CN110376847A - A kind of basal edge protection ring element, lithographic equipment and guard method - Google Patents

A kind of basal edge protection ring element, lithographic equipment and guard method Download PDF

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Publication number
CN110376847A
CN110376847A CN201810327823.3A CN201810327823A CN110376847A CN 110376847 A CN110376847 A CN 110376847A CN 201810327823 A CN201810327823 A CN 201810327823A CN 110376847 A CN110376847 A CN 110376847A
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CN
China
Prior art keywords
protection ring
unit
element
ring
basal edge
Prior art date
Application number
CN201810327823.3A
Other languages
Chinese (zh)
Inventor
蔡晨
王鑫鑫
Original Assignee
上海微电子装备(集团)股份有限公司
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Priority to CN201810327823.3A priority Critical patent/CN110376847A/en
Publication of CN110376847A publication Critical patent/CN110376847A/en

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    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials

Abstract

The invention discloses a kind of basal edge protection ring element, lithographic equipment and guard methods.It includes protection ring and protection ring pallet that basal edge, which protects ring element,;The protection ring is equipped with the first fixation member; the protection ring pallet is equipped with the second fixation member corresponding with first fixation member; when the protection ring is placed on the protection ring pallet; first fixation member and second fixation member cooperate, and the protection ring is fixed on the protection ring pallet.Basal edge provided in an embodiment of the present invention protects ring element, carries out position to protection ring and fixes, avoids protection ring that positional shift occurs in transmission process, guarantees that protection ring picking unit can accurately grab protection ring, and then ensure that and put ring precision;Simultaneously as without carrying out position alignment by hand, it is very high to put ring efficiency and equipment yield.

Description

A kind of basal edge protection ring element, lithographic equipment and guard method

Technical field

The present embodiments relate to field of semiconductor manufacture more particularly to a kind of basal edge protection ring element, photoetching to set Standby and guard method.

Background technique

There are positive photoresist exposure and negtive photoresist to expose two methods in exposing substrate technique.In order to eliminate basal edge photoresist pair The yield issues of subsequent technique pollution and generation, often select the photoresist that basal edge is removed in exposure technology.For just Glue can realize by developing after basal edge exposure technology, and for negtive photoresist, then it needs in exposure process by substrate The circle of edge one carries out blocking protection, could remove after development.

The prior art blocks basal edge using protection ring, and the negtive photoresist of basal edge is protected not exposed in exposure process Light.Protection ring is a kind of center portion hollow out, and edge is that the shading of entity shields object.Protection ring is placed on exposure by craft In light table.In the process, it needs to carry out position alignment by hand, so as to the crawl of protection ring picking unit.However ring hardly possible is put by hand To guarantee alignment precision, and ring low efficiency is put, equipment yield is not high, while improving cost of labor.

Summary of the invention

The present invention provides a kind of basal edge protection ring element, lithographic equipment and guard method, to improve putting for protection ring Ring precision, and then improve and put ring efficiency and equipment yield.

In a first aspect, the embodiment of the invention provides a kind of basal edges to protect ring element, the basal edge protection ring list Member includes:

Protection ring;

Protection ring pallet;

Protection ring is equipped with the first fixation member, and it is fixed that protection ring pallet is equipped with corresponding with the first fixation member second Component, when protection ring is placed on protection ring pallet, the first fixation member and the second fixation member cooperate, and protection ring is fixed on On protection ring pallet.

Optionally, the first fixation member includes at least one pin hole and at least one kidney slot;Second fixation member includes At least two positioning pins corresponding with pin hole and kidney slot;When protection ring is placed on protection ring pallet, each positioning pin difference With corresponding pin hole or kidney slot clearance fit, protection ring is fixed on protection ring pallet.

Optionally, the edge of protection ring is additionally provided with the first positioning element, and the edge of protection ring pallet is equipped with and the first positioning Corresponding second positioning element of component, when protection ring is fixed on protection ring pallet, the first positioning element and the second positioning region Part alignment.

Optionally, protection ring pallet is spoke-like, the solid disk including being located at protection ring tray center, and by protecting Ring tray center outwardly directed at least three spokes, the end of spoke include the support construction for carrying protection ring, are used for Carry the protection ring.

Optionally, the identification label for storage protection ring identification information is additionally provided on protection ring.

Second aspect, the embodiment of the invention also provides a kind of protection ring library units, for storing such as first party of the present invention Any basal edge in face protects ring element, comprising:

Protection ring library, protection ring library is equipped with several and sets annular space, for storing several protection rings;

Each of protection ring library, which is set, is equipped with the first positioning mechanism in annular space, the first positioning on mating protection ring The basal edge protection ring element is locked or unclamped to the second upper positioning element of component and protection ring pallet.

Optionally, the first positioning mechanism includes two first positioning bearings and movable first cylinder top tip;

First positioning bearing can be rotatable around its axis, and the first cylinder top tip can stretch back and forth under the promotion of cylinder;

When basal edge protection ring element, which is located at, to be set in annular space, the outer rim and basal edge of the first positioning bearing are protected The outer rim of ring element is tangent;First cylinder top tip cooperates the first notch and the second notch, protects for locking or unclamping basal edge Retaining ring unit.

The third aspect, the embodiment of the invention also provides a kind of lithographic equipment, which includes such as the present invention second Any protection ring library unit of aspect, the protection ring library unit is for storing as described in first aspect present invention is any Basal edge protects ring element;

It further include exposure desk unit, protection ring picking unit, manipulator unit;

Exposure desk unit, for carrying and the edge-protected ring element of holder base and substrate;

Protection ring picking unit is oppositely arranged with work stage, for crawl or release guard ring;

Manipulator unit is used to complete the basal edge protection ring element between protection ring library unit and exposure desk unit Transfer.

