JP2002237516A - Wafer protective case - Google Patents

Wafer protective case

Info

Publication number
JP2002237516A
JP2002237516A JP2001030894A JP2001030894A JP2002237516A JP 2002237516 A JP2002237516 A JP 2002237516A JP 2001030894 A JP2001030894 A JP 2001030894A JP 2001030894 A JP2001030894 A JP 2001030894A JP 2002237516 A JP2002237516 A JP 2002237516A
Authority
JP
Japan
Prior art keywords
wafer
semiconductor wafer
protection case
configuration
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001030894A
Other languages
Japanese (ja)
Inventor
Akishi Okuhara
晃史 奥原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Epson Corp
Original Assignee
Seiko Epson Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Epson Corp filed Critical Seiko Epson Corp
Priority to JP2001030894A priority Critical patent/JP2002237516A/en
Publication of JP2002237516A publication Critical patent/JP2002237516A/en
Withdrawn legal-status Critical Current

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Landscapes

  • Packaging Frangible Articles (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Packaging Of Annular Or Rod-Shaped Articles, Wearing Apparel, Cassettes, Or The Like (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a wafer protective case by which the quality of a wafer is kept accompanying easy handling, at carrying and operating of a semiconductor wafer. SOLUTION: This wafer protective case 10 is provided with a hinge part 11 and attaching/detaching parts 12 so as to be openable. One semiconductor wafer WF is housed, so as to expose the integrated circuit area CA of the main surface and to wrap all the peripheral edge part EG with a groove 13. The peripheral edge protective form of housing the semiconductor wafer so as to warp the entire wafer peripheral edge part is provided for each semiconductor wafer, and the semiconductor wafer WF is carried, while being kept housed in the wafer protective case 10.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、LSI製造工程及
び検査工程のラインで用いられ、特に半導体ウェハの搬
送時、操作時の品質を保持するウェハ保護ケースに関す
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a wafer protection case used in a line for an LSI manufacturing process and an inspection process, and particularly to a wafer protection case for maintaining the quality of a semiconductor wafer during transportation and operation.

【0002】[0002]

【従来の技術】LSI製造におけるウェハ工程では、製
造ラインに沿った半導体ウェハの搬送が不可欠である。
複数のウェハの収容、搬送にウェハキャリアが用いられ
る。ウェハキャリアからウェハを1枚ずつ真空吸着アー
ム(エアーピンセット)で抜き出す、ウェハキャリアに
ウェハを1枚ずつ真空吸着アーム(エアーピンセット)
で収容するといった作業が一般に行われている。
2. Description of the Related Art In a wafer process in LSI manufacturing, it is essential to transport a semiconductor wafer along a manufacturing line.
A wafer carrier is used for accommodating and transporting a plurality of wafers. Vacuum suction arm (air tweezers) to pull out wafers one by one from wafer carrier by vacuum suction arm (air tweezers)
In general, work such as housing in a room is performed.

【0003】近年、半導体ウェハは大径化され、特に出
荷検査工程においては薄厚化の傾向にある。そうなる
と、上述のようなウェハそのままの状態での取り扱いに
は細心の注意を払わねばならない。
In recent years, semiconductor wafers have become larger in diameter, and in particular, there has been a tendency to become thinner in a shipping inspection process. In such a case, great care must be taken in handling the wafer as it is as described above.

【0004】[0004]

【発明が解決しようとする課題】例えば、真空吸着アー
ム等でウェハを吸着してウェハキャリアから抜き出す場
合、他のウェハと接触する危険性がある。ウェハの径が
大きく、薄厚化されたものでは反りが顕著になるからで
ある。また、薄厚のアーム自体が他のウェハと接触する
ことにもなり兼ねない。これにより、ウェハへの損傷を
懸念して、作業効率を上げられない。
For example, when a wafer is suctioned by a vacuum suction arm or the like and extracted from a wafer carrier, there is a risk of contact with another wafer. This is because a wafer having a large diameter and a reduced thickness has a remarkable warpage. Further, the thin arm itself may come into contact with another wafer. As a result, the working efficiency cannot be increased due to concern about damage to the wafer.

