JP2002151618A - Build-up printed wring board and manufacturing method thereof - Google Patents

Build-up printed wring board and manufacturing method thereof

Info

Publication number
JP2002151618A
JP2002151618A JP2000347903A JP2000347903A JP2002151618A JP 2002151618 A JP2002151618 A JP 2002151618A JP 2000347903 A JP2000347903 A JP 2000347903A JP 2000347903 A JP2000347903 A JP 2000347903A JP 2002151618 A JP2002151618 A JP 2002151618A
Authority
JP
Japan
Prior art keywords
build
semiconductor element
printed wiring
wiring board
electrode pad
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000347903A
Other languages
Japanese (ja)
Inventor
Kazuo Uchiyama
一男 内山
Naoto Nakatani
直人 中谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nippon Avionics Co Ltd
Original Assignee
Nippon Avionics Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Avionics Co Ltd filed Critical Nippon Avionics Co Ltd
Priority to JP2000347903A priority Critical patent/JP2002151618A/en
Publication of JP2002151618A publication Critical patent/JP2002151618A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To offer a build-up printed wiring board having a good connecting reliability. SOLUTION: This build-up printed wiring board in which a semiconductor element such as an LSI is mounted with flip-chip mounting by pressure welding includes the following steps: (a) a step of laminating the necessary number of layers while forming a circuit pattern except the outermost layer, (b) a step of subjecting the substrate to a copper plating resist treatment except an electrode pad of the semiconductor element of the outermost layer, (c) a step of subjecting the electrode pad of the semiconductor element, (d) a step of removing the copper plating resist applied during the step (b).

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、プリント配線板に
係り、特にLSI等の半導体素子をフリップチップ実装
に適するビルドアッププリント配線板に関するものであ
る。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a printed wiring board, and more particularly to a build-up printed wiring board suitable for flip-chip mounting of a semiconductor device such as an LSI.

【0002】[0002]

【従来の技術】ベアチップを実装する工法として、圧接
法が提案されている。圧接法は、はんだまたは導電性樹
脂等の接合材料を供給する必要がなく、LSIと回路基
板の間に充填するアンダーフィル材である封止樹脂の収
縮力により機械的な接触のみで、LSIの電極と回路基
板上のパッドを電気的に接続させるものである。
2. Description of the Related Art As a method for mounting a bare chip, a pressure welding method has been proposed. In the pressure welding method, there is no need to supply a bonding material such as a solder or a conductive resin, and only mechanical contact is performed by the contraction force of a sealing resin, which is an underfill material filled between the LSI and a circuit board, and the LSI is formed. The electrodes are electrically connected to the pads on the circuit board.

【0003】圧接法の工程は、次の通りである。まず、
LSIを搭載する回路基板上の部分にアンダーフィル材
である封止樹脂を供給する。次に、この部分の上にLS
Iを搭載して加圧する。続いて、この状態で熱または光
を与え、封止樹脂を硬化させ、LSIの電極と回路基板
上のパッドを接続する。
The steps of the pressure welding method are as follows. First,
A sealing resin as an underfill material is supplied to a portion on a circuit board on which the LSI is mounted. Next, put LS on this part
I is mounted and pressurized. Subsequently, in this state, heat or light is applied to cure the sealing resin, and the electrodes of the LSI and the pads on the circuit board are connected.

【0004】ビルドアッププリント配線板は、この圧接
法によりLSIを実装する回路基板としても用いられて
いる。ここで、ビルドアッププリント配線板の製造方法
について簡単に説明する。内層コア材として銅張積層板
を用意し、この銅箔をエッチングして回路パターンを形
成する。次にこの回路パターンが形成された表面に熱硬
化性樹脂を塗布し、加熱することによって熱硬化性樹脂
層を形成する。この熱硬化性樹脂層の表面には銅箔が積
層される。
[0004] Build-up printed wiring boards are also used as circuit boards on which LSIs are mounted by this pressure welding method. Here, a method of manufacturing the build-up printed wiring board will be briefly described. A copper-clad laminate is prepared as an inner core material, and the copper foil is etched to form a circuit pattern. Next, a thermosetting resin is applied to the surface on which the circuit pattern is formed and heated to form a thermosetting resin layer. A copper foil is laminated on the surface of the thermosetting resin layer.

