JP2002092990A - Method for manufacturing optical information recording medium and optical information recording medium - Google Patents
Method for manufacturing optical information recording medium and optical information recording mediumInfo
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- JP2002092990A JP2002092990A JP2000283658A JP2000283658A JP2002092990A JP 2002092990 A JP2002092990 A JP 2002092990A JP 2000283658 A JP2000283658 A JP 2000283658A JP 2000283658 A JP2000283658 A JP 2000283658A JP 2002092990 A JP2002092990 A JP 2002092990A
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- Prior art keywords
- optical information
- information recording
- recording medium
- layer
- manufacturing
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- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- Optical Record Carriers And Manufacture Thereof (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Thermal Transfer Or Thermal Recording In General (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は、光情報記録媒体の
製造方法及び光情報記録媒体に関し、詳細には、相変化
材料を用いた光情報記録媒体の製造方法及び光情報記録
媒体に関する。The present invention relates to a method for manufacturing an optical information recording medium and an optical information recording medium, and more particularly to a method for manufacturing an optical information recording medium using a phase change material and an optical information recording medium.
【０００２】[0002]
【従来の技術】相変化材料からなる記録層を備えた光情
報記録媒体は、サブミクロンオーダーの光スポットに集
光したレーザビームが微小時間照射されて、微小な照射
部が局部的に所定の温度に加熱されると、照射部に原子
結合状態の変化が生じる。照射部は、結晶化温度以上に
上昇すると、結晶状態に転換し、融点以上に温度上昇す
ると、アモルファス化する。したがって、相変化材料か
らなる記録層を備えた光情報記録媒体は、このようなア
モルファス相（非晶質）、結晶相（結晶質）のいずれか
を記録状態、消去状態（未記録状態）と設定すること
で、可逆的な情報の記録及び消去を行うことができ、ま
た、このような記録層は、アモルファス相と結晶相とで
光学的な特性が異なるため、この特性差を光学的に検出
することで信号の検出（再生）を行うことができる。な
お、記録層の相変化を情報の記録に利用する光情報記録
媒体としては、アモルファス相−結晶相間の相変化を利
用するものだけでなく、結晶状態の高温相と低温相の相
変化を利用するものがある。この場合に、高温相をアモ
ルファス相、低温相を結晶相として、上記アモルファス
相と結晶相の場合と同様に取り扱うことができる。2. Description of the Related Art An optical information recording medium having a recording layer made of a phase-change material is irradiated with a laser beam focused on a submicron-order light spot for a short period of time. When heated to a temperature, a change in the state of atomic bonding occurs in the irradiated part. When the temperature rises above the crystallization temperature, the irradiated part changes to a crystalline state, and when the temperature rises above the melting point, it becomes amorphous. Therefore, an optical information recording medium provided with a recording layer made of a phase change material is capable of converting any of such an amorphous phase (amorphous) and a crystalline phase (crystalline) into a recorded state and an erased state (unrecorded state). By setting, recording and erasing of reversible information can be performed, and since such a recording layer has different optical characteristics between the amorphous phase and the crystalline phase, the difference in characteristics can be optically determined. By detecting, the signal can be detected (reproduced). Optical information recording media that use the phase change of the recording layer for information recording use not only a phase change between an amorphous phase and a crystalline phase but also a phase change between a high temperature phase and a low temperature phase in a crystalline state. There is something to do. In this case, the high-temperature phase can be treated as the amorphous phase and the low-temperature phase as the crystalline phase, and can be handled in the same manner as the amorphous phase and the crystalline phase.
【０００３】そして、記録層のアモルファス相と結晶相
の相変化を利用した光情報記録媒体は、ＡｇＩｎＳｂＴ
ｅやＧｅＳｂＴｅ等の記録層が、スパッタリング成膜の
直後は、通常、非晶質であり、光情報記録媒体では、未
記録部を結晶質、記録部を非晶質としているため、情報
の記録を行う前提として、記録層を予め結晶状態に転換
する、いわゆる初期化を行う必要がある。An optical information recording medium utilizing a phase change between an amorphous phase and a crystalline phase of a recording layer is made of AgInSbT.
The recording layer such as e or GeSbTe is usually amorphous immediately after the film formation by sputtering, and in an optical information recording medium, the unrecorded portion is crystalline and the recorded portion is amorphous. It is necessary to perform a so-called initialization in which the recording layer is converted to a crystalline state in advance.
【０００４】この初期化の方法としては、従来、一般
に、大出力のレーザービームを光情報記録媒体の記録層
に逐次照射することで、結晶化させる方法が採用されて
いる。ところが、この初期化方法にあっては、全面初期
化するのに、数十秒という長時間を要し、生産性が悪い
という問題があった。Conventionally, as a method of the initialization, a method of crystallizing the recording layer of the optical information recording medium by sequentially irradiating the recording layer of the optical information recording medium with a high output laser beam has been generally adopted. However, in this initialization method, it takes a long time of several tens of seconds to initialize the entire surface, and there is a problem that productivity is poor.
【０００５】また、基板成形やスパッタ等の他工程との
スループットの整合性を取るためには、初期化装置を多
数台必要とし、例えば、追記型光情報記録媒体の生産ラ
イン等に比較して、コンパクトな生産ラインを実現する
ための大きな弊害となっている。[0005] Further, in order to ensure the consistency of throughput with other processes such as substrate molding and sputtering, a large number of initialization devices are required. For example, compared with a write-once optical information recording medium production line, etc. , Which is a major detriment to achieving a compact production line.
【０００６】そこで、従来、高出力のフラッシュランプ
を用いて、記録層を一括して結晶化させて、初期化を短
時間に行う方法が提案されている（特開昭６３−２６１
５５３号公報等参照）。Therefore, there has been proposed a method of initializing the recording layer in a short time by crystallizing the recording layer at a time using a high-power flash lamp (Japanese Patent Laid-Open No. 63-261).
553).
【０００７】ところが、フラッシュランプを使用した初
期化方法にあっては、上記レーザービームを用いた初期
化方法に比較して、記録層を完全に結晶化することが難
しく、また、記録層の結晶化状態を均一にするのに必要
なエネルギーを与えることが非常に困難であることが実
験的に知られている。However, in the initialization method using a flash lamp, it is more difficult to completely crystallize the recording layer than in the initialization method using a laser beam. It is experimentally known that it is very difficult to provide the energy required to make the state of formation uniform.
【０００８】そこで、従来、結晶−アモルファス間の相
変化を生じる記録薄膜層を基板上に備えた光学的情報記
録媒体にフラッシュ光を照射し、上記記録薄膜の所定の
部分を一括して初期化状態である結晶状態に転換する方
法であって、上記光学的情報記録媒体を所定の位置に支
持する工程と、フラッシュ光源に供給する電気エネルギ
ーを蓄積回路部に充電する工程と、上記フラッシュ光源
にトリガをかけて発光を開始させる工程と、上記発光を
所定の時間継続させた後、上記フラッシュ光源に接続さ
れた遮断回路部を作動させ、上記放電を強制的に瞬時に
終了させて発光強度を実質的にゼロレベルまで降下させ
る工程とを備えている光学的情報記録媒体の初期化方法
が提案されている（特開平８−１５３３４３号公報参
照）。Therefore, conventionally, a flash light is applied to an optical information recording medium having a recording thin film layer on which a phase change between crystal and amorphous occurs on a substrate, and a predetermined portion of the recording thin film is collectively initialized. A method of converting the optical information recording medium to a predetermined state, a step of supporting the optical information recording medium at a predetermined position, a step of charging an electric energy supplied to a flash light source to a storage circuit unit, and a step of: A step of starting light emission by applying a trigger, and after continuing the light emission for a predetermined time, actuating a cut-off circuit unit connected to the flash light source, forcibly terminating the discharge instantaneously and reducing the light emission intensity. There has been proposed a method of initializing an optical information recording medium having a step of lowering to substantially zero level (see Japanese Patent Application Laid-Open No. 8-153343).
【０００９】すなわち、この光学的情報記録媒体の初期
化方法は、フラッシュ光源の出力を精密に制御して、記
録層の結晶化状態を均一かつ完全に行おうとしている。In other words, this method for initializing an optical information recording medium attempts to precisely and precisely control the output of the flash light source so that the crystallization state of the recording layer is uniform and complete.
【００１０】[0010]
【発明が解決しようとする課題】しかしながら、上記特
開平８−１５３３４３号公報記載の初期化方法にあって
は、光情報記録媒体の記録層を均一に結晶化するために
は、装置が大掛かりになり、また、均一性を求めると、
初期化に長時間を必要とするという問題がある。さら
に、上記従来の初期化方法にあっては、短時間で結晶化
しようとすると、大きなエネルギーを短時間に付与する
必要があるため、光情報記録媒体の基板の変形や記録層
のクラックによる破壊を引き起こすおそれがある。すな
わち、ＤＶＤのように０．６ｍｍと薄い基板を使用した
光情報記録媒体において、基板の変形が顕著になり、い
かに基板に変形を生じさせることなく、光情報記録媒体
を初期化するかが重要な課題となっている。However, in the initialization method described in Japanese Patent Application Laid-Open No. 8-153343, a large-scale apparatus is required to uniformly crystallize the recording layer of the optical information recording medium. And when seeking uniformity,
There is a problem that a long time is required for initialization. Furthermore, in the above-mentioned conventional initialization method, when attempting to crystallize in a short time, it is necessary to apply a large amount of energy in a short time, so that the substrate of the optical information recording medium is deformed or the recording layer is broken by cracks. May cause That is, in an optical information recording medium using a substrate as thin as 0.6 mm, such as a DVD, the substrate is significantly deformed, and it is important to initialize the optical information recording medium without causing the substrate to be deformed. Is an important issue.
