JP2002086346A5 - - Google Patents

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Publication number
JP2002086346A5
JP2002086346A5 JP2000276319A JP2000276319A JP2002086346A5 JP 2002086346 A5 JP2002086346 A5 JP 2002086346A5 JP 2000276319 A JP2000276319 A JP 2000276319A JP 2000276319 A JP2000276319 A JP 2000276319A JP 2002086346 A5 JP2002086346 A5 JP 2002086346A5
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JP
Japan
Prior art keywords
polishing pad
polishing
resin
pad according
cyclic olefin
Prior art date
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Pending
Application number
JP2000276319A
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English (en)
Japanese (ja)
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JP2002086346A (ja
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Publication date
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Priority to JP2000276319A priority Critical patent/JP2002086346A/ja
Priority claimed from JP2000276319A external-priority patent/JP2002086346A/ja
Publication of JP2002086346A publication Critical patent/JP2002086346A/ja
Publication of JP2002086346A5 publication Critical patent/JP2002086346A5/ja
Pending legal-status Critical Current

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JP2000276319A 2000-09-12 2000-09-12 研磨パッド Pending JP2002086346A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000276319A JP2002086346A (ja) 2000-09-12 2000-09-12 研磨パッド

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000276319A JP2002086346A (ja) 2000-09-12 2000-09-12 研磨パッド

Publications (2)

Publication Number Publication Date
JP2002086346A JP2002086346A (ja) 2002-03-26
JP2002086346A5 true JP2002086346A5 (https=) 2006-10-19

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ID=18761808

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000276319A Pending JP2002086346A (ja) 2000-09-12 2000-09-12 研磨パッド

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JP (1) JP2002086346A (https=)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10255652B4 (de) * 2002-11-28 2005-07-14 Infineon Technologies Ag Schleifkissen, Vorrichtung zum chemisch-mechanischen Polieren und Verfahren zum nasschemischen Schleifen einer Substratoberfläche
JP4688456B2 (ja) * 2004-09-10 2011-05-25 株式会社ディスコ 化学的機械的研磨装置
JP2009274150A (ja) * 2008-05-13 2009-11-26 Kawamura Sangyo Kk 被研磨物保持材用基材の製造方法及び被研磨物保持材用基材
KR20110033202A (ko) 2008-06-20 2011-03-30 쓰리엠 이노베이티브 프로퍼티즈 컴파니 성형된 미세구조화된 용품 및 그 제조 방법
JP5967999B2 (ja) * 2011-03-31 2016-08-10 Hoya株式会社 磁気ディスク用ガラス基板の製造方法
JP6345977B2 (ja) * 2014-05-02 2018-06-20 古河電気工業株式会社 研磨パッド、研磨パッドを用いた研磨方法及び該研磨パッドの使用方法

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