Optionally, protection ring library unit and/or the protection ring picking unit further include recognition unit, for reading storage The identification information of protection ring in identification label.

Optionally, manipulator unit is also used to transmit substrate.

Optionally, exposure desk unit includes exposure desk and several adsorption columns, and adsorption column is located inside exposure desk, and can hang down To movement, for completing the handover of basal edge protection ring element and substrate between exposure desk and manipulator unit.

Optionally, exposure desk unit further includes the second positioning mechanism, the first positioning element on mating protection ring and The second upper positioning element of protection ring pallet, locking or release basal edge protect ring element.

Optionally, the second positioning mechanism includes two second positioning bearings and movable second cylinder top tip;

Second positioning bearing can be rotatable around its axis, and the second cylinder top tip can stretch back and forth under the promotion of cylinder;

When basal edge protection ring element is located on exposure desk unit, the outer rim and basal edge of the second positioning bearing are protected The outer rim of retaining ring unit is tangent;Second cylinder top tip cooperates the first positioning element and the second positioning element, for locking or unclamping Basal edge protects ring element.

Optionally, protection ring picking unit includes pedestal and the gripper components on pedestal;

Gripper components include three claws equidistantly arranged along pedestal work side edge.

Fourth aspect, the embodiment of the invention also provides a kind of basal edge guard method, this method is based on the present invention the Any lithographic equipment of two aspects, this method comprises:

Manipulator unit is taken out from protection ring library unit protects ring element with the matched basal edge of substrate specifications, and passes It send to exposure desk unit;

Protection ring picking unit, which is hung down, to be moved down to handover station, grabs protection ring, and hang down and be moved upward to vertical zero-bit, Protection ring is separated with protection ring pallet;

Manipulator unit takes protection ring pallet away from exposure desk unit, and protection ring pallet is sent to protection ring library unit In;

Substrate is sent on exposure desk unit by manipulator unit;

Protection ring picking unit, which is hung down, to be moved down to handover station, and protection ring is placed in substrate.

Optionally, the basal edge guard method further include: after completion of the exposure,

Protection ring picking unit, which is hung down, to be moved down to handover station, grabs protection ring, and hang down and be moved upward to vertical zero-bit;

Manipulator unit removes substrate from exposure desk unit;

Manipulator unit takes out corresponding protection ring pallet from protection ring library unit, and is sent on exposure desk;

Protection ring picking unit, which is hung down, to be moved down to handover station, and protection ring is placed on protection ring pallet;

Manipulator unit takes basal edge protection ring element away from exposure desk unit, and basal edge is protected ring element It is sent in protection ring library unit.

Optionally, it is taken out from protection ring library unit in manipulator unit and the matched basal edge protection ring of substrate specifications It after unit, and/or hangs down and is moved down to handover station in the protection ring picking unit, when grabbing protection ring, this method is also Include:

Recognition unit reads the information of identification label storage on protection ring.

Basal edge provided in an embodiment of the present invention protects ring element, by the way that the first fixation member is arranged on protection ring, The second fixation member corresponding with the first fixation member is set on protection ring pallet, protection ring is fixed, solves hand Work puts the problem of low ring precision, low efficiency, and improve protection ring puts ring precision, and then improves and put ring efficiency and equipment yield.

Detailed description of the invention

Fig. 1 be in the embodiment of the present invention one basal edge protection ring element in protection ring schematic diagram;

Fig. 2 be in the embodiment of the present invention one basal edge protection ring element in protection ring pallet schematic diagram;

Fig. 3 is the schematic diagram of the basal edge protection ring element in the embodiment of the present invention one;

Fig. 4 is the partial cutaway view of positioning pin and pin hole matching part in Fig. 3;

Fig. 5 is the partial cutaway view of positioning pin and kidney slot matching part in Fig. 3;

Fig. 6 is the schematic diagram of protection ring library unit in the embodiment of the present invention two;

Fig. 7 is the internal structure chart in protection ring library in the embodiment of the present invention two;

Fig. 8 is the partial structure diagram of lithographic equipment in the embodiment of the present invention two;

Fig. 9 is the manipulator unit delivery basal edge protection ring element of lithographic equipment in the embodiment of the present invention two by the Schematic diagram when one recognition unit;

Figure 10 is the schematic diagram of the protection ring picking unit of lithographic equipment in the embodiment of the present invention two;

Figure 11 is that the protection ring picking unit of lithographic equipment in the embodiment of the present invention two grabs the schematic diagram after protection ring;

Figure 12 is the schematic diagram of exposure desk unit in lithographic equipment in the embodiment of the present invention two;

Figure 13 is that basal edge protection ring element is placed on exposure desk unit in lithographic equipment in the embodiment of the present invention two Schematic diagram;

Figure 14 is the flow chart for the basal edge guard method that the embodiment of the present invention three provides.

Specific embodiment

The present invention is described in further detail with reference to the accompanying drawings and examples.It is understood that this place is retouched The specific embodiment stated is used only for explaining the present invention rather than limiting the invention.It also should be noted that in order to just Only the parts related to the present invention are shown in description, attached drawing rather than entire infrastructure.