【0005】本発明は上記のような事情を考慮してなさ
れたもので、半導体ウェハの搬送時、操作時に容易な取
り扱いを伴ってウェハの品質を保持できるウェハ保護ケ
ースを提供しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made in view of the above circumstances, and aims to provide a wafer protection case capable of maintaining the quality of a semiconductor wafer with easy handling during transport and operation of the semiconductor wafer. is there.

【0006】[0006]

【課題を解決するための手段】本発明に係るウェハ保護
ケースは、開閉に少なくともヒンジ部及び着脱部を有
し、半導体ウェハ1枚について、その主表面の集積回路
領域を露出させると共にその周縁部全てが溝に包まれる
ように納められることを特徴とする。
SUMMARY OF THE INVENTION A wafer protection case according to the present invention has at least a hinge portion and a detachable portion for opening and closing, and exposes an integrated circuit region on a main surface of one semiconductor wafer and a peripheral portion thereof. It is characterized in that everything is housed in a groove.

【0007】上記本発明に係るウェハ保護ケースによれ
ば、半導体ウェハ1枚毎にウェハ周縁部全てを包むよう
に納められる周縁保護形態が提供される。半導体ウェハ
はウェハ保護ケースに納められたまま搬送できる。これ
により、ウェハ周縁部全体は強固になり、搬送時にウェ
ハの反りが防止される。取り扱いに十分な注意の必要な
ウェハ周縁部を保護することで、搬送、操作を容易に
し、高信頼性を得る。
[0007] According to the wafer protection case according to the present invention, there is provided a peripheral protection mode in which the semiconductor wafer is enclosed so as to enclose the entire wafer peripheral portion for each semiconductor wafer. The semiconductor wafer can be transported while being stored in the wafer protection case. As a result, the entire periphery of the wafer becomes strong, and the wafer is prevented from warping during transfer. By protecting the peripheral portion of the wafer, which requires careful handling, transportation and operation are facilitated, and high reliability is obtained.

【0008】また、本発明に係るウェハ保護ケースは、
開閉に少なくともヒンジ部及び着脱部を有し、半導体ウ
ェハ1枚について、その主表面の集積回路領域を露出さ
せると共にその周縁部から裏面全面に亘って包むように
納められることを特徴とする。
Further, the wafer protection case according to the present invention comprises:
It has at least a hinge portion and a detachable portion for opening and closing, and is characterized in that one semiconductor wafer is placed so as to expose the integrated circuit region on the main surface and to wrap from the periphery to the entire back surface.

【0009】上記本発明に係るウェハ保護ケースによれ
ば、半導体ウェハ1枚毎にウェハ周縁部全て及びウェハ
裏面全体を包むように納められるケースが提供される。
これにより、ウェハ周縁部全体の強化はもとより、搬送
時にウェハの裏面側の吸着を用いる場合、ウェハに直接
触れることはない。取り扱いに十分な注意の必要なウェ
ハ周縁部を保護することで、搬送、操作を容易にし、高
信頼性を得る。
According to the above-mentioned wafer protection case according to the present invention, a case is provided in which the entire semiconductor wafer is wrapped so as to cover the entire periphery of the wafer and the entire back surface of the wafer.
Accordingly, when the suction of the back surface side of the wafer is used during the transfer as well as the strengthening of the entire peripheral portion of the wafer, the wafer does not directly touch the wafer. By protecting the peripheral portion of the wafer, which requires careful handling, transportation and operation are facilitated, and high reliability is obtained.

【0010】なお、ケース装着脱の容易な形態として、
上記2つ本発明に係るウェハ保護ケースによれば、前記
ヒンジ部及び着脱部は、前記半導体ウェハ平面の広がる
方向で開閉するように設けられていることを特徴とす
る。また、上記2つ本発明に係るウェハ保護ケースによ
れば、前記ヒンジ部及び着脱部は、前記半導体ウェハの
主表面−裏面の方向で開閉するように設けられているこ
とを特徴とする。
[0010] In addition, as an easy form for mounting and dismounting the case,
According to the above two wafer protection cases according to the present invention, the hinge portion and the detachable portion are provided so as to open and close in a direction in which the plane of the semiconductor wafer expands. Further, in the above two wafer protection cases according to the present invention, the hinge portion and the attaching / detaching portion are provided so as to open and close in a direction from the main surface to the back surface of the semiconductor wafer.

