JP2002003226A - Die for molding optical element and its producing method - Google Patents

Die for molding optical element and its producing method

Info

Publication number
JP2002003226A
JP2002003226A JP2000178643A JP2000178643A JP2002003226A JP 2002003226 A JP2002003226 A JP 2002003226A JP 2000178643 A JP2000178643 A JP 2000178643A JP 2000178643 A JP2000178643 A JP 2000178643A JP 2002003226 A JP2002003226 A JP 2002003226A
Authority
JP
Japan
Prior art keywords
optical element
transfer
molding die
base material
element molding
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000178643A
Other languages
Japanese (ja)
Other versions
JP3667198B2 (en
Inventor
Shigeru Hashimoto
茂 橋本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000178643A priority Critical patent/JP3667198B2/en
Publication of JP2002003226A publication Critical patent/JP2002003226A/en
Application granted granted Critical
Publication of JP3667198B2 publication Critical patent/JP3667198B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B11/00Pressing molten glass or performed glass reheated to equivalent low viscosity without blowing
    • C03B11/06Construction of plunger or mould
    • C03B11/08Construction of plunger or mould for making solid articles, e.g. lenses
    • C03B11/084Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor
    • C03B11/086Construction of plunger or mould for making solid articles, e.g. lenses material composition or material properties of press dies therefor of coated dies
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/10Die base materials
    • C03B2215/12Ceramics or cermets, e.g. cemented WC, Al2O3 or TiC
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/16Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals
    • C03B2215/17Metals or alloys, e.g. Ni-P, Ni-B, amorphous metals comprising one or more of the noble meals, i.e. Ag, Au, platinum group metals
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/14Die top coat materials, e.g. materials for the glass-contacting layers
    • C03B2215/24Carbon, e.g. diamond, graphite, amorphous carbon
    • CCHEMISTRY; METALLURGY
    • C03GLASS; MINERAL OR SLAG WOOL
    • C03BMANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B2215/00Press-moulding glass
    • C03B2215/02Press-mould materials
    • C03B2215/08Coated press-mould dies
    • C03B2215/30Intermediate layers, e.g. graded zone of base/top material
    • C03B2215/34Intermediate layers, e.g. graded zone of base/top material of ceramic or cermet material, e.g. diamond-like carbon

Landscapes

  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Manufacturing & Machinery (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a molding die for an optical element, which enables the shape of an optical element with a polyhedral body and a free curved face, which cannot be realized by any conventional grinding work, to repeatedly be press-formed and also to precisely be transferred regardless of a glass species or a molding condition; to provide a producing method for the die; to provide a free-curved-face, polyhedral-body optical element. SOLUTION: The optical element molding die has a transfer-face for forming an optical element on a part of a base material. The producing method for the die comprises a transfer process wherein a transfer is conducted onto the surface of a transfer-material by using a matrix cut and processed into a shape inverse to that of the transfer-face after the transfer-material is formed on the base material, a process wherein the transfer-material is cured, an etching process wherein the transfer-material and the base material are subjected to dry etching and the transfer-shape is engraved on the base material, a process wherein an intermediate layer and a surface layer are formed on the surface of the base material etched. The optical element molding die obtained by the above producing method is provided and the free-curved-face, polyhedral-body optical element is also provided.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、レンズやプリズム
等のガラスよりなる光学素子を、ガラス素材のプレス成
型により高精度に製造するのに使用される型及びその製
造方法に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a mold used for manufacturing an optical element made of glass such as a lens or a prism with high precision by press-molding a glass material, and a method for manufacturing the same.

【0002】[0002]

【従来の技術】研磨工程を必要とせず、ガラス素材のプ
レス成型によってレンズを製造する技術は、従来の製造
において必要とされた複雑な工程をなくし、簡単かつ安
価にレンズを製造することを可能とし、近年レンズのみ
ならずプリズムその他のガラスよりなる光学素子の製造
に使用されるようになった。
2. Description of the Related Art The technology of manufacturing a lens by press molding a glass material without the need for a polishing step eliminates the complicated steps required in conventional manufacturing, and allows the lens to be manufactured easily and inexpensively. In recent years, it has been used in the manufacture of optical elements made of not only lenses but also prisms and other glasses.

【0003】このようなガラスの光学素子のプレス成型
に使用される型材に要求される性質としては、硬度、耐
酸化性、耐熱性、離型性及び鏡面加工性等に優れている
ことが挙げられる。従来、この種の型材として金属、セ
ラミックス及びそれらをコーテイングした材料等、数多
く提案がなされている。いくつかの例を挙げるなら、特
開昭49−51112号公報には13Crマルテンサイ
ト鋼が、特開昭52−45613号公報にはSiC及び
Si34が、特開昭59−121126号公報にはTi
C及び金属の混合材料が、特開昭60−246230号
公報には超硬合金に貴金属をコーティングした材料が、
また特開昭61−183134号公報、特開昭61−2
81030号公報及び特開平1−301864号公報に
はダイヤモンド薄膜もしくはダイヤモンド状炭素膜、特
開昭64−83529号公報には硬質炭素膜をコーティ
ングした材料が開示されている。
[0003] The properties required of a mold used for press molding of such a glass optical element include excellent hardness, oxidation resistance, heat resistance, mold release properties and mirror workability. Can be Heretofore, many proposals have been made as a mold material of this kind, such as metal, ceramics, and a material obtained by coating them. If some examples, 13Cr martensitic steels in JP-A-49-51112 is, Japanese Patent Publication No. Sho 52-45613 is SiC and Si 3 N 4, Sho 59-121126 JP Has Ti
A mixed material of C and a metal is disclosed in Japanese Patent Application Laid-Open No. 60-246230.
Also, JP-A-61-183134 and JP-A-61-2
JP-A-81030 and JP-A-1-301864 disclose a material coated with a diamond thin film or a diamond-like carbon film, and JP-A-64-83529 discloses a material coated with a hard carbon film.

【0004】しかしながら、従来の型材料では、硬度、
耐酸化性、耐熱性、離型性及び鏡面加工性を全て満足す
るものは得られていない。
However, in the conventional mold material, the hardness,
A product satisfying all of oxidation resistance, heat resistance, mold release property and mirror workability has not been obtained.

