JP2002093833A - Method for insulation sealing of electronic component - Google Patents
Method for insulation sealing of electronic componentInfo
- Publication number
- JP2002093833A JP2002093833A JP2000326215A JP2000326215A JP2002093833A JP 2002093833 A JP2002093833 A JP 2002093833A JP 2000326215 A JP2000326215 A JP 2000326215A JP 2000326215 A JP2000326215 A JP 2000326215A JP 2002093833 A JP2002093833 A JP 2002093833A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- electronic component
- mold
- energy ray
- opening
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title abstract description 17
- 238000007789 sealing Methods 0.000 title abstract description 14
- 238000009413 insulation Methods 0.000 title abstract description 7
- 229920005989 resin Polymers 0.000 claims abstract description 42
- 239000011347 resin Substances 0.000 claims abstract description 42
- 229920006362 Teflon® Polymers 0.000 claims abstract description 11
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 6
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 6
- 239000011737 fluorine Substances 0.000 claims abstract description 6
- 239000004809 Teflon Substances 0.000 claims description 10
- 230000001678 irradiating effect Effects 0.000 abstract description 2
- 238000007650 screen-printing Methods 0.000 description 5
- 238000001721 transfer moulding Methods 0.000 description 5
- 150000001768 cations Chemical class 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 3
- 238000000465 moulding Methods 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- 229920001187 thermosetting polymer Polymers 0.000 description 2
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000009429 electrical wiring Methods 0.000 description 1
- 239000003822 epoxy resin Substances 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000002844 melting Methods 0.000 description 1
- 230000008018 melting Effects 0.000 description 1
- 229920000647 polyepoxide Polymers 0.000 description 1
Landscapes
- Encapsulation Of And Coatings For Semiconductor Or Solid State Devices (AREA)
- Credit Cards Or The Like (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、ICモジュール、
非接触ICカード等の電子部品の絶縁封止方法に関する
ものである。TECHNICAL FIELD The present invention relates to an IC module,
The present invention relates to a method for insulating and sealing electronic components such as a non-contact IC card.
【0002】[0002]
【従来の技術】従来の電子部品の絶縁封止は、熱硬化性
エポキシ樹脂を型に注入し、加熱硬化させるトランスフ
ァーモールド法や、熱ラミネートシートを加熱溶融流動
させる加熱流動法が一般的である。2. Description of the Related Art Insulation sealing of a conventional electronic component is generally performed by a transfer molding method in which a thermosetting epoxy resin is injected into a mold and heat-cured, or a heat-flow method in which a heat laminated sheet is heated and melted and flown. .
【0003】[0003]
【発明が解決しようとする課題】ところで上記従来技術
では、次のような問題があった。However, the above prior art has the following problems.
【0004】第一に、従来法では絶縁封止材料を加熱硬
化あるいは加熱流動させる方法であるが、加熱により電
子部品の電気接点や電気配線部に熱歪が生じ、断線ある
いは内部応力の原因となって、電子部品の信頼性・耐久
性を損なう原因となる。[0004] First, in the conventional method, an insulating sealing material is cured by heating or heated and flowed. However, heating causes thermal strain in electrical contacts and electrical wiring portions of electronic parts, which may cause disconnection or internal stress. As a result, the reliability and durability of the electronic component may be impaired.
【0005】第二に、トランスファーモールド法では、
封止成型面の面粗度および形状精度がよいが、装置が高
価であり扱いも簡単ではない。Second, in the transfer molding method,
Although the surface roughness and shape accuracy of the sealing molding surface are good, the device is expensive and the handling is not easy.
【0006】第三に、ラミネートシートを加熱溶融流動
させる方法は、装置は比較的安価であり、取り扱いも容
易であるが、封止成型面の面粗度、形状精度の点でトラ
ンスファーモールド法より劣る。Thirdly, the method of heating and melting and flowing the laminate sheet is relatively inexpensive and easy to handle, but the surface roughness of the sealing molding surface and the shape accuracy are lower than those of the transfer molding method. Inferior.