【００１１】また、上記従来の初期化方法は、いずれの
方法にあっても、光情報記録媒体の生産工程中に、記録
層の初期化工程を含むことを前提としており、初期化シ
ステムの構築に莫大な投資を必要とする。また、その高
速化においては、基板機械特性の劣化等が伴うため、生
産性の向上を図ることが極めて困難である。In addition, the above-mentioned conventional initialization method is premised on including an initialization step of a recording layer in a production process of an optical information recording medium in any method. Requires a huge investment. Further, the increase in the speed is accompanied by deterioration of the mechanical properties of the substrate and the like, so that it is extremely difficult to improve the productivity.
【００１２】さらに、近時、結晶化促進層を設けて、初
期化工程を省くことが提案されているが（特開平１１−
９６５９６号公報参照）、この公報では、記録層にＡｇ
−Ｉｎ−Ｓｂ−Ｔｅを用いた場合の具体的な記述がな
く、また、単に結晶化促進層を用いるだけでは、確実に
記録層を結晶化できるとは限らず、信頼性に問題があっ
た。Furthermore, it has recently been proposed to provide a crystallization promoting layer to omit the initialization step (Japanese Patent Laid-Open No.
No. 96596), and in this publication, Ag is added to the recording layer.
There is no specific description in the case of using -In-Sb-Te, and simply using the crystallization promoting layer does not always ensure that the recording layer can be crystallized, and has a problem in reliability. .
【００１３】そこで、請求項１記載の発明は、基板上
に、少なくとも第１誘電体層、結晶化促進層、記録層、
第２誘電体層及び反射放熱層が積層され、前記記録層
が、Ａｇ、Ｉｎ、Ｓｂ、Ｔｅを主要な構成元素である光
情報記録媒体を製造するに際して、記録層の成膜中、あ
るいは、成膜後の少なくともいずれかの工程で、所定波
長の光照射を行うことにより、膜形成段階で、記録層に
照射した光のフォトンエネルギーを補助的に利用して、
結晶化促進層だけでは不十分な記録層の結晶化を確実か
つ安価に行い、生産性を向上させることのできる光情報
記録媒体の製造方法を提供することを目的としている。Therefore, the invention according to claim 1 provides at least a first dielectric layer, a crystallization promoting layer, a recording layer,
A second dielectric layer and a reflective heat dissipation layer are laminated, and the recording layer is formed during formation of the recording layer when manufacturing an optical information recording medium in which Ag, In, Sb, and Te are main constituent elements, or In at least one of the steps after film formation, by irradiating light of a predetermined wavelength, in the film formation stage, by utilizing the photon energy of the light irradiated on the recording layer,
An object of the present invention is to provide a method for manufacturing an optical information recording medium capable of reliably and inexpensively crystallizing a recording layer, which is insufficient with a crystallization promoting layer alone, and improving the productivity.
【００１４】請求項２記載の発明は、記録層に光照射す
る光の波長として、４００μｍ以上の波長を用いること
により、光吸収波長帯が４００ｎｍ以下であるポリカー
ボネート等の基板の影響を少なくして、記録層に照射し
た光のフォトンエネルギーをより効率的に利用して、結
晶化促進層だけでは不十分な記録層の結晶化をより一層
確実かつ安価に行い、より一層生産性を向上させること
のできる光情報記録媒体の製造方法を提供することを目
的としている。According to a second aspect of the present invention, by using a wavelength of 400 μm or more as the wavelength of light for irradiating the recording layer, the influence of a substrate such as polycarbonate having a light absorption wavelength band of 400 nm or less can be reduced. To more efficiently and efficiently use the photon energy of light applied to the recording layer to more reliably and inexpensively crystallize the recording layer, which is insufficient with the crystallization promoting layer alone, to further improve productivity. It is an object of the present invention to provide a method for manufacturing an optical information recording medium which can be performed.
【００１５】請求項３記載の発明は、光照射を、基板を
回転させつつ、記録層の成膜面側から行うことにより、
基板を通すことなく直接記録層に光照射を行うととも
に、光源の形状にかかわらず成膜範囲に均一に光照射を
行い、結晶化促進層だけでは不十分な記録層の結晶化を
より一層確実かつ安価に行い、より一層生産性を向上さ
せることのできる光情報記録媒体の製造方法を提供する
ことを目的としている。According to a third aspect of the present invention, the light irradiation is performed from the film forming surface side of the recording layer while rotating the substrate.
Irradiates light directly to the recording layer without passing through the substrate, and evenly irradiates the film formation area irrespective of the shape of the light source, further ensuring the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone Another object of the present invention is to provide a method for manufacturing an optical information recording medium which can be performed at low cost and can further improve productivity.
【００１６】請求項４記載の発明は、基板の裏面側に、
光照射された光を当該光の波長に対して反射率が７０％
以上を有する部材を設けることにより、照射された光が
当該部材で反射させて再度記録層に照射させ、結晶化促
進層だけでは不十分な記録層の結晶化をより一層確実か
つ安価に行い、より一層生産性を向上させることのでき
る光情報記録媒体の製造方法を提供することを目的とし
ている。According to a fourth aspect of the present invention, on the back side of the substrate,
The light irradiated has a reflectance of 70% with respect to the wavelength of the light.
By providing a member having the above, the irradiated light is reflected by the member and irradiate the recording layer again, and the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, is performed more reliably and inexpensively, It is an object of the present invention to provide a method for manufacturing an optical information recording medium capable of further improving productivity.
【００１７】請求項５記載の発明は、結晶化促進層を、
ＢｉまたはＢｉ−Ｔｅを材料として形成することによ
り、膜形成段階で、結晶化促進層により記録層をより一
層確実かつ安価に結晶化させ、より一層生産性を向上さ
せることのできる光情報記録媒体の製造方法を提供する
ことを目的としている。According to a fifth aspect of the present invention, the crystallization promoting layer comprises:
By forming Bi or Bi-Te as a material, an optical information recording medium that can more reliably and inexpensively crystallize a recording layer by a crystallization promoting layer at a film formation stage and further improve productivity. The purpose of the present invention is to provide a manufacturing method.
【００１８】請求項６記載の発明は、結晶化促進層を、
ＳｂまたはＳｂ−Ｔｅを材料として形成することによ
り、膜形成段階で、結晶化促進層により記録層をより一
層確実かつ安価に結晶化させ、より一層生産性を向上さ
せることのできる光情報記録媒体の製造方法を提供する
ことを目的としている。According to a sixth aspect of the present invention, the crystallization promoting layer comprises:
By forming Sb or Sb-Te as a material, an optical information recording medium that can more reliably and inexpensively crystallize a recording layer by a crystallization promoting layer at a film formation stage and further improve productivity. The purpose of the present invention is to provide a manufacturing method.
【００１９】請求項７記載の発明は、結晶化促進層を、
その膜厚が２ｎｍから６ｎｍの厚さに形成することによ
り、最終的に記録層と混在する可能性が高く、かつ、記
録層と材料の異なる結晶化促進層を可能な限り薄くし
て、記録層材料への影響を少なくし、記録層の結晶化を
より一層確実かつ安価に行って、より一層生産性を向上
させることのできる光情報記録媒体の製造方法を提供す
ることを目的としている。According to a seventh aspect of the present invention, the crystallization promoting layer comprises:
By forming the film to a thickness of 2 nm to 6 nm, it is highly possible that the film is finally mixed with the recording layer, and the crystallization promoting layer made of a different material from the recording layer is made as thin as possible. It is an object of the present invention to provide a method for manufacturing an optical information recording medium capable of reducing the influence on a layer material, crystallization of a recording layer more reliably and inexpensively, and further improving productivity.
【００２０】請求項８記載の発明は、結晶化促進層を、
その膜厚が５ｎｍから１０ｎｍの厚さに形成することに
より、最終的に記録層と混在する可能性の高い結晶化促
進層を可能な限り薄くして、記録層材料への影響を少な
くし、記録層の結晶化をより一層確実かつ安価に行っ
て、より一層生産性を向上させることのできる光情報記
録媒体の製造方法を提供することを目的としている。According to the invention of claim 8, the crystallization promoting layer comprises
By forming the film to have a thickness of 5 nm to 10 nm, the crystallization promoting layer which is likely to be finally mixed with the recording layer is made as thin as possible to reduce the influence on the recording layer material, It is an object of the present invention to provide a method for manufacturing an optical information recording medium that can more reliably and inexpensively crystallize a recording layer and can further improve productivity.
【００２１】請求項９記載の発明は、結晶化促進層を、
５ｎｍ／ｓｅｃ以下の範囲の成膜レートで成膜すること
により、結晶化促進層の膜厚を精度よく制御し、記録層
の結晶化をより一層確実かつ安価に行って、より一層生
産性を向上させることのできる光情報記録媒体の製造方
法を提供することを目的としている。According to a ninth aspect of the present invention, the crystallization promoting layer comprises:
By forming the film at a film formation rate in the range of 5 nm / sec or less, the thickness of the crystallization promoting layer can be accurately controlled, and the crystallization of the recording layer can be performed more reliably and inexpensively, and the productivity can be further improved. It is an object of the present invention to provide a method for manufacturing an optical information recording medium that can be improved.
