JP2001501728A - 微細システム技術と微細構造形成のための新規薄層ならびにその使用 - Google Patents
微細システム技術と微細構造形成のための新規薄層ならびにその使用Info
- Publication number
- JP2001501728A JP2001501728A JP10510430A JP51043098A JP2001501728A JP 2001501728 A JP2001501728 A JP 2001501728A JP 10510430 A JP10510430 A JP 10510430A JP 51043098 A JP51043098 A JP 51043098A JP 2001501728 A JP2001501728 A JP 2001501728A
- Authority
- JP
- Japan
- Prior art keywords
- thin layer
- biopolymer
- novel
- substance
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02109—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates
- H01L21/02112—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer
- H01L21/02118—Forming insulating materials on a substrate characterised by the type of layer, e.g. type of material, porous/non-porous, pre-cursors, mixtures or laminates characterised by the material of the layer carbon based polymeric organic or inorganic material, e.g. polyimides, poly cyclobutene or PVC
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J19/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J19/0046—Sequential or parallel reactions, e.g. for the synthesis of polypeptides or polynucleotides; Apparatus and devices for combinatorial chemistry or for making molecular arrays
-
- C—CHEMISTRY; METALLURGY
- C12—BIOCHEMISTRY; BEER; SPIRITS; WINE; VINEGAR; MICROBIOLOGY; ENZYMOLOGY; MUTATION OR GENETIC ENGINEERING
- C12Q—MEASURING OR TESTING PROCESSES INVOLVING ENZYMES, NUCLEIC ACIDS OR MICROORGANISMS; COMPOSITIONS OR TEST PAPERS THEREFOR; PROCESSES OF PREPARING SUCH COMPOSITIONS; CONDITION-RESPONSIVE CONTROL IN MICROBIOLOGICAL OR ENZYMOLOGICAL PROCESSES
- C12Q1/00—Measuring or testing processes involving enzymes, nucleic acids or microorganisms; Compositions therefor; Processes of preparing such compositions
- C12Q1/001—Enzyme electrodes
- C12Q1/002—Electrode membranes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
- H01L21/31—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26 to form insulating layers thereon, e.g. for masking or by using photolithographic techniques; After treatment of these layers; Selection of materials for these layers
- H01L21/312—Organic layers, e.g. photoresist
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01J—CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
- B01J2219/00—Chemical, physical or physico-chemical processes in general; Their relevant apparatus
- B01J2219/00274—Sequential or parallel reactions; Apparatus and devices for combinatorial chemistry or for making arrays; Chemical library technology
- B01J2219/00277—Apparatus
- B01J2219/00497—Features relating to the solid phase supports
- B01J2219/00527—Sheets
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/02104—Forming layers
- H01L21/02107—Forming insulating materials on a substrate
- H01L21/02225—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer
- H01L21/0226—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process
- H01L21/02282—Forming insulating materials on a substrate characterised by the process for the formation of the insulating layer formation by a deposition process liquid deposition, e.g. spin-coating, sol-gel techniques, spray coating
