JP2001520160A - 溶湯から結晶を引き出すためのダイ - Google Patents
溶湯から結晶を引き出すためのダイInfo
- Publication number
- JP2001520160A JP2001520160A JP2000516090A JP2000516090A JP2001520160A JP 2001520160 A JP2001520160 A JP 2001520160A JP 2000516090 A JP2000516090 A JP 2000516090A JP 2000516090 A JP2000516090 A JP 2000516090A JP 2001520160 A JP2001520160 A JP 2001520160A
- Authority
- JP
- Japan
- Prior art keywords
- die
- capillary channel
- angle
- degrees
- flat surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
- C30B15/34—Edge-defined film-fed crystal-growth using dies or slits
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B15/00—Single-crystal growth by pulling from a melt, e.g. Czochralski method
-
- C—CHEMISTRY; METALLURGY
- C30—CRYSTAL GROWTH
- C30B—SINGLE-CRYSTAL GROWTH; UNIDIRECTIONAL SOLIDIFICATION OF EUTECTIC MATERIAL OR UNIDIRECTIONAL DEMIXING OF EUTECTOID MATERIAL; REFINING BY ZONE-MELTING OF MATERIAL; PRODUCTION OF A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; SINGLE CRYSTALS OR HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; AFTER-TREATMENT OF SINGLE CRYSTALS OR A HOMOGENEOUS POLYCRYSTALLINE MATERIAL WITH DEFINED STRUCTURE; APPARATUS THEREFOR
- C30B29/00—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape
- C30B29/60—Single crystals or homogeneous polycrystalline material with defined structure characterised by the material or by their shape characterised by shape
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
- Y10T117/104—Means for forming a hollow structure [e.g., tube, polygon]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
- Y10T117/1044—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die] including means forming a flat shape [e.g., ribbon]
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T117/00—Single-crystal, oriented-crystal, and epitaxy growth processes; non-coating apparatus therefor
- Y10T117/10—Apparatus
- Y10T117/1024—Apparatus for crystallization from liquid or supercritical state
- Y10T117/1032—Seed pulling
- Y10T117/1036—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die]
- Y10T117/1044—Seed pulling including solid member shaping means other than seed or product [e.g., EDFG die] including means forming a flat shape [e.g., ribbon]
- Y10T117/1048—Pulling includes a horizontal component
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Crystallography & Structural Chemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| FR9712680A FR2769639B1 (fr) | 1997-10-10 | 1997-10-10 | Filiere pour le tirage de cristaux a partir d'un bain fondu |
| FR97/12680 | 1997-10-10 | ||
| PCT/FR1998/002171 WO1999019545A1 (fr) | 1997-10-10 | 1998-10-09 | Filiere pour le tirage de cristaux a partir d'un bain fondu |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001520160A true JP2001520160A (ja) | 2001-10-30 |
| JP2001520160A5 JP2001520160A5 (enExample) | 2006-01-05 |
Family
ID=9512081
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000516090A Pending JP2001520160A (ja) | 1997-10-10 | 1998-10-09 | 溶湯から結晶を引き出すためのダイ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6325852B1 (enExample) |
| EP (1) | EP1021599B1 (enExample) |
| JP (1) | JP2001520160A (enExample) |
| DE (1) | DE69804480T2 (enExample) |
| FR (1) | FR2769639B1 (enExample) |
| WO (1) | WO1999019545A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8574968B2 (en) | 2007-07-26 | 2013-11-05 | Soitec | Epitaxial methods and templates grown by the methods |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| IL162518A0 (en) * | 2004-06-14 | 2005-11-20 | Rafael Armament Dev Authority | Dome |
| JP5999044B2 (ja) * | 2013-07-30 | 2016-09-28 | トヨタ自動車株式会社 | 引上式連続鋳造装置及び引上式連続鋳造方法 |
| JP6701615B2 (ja) * | 2014-03-10 | 2020-05-27 | トヨタ自動車株式会社 | 引上式連続鋳造装置及び引上式連続鋳造方法 |
| CN104088012B (zh) * | 2014-07-31 | 2016-09-07 | 中国电子科技集团公司第二十六研究所 | 一种直接生长蓝宝石整流罩的设备 |
| JP7101194B2 (ja) * | 2017-12-07 | 2022-07-14 | 京セラ株式会社 | 単結晶、efg装置用金型、efg装置、単結晶の製造方法、および単結晶部材の製造方法 |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4430305A (en) * | 1979-02-12 | 1984-02-07 | Mobil Solar Energy Corporation | Displaced capillary dies |
| CA1165212A (en) * | 1979-08-10 | 1984-04-10 | Aaron S. Taylor | Crucible assembly |
| DE3310815A1 (de) * | 1983-03-24 | 1984-09-27 | Siemens AG, 1000 Berlin und 8000 München | Verfahren zum ziehen von kristallinen koerpern aus der schmelze unter verwendung von als ziehduesen wirkenden formgebungsteilen |
| JPS60108398A (ja) * | 1983-11-15 | 1985-06-13 | Toshiba Corp | シリコン・リボン結晶の成長方法 |
| JPS61106489A (ja) * | 1984-10-31 | 1986-05-24 | Toshiba Corp | 帯状シリコン結晶の製造方法 |
| FR2712608B1 (fr) * | 1993-11-16 | 1996-01-12 | Commissariat Energie Atomique | Procédé de fabrication de pièces en matériau polycristallin ou monocristallin par croissance à partir d'un bain fondu. |
| US5551977A (en) * | 1994-11-14 | 1996-09-03 | Ase Americas, Inc. | Susceptor for EFG crystal growth apparatus |
-
1997
- 1997-10-10 FR FR9712680A patent/FR2769639B1/fr not_active Expired - Fee Related
-
1998
- 1998-10-09 WO PCT/FR1998/002171 patent/WO1999019545A1/fr not_active Ceased
- 1998-10-09 EP EP98949032A patent/EP1021599B1/fr not_active Expired - Lifetime
- 1998-10-09 JP JP2000516090A patent/JP2001520160A/ja active Pending
- 1998-10-09 DE DE69804480T patent/DE69804480T2/de not_active Expired - Lifetime
- 1998-10-09 US US09/529,305 patent/US6325852B1/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8574968B2 (en) | 2007-07-26 | 2013-11-05 | Soitec | Epitaxial methods and templates grown by the methods |
Also Published As
| Publication number | Publication date |
|---|---|
| FR2769639B1 (fr) | 1999-11-12 |
| DE69804480T2 (de) | 2002-10-31 |
| US6325852B1 (en) | 2001-12-04 |
| DE69804480D1 (de) | 2002-05-02 |
| WO1999019545A1 (fr) | 1999-04-22 |
| EP1021599B1 (fr) | 2002-03-27 |
| EP1021599A1 (fr) | 2000-07-26 |
| FR2769639A1 (fr) | 1999-04-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
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Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20051011 |
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| A621 | Written request for application examination |
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| A131 | Notification of reasons for refusal |
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| A601 | Written request for extension of time |
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| A602 | Written permission of extension of time |
Free format text: JAPANESE INTERMEDIATE CODE: A602 Effective date: 20081209 |
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| A02 | Decision of refusal |
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