【0007】本発明は、上記従来技術に鑑み、電子部品
の信頼性と耐久性を向上させる、面粗度と形状精度のよ
い、取り扱いの容易な絶縁封止方法を提供することを目
的とする。SUMMARY OF THE INVENTION In view of the above prior art, it is an object of the present invention to provide an insulating and sealing method which improves the reliability and durability of electronic components, has good surface roughness and shape accuracy, and is easy to handle. .
【0008】[0008]
【0009】本発明は、絶縁封止材料との親和性の小さ
いテフロンまたはフッ素系樹脂を材料とする型、または
フッ素系樹脂被膜処理を施した型に、電子部品を装着す
る開口部を設け、該開口部からエネルギー線硬化樹脂を
該型内に充填する手段と、該樹脂を硬化させるエネルギ
ー線照射手段と、該エネルギー線照射による該樹脂硬化
後に該電子部品を該型から取り出す手段を設けたことを
特徴とする。According to the present invention, an opening for mounting an electronic component is provided in a mold made of Teflon or a fluorine-based resin having a low affinity for an insulating sealing material, or a mold treated with a fluorine-based resin coating. A means for filling the mold with an energy ray-curable resin from the opening, an energy beam irradiating means for curing the resin, and a means for removing the electronic component from the mold after curing the resin by the energy ray irradiation are provided. It is characterized by the following.
【0010】[0010]
【発明の実施の形態】以下に本発明の実施の形態を図面
に基づき詳細に説明する。本発明に基づく第一の実施例
を図1で、第二の実施例を図3で説明する。なお、図2
は図2で示す第二の実施例の対象となるICモジュール
の説明図である。Embodiments of the present invention will be described below in detail with reference to the drawings. A first embodiment according to the present invention will be described with reference to FIG. 1, and a second embodiment will be described with reference to FIG. Note that FIG.
FIG. 4 is an explanatory diagram of an IC module that is a target of the second embodiment shown in FIG.
【0011】第一の実施例を図1に基づいて説明する。A first embodiment will be described with reference to FIG.
【0012】図1(a)において、テフロン板1の上に
テフロン枠2が設置してあり、該枠2には絶縁封止前の
非接触ICカード5を装着するための複数の開口穴6が
設けてある。また、該カード5はアンテナコイル基板4
とICモジュール3とで構成されている。In FIG. 1A, a Teflon frame 2 is provided on a Teflon plate 1 and a plurality of opening holes 6 for mounting a non-contact IC card 5 before insulation sealing. Is provided. Further, the card 5 is provided with the antenna coil substrate 4.
And an IC module 3.
【0013】同図(b)において、スキージ7が該枠2
の上面に接しながら矢印aの方向に移動すると、エネル
ギー線硬化樹脂8が、該開口穴6の内部に充填されるよ
うになっている。In FIG. 1B, the squeegee 7 is
When it moves in the direction of arrow a while being in contact with the upper surface of the opening, the energy ray-curable resin 8 fills the inside of the opening 6.
【0014】同図(c)において、紫外線ランプ、熱線
ランプ等のエネルギー線照射ランプ9より照射されるエ
ネルギー線10によって、該開口穴6の内部に充填され
たエネルギー線硬化樹脂が硬化されるようになってい
る。In FIG. 1C, an energy ray 10 emitted from an energy ray irradiation lamp 9 such as an ultraviolet lamp or a heat ray lamp cures the energy ray-curable resin filled in the opening 6. It has become.
【0015】同図(d)において、該樹脂8は硬化して
硬化樹脂11となっており、該枠2及び該板1はテフロ
ンを材料とするので、該樹脂8または11との親和性が
小さい。そのため、該枠2を矢印b方向に持ち上げるこ
とによって、該樹脂11と一体となった該カードを該板
1、該枠2から分離して容易に取り出すことができる。In FIG. 1D, the resin 8 is cured to form a cured resin 11. Since the frame 2 and the plate 1 are made of Teflon, the affinity with the resin 8 or 11 is low. small. Therefore, by raising the frame 2 in the direction of arrow b, the card integrated with the resin 11 can be separated from the plate 1 and the frame 2 and easily taken out.
