JP2002110458A - Solid electrolytic chip capacitor - Google Patents

Solid electrolytic chip capacitor

Info

Publication number
JP2002110458A
JP2002110458A JP2000296597A JP2000296597A JP2002110458A JP 2002110458 A JP2002110458 A JP 2002110458A JP 2000296597 A JP2000296597 A JP 2000296597A JP 2000296597 A JP2000296597 A JP 2000296597A JP 2002110458 A JP2002110458 A JP 2002110458A
Authority
JP
Japan
Prior art keywords
solid electrolytic
electrolytic capacitor
chip
layer
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000296597A
Other languages
Japanese (ja)
Other versions
JP4276774B2 (en
Inventor
Kazuo Uzawa
一夫 鵜沢
Junichi Murakami
村上  順一
Nobuo Yuuhi
伸夫 夕日
Hisashi Suwa
壽志 諏訪
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichicon Corp
Original Assignee
Nichicon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichicon Corp filed Critical Nichicon Corp
Priority to JP2000296597A priority Critical patent/JP4276774B2/en
Publication of JP2002110458A publication Critical patent/JP2002110458A/en
Application granted granted Critical
Publication of JP4276774B2 publication Critical patent/JP4276774B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a small-sized chip capacitor having large capacitance at a low cost. SOLUTION: The chip capacitor has a lead 1, a capacitor element 2 formed of a dielectric oxide film, a solid electrolytic layer, and a cathode lead-out layer; an electrode substrate 7 to be a capacitor electrode; and a packaging resin 2. The electrode substrate 7 is provided with an insulating layer 4 having at least two through-holes, a conductive plate 3 disposed to cover one of the through-holes, and an electrode layer 10 formed by burying the through-holes.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はチップ状固体電解コ
ンデンサに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a chip solid electrolytic capacitor.

【0002】[0002]

【従来の技術】従来のチップ状固体電解コンデンサは、
図5のように陽極リード1を有し固体電解質層、陰極引
出層を形成したコンデンサ素子2をリードフレーム11
に接続し、外装樹脂9の側面からリードフレーム11を
導出し、外装樹脂9に沿って折り曲げ加工し、基板接地
面に電極を形成していた。また特開平8−148386
号公報では、コンデンサ素子を支持する段差を形成した
絶縁スルーホール電極基板にコンデンサ素子および導出
リードをそれぞれ導電性接着剤にて接続する製造方法が
提案されている。
2. Description of the Related Art Conventional chip-shaped solid electrolytic capacitors are:
A capacitor element 2 having an anode lead 1 and a solid electrolyte layer and a cathode extraction layer as shown in FIG.
Then, the lead frame 11 is led out from the side surface of the exterior resin 9 and bent along the exterior resin 9 to form an electrode on the substrate ground plane. Also, Japanese Patent Application Laid-Open No. 8-148386.
Japanese Patent Laid-Open Publication No. H11-15064 proposes a manufacturing method in which a capacitor element and a lead are connected to an insulating through-hole electrode substrate having a step for supporting the capacitor element with a conductive adhesive.

【0003】[0003]

【発明が解決しようとする課題】また部品の高密度実装
化が進められる中、チップ状固体電解コンデンサは小形
化が求められてきた。しかしながら図5のようにリード
フレームを折り曲げて外部電極を形成する従来のチップ
状固体電解コンデンサでは、製品体積が小さくなるほど
体積中に占めるリードフレームの割合が増え、収納する
コンデンサ素子の体積が十分取れないという問題があっ
た。さらに、基板に搭載する際、部品間距離を短縮する
と、隣接する部品がリフローはんだ付けでわずかに位置
ずれする場合があるため、電子部品の側面にリードフレ
ームを構成する従来のチップ状固体電解コンデンサなど
は部品間で短絡する危険があり、さらなる高密度実装が
進められないという問題があった。一方、段差を形成し
たスルーホール電極基板にコンデンサ素子を導電性接着
剤にて接続してチップ部品の下面、すなわち基板接地面
のみに電極形成した構造のチップ部品が提案されている
が、電極基板の製作コストがかさむ上、コンデンサ素子
の導出リードは通常タンタルなどの弁作用金属が用いら
れ、導電性接着剤による電気的接続では表面酸化により
接続界面の抵抗が増加してコンデンサ特性が劣化し、さ
らには接合強度が弱くなり剥離を生じさせるという問題
があった。また、上記従来のコンデンサは電極端子自体
の厚さが少なくとも80μm以上となるため、製品下面
とコンデンサ素子下面との距離が140μm以上とな
り、部品の小型化に伴う素子収容容量を向上させる阻害
要因となっていた。
Further, as components are mounted at a high density, there is a demand for miniaturization of chip-shaped solid electrolytic capacitors. However, in the conventional chip-shaped solid electrolytic capacitor in which the lead frame is bent to form external electrodes as shown in FIG. 5, the smaller the product volume, the larger the proportion of the lead frame in the volume, and the volume of the capacitor element to be housed is sufficient. There was no problem. Furthermore, when mounting on a board, if the distance between components is shortened, adjacent components may be slightly displaced by reflow soldering, so a conventional chip-shaped solid electrolytic capacitor that forms a lead frame on the side of electronic components In such a case, there is a danger of short-circuiting between components, and there is a problem that further high-density mounting cannot be advanced. On the other hand, a chip component having a structure in which a capacitor element is connected to a stepped through-hole electrode substrate with a conductive adhesive and an electrode is formed only on the lower surface of the chip component, that is, only on the substrate ground plane, has been proposed. In addition to the increased manufacturing cost, the lead-out lead of the capacitor element is usually made of a valve metal such as tantalum, and the electrical connection using a conductive adhesive increases the resistance at the connection interface due to surface oxidation, deteriorating the capacitor characteristics. Further, there is a problem that the bonding strength is weakened and peeling is caused. Further, in the conventional capacitor, since the thickness of the electrode terminal itself is at least 80 μm or more, the distance between the lower surface of the product and the lower surface of the capacitor element is 140 μm or more. Had become.

