JP2001507634A - ガラス上に光学的品質の表面を形成する方法および製品 - Google Patents
ガラス上に光学的品質の表面を形成する方法および製品Info
- Publication number
- JP2001507634A JP2001507634A JP53018098A JP53018098A JP2001507634A JP 2001507634 A JP2001507634 A JP 2001507634A JP 53018098 A JP53018098 A JP 53018098A JP 53018098 A JP53018098 A JP 53018098A JP 2001507634 A JP2001507634 A JP 2001507634A
- Authority
- JP
- Japan
- Prior art keywords
- abrasive
- polishing
- binder
- glass
- rtm
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D13/00—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor
- B24D13/02—Wheels having flexibly-acting working parts, e.g. buffing wheels; Mountings therefor acting by their periphery
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24B—MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
- B24B7/00—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor
- B24B7/20—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground
- B24B7/22—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain
- B24B7/24—Machines or devices designed for grinding plane surfaces on work, including polishing plane glass surfaces; Accessories therefor characterised by a special design with respect to properties of the material of non-metallic articles to be ground for grinding inorganic material, e.g. stone, ceramics, porcelain for grinding or polishing glass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D11/00—Constructional features of flexible abrasive materials; Special features in the manufacture of such materials
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D18/00—Manufacture of grinding tools or other grinding devices, e.g. wheels, not otherwise provided for
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/02—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent
- B24D3/20—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents the constituent being used as bonding agent and being essentially organic
- B24D3/28—Resins or natural or synthetic macromolecular compounds
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B24—GRINDING; POLISHING
- B24D—TOOLS FOR GRINDING, BUFFING OR SHARPENING
- B24D3/00—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents
- B24D3/34—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties
- B24D3/342—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent
- B24D3/344—Physical features of abrasive bodies, or sheets, e.g. abrasive surfaces of special nature; Abrasive bodies or sheets characterised by their constituents characterised by additives enhancing special physical properties, e.g. wear resistance, electric conductivity, self-cleaning properties incorporated in the bonding agent the bonding agent being organic
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Chemical & Material Sciences (AREA)
- Ceramic Engineering (AREA)
- Inorganic Chemistry (AREA)
- Manufacturing & Machinery (AREA)
- Polishing Bodies And Polishing Tools (AREA)
- Surface Treatment Of Glass (AREA)
- Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/778,501 US5876268A (en) | 1997-01-03 | 1997-01-03 | Method and article for the production of optical quality surfaces on glass |
| US08/778,501 | 1997-01-03 | ||
| PCT/US1997/023795 WO1998029217A1 (en) | 1997-01-03 | 1997-12-22 | Method and article for the production of optical quality surfaces on glass |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001507634A true JP2001507634A (ja) | 2001-06-12 |
| JP2001507634A5 JP2001507634A5 (enExample) | 2005-08-11 |
Family
ID=25113558
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP53018098A Withdrawn JP2001507634A (ja) | 1997-01-03 | 1997-12-22 | ガラス上に光学的品質の表面を形成する方法および製品 |
Country Status (9)
| Country | Link |
|---|---|
| US (3) | US5876268A (enExample) |
| EP (1) | EP0949986B1 (enExample) |
| JP (1) | JP2001507634A (enExample) |
