JP4554835B2 - Mold for glass and method for producing glass molded product - Google Patents

Mold for glass and method for producing glass molded product Download PDF

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Publication number
JP4554835B2
JP4554835B2 JP2001051857A JP2001051857A JP4554835B2 JP 4554835 B2 JP4554835 B2 JP 4554835B2 JP 2001051857 A JP2001051857 A JP 2001051857A JP 2001051857 A JP2001051857 A JP 2001051857A JP 4554835 B2 JP4554835 B2 JP 4554835B2
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Japan
Prior art keywords
mold
glass
molding
molded product
producing
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JP2002255567A (en
Inventor
利尚 鎌野
聡 福山
功 松月
洋 村越
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Shibaura Machine Co Ltd
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Toshiba Machine Co Ltd
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    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/10Die base materials
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/16Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
    • C03B2215/17Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing Optical Record Carriers (AREA)
  • Diffracting Gratings Or Hologram Optical Elements (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Description

【0001】
【発明の属する技術分野】
本発明は、例えば非球面レンズなどの高精度な光学素子や、その表面に微細な凹凸からなる平面的なパターンが形成されたガラス基板などを、プレス成形によって製造する際に使用される成形型に係る。
【0002】
【従来の技術】
近年、レンズやプリズムなどの光学素子を製造する際、加熱して軟化させたガラス素材を成形型を用いてプレス成形する方法が広く使用されている。このような成形型を使用して高精度の光学部品を製造する場合、その型表面(成形面)を高い形状精度で加工すること、及び型表面に鏡面加工を施す必要がある。このため、成形型の母材部分には、従来、超硬合金またはセラミックスが使用されていた。更に、型表面へのガラスの融着防止や酸化防止などの目的で、型表面を保護するため、一般的に、型表面には種々のコーティングが施される。
【0003】
(従来技術の問題点)
従来、成形型の母材部分に使用されている材料は、非常に硬く脆い材料であるので、その加工は、研削及び研磨によって行われている。
【0004】
母材部分に従来の材料を使用した場合、非球面、円筒面、トーリック面などを一様に加工することは、比較的容易である。しかし、例えば、回折格子、ハードディスク、MOディスクなどで用いられる微細な凹凸からなるパターンは、加工用のダイヤモンド砥石が無いので、研削によって加工することが不可能であり、また、フォトリソグラフィを用いたエッチングでも、母材の特性から、微細な溝を要求される寸法精度で加工することは困難である。
【0005】
また、導波路のコアを成形するための成形型でも、数μm角の溝加工が必要となる。この溝は複雑な平面的なパターンで形成されるので、従来の加工法では溝加工が困難である。
【0006】
なお、成形型の母材の上に機械加工が比較的容易なメッキ層を設け、このメッキ層に微細加工を行って回折格子などのパターンを形成した後、その表面にガラスの融着防止用の離型膜をコーティングする方法が提案されている。しかし、この方法でも、溝の加工をダイヤモンドバイトを用いて行っているので、加工可能な溝の幅や深さ、形成可能なパターンの種類、及び型表面の表面粗さに限界がある。例えば、幅数μm程度の溝加工は可能であるが、パターンは単純なものに限られる。
【0007】
【発明が解決しようとする課題】
本発明は、以上のような従来の成形型についての問題点に鑑み成されたもので、本発明の目的は、非球面レンズなどの高精度な光学素子や、その表面に微細な凹凸によって平面的なパターンが形成されたガラス基板などを、プレス成形法によって製造することを可能にする成形型を提供することにある。
【0008】
【課題を解決するための手段】
本発明のガラス用成形型は、加熱して軟化させたガラス素材をプレス成形して成形製品を製造する際に使用されるガラス用成形型であって、その母材部分が石英ガラスで構成されたことを特徴とする。
【0009】
好ましくは、前記ガラス用成形型の型表面に離型膜をコーティングする。
【0010】
なお、前記ガラス用成形型を用いて、表面に微細な凹凸からなるパターンが形成されたガラス基板を製造する場合には、型表面に対応するパターンをフォトリソグラフィの技術を用いて形成することができる。
【0011】
また、本発明のガラス成形製品の製造方法は、加熱して軟化させたガラス素材を成形型を用いてプレス成形して成形製品を製造する方法であって、前記成形型として、その母材部分が石英ガラスで構成された成形型を用いることを特徴とする。
【0012】
本発明によるガラス用成形型の特徴について説明する。
【0013】