【００２２】請求項１０記載の発明は、請求項１から請
求項９のいずれかの光情報記録媒体の製造方法で製造す
ることにより、膜形成段階で、記録層に照射した光のフ
ォトンエネルギーを補助的に利用して、結晶化促進層だ
けでは不十分な記録層の結晶化を確実かつ安価に行い、
生産性を向上させることのできる光情報記録媒体を提供
することを目的としている。According to a tenth aspect of the present invention, by manufacturing the optical information recording medium according to any one of the first to ninth aspects, the photon energy of the light applied to the recording layer in the film forming step is reduced. By using the auxiliary, the crystallization of the recording layer, which is not sufficient with the crystallization promoting layer alone, is performed reliably and at low cost.
It is an object of the present invention to provide an optical information recording medium capable of improving productivity.
【００２３】[0023]
【課題を解決するための手段】請求項１記載の発明の光
情報記録媒体の製造方法は、基板上に、少なくとも第１
誘電体層、結晶化促進層、記録層、第２誘電体層及び反
射放熱層が積層され、前記記録層が、Ａｇ、Ｉｎ、Ｓ
ｂ、Ｔｅを主要な構成元素である光情報記録媒体の製造
方法であって、前記記録層の成膜中、あるいは、成膜後
の少なくともいずれかの工程で、所定波長の光照射を行
うことにより、上記目的を達成している。According to a first aspect of the present invention, there is provided a method of manufacturing an optical information recording medium, comprising the steps of:
A dielectric layer, a crystallization promoting layer, a recording layer, a second dielectric layer and a reflective heat dissipation layer are laminated, and the recording layer is made of Ag, In, S
A method for manufacturing an optical information recording medium in which b and Te are main constituent elements, wherein light irradiation of a predetermined wavelength is performed during or at least one of the steps of forming the recording layer. Achieves the above object.
【００２４】上記構成によれば、基板上に、少なくとも
第１誘電体層、結晶化促進層、記録層、第２誘電体層及
び反射放熱層が積層され、前記記録層が、Ａｇ、Ｉｎ、
Ｓｂ、Ｔｅを主要な構成元素である光情報記録媒体を製
造するに際して、記録層の成膜中、あるいは、成膜後の
少なくともいずれかの工程で、所定波長の光照射を行う
ので、膜形成段階で、記録層に照射した光のフォトンエ
ネルギーを補助的に利用して、結晶化促進層だけでは不
十分な記録層の結晶化を確実かつ安価に行うことがで
き、生産性を向上させることができる。According to the above structure, at least a first dielectric layer, a crystallization promoting layer, a recording layer, a second dielectric layer and a reflective heat dissipation layer are laminated on a substrate, and the recording layer is made of Ag, In,
In manufacturing an optical information recording medium in which Sb and Te are main constituent elements, light irradiation of a predetermined wavelength is performed during or at least one of the steps after the formation of the recording layer. At the stage, by utilizing the photon energy of the light applied to the recording layer in an auxiliary manner, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed reliably and at low cost, and the productivity is improved. Can be.
【００２５】この場合、例えば、請求項２に記載するよ
うに、前記光照射する光の波長は、４００ｎｍ以上の波
長であってもよい。In this case, for example, the wavelength of the light to be irradiated may be a wavelength of 400 nm or more.
【００２６】上記構成によれば、記録層に光照射する光
の波長として、４００μｍ以上の波長を用いるので、光
吸収波長帯が４００ｎｍ以下であるポリカーボネート等
の基板の影響を少なくして、記録層に照射した光のフォ
トンエネルギーをより効率的に利用して、結晶化促進層
だけでは不十分な記録層の結晶化をより一層確実かつ安
価に行うことができ、より一層生産性を向上させること
ができる。According to the above arrangement, since the wavelength of light for irradiating the recording layer with light is 400 μm or more, the influence of a substrate made of polycarbonate or the like having a light absorption wavelength band of 400 nm or less is reduced, and The photon energy of the light applied to the recording layer, the crystallization of the recording layer, which is not sufficient with the crystallization promoting layer alone, can be performed more reliably and at lower cost, and the productivity is further improved. Can be.
【００２７】また、例えば、請求項３に記載するよう
に、前記光照射は、前記基板を回転させつつ、前記記録
層の成膜面側から行ってもよい。Also, for example, the light irradiation may be performed from the film forming surface side of the recording layer while rotating the substrate.
【００２８】上記構成によれば、光照射を、基板を回転
させつつ、記録層の成膜面側から行うので、基板を通す
ことなく直接記録層に光照射を行うとともに、光源の形
状にかかわらず成膜範囲に均一に光照射を行って、結晶
化促進層だけでは不十分な記録層の結晶化をより一層確
実かつ安価に行うことができ、より一層生産性を向上さ
せることができる。According to the above configuration, since the light irradiation is performed from the film forming surface side of the recording layer while rotating the substrate, the light irradiation is performed directly on the recording layer without passing through the substrate, and regardless of the shape of the light source. By uniformly irradiating light to the film formation range, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed more reliably and inexpensively, and the productivity can be further improved.
【００２９】さらに、例えば、請求項４に記載するよう
に、前記基板の裏面側に、前記光照射された光を当該光
の波長に対して反射率が７０％以上を有する部材を設け
てもよい。Further, for example, a member having a reflectance of 70% or more with respect to the wavelength of the irradiated light may be provided on the back surface of the substrate. Good.
【００３０】上記構成によれば、基板の裏面側に、光照
射された光を当該光の波長に対して反射率が７０％以上
を有する部材を設けているので、照射された光が当該部
材で反射させて再度記録層に照射させて、結晶化促進層
だけでは不十分な記録層の結晶化をより一層確実かつ安
価に行うことができ、より一層生産性を向上させること
ができる。According to the above arrangement, since the member having a reflectance of 70% or more with respect to the wavelength of the irradiated light is provided on the back surface side of the substrate, the irradiated light is reflected by the member. Then, the recording layer is re-irradiated, and the recording layer is irradiated again. Thus, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed more reliably and at lower cost, and the productivity can be further improved.
【００３１】また、例えば、請求項５に記載するよう
に、前記結晶化促進層は、ＢｉまたはＢｉ−Ｔｅを材料
として形成されていてもよい。Also, for example, the crystallization promoting layer may be formed using Bi or Bi-Te as a material.
【００３２】上記構成によれば、結晶化促進層を、Ｂｉ
またはＢｉ−Ｔｅを材料として形成しているので、膜形
成段階で、結晶化促進層により記録層をより一層確実か
つ安価に結晶化させることができ、より一層生産性を向
上させることができる。According to the above structure, the crystallization promoting layer is formed of Bi
Alternatively, since the recording layer is formed using Bi-Te as a material, the recording layer can be more reliably and inexpensively crystallized by the crystallization promoting layer at the film formation stage, and the productivity can be further improved.
【００３３】さらに、例えば、請求項６に記載するよう
に、前記結晶化促進層は、ＳｂまたはＳｂ−Ｔｅを材料
として形成されていてもよい。Further, for example, as set forth in claim 6, the crystallization promoting layer may be formed using Sb or Sb-Te as a material.
【００３４】上記構成によれば、結晶化促進層を、Ｓｂ
またはＳｂ−Ｔｅを材料として形成しているので、膜形
成段階で、結晶化促進層により記録層をより一層確実か
つ安価に結晶化させることができ、より一層生産性を向
上させることができる。According to the above configuration, the crystallization promoting layer is formed of Sb
Alternatively, since Sb-Te is formed as a material, the recording layer can be more reliably and inexpensively crystallized by the crystallization promoting layer at the film formation stage, and the productivity can be further improved.
【００３５】また、例えば、請求項７に記載するよう
に、前記結晶化促進層は、その膜厚が２ｎｍから６ｎｍ
の厚さに形成されていてもよい。Further, for example, as set forth in claim 7, the crystallization promoting layer has a thickness of 2 nm to 6 nm.
May be formed.
【００３６】上記構成によれば、結晶化促進層を、その
膜厚が２ｎｍから６ｎｍの厚さに形成しているので、最
終的に記録層と混在する可能性が高く、かつ、記録層と
材料の異なる結晶化促進層を可能な限り薄くして、記録
層材料への影響を少なくすることができ、記録層の結晶
化をより一層確実かつ安価に行って、より一層生産性を
向上させることができる。According to the above configuration, since the crystallization promoting layer is formed to have a thickness of 2 nm to 6 nm, there is a high possibility that the crystallization promoting layer will eventually be mixed with the recording layer. The crystallization promoting layer made of a different material can be made as thin as possible to reduce the influence on the recording layer material, and the crystallization of the recording layer can be performed more reliably and inexpensively, thereby further improving the productivity. be able to.
【００３７】さらに、例えば、請求項８に記載するよう
に、前記結晶化促進層は、その膜厚が５ｎｍから１０ｎ
ｍの厚さに形成されていてもよい。Further, for example, as set forth in claim 8, the crystallization promoting layer has a thickness of 5 nm to 10 n.
m may be formed.
【００３８】上記構成によれば、結晶化促進層を、その
膜厚が５ｎｍから１０ｎｍの厚さに形成しているので、
最終的に記録層と混在する可能性の高い結晶化促進層を
可能な限り薄くして、記録層材料への影響を少なくする
ことができ、記録層の結晶化をより一層確実かつ安価に
行って、より一層生産性を向上させることができる。According to the above configuration, the crystallization promoting layer is formed to have a thickness of 5 nm to 10 nm.
Finally, the crystallization promoting layer, which is likely to be mixed with the recording layer, can be made as thin as possible to reduce the influence on the recording layer material, and the crystallization of the recording layer can be performed more reliably and at lower cost. Thus, productivity can be further improved.
