JP2001527689A5 - - Google Patents

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Publication number
JP2001527689A5
JP2001527689A5 JP1998540704A JP54070498A JP2001527689A5 JP 2001527689 A5 JP2001527689 A5 JP 2001527689A5 JP 1998540704 A JP1998540704 A JP 1998540704A JP 54070498 A JP54070498 A JP 54070498A JP 2001527689 A5 JP2001527689 A5 JP 2001527689A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Ceased
Application number
JP1998540704A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001527689A (ja
Filing date
Publication date
Priority claimed from US08/820,013 external-priority patent/US5872426A/en
Application filed filed Critical
Publication of JP2001527689A publication Critical patent/JP2001527689A/ja
Publication of JP2001527689A5 publication Critical patent/JP2001527689A5/ja
Ceased legal-status Critical Current

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JP54070498A 1997-03-18 1998-03-17 グロープラズマ放電装置 Ceased JP2001527689A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/820,013 US5872426A (en) 1997-03-18 1997-03-18 Glow plasma discharge device having electrode covered with perforated dielectric
US08/820,013 1997-03-18
PCT/US1998/005174 WO1998042002A1 (en) 1997-03-18 1998-03-17 Glow plasma discharge device

Publications (2)

Publication Number Publication Date
JP2001527689A JP2001527689A (ja) 2001-12-25
JP2001527689A5 true JP2001527689A5 (enExample) 2005-12-02

Family

ID=25229669

Family Applications (1)

Application Number Title Priority Date Filing Date
JP54070498A Ceased JP2001527689A (ja) 1997-03-18 1998-03-17 グロープラズマ放電装置

Country Status (9)

Country Link
US (2) US5872426A (enExample)
EP (1) EP1012863B1 (enExample)
JP (1) JP2001527689A (enExample)
KR (1) KR20000076338A (enExample)
AT (1) ATE229227T1 (enExample)
AU (1) AU720025B2 (enExample)
CA (1) CA2284242C (enExample)
DE (1) DE69809943T2 (enExample)
WO (1) WO1998042002A1 (enExample)

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JP2005509255A (ja) * 2001-11-02 2005-04-07 プラズマゾル・コーポレイション 非熱プラズマスリット放電装置
US20040050684A1 (en) * 2001-11-02 2004-03-18 Plasmasol Corporation System and method for injection of an organic based reagent into weakly ionized gas to generate chemically active species
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US6841201B2 (en) * 2001-12-21 2005-01-11 The Procter & Gamble Company Apparatus and method for treating a workpiece using plasma generated from microwave radiation
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US6919551B2 (en) * 2002-08-29 2005-07-19 Micron Technology Inc. Differential column readout scheme for CMOS APS pixels
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US20040073221A1 (en) * 2002-10-11 2004-04-15 Spineco, Inc., A Corporation Of Ohio Electro-stimulation and medical delivery device
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US9120073B2 (en) * 2009-06-05 2015-09-01 Eon Labs, Llc Distributed dielectric barrier discharge reactor
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US10882021B2 (en) 2015-10-01 2021-01-05 Ion Inject Technology Llc Plasma reactor for liquid and gas and method of use
US10187968B2 (en) 2015-10-08 2019-01-22 Ion Inject Technology Llc Quasi-resonant plasma voltage generator
US10046300B2 (en) 2015-12-09 2018-08-14 Ion Inject Technology Llc Membrane plasma reactor
US11095088B1 (en) 2018-02-21 2021-08-17 Zoyka Llc Multi-pass coaxial molecular gas laser
CN112087857A (zh) * 2019-06-12 2020-12-15 中国石油化工股份有限公司 电晕放电等离子体发生装置
CN114205983B (zh) * 2021-11-09 2024-05-14 中国人民解放军军事科学院国防工程研究院工程防护研究所 一种诊断等离子体电子密度的测量系统和方法

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