【0011】さらに、ウェハの回転防止、ケース着脱に
よるウェハ保護の観点から、上記2つの本発明に係るウ
ェハ保護ケースによれば、少なくとも前記半導体ウェハ
が納められる接触部分において弾性部材で被覆されてい
る領域を有することを特徴とする。
Further, from the viewpoints of preventing the rotation of the wafer and protecting the wafer by attaching and detaching the case, according to the two wafer protection cases according to the present invention, at least the contact portion where the semiconductor wafer is accommodated is covered with the elastic member. It has a region.

【0012】[0012]

【発明の実施の形態】図1(a)〜(c)は、本発明の
第1実施形態に係るウェハ保護ケースの要部構成を示し
ており、(a)は概観平面図、(b)はウェハに装着し
た概観平面図、(c)は(b)図中の1C−1C線に沿
う断面構成図である。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS FIGS. 1 (a) to 1 (c) show a main configuration of a wafer protection case according to a first embodiment of the present invention, wherein (a) is an outline plan view and (b) FIG. 2 is an outline plan view mounted on a wafer, and FIG. 2C is a sectional configuration view taken along line 1C-1C in FIG.

【0013】ウェハ保護ケース10は、開閉可能なよう
にヒンジ部11及び着脱部12を有する。1枚の半導体
ウェハWFについて、その主表面の集積回路領域CAを
露出させると共にその周縁部EG全てが溝13に包まれ
るように納められる。半導体ウェハWFを納める際の位
置合わせは溝13の形状によって定められるようにして
もよい。
The wafer protection case 10 has a hinge portion 11 and a detachable portion 12 so that it can be opened and closed. One semiconductor wafer WF is placed so that the integrated circuit area CA on the main surface thereof is exposed and the entire periphery EG is surrounded by the groove 13. Positioning for storing the semiconductor wafer WF may be determined by the shape of the groove 13.

【0014】ウェハ保護ケース10は、例えばアルミ、
ステンレス等の金属材料で構成される。あるいは、プラ
スチック材料に帯電防止材としての導電性被膜を施した
構成でもよい。
The wafer protection case 10 is made of, for example, aluminum,
It is composed of a metal material such as stainless steel. Alternatively, a configuration in which a conductive coating as an antistatic material is applied to a plastic material may be used.

【0015】また、溝13は、ウェハWFの周縁を傷付
けずに狭持されることが望ましい。例えば、ポリイミド
樹脂などのコーティングによる弾性部材14がウェハ周
縁を狭持する形態を有する。弾性部材14は溝13全域
に設けなくともよく、所定間隔で複数箇所に設ける構成
としてもよい。これにより、ウェハWFの回転防止、ウ
ェハ保護ケース10の着脱時におけるウェハWFの保護
に寄与する。
It is desirable that the groove 13 be pinched without damaging the peripheral edge of the wafer WF. For example, the elastic member 14 made of a coating of polyimide resin or the like has a configuration in which the peripheral edge of the wafer is held. The elastic members 14 may not be provided in the entire area of the groove 13 and may be provided at a plurality of locations at predetermined intervals. This contributes to prevention of rotation of the wafer WF and protection of the wafer WF when the wafer protection case 10 is attached and detached.

【0016】図2(a),(b)は、それぞれ図1
(b)に示すヒンジ部11、着脱部12の構成の一例を
示す概略図である。(a)に示すように、ヒンジ部11
においても、可動軸111の突出はなく極力平坦化さ
れ、他の部分と厚さを同等にする。また、(b)に示す
ように、着脱部12は、閉じられた時嵌め合いの形状で
固定される形態とする。閉じられた部分は、他の部分と
厚さを同等にする。
FIGS. 2A and 2B respectively show FIGS.
It is the schematic which shows an example of a structure of the hinge part 11 and the attachment / detachment part 12 shown to (b). As shown in FIG.
Also in this case, the movable shaft 111 is flattened as much as possible without projection, and the thickness is made equal to other portions. Further, as shown in (b), the attaching / detaching portion 12 is fixed in a fitting shape when closed. The closed part has the same thickness as the other parts.