【0004】[0004]

【課題を解決するための手段】本発明は、貫通孔を有す
る絶縁層と、貫通孔を覆う導電板と、貫通孔を埋める電
極層とを有する電極基板と導出リードを具備したコンデ
ンサ素子とを電気的に接続した構造とすることにより、
該電極基板の厚みを薄くでき、素子収容容量に優れたチ
ップ状コンデンサが実現できるものであり、また該コン
デンサの側面のリードをなくすことで高密度実装も可能
とするものである。すなわち、導出リード1を具備し、
誘電体酸化皮膜、固体電解質層、陰極引出層を形成した
コンデンサ素子2と、コンデンサの電極となる電極基板
7と、外装樹脂9を有するチップ状コンデンサにおい
て、上記電極基板7が、少なくとも2箇所の貫通孔を有
する絶縁層4と、該貫通孔の一方を覆うように配置した
導電板3,3と、貫通孔に形成された電極層10,10
とを有することを特徴とするチップ状固体電解コンデン
サである。
SUMMARY OF THE INVENTION The present invention relates to a capacitor element having an electrode substrate having an insulating layer having a through hole, a conductive plate covering the through hole, an electrode layer filling the through hole, and a lead. By having an electrically connected structure,
The thickness of the electrode substrate can be reduced, and a chip capacitor excellent in element storage capacity can be realized, and high-density mounting is possible by eliminating the lead on the side surface of the capacitor. That is, it has the lead 1 and
In a capacitor element 2 having a dielectric oxide film, a solid electrolyte layer, and a cathode extraction layer, an electrode substrate 7 serving as an electrode of the capacitor, and a chip-shaped capacitor having an exterior resin 9, the electrode substrate 7 is provided in at least two places. An insulating layer 4 having a through hole, conductive plates 3 and 3 arranged to cover one of the through holes, and electrode layers 10 and 10 formed in the through hole.
And a chip-shaped solid electrolytic capacitor characterized by having:

【0005】上記電極基板7が、導電板3,3に接する
メッキ層6a〜6dを有し、貫通孔内のメッキ層6b,
6dと電極層10,10とが接すること特徴とするチッ
プ状固体電解コンデンサである。
The electrode substrate 7 has plating layers 6a to 6d in contact with the conductive plates 3 and 3, and the plating layers 6b and 6d in the through holes are provided.
6d is a chip-shaped solid electrolytic capacitor in which the electrode layers 10 and 10 are in contact with each other.

【0006】そして、上記電極基板7が、少なくとも2
箇所の貫通孔を有する樹脂フィルムと接着層とを絶縁層
4とし、該貫通孔の一方を導電板3,3で覆った後、該
導電板3,3に接する錫メッキまたははんだメッキから
なるメッキ層6a〜6dを形成し、貫通孔内のメッキ層
6b,6dと接するよう形成した電極層10,10とを
有することを特徴とするチップ状固体電解コンデンサで
ある。
When the electrode substrate 7 has at least two
A resin film having a through hole at a location and an adhesive layer are used as an insulating layer 4, one of the through holes is covered with a conductive plate 3, 3, and then a plating made of tin plating or solder plating in contact with the conductive plate 3, 3 This is a chip-shaped solid electrolytic capacitor comprising: layers 6a to 6d; and electrode layers 10, 10 formed so as to be in contact with the plating layers 6b, 6d in the through holes.