【００３９】また、例えば、請求項９に記載するよう
に、前記結晶化促進層は、５ｎｍ／ｓｅｃ以下の範囲の
成膜レートで成膜されていてもよい。Further, for example, the crystallization promoting layer may be formed at a film formation rate of 5 nm / sec or less.
【００４０】上記構成によれば、結晶化促進層を、５ｎ
ｍ／ｓｅｃ以下の範囲の成膜レートで成膜しているの
で、結晶化促進層の膜厚を精度よく制御することがで
き、記録層の結晶化をより一層確実かつ安価に行って、
より一層生産性を向上させることができる。According to the above structure, the crystallization promoting layer has a thickness of 5n.
Since the film is formed at a film formation rate within the range of m / sec or less, the thickness of the crystallization promoting layer can be accurately controlled, and the crystallization of the recording layer can be performed more reliably and inexpensively.
The productivity can be further improved.
【００４１】請求項１０記載の発明の光情報記録媒体
は、請求項１から請求項９のいずれかの光情報記録媒体
の製造方法で製造されていることにより、上記目的を達
成している。According to a tenth aspect of the present invention, an optical information recording medium achieves the above object by being manufactured by the method for manufacturing an optical information recording medium according to any one of the first to ninth aspects.
【００４２】上記構成によれば、光情報記録媒体を、請
求項１から請求項９のいずれかの光情報記録媒体の製造
方法で製造しているので、膜形成段階で、記録層に照射
した光のフォトンエネルギーを補助的に利用して、結晶
化促進層だけでは不十分な記録層の結晶化を確実かつ安
価に行うことができ、生産性を向上させることができ
る。According to the above configuration, since the optical information recording medium is manufactured by the method for manufacturing an optical information recording medium according to any one of claims 1 to 9, the recording layer is irradiated at the film forming stage. By utilizing the photon energy of light in an auxiliary manner, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed reliably and at low cost, and the productivity can be improved.
【００４３】[0043]
【発明の実施の形態】以下、本発明の好適な実施の形態
を添付図面に基づいて詳細に説明する。なお、以下に述
べる実施の形態は、本発明の好適な実施の形態であるか
ら、技術的に好ましい種々の限定が付されているが、本
発明の範囲は、以下の説明において特に本発明を限定す
る旨の記載がない限り、これらの態様に限られるもので
はない。Preferred embodiments of the present invention will be described below in detail with reference to the accompanying drawings. It should be noted that the embodiments described below are preferred embodiments of the present invention, and therefore, various technically preferable limitations are added. However, the scope of the present invention is not limited to the following description. The embodiments are not limited to these embodiments unless otherwise specified.
【００４４】図１は、本発明の光情報記録媒体の製造方
法及び光情報記録媒体の一実施の形態を適用した光情報
記録媒体１の概略構成図である。FIG. 1 is a schematic configuration diagram of an optical information recording medium 1 to which an embodiment of a method for manufacturing an optical information recording medium and an optical information recording medium according to the present invention is applied.
【００４５】図１において、光情報記録媒体１は、基板
２、第１誘電体層３、結晶化促進層４、記録層５、第２
誘電体層６、反射放熱層７及び保護層８が順次積層され
ている。In FIG. 1, an optical information recording medium 1 comprises a substrate 2, a first dielectric layer 3, a crystallization promoting layer 4, a recording layer 5, and a second
The dielectric layer 6, the reflective heat radiation layer 7, and the protective layer 8 are sequentially laminated.
【００４６】基板２は、１２０ｍｍφのポリカーボネー
ト基板であり、トラックピッチが、０．７４μｍで、グ
ルーブ（凹部）幅が、０．３μｍ、深さが、５０ｎｍの
溝形状を有している。第１誘電体層３は、ＺｎＳ・Ｓｉ
Ｏ2 を成膜レート９ｎｍ／ｓｅｃで、１８０ｎｍの厚さ
に成膜されており、結晶化促進層４は、Ｂｉを成膜レー
ト２ｎｍ／ｓｅｃで、５ｎｍの厚さに成膜されている。
記録層５は、Ａｇ−Ｉｎ−Ｓｂ−Ｔｅを成膜レート５ｎ
ｍ／ｓｅｃで、２０ｎｍの厚さに成膜されており、第２
誘電体層６は、ＺｎＳ・ＳｉＯ2 を成膜レート９ｎｍ／
ｓｅｃで、２０ｎｍの厚さに成膜されている。反射放熱
層７は、Ａｌ合金を成膜レート１５ｎｍ／ｓｅｃで、１
２０ｎｍの厚さに成膜されている。The substrate 2 is a 120 mmφ polycarbonate substrate having a groove shape with a track pitch of 0.74 μm, a groove (recess) width of 0.3 μm, and a depth of 50 nm. The first dielectric layer 3 is made of ZnS.Si
O 2 is deposited at a deposition rate of 9 nm / sec to a thickness of 180 nm, and the crystallization promoting layer 4 is formed of Bi at a deposition rate of 2 nm / sec to a thickness of 5 nm.
The recording layer 5 is formed of Ag-In-Sb-Te at a film formation rate of 5 n.
m / sec and a film thickness of 20 nm.
The dielectric layer 6 is made of ZnS.SiO 2 at a deposition rate of 9 nm /
In 20 seconds, the film is formed to a thickness of 20 nm. The reflective heat dissipation layer 7 is made of an Al alloy at a deposition rate of 15 nm / sec.
The film is formed to a thickness of 20 nm.
【００４７】そして、上記ＺｎＳ・ＳｉＯ2 は、ＲＦマ
グネトロンスパッタ法を用いて成膜を行い、 Ｂｉ、Ａ
ｇ−Ｉｎ−Ｓｂ−Ｔｅ及びＡｌ合金は、それぞれＤＣマ
グネトロンスパッタ法を用いて成膜を行うことができ
る。Then, the above ZnS.SiO 2 is formed by RF magnetron sputtering, and Bi, A
The g-In-Sb-Te and Al alloys can each be formed by DC magnetron sputtering.
【００４８】保護層８は、上記のようにして成膜を行っ
た後、反射放熱層７上にＵＶ硬化樹脂を塗布して形成し
ている。The protective layer 8 is formed by forming a film as described above and then applying a UV curable resin on the reflective heat radiation layer 7.
【００４９】また、記録層５であるＡｇ−Ｉｎ−Ｓｂ−
Ｔｅを成膜する際、成膜中に４００ｎｍ以下の波長をカ
ットする光学フィルターを用いてハロゲンランプの光を
照射しており、その際、基板２を自転させて、成膜面側
からハロゲンランプの光が均一に照射されるようにして
いる。また、基板２の裏面には、照射するハロゲンラン
プの波長に対して反射率が７０％以上であるＡｌ合金を
配設して、照射効率を向上させている。 〈比較例１〜比較例５〉そして、上述のようにして作製
した光情報記録媒体１と比較するために、以下の比較例
として示す光情報記録媒体を作製した。 ＜比較例１＞ 結晶化促進層４を抜いた光情報記録媒体＋初期化なし ＜比較例２＞ 結晶化促進層４を抜いた光情報記録媒体＋初期化あり ＜比較例３＞ 結晶化促進層４のみで、光照射なし＋初期化なし ＜比較例４＞ 結晶化促進層４のみで、光照射なし＋初期化あり ＜比較例５＞ 結晶化促進層４＋光照射あり＋初期化あり ＜本実施例＞ 結晶化促進層４＋光照射あり＋初期化なし なお、各比較例１〜５の初期化には、出力波長８３０ｎ
ｍ、幅２μｍ、長さ１００μｍ、最大出力１Ｗのレーザ
ー光にフォーカシング機能を付加したレーザーヘッドを
有する初期化装置を用いた。The recording layer 5 of Ag-In-Sb-
When forming Te, the light of a halogen lamp is irradiated using an optical filter that cuts a wavelength of 400 nm or less during the film formation. At this time, the substrate 2 is rotated and the halogen lamp is irradiated from the film forming surface side. Is uniformly irradiated. An Al alloy having a reflectance of 70% or more with respect to the wavelength of a halogen lamp to be irradiated is provided on the back surface of the substrate 2 to improve the irradiation efficiency. <Comparative Examples 1 to 5> To compare with the optical information recording medium 1 produced as described above, the following optical information recording medium was produced as a comparative example. <Comparative Example 1> Optical information recording medium from which crystallization promoting layer 4 was removed + no initialization <Comparative Example 2> Optical information recording medium from which crystallization promoting layer 4 was removed + with initialization <Comparative Example 3> Crystallization promotion <Layer 4 Only, No Light Irradiation + No Initialization><Comparative Example 4> Only Crystallization Acceleration Layer 4 No Light Irradiation + Initialization <Comparative Example 5> Crystallization Acceleration Layer 4 + Light Irradiation + Initialization <Example> Crystallization accelerating layer 4 + with light irradiation + without initialization In each of Comparative Examples 1 to 5, the output wavelength was 830n.
An initialization apparatus having a laser head having a focusing function added to a laser beam having m, width 2 μm, length 100 μm, and maximum output 1 W was used.
【００５０】このようにして作製したそれぞれの光情報
記録媒体１及び比較例１〜５の反射率を波長６６０ｎ
ｍ、ＮＡＯ０．６３のピックアップを有する光ディスク
評価装置（パルステック社製ＤＤＵ−１０００）を用い
て、光情報記録媒体１及び比較例１〜５のグルーブ面で
の反射率を評価して、比較した。The reflectance of each of the optical information recording media 1 and the comparative examples 1 to 5 manufactured as described above was measured at a wavelength of 660 nm.