Embodiment one

The embodiment of the present invention one provides a kind of basal edge protection ring element, and Fig. 1 is the substrate in the embodiment of the present invention one The schematic diagram of protection ring in edge-protected ring element, Fig. 2 be in the embodiment of the present invention one basal edge protection ring element in protect The schematic diagram of retaining ring pallet, Fig. 3 are the schematic diagrames of the basal edge protection ring element in the embodiment of the present invention one.With reference to Fig. 1, figure 2 and Fig. 3, it includes protection ring 110 and protection ring pallet 120 that basal edge, which protects ring element 100,.Wherein, protection ring is in one kind Part hollow out is entreated, edge is that the shading of entity shields object.The outer diameter of protection ring 110 is slightly larger than the diameter of substrate, protection ring 110 Internal diameter can be the internal diameter in the region for needing to block in substrate.

Protection ring 110 is equipped with the first fixation member, and protection ring pallet 120 is equipped with corresponding with the first fixation member the Two fixation members, when protection ring 110 is placed on protection ring pallet 120, the first fixation member and the second fixation member cooperate, will Protection ring 110 is fixed on protection ring pallet 120.Wherein, the second fixation member can be pin or key, and the first fixation member can be with It is the hole cooperated with pin or key.

During putting ring, basal edge protects ring element 100 by way of either manually or mechanically, is placed to exposure After platform, protection ring picking unit drops to handover station, grabs protection ring 110 and rises to zero-bit, protection ring 110 and protection ring Pallet 120 separates;Protection ring pallet 120 is removed from exposure desk, and substrate is sent to exposure desk, protection ring crawl by manipulator Unit drops to handover station, and protection ring 110 is placed in substrate, is blocked to basal edge;Substrate and protection ring 110 After being exposed platform fixing, start exposure technology.

During basal edge protection ring element 100 is placed to exposure desk, protection ring 110 is fixed on protection ring On pallet 120, the position of protection ring 110 is avoided to shift, guarantees that protection ring picking unit can accurately grab protection ring 110, and then ensure that protection ring 110 can be refined is placed in substrate, basal edge is covered;Simultaneously as It is very high to put ring efficiency and equipment yield without carrying out position alignment by hand.

The basal edge protection ring element that the embodiment of the present invention one provides passes through the first fixation member on protection ring and guarantor The cooperation of the second fixation member on retaining ring pallet carries out position to protection ring and fixes, protection ring is avoided to send out in transmission process Raw positional shift guarantees that protection ring picking unit can accurately grab protection ring, and then ensure that protection ring can be refined Be placed in substrate, basal edge is covered;Simultaneously as without carrying out position alignment by hand, it is very high to put ring effect Rate and equipment yield.

Optionally, the first fixation member includes at least one pin hole and at least one kidney slot;Second fixation member includes At least two positioning pins corresponding with pin hole and kidney slot;When protection ring is placed on protection ring pallet, each positioning pin difference With corresponding pin hole or kidney slot clearance fit, protection ring is fixed on protection ring pallet.Illustratively, with reference to Fig. 1, Fig. 2 And Fig. 3, the first fixation member includes a pin hole 111 and a kidney slot 112, the second fixation member include and pin hole and kidney-shaped Corresponding two positioning pins 121 in hole.Fig. 4 is the partial cutaway view of positioning pin and pin hole matching part in Fig. 3, and Fig. 5 is fixed in Fig. 3 The partial cutaway view of position pin and kidney slot matching part.With reference to Fig. 4 and Fig. 5, optionally, the head of positioning pin 121 is taper, is used In guiding, convenient for protection ring 110 and protection ring pallet 120 combination or separate.Kidney slot 112 is convenient in protection ring 110 and is protected In the cohesive process of retaining ring pallet 120, the mutual alignment of the two is adjusted, so as to protection ring 110 and protection ring pallet 120 In conjunction with more smoothly.

Optionally, the edge of protection ring is additionally provided with the first positioning element, and the edge of protection ring pallet is equipped with and described first Corresponding second positioning element of positioning element, the first positioning element and the second positioning element can be notch, with reference to Fig. 1, Fig. 2 and Fig. 3, the edge of protection ring 110 are additionally provided with the first notch, and the edge of protection ring pallet 120 is equipped with corresponding with the first notch second Notch, when protection ring 110 is fixed on protection ring pallet 120, the first notch and the alignment of the second notch.When basal edge is protected When ring element 100 is placed on exposure desk, the positioning mechanism on exposure desk cooperates the first notch and the second notch, protects to basal edge Retaining ring unit 100 is fixed, and prevents basal edge protection ring element 100 from positional shift occurs, guarantees protection ring picking unit Protection ring 110 can accurately be grabbed.

With continued reference to Fig. 2, optionally, protection ring pallet 120 is spoke-like, including being located at 120 center of protection ring pallet Solid disk, and by outwardly directed three spokes of protection ring tray center, the end of spoke includes for carrying protection ring 110 plummer.Illustratively, the angle of adjacent two spokes is 120 °, and two positioning pins 121 are located at two of them and hold On microscope carrier, the second notch is located at the edge of another plummer.

Optionally, the identification label for storage protection ring identification information is additionally provided on protection ring 110.Specific identification letter Breath may include the identification id and specification information of protection ring 110, and corresponding recognition unit can be arranged in the lithographic apparatus, read The identification id and specification information stored in identification label, the service condition of real-time tracking protection ring.

Embodiment two

Second embodiment of the present invention provides a kind of protection ring library unit, Fig. 6 is protection ring library unit in the embodiment of the present invention two Schematic diagram, for storing such as basal edge protection ring element any described in the embodiment of the present invention one, protection ring library unit 200 include:

Protection ring library 220, protection ring library 220 is equipped with several and sets annular space, for storing several protection rings 110.Its In, several protection rings 110 can be same specification, be also possible to different specification size.Different protection rings, outer diameter and Shape is identical, and internal diameter is the internal diameter in the region for needing to block in substrate.Illustratively, with continued reference to Fig. 6, protection ring library 220 is wrapped Several layers are included, every layer is set annular space for one.

