JP2001356352A - Liquid crystal display device and method for manufacturing the same - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a liquid crystal display device and a method for manufacturing the device which can decrease the manufacture cost because the positioning process of a mask is not required when a supporting member is formed and which has a small area of the supporting member and a high contrast ratio. SOLUTION: Openings 9a, 5a, 5b are formed in a first pixel electrode 9 and a black matrix 5 on a substrate 1, and a supporting member 18 is formed at the position of these openings 9a, 5a, 5b. The supporting member 18 is formed from a negative resist hardened by exposing to UV rays through the openings 9a, 5a, 5b from the substrate 1 side and supports a sealing plate 11 to make the gap between the plate 11 and the substrate 1 constant.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a liquid crystal display device and a method of manufacturing the same, and more particularly, to a method of displaying a bright color image even in a reflection type by providing a plurality of guest-host mode liquid crystal layers on one substrate. And a method for manufacturing the same.

[0002]

2. Description of the Related Art As a conventional liquid crystal display device, a device which displays an image by controlling light transmitted through each pixel by using a twisted nematic liquid crystal and a polarizing plate in combination is widely used. In addition, the liquid crystal display element that displays a color image further includes a micro color filter that transmits red, green, or blue light corresponding to each of three adjacent pixels, and displays a color image by additive color mixing. It is possible to do.

However, in this type of liquid crystal display device, since the amount of light absorbed by the polarizing plate and the color filter is large,
The light transmittance of the entire liquid crystal display element becomes about 10% or less, and it is difficult to perform bright display. In particular, when a reflection-type liquid crystal display element using external light is configured, it tends to be dark enough to make color recognition difficult.

On the other hand, a liquid crystal display device capable of displaying a bright color image even in a reflection type is disclosed in Japanese Patent Application Laid-Open No. 61-23 / 1986.
As disclosed in JP-A-8024 and JP-A-3-238424, there has been proposed a guest-host mode liquid crystal display device in which absorption and transmission of light of each color are controlled using a dichroic dye. This liquid crystal display element is configured by superposing a plurality of panels each having a liquid crystal layer containing dichroic dyes of different colors. More specifically, three liquid crystal panels each including a liquid crystal containing a dichroic dye of cyan, magenta, or yellow sandwiched between a pair of glass substrates are stacked. Display, white display when light is transmitted through all layers,
Color display is performed when only some of the layers absorb light. This kind of guest-host mode liquid crystal display element can display bright and vivid colors because light is not absorbed by a color filter or a polarizing plate, and is suitable for a reflection type liquid crystal display element.

However, when a plurality of panels each having a pair of glass substrates are stacked to produce a liquid crystal display element as described above, when the pixels become finer, the thickness of the glass substrate constituting each panel becomes smaller. Is relatively large as compared with, the effect of parallax increases, and there is a problem that color shift occurs when a display image is viewed obliquely.

In order to eliminate such color shift due to parallax, a so-called polymer-dispersed liquid crystal display device as disclosed in Japanese Patent Application Laid-Open No. 6-337643 has been proposed. In this polymer dispersion type liquid crystal display device, FIG.
As shown in FIG. 7, a liquid crystal layer 295 to 297 in which a guest-host liquid crystal 299 is dispersed and held in a resist material or a polymer material 298 and solidified is laminated on a substrate 291. Further, driving electrodes 292 to 294 connected to driving elements provided on one substrate 291 are formed corresponding to the respective liquid crystal layers 295 to 297. In this manner, by adopting a configuration in which a glass substrate is not required between the liquid crystal layers 295 to 297, a guest-host mode liquid crystal display element having no color shift due to parallax can be obtained.

However, such a polymer-dispersed liquid crystal display element has a liquid crystal layer 29 for dispersing and holding a guest-host liquid crystal 299 in a resist material or a polymer material 298.
Resist material or polymer material 2 in 5-297
98 increases (guest-host liquid crystal 299
Occupies a smaller proportion. ). For this reason, there is a problem that the substantial aperture ratio becomes small and it is difficult to increase the contrast ratio.

Accordingly, the present inventors have previously described Japanese Patent Application No.
No. 27057 proposes a liquid crystal display device as shown in FIG. In this liquid crystal display element, film-like sealing plates 113 to 115 are provided on a substrate 101 as supporting members (spacers).
Liquid crystals 125 to 127 are sealed between the substrate 101 and the sealing plate 113 and between the sealing plates 113 to 115.
As described above, by using the film-shaped sealing plates 113 to 115 supported by the support members 108 to 110, color shift due to parallax as in the case of using a glass substrate can be eliminated. Unlike the molecular dispersion type liquid crystal display element, a polymer material for holding liquid crystal is not required, and the liquid crystal 125 to 1 between the sealing plates 113 to 115 is not required.
Since the ratio occupied by 27 is large, it is possible to increase the substantial aperture ratio and increase the contrast ratio.