The reflectance of the optical information recording medium 1 and Comparative Examples 1 to 5 on the groove surface was evaluated using an optical disk evaluation device (DDU-1000 manufactured by Pulstec) having a pickup of m and NAO of 0.63, and comparison was made. .
【００５１】比較結果は、比較例１では、反射率が低
く、グルーブ面にトラッキングできず、反射率を測定す
ることができなかった。比較例２では、反射率が２０％
で周方向に均一、比較例３では、１４〜１７％の範囲で
周方向にむらがあり、比較例４では、反射率が２０％で
周方向に均一、比較例５では、反射率が２０％で、周方
向に均一であった。As a result of comparison, in Comparative Example 1, the reflectance was low, tracking could not be performed on the groove surface, and the reflectance could not be measured. In Comparative Example 2, the reflectance was 20%.
In Comparative Example 3, there was unevenness in the circumferential direction in the range of 14 to 17%. In Comparative Example 4, the reflectance was 20% and uniform in the circumferential direction. In Comparative Example 5, the reflectance was 20%. % In the circumferential direction.
【００５２】これに対して、本実施の形態の光情報記録
媒体１は、反射率が２０％で、周方向に均一という結果
が得られた。On the other hand, the optical information recording medium 1 of the present embodiment has a result that the reflectivity is 20% and uniform in the circumferential direction.
【００５３】以上のことから、本実施の形態の光情報記
録媒体１は、初期化工程を行うことなく、初期化工程を
行った場合と同等な反射率を得られることが判明した。From the above, it has been found that the optical information recording medium 1 of the present embodiment can obtain the same reflectance as that obtained by performing the initialization step without performing the initialization step.
【００５４】なお、本実施の形態の光情報記録媒体１及
び比較例１〜５で用いた保護層材料や反射放熱層材料、
作製装置、作製方法や層構成、評価装置等に制限され
ず、また、結晶化促進層の材料としては、Ｂｉ−Ｔｅで
も同様な結果が得られた。 ＜比較例６〜比較例１０＞比較例６〜１０の光情報記録
媒体は、上記実施の形態と同様の作成工程で作成する
が、記録層の成膜中の光照射の波長に関して、各比較例
６〜１０において、以下のような光照射を行った。 ＜比較例６＞ 光学フィルターなし ＜比較例７＞ 波長２００ｎｍ以下をカットした光学フィルター ＜比較例８＞ 波長３００ｎｍ以下をカットした光学フィルター ＜比較例９＞ 波長５００ｎｍ以下をカットした光学フィルター ＜比較例１０＞ 波長６００ｎｍ以下をカットした光学フィルター なお、本実施の形態の光情報記録媒体１は、上述のよう
に、波長４００ｎｍ以下をカットする光学フィルターを
用いて光照射を行いつつ、記録層５を成膜した。Incidentally, the protective layer material and the reflective heat radiation layer material used in the optical information recording medium 1 of the present embodiment and Comparative Examples 1 to 5,
The production apparatus, the production method, the layer configuration, the evaluation apparatus, and the like were not limited, and the same result was obtained with Bi-Te as the material of the crystallization promoting layer. <Comparative Examples 6 to 10> The optical information recording media of Comparative Examples 6 to 10 are produced by the same production steps as in the above embodiment, but the respective wavelengths of light irradiation during the formation of the recording layer are compared. In Examples 6 to 10, the following light irradiation was performed. <Comparative Example 6> No optical filter <Comparative Example 7> Optical filter that cuts a wavelength of 200 nm or less <Comparative Example 8> Optical filter that cuts a wavelength of 300 nm or less <Comparative Example 9> Optical filter that cuts a wavelength of 500 nm or less <Comparative Example 10> Optical Filter that Cuts a Wavelength of 600 nm or Less The optical information recording medium 1 according to the present embodiment, as described above, performs light irradiation using an optical filter that cuts a wavelength of 400 nm or less, and A film was formed.
【００５５】上述のようにして作製した比較例の光情報
記録媒体のうち、比較例６と比較例９と比較例１０につ
いては、著しく基板の変形が見られた。これは、比較例
９と比較例１０の光照射の波長が、基板の材質であるポ
リカーボネートの光吸収波長領域に含まれたために、光
照射により基板が加熱されたことが原因と考えられる。Of the optical information recording media of the comparative examples produced as described above, in the comparative examples 6, 9 and 10, the substrate was significantly deformed. This may be because the wavelength of light irradiation in Comparative Examples 9 and 10 was included in the light absorption wavelength region of polycarbonate, which is the material of the substrate, and the substrate was heated by the light irradiation.
【００５６】以上のことから、本実施の形態のように、
波長４００ｎｍ以下をカットする光学フィルターを用い
て光照射を行いつつ、記録層５を成膜することが、基板
２へのダメージのない光照射を行うことが判明した。From the above, as in the present embodiment,
It was found that forming the recording layer 5 while irradiating light using an optical filter that cuts a wavelength of 400 nm or less performs light irradiation without damaging the substrate 2.
【００５７】なお、この比較例の実験で用いた光学フィ
ルターの種類や光源の種類などは、何ら制限されるもの
ではない。 ＜比較例１１〜１３＞比較例１１〜１３の光情報記録媒
体は、上記実施の形態と同様の作成工程で作成するが、
記録層の成膜中の光照射に関して、各比較例１１〜１３
において、以下のような光照射を行った。 ＜比較例１１＞ 光照射の方向…成膜面側基板の回転…なし ＜比較例１２＞ 光照射の方向…成膜面と逆側基板の回転…あり ＜比較例１３＞ 光照射の方向…成膜面と逆側基板の回転…なし なお、本実施の形態の光情報記録媒体１は、上述のよう
に、基板２を回転させつつ、成膜面側から照射を行って
記録層５を成膜した。The type of the optical filter and the type of the light source used in the experiment of the comparative example are not limited at all. <Comparative Examples 11 to 13> The optical information recording media of Comparative Examples 11 to 13 are produced by the same production steps as in the above embodiment.
Regarding light irradiation during the formation of the recording layer, each of Comparative Examples 11 to 13 was used.
, The following light irradiation was performed. <Comparative Example 11> Direction of light irradiation: rotation of the substrate on the film formation surface side ... none <Comparative Example 12> Direction of light irradiation: rotation of the substrate on the opposite side from the film formation surface ... comparative example 13: Direction of light irradiation: Rotation of substrate on opposite side of film formation surface ... None Note that, as described above, the optical information recording medium 1 of the present embodiment rotates the substrate 2 while irradiating the recording layer 5 from the film formation surface side. A film was formed.
【００５８】光情報記録媒体１及び上記条件で作製した
比較例１１〜１３の反射率を、波長６６０ｎｍ、ＮＡＯ
０．６３のピックアップを有する光ディスク評価装置を
用いて、光情報記録媒体１及び比較例１１〜１３のグル
ーブ面での反射率を評価して、比較した。The reflectance of the optical information recording medium 1 and the comparative examples 11 to 13 manufactured under the above conditions was measured at a wavelength of 660 nm and NAO.
Using an optical disk evaluation device having a 0.63 pickup, the reflectances of the optical information recording medium 1 and the comparative examples 11 to 13 on the groove surface were evaluated and compared.
【００５９】比較結果は、比較例１１では、反射率は周
方向に１６〜２０％のむらが見られ、比較例１２では、
反射率は１８％で、周方向に均一であった。比較例１３
では、反射率は１５〜１８％のむらが見られた。As a result of comparison, in Comparative Example 11, the reflectivity was 16 to 20% uneven in the circumferential direction.
The reflectance was 18%, which was uniform in the circumferential direction. Comparative Example 13
In the sample, the reflectance was uneven at 15 to 18%.
【００６０】以上のことから、本実施の形態の光情報記
録媒体１は、効率よくかつ均一な光照射の効果が得られ
ることが判明した。 ＜比較例１４〜１６＞比較例１４〜１６の光情報記録媒
体は、上記実施の形態と同様の作成工程で作成するが、
記録層の成膜中の照射光の反射率に関して、各比較例１
４〜１６において、以下のような反射率とした。なお、
反射率の調整には材質の表面に光学薄膜をコーティング
することで行った。 ＜比較例１４＞ 材質の反射率８０％ ＜比較例１５＞ 材質の反射率６０％ ＜比較例１６＞ 材質の反射率５０％ なお、本実施の形態の光情報記録媒体１は、上述のよう
に、７０％以上の反射率であるＡｌ合金を配設して、記
録層５を成膜した。From the above, it has been found that the optical information recording medium 1 of the present embodiment can obtain the effect of efficient and uniform light irradiation. <Comparative Examples 14 to 16> The optical information recording media of Comparative Examples 14 to 16 are produced by the same production steps as in the above embodiment.
Regarding the reflectance of irradiation light during the formation of the recording layer, each comparative example 1
In 4 to 16, the reflectance was as follows. In addition,
The reflectance was adjusted by coating the surface of the material with an optical thin film. <Comparative Example 14> Material reflectivity 80% <Comparative Example 15> Material reflectivity 60% <Comparative Example 16> Material reflectivity 50% Note that the optical information recording medium 1 of the present embodiment is as described above. The recording layer 5 was formed by disposing an Al alloy having a reflectance of 70% or more.