【0005】例えば、13マルテンサイト鋼は酸化し易
く、更に高温でFeがガラス中に拡散してガラスを着色
する欠点を持つ。
[0005] For example, 13 martensitic steel has the drawback that it is easily oxidized and that Fe diffuses into the glass at a high temperature to color the glass.

【0006】また、SiC、Si34、TiC、ダイヤ
モンド薄膜、ダイヤモンド状炭素膜及び硬質炭素膜は、
材料の硬度が非常に硬く機械的強度は優れているもの
の、加工性に劣り、高精度な型形状に加工することが困
難である。更には、SiC、Si34及びTiCでは、
高温で酸化が起こりガラスの融着が生じる。
Further, SiC, Si 3 N 4 , TiC, diamond thin film, diamond-like carbon film and hard carbon film are
Although the hardness of the material is very high and the mechanical strength is excellent, the workability is inferior and it is difficult to process the material into a highly accurate mold shape. Furthermore, in SiC, Si 3 N 4 and TiC,
Oxidation occurs at high temperatures, causing glass fusing.

【0007】また、超硬合金母材上に貴金属薄膜、ダイ
ヤモンド薄膜、ダイヤモンド状炭素膜又は硬質炭素膜を
コーティングした型では、超硬合金を加工する手段とし
て、ダイヤモンド砥石を用いて加工することが一般的で
あるが、曲率の小さい球面や自由曲面等には加工できな
いという欠点を有している。ここでいう自由曲面とは、
非軸対称な非球面を含む面である。
In a mold in which a noble metal thin film, a diamond thin film, a diamond-like carbon film, or a hard carbon film is coated on a cemented carbide base material, it is possible to use a diamond grindstone as a means for processing the cemented carbide. Although it is general, it has a drawback that it cannot be processed into a spherical surface or a free-form surface with a small curvature. The free-form surface here means
This is a surface including a non-axisymmetric aspheric surface.

【0008】これらの改善策として、超硬合金母材上
に、容易に精密加工できる切削加工層として、特開平3
−23230号公報では無電解Ni−Pメッキ膜、特開
平7−41326号公報ではPを含む3元合金(P−N
i、Co、Fe−Si、Ti、Cu、Zr、Nb、M
o、Ru、Ph、Pd、Hf、Ta、W、Re、Os、
Ir)をスパッタ成膜し、この切削加工層に対して必要
なダイヤモンドバイトにより切削加工を施して転写面を
形成し、この加工層上に貴金属系の合金薄膜をスパッタ
成膜する方法が開示されている。
As a measure for improvement, a cutting layer which can be easily machined on a cemented carbide base material is disclosed in
No. 23230, an electroless Ni-P plating film, and JP-A-7-41326, a ternary alloy containing P (P-N
i, Co, Fe-Si, Ti, Cu, Zr, Nb, M
o, Ru, Ph, Pd, Hf, Ta, W, Re, Os,
A method is disclosed in which Ir) is sputter-deposited, the cut layer is cut with a necessary diamond tool to form a transfer surface, and a noble metal-based alloy thin film is sputter-deposited on the cut layer. ing.

【0009】しかし、無電解Ni−Pメッキ膜や3元合
金のスパッタ膜は、充分な密着性を有しておらず、成型
条件やガラスの硝種、特に高融点ガラスでは、繰り返し
プレス成型時に切削加工層に亀裂が生じたり、母材と切
削加工層が剥離するという欠点を有している。
However, the electroless Ni-P plating film and the ternary alloy sputtered film do not have sufficient adhesion, and the molding conditions and glass types, especially high-melting glass, are repeatedly cut during press molding. There are disadvantages in that a crack occurs in the processed layer and the base material and the cut layer are separated.

【0010】また、回折格子等の微細形状を転写する型
として、特開平6−279036号公報では、切削加工
層のかわりに加工層としてSi又はSiO2をフォトリ
ソ及びドライエッチングで所望の形状に加工したり、特
開平10−337734号公報では、レジストを用いて
フォトリソ及びドライエッチングで母材を所望の形状に
加工することが開示されているが、硝種、形状が限定さ
れるという欠点を有している。
As a mold for transferring a fine shape such as a diffraction grating, Japanese Patent Application Laid-Open No. 6-279036 discloses a method in which Si or SiO 2 is processed into a desired shape by photolithography and dry etching instead of a cutting layer. Japanese Patent Application Laid-Open No. 10-337734 discloses that a base material is processed into a desired shape by photolithography and dry etching using a resist, but has a drawback that the type of glass and the shape are limited. ing.

【0011】また、回折格子等の微細形状を直接加工す
る光学素子として、特開平8−43605号公報では、
レプリカ及びドライエッチングで所望の形状に加工した
り、特開平9−243812号公報では、レジストを切
削加工後、ドライエッチングで所望の形状に加工するこ
とが開示されているが、形状が限定されたり、生産性が
低いという欠点を有している。
Japanese Patent Application Laid-Open No. 8-43605 discloses an optical element for directly processing a fine shape such as a diffraction grating.
Processing to a desired shape by replica and dry etching, and Japanese Patent Application Laid-Open No. 9-243812 discloses cutting a resist and then processing to a desired shape by dry etching, but the shape is limited. And has the disadvantage of low productivity.

【0012】[0012]

【発明が解決しようとする課題】本発明の目的は、この
ような従来の課題を解消し、従来の研削加工では実現で
きなかった多面体自由曲面の形状を持った光学素子を、
成型条件やガラスの硝種に拘わらず、繰り返しプレス成
型を行っても、精密に形状が転写する光学素子成型用型
及びその製造方法、自由曲面多面体光学素子を提供する
ことにある。
SUMMARY OF THE INVENTION An object of the present invention is to solve such a conventional problem and provide an optical element having a polyhedral free-form surface which cannot be realized by conventional grinding.
An object of the present invention is to provide an optical element molding die capable of transferring a shape precisely even if press molding is repeatedly performed regardless of molding conditions and glass types of glass, a manufacturing method thereof, and a free-form polyhedral optical element.

