JP2001356488A - レーザ描画装置 - Google Patents
レーザ描画装置Info
- Publication number
- JP2001356488A JP2001356488A JP2000178253A JP2000178253A JP2001356488A JP 2001356488 A JP2001356488 A JP 2001356488A JP 2000178253 A JP2000178253 A JP 2000178253A JP 2000178253 A JP2000178253 A JP 2000178253A JP 2001356488 A JP2001356488 A JP 2001356488A
- Authority
- JP
- Japan
- Prior art keywords
- laser
- wavelength
- light
- optical system
- light source
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
- B41J—TYPEWRITERS; SELECTIVE PRINTING MECHANISMS, i.e. MECHANISMS PRINTING OTHERWISE THAN FROM A FORME; CORRECTION OF TYPOGRAPHICAL ERRORS
- B41J2/00—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed
- B41J2/435—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material
- B41J2/47—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light
- B41J2/471—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light using dot sequential main scanning by means of a light deflector, e.g. a rotating polygonal mirror
- B41J2/473—Typewriters or selective printing mechanisms characterised by the printing or marking process for which they are designed characterised by selective application of radiation to a printing material or impression-transfer material using the combination of scanning and modulation of light using dot sequential main scanning by means of a light deflector, e.g. a rotating polygonal mirror using multiple light beams, wavelengths or colours
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/10—Scanning systems
- G02B26/12—Scanning systems using multifaceted mirrors
- G02B26/123—Multibeam scanners, e.g. using multiple light sources or beam splitters
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2051—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source
- G03F7/2053—Exposure without an original mask, e.g. using a programmed deflection of a point source, by scanning, by drawing with a light beam, using an addressed light or corpuscular source using a laser
Landscapes
- Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Optical Scanning Systems (AREA)
- Microscoopes, Condenser (AREA)
- Laser Beam Processing (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000178253A JP2001356488A (ja) | 2000-06-14 | 2000-06-14 | レーザ描画装置 |
| US09/879,161 US6791594B2 (en) | 2000-06-14 | 2001-06-13 | Laser imaging apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000178253A JP2001356488A (ja) | 2000-06-14 | 2000-06-14 | レーザ描画装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001356488A true JP2001356488A (ja) | 2001-12-26 |
| JP2001356488A5 JP2001356488A5 (enExample) | 2007-07-19 |
Family
ID=18679710
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000178253A Pending JP2001356488A (ja) | 2000-06-14 | 2000-06-14 | レーザ描画装置 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US6791594B2 (enExample) |
| JP (1) | JP2001356488A (enExample) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006235370A (ja) * | 2005-02-25 | 2006-09-07 | Fuji Photo Film Co Ltd | 画像形成装置および画像形成方法 |
| TWI401539B (zh) * | 2007-03-28 | 2013-07-11 | Orc Mfg Co Ltd | Exposure drawing device |
| JP2019158926A (ja) * | 2018-03-07 | 2019-09-19 | キヤノン株式会社 | パターン形成装置及び物品の製造方法 |
| JP2020013137A (ja) * | 2019-08-23 | 2020-01-23 | 株式会社ニコン | パターン露光装置 |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7256803B2 (en) * | 2002-09-26 | 2007-08-14 | Futurelogic, Inc. | Direct thermal printer |
| JP5651935B2 (ja) * | 2008-08-28 | 2015-01-14 | 株式会社リコー | 画像処理装置 |
| GB2477139A (en) * | 2010-01-25 | 2011-07-27 | Datalase Ltd | Inkless printing apparatus |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62237865A (ja) * | 1986-04-09 | 1987-10-17 | Fuji Photo Film Co Ltd | 光走査装置 |
| US5587825A (en) * | 1991-06-26 | 1996-12-24 | Asahi Kogaku Kogyo Kabushiki Kaisha | Scanning optical system |
| US6141030A (en) * | 1997-04-24 | 2000-10-31 | Konica Corporation | Laser exposure unit including plural laser beam sources differing in wavelength |
-
2000
- 2000-06-14 JP JP2000178253A patent/JP2001356488A/ja active Pending
-
2001
- 2001-06-13 US US09/879,161 patent/US6791594B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006235370A (ja) * | 2005-02-25 | 2006-09-07 | Fuji Photo Film Co Ltd | 画像形成装置および画像形成方法 |
| TWI401539B (zh) * | 2007-03-28 | 2013-07-11 | Orc Mfg Co Ltd | Exposure drawing device |
| JP2019158926A (ja) * | 2018-03-07 | 2019-09-19 | キヤノン株式会社 | パターン形成装置及び物品の製造方法 |
| JP7114277B2 (ja) | 2018-03-07 | 2022-08-08 | キヤノン株式会社 | パターン形成装置及び物品の製造方法 |
| JP2020013137A (ja) * | 2019-08-23 | 2020-01-23 | 株式会社ニコン | パターン露光装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| US6791594B2 (en) | 2004-09-14 |
| US20010053164A1 (en) | 2001-12-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20060908 |
|
| A521 | Written amendment |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20070605 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20070611 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20091006 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20100216 |