JP2002033190A5 - - Google Patents

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Publication number
JP2002033190A5
JP2002033190A5 JP2001142465A JP2001142465A JP2002033190A5 JP 2002033190 A5 JP2002033190 A5 JP 2002033190A5 JP 2001142465 A JP2001142465 A JP 2001142465A JP 2001142465 A JP2001142465 A JP 2001142465A JP 2002033190 A5 JP2002033190 A5 JP 2002033190A5
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JP
Japan
Prior art keywords
organic
reaction chamber
substrate
cell
manufacturing
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Application number
JP2001142465A
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English (en)
Japanese (ja)
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JP4597421B2 (ja
JP2002033190A (ja
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Priority to JP2001142465A priority Critical patent/JP4597421B2/ja
Priority claimed from JP2001142465A external-priority patent/JP4597421B2/ja
Publication of JP2002033190A publication Critical patent/JP2002033190A/ja
Publication of JP2002033190A5 publication Critical patent/JP2002033190A5/ja
Application granted granted Critical
Publication of JP4597421B2 publication Critical patent/JP4597421B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2001142465A 2000-05-12 2001-05-11 発光装置の作製方法 Expired - Fee Related JP4597421B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001142465A JP4597421B2 (ja) 2000-05-12 2001-05-11 発光装置の作製方法

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000141005 2000-05-12
JP2000-141005 2000-05-12
JP2001142465A JP4597421B2 (ja) 2000-05-12 2001-05-11 発光装置の作製方法

Publications (3)

Publication Number Publication Date
JP2002033190A JP2002033190A (ja) 2002-01-31
JP2002033190A5 true JP2002033190A5 (ko) 2008-06-19
JP4597421B2 JP4597421B2 (ja) 2010-12-15

Family

ID=26591839

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001142465A Expired - Fee Related JP4597421B2 (ja) 2000-05-12 2001-05-11 発光装置の作製方法

Country Status (1)

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JP (1) JP4597421B2 (ko)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4066661B2 (ja) 2002-01-23 2008-03-26 セイコーエプソン株式会社 有機ｅｌ装置の製造装置および液滴吐出装置
JP3979135B2 (ja) * 2002-03-20 2007-09-19 セイコーエプソン株式会社 チャンバ装置、これを備えた電気光学装置および有機ｅｌ装置
JP2004006311A (ja) * 2002-04-15 2004-01-08 Semiconductor Energy Lab Co Ltd 発光装置の作製方法および製造装置
US7309269B2 (en) 2002-04-15 2007-12-18 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating light-emitting device and apparatus for manufacturing light-emitting device
TWI277363B (en) 2002-08-30 2007-03-21 Semiconductor Energy Lab Fabrication system, light-emitting device and fabricating method of organic compound-containing layer
JP5072184B2 (ja) * 2002-12-12 2012-11-14 株式会社半導体エネルギー研究所 成膜方法
JP4840186B2 (ja) * 2007-02-19 2011-12-21 セイコーエプソン株式会社 チャンバ装置
KR20140022804A (ko) * 2011-03-03 2014-02-25 도쿄엘렉트론가부시키가이샤 증착 장치, 증착 방법, 유기 el 디스플레이 및 조명 장치
CN112877649A (zh) * 2021-04-01 2021-06-01 宁波星河材料科技有限公司 一种便于更换坩埚的高通量薄膜制备装置及其应用

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5141595A (en) * 1990-03-05 1992-08-25 Northrop Corporation Method and apparatus for carbon coating and boron-doped carbon coating
JP3569933B2 (ja) * 1993-11-12 2004-09-29 石川島播磨重工業株式会社 連続真空蒸着装置
JPH0831741A (ja) * 1994-07-12 1996-02-02 Sumitomo Electric Ind Ltd Ｋセル型蒸着源
US5554220A (en) * 1995-05-19 1996-09-10 The Trustees Of Princeton University Method and apparatus using organic vapor phase deposition for the growth of organic thin films with large optical non-linearities
JPH09184070A (ja) * 1996-01-05 1997-07-15 Chugai Ro Co Ltd Ｐｖｄ成膜装置のシャッタ機構
JP3483719B2 (ja) * 1997-01-09 2004-01-06 株式会社アルバック 有機材料用蒸発源及びこれを用いた有機薄膜形成装置
US6337102B1 (en) * 1997-11-17 2002-01-08 The Trustees Of Princeton University Low pressure vapor phase deposition of organic thin films

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