【0013】本発明の別の目的は、光学素子を量産する
場合、同一形状の型が多数必要となり、特に、多面体成
型の場合、複数の型を組み合わせた分割型の場合、型間
のばらつきが生じたり、型組み合わせに莫大な調整時間
を要していたので、このような場合に対して、同一形状
の一体型を、速やかかつ安価に製造できる光学素子成型
用型の製造方法を提供することにある。
Another object of the present invention is that when mass-producing optical elements, a large number of molds having the same shape are required. In particular, in the case of polyhedral molding, in the case of a split mold in which a plurality of molds are combined, variations among the molds are reduced. To provide a method for manufacturing a mold for optical element molding, which can quickly and inexpensively produce an integrated mold having the same shape in such a case since it takes a lot of time to adjust a mold combination. It is in.

【0014】[0014]

【課題を解決するための手段】本発明に従って、母材の
一部に光学素子を成型するための転写面を有する成型用
型であって、前記母材上に転写材を形成した後、転写面
に対応する逆形状の形状に切削加工された母型を用い
て、転写材の表面への転写を行う転写工程と、上記転写
材を硬化する工程と、上記転写材及び母材に対してドラ
イエッチングを行い、転写形状を上記母材に彫り写すエ
ッチング工程と、エッチングされた前記母材表面に、中
間層、表面層を形成する工程と、を有する光学素子成型
用型の製造方法が提供される。
According to the present invention, there is provided a molding die having a transfer surface for molding an optical element on a part of a base material, wherein a transfer material is formed on the base material and then transferred. Using a matrix cut into an inverted shape corresponding to the surface, a transfer step of transferring to the surface of the transfer material, a step of curing the transfer material, and a step of curing the transfer material and the base material Provided is a method for manufacturing an optical element molding die, comprising: an etching step of engraving a transfer shape on the base material by performing dry etching; and a step of forming an intermediate layer and a surface layer on the etched base material surface. Is done.

【0015】また、本発明に従って、上記光学素子成型
用型の製造方法により製造された光学素子成型用型が提
供される。
Further, according to the present invention, there is provided an optical element molding die manufactured by the above method for manufacturing an optical element molding die.

【0016】更に、本発明に従って、上記光学素子成型
用型の製造方法により製造された光学素子成型用型を用
いて成型された自由曲面多面体光学素子が提供される。
Further, according to the present invention, there is provided a free-form surface polyhedral optical element molded using the optical element molding die manufactured by the above-described method for manufacturing an optical element molding die.

【0017】[0017]

【発明の実施の形態】本発明では、母材の一部に光学素
子を成型するための転写面を有する成型用型であって、
前記母材上に転写材を形成した後、転写面に対応する逆
形状の形状に切削加工された母型を用いて、転写材の表
面への転写を行う転写工程と、上記転写材を硬化する工
程と、上記転写材及び母材に対してドライエッチングを
行い、転写形状を上記母材に彫り写すエッチング工程
と、エッチングされた前記母材表面に、中間層、表面層
を形成する工程と、を有する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS According to the present invention, there is provided a molding die having a transfer surface for molding an optical element on a part of a base material,
After forming the transfer material on the base material, using a mother die cut into an inverted shape corresponding to the transfer surface, a transfer step of transferring to the surface of the transfer material, and curing the transfer material Performing a dry etching on the transfer material and the base material, engraving the transfer shape on the base material, and forming an intermediate layer and a surface layer on the etched base material surface. And

【0018】更に、転写面に対応する逆形状の形状に切
削加工された母型が、エッチングによる面変化を予め補
正した形状に切削加工されたことが、所望の形状の型を
得るために好ましい。また、要求される光学素子の性能
により、エッチング工程後、母材表面が均等研磨転加工
する工程を有する。
Further, it is preferable to obtain a mold having a desired shape by cutting the master having been cut into an inverted shape corresponding to the transfer surface into a shape in which the surface change due to etching has been corrected in advance. . Further, according to the required performance of the optical element, a step of uniformly polishing and rolling the base material surface after the etching step is provided.

【0019】そして、転写面に対応する逆形状の形状に
切削加工された母型が、ダイヤモンドバイトで容易に加
工できる例えば、銅、アルミニウム及びリン青銅等の金
属であることが、ダイヤモンドバイト摩耗性の面で好ま
しい。また、母型は、硬化前の樹脂等の転写材を成型す
るだけのため、超硬金属の様な硬度及び耐熱性が必要で
はなく、切削性のみを考慮すればよい。
[0019] The mother die cut into an inverted shape corresponding to the transfer surface is made of a metal such as copper, aluminum and phosphor bronze which can be easily processed with a diamond tool. It is preferable in terms of. In addition, since the master mold only molds a transfer material such as a resin before curing, it does not need the hardness and heat resistance of a super hard metal, and only needs to consider the machinability.

【0020】母材としては、高温硬度の面でタングステ
ンカーバイト(WC)を主成分とする超硬合金、転写材
とのエッチング速度を調整し易い石英が好ましい。転写
材としては、転写性と母材とエッチング速度の等しくな
る光硬化性樹脂、熱硬化性樹脂及び熱可塑性樹脂が好ま
しい。中間層としては、表面層との密着性の面で金属の
炭化物、窒化物及び炭窒化物が好ましい。表面層として
は、ガラスとの離型性の面で硬質炭素膜及び貴金属系合
金膜が好ましい。
As the base material, a cemented carbide mainly composed of tungsten carbide (WC) in terms of high-temperature hardness, and quartz which is easy to adjust the etching rate with the transfer material are preferable. As the transfer material, a photocurable resin, a thermosetting resin, or a thermoplastic resin, which has the same transferability as the base material and the etching rate, is preferable. As the intermediate layer, metal carbides, nitrides, and carbonitrides are preferable in terms of adhesion to the surface layer. As the surface layer, a hard carbon film and a noble metal based alloy film are preferable in terms of releasability from glass.