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Organic Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Zoology (AREA)
- Wood Science & Technology (AREA)
- Proteomics, Peptides & Aminoacids (AREA)
- Health & Medical Sciences (AREA)
- Computer Hardware Design (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Power Engineering (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Analytical Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Bioinformatics & Cheminformatics (AREA)
- General Engineering & Computer Science (AREA)
- General Health & Medical Sciences (AREA)
- Genetics & Genomics (AREA)
- Biotechnology (AREA)
- Biophysics (AREA)
- Molecular Biology (AREA)
- Biochemistry (AREA)
- Microbiology (AREA)
- Immunology (AREA)
- Laminated Bodies (AREA)
- Materials For Medical Uses (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Immobilizing And Processing Of Enzymes And Microorganisms (AREA)
- Manufacture Of Macromolecular Shaped Articles (AREA)
- Apparatus Associated With Microorganisms And Enzymes (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1. 薄層が酵素分解可能なバイオポリマーから形成されていて、前記薄層 の層厚が30nm〜3μmであることを特徴とする微細システム技術と微細構造 形成のための新規薄層。 2. 前記酵素分解可能なバイオポリマー薄層が、部分的に、または全表面 において、インヒビターまたは競合物質を具備していることを特徴とする請求項 1に記載の新規薄層。 3. 前記酵素分解の可能なバイオポリマー薄層に、容積と合致したインヒ ビターまたは競合物質が浸透していることを特徴とする請求項1に記載の新規薄 層。 4. 前記酵素分解の可能なバイオポリマー薄層に、感光性添加物が添加さ れていることを特徴とする請求項1に記載の新規薄層。 5. 前記感光性添加物がジアゾナフトキノンによって形成されていること を特徴とする請求項4に記載の新規薄層。 6. 前記バイオポリマー薄層がゼラチンによって形成されていることを特 徴とする請求項1〜4のいずれか1項に記載の新規薄層。 7. 前記バイオポリマー薄層がアガロースによって形成されていることを 特徴とする請求項1〜4のいずれか1項記載の新規薄層。 8. 前記バイオポリマー薄層がデキストロースによって形成されているこ とを特徴とする請求項1〜4のいずれか1項記載の新規薄層。 9. 前記バイオポリマー薄層が脂質によって形成されていることを特徴と する請求項1〜4のいずれか1項記載の新規薄層。 10. バイオポリマー原料物質としての固形物質の含量が1〜30%の溶 液からなる前記バイオポリマー薄層が、スピンコーティングによって、予定され ている層厚領域のもとに塗布されることを特徴とする請求項1〜9のいずれか1 項記載の新規薄層。 11. 前記酵素分解の可能なバイオポリマー薄層が熱活性化試薬を添加す ることによって架橋反応、特に交差架橋反応を示すことを特徴とする請求項1〜 10のいずれか1項記載の新規薄層。 12. 前記熱活性化試薬として主にグルタルジアルデヒドまたはホルムア ルデヒドを使用し、そしてバイオポリマーを含む溶液に1〜5%の割合で添加す ることを特徴とする請求項10および11記載の新規薄層。 13. 光活性化添加物または物質群として分子鎖を延長させたり架橋反応 を生じさせたりする働きのあるラジカル形成物質が添加されることを特徴とする 請求項4記載の新規薄層。 14. 前記ラジカル形成物質が240〜550nmの波長域で強い感光性 を示すという基準に基づいて選択されることを特徴とする請求項13記載の新規 薄層。 15. 前記ラジカル形成物質としてジアジドスチルベンを塩基とする1種 類の物質が使用されることを特徴とする請求項13および14記載の新規薄層。 16. 前記バイオポリマー層が希望の架橋度に応じて10:1〜100: 1の混合割合のラジカル形成物質と可溶性の固形ゼラチンとの水溶液から形成さ れていることを特徴とする請求項13〜15記載の新規薄層。 17. 前記ジアジドスチルベンとして4,4−ジアジドスチルベン−2, 2−スルホン酸のナトリウム塩が使用されることを特徴とする請求項15または 16記載の新規薄層。 18. 基板の表面に塗布され、ジアゾナフトキノンまたはジアジドスチル ベン色素物質が添加されている前記のバイオポリマー層を構造付与性の紫外光に 曝露し、且つ非露光部分を水溶液及び酵素緩衝液で除去し、残された構造をテス トアッセイとして、又は物質ライブラリーの作成のために使用することを特徴と する前記各請求項のいずれか1項記載の新規薄層。
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19634120A DE19634120A1 (de) | 1996-08-23 | 1996-08-23 | Neuartige Dünnschichten für die Mikrosystemtechnik |
DE19634120.5 | 1997-02-15 | ||
DE19705909A DE19705909A1 (de) | 1996-08-23 | 1997-02-15 | Neuartige Dünnschichten für die Mikrosystemtechnik und Mikrostrukturierung sowie ihre Verwendung |
DE19705909.0 | 1997-02-15 | ||