| KR (1) | KR100483090B1 (enExample) |
| AU (1) | AU5618498A (enExample) |
| DE (1) | DE69728791T2 (enExample) |
| MY (1) | MY117614A (enExample) |
| TW (1) | TW404878B (enExample) |
| WO (1) | WO1998029217A1 (enExample) |
Cited By (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009072832A (ja) * | 2007-09-18 | 2009-04-09 | Bando Chem Ind Ltd | 研磨シートおよびその製造方法 |
| JP2013514900A (ja) * | 2009-12-22 | 2013-05-02 | スリーエム イノベイティブ プロパティズ カンパニー | 成形研磨粒子を製造するための転写補助スクリーン印刷法及びその結果得られる成形研磨粒子 |
| KR20170070210A (ko) * | 2014-10-17 | 2017-06-21 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| US10399201B2 (en) | 2014-10-17 | 2019-09-03 | Applied Materials, Inc. | Advanced polishing pads having compositional gradients by use of an additive manufacturing process |
| US10456886B2 (en) | 2016-01-19 | 2019-10-29 | Applied Materials, Inc. | Porous chemical mechanical polishing pads |
| US10537974B2 (en) | 2014-10-17 | 2020-01-21 | Applied Materials, Inc. | CMP pad construction with composite material properties using additive manufacturing processes |
| US10821573B2 (en) | 2014-10-17 | 2020-11-03 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| US10875153B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Advanced polishing pad materials and formulations |
| US10875145B2 (en) | 2014-10-17 | 2020-12-29 | Applied Materials, Inc. | Polishing pads produced by an additive manufacturing process |
| US12023853B2 (en) | 2014-10-17 | 2024-07-02 | Applied Materials, Inc. | Polishing articles and integrated system and methods for manufacturing chemical mechanical polishing articles |
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| US6599631B2 (en) * | 2001-01-26 | 2003-07-29 | Nanogram Corporation | Polymer-inorganic particle composites |
| US7226966B2 (en) * | 2001-08-03 | 2007-06-05 | Nanogram Corporation | Structures incorporating polymer-inorganic particle blends |
| US5989301A (en) | 1998-02-18 | 1999-11-23 | Saint-Gobain Industrial Ceramics, Inc. | Optical polishing formulation |
| CN1139462C (zh) * | 1998-02-19 | 2004-02-25 | 美国3M公司 | 磨具和研磨玻璃的方法 |
| US5897426A (en) | 1998-04-24 | 1999-04-27 | Applied Materials, Inc. | Chemical mechanical polishing with multiple polishing pads |
| US6099389A (en) * | 1998-10-05 | 2000-08-08 | The United States Of America As Represented By The United States Department Of Energy | Fabrication of an optical component |
| US6296557B1 (en) * | 1999-04-02 | 2001-10-02 | Micron Technology, Inc. | Method and apparatus for releasably attaching polishing pads to planarizing machines in mechanical and/or chemical-mechanical planarization of microelectronic-device substrate assemblies |
| US6634929B1 (en) * | 1999-04-23 | 2003-10-21 | 3M Innovative Properties Company | Method for grinding glass |
| KR20060101791A (ko) * | 1999-04-23 | 2006-09-26 | 쓰리엠 이노베이티브 프로퍼티즈 캄파니 | 유리를 연삭하는 방법 |
| US6458018B1 (en) * | 1999-04-23 | 2002-10-01 | 3M Innovative Properties Company | Abrasive article suitable for abrading glass and glass ceramic workpieces |
| US6375551B1 (en) | 1999-06-25 | 2002-04-23 | Corning Incorporated | Angstrom polishing of calcium fluoride optical VUV microlithography lens elements and preforms |
| US6306012B1 (en) * | 1999-07-20 | 2001-10-23 | Micron Technology, Inc. | Methods and apparatuses for planarizing microelectronic substrate assemblies |
| US7232529B1 (en) * | 1999-08-26 | 2007-06-19 | Hitachi Chemical Company, Ltd. | Polishing compound for chemimechanical polishing and polishing method |
| US6406363B1 (en) * | 1999-08-31 | 2002-06-18 | Lam Research Corporation | Unsupported chemical mechanical polishing belt |
| US6638144B2 (en) | 2000-04-28 | 2003-10-28 | 3M Innovative Properties Company | Method of cleaning glass |
| KR100373846B1 (ko) * | 2000-06-12 | 2003-02-26 | 지앤피테크놀로지 주식회사 | 반도체 및 광학부품용 연마패드 및 그 제조방법 |