【0021】また、母材上に、転写材とエッチング速度
が等しくなるような、例えば、Si、Cr、Ti及びT
aのような金属、該金属の酸化物からなるエッチング調
整層を形成した後、転写材を形成することが母材表面の
鏡面性の面で好ましい。
Further, for example, Si, Cr, Ti and T are formed on the base material so that the transfer material and the etching rate are equal.
It is preferable to form a transfer material after forming an etching adjustment layer made of a metal such as a and an oxide of the metal, from the viewpoint of the mirror surface of the base material surface.

【0022】また、必要に応じて、転写工程の後、転写
材表面を軟化させ、母型の切削の送り跡が転写された面
を平滑化することもできる。
Further, if necessary, after the transfer step, the surface of the transfer material can be softened to smooth the surface on which the feed trace of the cutting of the matrix has been transferred.

【0023】また、母材を放電加工や研削加工等で近似
形状までを行った後、転写材を形成することが転写性の
精度を向上するうえで好ましい。
It is preferable to form the transfer material after the base material is processed to an approximate shape by electric discharge machining, grinding, or the like, from the viewpoint of improving the transferability accuracy.

【0024】また、母型が自由曲面形状の場合、母型を
切削加工後、均等研磨することが好ましい。
When the matrix has a free-form surface shape, it is preferable that the matrix be cut and then uniformly polished.

【0025】また、多面体成型を行う型が、隣接する面
自体が干渉して、一体型が切削できないような形状で
も、一面ずつ切削及び均等研磨した母型を組み合わせる
ことにより、所望の形状が得られる再現性のよい多面体
母光学素子成型用型が得られる。
Further, even if the mold for performing polyhedral molding has a shape in which adjacent surfaces themselves interfere with each other and the integrated mold cannot be cut, a desired shape can be obtained by combining the mother dies which are cut and uniformly polished one by one. A mold for molding a polyhedral mother optical element with good reproducibility can be obtained.

【0026】図1を参照して、本発明の作用を説明す
る。
The operation of the present invention will be described with reference to FIG.

【0027】(a1)の1は、自由曲面の転写面を3面
持つ、近似形状に加工した光学素子成型用型母材であ
る。母材材料としては、高温硬度の面でタングステンカ
ーバイト(WC)を主成分とする超硬合金、転写面の鏡
面性の面で転写材とのエッチング速度を調整し易い石英
が適用される。近似形状への加工は、放電加工が用いら
れる。更に、高温硬度と鏡面性の両面で、近似形状に加
工した母材上に、転写材とエッチング速度が等しくなる
ような、例えば、Si、Cr、Ti及びTaのような金
属、該金属の酸化物からなるエッチング調整層を、スパ
ッタ又はCVD等の公知な成膜法で形成することができ
る。
Reference numeral 1 of (a1) denotes an optical element molding base material having three transfer surfaces of a free-form surface and processed into an approximate shape. As the base material, a cemented carbide mainly composed of tungsten carbide (WC) in terms of high-temperature hardness, and quartz whose etching rate with the transfer material is easy to adjust in terms of the mirror surface of the transfer surface are applied. Electric discharge machining is used for machining to an approximate shape. Furthermore, a metal such as Si, Cr, Ti, and Ta, or an oxidation of the metal, such that the etching rate is equal to that of the transfer material on a base material processed into an approximate shape on both sides of high-temperature hardness and mirror finish. The etching adjustment layer made of a material can be formed by a known film forming method such as sputtering or CVD.

【0028】(a2)の21、22及び23は、それぞ
れ、個別に自由曲面形状転写面に対応する逆形状の形状
に切削加工された母型である。母型は、ダイヤモンドバ
イトで容易に加工できる例えば、銅、アルミニウム又は
リン青銅等の金属であることが、ダイヤモンドバイト摩
耗性の面で好ましい。これは、高温で型転写する必要が
ないので、切削加工が困難な超硬合金等を使用する必要
がないためである。また、切削による送り痕は、要求さ
れる光学性能上必要であれば、均等研磨で送り痕を除去
する必要がある。転写面の逆形状としては、エッチング
による面変化を予め補正した形状に切削加工されたこと
が、エッチング条件の調整が容易になる。また、本発明
においては、転写面形状は自由曲面に限定されるもでな
く、球面、非球面及び回折格子等の組み合わせにも適用
される。また、母型表面の離型性を向上するため、母型
21、22及び23の表面を公知な方法で、金属薄膜等
の離型膜を形成したり、離型処理を施したりすることが
できる。
Reference numerals 21, 22, and 23 in (a2) denote base dies each having a reverse shape corresponding to the free-form surface transfer surface. The matrix is preferably made of a metal such as copper, aluminum or phosphor bronze, which can be easily processed with a diamond tool, in terms of diamond tool wear. This is because it is not necessary to transfer the mold at a high temperature, so that it is not necessary to use a hard metal or the like which is difficult to cut. In addition, it is necessary to remove the feed trace due to the cutting by uniform polishing if necessary for the required optical performance. As the inverse shape of the transfer surface, the cutting process is performed in such a manner that the surface change due to the etching is corrected in advance, so that the etching condition can be easily adjusted. In the present invention, the shape of the transfer surface is not limited to a free-form surface, but may be applied to a combination of a spherical surface, an aspherical surface, a diffraction grating, and the like. Further, in order to improve the releasability of the surface of the matrix, it is possible to form a release film such as a metal thin film or perform a release treatment on the surfaces of the molds 21, 22, and 23 by a known method. it can.

【0029】(b)、(c)は、転写工程である。母材
1の上に軟質状態である転写材3を形成し、21、22
及び23を一体化した母型を、転写材に押し付け、転写
材を硬化し、母型を分離する。転写材として、光硬化性
樹脂である紫外線硬化樹脂を用いる場合には、紫外光を
照射し硬化させる。転写材として、熱硬化性材料を用い
る場合には、加熱により硬化させ、熱可塑性材料を用い
る場合には、加熱により転写材を軟化させつつ、母型2
1、22及び23を押し付ける表面形状を転写する。
(B) and (c) are transfer steps. A transfer material 3 in a soft state is formed on a base material 1,
Is pressed against the transfer material, the transfer material is cured, and the master is separated. When an ultraviolet curable resin, which is a photocurable resin, is used as the transfer material, the transfer material is cured by irradiating ultraviolet light. When a thermosetting material is used as the transfer material, the transfer material is cured by heating, and when a thermoplastic material is used, the transfer material is softened by heating, and the matrix 2 is heated.
Transfer the surface shape pressing 1, 22, and 23.