Here, the supporting members 108 to 110 of the liquid crystal display element as described above, for example,
1 or a sealing resin 113, 114 is coated with a photosensitive resin, and only the portions where the support members 108 to 110 are formed are polymerized and cured by mask exposure, and then the other portions are developed and removed. Is done.

[0010]

In the liquid crystal display device having the structure in which the film-shaped sealing plates 113 to 115 are stacked as described above, it is necessary that the support members 108 to 110 are not formed at exactly the same position in each layer. In addition, the sealing plates 113 to 115 are not reliably supported. Specifically, the support members 108 to 110
Is not sufficiently accurate, for example, as shown in FIG.
When the positions of the supporting members 108 and 109 are shifted as shown in FIG. 34, the sealing plate 113 is bonded as shown in FIG. Are deformed or the displacement amount is further large, the support member 109 of the second display layer 122 bites into the first display layer 117 as shown in FIG. The structure of the display layer 122 will be destroyed. Therefore, when the support members 108 to 110 of each layer are formed by mask exposure as described above, it is necessary to perform accurate alignment of the mask.

Since the portions of the support members 108 are regions where the light transmittance is not controlled, the area occupied by the support members 108 to 110 in the pixel must be as small as possible in order to increase the aperture ratio. Although it is preferable, for that purpose, it is necessary to further improve the positioning accuracy of the mask. Specifically, for example, the support members 109 are 7 μm
In the case of forming the corners, if the displacement of the support members 109 is 3 μm or more, the first display layer 117 or the like is broken as described above. Therefore, it is necessary to align the mask so that the above-mentioned misalignment is 3 μm or less.

Therefore, there is a problem that the production cost may be increased by providing a highly accurate masking process.

The present invention has been made in consideration of the above-mentioned problems, and does not require a mask positioning step when forming a support member. It is an object of the present invention to provide a liquid crystal display element in which the area occupied by members is reduced and the contrast ratio can be easily further increased, and a method for manufacturing the same.

[0014]

In order to solve the above-mentioned problems, the present invention is directed to a substrate made of a transparent material and having a reflective film formed thereon, and a side of the substrate having the reflective film formed thereon. A liquid crystal display element having a sealing plate provided to face the substrate and a liquid crystal layer provided between the substrate and the sealing plate, wherein an opening is formed in the reflective film, Supporting the sealing plate formed by exposing a photosensitive resin through the opening at a position where the opening of the reflection film is formed between the substrate and the sealing plate. The support member is provided.

With this configuration, since the positional accuracy of the support member is high, the area occupied by the support member can be reduced and the contrast ratio can be easily increased.

According to a second aspect of the present invention, there is provided the liquid crystal display device according to the first aspect, wherein the photosensitive resin is a negative resist.

Thus, the support member formed by exposing the photosensitive resin through the opening as described above can be easily obtained.

According to a third aspect of the present invention, in the liquid crystal display device of the second aspect, the liquid crystal layer includes a polymer and a liquid crystal dispersed and held in the polymer. .

Thus, it is possible to obtain a liquid crystal display element in which the sealing plate is securely fixed to the supporting member by the polymer in the liquid crystal layer.

According to a fourth aspect of the present invention, there is provided the liquid crystal display device according to the first aspect, wherein the photosensitive resin is a mixed solution containing a liquid crystal and a photosensitive polymer precursor for forming the liquid crystal layer. Characterized in that it is the above polymer precursor.

As a result, the liquid crystal layer is formed by the liquid crystal remaining after the formation of the support member by the exposure of the mixed solution, so that a liquid crystal display element having a substantially large aperture ratio and a higher contrast ratio is obtained. be able to.

According to a fifth aspect of the present invention, there is provided the liquid crystal display element according to the first aspect, wherein the liquid crystal layer and the sealing plate are provided in a plurality of sets, and an opening of the reflection film is provided between the sealing plates. A support member for supporting each sealing plate, which is formed by exposing the photosensitive resin through the opening, is provided at a position where is formed. Thereby, a liquid crystal display device capable of displaying a color image can be configured.

According to a sixth aspect of the present invention, in the liquid crystal display element of the fifth aspect, the supporting members for supporting the sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics. Features.