【0007】さらに、上記樹脂フィルムがポリイミドフ
ィルムであり、接着層がエポキシ系接着剤からなること
を特徴とするチップ状コンデンサである。
Further, in the chip-shaped capacitor, the resin film is a polyimide film, and the adhesive layer is made of an epoxy-based adhesive.

【0008】また、上記電極基板7が、少なくとも2枚
の導電板3,3を配置し、絶縁性樹脂を塗布、硬化して
絶縁層4を形成後、導電板3,3上の絶縁性樹脂を除去
して絶縁層4に貫通孔を形成し、導電板3,3に接する
錫メッキまたははんだメッキからなるメッキ層6a〜6
dを形成後、電極層10を形成してなることを特徴とす
るチップ状固体電解コンデンサである。
On the electrode substrate 7, at least two conductive plates 3 and 3 are arranged, an insulating resin is applied and cured to form an insulating layer 4, and then the insulating resin on the conductive plates 3 and 3 is formed. Are removed to form through holes in the insulating layer 4, and the plating layers 6a to 6 made of tin plating or solder plating in contact with the conductive plates 3 and 3 are formed.
This is a chip-shaped solid electrolytic capacitor obtained by forming an electrode layer 10 after forming d.

【0009】上記絶縁性樹脂がポリイミド樹脂であるこ
とを特徴とするチップ状固体電解コンデンサである。
[0009] A chip-shaped solid electrolytic capacitor characterized in that the insulating resin is a polyimide resin.

【0010】上記電極基板7の厚みが、25〜90μm
であることを特徴とするチップ状固体電解コンデンサで
ある。
The thickness of the electrode substrate 7 is 25 to 90 μm.
It is a chip-shaped solid electrolytic capacitor characterized by the following.

【0011】上記導出リード1と一方の導電板3とを金
属条材5で電気的に接続したことを特徴とするチップ状
固体電解コンデンサである。
A chip-shaped solid electrolytic capacitor characterized in that the lead-out lead (1) and one conductive plate (3) are electrically connected by a metal strip (5).

【0012】さらに、上記金属条材5がニッケルまたは
ニッケル合金を母材とし、錫メッキまたははんだメッキ
を施してなることを特徴とするチップ状固体電解コンデ
ンサである。
Further, the chip-shaped solid electrolytic capacitor is characterized in that the metal strip 5 is made of nickel or a nickel alloy as a base material and is plated with tin or solder.

【0013】上記金属条材5の形状が角柱であることを
特徴とするチップ状固体電解コンデンサである。
The chip-shaped solid electrolytic capacitor is characterized in that the shape of the metal strip 5 is a prism.

【0014】上記金属条材5の形状が三〜六角柱である
ことを特徴とするチップ状固体電解コンデンサである。
[0014] A chip-shaped solid electrolytic capacitor characterized in that the shape of the metal strip 5 is a triangular to hexagonal prism.

【0015】上記導出リード1と金属条材5とを抵抗溶
接にて接続し、金属条材5の側面と電極基板7とを導電
性接着剤8で接続したことを特徴とするチップ状固体電
解コンデンサである。
The lead-out lead 1 and the metal strip 5 are connected by resistance welding, and the side surface of the metal strip 5 and the electrode substrate 7 are connected by a conductive adhesive 8. It is a capacitor.

【0016】[0016]

【発明の実施の形態】導出リードを金属条材と導電性接
着剤を介して電極基板に電気的に接続し、さらにコンデ
ンサ素子を導電性接着剤を介して電極基板と電気的に接
続し、電極基板の裏面に電極層を形成することで、コン
デンサ素子に接続したリードフレームを外部電極とする
コンデンサより素子収納容量に優れたチップ状コンデン
サを実現することができ、さらに該コンデンサ側面には
リードフレームがないため、リフローはんだ付け時に部
品位置がずれても部品間の電気的短絡を防ぐことができ
る。
BEST MODE FOR CARRYING OUT THE INVENTION A lead lead is electrically connected to an electrode substrate via a metal strip and a conductive adhesive, and a capacitor element is electrically connected to the electrode substrate via a conductive adhesive. By forming an electrode layer on the back surface of the electrode substrate, it is possible to realize a chip-shaped capacitor having a higher element storage capacity than a capacitor having a lead frame connected to the capacitor element as an external electrode, and further having a lead on the side of the capacitor. Since there is no frame, it is possible to prevent an electrical short circuit between components even if the components are displaced during reflow soldering.