【0030】そこで、この状態から、異方性のドライエ
ッチングを、転写材3と母材1とに行い、転写材3の表
面の3面の自由曲面形状を、母材1に彫り写すエッチン
グ工程を実施すると、(d)に示すように、所望の3面
の自由曲面形状を有する光学素子成型型が得られる。
Then, from this state, an anisotropic dry etching is performed on the transfer material 3 and the base material 1, and an etching step of engraving the three free-form surfaces of the surface of the transfer material 3 on the base material 1. Is performed, an optical element molding die having three desired free-form surface shapes is obtained as shown in FIG.

【0031】一般的に、物理エッチングは化学エッチン
グに比べて制御が容易であり、しかも、同一の出発形状
に対し、エッチング速度比の制御を同一にすれば、常に
同一の所望形状が得られ、再現性に優れている。従っ
て、エッチング工程は、ECR、RIE及び低圧高密度
プラズマ等の公知な物理エッチングが好ましい。エッチ
ング工程における異方性エッチングは、転写材と母材の
エッチングの速度比を等しくすれば、転写材の表面に形
成された形状を、そのまま合同的に母型に彫り写すこと
ができる。転写材と母材のエッチングの速度比を等しく
する手段として、転写材の硬化条件を制御したり、希ガ
ス(Ar等)、フッ化炭素系ガス(CF4等)、塩素系
ガス(Cl2等)又は酸素ガス(O2)等のエッチングガ
スの組み合わせ、流量等を最適化することで達成され
る。また、要求される光学素子の性能により、エッチン
グ工程後、母材表面を、均等研磨転加工により微小な凹
凸を取り除くことで、特に型母材が超硬合金の場合は鏡
面性を増すことができる。
In general, physical etching is easier to control than chemical etching, and if the control of the etching rate ratio is the same for the same starting shape, the same desired shape can always be obtained. Excellent reproducibility. Therefore, the etching process is preferably a known physical etching such as ECR, RIE, and low-pressure high-density plasma. In the anisotropic etching in the etching step, if the etching rate ratio between the transfer material and the base material is made equal, the shape formed on the surface of the transfer material can be jointly engraved as it is on the base mold. As means for equalizing the etching rate ratio between the transfer material and the base material, curing conditions of the transfer material are controlled, and rare gas (such as Ar), carbon fluoride gas (such as CF 4 ), chlorine gas (such as Cl 2) are used. Etc.) or by optimizing the combination and flow rate of an etching gas such as an oxygen gas (O 2 ). Also, depending on the required performance of the optical element, after the etching process, the surface of the base material can be removed by removing fine irregularities by uniform polishing and rolling, thereby increasing the specularity particularly when the mold base material is a cemented carbide. it can.

【0032】以上の工程で、型母材1が所望の形状が得
られれば、ガラスモールドの成型性を増すために、型母
材上に、中間層としては、表面層との密着性の面で金属
の炭化物、窒化物又は炭窒化物を形成し、更に、中間層
上に表面層としては、ガラスとの離型性の面で、硬質炭
素膜又は貴金属系合金膜を形成することで光学素子成型
用型が作製できる。
In the above steps, if the desired shape of the mold base material 1 is obtained, in order to increase the moldability of the glass mold, an intermediate layer is formed on the mold base material as an intermediate layer having an adhesive property with the surface layer. To form a metal carbide, nitride or carbonitride, and as a surface layer on the intermediate layer, a hard carbon film or a noble metal-based alloy film is formed on the surface in terms of mold releasability from glass. An element molding die can be manufactured.

【0033】以上の様に、本発明の光学素子成型用型の
製造方法によれば、従来の研削加工では実現できなかっ
た多面体自由曲面の形状を持った光学素子を、成型条件
やガラスの硝種に拘わらず、繰り返しプレス成型を行っ
ても、精密に形状が転写する型を提供することが可能と
なった。また、前述した工程を繰り返せば、同一形状の
一体型を、速やかかつ安価に提供することが可能にな
り、分割型の場合の型間のばらつきが無くなり、型組み
合わせに莫大な調整時間が不用となる。
As described above, according to the method of manufacturing an optical element molding die of the present invention, an optical element having a polyhedral free-form surface, which cannot be realized by conventional grinding, can be formed under molding conditions and glass types. In spite of this, it has become possible to provide a mold whose shape is precisely transferred even if press molding is performed repeatedly. In addition, by repeating the above-described steps, it becomes possible to provide an integrated mold having the same shape quickly and inexpensively, eliminating the variation between molds in the case of the split mold, and eliminating the need for enormous adjustment time for mold combinations. Become.

【0034】[0034]

【実施例】以下に、具体的な実施例を挙げて本発明をよ
り詳細に説明する。
The present invention will be described below in more detail with reference to specific examples.

【0035】(実施例1)図1の(a1)の1は、自由
曲面の転写面を3面持つ、放電加工で近似形状に加工し
たタングステンカーバイト(WC)を主成分とする超硬
合金製の光学素子成型用型母材である。図1の(a2)
の21、22及び23は、それぞれ、個別に自由曲面形
状転写面に対応する様に、エッチングによる面変化を予
め補正した形状にダイヤモンドバイトに切削加工及び均
等研磨された無酸素銅製母型である。
(Example 1) 1 of (a1) in FIG. 1 is a cemented carbide mainly composed of tungsten carbide (WC) which has three transfer surfaces of a free-form surface and is formed into an approximate shape by electric discharge machining. Is a base material for optical element molding. (A2) in FIG.
Reference numerals 21, 22 and 23 denote oxygen-free copper matrices which are individually cut and even polished into diamond tools in a shape in which surface changes due to etching have been corrected in advance so as to individually correspond to the free-form surface transfer surface. .

