JP2002210730A5 - - Google Patents

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Publication number
JP2002210730A5
JP2002210730A5 JP2001012372A JP2001012372A JP2002210730A5 JP 2002210730 A5 JP2002210730 A5 JP 2002210730A5 JP 2001012372 A JP2001012372 A JP 2001012372A JP 2001012372 A JP2001012372 A JP 2001012372A JP 2002210730 A5 JP2002210730 A5 JP 2002210730A5
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JP
Japan
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JP2001012372A
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Japanese (ja)
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JP4880820B2 (ja
JP2002210730A (ja
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Publication of JP2002210730A5 publication Critical patent/JP2002210730A5/ja
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JP2001012372A 2001-01-19 2001-01-19 レーザ支援加工方法 Expired - Lifetime JP4880820B2 (ja)

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JP2001012372A JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001012372A JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

Publications (3)

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JP2002210730A JP2002210730A (ja) 2002-07-30
JP2002210730A5 true JP2002210730A5 (https=) 2008-04-10
JP4880820B2 JP4880820B2 (ja) 2012-02-22

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JP2001012372A Expired - Lifetime JP4880820B2 (ja) 2001-01-19 2001-01-19 レーザ支援加工方法

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JP5693074B2 (ja) 2010-07-26 2015-04-01 浜松ホトニクス株式会社 レーザ加工方法
JP5653110B2 (ja) 2010-07-26 2015-01-14 浜松ホトニクス株式会社 チップの製造方法
JP5702556B2 (ja) 2010-07-26 2015-04-15 浜松ホトニクス株式会社 レーザ加工方法
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JP5574866B2 (ja) 2010-07-26 2014-08-20 浜松ホトニクス株式会社 レーザ加工方法
JP5530522B2 (ja) 2010-07-26 2014-06-25 浜松ホトニクス株式会社 半導体デバイスの製造方法
KR102000031B1 (ko) 2010-07-26 2019-07-15 하마마츠 포토닉스 가부시키가이샤 레이저 가공 방법
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CN103212822B (zh) * 2012-01-19 2016-07-06 昆山思拓机器有限公司 全自动smt模板切割及检测一体化系统切割及检测方法
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CN103111762B (zh) * 2013-01-29 2015-12-09 无锡鼎晶光电科技有限公司 一种将激光打孔应用于蓝宝石片打孔的方法
EP2781296B1 (de) 2013-03-21 2020-10-21 Corning Laser Technologies GmbH Vorrichtung und verfahren zum ausschneiden von konturen aus flächigen substraten mittels laser
JP6157245B2 (ja) * 2013-07-01 2017-07-05 三菱電機株式会社 レーザ加工装置およびレーザ光軸調整方法
US10442719B2 (en) 2013-12-17 2019-10-15 Corning Incorporated Edge chamfering methods
US11556039B2 (en) 2013-12-17 2023-01-17 Corning Incorporated Electrochromic coated glass articles and methods for laser processing the same
US9815730B2 (en) 2013-12-17 2017-11-14 Corning Incorporated Processing 3D shaped transparent brittle substrate
US9850160B2 (en) 2013-12-17 2017-12-26 Corning Incorporated Laser cutting of display glass compositions
US10293436B2 (en) 2013-12-17 2019-05-21 Corning Incorporated Method for rapid laser drilling of holes in glass and products made therefrom
US20150165560A1 (en) 2013-12-17 2015-06-18 Corning Incorporated Laser processing of slots and holes
US9701563B2 (en) 2013-12-17 2017-07-11 Corning Incorporated Laser cut composite glass article and method of cutting
US9676167B2 (en) 2013-12-17 2017-06-13 Corning Incorporated Laser processing of sapphire substrate and related applications
JP2015150609A (ja) 2014-02-18 2015-08-24 アイシン精機株式会社 レーザ加工方法