Thus, the supporting member can be easily set to a predetermined height, so that the liquid crystal layer is formed to have a predetermined thickness.
A liquid crystal display element with good color balance can be obtained.

According to a seventh aspect of the present invention, there is provided the liquid crystal display device according to the fifth aspect, wherein three sets of the liquid crystal layer and the sealing plate are provided, and each of the liquid crystal layers is one of cyan, magenta, and yellow. It is characterized by including a guest-host liquid crystal including a dichroic dye of different colors and a liquid crystal.

Thus, a liquid crystal display device capable of displaying a full-color image can be constructed.

[0027] The invention of claim 8 is a method of manufacturing a liquid crystal display element for the liquid crystal display element of claim 1, wherein a step of forming a reflection film having the opening on the substrate;
Forming a photosensitive resin layer on the substrate on which the reflective film is formed, exposing the photosensitive resin layer from the substrate side through an opening of the reflective film, and curing the photosensitive resin layer; A step of forming the support member by removing a portion of the conductive resin layer which is not exposed by the shielding of the reflective film by development, and a step of bringing the sealing plate into close contact with the support member; Forming a liquid crystal layer by sealing liquid crystal between the stop plate and the liquid crystal layer.

Thus, the support member is reliably formed at the position of the opening, and the position accuracy of the support member can be easily increased, so that the liquid crystal layer is not broken due to the displacement of the support member. By reducing the area occupied by the support member, a liquid crystal display element having a high contrast ratio can be manufactured. In addition, since it is not necessary to align the mask as in the case where a separate mask is used, the manufacturing cost can be reduced.

A ninth aspect of the present invention is the method for manufacturing a liquid crystal display element according to the eighth aspect, wherein the photosensitive resin layer is formed of a negative resist.

Thus, since a general material can be applied to the formation of the support member, the support member can be manufactured easily and at low manufacturing cost.

According to a tenth aspect of the present invention, there is provided the method for manufacturing a liquid crystal display element according to the eighth aspect, wherein the step of forming the liquid crystal layer comprises a step of forming a liquid crystal and a photosensitive material between the substrate and the sealing plate. A step of enclosing a mixed solution containing a molecular precursor, and exposing the mixed solution from the sealing plate side to cure the polymer precursor in the mixed solution, thereby forming a polymer and a polymer. Forming the liquid crystal layer including liquid crystal dispersed and held in the substrate, and fixing the sealing plate to the substrate.

Thus, the substrate and the sealing plate can be easily and reliably fixed by the polymer cured by the exposure.

According to an eleventh aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the eighth aspect, the step of bringing the sealing plate into close contact with the support member includes bonding the support member and the sealing plate. And a bonding step of fixing the sealing plate to the substrate.

According to a twelfth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the eleventh aspect, in the bonding step, an adhesive is applied to at least one of the support member and the sealing plate. It is characterized by including the step of performing.

Further, the invention of claim 13 provides the invention of claim 11
Wherein at least one of the sealing plate and the support member is made of a material having plasticity by at least one of heat and pressure, and the bonding step comprises: The method is characterized in that at least one of heating and pressurizing is performed in a state where the sealing plate is in close contact with the sealing plate, and the sealing plate is fixed to the substrate.

Thus, the substrate and the sealing plate can be easily and securely fixed without using a mixed solution containing a liquid crystal and a photosensitive polymer precursor. , The effective aperture ratio can be increased, and a liquid crystal display device having a higher contrast ratio can be manufactured.

According to a fourteenth aspect of the present invention, there is provided a method for manufacturing the liquid crystal display element according to the fifth aspect, wherein in addition to the steps of the eighth aspect, a new photosensitive resin layer is further formed on the sealing plate. Forming, exposing the new photosensitive resin layer from the substrate side through the opening of the reflective film and the support member already formed, and curing, and curing the new photosensitive resin layer. Removing the portions not exposed by the shielding of the reflective film by development to form a new support member; and bringing a new sealing plate into close contact with the new support member; and Between the encapsulating plate and the new encapsulating plate, the step of enclosing the liquid crystal and forming a new liquid crystal layer at least once, respectively,
It is characterized in that a plurality of liquid crystal layers are formed.

Thus, a liquid crystal display device capable of displaying a color image can be manufactured.

According to a fifteenth aspect of the present invention, there is provided the method for manufacturing a liquid crystal display element according to the fourteenth aspect, wherein the supporting members for supporting the sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics. In addition, each of the support members is exposed to light having a different wavelength, and is cured.