【0036】図1の(b)、(c)は、転写工程であ
る。母材1の上に軟質状態である熱硬化性樹脂製の転写
材3を形成し、21、22及び23を一体化した母型
を、転写材に押し付け、転写材を加熱硬化し、母型を分
離する。
FIGS. 1B and 1C show a transfer step. A transfer material 3 made of a thermosetting resin, which is in a soft state, is formed on a base material 1, and a matrix in which 21, 22, and 23 are integrated is pressed against the transfer material, and the transfer material is cured by heating. Is separated.

【0037】次に、この状態から、異方性のドライエッ
チングを、転写材3と母材1とに行い、転写材3の表面
の3面の自由曲面形状を、母材1に彫り写すエッチング
工程を実施し、(d)に示すように、所望の3面の自由
曲面形状を有する光学素子成型型が得られた。このドラ
イエッチングはリアクティブエッチング装置を用い、エ
ッチングガスとして、ArガスとCF4ガスを用いた。
ガス流量比はAr/CF4=3/1、圧力0.5Paと
した。
Next, in this state, anisotropic dry etching is performed on the transfer material 3 and the base material 1, and the three free-form surfaces of the transfer material 3 are etched on the base material 1. The process was performed, and as shown in (d), an optical element mold having the desired three free-form surface shapes was obtained. For this dry etching, a reactive etching apparatus was used, and Ar gas and CF 4 gas were used as etching gases.
The gas flow ratio was Ar / CF 4 = 3/1 and the pressure was 0.5 Pa.

【0038】次に、エッチングされた面を均等研磨加工
を行う。
Next, the etched surface is uniformly polished.

【0039】本発明の光学素子成型用型の模式的断面図
を図2に示す。
FIG. 2 is a schematic sectional view of the optical element molding die of the present invention.

【0040】成型型母材41の均等研磨加工された面
に、Tiターゲットを用い、導入ガスとして窒素ガスを
用いて反応性スパッタでTiNの中間層42を膜厚1μ
mで形成する。
A TiN intermediate layer 42 having a thickness of 1 μm was formed on the uniformly polished surface of the mold base material 41 by reactive sputtering using a Ti target and a nitrogen gas as an introduction gas.
m.

【0041】次に、この中間層42上に、イオンビーム
蒸着法により硬質炭素膜の表面層43を100nm形成
する。
Next, a surface layer 43 of a hard carbon film having a thickness of 100 nm is formed on the intermediate layer 42 by an ion beam evaporation method.

【0042】以上述べた工程と同様の工程を繰り返し
て、同形状の型を3型製作する。また、反対面の型を同
様の工程を繰り返して、同形状の型を4型製作する。
By repeating the same steps as those described above, three molds having the same shape are manufactured. The same process is repeated for the mold on the opposite side to produce four molds of the same shape.

【0043】これらの型を4組用いて連続成型機を用い
て多面体自由曲面プリズムのガラス成型(ホウ珪酸系ガ
ラス)を行った所、どの型も3000ショット成型後も
良好な成型品が得られ、また転写面の劣化も観察されな
かった。また、成型品の型間の形状バラツキも生じなか
った。
When four sets of these molds were used to form a polyhedral free-form prism glass (borosilicate glass) using a continuous molding machine, good molds were obtained even after 3000 shots of each mold. Also, no deterioration of the transfer surface was observed. Also, there was no variation in the shape between the molds of the molded product.

【0044】(実施例2)実施例1において、光学素子
成型用型母材1を石英とし、転写材3を紫外線硬化樹脂
とし、この転写材の硬化方法を、石英母材に紫外線を透
過させて硬化、転写工程を行う以外は、実施例1と同様
にして光学素子成型用型を製造した。
(Example 2) In Example 1, the optical element molding die base material 1 was made of quartz and the transfer material 3 was made of an ultraviolet curable resin. The method of curing the transfer material was such that ultraviolet light was transmitted through the quartz base material. An optical element molding die was manufactured in the same manner as in Example 1 except that the curing and transfer steps were performed.

【0045】これらの型を4組用いて連続成型機を用い
て多面体自由曲面プリズムのガラス成型(ホウ珪酸系ガ
ラス)を行った所、どの型も3000ショット成型後も
良好な成型品が得られ、また転写面の劣化も観察されな
かった。また、成型品の型間の形状バラツキも生じなか
った。
When four sets of these molds were used to form a polyhedral free-form prism glass using a continuous molding machine (borosilicate glass), good molds were obtained even after 3000 shots of each mold. Also, no deterioration of the transfer surface was observed. Also, there was no variation in the shape between the molds of the molded product.

【0046】(実施例3)実施例1において、転写材3
を熱可塑性樹脂とし、この転写材の硬化方法を、固体状
態である転写材に母型を押圧しつつ転写材を加熱し、軟
化状態で形状を転写し、その後、加熱状態を停止して変
形状態を固定する以外は、実施例1と同様にして光学素
子成型用型を製造した。
(Embodiment 3) In the embodiment 1, the transfer material 3
Is a thermoplastic resin, and the method of curing this transfer material is as follows. The transfer material is heated while pressing the matrix onto the transfer material in a solid state, the shape is transferred in a softened state, and then the heating state is stopped and deformed. An optical element molding die was manufactured in the same manner as in Example 1 except that the state was fixed.

【0047】これらの型を4組用いて連続成型機を用い
て多面体自由曲面プリズムのガラス成型(ホウ珪酸系ガ
ラス)を行った所、どの型も3000ショット成型後も
良好な成型品が得られ、また転写面の劣化も観察されな
かった。また、成型品の型間の形状バラツキも生じなか
った。
When four sets of these molds were used to form a polyhedral free-form surface prism glass (borosilicate glass) using a continuous molding machine, good molds were obtained even after 3000 shots of each mold. Also, no deterioration of the transfer surface was observed. Also, there was no variation in the shape between the molds of the molded product.