Fig. 7 is the internal structure chart in protection ring library in lithographic equipment in the embodiment of the present invention two, as shown in fig. 7, protection ring Each of library 220, which is set, is equipped with the first positioning mechanism, the first positioning element and guarantor on mating protection ring 110 in annular space The basal edge protection ring element 100 is locked or unclamped to the second upper positioning element of retaining ring pallet 120.Specifically, first Positioning mechanism includes two first positioning bearings 221 and movable first cylinder top tip 222;First positioning bearing 221 can Rotatable around its axis, the first cylinder top tip 222 can stretch back and forth under the promotion of cylinder;When basal edge protects ring element 100 Positioned at when setting in annular space, the outer rim of the first positioning bearing 221 and the outer rim of basal edge protection ring element 100 are tangent;First Cylinder top tip 222 cooperates the first notch and the second notch, for locking or unclamping basal edge protection ring element 100.

Specifically, when needing a certain set from protection ring library 220 to take out basal edge protection ring element 100 in annular space When, this sets the release of the first cylinder top tip 222 in annular space, sets from this and takes out basal edge protection ring element 100 in annular space; After protection ring pallet 120 or the basal edge protection feeding of ring element 100 are set annular space, the locking of the first cylinder top tip 222, top Tight first notch and the second notch cooperate two first positioning bearings 221, and basal edge is protected ring element 100 or protection ring Pallet 120 is locked and is fixed on and sets in annular space.Wherein, the first positioning bearing 221 can be rotatable around its axis, basal edge protection Ring element 100 or protection ring pallet 120 be admitted to set annular space or locking when, avoid occurring directly with the first positioning bearing 221 Collision is connect, buffer function is played.

Protection ring library unit provided by Embodiment 2 of the present invention, for storing any substrate of the embodiment of the present invention one Edge-protected ring element, by the way that the first positioning mechanism is arranged in annular space in setting for protection ring library, first on mating protection ring The second upper positioning element of positioning element and protection ring pallet carries out position to basal edge protection ring element and fixes, guarantees The accuracy of initial position when basal edge protection ring element is transferred to exposure desk, so that protection ring picking unit being capable of essence Quasi- crawl protection ring, and then ensure that protection ring can be refined is placed in substrate, basal edge is covered;Together When, it is very high to put ring efficiency and equipment yield due to without carrying out position alignment by hand.

Embodiment three

The embodiment of the present invention three provides a kind of lithographic equipment, and Fig. 8 is the part knot of lithographic equipment in the embodiment of the present invention two Structure schematic diagram, as shown in figure 8, the lithographic equipment includes the protection ring library unit 200 as described in the embodiment of the present invention two is any;

It further include exposure desk unit 300, protection ring picking unit 400, manipulator unit 500;

Exposure desk unit 300 is located in the work stage 301 of lithographic equipment, for carrying and the edge-protected ring list of holder base Member 100 and substrate;

Protection ring picking unit 400 is oppositely arranged with work stage 301, for crawl or release guard ring 110;

Manipulator unit 500 is protected for completing the basal edge between protection ring library unit 200 and exposure desk unit 300 The transfer of ring element 100.

Specifically, manipulator unit 500 is taken out from protection ring library unit 200 advises with containing suitable during putting ring The basal edge of lattice size protection ring 110 protects ring element 100, and is placed on exposure desk unit 300, exposure desk unit 300 Basal edge protection ring element 100 is held;Protection ring picking unit 400 is vertical to drop to handover station, exposure desk list Member 300, which releases, acts on the fixing of basal edge protection ring element 100, and protection ring picking unit 400 grabs protection ring, and vertical Zero-bit is risen to, protection ring 110 is separated with protection ring pallet 120;Manipulator unit 500 takes protection ring pallet away from exposure desk 120, and it is sent to position original in protection ring library unit 200;Substrate is transferred on exposure desk unit 300, exposure desk list First 300 pairs of substrates are held;Protection ring picking unit 400 is vertical to drop to handover station, and protection ring 110 is placed on substrate On, basal edge is blocked;After exposure desk unit 300 holds substrate and protection ring 110, lithographic equipment is to substrate Exposure.

During lower ring, after completing exposure, protection ring picking unit 400 is vertical to drop to handover station, and exposure desk is set Standby release acts on the fixing of substrate and protection ring 110, and protection ring picking unit 400 grabs protection ring 110, and rises to zero Position;Substrate is removed, and is sent into next process, or is sent into substrate library;Manipulator unit 500 is from protection ring library unit Protection ring pallet 120 corresponding with the protection ring 110 is taken out in 200, is placed on exposure desk unit 300;Protection ring crawl is single Member 400 is vertical to drop to handover station, and protection ring 110 is placed on protection ring pallet 120;Manipulator unit 500 is from exposure It takes basal edge protection ring element 100 on platform unit away, and is sent into position original in protection ring library unit.

The lithographic equipment that the embodiment of the present invention three provides, by setting for storing as described in the embodiment of the present invention one is any Basal edge protection ring element protection ring library unit, using mechanism existing in lithographic equipment, such as manipulator unit and guarantor Retaining ring picking unit realizes the function of putting ring and lower ring automatically, the photoetching of raising under the premise of other mechanisms of not additional The production efficiency of equipment, has saved cost of labor;Meanwhile protection ring pallet carries out position to protection ring and fixes, and avoids protection ring Positional shift occurs in transmission process, guarantees that protection ring picking unit can accurately grab protection ring, and then ensure that guarantor What retaining ring can be refined is placed in substrate;Simultaneously as without carrying out position alignment by hand, it is very high to put ring efficiency and set Standby yield.