【００６１】光情報記録媒体１及び上記条件で作製した
比較例１４〜１６の反射率を、波長６６０ｎｍ、ＮＡＯ
０．６３のピックアップを有する光ディスク評価装置を
用いて、光情報記録媒体１及び比較例１４〜１６のグル
ーブ面での反射率を評価して、比較した。The reflectance of the optical information recording medium 1 and the comparative examples 14 to 16 produced under the above conditions was measured at a wavelength of 660 nm and NAO.
Using an optical disk evaluation apparatus having a 0.63 pickup, the reflectances of the optical information recording medium 1 and the comparative examples 14 to 16 on the groove surface were evaluated and compared.
【００６２】比較結果は、比較例１５と比較例１６につ
いては、それぞれ１８％と１６％であり、本実施の形態
の光情報記録媒体１で得られた２０％よりも低かった。
比較例１４では、反射率は、本実施の形態の光情報記録
媒体１と同様な結果が得られた。The comparison results for Comparative Example 15 and Comparative Example 16 were 18% and 16%, respectively, which were lower than 20% obtained with the optical information recording medium 1 of the present embodiment.
In Comparative Example 14, a result similar to that of the optical information recording medium 1 of the present embodiment was obtained with respect to the reflectance.
【００６３】以上のことから、本実施の形態の光情報記
録媒体１は、効率よくかつ均一な光照射の効果が得られ
ることが判明した。なお、この比較例の実験で用いた反
射率調整用の光学薄膜の種類などは、何ら制限されるも
のではない。 ＜比較例１７〜２１＞比較例１７〜２１の光情報記録媒
体は、上記実施の形態と同様の作成工程で作成するが、
結晶化促進層に関して、各比較例１７〜２１において、
以下のような膜厚とした。 ＜比較例１７＞ 結晶化促進層：Ｂｉ、膜厚：１ｎｍ ＜比較例１８＞ 結晶化促進層：Ｂｉ、膜厚：２ｎｍ ＜比較例１９＞ 結晶化促進層：Ｂｉ、膜厚：３ｎｍ ＜比較例２０＞ 結晶化促進層：Ｂｉ、膜厚：６ｎｍ ＜比較例２１＞ 結晶化促進層：Ｂｉ、膜厚：７ｎｍ なお、本実施の形態の光情報記録媒体１では、上述のよ
うに、結晶化促進層４は、Ｂｉを成膜レート２ｎｍ／ｓ
ｅｃで、５ｎｍの厚さに成膜している。From the above, it has been found that the optical information recording medium 1 of the present embodiment can obtain the effect of efficient and uniform light irradiation. The kind of the optical thin film for adjusting the reflectance used in the experiment of the comparative example is not limited at all. <Comparative Examples 17 to 21> The optical information recording media of Comparative Examples 17 to 21 are manufactured by the same manufacturing process as that of the above-described embodiment.
Regarding the crystallization promoting layer, in each of Comparative Examples 17 to 21,
The film thickness was as follows. <Comparative Example 17> Crystallization promoting layer: Bi, film thickness: 1 nm <Comparative Example 18> Crystallization promoting layer: Bi, film thickness: 2 nm <Comparative Example 19> Crystallization promoting layer: Bi, film thickness: 3 nm <Comparative Example 20> Crystallization promoting layer: Bi, film thickness: 6 nm <Comparative Example 21> Crystallization promoting layer: Bi, film thickness: 7 nm In the optical information recording medium 1 of the present embodiment, as described above, The formation promoting layer 4 is formed by depositing Bi at a deposition rate of 2 nm / s.
At ec, a film is formed to a thickness of 5 nm.
【００６４】光情報記録媒体１及び上記条件で作製した
比較例１７〜２１の反射率を、波長６６０ｎｍ、ＮＡＯ
０．６３のピックアップを有する光ディスク評価装置を
用いて、光情報記録媒体１及び比較例１７〜２１のグル
ーブ面での反射率を評価して、比較した。The reflectance of the optical information recording medium 1 and Comparative Examples 17 to 21 produced under the above conditions was measured at a wavelength of 660 nm and NAO
Using an optical disk evaluation device having a 0.63 pickup, the reflectances of the optical information recording medium 1 and the comparative examples 17 to 21 on the groove surface were evaluated and compared.
【００６５】比較結果は、比較例１７のみ、１２％で、
他は何れも２０％程度で違いは見られなかった。The comparison result shows that only Comparative Example 17 was 12%.
The others were about 20% and no difference was seen.
【００６６】そこで、これらの比較例１７〜２１の光情
報記録媒体にＤＶＤ−ＲＷに使用される記録条件で信号
を記録して、それぞれのジッターを評価した。その結
果、比較例１８、比較例１９、比較例２０及び本実施の
形態の光情報記録媒体１で、約７％、比較例２１で、約
１０％となった。同様な記録条件で、上記比較例２の光
情報記録媒体で、約７％のジッターが得られた。Therefore, signals were recorded on the optical information recording media of Comparative Examples 17 to 21 under the recording conditions used for DVD-RW, and the respective jitters were evaluated. As a result, the optical information recording medium 1 of Comparative Example 18, Comparative Example 19, Comparative Example 20 and the present embodiment showed about 7%, and Comparative Example 21 showed about 10%. Under the same recording conditions, about 7% jitter was obtained in the optical information recording medium of Comparative Example 2 above.
【００６７】以上のことから、本実施の形態の光情報記
録媒体１は、初期化工程を行うとこなく、初期化工程を
行った場合と同等な結果が得られることが判明した。ま
た、結晶化促進層を、Ｂｉ−Ｔｅで作製した場合にも、
同様な結果が得られた。＜比較例２２〜２７＞比較例２
２〜２７の光情報記録媒体は、上記実施の形態と同様の
作成工程で作成するが、結晶化促進層に関して、各比較
例２２〜２７において、以下のような材料を用いて、以
下のような膜厚とした。なお、Ｓｂの成膜レートは２ｎ
ｍ／ｓｅｃである。 ＜比較例２２＞ 結晶化促進層：Ｓｂ、膜厚：３ｎｍ ＜比較例２３＞ 結晶化促進層：Ｓｂ、膜厚：５ｎｍ ＜比較例２４＞ 結晶化促進層：Ｓｂ、膜厚：７ｎｍ ＜比較例２５＞ 結晶化促進層：Ｓｂ、膜厚：１０ｎｍ ＜比較例２６＞ 結晶化促進層：Ｓｂ、膜厚：１１ｎｍ ＜比較例２７＞ 結晶化促進層：Ｓｂ、膜厚：１２ｎｍ なお、本実施の形態の光情報記録媒体１では、上述のよ
うに、結晶化促進層４は、Ｂｉを成膜レート２ｎｍ／ｓ
ｅｃで、５ｎｍの厚さに成膜している。From the above, it has been found that the optical information recording medium 1 of the present embodiment can obtain the same result as the case where the initialization step is performed without performing the initialization step. Also, when the crystallization promoting layer is made of Bi-Te,
Similar results were obtained. <Comparative Examples 22 to 27> Comparative Example 2
The optical information recording media Nos. 2 to 27 are produced in the same production steps as in the above embodiment, but the following materials are used in each of Comparative Examples 22 to 27 with respect to the crystallization promoting layer, using the following materials. Film thickness. The Sb film formation rate is 2n
m / sec. <Comparative Example 22> Crystallization promoting layer: Sb, film thickness: 3 nm <Comparative Example 23> Crystallization promoting layer: Sb, film thickness: 5 nm <Comparative Example 24> Crystallization promoting layer: Sb, film thickness: 7 nm <Comparative Example 25> Crystallization promoting layer: Sb, film thickness: 10 nm <Comparative Example 26> Crystallization promoting layer: Sb, film thickness: 11 nm <Comparative Example 27> Crystallization promoting layer: Sb, film thickness: 12 nm In the optical information recording medium 1 according to the embodiment, as described above, the crystallization promoting layer 4 forms Bi at a deposition rate of 2 nm / s.
At ec, a film is formed to a thickness of 5 nm.
【００６８】光情報記録媒体１及び上記条件で作製した
比較例２２〜２７の反射率を、波長６６０ｎｍ、ＮＡＯ
０．６３のピックアップを有する光ディスク評価装置を
用いて、光情報記録媒体１及び比較例２２〜２７のグル
ーブ面での反射率を評価して、比較した。The reflectance of the optical information recording medium 1 and Comparative Examples 22 to 27 produced under the above conditions was measured at a wavelength of 660 nm and NAO
Using an optical disk evaluation apparatus having a 0.63 pickup, the reflectances of the optical information recording medium 1 and the comparative examples 22 to 27 on the groove surface were evaluated and compared.
【００６９】比較結果は、比較例２２だけが１０％で、
他は何れも２０％程度であり、違いは見られなかった。The comparison result shows that only Comparative Example 22 was 10%.
The others were about 20%, and no difference was observed.
