JP2002030433A5 - - Google Patents
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- JP2002030433A5 JP2002030433A5 JP2000212073A JP2000212073A JP2002030433A5 JP 2002030433 A5 JP2002030433 A5 JP 2002030433A5 JP 2000212073 A JP2000212073 A JP 2000212073A JP 2000212073 A JP2000212073 A JP 2000212073A JP 2002030433 A5 JP2002030433 A5 JP 2002030433A5
- Authority
- JP
- Japan
- Prior art keywords
- target
- magnetic circuit
- substrate
- voltage value
- mask member
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212073A JP4082852B2 (ja) | 2000-07-13 | 2000-07-13 | 薄膜形成装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000212073A JP4082852B2 (ja) | 2000-07-13 | 2000-07-13 | 薄膜形成装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002030433A JP2002030433A (ja) | 2002-01-31 |
| JP2002030433A5 true JP2002030433A5 (enExample) | 2005-08-04 |
| JP4082852B2 JP4082852B2 (ja) | 2008-04-30 |
Family
ID=18708039
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000212073A Expired - Fee Related JP4082852B2 (ja) | 2000-07-13 | 2000-07-13 | 薄膜形成装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4082852B2 (enExample) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5393972B2 (ja) * | 2007-11-05 | 2014-01-22 | Ｈｏｙａ株式会社 | マスクブランク及び転写用マスクの製造方法 |
| KR100932934B1 (ko) * | 2007-12-13 | 2009-12-21 | 삼성모바일디스플레이주식회사 | 스퍼터링 장치 및 스퍼터링 장치를 사용한 평판 표시장치의제조방법 |
| JP5302916B2 (ja) * | 2010-03-05 | 2013-10-02 | キヤノンアネルバ株式会社 | 基板処理装置 |
| JP5849334B2 (ja) * | 2012-02-14 | 2016-01-27 | 株式会社Ｊｏｌｅｄ | スパッタリング装置のメンテナンス時期決定方法、メンテナンス方法、スパッタリング装置 |
| TWI438297B (zh) * | 2012-06-06 | 2014-05-21 | Au Optronics Corp | 濺鍍機及其磁鐵的控制方法 |
| CN105803410B (zh) * | 2016-04-29 | 2018-07-17 | 京东方科技集团股份有限公司 | 磁控溅射装置、磁控溅射设备及磁控溅射的方法 |
-
2000
- 2000-07-13 JP JP2000212073A patent/JP4082852B2/ja not_active Expired - Fee Related
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