石英ガラスは、他の一般的な光学ガラスと異なり、単一の組成からなるので、融点が高い。このため、石英ガラスは、通常のガラス成形品のプレス成形が行われる500℃から800℃の温度範囲では、ほとんど変形を生じない。また、レンズ成形用の型を製作する場合には、従来から行われている研削及び研磨加工で型表面の加工を精度良く行うことができる。更に、型表面に微細な凹凸によってパターンを形成する場合には、石英ガラスに対するフォトリソグラフィ技術が確立されているので、比較的容易に多種多様なパターンを高い精度で形成することが可能である。
【0014】
従って、ガラス用成形型の母材部分を石英ガラスで構成することによって、光学素子や、表面に数μm程度の幅及び深さまたは高さの凹凸によってパターンが形成されたガラス基板を成形するための成形型を、高い形状精度で製作することが可能になる。
【0015】
【発明の実施の形態】
以下、本発明に基づくガラス用成形型の例を図面を用いて説明する。
【0016】
(例1)
図1に、レンズ成形用の成形型の概略図を示す。この成形型10は、母材部分11が石英ガラスからなり、離型膜12として、型表面に白金合金が厚さ0.3μmでコーティングされている。
【0017】
この成形型10を、図2に示すプレス成形機に取り付け、プレス成形によって径12mm、厚さ5mm程度の光学レンズを製作した。なお、図2において、21は固定軸、22は移動軸、23は上型ユニット、24は下型ユニット、25は透明石英管、26は赤外線ランプユニットである。
【0018】
成形素材として低融点ガラス(L−BAL42;オハラ(株)製)を使用し、成形温度570℃、プレス力800kgfでプレス成形を行った。500個のレンズを連続して成形し、その面精度を測定したところ、その平均値は0.3μm程度であった。また、500個のレンズを成形した後でも、型表面に特に変化は認められず、十分な耐久性を備えていることが確認された。
【0019】
(例2)
図3に、リブ状の微細な突起によってパターンが形成されたガラス基板を成形する際に使用される成形型の製作工程を示す。
【0020】
a.石英ガラス基板31を準備し、その上に、PVD法によって、エッチング用マスクとしてのタングステン薄膜32を堆積する(図3(a))。
【0021】
b.タングステン薄膜32の上に、スピンコータを用いてフォトレジスト膜33を塗布する(図3(b))。
【0022】
c.所定のパターンが形成されたフォトマスク35を使用し、フォトマスク35の上からフォトレジスト膜33に感光用光線としての紫外線を照射し、フォトレジスト膜33を感光させる(図3(c))。
【0023】
d.フォトレジスト膜33の感光部分を溶剤で取り除く(図3(d))。
【0024】
e.フォトレジスト膜33の上から、選択的にエッチング用マスクを除去するための媒体としてのアルゴンイオンを用いてイオンスパッタリングを行い、先にフォトレジスト膜33が取り除かれた部分において、タングステン薄膜32を除去する(図3(e))。
【0025】
f.残っているフォトレジスト膜33を、アッシングにより除去する(図3(f))。
【0026】
g.このようにしてパターニングされたタングステン薄膜32をマスクにして、CF系ガスを用いてドライエッチングを行い、石英ガラス基板31の表面をエッチングする(図3(g))。このとき、エッチングの時間を調節することにより、形成される溝の深さを制御することができる。
【0027】
h.アルゴンイオンを用いたイオンスパッタリングを行い、残っているタングステン薄膜32を除去する(図3(h))。これによって、石英ガラス基板31の表面に、微細な溝によるパターンが形成される。
【0028】
i.最後に、石英ガラス基板31の表面に、離型膜37として、PVD法によって白金合金を厚さ0.3μmでコーティングする(図3(i))。
【0029】
上記の方法を用いて、表面に、深さ3μm、幅3μmの溝によって所定のパターンが形成された成形型を製作した。この成形型を、図2に示すプレス成形機に取り付け、次の条件によって、幅10mm×10mm、厚さ1mm程度のガラス基板を製作した。
【0030】
成形素材として低融点ガラス(L−BAL42;オハラ(株)製)を使用し、成形温度570℃、プレス力800kgfでプレス成形を行った。500個のガラス基板を連続して成形し、その表面に形成されたリブ状の突起の高さを測定したところ、その高さは、ほぼ3μmとなり十分な転写性が確認された。また、500個のガラス基板を成形した後でも、型表面に特に変化は認められず、十分な耐久性を備えていることが確認された。
【0031】
【発明の効果】
本発明のガラス用成形型によれば、成形型の母材部分を石英ガラスによって構成した結果、光学素子や表面に微細な凹凸からなるパターンを備えたガラス基板を、高い形状精度で、且つ低いコストで製造することが可能になる。
【図面の簡単な説明】
【図1】本発明に基づくガラス用成形型の一例を示す概略図。
【図2】ガラス用成形型が使用されるプレス成形機の概要を示す図。
【図3】本発明に基づくガラス用成形型の製作工程の一例を示す図、(a)〜(i)は各工程における処理内容について説明する図。
【符号の説明】
10・・・成形型、
11・・・母材部分、
12・・・離型膜、
21・・・固定軸、
22・・・移動軸、
23・・・上型ユニット、
24・・・下型ユニット、
25・・・透明石英管、
26・・・ランプユニット、
31・・・石英ガラス基板、
32・・・タングステン薄膜、
33・・・フォトレジスト膜、
35・・・フォトマスク、
37・・・離型膜。
[0001]
BACKGROUND OF THE INVENTION
The present invention relates to a molding die used for producing a high-precision optical element such as an aspheric lens or a glass substrate having a planar pattern of fine irregularities formed on the surface thereof by press molding. Concerning.
[0002]
[Prior art]