【0005】この銅箔には公知のフォトエッチング法に
よりビアホール用の小開口部および回路パターンが形成
される。このようにして作られた積層体の各小開口部を
指向してレーザが順番に照射される。レーザは表面の銅
箔を透過しないので銅箔がない小開口部を通して熱硬化
性樹脂層を加熱し消失させる。この結果小開口部の下に
レーザビアホール用の小孔が形成される。レーザは下の
銅箔の下に到達することはできないから、小孔の底には
下の銅箔が現れる。
A small opening for a via hole and a circuit pattern are formed in the copper foil by a known photoetching method. The laser is sequentially irradiated to each of the small openings of the laminate thus manufactured. Since the laser does not transmit through the copper foil on the surface, the thermosetting resin layer is heated and disappears through the small opening having no copper foil. As a result, a small hole for a laser via hole is formed below the small opening. Since the laser cannot reach under the underlying copper foil, the underlying copper foil appears at the bottom of the stoma.

【0006】次にこの積層体は銅めっきされる。すなわ
ち無電解銅めっきにより小孔の内面を含む表面に導電性
が付与された後、電解めっきが施され、所定の厚さの銅
めっき層が形成される。小孔の内面に形成された銅めっ
き層は、下の銅箔の回路パターンと上の銅箔の回路パタ
ーンとを接続するビアホールとなる。なお、表面の銅箔
には必要に応じてフォトエッチング法などによって回路
パターンを形成する。
[0006] The laminate is then plated with copper. That is, after electroconductivity is imparted to the surface including the inner surface of the small hole by electroless copper plating, electrolytic plating is performed, and a copper plating layer having a predetermined thickness is formed. The copper plating layer formed on the inner surface of the small hole becomes a via hole connecting the circuit pattern of the lower copper foil and the circuit pattern of the upper copper foil. A circuit pattern is formed on the surface of the copper foil by a photoetching method or the like as necessary.

【0007】また、この上に前記と同様の手順によって
さらに他の熱硬化性樹脂層や銅箔を重ね、レーザビアホ
ールを形成することにより、積層数を増やすことができ
る。このようにして積層された表面の回路パターン上の
LSI等の半導体素子を実装する電極パッド形成部には
約5μm厚のニッケルめっきが付されたうえ、さらに
0.05〜0.3μm厚の金めっきが付される。これは
腐食防止のためである。
Further, by laminating another thermosetting resin layer or a copper foil thereon by the same procedure as above and forming a laser via hole, the number of laminations can be increased. An electrode pad forming portion for mounting a semiconductor element such as an LSI on the circuit pattern on the surface thus laminated is plated with nickel having a thickness of about 5 μm and further having a thickness of 0.05 to 0.3 μm. Plating is applied. This is to prevent corrosion.

【0008】こうして完成したビルドアッププリント配
線板の電極パッド上に、アンダーフィル材を用いてLS
I等の半導体素子を圧接法により、フリップチップ実装
する。このとき、ビルドアッププリント配線板と半導体
素子を接着するアンダーフィル材の内部に空隙部(以下
「ボイド」という。)が発生する場合がある。このボイ
ドは、アンダーフィル材が半導体素子をフリップチップ
実装する際に半導体素子に押し流され流動し、その際の
ビルドアップ基板凸部近傍に空気を抜ける前にペースト
が巻き込み滞留するなどにより生じるものである。ま
た、ビルドアッププリント配線板内部の水分がフリップ
チップ実装時の加熱でアンダーフィル材側に流れ出し、
アンダーフィル材内の気泡により生じるものである。
The LS is formed on the electrode pads of the completed build-up printed wiring board by using an underfill material.
A semiconductor element such as I is flip-chip mounted by a pressure welding method. At this time, voids (hereinafter, referred to as “voids”) may be generated inside the underfill material that bonds the build-up printed wiring board and the semiconductor element. This void is caused by the underfill material being pushed and flown by the semiconductor element when the semiconductor element is flip-chip mounted and flowing, and the paste being trapped and staying before the air escapes near the convex portion of the build-up substrate at that time. is there. In addition, the moisture inside the build-up printed wiring board flows out to the underfill material side by heating during flip chip mounting,
This is caused by bubbles in the underfill material.

【0009】[0009]

【発明が解決しようとする課題】ボイドは、水分を溜め
込み、リフロー加熱時による熱負荷でその水分が膨張
し、ボイドを起点に亀裂を誘発するなど接続信頼性が低
下するという問題点があった。本発明は、上記課題を解
決するために、LSI等の半導体素子を実装する電極パ
ッドを他の表面実装部品を実装する電極パッドより適宜
高くすることにより、ビルドアッププリント配線板とL
SI等の半導体素子の間隙を広げることにより、この間
隙中に占めるボイドの割合を減少させて亀裂が生じ難く
し、接続信頼性の高いビルドアッププリント配線板とそ
の製造方法を提供する。
The voids accumulate moisture, and the moisture expands due to the heat load caused by the reflow heating, causing a problem that the connection reliability is reduced, for example, a crack is induced from the void as a starting point. . SUMMARY OF THE INVENTION In order to solve the above-mentioned problems, the present invention provides an electrode pad for mounting a semiconductor element such as an LSI, which is appropriately higher than an electrode pad for mounting another surface-mounted component, thereby achieving a build-up printed wiring board and
The present invention provides a build-up printed wiring board with high connection reliability, in which a gap between semiconductor elements such as SIs is widened to reduce the ratio of voids occupying the gap to prevent cracks from occurring.