【００７０】そこで、これらの比較例２２〜２７の光情
報記録媒体にＤＶＤ−ＲＷに使用される記録条件で信号
を記録して、それぞれのジッターを評価した。その結
果、比較例２３、比較例２４、比較例２５及び本実施の
形態の光情報記録媒体１で、約７％、比較例２６で、約
９％、比較例２７で、約１１％となった。同様な記録条
件で、比較例２の光情報記録媒体で約７％のジッターが
得られたことから、初期化工程を行うとこなく、初期化
工程を行った場合と同等な結果が得られることが判明し
た。また、結晶化促進層を、Ｓｂ−Ｔｅで作成した場合
にも、同様な結果が得られた。 ＜比較例２８〜３１＞比較例２８〜３１の光情報記録媒
体は、上記実施の形態と同様の作成工程で作成するが、
結晶化促進層に関して、各比較例２８〜３１において、
以下のような成膜レートで作製した。 ＜比較例２８＞ 結晶化促進層：Ｂｉ、膜厚５ｎｍ、成膜レート４ｎｍ／ｓｅｃ ＜比較例２９＞ 結晶化促進層：Ｂｉ、膜厚５ｎｍ、成膜レート５ｎｍ／ｓｅｃ ＜比較例３０＞ 結晶化促進層：Ｂｉ、膜厚５ｎｍ、成膜レート６ｎｍ／ｓｅｃ ＜比較例３１＞ 結晶化促進層：Ｂｉ、膜厚５ｎｍ、成膜レート７ｎｍ／ｓｅｃ なお、本実施の形態の光情報記録媒体１では、上述のよ
うに、結晶化促進層４は、Ｂｉを成膜レート２ｎｍ／ｓ
ｅｃで、５ｎｍの厚さに成膜している。Therefore, signals were recorded on the optical information recording media of Comparative Examples 22 to 27 under the recording conditions used for DVD-RW, and the respective jitters were evaluated. As a result, about 7% for Comparative Examples 23, 24, 25 and the optical information recording medium 1 of the present embodiment, about 9% for Comparative Example 26, and about 11% for Comparative Example 27. Was. Under the same recording conditions, about 7% jitter was obtained in the optical information recording medium of Comparative Example 2, so that the same result as that obtained by performing the initialization step was obtained without performing the initialization step. There was found. Similar results were obtained when the crystallization promoting layer was made of Sb-Te. <Comparative Examples 28 to 31> The optical information recording media of Comparative Examples 28 to 31 are produced by the same production steps as in the above embodiment.
Regarding the crystallization promoting layer, in each of Comparative Examples 28 to 31,
It was produced at the following film formation rate. <Comparative Example 28> Crystallization promoting layer: Bi, film thickness 5 nm, film formation rate 4 nm / sec Comparative Example 29 Crystallization promoting layer: Bi, film thickness 5 nm, film formation rate 5 nm / sec Comparative Example 30 Crystal Crystallization promoting layer: Bi, thickness 5 nm, film formation rate 6 nm / sec <Comparative Example 31> Crystallization promoting layer: Bi, film thickness 5 nm, film formation rate 7 nm / sec The optical information recording medium 1 of the present embodiment Then, as described above, the crystallization promoting layer 4 forms Bi at a film formation rate of 2 nm / s.
At ec, a film is formed to a thickness of 5 nm.
【００７１】光情報記録媒体１及び上記条件で作製した
比較例１７〜２１の反射率を、波長６６０ｎｍ、ＮＡＯ
０．６３のピックアップを有する光ディスク評価装置を
用いて、光情報記録媒体１及び比較例２８〜３１のグル
ーブ面での反射率を評価して、比較した。The reflectance of the optical information recording medium 1 and Comparative Examples 17 to 21 produced under the above conditions was measured at a wavelength of 660 nm and NAO
Using an optical disk evaluation device having a 0.63 pickup, the reflectances of the optical information recording medium 1 and the comparative examples 28 to 31 on the groove surface were evaluated and compared.
【００７２】比較結果は、比較例２８、比較例２９及び
本実施の形態の光情報記録媒体１で、周方向に２０％均
一であったのに対して、比較例３０及び比較例３１で
は、周方向に１５〜２０％のむらがあった。The comparison results show that Comparative Examples 28 and 29 and the optical information recording medium 1 of the present embodiment were 20% uniform in the circumferential direction, whereas Comparative Examples 30 and 31 There was 15-20% unevenness in the circumferential direction.
【００７３】以上のことから、本実施の形態の光情報記
録媒体１の作製方法は、効率的で均一な光照射の効果を
得ることが判明した。また、ここでは結晶化促進層に、
Ｂｉを用いたが、Ｂｉ−Ｔｅ、Ｓｂ、Ｓｂ−Ｔｅにおい
ても行った実験においても、同様な結果を得ることがで
きた。From the above, it has been found that the method of manufacturing the optical information recording medium 1 of the present embodiment can obtain an efficient and uniform light irradiation effect. Also, here, the crystallization promoting layer
Although Bi was used, similar results could be obtained in experiments performed on Bi-Te, Sb, and Sb-Te.
【００７４】以上、本発明者によってなされた発明を好
適な実施の形態に基づき具体的に説明したが、本発明は
上記のものに限定されるものではなく、その要旨を逸脱
しない範囲で種々変更可能であることはいうまでもな
い。As described above, the invention made by the inventor has been specifically described based on the preferred embodiments. However, the present invention is not limited to the above, and various modifications can be made without departing from the gist of the invention. It goes without saying that it is possible.
【００７５】[0075]
【発明の効果】請求項１記載の発明の光情報記録媒体の
製造方法によれば、基板上に、少なくとも第１誘電体
層、結晶化促進層、記録層、第２誘電体層及び反射放熱
層が積層され、前記記録層が、Ａｇ、Ｉｎ、Ｓｂ、Ｔｅ
を主要な構成元素である光情報記録媒体を製造するに際
して、記録層の成膜中、あるいは、成膜後の少なくとも
いずれかの工程で、所定波長の光照射を行うので、膜形
成段階で、記録層に照射した光のフォトンエネルギーを
補助的に利用して、結晶化促進層だけでは不十分な記録
層の結晶化を確実かつ安価に行うことができ、生産性を
向上させることができる。According to the method for manufacturing an optical information recording medium according to the first aspect of the present invention, at least a first dielectric layer, a crystallization promoting layer, a recording layer, a second dielectric layer, and reflected heat radiation are formed on a substrate. Layers are laminated, and the recording layer is made of Ag, In, Sb, Te.
When manufacturing an optical information recording medium that is a main constituent element, during the film formation of the recording layer, or at least one of the processes after the film formation, since light irradiation of a predetermined wavelength is performed, in the film formation stage, By utilizing the photon energy of the light applied to the recording layer in an auxiliary manner, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed reliably and at low cost, and the productivity can be improved.
【００７６】請求項２記載の発明の光情報記録媒体の製
造方法によれば、記録層に光照射する光の波長として、
４００μｍ以上の波長を用いるので、光吸収波長帯が４
００ｎｍ以下であるポリカーボネート等の基板の影響を
少なくして、記録層に照射した光のフォトンエネルギー
をより効率的に利用して、結晶化促進層だけでは不十分
な記録層の結晶化をより一層確実かつ安価に行うことが
でき、より一層生産性を向上させることができる。According to the method for manufacturing an optical information recording medium of the present invention, the wavelength of light for irradiating the recording layer with light is:
Since the wavelength of 400 μm or more is used, the light absorption wavelength band is 4
By reducing the influence of the substrate such as polycarbonate which is not more than 00 nm, the photon energy of the light applied to the recording layer is more efficiently used, and the crystallization of the recording layer which is insufficient with the crystallization promoting layer alone is further improved. This can be performed reliably and at low cost, and the productivity can be further improved.
【００７７】請求項３記載の発明の光情報記録媒体の製
造方法によれば、光照射を、基板を回転させつつ、記録
層の成膜面側から行うので、基板を通すことなく直接記
録層に光照射を行うとともに、光源の形状にかかわらず
成膜範囲に均一に光照射を行って、結晶化促進層だけで
は不十分な記録層の結晶化をより一層確実かつ安価に行
うことができ、より一層生産性を向上させることができ
る。According to the method for manufacturing an optical information recording medium of the present invention, the light irradiation is performed from the film forming surface side of the recording layer while rotating the substrate. Irradiates light uniformly and irradiates the film formation range irrespective of the shape of the light source, so that the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed more reliably and inexpensively. The productivity can be further improved.
【００７８】請求項４記載の発明の光情報記録媒体の製
造方法によれば、基板の裏面側に、光照射された光を当
該光の波長に対して反射率が７０％以上を有する部材を
設けているので、照射された光が当該部材で反射させて
再度記録層に照射させて、結晶化促進層だけでは不十分
な記録層の結晶化をより一層確実かつ安価に行うことが
でき、より一層生産性を向上させることができる。According to the method for manufacturing an optical information recording medium of the invention, a member having a reflectance of 70% or more with respect to the wavelength of the light irradiated on the back side of the substrate is provided. Since it is provided, the irradiated light is reflected by the member and irradiates the recording layer again, and the crystallization of the recording layer, which is insufficient only with the crystallization promoting layer, can be performed more reliably and inexpensively. The productivity can be further improved.
【００７９】請求項５記載の発明の光情報記録媒体の製
造方法によれば、結晶化促進層を、ＢｉまたはＢｉ−Ｔ
ｅを材料として形成しているので、膜形成段階で、結晶
化促進層により記録層をより一層確実かつ安価に結晶化
させることができ、より一層生産性を向上させることが
できる。According to the method of manufacturing an optical information recording medium of the invention described in claim 5, the crystallization promoting layer is made of Bi or Bi-T
Since e is formed as a material, the recording layer can be more reliably and inexpensively crystallized by the crystallization promoting layer at the film formation stage, and the productivity can be further improved.
【００８０】請求項６記載の発明の光情報記録媒体の製
造方法によれば、結晶化促進層を、ＳｂまたはＳｂ−Ｔ
ｅを材料として形成しているので、膜形成段階で、結晶
化促進層により記録層をより一層確実かつ安価に結晶化
させることができ、より一層生産性を向上させることが
できる。According to the method of manufacturing an optical information recording medium of the present invention, the crystallization promoting layer is made of Sb or Sb-T
Since e is formed as a material, the recording layer can be more reliably and inexpensively crystallized by the crystallization promoting layer at the film formation stage, and the productivity can be further improved.