PCT/EP1997/004582 WO1998008086A1 (de) | 1996-08-23 | 1997-08-22 | Neuartige dünnschichten für die mikrosystemtechnik und mikrostrukturierung sowie ihre verwendung |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2001501728A true JP2001501728A (ja) | 2001-02-06 |
JP3624382B2 JP3624382B2 (ja) | 2005-03-02 |
Family
ID=26028675
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP51043098A Expired - Fee Related JP3624382B2 (ja) | 1996-08-23 | 1997-08-22 | 微細システム技術と微細構造形成のための新規薄層ならびにその使用 |
Country Status (6)
Country | Link |
---|---|
US (1) | US6821692B1 (ja) |
EP (1) | EP0920618B1 (ja) |
JP (1) | JP3624382B2 (ja) |
AT (1) | ATE313078T1 (ja) |
DE (2) | DE19705909A1 (ja) |
WO (1) | WO1998008086A1 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009207381A (ja) * | 2008-03-03 | 2009-09-17 | Kaneka Corp | 単球捕捉用デバイス |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7075112B2 (en) * | 2001-01-31 | 2006-07-11 | Gentex Corporation | High power radiation emitter device and heat dissipating package for electronic components |
US6797393B2 (en) * | 2001-11-30 | 2004-09-28 | Eastman Kodak Company | Method for making biochip substrate |
US7713053B2 (en) * | 2005-06-10 | 2010-05-11 | Protochips, Inc. | Reusable template for creation of thin films; method of making and using template; and thin films produced from template |
CN103528866B (zh) * | 2013-10-18 | 2016-01-20 | 江苏蓝拓生物科技有限公司 | 碳支持膜的制备方法 |
EP4021707B1 (en) | 2019-08-30 | 2023-10-04 | Westfälische Wilhelms-Universität Münster | Method for manufacturing a holey film, in particular for electron microscopy applications |
Family Cites Families (29)
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JPS515935B2 (ja) * | 1972-04-17 | 1976-02-24 | ||
FR2245009A1 (en) | 1973-09-21 | 1975-04-18 | Kodak Pathe | Protein contng photo resist compsn with photoisomerisable cpd - which on exposure has greater enzyme inhibiting power |
GB1542131A (en) * | 1975-02-19 | 1979-03-14 | Fuji Photo Film Co Ltd | Light-sensitive printing plate precursors and process for the production thereof |
US4106938A (en) * | 1977-05-23 | 1978-08-15 | Eastman Kodak Company | Vesicular composition, element and process utilizing a diol |
US4472494A (en) * | 1980-09-15 | 1984-09-18 | Napp Systems (Usa), Inc. | Bilayer photosensitive imaging article |
US4451568A (en) * | 1981-07-13 | 1984-05-29 | Battelle Memorial Institute | Composition for binding bioactive substances |
AT375486B (de) * | 1982-12-07 | 1984-08-10 | Philips Nv | System zum aufzeichnen und/oder auswerten von zwei markiersignalen |
JPS59143959A (ja) | 1983-02-07 | 1984-08-17 | Fuji Photo Film Co Ltd | 乾式分析要素 |
US5157018A (en) * | 1984-06-08 | 1992-10-20 | Hoechst Aktiengesellschaft | Perfluoroalkyl group-containing polymers and reproduction layers produced therefrom |
EP0214805B1 (en) * | 1985-08-29 | 1993-05-26 | Matsushita Electric Industrial Co., Ltd. | Sensor using a field effect transistor and method of fabricating the same |
DE3602486A1 (de) | 1986-01-29 | 1987-07-30 | Sanyo Kokusaku Pulp Co | Verfahren zur herstellung eines farbfilters |
CA1302675C (en) | 1986-05-20 | 1992-06-09 | Masakazu Uekita | Thin film and device having the same |