【0017】上記実施形態の構成によれば、半導体ウェ
ハ1枚毎にウェハ周縁部全てを包むように納められる周
縁保護形態が提供される。半導体ウェハWFは、ウェハ
保護ケース10に納められたまま搬送できる。例えばウ
ェハ保護ケース10の厚さが図示しないウェハキャリア
の収納溝の幅より小さければ、ウェハキャリアでの搬送
利用が実現できる。
According to the configuration of the above-described embodiment, there is provided a peripheral edge protection mode in which the semiconductor wafer is housed so as to enclose the entire wafer peripheral portion. The semiconductor wafer WF can be transported while being stored in the wafer protection case 10. For example, if the thickness of the wafer protection case 10 is smaller than the width of the storage groove of the wafer carrier (not shown), the transfer use in the wafer carrier can be realized.

【0018】これにより、ウェハ周縁部全体は強固にな
り、搬送時にウェハの反りが防止される。取り扱いに十
分な注意の必要なウェハ周縁部を保護することで、搬
送、操作を容易にし、高信頼性を得ることができる。
As a result, the entire periphery of the wafer becomes strong, and the wafer is prevented from warping during transfer. By protecting the peripheral portion of the wafer, which requires careful handling, transportation and operation can be facilitated and high reliability can be obtained.

【0019】図3(a)〜(c)は、本発明の第2実施
形態に係るウェハ保護ケースの要部構成を示しており、
(a)は概観平面図、(b)はウェハに装着した概観平
面図、(c)は(b)図中の3C−3C線に沿う断面構
成図である。
FIGS. 3A to 3C show a main configuration of a wafer protection case according to a second embodiment of the present invention.
(A) is an outline plan view, (b) is an outline plan view mounted on a wafer, and (c) is a cross-sectional configuration diagram taken along line 3C-3C in (b) diagram.

【0020】ウェハ保護ケース20は、開閉可能なよう
にヒンジ部21及び所定数の着脱部22を有する。1枚
の半導体ウェハWFについて、その主表面の集積回路領
域CAを露出させると共にその周縁部EGから裏面全面
に亘って包むように納められる。半導体ウェハWFを納
める際の位置合わせは、平面領域23の微小な突起等で
構成されるマーク(図示せず)によって定められるよう
にしてもよい。
The wafer protection case 20 has a hinge portion 21 and a predetermined number of detachable portions 22 so as to be openable and closable. One semiconductor wafer WF is placed so as to expose the integrated circuit area CA on the main surface and to cover the entire back surface from the peripheral edge EG. Positioning when the semiconductor wafer WF is placed may be determined by a mark (not shown) formed by minute projections or the like in the plane area 23.

【0021】ウェハ保護ケース20は、例えばアルミ、
ステンレス等の金属材料で構成される。あるいは、プラ
スチック材料に帯電防止材としての導電性被膜を施した
構成でもよい。
The wafer protection case 20 is made of, for example, aluminum,
It is composed of a metal material such as stainless steel. Alternatively, a configuration in which a conductive coating as an antistatic material is applied to a plastic material may be used.

【0022】また、ウェハWFの裏面側を保護する平面
領域23は、ポリイミド樹脂などの弾性部材24がコー
ティングされウェハWFの裏面を傷付けないような構成
にするとよい。ウェハ周縁を狭持するリング部25にも
弾性部材24のコーティング領域が設けられていること
が望ましい。もちろん全域でなく、所定間隔で複数箇所
に設ける構成としてもよい。これにより、ウェハWFの
回転防止、ウェハ保護ケース20の着脱時におけるウェ
ハWFの保護に寄与する。
The planar region 23 for protecting the rear surface of the wafer WF is preferably coated with an elastic member 24 such as a polyimide resin so as not to damage the rear surface of the wafer WF. It is desirable that a coating region of the elastic member 24 is also provided on the ring portion 25 that holds the peripheral edge of the wafer. Of course, a configuration may be provided at a plurality of locations at predetermined intervals instead of the entire area. This contributes to preventing the rotation of the wafer WF and protecting the wafer WF when the wafer protection case 20 is attached and detached.