2. Description of the Related Art In recent years, when manufacturing optical elements such as lenses and prisms, a method of press-molding a glass material that has been heated and softened using a mold has been widely used. When a highly accurate optical component is manufactured using such a mold, it is necessary to process the mold surface (molded surface) with high shape accuracy and to apply a mirror finish to the mold surface. For this reason, cemented carbide or ceramics has been conventionally used for the base material portion of the mold. Furthermore, in order to protect the mold surface for the purpose of preventing the glass from fusing to the mold surface and preventing oxidation, generally, various coatings are applied to the mold surface.
[0003]
(Problems of conventional technology)
Conventionally, since the material used for the base material part of a shaping | molding die is a very hard and brittle material, the process is performed by grinding and grinding | polishing.
[0004]
When a conventional material is used for the base material portion, it is relatively easy to uniformly process an aspheric surface, a cylindrical surface, a toric surface, and the like. However, for example, a pattern composed of fine irregularities used in a diffraction grating, a hard disk, an MO disk, and the like cannot be processed by grinding because there is no diamond wheel for processing, and photolithography was used. Even in etching, it is difficult to process fine grooves with required dimensional accuracy due to the characteristics of the base material.
[0005]
In addition, even a forming die for forming the core of the waveguide requires groove processing of several μm square. Since this groove is formed in a complicated planar pattern, the groove processing is difficult by the conventional processing method.
[0006]
In addition, a plating layer that is relatively easy to machine is provided on the base material of the mold, and a fine grating is formed on the plating layer to form a pattern such as a diffraction grating. There has been proposed a method of coating a release film. However, even in this method, since the grooves are processed using a diamond tool, there are limits to the width and depth of the grooves that can be processed, the types of patterns that can be formed, and the surface roughness of the mold surface. For example, a groove with a width of several μm can be formed, but the pattern is limited to a simple one.
[0007]
[Problems to be solved by the invention]
The present invention has been made in view of the problems associated with the conventional molds as described above. The object of the present invention is to provide a high-precision optical element such as an aspheric lens and a flat surface with fine irregularities on the surface. It is an object of the present invention to provide a mold that enables a glass substrate or the like on which a typical pattern is formed to be manufactured by a press molding method.