【0017】さらに、導電板3,3を有することにより
電極基板7の厚みを厚くすることなく、電極層10,1
0の幅と位置を各々任意に設計することができ、少なく
とも部品側面に電極が形成されない構造とすることがで
きる。よって、部品間距離が0.1〜0.15mm程度
で基板設計した高密度実装基板で、リフローはんだ付け
時に部品の位置ずれが生じても、部品側面に導電部分が
ない構造であるため、部品間で電気的短絡が発生しな
い。その上角柱状の金属条材を導出リードと陽極外部端
子との接続に用い、電極基板7をほぼ平面状の基板とす
ることができるので低コストで極めて生産性の優れたコ
ンデンサを得ることができる。さらに、厚さの制約があ
るリードフレームを電極に使用しないので、極めて優れ
た体積有効活用率を有すチップ状固体電解コンデンサを
提供することが可能である。
Further, by providing the conductive plates 3 and 3, the electrode layers 10 and 1 can be formed without increasing the thickness of the electrode substrate 7.
The width and position of 0 can be arbitrarily designed, and a structure in which no electrode is formed at least on the side surface of the component can be adopted. Therefore, a high-density mounting board designed with a distance between components of about 0.1 to 0.15 mm and having a structure in which there is no conductive portion on the side surface of the component even if the component is misaligned during reflow soldering. No electrical short circuit occurs between them. The upper prism-shaped metal strip is used for connection between the lead-out lead and the anode external terminal, and the electrode substrate 7 can be a substantially planar substrate. Therefore, a low-cost, extremely productive capacitor can be obtained. it can. Furthermore, since a lead frame having a thickness restriction is not used for an electrode, it is possible to provide a chip-shaped solid electrolytic capacitor having an extremely excellent volume effective utilization rate.

【0018】[0018]

【実施例】〔実施例1〕 以下に本発明の実施例につい
て図面に基づき具体的に説明する。図1は、本発明の実
施例を示すチップ状固体電解コンデンサの断面図であ
る。
[Embodiment 1] An embodiment of the present invention will be specifically described below with reference to the drawings. FIG. 1 is a cross-sectional view of a chip-shaped solid electrolytic capacitor showing an embodiment of the present invention.

【0019】導出リード1を具備したタンタル焼結体
に、公知の方法で誘電体酸化皮膜、固体電解質層、陰極
引出層を形成しコンデンサ素子2とした。2箇所の貫通
孔を設けた厚さ50μmのポリイミドフィルムの上面に
エポキシ系接着剤を塗布し、導電板3,3として厚さ1
8μmの圧延銅板を用いて、貫通孔を覆うように塗布面
に配置した後硬化させ、無光沢錫メッキで導電板と接す
るメッキ層6a〜6dを形成し、残った貫通孔にはんだ
ペーストを印刷し電極10,10とし、厚さ80μmの
電極基板7を形成した。次に、鉄−ニッケル合金を母材
とし、表面に無光沢錫メッキを施した金属条材5と、導
出リードを抵抗溶接し、金属条材とメッキ層6a、コン
デンサ素子2とメッキ層6cとを導電性接着剤8で各々
電気的に接続した後、コンデンサ素子を外装樹脂で被覆
し、1.6×0.8×0.8mm(1608サイズ)の
チップ状固体電解コンデンサを作製した。
A dielectric oxide film, a solid electrolyte layer, and a cathode extraction layer were formed on a tantalum sintered body provided with the lead 1 by a known method to obtain a capacitor element 2. An epoxy adhesive is applied to the upper surface of a 50 μm-thick polyimide film having two through holes, and the conductive plates 3 and 3 have a thickness of 1 μm.
Using a rolled copper plate of 8 μm, it is placed on the application surface so as to cover the through-holes and then cured, and the plating layers 6a to 6d in contact with the conductive plate are formed by matte tin plating, and the solder paste is printed in the remaining through-holes The electrodes 10, 10 were used to form an electrode substrate 7 having a thickness of 80 μm. Next, a metal strip 5 whose surface is matte tin-plated with an iron-nickel alloy as a base material and a lead lead are resistance-welded to form a metal strip and a plating layer 6a, a capacitor element 2 and a plating layer 6c. Were electrically connected with a conductive adhesive 8, respectively, and then the capacitor element was covered with an exterior resin to produce a chip-shaped solid electrolytic capacitor of 1.6 × 0.8 × 0.8 mm (1608 size).