【0023】図4(a),(b)は、それぞれ図3
(b)に示すヒンジ部21、着脱部22の構成の一例を
示す概略図である。(a)に示すように、ヒンジ部21
においても、可動軸211の突出はなく極力平坦化さ
れ、他の部分と厚さを同等にする。また、(b)に示す
ように、着脱部22は、閉じられた時嵌め合いの形状で
固定される形態とし、2箇所以上(ここでは3箇所)設
けることが望ましい。閉じられた部分は、他の部分と厚
さを同等にする。
FIGS. 4A and 4B respectively show FIGS.
It is the schematic which shows an example of the structure of the hinge part 21 and attachment / detachment part 22 shown to (b). As shown in FIG.
Also in this case, the movable shaft 211 is flattened as much as possible without projection, and the thickness is made equal to other portions. Further, as shown in (b), the attachment / detachment portion 22 is fixed in a fitting shape when closed, and is desirably provided at two or more locations (here, three locations). The closed part has the same thickness as the other parts.

【0024】上記実施形態の構成によれば、半導体ウェ
ハ1枚毎にウェハ周縁部全て及びウェハ裏面全体を包む
ように納められるケースが提供される。これにより、ウ
ェハ周縁部全体の強化(反り防止)はもとより、搬送時
にウェハの裏面側の吸着を用いる場合、ウェハに直接触
れることはない。半導体ウェハWFは、ウェハ保護ケー
ス20に納められたまま搬送できる。例えばウェハ保護
ケース20の厚さが図示しないウェハキャリアの収納溝
の幅より小さければ、ウェハキャリアでの搬送利用が実
現できる。
According to the configuration of the above-described embodiment, a case is provided in which the semiconductor wafer is housed so as to cover the entire periphery of the wafer and the entire back surface of the wafer for each semiconductor wafer. Thus, in addition to strengthening the entire peripheral portion of the wafer (preventing warpage), when using suction on the back surface side of the wafer during transfer, the wafer does not directly touch the wafer. The semiconductor wafer WF can be transported while being stored in the wafer protection case 20. For example, if the thickness of the wafer protection case 20 is smaller than the width of the storage groove of the wafer carrier (not shown), the transfer use in the wafer carrier can be realized.

【0025】これにより、ウェハ周縁部全体は強固にな
り、搬送時にウェハの反りが防止される。取り扱いに十
分な注意の必要なウェハ周縁部を保護することで、搬
送、操作を容易にし、高信頼性を得ることができる。
As a result, the entire periphery of the wafer becomes strong, and the wafer is prevented from warping during transfer. By protecting the peripheral portion of the wafer, which requires careful handling, transportation and operation can be facilitated and high reliability can be obtained.

【0026】図5(a)〜(c)は、前記図1の構成の
変形例で第2実施形態の構成を適用したウェハ保護ケー
スの要部構成を示しており、(a)は概観平面図、
(b)はウェハに装着した概観平面図、(c)は(b)
図中の5C−5C線に沿う断面構成図である。前記図1
と同様の箇所には同一の符合を付して説明は省略する。
FIGS. 5 (a) to 5 (c) show a main configuration of a wafer protection case to which the configuration of the second embodiment is applied, which is a modification of the configuration shown in FIG. 1, and FIG. Figure,
(B) is an outline plan view mounted on the wafer, (c) is (b)
It is sectional drawing which follows the 5C-5C line in the figure. FIG. 1
The same parts as those described above are denoted by the same reference numerals and description thereof is omitted.

【0027】すなわち、ウェハ保護ケース50は、機構
は前記図1と同様であって、ヒンジ部11及び着脱部1
2は、半導体ウェハWF平面の広がる方向で開閉するよ
うに設けられている。
That is, the mechanism of the wafer protection case 50 is the same as that of FIG.
2 is provided so as to open and close in the direction in which the plane of the semiconductor wafer WF spreads.

【0028】このような機構でもって1枚の半導体ウェ
ハWFについて、その主表面の集積回路領域CAを露出
させると共にその周縁部EGから裏面全面に亘って包む
ように納められる。第2実施形態と同様にウェハWFの
裏面を傷付けないような構成にすることが重要であり、
第2実施形態と同様な効果が期待できる。
With such a mechanism, one semiconductor wafer WF is placed so as to expose the integrated circuit area CA on the main surface thereof and to cover the entire back surface from the peripheral edge EG. It is important that the back surface of the wafer WF is not damaged as in the second embodiment.
The same effects as in the second embodiment can be expected.