US4759828A (en) | 1987-04-09 | 1988-07-26 | Nova Biomedical Corporation | Glucose electrode and method of determining glucose |
JPS645489A (en) * | 1987-06-26 | 1989-01-10 | Fuji Photo Film Co Ltd | Functional organic thin film and production thereof |
US5154808A (en) * | 1987-06-26 | 1992-10-13 | Fuji Photo Film Co., Ltd. | Functional organic thin film and process for producing the same |
US4923948A (en) * | 1987-09-24 | 1990-05-08 | Japan Synthetic Rubber Co., Ltd. | Curable composition |
JPH01128064A (ja) * | 1987-11-12 | 1989-05-19 | Chisso Corp | 光硬化性樹脂組成物 |
JPH01240188A (ja) * | 1988-03-18 | 1989-09-25 | Fuji Photo Film Co Ltd | 機能性有機薄膜 |
JPH01241541A (ja) * | 1988-03-23 | 1989-09-26 | Nippon Kayaku Co Ltd | 着色パターンの形成方法 |
EP0353666A3 (en) * | 1988-08-03 | 1990-05-23 | Toyo Gosei Kogyo Co., Ltd. | Photosensitive agent,photosensitive resin composition containing same, and method of image formation using the composition |
DD275538A1 (de) | 1988-09-12 | 1990-01-24 | Feutron Greiz Veb | Verfahren zur herstellung eines kapazitiven sorptionsfeuchtesensors |
DD298268A5 (de) | 1989-03-02 | 1992-02-13 | Zentralinstitut Fuer Molekularbiologie,De | Verfahren zur immobilisierung von biologisch aktiven materialien |
US5202227A (en) * | 1989-06-03 | 1993-04-13 | Kanegafuchi Kagaku Kogyo Kabushiki Kaisha | Control of cell arrangement |
JP2847321B2 (ja) * | 1990-08-14 | 1999-01-20 | 日本石油株式会社 | ポジ型フォトレジスト組成物 |
CA2145996A1 (en) | 1992-10-01 | 1994-04-14 | Burkhard Raguse | Improved sensor membranes |
JP3713516B2 (ja) | 1993-05-29 | 2005-11-09 | ケンブリッジ ライフ サイエンシズ パブリック リミテッド カンパニー | ポリマー変態を基礎とするセンサ |
US5725978A (en) * | 1995-01-31 | 1998-03-10 | Basf Aktiengesellschaft | Water-soluble photosensitive resin composition and a method of forming black matrix patterns using the same |
DE19607279A1 (de) | 1996-02-27 | 1997-08-28 | Bayer Ag | Durch Festkörper unterstützte Membran-Biosensoren |
US6020093A (en) * | 1998-05-13 | 2000-02-01 | Toyo Gosei Kogyo, Ltd. | Photosensitive compounds, photosensitive resin compositions, and pattern formation method making use of the compounds or compositions |
-
1997
- 1997-02-15 DE DE19705909A patent/DE19705909A1/de not_active Ceased
- 1997-08-22 JP JP51043098A patent/JP3624382B2/ja not_active Expired - Fee Related
- 1997-08-22 US US09/230,975 patent/US6821692B1/en not_active Expired - Fee Related
- 1997-08-22 AT AT97941958T patent/ATE313078T1/de active
- 1997-08-22 DE DE59712525T patent/DE59712525D1/de not_active Expired - Lifetime
- 1997-08-22 EP EP97941958A patent/EP0920618B1/de not_active Expired - Lifetime
- 1997-08-22 WO PCT/EP1997/004582 patent/WO1998008086A1/de active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009207381A (ja) * | 2008-03-03 | 2009-09-17 | Kaneka Corp | 単球捕捉用デバイス |
Also Published As
Publication number | Publication date |
---|---|
JP3624382B2 (ja) | 2005-03-02 |
WO1998008086A1 (de) | 1998-02-26 |
DE19705909A1 (de) | 1998-08-20 |
ATE313078T1 (de) | 2005-12-15 |
DE59712525D1 (de) | 2006-01-19 |
EP0920618B1 (de) | 2005-12-14 |
EP0920618A1 (de) | 1999-06-09 |
US6821692B1 (en) | 2004-11-23 |
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