TWI730945B (zh) 2014-07-08 2021-06-21 美商康寧公司 用於雷射處理材料的方法與設備
KR20170028943A (ko) 2014-07-14 2017-03-14 코닝 인코포레이티드 조정가능한 레이저 빔 촛점 라인을 사용하여 투명한 재료를 처리하는 방법 및 시스템
WO2016010949A1 (en) 2014-07-14 2016-01-21 Corning Incorporated Method and system for forming perforations
EP3169479B1 (en) 2014-07-14 2019-10-02 Corning Incorporated Method of and system for arresting incident crack propagation in a transparent material
CN107073641B (zh) 2014-07-14 2020-11-10 康宁股份有限公司 接口块;用于使用这种接口块切割在波长范围内透明的衬底的系统和方法
KR20170044143A (ko) 2014-09-16 2017-04-24 엘피케이에프 레이저 앤드 일렉트로닉스 악티엔게젤샤프트 판 모양의 작업물 안으로 적어도 하나의 컷아웃부 또는 구멍을 도입하기 위한 방법
US10047001B2 (en) 2014-12-04 2018-08-14 Corning Incorporated Glass cutting systems and methods using non-diffracting laser beams
CN107406293A (zh) 2015-01-12 2017-11-28 康宁股份有限公司 使用多光子吸收方法来对经热回火的基板进行激光切割
US11773004B2 (en) 2015-03-24 2023-10-03 Corning Incorporated Laser cutting and processing of display glass compositions
KR20170131638A (ko) 2015-03-27 2017-11-29 코닝 인코포레이티드 가스 투과성 유리창 및 이의 제작방법
WO2017011296A1 (en) 2015-07-10 2017-01-19 Corning Incorporated Methods of continuous fabrication of holes in flexible substrate sheets and products relating to the same
JP6938543B2 (ja) 2016-05-06 2021-09-22 コーニング インコーポレイテッド 透明基板からの、輪郭設定された形状のレーザ切断及び取り外し
US10410883B2 (en) 2016-06-01 2019-09-10 Corning Incorporated Articles and methods of forming vias in substrates
US10794679B2 (en) 2016-06-29 2020-10-06 Corning Incorporated Method and system for measuring geometric parameters of through holes
KR20190035805A (ko) 2016-07-29 2019-04-03 코닝 인코포레이티드 레이저 처리를 위한 장치 및 방법
KR102423775B1 (ko) 2016-08-30 2022-07-22 코닝 인코포레이티드 투명 재료의 레이저 가공
US10730783B2 (en) 2016-09-30 2020-08-04 Corning Incorporated Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
NL2017998B1 (en) * 2016-12-14 2018-06-26 Corning Inc Apparatuses and methods for laser processing transparent workpieces using non-axisymmetric beam spots
EP3597353A1 (en) * 2016-09-30 2020-01-22 Corning Incorporated Apparatuses for laser processing transparent workpieces using non-axisymmetric beam spots
KR102428350B1 (ko) 2016-10-24 2022-08-02 코닝 인코포레이티드 시트형 유리 기판의 레이저 기반 기계 가공을 위한 기판 프로세싱 스테이션
US10752534B2 (en) 2016-11-01 2020-08-25 Corning Incorporated Apparatuses and methods for laser processing laminate workpiece stacks
US10688599B2 (en) 2017-02-09 2020-06-23 Corning Incorporated Apparatus and methods for laser processing transparent workpieces using phase shifted focal lines
US11078112B2 (en) * 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
US10580725B2 (en) 2017-05-25 2020-03-03 Corning Incorporated Articles having vias with geometry attributes and methods for fabricating the same
US10626040B2 (en) 2017-06-15 2020-04-21 Corning Incorporated Articles capable of individual singulation
US12180108B2 (en) 2017-12-19 2024-12-31 Corning Incorporated Methods for etching vias in glass-based articles employing positive charge organic molecules
US11554984B2 (en) 2018-02-22 2023-01-17 Corning Incorporated Alkali-free borosilicate glasses with low post-HF etch roughness
JP7230650B2 (ja) 2019-04-05 2023-03-01 Tdk株式会社 無機材料基板の加工方法、デバイス、およびデバイスの製造方法
CN111830695B (zh) * 2020-07-31 2025-03-11 北京兆维电子(集团)有限责任公司 一种oled显示面板亮点缺陷修正系统
CN115856066A (zh) * 2022-12-01 2023-03-28 暨南大学 一种基质辅助激光解吸飞行时间的光路系统及质谱仪

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JP3433110B2 (ja) * 1998-08-03 2003-08-04 科学技術振興事業団 3次元的回折光学素子及びその製造方法
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