【0029】図6(a)〜(c)は、前記図3の構成の
変形例で第1実施形態の構成を適用したウェハ保護ケー
スの要部構成を示しており、(a)は概観平面図、
(b)はウェハに装着した概観平面図、(c)は(b)
図中の6C−6C線に沿う断面構成図である。前記図3
と同様の箇所には同一の符合を付して説明は省略する。
FIGS. 6 (a) to 6 (c) show a main part of a wafer protection case to which the configuration of the first embodiment is applied in a modification of the configuration of FIG. 3, and FIG. Figure,
(B) is an outline plan view mounted on the wafer, (c) is (b)
FIG. 6 is a sectional configuration view taken along line 6C-6C in the figure. FIG. 3
The same parts as those described above are denoted by the same reference numerals and description thereof is omitted.

【0030】すなわち、ウェハ保護ケース60は、機構
は前記図3と同様であって、ヒンジ部21及び着脱部2
2は、半導体ウェハWFの主表面−裏面の方向で開閉す
るように設けられている。
That is, the mechanism of the wafer protection case 60 is the same as that of FIG.
2 is provided so as to open and close in the direction from the main surface to the back surface of the semiconductor wafer WF.

【0031】このような機構でもって1枚の半導体ウェ
ハWFについて、その主表面の集積回路領域CAを露出
させると共にその周縁部EG全てが溝の狭持に包まれる
ように納められる。第1実施形態と同様にウェハWFの
周縁を傷付けずに狭持される構成にすることが重要であ
り、第1実施形態と同様な効果が期待できる。
With such a mechanism, one semiconductor wafer WF is housed so that the integrated circuit area CA on the main surface thereof is exposed and the entire periphery EG is surrounded by the holding of the groove. As in the first embodiment, it is important to hold the wafer WF without damaging the peripheral edge thereof, and the same effects as in the first embodiment can be expected.

【0032】[0032]

【発明の効果】以上説明したように本発明によれば、1
枚の半導体ウェハWFについて、その主表面の集積回路
領域を露出させると共にその周縁部全てあるいは裏面も
含めて包まれるように周縁保護形態が実現される。この
結果、半導体ウェハの搬送時、操作時に容易な取り扱い
を伴ってウェハの品質を保持できるウェハ保護ケースを
提供することができる。
As described above, according to the present invention, 1
With respect to one semiconductor wafer WF, a peripheral edge protection form is realized such that the integrated circuit region on the main surface is exposed and the entire peripheral portion or the rear surface is covered. As a result, it is possible to provide a wafer protection case that can maintain the quality of the semiconductor wafer with easy handling at the time of transporting and operating the semiconductor wafer.

【図面の簡単な説明】[Brief description of the drawings]

【図1】(a)〜(c)は、本発明の第1実施形態に係
るウェハ保護ケースの要部構成を示し、(a)は概観平
面図、(b)はウェハに装着した概観平面図、(c)は
(b)図中の1C−1C線に沿う断面構成図である。
1 (a) to 1 (c) show a main part configuration of a wafer protection case according to a first embodiment of the present invention, where (a) is an outline plan view, and (b) is an outline plan mounted on a wafer. FIG. 1C is a cross-sectional view taken along the line 1C-1C in FIG.

【図2】(a),(b)は、それぞれ図1(b)に示す
ヒンジ部、着脱部の構成の一例を示す概略図である。
FIGS. 2A and 2B are schematic diagrams each illustrating an example of a configuration of a hinge unit and a detachable unit illustrated in FIG. 1B;

【図3】(a)〜(c)は、本発明の第2実施形態に係
るウェハ保護ケースの要部構成を示し、(a)は概観平
面図、(b)はウェハに装着した概観平面図、(c)は
(b)図中の3C−3C線に沿う断面構成図である。
3 (a) to 3 (c) show a main part configuration of a wafer protection case according to a second embodiment of the present invention, where (a) is an outline plan view, and (b) is an outline plane mounted on a wafer. FIG. 3C is a cross-sectional view taken along line 3C-3C in FIG.