【0048】(実施例4)実施例1において、中間層4
2のTiN膜を形成する代わりに表1に示した、チタ
ン、タンタル、クロム又はシリコンの炭化物、窒化物又
は炭窒化物を形成する以外は、実施例2と同様にして光
学素子成型用型を製造した。この型のガラス成型性を測
定したとろ、実施例1と同等であった。
(Example 4) In Example 1, the intermediate layer 4
2 except that a carbide, nitride or carbonitride of titanium, tantalum, chromium, or silicon shown in Table 1 was formed instead of forming the TiN film of Example 2. Manufactured. The glass moldability of this mold was measured and found to be the same as in Example 1.

【0049】[0049]

【表1】 [Table 1]

【0050】(実施例5)実施例1において、表面層4
3の硬質炭素膜を形成する代わりに表2に示した、P
t、Pd、Ir、Rh、Os、Ru、Re、Au、W及
びTaの組み合わせの2元以上の合金を0.5μmの膜
厚で形成する以外は、実施例1と同様にして光学素子成
型用型を製造した。この型のガラス成型性を測定したと
ろ、実施例1と同等であった。
(Example 5) In Example 1, the surface layer 4
Instead of forming the hard carbon film of No. 3, P shown in Table 2
Optical element molding was performed in the same manner as in Example 1, except that a binary alloy of t, Pd, Ir, Rh, Os, Ru, Re, Au, W, and Ta was formed to a thickness of 0.5 μm. A mold was manufactured. The glass moldability of this mold was measured and found to be the same as in Example 1.

【0051】[0051]

【表2】 [Table 2]

【0052】本発明の実施例では、中間層、表面層にお
いて、各々成分を変えたが、これらの組み合わせでも、
同様の効果が得られることは言うまでもない。
In the embodiments of the present invention, the components were changed in the intermediate layer and the surface layer.
It goes without saying that a similar effect can be obtained.

【0053】(実施例6)実施例1において、中間層4
2を形成する際、金属Tiを電子銃で加熱蒸発させ、窒
素プラズマ中でイオンプレーティングすることによりT
iNを形成する以外は、実施例1と同様にして光学素子
成型用型を製造した。
(Example 6) In Example 1, the intermediate layer 4
2 is formed by heating and evaporating metal Ti with an electron gun and performing ion plating in nitrogen plasma.
Except for forming iN, a mold for molding an optical element was manufactured in the same manner as in Example 1.

【0054】この型を連続成型機を用いてガラス成型
(ホウ珪酸系ガラス)を行った所、3000ショット成
型後も良好な成型品が得られ、また転写面の劣化も観察
されなかった。
When this mold was subjected to glass molding (borosilicate glass) using a continuous molding machine, a good molded product was obtained even after 3000 shot molding, and no deterioration of the transfer surface was observed.

【0055】(実施例7)実施例1において、母材1上
に、エッチング調整層としてSiO2をスパッタで1μ
mの膜厚で形成する以外は、実施例1と同様にして光学
素子成型用型を製造した。
(Example 7) In Example 1, 1 μm of SiO 2 was sputtered on the base material 1 as an etching adjusting layer by sputtering.
An optical element molding die was manufactured in the same manner as in Example 1 except that the mold was formed with a film thickness of m.

【0056】この型を連続成型機を用いてガラス成型
(ホウ珪酸系ガラス)を行った所、3000ショット成
型後も良好な成型品が得られ、また転写面の劣化も観察
されなかった。
When this mold was subjected to glass molding (borosilicate glass) using a continuous molding machine, a good molded product was obtained even after 3000 shot molding, and no deterioration of the transfer surface was observed.

【0057】(実施例8)実施例7において、エッチン
グ調整層として、SiO2の代わりに表3に示した材質
とそれに対応するエッチングガスを用いて光学素子成型
用型を製造したが、SiO2と同様の効果が得られた。
[0057] In Example 8 Example 7, as the etching control layer has been to produce an optical element molding die with the material and corresponding etching gas to that shown in place of the SiO 2 in Table 3, SiO 2 The same effect as described above was obtained.

【0058】[0058]

【表3】 [Table 3]

【0059】(実施例9)実施例1において、母型2
1、22及び23の材質をアルミニウム、及びリン青銅
にする以外は、実施例1と同様にして光学素子成型用型
を製造した。
(Embodiment 9)
An optical element molding die was manufactured in the same manner as in Example 1, except that the materials 1, 22, and 23 were aluminum and phosphor bronze.

【0060】これらの型を4組用いて連続成型機を用い
て多面体自由曲面プリズムのガラス成型(ホウ珪酸系ガ
ラス)を行った所、どの型も3000ショット成型後も
良好な成型品が得られ、また転写面の劣化も観察されな
かった。また、成型品の型間の形状バラツキも生じなか
った。
When a glass molding (borosilicate glass) of a polyhedral free-form surface prism was performed using a continuous molding machine using four sets of these molds, good molded products were obtained even after 3000 shot molding. Also, no deterioration of the transfer surface was observed. Also, there was no variation in the shape between the molds of the molded product.

【0061】[0061]

【発明の効果】以上の様に、本発明の光学素子成型用型
の製造方法によれば、従来の研削加工では実現できなか
った多面体自由曲面の形状を持った光学素子を、成型条
件やガラスの硝種に拘わらず、繰り返しプレス成型を行
っても、精密に形状が転写する光学素子成型用型を提供
することが可能となった。また、前述した工程を繰り返
せば、同一形状の一体型を、速やかかつ安価に製造でき
る光学素子成型用型の製造方法を提供することが可能に
なり、分割型の場合の型間のばらつき、型組み合わせに
莫大な調整時間が不用となった。
As described above, according to the method of manufacturing an optical element molding die of the present invention, an optical element having a polyhedral free-form surface, which cannot be realized by conventional grinding, can be formed under molding conditions or glass conditions. Regardless of the glass type, it is possible to provide an optical element molding die whose shape is accurately transferred even if press molding is repeatedly performed. Further, by repeating the above-described steps, it becomes possible to provide a method of manufacturing an optical element molding die capable of manufacturing an integrated mold having the same shape quickly and inexpensively. Huge adjustment time was not needed for the combination.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の光学素子成型用型の模式工程加工図で
ある。
FIG. 1 is a schematic process drawing of an optical element molding die according to the present invention.