As a result, the intensity of exposure to the newly formed support member is hardly reduced by the absorption of the already formed support member, so that the support member is surely hardened to have a predetermined height. Therefore, a liquid crystal display element having a good color balance can be manufactured by forming the liquid crystal layer to a predetermined thickness.

According to a sixteenth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display element according to the first aspect, wherein a step of forming a reflection film having the opening on the substrate is performed. Forming an auxiliary support member in a predetermined area other than the area where the opening of the reflective film is formed,
A step of bringing the sealing plate into close contact with the auxiliary support member, a step of sealing a mixed solution containing a liquid crystal and a photosensitive polymer precursor between the substrate and the sealing plate, Exposure through the opening of the reflective film from the substrate side, while forming and curing the polymer precursor in the mixed solution at a position corresponding to the opening of the reflective film to form the support member, Forming the liquid crystal layer with the liquid crystal in the remaining mixed liquid.

Thus, the support member is reliably formed at the position of the opening, and the positional accuracy of the support member can be easily increased, so that the liquid crystal layer is not broken due to the displacement of the support member. The area occupied by the support member can be reduced, and the liquid crystal layer is formed by the liquid crystal remaining after the formation of the support member by exposure of the mixed solution, so that the substantial aperture ratio can be increased and the contrast ratio can be further increased. A liquid crystal display device can be manufactured. Moreover,
Since there is no need to align the mask as in the case of using a separate mask, the manufacturing cost can be reduced.

According to a seventeenth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the sixteenth aspect, the step of forming the auxiliary support member comprises forming a negative resist layer on the substrate on which the reflective film is formed. And exposing the negative resist layer from a side opposite to the substrate via a predetermined mask pattern, and curing the resist, and a portion of the negative resist layer that is not exposed due to the mask pattern shielding. And removing it by development.

Thus, a general material can be applied to the formation of the auxiliary support member, so that the auxiliary support member can be manufactured easily and at low manufacturing cost.

According to a eighteenth aspect of the present invention, there is provided a method of manufacturing the liquid crystal display element according to the fifth aspect, wherein in addition to the steps of the sixteenth aspect, the liquid crystal display element is further formed on an already formed sealing plate. A step of forming a new auxiliary support member at a position corresponding to the auxiliary support member, a step of bringing a new sealing plate into close contact with the new auxiliary support member, and a step of forming a new seal with the already formed sealing plate A step of enclosing a new mixed solution containing a liquid crystal and a photosensitive polymer precursor between the substrate and the new mixed solution from the substrate side to the opening of the reflective film and the support already formed; Exposure through the member, the polymer precursor in the new mixture is deposited and cured at a position corresponding to the opening of the reflective film to form a new support member, and the remaining mixture in the mixture Process of forming a new liquid crystal layer with liquid crystal By the carried out at least once each, it is characterized by forming a plurality of liquid crystal layers.

Thus, a liquid crystal display device capable of displaying a color image can be manufactured.

According to a nineteenth aspect of the present invention, there is provided the method for manufacturing a liquid crystal display element according to the eighteenth aspect, wherein the supporting members for supporting the sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics. In addition, each of the support members is exposed to light having a different wavelength, and is cured.

As a result, the exposure intensity of the newly formed support member is hardly reduced by the absorption of the already formed support member, so that the support member is surely hardened and formed to a predetermined height. Therefore, a liquid crystal display element having a good color balance can be manufactured by forming the liquid crystal layer to a predetermined thickness.

According to a twentieth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display element according to the first aspect, wherein a step of forming a reflective film having the opening on the substrate; Forming a photosensitive resin layer on the substrate on which is formed, and a first masking member from the substrate side so that a part of the first openings of the reflection film is exposed. Covering the other second opening, exposing the photosensitive resin layer from the substrate side through the first opening of the reflective film, and curing the photosensitive resin layer; Removing the unexposed portion by the shielding of the reflective film and the masking member by development to form a first support member of a part of the support member; and sealing the first support member with the sealing member. Step of bringing the board into close contact and sealing with the substrate Enclosing a mixed solution containing a liquid crystal and a photosensitive polymer precursor, and covering the first opening of the reflective film with a second masking member from the substrate side; The mixed solution is exposed from the substrate side through the second opening of the reflective film, and the polymer precursor in the mixed solution is deposited and cured at a position corresponding to the second opening of the reflective film. Forming another second support member of the support members, and forming the liquid crystal layer from liquid crystals in the remaining mixed liquid.

Thus, the gap between the substrate 1 and the sealing plate, and the gaps between the sealing plates are kept uniform by the first support member, and the display color balance of the liquid crystal display element is kept constant, Since the layer is formed by the liquid crystal remaining after the formation of the support member by the exposure of the mixed solution, a liquid crystal display device having a substantially large aperture ratio and a higher contrast ratio can be manufactured.