【図4】(a),(b)は、それぞれ図3(b)に示す
ヒンジ部、着脱部の構成の一例を示す概略図である。
FIGS. 4A and 4B are schematic diagrams each illustrating an example of a configuration of a hinge unit and a detachable unit illustrated in FIG. 3B;

【図5】(a)〜(c)は、前記図1の構成の変形例で
第2実施形態の構成を適用したウェハ保護ケースの要部
構成を示しており、(a)は概観平面図、(b)はウェ
ハに装着した概観平面図、(c)は(b)図中の5C−
5C線に沿う断面構成図である。
FIGS. 5 (a) to 5 (c) show a main configuration of a wafer protection case to which the configuration of the second embodiment is applied in a modification of the configuration of FIG. 1, and FIG. , (B) is an outline plan view mounted on the wafer, (c) is 5C- in FIG.
It is sectional drawing which follows 5C line.

【図6】(a)〜(c)は、前記図3の構成の変形例で
第1実施形態の構成を適用したウェハ保護ケースの要部
構成を示しており、(a)は概観平面図、(b)はウェ
ハに装着した概観平面図、(c)は(b)図中の6C−
6C線に沿う断面構成図である。
6 (a) to 6 (c) show a main part configuration of a wafer protection case to which the configuration of the first embodiment is applied, which is a modification of the configuration of FIG. 3, and FIG. , (B) is an outline plan view mounted on the wafer, (c) is 6C- in FIG.
It is sectional drawing which follows 6C line.

【符号の説明】[Explanation of symbols]

10,20,50,60…ウェハ保護ケース 11,21…ヒンジ部 111,211…可動軸 12,22…着脱部 13…溝 14,24…弾性部材 25…リング部 WF…半導体ウェハ CA…集積回路領域 EG…周縁部 10, 20, 50, 60: wafer protection case 11, 21, hinge part 111, 211 movable shaft 12, 22, detachable part 13, groove 14, 24, elastic member 25, ring part WF, semiconductor wafer CA, integrated circuit Area EG: Peripheral part

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 3E068 AA33 AB04 AC06 BB01 CC04 CC12 CD02 CE03 DD06 DD09 DD14 DD40 DE06 EE26 EE37 3E096 AA01 BA16 BB04 CA01 CB02 CB10 DA05 DA18 DB07 DC01 FA12 FA30 GA14 5F031 CA02 DA13 FA01 FA12 MA33 PA13 PA20  ──────────────────────────────────────────────────続 き Continued on front page F term (reference) 3E068 AA33 AB04 AC06 BB01 CC04 CC12 CD02 CE03 DD06 DD09 DD14 DD40 DE06 EE26 EE37 3E096 AA01 BA16 BB04 CA01 CB02 CB10 DA05 DA18 DB07 DC01 FA12 FA30 GA14 5F031 CA02 DA13 FA01 PA12 MA13

Claims (5)

【特許請求の範囲】[Claims] 【請求項1】 開閉に少なくともヒンジ部及び着脱部を
有し、半導体ウェハ1枚について、その主表面の集積回
路領域を露出させると共にその周縁部全てが溝に包まれ
るように納められることを特徴とするウェハ保護ケー
ス。
1. A semiconductor wafer having at least a hinge portion and an attaching / detaching portion for opening and closing, wherein one semiconductor wafer is housed so that an integrated circuit region on a main surface thereof is exposed and the entire peripheral portion is surrounded by a groove. Wafer protection case.
【請求項2】 開閉に少なくともヒンジ部及び着脱部を
有し、半導体ウェハ1枚について、その主表面の集積回
路領域を露出させると共にその周縁部から裏面全面に亘
って包むように納められることを特徴とするウェハ保護
ケース。
2. A semiconductor wafer having at least a hinge portion and an attaching / detaching portion for opening and closing, wherein one semiconductor wafer is housed so as to expose an integrated circuit region on a main surface thereof and to wrap from a peripheral portion to an entire back surface. Wafer protection case.
【請求項3】 前記ヒンジ部及び着脱部は、前記半導体
ウェハ平面の広がる方向で開閉するように設けられてい
ることを特徴とする請求項1または2記載のウェハ保護
ケース。
3. The wafer protection case according to claim 1, wherein the hinge portion and the attachment / detachment portion are provided so as to open and close in a direction in which the plane of the semiconductor wafer expands.
【請求項4】 前記ヒンジ部及び着脱部は、前記半導体
ウェハの主表面−裏面の方向で開閉するように設けられ
ていることを特徴とする請求項1または2記載のウェハ
保護ケース。
4. The wafer protection case according to claim 1, wherein the hinge portion and the attachment / detachment portion are provided so as to open and close in a direction from a main surface to a back surface of the semiconductor wafer.
【請求項5】 少なくとも前記半導体ウェハが納められ
る接触部分において弾性部材で被覆されている領域を有
することを特徴とする請求項1〜4いずれか一つに記載
のウェハ保護ケース。
5. The wafer protection case according to claim 1, wherein at least a contact portion in which the semiconductor wafer is accommodated has a region covered with an elastic member.
JP2001030894A 2001-02-07 2001-02-07 Wafer protective case Withdrawn JP2002237516A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001030894A JP2002237516A (en) 2001-02-07 2001-02-07 Wafer protective case