Optionally, protection ring library unit 200 and/or protection ring picking unit 400 further include recognition unit, are deposited for reading Store up the identification information of the protection ring in the identification label.Illustratively, the first recognition unit 210 is radio frequency identification read-write Head is mounted on the protection ring library 220 of protection ring library unit 200;Identification label is RFID tag, is stored with the protection ring 110 identification id and specification information.It should be noted that the first recognition unit 210 is also possible to dimensional code scanner, accordingly , identification label is two dimensional code.Fig. 9 is the manipulator unit delivery basal edge protection of lithographic equipment in the embodiment of the present invention two Ring element passes through schematic diagram when the first recognition unit, and with reference to Fig. 9, manipulator unit 500 is taken out from protection ring library unit 200 Basal edge protects ring element 100, and passes through the first recognition unit 210, and the first recognition unit 210 is read on protection ring 110 Identify the identification id and specification information of the protection ring 110 of tag memory storage.

Optionally, protection ring picking unit 400 further includes the second recognition unit 410, is stored in identification label for reading The identification information of interior protection ring 110.Second recognition unit 410 can be radio frequency identification read-write head, identify label for radio frequency knowledge Distinguishing label;Alternatively, the second recognition unit 410 is also possible to dimensional code scanner, correspondingly, identification label is two dimensional code.Figure 10 It is the schematic diagram of the protection ring picking unit of lithographic equipment in the embodiment of the present invention two, Figure 11 is photoetching in the embodiment of the present invention two The protection ring picking unit of equipment grabs the schematic diagram after protection ring, and with reference to Figure 10 and Figure 11, the second recognition unit 410 is located at On the pedestal of protection ring picking unit 400, after protection ring picking unit 400 grabs protection ring 110, the second recognition unit 410 Read the identification id and specification information of the protection ring 110 of the identification tag memory storage on protection ring 110.

Optionally, manipulator unit 500 is also used to transmit substrate.Manipulator unit 500 is applied not only to transmission substrate, also uses In transmission basal edge protection ring element 100 and protection ring pallet 110, the utilization rate of manipulator unit 500 is improved.

Figure 12 is the schematic diagram of exposure desk unit in lithographic equipment in the embodiment of the present invention two, and Figure 13 is the embodiment of the present invention Basal edge protection ring element is placed in the schematic diagram on exposure desk unit in lithographic equipment in two, optionally, with reference to Figure 12 and figure 13, exposure desk unit 300 includes exposure desk 310 and three adsorption columns 320, and adsorption column 320 is located inside exposure desk 310, and can Catenary motion, for completing between exposure desk 310 and manipulator unit 500 basal edge protection ring element 100 and substrate Handover.Specifically, manipulator unit 500 delivers basal edge protection ring element 100, protection ring pallet 110 or substrate to handover Station, adsorption column 320 rise, prominent 310 surface of exposure desk;Basal edge is protected ring element 100, protected by manipulator unit 500 Retaining ring pallet 110 or substrate are placed on adsorption column 320;The edge-protected ring element 100 of 320 absorbable substrate of adsorption column, protection ring Pallet 110 or substrate, and decline, protect ring element 100, protection ring pallet 110 or substrate to be placed on exposure desk basal edge On 310.Opposite, it is needing to protect ring element 100, protection ring pallet 110 or substrate to move up from exposure desk 310 basal edge When walking, adsorption column 320 rises, prominent 310 surface of exposure desk, by basal edge protect ring element 100, protection ring pallet 110 or Substrate jacks up, and desorbs effect;Manipulator unit 500 takes basal edge protection ring element 100, protection ring pallet 110 away Or substrate.

2 and Figure 13 are continued to refer to figure 1, exposure desk unit 300 further includes the second positioning mechanism, is used for mating protection ring 110 On the first positioning element and protection ring pallet the second upper positioning element, locking or unclamp basal edge protect ring element 100.Optionally, the second positioning mechanism includes two second positioning bearing (not shown)s and movable second cylinder top Needle 340;Second positioning bearing can be rotatable around its axis, and the second cylinder top tip 340 can stretch back and forth under the promotion of cylinder;Work as base When feather edge protection ring element 100 is located on exposure desk unit 300, the outer rim and basal edge protection ring list of the second positioning bearing The outer rim of member 100 is tangent;Second cylinder top tip 340 cooperates the first notch and the second notch, for locking or unclamping basal edge Protect ring element 100.

Specifically, when basal edge protection ring element 100 is placed on exposure desk 310, the second cylinder top tip 340 lock Tightly, the first notch and the second notch are held out against, two second positioning bearings are cooperated, simultaneously by the locking of basal edge protection ring element 100 It is fixed on exposure desk 310;When needing to remove basal edge protection ring element 100 from exposure desk unit 300, the second gas Cylinder thimble 340 unclamps, and adsorption column 320 rises, prominent 310 surface of exposure desk, and basal edge protection ring element 100 is jacked up, and Desorb effect;Manipulator unit 500 takes basal edge protection ring element 100 away.

Optionally, 0 and Figure 11 are continued to refer to figure 1, protection ring picking unit 400 includes pedestal 420 and is located on pedestal Gripper components 430;Gripper components 430 include three claws equidistantly arranged along pedestal work side edge.Illustratively, three The line of claw constitutes an equilateral triangle, and the edge of protection ring 110 is equipped with groove corresponding with claw, grabs convenient for claw.

