JP2002075691A - プラズマ発生装置 - Google Patents
プラズマ発生装置Info
- Publication number
- JP2002075691A JP2002075691A JP2001136294A JP2001136294A JP2002075691A JP 2002075691 A JP2002075691 A JP 2002075691A JP 2001136294 A JP2001136294 A JP 2001136294A JP 2001136294 A JP2001136294 A JP 2001136294A JP 2002075691 A JP2002075691 A JP 2002075691A
- Authority
- JP
- Japan
- Prior art keywords
- cathode
- plasma generator
- generator according
- plasma
- anode
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J17/00—Gas-filled discharge tubes with solid cathode
- H01J17/02—Details
- H01J17/04—Electrodes; Screens
- H01J17/06—Cathodes
- H01J17/066—Cold cathodes
Landscapes
- Plasma Technology (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB0011080A GB0011080D0 (en) | 2000-05-08 | 2000-05-08 | Electrodes and plasma generating devices including electrodes |
GB0011080.9 | 2000-05-08 |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2002075691A true JP2002075691A (ja) | 2002-03-15 |
Family
ID=9891186
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2001136294A Withdrawn JP2002075691A (ja) | 2000-05-08 | 2001-05-07 | プラズマ発生装置 |
Country Status (3)
Country | Link |
---|---|
JP (1) | JP2002075691A (zh) |
CN (1) | CN1209947C (zh) |
GB (2) | GB0011080D0 (zh) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH696179A5 (de) * | 2000-06-08 | 2007-01-31 | Satis Vacuum Ind Vertriebs Ag | Plasma-Verdampfungsquelle für eine Vakuum Beschichtungsanordnung zum Aufbringen von Vergütungsschichten auf optische Substrate. |
CN101621181B (zh) * | 2003-05-15 | 2012-09-12 | 夏普株式会社 | 离子发生元件、离子发生装置、电气设备 |
CN102126078B (zh) * | 2011-01-31 | 2013-04-17 | 东莞市星毅焊接设备科技有限公司 | 引弧座 |
CN104833477A (zh) * | 2015-05-12 | 2015-08-12 | 中国商用飞机有限责任公司北京民用飞机技术研究中心 | 一种用于测量翼型或叶栅表面流场的喷射式光谱探针 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4105408C1 (zh) * | 1991-02-21 | 1992-09-17 | Plasma-Technik Ag, Wohlen, Ch | |
US5705886A (en) * | 1994-12-21 | 1998-01-06 | Philips Electronics North America Corp. | Cathode for plasma addressed liquid crystal display |
GB9502435D0 (en) * | 1995-02-08 | 1995-03-29 | Smiths Industries Plc | Displays |
US5982095A (en) * | 1995-09-19 | 1999-11-09 | Lucent Technologies Inc. | Plasma displays having electrodes of low-electron affinity materials |
FR2754969B1 (fr) * | 1996-10-18 | 1998-11-27 | Giat Ind Sa | Torche a plasma a etancheite amelioree |
-
2000
- 2000-05-08 GB GB0011080A patent/GB0011080D0/en not_active Ceased
-
2001
- 2001-03-13 GB GB0106163A patent/GB2362502B/en not_active Expired - Fee Related
- 2001-04-04 CN CN 01119296 patent/CN1209947C/zh not_active Expired - Fee Related
- 2001-05-07 JP JP2001136294A patent/JP2002075691A/ja not_active Withdrawn
Also Published As
Publication number | Publication date |
---|---|
GB0106163D0 (en) | 2001-05-02 |
GB2362502B (en) | 2004-10-13 |
GB0011080D0 (en) | 2000-06-28 |
CN1340990A (zh) | 2002-03-20 |
CN1209947C (zh) | 2005-07-06 |
GB2362502A (en) | 2001-11-21 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
JP2868120B2 (ja) | 電子ビーム励起プラズマ発生装置 | |
JP3924734B2 (ja) | イオン注入機、イオン源及びイオンのプラズマ形成方法 | |
US7382098B2 (en) | Plasma producing apparatus and doping apparatus | |
US7626135B2 (en) | Electrode systems and methods of using electrodes | |
JPS59140375A (ja) | 反応スパッタリング装置およびマグネトロン電極装置 | |
JPH0635323B2 (ja) | 表面処理方法 | |
JP2001135253A (ja) | イオナイザーおよびイオン源 | |
JPH03500109A (ja) | 乱れた形態のクロム冷陰極を有するプラズマスイッチ | |
US7038389B2 (en) | Magnetron plasma source | |
TW201913711A (zh) | 用於離子佈植機的離子產生器 | |
Gavrilov et al. | High-current pulse sources of broad beams of gas and metal ions for surface treatment | |
JP4089022B2 (ja) | 自己電子放射型ecrイオンプラズマ源 | |
JP3481953B2 (ja) | 基板をコーティングするための装置 | |
JP2002075691A (ja) | プラズマ発生装置 | |
US20090166555A1 (en) | RF electron source for ionizing gas clusters | |
JP3989507B2 (ja) | ガス原子内包フラーレンの製造装置及び製造方法並びにガス原子内包フラーレン | |
TWI240762B (en) | Cathode electrode for plasma sources and plasma source of a vacuum coating device, in particular for the application of coating layers on optical substrates | |
JP2007123270A (ja) | イオン発生装置 | |
JP4677123B2 (ja) | 高密度へリコンプラズマを利用した緻密な硬質薄膜の形成装置及び形成方法 | |
JP6637285B2 (ja) | 放電を発生させるための装置及び方法 | |
TW475222B (en) | Plasma generator | |
RU2796652C1 (ru) | Устройство для формирования пучка кластерных или атомарных ионов газа | |
Takahashi et al. | Development of a low temperature plasma source providing ion flow energy control | |
RU2088056C1 (ru) | Генератор атомарного водорода | |
Saenko | Discharges with the electrode homogeneously evaporated in vacuum (DEHEV) |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A300 | Withdrawal of application because of no request for examination |
Free format text: JAPANESE INTERMEDIATE CODE: A300 Effective date: 20080805 |