【0016】なお、エネルギー線硬化樹脂8としては、
紫外線硬化樹脂、及びエネルギー線照射によって硬化反
応が開始され、カチオンまたはカチオンと反応熱の伝播
によって硬化反応が進行する樹脂等を含み、エネルギー
線硬化樹脂の種類は特に限定しないものとする。The energy ray curable resin 8 includes:
The type of the energy ray-curable resin is not particularly limited, including a UV-curable resin, a resin whose curing reaction is initiated by irradiation with energy rays, and a curing reaction that proceeds by propagation of cations or cations and reaction heat.
【0017】第二の実施例を図2と図3に従って説明す
る。図2は第二の実施例の適用対象としての接触式IC
カード用ICモジュールの構造説明図である。A second embodiment will be described with reference to FIGS. FIG. 2 shows a contact type IC to which the second embodiment is applied.
FIG. 3 is a structural explanatory view of a card IC module.
【0018】図2(a)は絶縁封止前の接触式ICカー
ド用ICモジュール12の構成を示し、同図(b)は硬
化樹脂11で絶縁封止された該モジュール12を示す。FIG. 2A shows the structure of the contact type IC card IC module 12 before insulation sealing, and FIG. 2B shows the module 12 insulated and sealed with the cured resin 11.
【0019】同図(a)において、CPUチップ13は
バンプ(電気接点)14a、基板16上のパターン電極
15及び貫通電極17を介してパターン電極18と接続
されており、また、バンプ14b、パターン電極24及
びバンプ20bを介して、メモリーチップ19と接続さ
れている。In FIG. 1A, a CPU chip 13 is connected to a pattern electrode 18 via a bump (electric contact) 14a, a pattern electrode 15 and a through electrode 17 on a substrate 16, and a bump 14b, a pattern It is connected to the memory chip 19 via the electrode 24 and the bump 20b.
【0020】該メモリーチップ19は、バンプ20a、
パターン電極21及び貫通電極22を介して、パターン
電極23と接続されている。The memory chip 19 has bumps 20a,
It is connected to the pattern electrode 23 via the pattern electrode 21 and the through electrode 22.
【0021】同図(b)に示すように、該モジュール1
2は硬化樹脂11で絶縁封止されて絶縁封止後の接触式
ICカード25となる。パターン電極18および23は
露出して絶縁封止されてなく、このパターン電極部が接
触式ICカードの外部接触端子となる。As shown in FIG. 2B, the module 1
Reference numeral 2 denotes a contact type IC card 25 which is insulated and sealed by the cured resin 11 and insulated and sealed. The pattern electrodes 18 and 23 are exposed and not insulated and sealed, and this pattern electrode portion serves as an external contact terminal of the contact IC card.
【0022】図3(a)において、絶縁封止前のICモ
ジュール12は、テフロン板1の上、テフロン枠2の開
口穴6の中に装着されている。ここで、該パターン電極
18及び23の表面は、該枠2の上面と同一高さとなっ
ている。In FIG. 3A, the IC module 12 before insulation sealing is mounted on the Teflon plate 1 and in the opening 6 of the Teflon frame 2. Here, the surfaces of the pattern electrodes 18 and 23 are at the same height as the upper surface of the frame 2.
【0023】次に、同図(b)に示すように、スクリー
ン印刷装置26が、該枠2の上面に接触して装着される
ようになっている。Next, as shown in FIG. 1B, a screen printing device 26 is mounted in contact with the upper surface of the frame 2.