Example IV

The embodiment of the present invention three provides a kind of basal edge guard method, and Figure 14 is the substrate that the embodiment of the present invention three provides The flow chart of edge-protected method, this method is based on any lithographic equipment of the embodiment of the present invention two, illustratively, reference Figure 14, in one of the embodiments, this method comprises:

S10: manipulator unit 500 is taken out from protection ring library unit 200 to be protected with the matched basal edge of substrate specifications Ring element 100, and be sent on exposure desk unit 300.

Specifically, a certain the first cylinder top tip 222 set in annular space unclamps in protection ring library 220, manipulator unit 500 It is set from this and takes out basal edge protection ring element 100 in annular space;Manipulator unit 500 delivers basal edge and protects ring element 100 rise to handover station, adsorption column 320, protrude 310 surface of exposure desk;Manipulator unit 500 is by basal edge protection ring list Member 100 is placed on adsorption column 320;The edge-protected ring element 100 of 320 absorbable substrate of adsorption column, and decline, basal edge is protected Retaining ring unit 100 is placed on exposure desk 310.Exposure desk unit 300 holds basal edge protection ring element 100.Tool Body, after basal edge protection ring element 100 is placed on exposure desk 310, the locking of the second cylinder top tip 340 holds out against first Notch and the second notch cooperate two second positioning bearings, and basal edge protection ring element 100 is locked and is fixed on exposure desk On 310.

S11: protection ring picking unit 400, which is hung down, to be moved down to handover station, grabs protection ring 110, and hang down and move up To vertical zero-bit, protection ring 110 is separated with protection ring pallet 120.

It moves down specifically, protection ring picking unit 400 is hung down to handover station, exposure desk unit 300 is released to substrate The fixing of edge-protected ring element 100 acts on, specifically, the second cylinder top tip 340 unclamps, protection ring picking unit 400 passes through Gripper components 430 grab protection ring 110, and hang down and be moved upward to vertical zero-bit, divide protection ring 110 with protection ring pallet 120 From.

S12: manipulator unit 500 takes protection ring pallet 120 away from exposure desk unit 300, and protection ring pallet 120 is passed It send into protection ring library unit 200.

Specifically, the adsorption column 320 of exposure desk unit 300 rises, prominent 310 surface of exposure desk, by protection ring pallet 120 It jacks up, and desorbs effect;Manipulator unit 500 takes protection ring pallet 120 away, and is sent in protection ring library 220 corresponding Set in annular space;The locking of first cylinder top tip 222, holds out against the first notch and the second notch, cooperates two first positioning bearings 221, protection ring pallet 120 is locked and is fixed on and is set in annular space.

S13: substrate is sent on exposure desk unit 300 by manipulator unit 500.

Rise specifically, manipulator unit 500 delivers substrate to station, adsorption column 320 is joined, prominent 310 table of exposure desk Face;Manipulator unit 500 places the substrate above on adsorption column 320;320 absorbable substrate of adsorption column, and decline, it places the substrate above On exposure desk 310.

S14: protection ring picking unit 400, which is hung down, to be moved down to handover station, and protection ring 110 is placed in substrate.

It moves down specifically, protection ring picking unit 400 is hung down to handover station, 430 release guard ring of gripper components 110, protection ring 110 is placed in substrate, basal edge is blocked;The second cylinder top tip in exposure desk unit 300 340 lockings, hold out against the first notch and the second notch, cooperate two second positioning bearings, by substrate and the locking of protection ring 110 and admittedly It is scheduled on exposure desk 310;Lithographic equipment starts to be exposed substrate.

The basal edge guard method that the embodiment of the present invention four provides, by being arranged for storing basal edge protection ring list The protection ring library unit of member, using mechanism existing in lithographic equipment, such as manipulator unit and protection ring picking unit, in not volume Under the premise of adding other mechanisms outside, realize that the function of putting ring automatically, the production efficiency of the lithographic equipment of raising have been saved artificial Cost;Meanwhile protection ring pallet carries out position to protection ring and fixes, and avoids protection ring that positional shift occurs in transmission process, Guarantee that protection ring picking unit can accurately grab protection ring, and then ensure that protection ring can be refined is placed on substrate On;Simultaneously as without carrying out position alignment by hand, it is very high to put ring efficiency and equipment yield.

Optionally, 4 are continued to refer to figure 1, the basal edge guard method further include: after completion of the exposure,

S15: protection ring picking unit 400, which is hung down, to be moved down to handover station, grabs protection ring 110, and hang down and move up To vertical zero-bit.

Specifically, protection ring picking unit 400 is hung down and is moved down to handover station, the second gas in exposure desk unit 300 Cylinder thimble 340 unclamp, protection ring picking unit 400 by gripper components 430 grab protection ring 110, and hang down be moved upward to it is vertical To zero-bit.

S16: manipulator unit 500 removes substrate from exposure desk unit 300.

Specifically, the adsorption column 320 of exposure desk unit 300 rises, prominent 310 surface of exposure desk will be protected substrate and be jacked up, and Desorb effect;Manipulator unit 500 takes substrate away, and is sent into substrate library or is sent into next process.

S17: manipulator unit 500 takes out corresponding protection ring pallet 120 from protection ring library unit 200, and is sent to On exposure desk unit 300.

Specifically, corresponding the first cylinder top tip 222 set in annular space unclamps in protection ring library 220, manipulator unit 500 set taking-up protection ring pallet 120 in annular space from this;Manipulator unit 500 deliver protection ring pallet 120 to handover station, Adsorption column 320 rises, prominent 310 surface of exposure desk;Protection ring pallet 120 is placed on adsorption column 320 by manipulator unit 500 On, adsorption column 320 adsorbs protection ring pallet 120.

S18: protection ring picking unit 400, which is hung down, to be moved down to handover station, and protection ring 110 is placed on protection ring pallet On 120.