[0008]
[Means for Solving the Problems]
The glass mold of the present invention is a glass mold used when a molded product is produced by press-molding a glass material that has been softened by heating, and the base material portion is made of quartz glass. It is characterized by that.
[0009]
Preferably, a mold release film is coated on the mold surface of the glass mold.
[0010]
In addition, when manufacturing the glass substrate in which the pattern which consists of fine unevenness | corrugation was formed on the surface using the said glass shaping | molding die, the pattern corresponding to a type | mold surface can be formed using the technique of photolithography. it can.
[0011]
Further, the method for producing a glass molded product of the present invention is a method for producing a molded product by press-molding a glass material heated and softened using a molding die, and the base material portion thereof is used as the molding die. Is characterized by using a mold made of quartz glass.
[0012]
The characteristics of the glass mold according to the present invention will be described.
[0013]
Unlike other general optical glasses, quartz glass has a single composition and therefore has a high melting point. For this reason, quartz glass hardly deforms in a temperature range of 500 ° C. to 800 ° C. in which a normal glass molded product is press-formed. Further, when a lens molding die is manufactured, the die surface can be processed with high accuracy by conventional grinding and polishing. Furthermore, when a pattern is formed on the mold surface with fine irregularities, a photolithography technique for quartz glass has been established, so that various patterns can be formed with high accuracy relatively easily.
[0014]
Therefore, by forming the base material portion of the glass mold with quartz glass, it is possible to mold an optical element or a glass substrate in which a pattern is formed on the surface by unevenness having a width, depth, or height of about several μm. This mold can be manufactured with high shape accuracy.
[0015]
DETAILED DESCRIPTION OF THE INVENTION
Hereinafter, the example of the shaping | molding die for glass based on this invention is demonstrated using drawing.
[0016]
(Example 1)
FIG. 1 shows a schematic diagram of a mold for molding a lens. In this mold 10, a base material portion 11 is made of quartz glass, and a platinum alloy is coated on the mold surface as a release film 12 with a thickness of 0.3 μm.
[0017]
This mold 10 was attached to the press molding machine shown in FIG. 2, and an optical lens having a diameter of about 12 mm and a thickness of about 5 mm was manufactured by press molding. In FIG. 2, 21 is a fixed shaft, 22 is a moving shaft, 23 is an upper mold unit, 24 is a lower mold unit, 25 is a transparent quartz tube, and 26 is an infrared lamp unit.
[0018]
Low molding glass (L-BAL42; manufactured by OHARA) was used as a molding material, and press molding was performed at a molding temperature of 570 ° C. and a pressing force of 800 kgf. When 500 lenses were continuously molded and the surface accuracy was measured, the average value was about 0.3 μm. Further, even after molding 500 lenses, no particular change was observed on the mold surface, and it was confirmed that the mold surface had sufficient durability.
[0019]
(Example 2)
FIG. 3 shows a manufacturing process of a forming die used when forming a glass substrate on which a pattern is formed by fine rib-shaped protrusions.
[0020]
a. A quartz glass substrate 31 is prepared, and a tungsten thin film 32 as an etching mask is deposited thereon by the PVD method (FIG. 3A).
[0021]
b. A photoresist film 33 is applied on the tungsten thin film 32 by using a spin coater (FIG. 3B).
[0022]
c. Using a photomask 35 on which a predetermined pattern is formed, the photoresist film 33 is irradiated with ultraviolet rays as a photosensitive light beam from above the photomask 35 to expose the photoresist film 33 (FIG. 3C).
[0023]
d. The photosensitive portion of the photoresist film 33 is removed with a solvent (FIG. 3D).
[0024]
e. Ion sputtering is performed from above the photoresist film 33 using argon ions as a medium for selectively removing the etching mask, and the tungsten thin film 32 is removed at the portion where the photoresist film 33 has been removed first. (FIG. 3E).
[0025]
f. The remaining photoresist film 33 is removed by ashing (FIG. 3F).
[0026]
g. Using the tungsten thin film 32 thus patterned as a mask, dry etching is performed using a CF-based gas to etch the surface of the quartz glass substrate 31 (FIG. 3G). At this time, the depth of the groove to be formed can be controlled by adjusting the etching time.