【0010】[0010]

【課題を解決するための手段】本発明になるビルドアッ
ププリント配線板は、LSI等の半導体素子を圧接法に
よりフリップチップ実装するビルドアッププリント配線
板において、前記半導体素子を実装する電極パッドの高
さを他の表面実装部品の電極パッドの高さより高くした
ことを特徴とするものである。
According to the present invention, there is provided a build-up printed wiring board in which a semiconductor element such as an LSI is flip-chip mounted by a pressure welding method. The height is made higher than the height of the electrode pads of the other surface mount components.

【0011】また、このビルドアッププリント配線板の
製造方法は、LSI等の半導体素子を圧接法によりフリ
ップチップ実装するビルドアッププリント配線板におい
て、次の工程を含むことを特徴とするものである。 a)最外層を除き回路パターンを形成しつつ、所要の層
数絶縁層と銅層を交互に積層する工程 b)最外層の半導体素子の電極パッド形成部を除いて、
銅めっきレジスト処理を施す工程 c)前記半導体素子の電極パッド形成部に銅めっきを施
す工程 d)工程bで施した銅めっきレジストを剥離する工程
Further, the method for manufacturing a build-up printed wiring board is characterized in that the build-up printed wiring board on which a semiconductor element such as an LSI is flip-chip mounted by a pressure welding method includes the following steps. a) a step of alternately laminating insulating layers and copper layers by a required number of layers while forming a circuit pattern except for the outermost layer b) excluding an electrode pad forming portion of a semiconductor element of the outermost layer
Step of applying a copper plating resist process c) Step of applying copper plating to the electrode pad formation portion of the semiconductor element d) Step of removing the copper plating resist applied in Step b

【0012】また、本発明になるビルドアッププリント
配線板は、LSI等の半導体素子を実装する電極パッド
の高さと他の表面実装部品を実装する電極パッドとの高
さの差が15μm〜25μmであることを特徴とするも
のである。
In the build-up printed wiring board according to the present invention, the difference between the height of an electrode pad for mounting a semiconductor element such as an LSI and the height of an electrode pad for mounting other surface mounting components is 15 μm to 25 μm. It is characterized by having.

【0013】本発明によれば、LSI等の半導体素子を
実装する電極パッドは、他の表面実装部品を実装する電
極パッドよりも高くなるので、ビルドアッププリント配
線板とLSI等の半導体素子との間隙を広げることがで
きるから、この間隙中に占めるボイドの割合が減少する
ので亀裂が入り難くすることができる。
According to the present invention, an electrode pad for mounting a semiconductor device such as an LSI is higher than an electrode pad for mounting other surface mount components. Since the gap can be widened, the ratio of voids in the gap is reduced, so that cracks can be hardly formed.

【0014】[0014]

【発明の実施の形態】以下本発明について、図を用いて
詳しく説明する。図1は、本発明の一実施の形態を示す
ビルドアッププリント配線板の製造工程図である。最外
層の銅箔の積層までは従来のビルドアッププリント配線
板の製造方法と同様であるから、その説明は省略し、最
外層の銅箔の積層以降の製造方法について説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention will be described below in detail with reference to the drawings. FIG. 1 is a manufacturing process diagram of a build-up printed wiring board showing one embodiment of the present invention. The process up to the lamination of the outermost copper foil is the same as that of the conventional method of manufacturing a build-up printed wiring board, and therefore the description thereof will be omitted, and the production method after lamination of the outermost copper foil will be described.

【0015】図1(a)は、こうして製造された積層体
の最外層を示したものである。ここで、1は熱硬化性樹
脂層、2はその表面に積層された銅箔である。次に、図
1(b)に示すように、銅箔2の表面にLSI等の半導
体素子を実装する電極パッドを形成する部分を除いて銅
めっきレジスト処理を施す。3がこうして形成された銅
めっきレジスト層である。
FIG. 1 (a) shows the outermost layer of the laminate thus manufactured. Here, 1 is a thermosetting resin layer, and 2 is a copper foil laminated on its surface. Next, as shown in FIG. 1B, a copper plating resist process is performed on the surface of the copper foil 2 except for a portion where an electrode pad for mounting a semiconductor element such as an LSI is formed. Reference numeral 3 denotes the copper plating resist layer thus formed.