It moves down specifically, protection ring picking unit 400 is hung down to handover station, 430 release guard ring of gripper components 110, protection ring 110 is placed on protection ring pallet 120, protection ring 110 is combined with protection ring pallet 120.

S19: manipulator unit 500 takes basal edge protection ring element 100 away from exposure desk unit 300, and by substrate Edge-protected ring element is sent in protection ring library unit 200.

Specifically, adsorption column 320 releases suction-operated to protection ring pallet 120, manipulator unit 500 is from exposure desk list It takes basal edge protection ring element 100 in member 300 away, and is sent to corresponding in protection ring library 220 set in annular space;First gas Cylinder thimble 222 is locked, and the first notch and the second notch are held out against, and cooperates two first positioning bearings 221, by basal edge protection ring Unit 100 is locked and is fixed on and sets in annular space.

The basal edge guard method of the present embodiment, can be realized the function of putting ring and lower ring automatically, and the photoetching of raising is set The utilization rate of standby production efficiency and litho machine inner part, has saved cost of labor;Meanwhile protection ring pallet carries out protection ring Position is fixed, and avoids protection ring that positional shift occurs in transmission process, guarantees that protection ring picking unit can be grabbed accurately Protection ring, and then ensure that protection ring can be refined is placed in substrate.

Optionally, in step S10: manipulator unit 500 is taken out matched with substrate specifications from protection ring library unit 200 After basal edge protects ring element 100, this method further include:

Manipulator unit 500 delivers basal edge and ring element 100 to protection ring is protected to identify station, is located at protection ring library The first recognition unit 210 on 220 reads the identification information of identification label storage on protection ring 110.

In step S11: protection ring picking unit 400, which is hung down, to be moved down to handover station, when grabbing protection ring 110, the party Method further include:

The second recognition unit 410 on the pedestal 420 of protection ring picking unit 400 reads and identifies on protection ring 110 The identification information of label storage.

The lithographic equipment of the present embodiment is read by the first recognition unit and the second recognition unit and is protected during putting ring The identification information that tag memory storage is identified on retaining ring, implements the service condition of track protection ring, the protection being such as being currently used The sequence number and specification of ring, realize the intelligence of lithographic equipment.

Note that the above is only a better embodiment of the present invention and the applied technical principle.It will be appreciated by those skilled in the art that The invention is not limited to the specific embodiments described herein, be able to carry out for a person skilled in the art it is various it is apparent variation, It readjusts and substitutes without departing from protection scope of the present invention.Therefore, although being carried out by above embodiments to the present invention It is described in further detail, but the present invention is not limited to the above embodiments only, without departing from the inventive concept, also It may include more other equivalent embodiments, and the scope of the invention is determined by the scope of the appended claims.

Claims (17)