【0020】〔実施例2〕 図2は本発明のその他の実
施例によるチップ状固体電解コンデンサの断面図であ
る。導電板として厚さ18μmの圧延銅板2枚を配置
し、ポリイミド樹脂を塗布、硬化して絶縁層4を形成し
た後、導電板上のポリイミド樹脂の一部を除去して絶縁
層4に貫通孔を形成し、無光沢はんだメッキでメッキ層
6a〜6dを形成後、残った貫通孔にはんだペーストを
印刷して電極10,10を形成し厚さ80μmの電極基
板7とした。その他は実施例と同様にして、1608サ
イズのチップ状固体電解コンデンサを作製した。
[Embodiment 2] FIG. 2 is a sectional view of a chip-shaped solid electrolytic capacitor according to another embodiment of the present invention. Two 18 μm-thick rolled copper plates are arranged as conductive plates, and a polyimide resin is applied and cured to form an insulating layer 4. Then, a part of the polyimide resin on the conductive plate is removed to form a through hole in the insulating layer 4. After the plating layers 6a to 6d were formed by matte solder plating, solder paste was printed on the remaining through holes to form electrodes 10 and 10, thereby forming an electrode substrate 7 having a thickness of 80 μm. Otherwise, a 1608 size chip-shaped solid electrolytic capacitor was manufactured in the same manner as in the example.

【0021】従来例としてリードフレームを用いた16
08サイズのコンデンサを、比較例として特開平8−1
48386号公報記載の段付スルーホール電極基板を用
いた1608サイズのコンデンサを作製し、実施例1、
実施例2、従来例、比較例で、従来例を1.00とした
ときの製品内に最大収容可能な素子収容容積比率と、外
部電極である電極層またはリードフレームの設計値に対
する垂直方向の電極位置バラツキを表1に示した。
As a conventional example, a lead frame 16 is used.
As a comparative example, a capacitor of 08 size was disclosed in
A 1608-size capacitor using a stepped through-hole electrode substrate described in Japanese Patent No. 48386 was manufactured.
In Example 2, the conventional example, and the comparative example, when the conventional example was set to 1.00, the element accommodation volume ratio that could be maximally accommodated in the product and the vertical direction with respect to the design value of the electrode layer or the lead frame as the external electrode. Table 1 shows electrode position variations.

【0022】[0022]

【表1】 [Table 1]

【0023】表1より本発明による実施例1,2は、従
来例、比較例より素子収容容積比率が高く優れており、
電極位置バラツキも従来例より少なく優れていることが
分かる。
Table 1 shows that Examples 1 and 2 according to the present invention have a higher element accommodation volume ratio than the conventional example and the comparative example, and are excellent.
It can be seen that the electrode position variation is smaller than that of the conventional example and is superior.

【0024】その他の実施例を図3,4に示す。金属条
材5の形状は角柱が望ましく、好ましくは三〜六角柱で
ある。金属条材5の形状を角柱とし、角柱の側面と陽極
側内部電極6aとを導電性接着剤8で接続することで、
電気的・物理的に長期に安定した接続が可能となり、さ
らに角柱は転がりにくいので作業性を改善することがで
きる。なお、金属条材5の導出リード溶接箇所を切り欠
き加工してもよい。
Another embodiment is shown in FIGS. The shape of the metal strip 5 is desirably a prism, preferably a tri-hexagonal prism. By making the shape of the metal strip 5 a prism, and connecting the side surface of the prism and the anode-side internal electrode 6a with the conductive adhesive 8,
Electrically and physically stable connection for a long period of time is possible, and the prism is hard to roll, so that workability can be improved. Note that the lead lead welding portion of the metal strip 5 may be cut out.

【0025】実施例1、2では、電極層10の形成には
んだペーストの印刷を用いたが、銀ペースト、銀ペース
トとはんだペースト、はんだ浴へのディッピング、はん
だボール接続で構成しても良い。
In the first and second embodiments, the printing of the solder paste is used for forming the electrode layer 10. However, the electrode layer 10 may be formed by silver paste, silver paste and solder paste, dipping in a solder bath, and solder ball connection.

【0026】また、絶縁フィルムに導電板を貼り付け
後、または、導電板に絶縁性樹脂を塗布、硬化後、エッ
チング加工にて導電板の不要な部分を除去してもよい。
After the conductive plate is attached to the insulating film, or after the conductive plate is coated and cured with an insulating resin, unnecessary portions of the conductive plate may be removed by etching.