【0024】該スクリーン印刷装置26は、枠27、枠
27の下面に接着されたメッシュ28、該メッシュ28
に光硬化樹脂で形成された硬化膜29、及びスキージ7
で構成される。該硬化膜29は、該開口穴6の上には形
成されていないが、該パターン電極18と23の上には
形成されている。The screen printing device 26 includes a frame 27, a mesh 28 bonded to the lower surface of the frame 27,
Cured film 29 formed of a photo-curable resin, and squeegee 7
It consists of. The cured film 29 is not formed on the opening 6, but is formed on the pattern electrodes 18 and 23.
【0025】該スキージ7が矢印a方向に移動すると、
エネルギー線硬化樹脂8が該開口穴6の内部に充填され
るようになっている。When the squeegee 7 moves in the direction of arrow a,
The energy ray curable resin 8 is filled in the opening 6.
【0026】次に、該スクリーン印刷装置26を取り外
した後、同図(c)に示すように、エネルギー線照射ラ
ンプ9によりエネルギー線10を該エネルギー線硬化樹
脂8に対して照射するようになっている。Next, after the screen printing device 26 is removed, as shown in FIG. 1C, the energy ray irradiation lamp 9 irradiates the energy ray 10 to the energy ray curing resin 8. ing.
【0027】同図(d)に示すように、該エネルギー線
硬化樹脂8が該エネルギー線10によって硬化して、硬
化樹脂11となると、該枠2は矢印b方向に持ち上げら
れるようになっている。As shown in FIG. 2D, when the energy ray-curable resin 8 is cured by the energy rays 10 to become a cured resin 11, the frame 2 is lifted in the direction of arrow b. .
【0028】ここで、該板1及び該枠2の材料はテフロ
ンであり、該エネルギー線硬化樹脂8との親和性が小さ
いため、該硬化樹脂11との分離が容易である。Here, the material of the plate 1 and the frame 2 is Teflon, which has a low affinity with the energy ray-curable resin 8, so that it can be easily separated from the cured resin 11.
【0029】なお、エネルギー線硬化樹脂8としては、
紫外線硬化樹脂、及びエネルギー線照射によって硬化反
応が開始され、カチオンまたはカチオンと反応熱の伝播
によって硬化反応が進行する樹脂等を含み、エネルギー
線硬化樹脂の種類は特に限定しないものとする。The energy ray-curable resin 8 includes:
The type of the energy ray-curable resin is not particularly limited, including a UV-curable resin, a resin whose curing reaction is initiated by irradiation with energy rays, and a curing reaction that proceeds by propagation of cations or cations and reaction heat.
【0030】[0030]
【発明の効果】以上実施の形態と共に具体的に説明した
ように、本発明では紫外線、白色光等のエネルギー線の
照射によって絶縁封止樹脂を硬化させるため、電子部品
及び電子部品の電気接点部に与える熱歪を小さくするこ
とができるので、電子部品の信頼性を向上させる。As described above in detail with the embodiments, in the present invention, the insulating sealing resin is cured by irradiation of energy rays such as ultraviolet rays and white light, so that the electronic parts and the electric contact parts of the electronic parts are hardened. Since the thermal strain applied to the electronic component can be reduced, the reliability of the electronic component is improved.
【0031】また従来、トランスファーモールド法など
の熱硬化性樹脂モールド法では、装置が大掛かりな高価
なものとなっているが、本発明を実現する装置もスクリ
ーン印刷装置またはスキージを用いた充填装置などの簡
素なものとなる。Conventionally, a thermosetting resin molding method such as a transfer molding method requires a large-scale and expensive apparatus. However, an apparatus for realizing the present invention is also a screen printing apparatus or a filling apparatus using a squeegee. Becomes simple.
【0032】上記手法を採用したため、本発明によるI
Cカード及びICカードの製造方法では、次の(1)〜
(4)の効果を奏し、ICカード信頼性、耐久性、品質
の向上と製造コストの低減に寄与する。By adopting the above method, the I
In the method of manufacturing a C card and an IC card, the following (1) to
The effect of (4) is achieved, which contributes to improvement in reliability, durability, and quality of the IC card and reduction in manufacturing cost.