| US6964604B2 (en) * | 2000-06-23 | 2005-11-15 | International Business Machines Corporation | Fiber embedded polishing pad |
| US6383066B1 (en) | 2000-06-23 | 2002-05-07 | International Business Machines Corporation | Multilayered polishing pad, method for fabricating, and use thereof |
| US6477926B1 (en) * | 2000-09-15 | 2002-11-12 | Ppg Industries Ohio, Inc. | Polishing pad |
| WO2002028980A2 (en) | 2000-10-06 | 2002-04-11 | 3M Innovative Properties Company | Agglomerate abrasive grain and a method of making the same |
| EP1326941B1 (en) | 2000-10-16 | 2008-01-02 | 3M Innovative Properties Company | Method of making agglomerate particles |
| CA2423597A1 (en) | 2000-10-16 | 2002-04-25 | 3M Innovative Properties Company | Method of making ceramic aggregate particles |
| US6551366B1 (en) * | 2000-11-10 | 2003-04-22 | 3M Innovative Properties Company | Spray drying methods of making agglomerate abrasive grains and abrasive articles |
| US6561889B1 (en) | 2000-12-27 | 2003-05-13 | Lam Research Corporation | Methods for making reinforced wafer polishing pads and apparatuses implementing the same |
| US6572463B1 (en) * | 2000-12-27 | 2003-06-03 | Lam Research Corp. | Methods for making reinforced wafer polishing pads utilizing direct casting and apparatuses implementing the same |
| US6755728B2 (en) * | 2001-03-29 | 2004-06-29 | Noritake Co., Ltd. | Abrasive film in which water-soluble inorganic compound is added to binder |
| US6620031B2 (en) * | 2001-04-04 | 2003-09-16 | Lam Research Corporation | Method for optimizing the planarizing length of a polishing pad |
| US6604990B2 (en) * | 2001-08-31 | 2003-08-12 | Universal Photonics Inc. | Polishing pad and method of producing the same |
| US6685756B2 (en) * | 2001-09-24 | 2004-02-03 | Saint-Gobain Abrasives Technology Company | Coated abrasives |
| GB0123089D0 (en) * | 2001-09-26 | 2001-11-14 | Coombes James E | Door dressing tool |
| US6827633B2 (en) * | 2001-12-28 | 2004-12-07 | Ebara Corporation | Polishing method |
| UA55315A (uk) * | 2002-12-09 | 2003-03-17 | Юрій Михайлович Петрусевич | Шліфувально-полірувальний абразив на гнучкій основі |
| US20050054277A1 (en) * | 2003-09-04 | 2005-03-10 | Teng-Chun Tsai | Polishing pad and method of polishing wafer |
| JP2007514553A (ja) * | 2003-11-26 | 2007-06-07 | スリーエム イノベイティブ プロパティズ カンパニー | 工作物の研磨方法 |
| US7988534B1 (en) * | 2004-05-19 | 2011-08-02 | Sutton Stephen P | Optical polishing pitch formulations |
| US7198549B2 (en) * | 2004-06-16 | 2007-04-03 | Cabot Microelectronics Corporation | Continuous contour polishing of a multi-material surface |
| US7150770B2 (en) * | 2004-06-18 | 2006-12-19 | 3M Innovative Properties Company | Coated abrasive article with tie layer, and method of making and using the same |
| US20050282029A1 (en) * | 2004-06-18 | 2005-12-22 | 3M Innovative Properties Company | Polymerizable composition and articles therefrom |
| US7150771B2 (en) * | 2004-06-18 | 2006-12-19 | 3M Innovative Properties Company | Coated abrasive article with composite tie layer, and method of making and using the same |
| US20060094322A1 (en) * | 2004-10-29 | 2006-05-04 | Ouderkirk Andrew J | Process for manufacturing a light emitting array |
| US7404756B2 (en) * | 2004-10-29 | 2008-07-29 | 3M Innovative Properties Company | Process for manufacturing optical and semiconductor elements |
| US20060198953A1 (en) * | 2005-03-03 | 2006-09-07 | Longtide Technology Co., Ltd. | Process of forming special protecting structure for optical products |
| US7344574B2 (en) | 2005-06-27 | 2008-03-18 | 3M Innovative Properties Company | Coated abrasive article, and method of making and using the same |
| US7344575B2 (en) | 2005-06-27 | 2008-03-18 | 3M Innovative Properties Company | Composition, treated backing, and abrasive articles containing the same |
| KR100655584B1 (ko) * | 2005-07-08 | 2006-12-08 | 동부일렉트로닉스 주식회사 | 실접촉 면적이 서로 다른 영역을 하나의 패드로 구현한고정입자 패드 및 및 그 제조방법 |
