JP4082852B2 - 薄膜形成装置 - Google Patents

薄膜形成装置 Download PDF

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Publication number
JP4082852B2
JP4082852B2 JP2000212073A JP2000212073A JP4082852B2 JP 4082852 B2 JP4082852 B2 JP 4082852B2 JP 2000212073 A JP2000212073 A JP 2000212073A JP 2000212073 A JP2000212073 A JP 2000212073A JP 4082852 B2 JP4082852 B2 JP 4082852B2
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Japan
Prior art keywords
magnetic circuit
target
potential
inner mask
substrate
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Expired - Fee Related
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JP2000212073A
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Japanese (ja)
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JP2002030433A (ja
JP2002030433A5 (enExample
Inventor
裕一 中上
和利 宮澤
宗和 西原
国通 金谷
良一 小西
誠 清原
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Panasonic Corp
Panasonic Holdings Corp
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Panasonic Corp
Matsushita Electric Industrial Co Ltd
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Priority to JP2000212073A priority Critical patent/JP4082852B2/ja
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Publication of JP2002030433A5 publication Critical patent/JP2002030433A5/ja
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Publication of JP4082852B2 publication Critical patent/JP4082852B2/ja
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JP2000212073A 2000-07-13 2000-07-13 薄膜形成装置 Expired - Fee Related JP4082852B2 (ja)

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JP2000212073A JP4082852B2 (ja) 2000-07-13 2000-07-13 薄膜形成装置

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JP2000212073A JP4082852B2 (ja) 2000-07-13 2000-07-13 薄膜形成装置

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JP2002030433A JP2002030433A (ja) 2002-01-31
JP2002030433A5 JP2002030433A5 (enExample) 2005-08-04
JP4082852B2 true JP4082852B2 (ja) 2008-04-30

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JP2000212073A Expired - Fee Related JP4082852B2 (ja) 2000-07-13 2000-07-13 薄膜形成装置

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Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102817001A (zh) * 2012-06-06 2012-12-12 友达光电股份有限公司 溅镀机及其磁铁的控制方法

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5393972B2 (ja) * 2007-11-05 2014-01-22 Ｈｏｙａ株式会社 マスクブランク及び転写用マスクの製造方法
KR100932934B1 (ko) * 2007-12-13 2009-12-21 삼성모바일디스플레이주식회사 스퍼터링 장치 및 스퍼터링 장치를 사용한 평판 표시장치의제조방법
JP5302916B2 (ja) * 2010-03-05 2013-10-02 キヤノンアネルバ株式会社 基板処理装置
JP5849334B2 (ja) * 2012-02-14 2016-01-27 株式会社Ｊｏｌｅｄ スパッタリング装置のメンテナンス時期決定方法、メンテナンス方法、スパッタリング装置
CN105803410B (zh) * 2016-04-29 2018-07-17 京东方科技集团股份有限公司 磁控溅射装置、磁控溅射设备及磁控溅射的方法

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102817001A (zh) * 2012-06-06 2012-12-12 友达光电股份有限公司 溅镀机及其磁铁的控制方法
CN102817001B (zh) * 2012-06-06 2014-05-14 友达光电股份有限公司 溅镀机及其磁铁的控制方法

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JP2002030433A (ja) 2002-01-31

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