1. a kind of basal edge protects ring element characterized by comprising
Protection ring;
Protection ring pallet;
The protection ring is equipped with the first fixation member, and the protection ring pallet is equipped with corresponding with first fixation member Second fixation member, when the protection ring is placed on the protection ring pallet, first fixation member is solid with described second Determine component cooperation, the protection ring is fixed on the protection ring pallet.
2. basal edge according to claim 1 protects ring element, which is characterized in that first fixation member includes extremely A few pin hole and at least one kidney slot;Second fixation member includes corresponding with the pin hole and kidney slot at least two A positioning pin;When the protection ring is placed on the protection ring pallet, each positioning pin respectively with corresponding pin hole or The protection ring is fixed on the protection ring pallet by kidney slot clearance fit.
3. basal edge according to claim 1 protects ring element, which is characterized in that the edge of the protection ring is additionally provided with The edge of first positioning element, the protection ring pallet is equipped with the second positioning element corresponding with first positioning element, when When the protection ring is fixed on the protection ring pallet, first positioning element and second positioning element alignment.
4. basal edge according to claim 1 protects ring element, which is characterized in that the protection ring pallet is spoke Shape, the solid disk including being located at the protection ring tray center, and it is outwardly directed extremely by the protection ring tray center Few three spokes, the end of the spoke includes the support construction for carrying protection ring, for carrying the protection ring.
5. basal edge according to claim 1 protects ring element, which is characterized in that be additionally provided with and be used on the protection ring Store the identification label of the protection ring identification information.
6. a kind of protection ring library unit, which is characterized in that for storing basal edge protection a method as claimed in any one of claims 1 to 5 Ring element, comprising:
Protection ring library, the protection ring library is equipped with several and sets annular space, for storing several protection rings;
Each of the protection ring library, which is set, is equipped with the first positioning mechanism in annular space, the first positioning on mating protection ring The basal edge protection ring element is locked or unclamped to the second upper positioning element of component and protection ring pallet.
7. protection ring library unit according to claim 6, which is characterized in that first positioning mechanism includes two first Position bearing and movable first cylinder top tip;
The first positioning bearing can be rotatable around its axis, and first cylinder top tip can stretch back and forth under the promotion of cylinder;
When basal edge protection ring element is located at described set in annular space, the outer rim and substrate of the first positioning bearing The outer rim of edge-protected ring element is tangent;First cylinder top tip cooperates first positioning element and the second positioning element, For locking or unclamping the basal edge protection ring element.
8. a kind of lithographic equipment, which is characterized in that including the protection ring library unit as described in claim 6 or 7 is any, the guarantor Retaining ring library unit is for storing basal edge protection ring element a method as claimed in any one of claims 1 to 5;
It further include exposure desk unit, protection ring picking unit, manipulator unit;
The exposure desk unit is for carrying and holding the basal edge protection ring element and substrate;
The protection ring picking unit is oppositely arranged with the exposure desk unit, for grabbing or discharging the protection ring;
The manipulator unit is for completing the basal edge protection ring list between the protection ring library unit and exposure desk unit The transfer of member.
9. lithographic equipment according to claim 8, which is characterized in that the protection ring library unit and/or the protection ring Picking unit further includes recognition unit, for reading the identification information for the protection ring being stored in the identification label.
10. lithographic equipment according to claim 8, which is characterized in that the manipulator unit is also used to transmit substrate.
11. lithographic equipment according to claim 8, which is characterized in that the exposure desk unit includes exposure desk and several A adsorption column, the adsorption column are located inside exposure desk, and can catenary motion, for complete in the exposure desk and manipulator list The handover of basal edge protection ring element and substrate between member.
12. lithographic equipment according to claim 8, which is characterized in that the exposure desk unit further includes the second localization machine Structure, the second upper positioning element of the first positioning element and protection ring pallet on mating protection ring, locking or release institute State basal edge protection ring element.
13. lithographic equipment according to claim 12, which is characterized in that second positioning mechanism includes two second fixed Position bearing and movable second cylinder top tip;
The second positioning bearing can be rotatable around its axis, and second cylinder top tip can stretch back and forth under the promotion of cylinder;
When basal edge protection ring element is located on the exposure desk unit, the outer rim and base of the second positioning bearing Feather edge protects the outer rim of ring element tangent;Second cylinder top tip cooperates first positioning element and the second positioning region Part, for locking or unclamping the basal edge protection ring element.
14. lithographic equipment according to claim 8, which is characterized in that the protection ring picking unit include pedestal and Gripper components on pedestal;
The gripper components include three claws equidistantly arranged along pedestal work side edge.
15. a kind of basal edge guard method based on the lithographic equipment as described in claim 8-14 is any, which is characterized in that Include:
Manipulator unit is taken out from protection ring library unit protects ring element with the matched basal edge of substrate specifications, and is sent to On exposure desk unit;
Protection ring picking unit, which is hung down, to be moved down to handover station, is grabbed protection ring, and hang down and be moved upward to vertical zero-bit, is protected Ring is separated with protection ring pallet;
Manipulator unit takes protection ring pallet away from exposure desk unit, and protection ring pallet is sent in protection ring library unit;
Substrate is sent on exposure desk unit by manipulator unit;
Protection ring picking unit, which is hung down, to be moved down to handover station, and protection ring is placed in substrate.
16. basal edge guard method according to claim 15, which is characterized in that further include: after completion of the exposure,
Protection ring picking unit, which is hung down, to be moved down to handover station, grabs protection ring, and hang down and be moved upward to vertical zero-bit;
Manipulator unit removes substrate from exposure desk unit;
Manipulator unit takes out corresponding protection ring pallet from protection ring library unit, and is sent on exposure desk;
Protection ring picking unit, which is hung down, to be moved down to handover station, and protection ring is placed on protection ring pallet;
Manipulator unit takes basal edge protection ring element away from exposure desk unit, and basal edge protection ring element is transmitted Into protection ring library unit.
17. basal edge guard method according to claim 15, which is characterized in that
The manipulator unit taken out from protection ring library unit with substrate specifications matched basal edge protection ring element it Afterwards, and/or the protection ring picking unit hang down move down to handover station, grab protection ring when, the method also includes:
Recognition unit reads the identification information of identification label storage on protection ring.
CN201810327823.3A 2018-04-12 2018-04-12 A kind of basal edge protection ring element, lithographic equipment and guard method CN110376847A (en)

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Application Number Priority Date Filing Date Title
CN201810327823.3A CN110376847A (en) 2018-04-12 2018-04-12 A kind of basal edge protection ring element, lithographic equipment and guard method

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Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002237516A (en) * 2001-02-07 2002-08-23 Seiko Epson Corp Wafer protective case
JP2008004875A (en) * 2006-06-26 2008-01-10 Dainippon Screen Mfg Co Ltd Wafer edge face protective device
CN101359614A (en) * 2007-08-01 2009-02-04 和舰科技(苏州)有限公司 Improved standard type bearing strip pinching tool
CN101487990A (en) * 2009-02-27 2009-07-22 上海微电子装备有限公司 Work piece bench with edge exposure protection
CN101946302A (en) * 2008-02-15 2011-01-12 应用材料股份有限公司 Millisecond annealing (DSA) edge-protected
CN102012639A (en) * 2009-09-04 2011-04-13 上海微电子装备有限公司 Method and device for protecting silicon wafer edge
WO2014055582A1 (en) * 2012-10-05 2014-04-10 Rudolph Technologies, Inc. Multiple-blade device for substrate edge protection during photolithography

Patent Citations (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002237516A (en) * 2001-02-07 2002-08-23 Seiko Epson Corp Wafer protective case
JP2008004875A (en) * 2006-06-26 2008-01-10 Dainippon Screen Mfg Co Ltd Wafer edge face protective device
CN101359614A (en) * 2007-08-01 2009-02-04 和舰科技(苏州)有限公司 Improved standard type bearing strip pinching tool
CN101946302A (en) * 2008-02-15 2011-01-12 应用材料股份有限公司 Millisecond annealing (DSA) edge-protected
CN101487990A (en) * 2009-02-27 2009-07-22 上海微电子装备有限公司 Work piece bench with edge exposure protection
CN102012639A (en) * 2009-09-04 2011-04-13 上海微电子装备有限公司 Method and device for protecting silicon wafer edge
WO2014055582A1 (en) * 2012-10-05 2014-04-10 Rudolph Technologies, Inc. Multiple-blade device for substrate edge protection during photolithography

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