| KR101334012B1 (ko) * | 2005-07-25 | 2013-12-02 | 호야 가부시키가이샤 | 마스크 블랭크용 기판의 제조방법, 마스크 블랭크의제조방법 및 마스크의 제조방법 |
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| KR102347711B1 (ko) * | 2014-04-03 | 2022-01-06 | 쓰리엠 이노베이티브 프로퍼티즈 컴파니 | 폴리싱 패드 및 시스템과 이의 제조 및 사용 방법 |
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| WO2019032286A1 (en) | 2017-08-07 | 2019-02-14 | Applied Materials, Inc. | ABRASIVE DISTRIBUTION POLISHING PADS AND METHODS OF MAKING SAME |
| CN111565892A (zh) | 2017-12-29 | 2020-08-21 | 圣戈班磨料磨具公司 | 磨料抛光制品 |
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| CN119635544B (zh) * | 2025-01-10 | 2025-11-11 | 东莞金太阳研磨股份有限公司 | 新型堆积磨料打磨抛光材料及其制备工艺 |
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-
1997
- 1997-01-03 US US08/778,501 patent/US5876268A/en not_active Expired - Lifetime
- 1997-12-22 JP JP53018098A patent/JP2001507634A/ja not_active Withdrawn
- 1997-12-22 DE DE69728791T patent/DE69728791T2/de not_active Expired - Fee Related
- 1997-12-22 KR KR10-1999-7006039A patent/KR100483090B1/ko not_active Expired - Fee Related
- 1997-12-22 WO PCT/US1997/023795 patent/WO1998029217A1/en not_active Ceased
- 1997-12-22 EP EP97952613A patent/EP0949986B1/en not_active Expired - Lifetime
- 1997-12-22 AU AU56184/98A patent/AU5618498A/en not_active Abandoned
- 1997-12-26 TW TW086119801A patent/TW404878B/zh not_active IP Right Cessation
-
1998
- 1998-01-03 MY MYPI98000016A patent/MY117614A/en unknown
- 1998-11-23 US US09/197,656 patent/US5989111A/en not_active Expired - Lifetime
-
1999
- 1999-09-20 US US09/400,005 patent/US6155910A/en not_active Expired - Lifetime
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| JP2009072832A (ja) * | 2007-09-18 | 2009-04-09 | Bando Chem Ind Ltd | 研磨シートおよびその製造方法 |
| JP2013514900A (ja) * | 2009-12-22 | 2013-05-02 | スリーエム イノベイティブ プロパティズ カンパニー | 成形研磨粒子を製造するための転写補助スクリーン印刷法及びその結果得られる成形研磨粒子 |
| KR102295988B1 (ko) | 2014-10-17 | 2021-09-01 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| US10953515B2 (en) | 2014-10-17 | 2021-03-23 | Applied Materials, Inc. | Apparatus and method of forming a polishing pads by use of an additive manufacturing process |
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| JP2017533832A (ja) * | 2014-10-17 | 2017-11-16 | アプライド マテリアルズ インコーポレイテッドApplied Materials,Incorporated | 付加製造プロセスを使用する、複合材料特性を有するcmpパッド構造 |
| KR20170070210A (ko) * | 2014-10-17 | 2017-06-21 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| KR20210110741A (ko) * | 2014-10-17 | 2021-09-08 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| KR102436416B1 (ko) | 2014-10-17 | 2022-08-26 | 어플라이드 머티어리얼스, 인코포레이티드 | 애디티브 제조 프로세스들을 이용한 복합 재료 특성들을 갖는 cmp 패드 구성 |
| US11446788B2 (en) | 2014-10-17 | 2022-09-20 | Applied Materials, Inc. | Precursor formulations for polishing pads produced by an additive manufacturing process |
| US11772229B2 (en) | 2016-01-19 | 2023-10-03 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
| US10456886B2 (en) | 2016-01-19 | 2019-10-29 | Applied Materials, Inc. | Porous chemical mechanical polishing pads |
| US10391605B2 (en) | 2016-01-19 | 2019-08-27 | Applied Materials, Inc. | Method and apparatus for forming porous advanced polishing pads using an additive manufacturing process |
Also Published As
| Publication number | Publication date |
|---|---|
| EP0949986A1 (en) | 1999-10-20 |
| MY117614A (en) | 2004-07-31 |
| US6155910A (en) | 2000-12-05 |
| AU5618498A (en) | 1998-07-31 |
| KR100483090B1 (ko) | 2005-04-15 |
| US5989111A (en) | 1999-11-23 |
| EP0949986B1 (en) | 2004-04-21 |
| DE69728791D1 (de) | 2004-05-27 |
| KR20000062417A (ko) | 2000-10-25 |
| DE69728791T2 (de) | 2005-04-28 |
| TW404878B (en) | 2000-09-11 |
| WO1998029217A1 (en) | 1998-07-09 |
| US5876268A (en) | 1999-03-02 |
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