【図2】本発明の光学素子成型用型の模式的断面図であ
る。
FIG. 2 is a schematic sectional view of an optical element molding die according to the present invention.

【符号の説明】[Explanation of symbols]

1,41 成型型母材 21,22,23 母型 3 転写材 42 中間層 43 表面層 1,41 Mold base material 21,22,23 Base mold 3 Transfer material 42 Intermediate layer 43 Surface layer

Claims (11)

【特許請求の範囲】[Claims] 【請求項1】 母材の一部に光学素子を成型するための
転写面を有する成型用型であって、該母材上に転写材を
形成した後、転写面に対応する逆形状の形状に切削加工
された母型を用いて、転写材の表面への転写を行う転写
工程と、該転写材を硬化する工程と、該転写材及び母材
に対してドライエッチングを行い、転写形状を上記母材
に彫り写すエッチング工程と、エッチングされた前記母
材表面に、中間層、表面層を形成する工程と、を有する
ことを特徴とする光学素子成型用型の製造方法。
1. A molding die having a transfer surface for molding an optical element on a part of a base material, wherein the transfer material is formed on the base material and then has an inverted shape corresponding to the transfer surface. A transfer step of transferring to the surface of the transfer material using a mother die cut into a shape, a step of hardening the transfer material, and performing dry etching on the transfer material and the base material to form a transfer shape. A method for manufacturing an optical element molding die, comprising: an etching step of engraving on the base material; and a step of forming an intermediate layer and a surface layer on the etched base material surface.
【請求項2】 転写面に対応する逆形状の形状に切削加
工された母型が、エッチングによる面変化を予め補正し
た形状に切削加工された請求項1に記載の光学素子成型
用型の製造方法。
2. The method of manufacturing an optical element molding die according to claim 1, wherein the mother die cut into an inverted shape corresponding to the transfer surface is cut into a shape in which a surface change due to etching is corrected in advance. Method.
【請求項3】 エッチング工程後、母材表面が均等研磨
加工された請求項1又は2に記載の光学素子成型用型の
製造方法。
3. The method for manufacturing an optical element molding die according to claim 1, wherein the base material surface is uniformly polished after the etching step.
【請求項4】 転写面に対応する逆形状の形状に切削加
工された母型が、ダイヤモンドバイトで容易に加工でき
る金属である請求項1〜3のいずれかに記載の光学素子
成型用型の製造方法。
4. The optical element molding die according to claim 1, wherein the mother die cut into an inverted shape corresponding to the transfer surface is a metal that can be easily processed with a diamond tool. Production method.
【請求項5】 母材がタングステンカーバイト(WC)
を主成分とする超硬合金又は石英であり、転写材が光硬
化性樹脂、熱硬化性樹脂又は熱可塑性樹脂であり、中間
層が金属の炭化物、窒化物又は炭窒化物であり、表面層
が硬質炭素膜又は貴金属系合金膜である請求項1〜4の
いずれかに記載の光学素子成型用型の製造方法。
5. The base material is tungsten carbide (WC)
The main material is a cemented carbide or quartz, the transfer material is a photocurable resin, a thermosetting resin or a thermoplastic resin, the intermediate layer is a metal carbide, nitride or carbonitride, and the surface layer Is a hard carbon film or a noble metal alloy film. The method for manufacturing an optical element molding die according to claim 1, wherein
【請求項6】 母材上に、転写材とエッチング速度が等
しくなるような金属、該金属の酸化物からなるエッチン
グ調整層を形成した後、転写材を形成する請求項1〜5
のいずれかに記載の光学素子成型用型の製造方法。
6. A transfer material is formed after forming an etching adjustment layer made of a metal and an oxide of the metal such that the etching rate is equal to that of the transfer material on the base material.
The method for producing an optical element molding die according to any one of the above.
【請求項7】 母材を放電加工、研削加工等で近似形状
までを行った後、転写材を形成する請求項1〜6のいず
れかに記載の光学素子成型用型の製造方法。
7. The method for manufacturing an optical element molding die according to claim 1, wherein the transfer material is formed after the base material is processed to an approximate shape by electric discharge machining, grinding, or the like.
【請求項8】 母型が、切削加工後、均等研磨された自
由曲面である請求項1〜7のいずれかに記載の光学素子
成型用型の製造方法。
8. The method for manufacturing an optical element molding die according to claim 1, wherein the matrix is a free-form surface that is uniformly polished after cutting.
【請求項9】 母型が複数個の母型を所望の形状が得ら
れる様に組み合わせた請求項1〜8のいずれかに記載の
光学素子成型用型の製造方法。
9. The method for manufacturing an optical element molding die according to claim 1, wherein a plurality of mother dies are combined so as to obtain a desired shape.
【請求項10】 請求項1〜9のいずれかに記載の光学
素子成型用型の製造方法により製造されたことを特徴と
する光学素子成型用型。
10. An optical element molding die manufactured by the method for manufacturing an optical element molding die according to claim 1. Description:
【請求項11】 請求項1〜9のいずれかに記載の光学
素子成型用型の製造方法により製造された光学素子成型
用型を用いて成型されたことを特徴とする自由曲面多面
体光学素子。
11. A free-form polyhedral optical element molded using an optical element molding die manufactured by the method for manufacturing an optical element molding die according to claim 1. Description:
JP2000178643A 2000-06-14 2000-06-14 Manufacturing method of mold for optical element molding Expired - Fee Related JP3667198B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000178643A JP3667198B2 (en) 2000-06-14 2000-06-14 Manufacturing method of mold for optical element molding

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000178643A JP3667198B2 (en) 2000-06-14 2000-06-14 Manufacturing method of mold for optical element molding

Publications (2)

Publication Number Publication Date
JP2002003226A true JP2002003226A (en) 2002-01-09
JP3667198B2 JP3667198B2 (en) 2005-07-06

Family

ID=18680044

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000178643A Expired - Fee Related JP3667198B2 (en) 2000-06-14 2000-06-14 Manufacturing method of mold for optical element molding

Country Status (1)

Country Link
JP (1) JP3667198B2 (en)

Also Published As

Publication number Publication date
JP3667198B2 (en) 2005-07-06

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