【0016】次に、図1(c)に示すように銅箔2に銅
めっきを施す。4aがこうして形成された銅めっき層で
あり、約20μmが適切である。次に、図1(d)に示
すように銅めっきレジスト層3を剥離する。
Next, as shown in FIG. 1C, the copper foil 2 is plated with copper. 4a is the copper plating layer thus formed, and about 20 μm is appropriate. Next, the copper plating resist layer 3 is peeled off as shown in FIG.

【0017】これ以降、従来のビルドアッププリント配
線板の製造工程と同様、回路パターンおよび電極パッド
形成部にエッチングレジスト処理を施して、エッチング
し、所望の回路パターンおよび電極パッドを形成し、そ
の後エッチングレジストを剥離し、所要部にソルダレジ
スト処理を施し、表面部品実装用の電極パッド部にニッ
ケルめっき、続いて金めっきを施す。こうして得られた
ビルドアッププリント配線板を図1(e)に示す(ソル
ダレジストは図示省略してある)。ここで、4はLSI
等の半導体素子を実装する電極パッドであり、5は他の
表面実装部品用電極パッドであり、6は回路パターンで
ある。
Thereafter, in the same manner as in the conventional manufacturing process of a build-up printed wiring board, a circuit pattern and an electrode pad forming portion are subjected to an etching resist process and etched to form a desired circuit pattern and an electrode pad. The resist is peeled off, and a solder resist process is performed on a required portion, and nickel plating and then gold plating are performed on the electrode pad portion for mounting surface components. The build-up printed wiring board thus obtained is shown in FIG. 1 (e) (solder resist is not shown). Where 4 is the LSI
Reference numeral 5 denotes an electrode pad for another surface mount component, and 6 denotes a circuit pattern.

【0018】[0018]

【発明の効果】本発明によれば、以上説明したように、
ビルドアッププリント配線板のLSI等の半導体素子実
装用電極パッドに相当する部分を銅めっきを施すことに
より、従来のビルドアッププリント配線板のLSI等の
半導体素子実装用の電極パッドより高さがあるので、半
導体素子を圧接法によりフリップチップ実装したときに
ボイドが生じても、半導体素子とビルドアッププリント
配線板の間隙は広がっているため、この間隙中に占める
ボイドの割合が減少するから亀裂が入り難くなるので接
続信頼性に優れたビルドアッププリント配線板を提供で
きる(請求項1、3)。また、本発明になるビルドアッ
ププリント配線板の製造方法によれば、上記ビルドアッ
ププリント配線板を提供できる(請求項2、4)。
According to the present invention, as described above,
A portion corresponding to an electrode pad for mounting a semiconductor element such as an LSI of a build-up printed wiring board is plated with copper, so that the height is higher than a conventional electrode pad for mounting a semiconductor element such as an LSI of a build-up printed wiring board. Therefore, even if voids occur when the semiconductor element is flip-chip mounted by the pressure welding method, the gap between the semiconductor element and the build-up printed wiring board is widened, and the proportion of voids in the gap decreases, so that cracks are formed. Since it is difficult to enter, a build-up printed wiring board having excellent connection reliability can be provided (claims 1 and 3). Further, according to the method of manufacturing a build-up printed wiring board according to the present invention, the above-mentioned build-up printed wiring board can be provided (claims 2 and 4).

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明のビルドアッププリント配線板の一実施
形態を示す製造工程図である。
FIG. 1 is a manufacturing process diagram showing one embodiment of a build-up printed wiring board of the present invention.

【符号の説明】[Explanation of symbols]

1 熱硬化性樹脂層 2 銅箔 3 銅めっきレジスト 4a 銅めっき 4 半導体素子実装用電極パッド 5 他の表面実装部品実装用電極パッド 6 回路パターン DESCRIPTION OF SYMBOLS 1 Thermosetting resin layer 2 Copper foil 3 Copper plating resist 4a Copper plating 4 Electrode pad for mounting semiconductor elements 5 Electrode pad for mounting other surface mounting parts 6 Circuit pattern