【0027】金属条材は外装樹脂9で外部と絶縁するこ
とを基本とするが、設計寸法的・製造設備の加工精度的
に外部に表出する可能性があることを見越し、実装はん
だ付け時、はんだに容易に濡れない材料が望ましく、ニ
ッケルまたはニッケル合金が好ましい。また金属条材の
表面メッキは前出の電極基板7と同じく無光沢はんだメ
ッキなどの材料を用いることができ、金属条材5の表面
にメッキ処理することで、導電性接着剤8との接続を電
気的、物理的に安定させることができる。
The metal strip material is basically insulated from the outside by the exterior resin 9, but in consideration of the possibility of being exposed to the outside due to the design dimensions and processing accuracy of the manufacturing equipment, the A material that does not easily wet with solder is desirable, and nickel or a nickel alloy is preferred. For the surface plating of the metal strip, a material such as matte solder plating can be used as in the case of the above-described electrode substrate 7, and the surface of the metal strip 5 is plated to be connected to the conductive adhesive 8. Can be electrically and physically stabilized.

【0028】なお、実施例1,2の電極基板厚みを80
μmとしたが、より薄い材料を用いた方が体積有効活用
効果が向上することは言うまでもなく、現在のリードフ
レーム材料として広く使用されているものが厚さ120
μmを中心に80μmから150μmであることに対し
いわゆるフレキシブル基板ではより薄くすることが可能
である。しかしながら基板厚みが25μm未満では基板
の剛性が弱くコンデンサの組立工程でのハンドリング性
が著しく劣化し生産性が極めて悪くなる。一方、90μ
mを超える基板厚みでは固体電解コンデンサに占める体
積比が大なるものとなり、体積効率が劣化する。よって
体積有効活用性、材料の入手性、さらにチップ状固体電
解コンデンサの生産性から電極基板厚さは25〜90μ
mの範囲が好ましい。
It should be noted that the electrode substrates of Examples 1 and 2 have a thickness of 80.
It is needless to say that the use of a thinner material improves the volume effective utilization effect.
A thickness of 80 μm to 150 μm centering on μm can be made thinner with a so-called flexible substrate. However, when the thickness of the substrate is less than 25 μm, the rigidity of the substrate is weak, and the handleability in the capacitor assembling process is significantly deteriorated, and the productivity is extremely deteriorated. On the other hand, 90μ
If the substrate thickness exceeds m, the volume ratio occupying the solid electrolytic capacitor becomes large, and the volume efficiency deteriorates. Therefore, from the viewpoint of effective volume utilization, availability of materials, and productivity of the solid electrolytic capacitor chip, the thickness of the electrode substrate is 25 to 90 μm.
The range of m is preferred.

【0029】さらに、導電板にエッチングまたはパンチ
ング加工したものを用いて、連続した複数個の電極基板
を作製し、各電極基板に複数個のコンデンサ素子を各々
接続し、一括して外装樹脂で被覆後個々のコンデンサに
切り離してもよい。
Further, a plurality of continuous electrode substrates are manufactured by using a conductive plate obtained by etching or punching, a plurality of capacitor elements are connected to each electrode substrate, and collectively covered with an exterior resin. It may be later separated into individual capacitors.

【0030】[0030]

【発明の効果】上記のとおり本発明によるチップ状コン
デンサは、少なくとも2箇所の貫通孔を有する絶縁層
と、貫通孔を覆う導電板と、貫通孔を埋める電極層とを
有する電極基板を用いることで、製品側面に導通部を設
けることなく下面に電極を形成できるので高密度実装に
対応でき、さらに内部電極と外部電極との位置を任意に
設計できるので、極めて優れた体積有効活用率を有し、
また、電極基板下面の電極層を導電性ペースト印刷、は
んだ浴へのディッピング等で形成しているため、平面度
のバラツキが少なく安定した基板搭載が可能なチップ状
固体電解コンデンサを安価に得ることができる。
As described above, the chip-shaped capacitor according to the present invention uses an electrode substrate having an insulating layer having at least two through holes, a conductive plate covering the through holes, and an electrode layer filling the through holes. Since electrodes can be formed on the lower surface without providing a conductive part on the side of the product, it can be used for high-density mounting, and the positions of the internal and external electrodes can be arbitrarily designed. And
In addition, since the electrode layer on the lower surface of the electrode substrate is formed by conductive paste printing, dipping into a solder bath, etc., it is possible to obtain a low-cost chip-shaped solid electrolytic capacitor capable of stably mounting the substrate with little variation in flatness. Can be.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施例によるチップ状固体電解コンデ
ンサの断面図である。
FIG. 1 is a cross-sectional view of a chip-shaped solid electrolytic capacitor according to an embodiment of the present invention.

【図2】本発明のその他の実施例によるチップ状固体電
解コンデンサの断面図である。
FIG. 2 is a sectional view of a chip-shaped solid electrolytic capacitor according to another embodiment of the present invention.

【図3】金属条材を六角柱とした実施例によるチップ状
固体電解コンデンサの断面図である。
FIG. 3 is a cross-sectional view of a chip-shaped solid electrolytic capacitor according to an embodiment in which a metal strip is a hexagonal column.