【００８１】請求項７記載の発明の光情報記録媒体の製
造方法によれば、結晶化促進層を、その膜厚が２ｎｍか
ら６ｎｍの厚さに形成しているので、最終的に記録層と
混在する可能性が高く、かつ、記録層と材料の異なる結
晶化促進層を可能な限り薄くして、記録層材料への影響
を少なくすることができ、記録層の結晶化をより一層確
実かつ安価に行って、より一層生産性を向上させること
ができる。According to the method for manufacturing an optical information recording medium of the present invention, the crystallization promoting layer is formed to have a thickness of 2 nm to 6 nm. The possibility of coexistence is high, and the crystallization promoting layer having a different material from the recording layer can be made as thin as possible, so that the influence on the recording layer material can be reduced. It can be performed at low cost, and the productivity can be further improved.
【００８２】請求項８記載の発明の光情報記録媒体の製
造方法によれば、結晶化促進層を、その膜厚が５ｎｍか
ら１０ｎｍの厚さに形成しているので、最終的に記録層
と混在する可能性の高い結晶化促進層を可能な限り薄く
して、記録層材料への影響を少なくすることができ、記
録層の結晶化をより一層確実かつ安価に行って、より一
層生産性を向上させることができる。According to the method for manufacturing an optical information recording medium of the present invention, the crystallization promoting layer is formed to have a thickness of 5 nm to 10 nm. The crystallization-promoting layer, which is likely to be mixed, can be made as thin as possible to reduce the effect on the recording layer material. Can be improved.
【００８３】請求項９記載の発明の光情報記録媒体の製
造方法によれば、結晶化促進層を、５ｎｍ／ｓｅｃ以下
の範囲の成膜レートで成膜しているので、結晶化促進層
の膜厚を精度よく制御することができ、記録層の結晶化
をより一層確実かつ安価に行って、より一層生産性を向
上させることができる。According to the ninth aspect of the present invention, the crystallization promoting layer is formed at a film formation rate of 5 nm / sec or less. The film thickness can be controlled with high precision, the crystallization of the recording layer can be performed more reliably and at lower cost, and the productivity can be further improved.
【００８４】請求項１０記載の発明の光情報記録媒体に
よれば、光情報記録媒体を、請求項１から請求項９のい
ずれかの光情報記録媒体の製造方法で製造しているの
で、膜形成段階で、記録層に照射した光のフォトンエネ
ルギーを補助的に利用して、結晶化促進層だけでは不十
分な記録層の結晶化を確実かつ安価に行うことができ、
生産性を向上させることができる。According to the optical information recording medium of the present invention, the optical information recording medium is manufactured by the method for manufacturing an optical information recording medium according to any one of the first to ninth aspects. In the formation stage, by utilizing the photon energy of the light applied to the recording layer in an auxiliary manner, the crystallization of the recording layer, which is insufficient with the crystallization promoting layer alone, can be performed reliably and at low cost.
Productivity can be improved.
【図１】本発明の光情報記録媒体及び光情報記録媒体の
製造方法の一実施の形態を適用した光情報記録媒体の概
略構成図。FIG. 1 is a schematic configuration diagram of an optical information recording medium to which an embodiment of an optical information recording medium and a method for manufacturing the optical information recording medium of the present invention is applied.
１ 光情報記録媒体 ２ 基板 ３ 第１誘電体層 ４ 結晶化促進層 ５ 記録層 ６ 第２誘電体層 ７ 反射放熱層７ ８ 保護層 REFERENCE SIGNS LIST 1 optical information recording medium 2 substrate 3 first dielectric layer 4 crystallization promoting layer 5 recording layer 6 second dielectric layer 7 reflective heat dissipation layer 7 8 protective layer
───────────────────────────────────────────────────── フロントページの続き (72)発明者 針谷 眞人 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 (72)発明者 大谷 渉 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 (72)発明者 柴田 清人 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 (72)発明者 小名木 伸晃 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 (72)発明者 古川 龍一 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 (72)発明者 阿萬 康知 東京都大田区中馬込１丁目３番６号 株式 会社リコー内 Ｆターム(参考） 2H111 EA04 EA23 FA11 FA23 FB09 FB12 FB17 FB21 GA11 5D029 JA01 JB35 MA15 MA17 5D121 AA01 AA05 GG02 ────────────────────────────────────────────────── ─── Continued on the front page (72) Inventor Masato Hariya 1-3-6 Nakamagome, Ota-ku, Tokyo Stock inside Ricoh Company (72) Inventor Wataru Watari 1-3-6 Nakamagome, Ota-ku, Tokyo Stock Inside Ricoh Company (72) Inventor Kiyoto Shibata 1-3-6 Nakamagome, Ota-ku, Tokyo Stock Company Ricoh Company (72) Inventor Nobuaki Onagi 1-3-6 Nakamagome, Ota-ku, Tokyo Stock Company Ricoh Company (72) Inventor Ryuichi Furukawa 1-3-6 Nakamagome, Ota-ku, Tokyo Inside Ricoh Company (72) Inventor Yasutomo Aman 1-3-6 Nakamagome, Ota-ku, Tokyo FTerm in Ricoh Company Limited Reference) 2H111 EA04 EA23 FA11 FA23 FB09 FB12 FB17 FB21 GA11 5D029 JA01 JB35 MA15 MA17 5D121 AA01 AA05 GG02
Claims (10)
化促進層、記録層、第２誘電体層及び反射放熱層が積層
され、前記記録層が、Ａｇ、Ｉｎ、Ｓｂ、Ｔｅを主要な
構成元素である光情報記録媒体の製造方法であって、前
記記録層の成膜中、あるいは、成膜後の少なくともいず
れかの工程で、所定波長の光照射を行うことを特徴とす
る光情報記録媒体の製造方法。1. A substrate on which at least a first dielectric layer, a crystallization promoting layer, a recording layer, a second dielectric layer and a reflective heat radiation layer are laminated, wherein the recording layer is made of Ag, In, Sb, Te. A method for manufacturing an optical information recording medium that is a main constituent element, wherein light irradiation of a predetermined wavelength is performed during film formation of the recording layer or in at least one step after film formation. A method for manufacturing an optical information recording medium.
上の波長であることを特徴とする請求項１記載の光情報
記録媒体の製造方法。2. The method for manufacturing an optical information recording medium according to claim 1, wherein the wavelength of the light to be irradiated is a wavelength of 400 nm or more.
前記記録層の成膜面側から行うことを特徴とする請求項
１または請求項２記載の光情報記録媒体の製造方法。3. The method of claim 1, wherein the light irradiation is performed while rotating the substrate.
3. The method for manufacturing an optical information recording medium according to claim 1, wherein the method is performed from the film forming surface side of the recording layer.
を当該光の波長に対して反射率が７０％以上を有する部
材を設けることを特徴とする請求項１から請求項３のい
ずれかに記載の光情報記録媒体の製造方法。4. The apparatus according to claim 1, wherein a member having a reflectance of 70% or more with respect to the wavelength of the irradiated light is provided on the back side of the substrate. A method for manufacturing the optical information recording medium according to any one of the above.
ｅを材料として形成されていることを特徴とする請求項
１から請求項４のいずれかに記載の光情報記録媒体の製
造方法。5. The crystallization promoting layer is made of Bi or Bi-T.
The method for manufacturing an optical information recording medium according to claim 1, wherein the optical information recording medium is formed using e as a material.
ｅを材料として形成されていることを特徴とする請求項
１から請求項４のいずれかに記載の光情報記録媒体の製
造方法。6. The crystallization promoting layer is made of Sb or Sb-T.
The method for manufacturing an optical information recording medium according to claim 1, wherein the optical information recording medium is formed using e as a material.
ら６ｎｍの厚さに形成されていることを特徴とする請求
項５記載の光情報記録媒体の製造方法。7. The method for manufacturing an optical information recording medium according to claim 5, wherein said crystallization promoting layer has a thickness of 2 nm to 6 nm.
ら１０ｎｍの厚さに形成されていることを特徴とする請
求項６記載の光情報記録媒体の製造方法。8. The method for manufacturing an optical information recording medium according to claim 6, wherein said crystallization promoting layer has a thickness of 5 nm to 10 nm.
の範囲の成膜レートで成膜されていることを特徴とする
請求項５から請求項８のいずれかに記載の光情報記録媒
体の製造方法。9. The optical information recording medium according to claim 5, wherein the crystallization promoting layer is formed at a film formation rate of 5 nm / sec or less. Manufacturing method.
報記録媒体の製造方法で製造されたことを特徴とする光
情報記録媒体。10. An optical information recording medium manufactured by the method for manufacturing an optical information recording medium according to claim 1.
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Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1669990A2 (en) * | 2004-12-09 | 2006-06-14 | Electronics And Telecommunications Research Institute | Apparatus and method of initializing phase-change optical disk |
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Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1669990A2 (en) * | 2004-12-09 | 2006-06-14 | Electronics And Telecommunications Research Institute | Apparatus and method of initializing phase-change optical disk |
| EP1669990A3 (en) * | 2004-12-09 | 2007-08-08 | Electronics And Telecommunications Research Institute | Apparatus and method of initializing phase-change optical disk |
| US7558187B2 (en) | 2004-12-09 | 2009-07-07 | Electronics And Telecommunications Research Institute | Apparatus and method of initializing phase-change optical disk |
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