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001030894A JP2002237516A (en) 2001-02-07 2001-02-07 Wafer protective case

Publications (1)

Publication Number Publication Date
JP2002237516A true JP2002237516A (en) 2002-08-23

Family

ID=18895045

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001030894A Withdrawn JP2002237516A (en) 2001-02-07 2001-02-07 Wafer protective case

Country Status (1)

Country Link
JP (1) JP2002237516A (en)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006035484A1 (en) 2004-09-27 2006-04-06 Mitsubishi Denki Kabushiki Kaisha Semiconductor manufacturing equipment and semiconductor manufacturing method
JP2009272464A (en) * 2008-05-08 2009-11-19 Techno Fine:Kk Sample holding mechanism
JP2010258288A (en) * 2009-04-27 2010-11-11 Sanyo Electric Co Ltd Fixture, and method of manufacturing semiconductor device using the same
JP2012004522A (en) * 2010-06-21 2012-01-05 Brewer Science Inc Method and apparatus for removing reversibly mounted device wafer from carrier substrate
US9099512B2 (en) 2008-01-24 2015-08-04 Brewer Science Inc. Article including a device wafer reversibly mountable to a carrier substrate
US9263314B2 (en) 2010-08-06 2016-02-16 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
CN110376847A (en) * 2018-04-12 2019-10-25 上海微电子装备(集团)股份有限公司 A kind of basal edge protection ring element, lithographic equipment and guard method

Cited By (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006035484A1 (en) 2004-09-27 2006-04-06 Mitsubishi Denki Kabushiki Kaisha Semiconductor manufacturing equipment and semiconductor manufacturing method
US7994067B2 (en) 2004-09-27 2011-08-09 Mitsubishi Denki Kabushiki Kaisha Semiconductor manufacturing equipment with an open-topped cassette apparatus
US9099512B2 (en) 2008-01-24 2015-08-04 Brewer Science Inc. Article including a device wafer reversibly mountable to a carrier substrate
US9111981B2 (en) 2008-01-24 2015-08-18 Brewer Science Inc. Method for reversibly mounting a device wafer to a carrier substrate
JP2009272464A (en) * 2008-05-08 2009-11-19 Techno Fine:Kk Sample holding mechanism
JP2010258288A (en) * 2009-04-27 2010-11-11 Sanyo Electric Co Ltd Fixture, and method of manufacturing semiconductor device using the same
JP2012004522A (en) * 2010-06-21 2012-01-05 Brewer Science Inc Method and apparatus for removing reversibly mounted device wafer from carrier substrate
US8852391B2 (en) 2010-06-21 2014-10-07 Brewer Science Inc. Method and apparatus for removing a reversibly mounted device wafer from a carrier substrate
US9263314B2 (en) 2010-08-06 2016-02-16 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
US9472436B2 (en) 2010-08-06 2016-10-18 Brewer Science Inc. Multiple bonding layers for thin-wafer handling
CN110376847A (en) * 2018-04-12 2019-10-25 上海微电子装备(集团)股份有限公司 A kind of basal edge protection ring element, lithographic equipment and guard method
CN110376847B (en) * 2018-04-12 2021-01-01 上海微电子装备(集团)股份有限公司 Substrate edge protection ring unit, photoetching equipment and protection method

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