【図4】金属条材を三角柱とした実施例によるチップ状
固体電解コンデンサの断面図である。
FIG. 4 is a cross-sectional view of a chip-shaped solid electrolytic capacitor according to an embodiment in which a metal strip is used as a triangular prism.

【図5】従来のチップ状コンデンサの断面図である。FIG. 5 is a sectional view of a conventional chip capacitor.

【符号の説明】[Explanation of symbols]

1 導出リード 2 コンデンサ素子 3 導電板 4 絶縁層 5 金属条材 6a メッキ層(陽極側内部電極) 6b メッキ層(陽極側外部電極) 6c メッキ層(陰極側内部電極) 6d メッキ層(陰極側外部電極) 7 電極基板 8 導電性接着剤 9 外装樹脂 10 電極層 11 リードフレーム REFERENCE SIGNS LIST 1 lead-out 2 capacitor element 3 conductive plate 4 insulating layer 5 metal strip 6 a plating layer (anode internal electrode) 6 b plating layer (anode external electrode) 6 c plating layer (cathode internal electrode) 6 d plating layer (cathode external) Electrode) 7 electrode substrate 8 conductive adhesive 9 exterior resin 10 electrode layer 11 lead frame

───────────────────────────────────────────────────── フロントページの続き (72)発明者 夕日 伸夫 京都府京都市中京区御池通烏丸東入一筋目 仲保利町191番地の4 上原ビル3階 ニ チコン株式会社内 (72)発明者 諏訪 壽志 京都府京都市中京区御池通烏丸東入一筋目 仲保利町191番地の4 上原ビル3階 ニ チコン株式会社内 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Nobuo Sunset 4th floor of Uehara Bldg., 3rd floor, 191-st. Nichicon Co., Ltd., 3rd floor, Uehara Building, 191 Nakabori-cho, Oike-dori Karasuma-Higashi-iri, Nakagyo-ku, Kyoto-shi

Claims (12)