[0027]
h. Ion sputtering using argon ions is performed to remove the remaining tungsten thin film 32 (FIG. 3H). As a result, a pattern with fine grooves is formed on the surface of the quartz glass substrate 31.
[0028]
i. Finally, a platinum alloy is coated on the surface of the quartz glass substrate 31 with a thickness of 0.3 μm by the PVD method as the release film 37 (FIG. 3I).
[0029]
Using the above method, a mold having a predetermined pattern formed on the surface by grooves having a depth of 3 μm and a width of 3 μm was manufactured. This mold was attached to the press molding machine shown in FIG. 2, and a glass substrate having a width of about 10 mm × 10 mm and a thickness of about 1 mm was manufactured under the following conditions.
[0030]
Low molding glass (L-BAL42; manufactured by OHARA) was used as a molding material, and press molding was performed at a molding temperature of 570 ° C. and a pressing force of 800 kgf. When 500 glass substrates were continuously formed and the height of the rib-like protrusions formed on the surface was measured, the height was approximately 3 μm, and sufficient transferability was confirmed. Moreover, even after molding 500 glass substrates, no particular change was observed on the mold surface, and it was confirmed that the mold surface had sufficient durability.
[0031]
【The invention's effect】
According to the glass mold of the present invention, the base material portion of the mold is made of quartz glass. As a result, an optical element and a glass substrate having a pattern with fine irregularities on the surface can be obtained with high shape accuracy and low. It becomes possible to manufacture at a cost.
[Brief description of the drawings]
FIG. 1 is a schematic view showing an example of a glass mold according to the present invention.
FIG. 2 is a diagram showing an outline of a press molding machine in which a glass mold is used.
FIGS. 3A and 3B are diagrams showing an example of a manufacturing process of a glass mold according to the present invention, and FIGS.
[Explanation of symbols]
10 ... Mold,
11 ... base material part,
12 ... release film,
21 ... fixed shaft,
22 ... movement axis,
23 ... Upper mold unit,
24 ... Lower mold unit,
25 ... Transparent quartz tube,
26: Lamp unit,
31 ... quartz glass substrate,
32 ... tungsten thin film,
33 ... Photoresist film,
35 ... Photomask,
37 ... Release film.

Claims (4)

加熱して軟化させたガラス素材をプレス成形して成形製品を製造する際に使用されるガラス用成形型であって、石英ガラスで構成された母材部分の表面に、微細な凹凸からなるパターンがフォトリソグラフィによって形成されていることを特徴とするガラス用成形型。  A mold for glass used when press-molding a glass material that has been softened by heating to produce a molded product, and a pattern consisting of fine irregularities on the surface of a base material part made of quartz glass Is formed by photolithography, a glass mold. 型表面に離型膜がコーティングされていることを特徴とする請求項1に記載のガラス用成形型。  The mold for glass according to claim 1, wherein a mold release film is coated on the mold surface. 加熱して軟化させたガラス素材を成形型を用いてプレス成形して成形製品を製造する方法であって、前記成形型として、石英ガラスで構成された母材部分の表面に、微細な凹凸からなるパターンがフォトリソグラフィによって形成された成形型を用いることを特徴とするガラス成形製品の製造方法。  A method for producing a molded product by press-molding a glass material softened by heating using a molding die, wherein the molding die is formed from fine irregularities on the surface of a base material portion made of quartz glass. A method for producing a glass molded product, comprising using a mold having a pattern formed by photolithography. 前記成形型として、型表面に離型膜がコーティングされた成形型を用いることを特徴とする請求項3に記載のガラス成形製品の製造方法。  The method for producing a glass molded product according to claim 3, wherein a mold having a mold surface coated with a release film is used as the mold.
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JPH0251434A (en) * 1988-08-15 1990-02-21 Hoya Corp Mold for press-molding glass
JP2000185926A (en) * 1998-12-24 2000-07-04 Canon Inc Mold for molding glass optical device, molding method and optical device thus molded

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0251434A (en) * 1988-08-15 1990-02-21 Hoya Corp Mold for press-molding glass
JP2000185926A (en) * 1998-12-24 2000-07-04 Canon Inc Mold for molding glass optical device, molding method and optical device thus molded

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