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 LSI等の半導体素子を圧接法によりフ
リップチップ実装するビルドアッププリント配線板にお
いて、 前記半導体素子を実装する電極パッドの高さを他の表面
実装部品の電極パッドの高さより厚くしたことを特徴と
するビルドアッププリント配線板。
1. A build-up printed wiring board on which a semiconductor element such as an LSI is flip-chip mounted by a pressure welding method, wherein the height of an electrode pad on which the semiconductor element is mounted is greater than the height of an electrode pad of another surface mount component. A build-up printed wiring board, characterized in that:
【請求項2】 LSI等の半導体素子を圧接法によりフ
リップチップ実装するビルドアッププリント配線板にお
いて、次の工程を含むことを特徴とする請求項1記載の
ビルドアッププリント配線板の製造方法 a)最外層を除き回路パターンを形成しつつ、所要の層
数絶縁層と銅層を交互に積層する工程 b)最外層の半導体素子の電極パッド形成部を除いて、
銅めっきレジスト処理を施す工程 c)前記半導体素子の電極パッド形成部に銅めっきを施
す工程 d)工程bで施した銅めっきレジストを剥離する工程
2. A method for manufacturing a build-up printed wiring board according to claim 1, wherein the build-up printed wiring board on which a semiconductor element such as an LSI is flip-chip mounted by a pressure welding method includes the following steps. A step of alternately laminating insulating layers and copper layers by a required number of layers while forming a circuit pattern excluding the outermost layer. B) Excluding an electrode pad forming portion of the outermost semiconductor element,
Step of applying a copper plating resist process c) Step of applying copper plating to the electrode pad formation portion of the semiconductor element d) Step of removing the copper plating resist applied in Step b
【請求項3】 LSI等の半導体素子を実装する電極パ
ッドの高さと他の表面実装部品を実装する電極パッドと
の高さの差が15μm〜25μmであることを特徴とす
る請求項1記載のビルドアッププリント配線板。
3. The semiconductor device according to claim 1, wherein the difference between the height of the electrode pad for mounting a semiconductor element such as an LSI and the height of the electrode pad for mounting another surface mounting component is 15 μm to 25 μm. Build-up printed wiring board.
【請求項4】 LSI等の半導体素子を実装する電極パ
ッド形成部に施される銅めっき厚は15μm〜25μm
であることを特徴とする請求項2記載のビルドアッププ
リント配線板の製造方法。
4. A copper plating thickness applied to an electrode pad formation portion for mounting a semiconductor element such as an LSI is 15 μm to 25 μm.
3. The method for manufacturing a build-up printed wiring board according to claim 2, wherein
JP2000347903A 2000-11-15 2000-11-15 Build-up printed wring board and manufacturing method thereof Pending JP2002151618A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000347903A JP2002151618A (en) 2000-11-15 2000-11-15 Build-up printed wring board and manufacturing method thereof

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000347903A JP2002151618A (en) 2000-11-15 2000-11-15 Build-up printed wring board and manufacturing method thereof

Publications (1)

Publication Number Publication Date
JP2002151618A true JP2002151618A (en) 2002-05-24

Family

ID=18821562

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000347903A Pending JP2002151618A (en) 2000-11-15 2000-11-15 Build-up printed wring board and manufacturing method thereof

Country Status (1)

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102111952A (en) * 2009-12-28 2011-06-29 日本特殊陶业株式会社 Multilayer wiring substrate
KR101375998B1 (en) * 2009-12-28 2014-03-19 니혼도꾸슈도교 가부시키가이샤 Method of Manufacturing Multilayer Wiring Substrate, and Multilayer Wiring Substrate
CN104766850A (en) * 2014-01-06 2015-07-08 台湾积体电路制造股份有限公司 Protrusion bump pads for bond-on-trace processing

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102111952A (en) * 2009-12-28 2011-06-29 日本特殊陶业株式会社 Multilayer wiring substrate
US20110155438A1 (en) * 2009-12-28 2011-06-30 Ngk Spark Plug Co., Ltd. Multilayer Wiring Substrate
KR101281410B1 (en) * 2009-12-28 2013-07-02 니혼도꾸슈도교 가부시키가이샤 Multilayer Wiring Substrate
KR101375998B1 (en) * 2009-12-28 2014-03-19 니혼도꾸슈도교 가부시키가이샤 Method of Manufacturing Multilayer Wiring Substrate, and Multilayer Wiring Substrate
US8707554B2 (en) 2009-12-28 2014-04-29 Ngk Spark Plug Co., Ltd. Method of manufacturing multilayer wiring substrate
CN102111952B (en) * 2009-12-28 2014-06-04 日本特殊陶业株式会社 Multilayer wiring substrate
US20140202740A1 (en) * 2009-12-28 2014-07-24 Ngk Spark Plug Co., Ltd. Method of Manufacturing Multilayer Wiring Substrate, and Multilayer Wiring Substrate
CN104766850A (en) * 2014-01-06 2015-07-08 台湾积体电路制造股份有限公司 Protrusion bump pads for bond-on-trace processing

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