JP2002203773A - 露光装置 - Google Patents

露光装置

Info

Publication number
JP2002203773A
JP2002203773A JP2000401764A JP2000401764A JP2002203773A JP 2002203773 A JP2002203773 A JP 2002203773A JP 2000401764 A JP2000401764 A JP 2000401764A JP 2000401764 A JP2000401764 A JP 2000401764A JP 2002203773 A JP2002203773 A JP 2002203773A
Authority
JP
Japan
Prior art keywords
exposure
alignment mark
exposure apparatus
alignment
substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000401764A
Other languages
English (en)
Japanese (ja)
Other versions
JP2002203773A5 (enrdf_load_stackoverflow
Inventor
Itaru Fujita
いたる 藤田
Hideki Nogawa
秀樹 野川
Yukio Takabayashi
幸夫 高林
Izumi Tsukamoto
泉 塚本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000401764A priority Critical patent/JP2002203773A/ja
Publication of JP2002203773A publication Critical patent/JP2002203773A/ja
Publication of JP2002203773A5 publication Critical patent/JP2002203773A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000401764A 2000-12-28 2000-12-28 露光装置 Withdrawn JP2002203773A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000401764A JP2002203773A (ja) 2000-12-28 2000-12-28 露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000401764A JP2002203773A (ja) 2000-12-28 2000-12-28 露光装置

Publications (2)

Publication Number Publication Date
JP2002203773A true JP2002203773A (ja) 2002-07-19
JP2002203773A5 JP2002203773A5 (enrdf_load_stackoverflow) 2008-02-28

Family

ID=18866153

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000401764A Withdrawn JP2002203773A (ja) 2000-12-28 2000-12-28 露光装置

Country Status (1)

Country Link
JP (1) JP2002203773A (enrdf_load_stackoverflow)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005209926A (ja) * 2004-01-23 2005-08-04 Nikon Corp マーク検出方法とその装置、露光方法とその装置、及び、デバイス製造方法
KR100742597B1 (ko) 2004-03-31 2007-07-25 후지필름 가부시키가이샤 노광장치의 교정방법, 노광방법 및 노광장치
JP2013211488A (ja) * 2012-03-30 2013-10-10 Canon Inc 露光装置、露光装置の制御方法及びデバイス製造方法
JP2014138038A (ja) * 2013-01-15 2014-07-28 Canon Inc 露光装置、露光方法、それらを用いたデバイスの製造方法
US8953163B2 (en) 2012-09-06 2015-02-10 Kabushiki Kaisha Toshiba Exposure apparatus, exposure method, and method of manufacturing semiconductor device

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05304077A (ja) * 1992-01-23 1993-11-16 Nikon Corp 位置合わせ方法
JPH08227854A (ja) * 1994-11-29 1996-09-03 Nikon Corp 露光方法及びその装置
JPH10172900A (ja) * 1996-12-06 1998-06-26 Nikon Corp 露光装置
JPH1140489A (ja) * 1997-07-15 1999-02-12 Canon Inc 投影露光方法および装置
JPH1174185A (ja) * 1997-08-29 1999-03-16 Canon Inc 露光装置およびデバイス製造方法

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05304077A (ja) * 1992-01-23 1993-11-16 Nikon Corp 位置合わせ方法
JPH08227854A (ja) * 1994-11-29 1996-09-03 Nikon Corp 露光方法及びその装置
JPH10172900A (ja) * 1996-12-06 1998-06-26 Nikon Corp 露光装置
JPH1140489A (ja) * 1997-07-15 1999-02-12 Canon Inc 投影露光方法および装置
JPH1174185A (ja) * 1997-08-29 1999-03-16 Canon Inc 露光装置およびデバイス製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005209926A (ja) * 2004-01-23 2005-08-04 Nikon Corp マーク検出方法とその装置、露光方法とその装置、及び、デバイス製造方法
KR100742597B1 (ko) 2004-03-31 2007-07-25 후지필름 가부시키가이샤 노광장치의 교정방법, 노광방법 및 노광장치
JP2013211488A (ja) * 2012-03-30 2013-10-10 Canon Inc 露光装置、露光装置の制御方法及びデバイス製造方法
US8953163B2 (en) 2012-09-06 2015-02-10 Kabushiki Kaisha Toshiba Exposure apparatus, exposure method, and method of manufacturing semiconductor device
JP2014138038A (ja) * 2013-01-15 2014-07-28 Canon Inc 露光装置、露光方法、それらを用いたデバイスの製造方法

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