JP2002151377A - 投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法 - Google Patents

投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法

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Publication number
JP2002151377A
JP2002151377A JP2000339880A JP2000339880A JP2002151377A JP 2002151377 A JP2002151377 A JP 2002151377A JP 2000339880 A JP2000339880 A JP 2000339880A JP 2000339880 A JP2000339880 A JP 2000339880A JP 2002151377 A JP2002151377 A JP 2002151377A
Authority
JP
Japan
Prior art keywords
substrate
optical system
focus
detection
exposure apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000339880A
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English (en)
Japanese (ja)
Other versions
JP2002151377A5 (enrdf_load_stackoverflow
Inventor
Noriyuki Mitome
範行 見留
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000339880A priority Critical patent/JP2002151377A/ja
Publication of JP2002151377A publication Critical patent/JP2002151377A/ja
Publication of JP2002151377A5 publication Critical patent/JP2002151377A5/ja
Withdrawn legal-status Critical Current

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Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000339880A 2000-11-08 2000-11-08 投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法 Withdrawn JP2002151377A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000339880A JP2002151377A (ja) 2000-11-08 2000-11-08 投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000339880A JP2002151377A (ja) 2000-11-08 2000-11-08 投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法

Publications (2)

Publication Number Publication Date
JP2002151377A true JP2002151377A (ja) 2002-05-24
JP2002151377A5 JP2002151377A5 (enrdf_load_stackoverflow) 2007-12-27

Family

ID=18814887

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000339880A Withdrawn JP2002151377A (ja) 2000-11-08 2000-11-08 投影露光装置、投影露光方法、デバイス製造方法、半導体製造工場および露光装置の保守方法

Country Status (1)

Country Link
JP (1) JP2002151377A (enrdf_load_stackoverflow)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006001416A1 (ja) * 2004-06-29 2006-01-05 Nikon Corporation 管理方法及び管理システム、並びにプログラム
CN103676497A (zh) * 2012-09-10 2014-03-26 国际商业机器公司 半导体芯片制造中产品上焦距偏移的计量方法和结构
US9411249B2 (en) 2013-09-23 2016-08-09 Globalfoundries Inc. Differential dose and focus monitor

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006001416A1 (ja) * 2004-06-29 2006-01-05 Nikon Corporation 管理方法及び管理システム、並びにプログラム
JPWO2006001416A1 (ja) * 2004-06-29 2008-04-17 株式会社ニコン 管理方法及び管理システム、並びにプログラム
JP4678372B2 (ja) * 2004-06-29 2011-04-27 株式会社ニコン 管理方法及び管理システム、並びにプログラム
US7941232B2 (en) 2004-06-29 2011-05-10 Nikon Corporation Control method, control system, and program
CN103676497A (zh) * 2012-09-10 2014-03-26 国际商业机器公司 半导体芯片制造中产品上焦距偏移的计量方法和结构
US9411223B2 (en) 2012-09-10 2016-08-09 Globalfoundries Inc. On-product focus offset metrology for use in semiconductor chip manufacturing
US9411249B2 (en) 2013-09-23 2016-08-09 Globalfoundries Inc. Differential dose and focus monitor

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