【0033】また、図1で示した第一の実施例のよう
に、スキージによってエネルギー線硬化樹脂の表面を平
滑化することができるため、トランスファーモールド法
に匹敵する表面品質を簡便な方法・装置で実現すること
ができるので、中小企業、ジョブショップ等、設備投資
資金力の小さい企業でも容易に導入することが可能とな
り、IT産業の普及に寄与する。Further, as in the first embodiment shown in FIG. 1, since the surface of the energy ray-curable resin can be smoothed by a squeegee, a surface quality comparable to that of the transfer molding method can be obtained by a simple method and apparatus. Therefore, even small companies such as small and medium-sized enterprises and job shops, which have a small capital investment capital, can easily introduce the system and contribute to the spread of the IT industry.
【図1】本発明の実施形態に係る第一の実施例としての
非接触ICカードの絶縁封止方法を示す図。FIG. 1 is a diagram showing a method for insulating and sealing a non-contact IC card as a first example according to an embodiment of the present invention.
【図2】本発明の実施形態に係る第二の実施例の対象と
しての接触式ICカードの構成説明図。FIG. 2 is a configuration explanatory view of a contact type IC card as a target of a second example according to the embodiment of the present invention.
【図3】本発明の実施形態に係る第二の実施例としての
接触式ICカードの絶縁封止方法を示す図。FIG. 3 is a view showing a method of insulating and sealing a contact type IC card as a second example according to the embodiment of the present invention.
1 テフロン板 2 テフロン枠 5 非接触式ICカード 6 開口穴 7 スキージ 8 エネルギー線硬化樹脂 9 エネルギー線照射ランプ 10 エネルギー線 26 スクリーン印刷装置 DESCRIPTION OF SYMBOLS 1 Teflon board 2 Teflon frame 5 Non-contact type IC card 6 Opening hole 7 Squeegee 8 Energy ray curing resin 9 Energy ray irradiation lamp 10 Energy ray 26 Screen printing device
Claims (1)
型、またはフッ素系樹脂被膜処理を施した型に、電子部
品を装着する開口部を設け、該開口部からエネルギー線
硬化樹脂を該型内に充填する手段と、該樹脂を硬化させ
るエネルギー線照射手段と、該エネルギー線照射による
該樹脂硬化後に該電子部品を該型から取り出す手段を設
けたことを特徴とする電子部品の絶縁封止方法An opening for mounting an electronic component is provided in a mold made of Teflon or a fluorine-based resin or a mold treated with a fluorine-based resin, and an energy ray-curable resin is supplied from the opening into the mold. And an energy beam irradiation means for curing the resin, and a means for removing the electronic component from the mold after the resin is cured by the energy beam irradiation.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000326215A JP2002093833A (en) | 2000-09-19 | 2000-09-19 | Method for insulation sealing of electronic component |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2000326215A JP2002093833A (en) | 2000-09-19 | 2000-09-19 | Method for insulation sealing of electronic component |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002093833A true JP2002093833A (en) | 2002-03-29 |
Family
ID=18803440
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2000326215A Pending JP2002093833A (en) | 2000-09-19 | 2000-09-19 | Method for insulation sealing of electronic component |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2002093833A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011528858A (en) * | 2008-07-24 | 2011-11-24 | ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング | Seal frame and method for covering components |
-
2000
- 2000-09-19 JP JP2000326215A patent/JP2002093833A/en active Pending
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2011528858A (en) * | 2008-07-24 | 2011-11-24 | ローベルト ボツシユ ゲゼルシヤフト ミツト ベシユレンクテル ハフツング | Seal frame and method for covering components |
US8833726B2 (en) | 2008-07-24 | 2014-09-16 | Robert Bosch Gmbh | Sealing frame and method for covering a component |
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