【特許請求の範囲】[Claims] 【請求項1】 導出リードを具備し、誘電体酸化皮膜、
固体電解質層、陰極引出層を形成したコンデンサ素子
と、コンデンサの電極となる電極基板と、外装樹脂を有
するチップ状固体電解コンデンサにおいて、 上記電極基板が、少なくとも2箇所の貫通孔を有する絶
縁層と、該貫通孔の一方を覆うように配置した導電板
と、貫通孔に形成された電極層とを有することを特徴と
するチップ状固体電解コンデンサ。
1. A lead oxide lead, comprising: a dielectric oxide film;
A solid electrolyte layer, a capacitor element formed with a cathode extraction layer, an electrode substrate serving as an electrode of the capacitor, and a chip-shaped solid electrolytic capacitor having an exterior resin, wherein the electrode substrate has an insulating layer having at least two through holes. A chip-shaped solid electrolytic capacitor, comprising: a conductive plate arranged to cover one of the through holes; and an electrode layer formed in the through hole.
【請求項2】 請求項1記載の電極基板が、導電板に接
するメッキ層を有し、貫通孔内のメッキ層と電極層とが
接することを特徴とするチップ状固体電解コンデンサ。
2. The solid electrolytic capacitor according to claim 1, wherein the electrode substrate according to claim 1 has a plating layer in contact with the conductive plate, and the plating layer in the through hole and the electrode layer are in contact with each other.
【請求項3】 上記電極基板が、少なくとも2箇所の貫
通孔を有する樹脂フィルムと接着層とを絶縁層とし、該
貫通孔の一方を導電板で覆った後、該導電板に接する錫
メッキまたははんだメッキからなるメッキ層を形成し、
貫通孔内のメッキ層と接するよう形成した電極層とを有
することを特徴とする請求項1記載のチップ状固体電解
コンデンサ。
3. The electrode substrate, wherein a resin film having at least two through holes and an adhesive layer are used as insulating layers, one of the through holes is covered with a conductive plate, and then tin plating or Form a plating layer consisting of solder plating,
2. The solid electrolytic capacitor according to claim 1, further comprising an electrode layer formed in contact with the plating layer in the through hole.
【請求項4】 上記樹脂フィルムがポリイミドフィルム
であり、接着層がエポキシ系接着剤からなることを特徴
とする請求項3記載のチップ状固体電解コンデンサ。
4. The solid electrolytic capacitor according to claim 3, wherein said resin film is a polyimide film, and said adhesive layer is made of an epoxy-based adhesive.
【請求項5】 上記電極基板が、少なくとも2枚の導電
板を配置し、絶縁性樹脂を塗布、硬化して絶縁層を形成
後、導電板上の絶縁性樹脂を除去して絶縁層に貫通孔を
形成し、導電板に接する錫メッキまたははんだメッキか
らなるメッキ層を形成後、貫通孔内のメッキ層と接する
よう形成した電極層とを有することを特徴とする請求項
2記載のチップ状固体電解コンデンサ。
5. The electrode substrate according to claim 1, wherein at least two conductive plates are arranged, an insulating resin is applied and cured to form an insulating layer, and then the insulating resin on the conductive plate is removed to penetrate the insulating layer. 3. The chip-shaped chip according to claim 2, further comprising: forming a hole, forming a plating layer made of tin plating or solder plating in contact with the conductive plate, and then forming an electrode layer in contact with the plating layer in the through hole. Solid electrolytic capacitor.
【請求項6】 上記絶縁性樹脂がポリイミド樹脂である
ことを特徴とする請求項5記載のチップ状固体電解コン
デンサ。
6. The solid electrolytic capacitor according to claim 5, wherein said insulating resin is a polyimide resin.
【請求項7】 上記電極基板の厚みが、25〜90μm
であることを特徴とする請求項1〜5記載のチップ状固
体電解コンデンサ。
7. The thickness of the electrode substrate is 25 to 90 μm.
The chip-shaped solid electrolytic capacitor according to claim 1, wherein:
【請求項8】 上記導出リードと一方の導電板とを金属
条材で電気的に接続したことを特徴とする請求項1〜5
記載のチップ状固体電解コンデンサ。
8. The lead wire and one of the conductive plates are electrically connected by a metal strip.
The chip-shaped solid electrolytic capacitor as described in the above.
【請求項9】 請求項9記載の金属条材がニッケルまた
はニッケル合金を母材とし、錫メッキまたははんだメッ
キを施してなることを特徴とするチップ状固体電解コン
デンサ。
9. A chip-shaped solid electrolytic capacitor according to claim 9, wherein said metal strip is made of nickel or a nickel alloy as a base material and is plated with tin or solder.
【請求項10】 上記金属条材の形状が角柱であること
を特徴とする請求項9〜10記載のチップ状固体電解コ
ンデンサ。
10. The chip-shaped solid electrolytic capacitor according to claim 9, wherein the shape of the metal strip is a prism.
【請求項11】 上記金属条材の形状が三〜六角柱であ
ることを特徴とする請求項9〜11記載のチップ状固体
電解コンデンサ。
11. The chip-shaped solid electrolytic capacitor according to claim 9, wherein the shape of the metal strip is a triangular prism to a hexagonal prism.
【請求項12】 上記導出リードと金属条材とを抵抗溶
接にて接続し、金属条材の側面と電極基板とを導電性接
着剤で接続したことを特徴とする請求項9〜12記載の
チップ状固体電解コンデンサ。
12. The method according to claim 9, wherein the lead and the metal strip are connected by resistance welding, and the side surface of the metal strip and the electrode substrate are connected by a conductive adhesive. Chip-shaped solid electrolytic capacitor.
JP2000296597A 2000-09-28 2000-09-28 Chip-shaped solid electrolytic capacitor Expired - Lifetime JP4276774B2 (en)

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004281716A (en) * 2003-03-17 2004-10-07 Nichicon Corp Chip-like solid electrolytic capacitor
JP2008198639A (en) * 2007-02-08 2008-08-28 Nichicon Corp Solid-state electrolytic capacitor
JP2009105241A (en) * 2007-10-24 2009-05-14 Nec Tokin Corp Chip type solid electrolytic capacitor and manufacturing method thereof
KR101067210B1 (en) * 2008-12-08 2011-09-22 삼성전기주식회사 Solid electrolytic capacitor
TWI485731B (en) * 2013-03-15 2015-05-21 Holy Stone Entpr Co Ltd The structure of tantalum capacitors

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004281716A (en) * 2003-03-17 2004-10-07 Nichicon Corp Chip-like solid electrolytic capacitor
JP2008198639A (en) * 2007-02-08 2008-08-28 Nichicon Corp Solid-state electrolytic capacitor
JP2009105241A (en) * 2007-10-24 2009-05-14 Nec Tokin Corp Chip type solid electrolytic capacitor and manufacturing method thereof
KR101067210B1 (en) * 2008-12-08 2011-09-22 삼성전기주식회사 Solid electrolytic capacitor
US8179665B2 (en) 2008-12-08 2012-05-15 Samsung Electro-Mechanics Co., Ltd. Solid electrolytic capacitor with increased capacitance
TWI485731B (en) * 2013-03-15 2015-05-21 Holy Stone Entpr Co Ltd The structure of tantalum capacitors

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