According to a twenty-first aspect of the present invention, there is provided a method for manufacturing the liquid crystal display element according to the fifth aspect, wherein a new photosensitive resin layer is further formed on the sealing plate in addition to the steps of the twentieth aspect. Forming, and covering the second opening of the reflective film with the first masking member from the substrate side,
Exposing and curing the new photosensitive resin layer from the substrate side through the first opening of the reflection film and the first support member already formed; and Forming a new first support member by removing a portion not exposed by the shielding of the reflective film and the masking member by development to form a new first support member;
A step of adhering a new sealing plate to the supporting member of the above, and a new mixed solution containing a liquid crystal and a photosensitive polymer precursor between the already formed sealing plate and the new sealing plate. And covering the first opening of the reflection film from the substrate side with the second masking member, and supplying the new mixed solution from the substrate side to the second opening of the reflection film. Exposure through the part and the already formed second support member,
The polymer precursor in the new mixed solution is used as the second material of the reflective film.
And forming a new second support member by depositing and hardening at a position corresponding to the opening portion, and forming a new liquid crystal layer with the liquid crystal in the remaining liquid mixture at least once. In addition, a plurality of liquid crystal layers are formed.

Thus, a liquid crystal display device capable of displaying a color image can be manufactured.

According to a twenty-second aspect of the present invention, there is provided the method for manufacturing a liquid crystal display element according to the twenty-first aspect, wherein the first support member and the second support member for supporting each of the sealing plates are each other sealing member. A first support member and a second support member which are formed of a photosensitive resin having different photosensitive wavelength characteristics from the first support member and the second support member which support the plates, and which support the respective sealing plates. Are exposed and cured by light having different wavelengths from the first support member and the second support member that respectively support the other sealing plates.

This makes it difficult for the exposure intensity of the newly formed support member to decrease due to the absorption of the already formed support member, so that the support member is surely cured and formed to a predetermined height. Therefore, a liquid crystal display element having a good color balance can be manufactured by forming the liquid crystal layer to a predetermined thickness.

According to a twenty-third aspect of the present invention, the semiconductor device includes a substrate made of a transparent material, a sealing plate provided to face the substrate, and a liquid crystal layer provided between the substrate and the sealing plate. In a liquid crystal display element, a light-shielding film is formed in a predetermined region of the substrate, and the light-shielding film of a photosensitive resin is provided at a position where the light-shielding film is formed between the substrate and the sealing plate. A support member for supporting the sealing plate, which is formed by exposing a portion where the film is not formed, is provided.

With this configuration, since the positional accuracy of the support member is high, it is easy to reduce the area occupied by the support member and increase the contrast ratio. The invention according to claim 24 is the liquid crystal display element according to claim 23, wherein the photosensitive resin is a positive resist.

According to a twenty-fifth aspect of the present invention, in the liquid crystal display element of the twenty-third aspect, the light shielding film is formed of a black resist.

Thus, the support member formed by exposing the portion of the photosensitive resin where the light-shielding film is not formed as described above can be easily obtained.

According to a twenty-sixth aspect of the present invention, in the liquid crystal display element according to the twenty-third aspect, the liquid crystal layer contains a polymer and a liquid crystal dispersed and held in the polymer. .

Thus, it is possible to obtain a liquid crystal display element in which the sealing plate is securely fixed to the supporting member by the polymer in the liquid crystal layer.

According to a twenty-seventh aspect of the present invention, in the liquid crystal display element of the twenty-third aspect, the liquid crystal layer and the sealing plate are provided in a plurality of sets, and the light shielding film is formed between the sealing plates. And a support member for supporting each sealing plate, which is formed by exposing the photosensitive resin through the region where the light shielding film is not formed, is provided.

Thus, a liquid crystal display device capable of displaying a color image can be constructed.

According to a twenty-eighth aspect of the present invention, there is provided a method of manufacturing a liquid crystal display element according to the twenty-third aspect, wherein a step of forming a light shielding film in a predetermined region on the substrate, Forming a photosensitive resin layer on the substrate, and exposing the portion of the photosensitive resin layer where the light-shielding film is not formed from the substrate side; and exposing the exposed portion of the photosensitive resin layer. Removing the exposed portion by development, forming the support member at the position where the light-shielding film is formed, and bringing the sealing plate into close contact with the support member; and Forming a liquid crystal layer by filling liquid crystal between them.

As a result, the support member is reliably formed at the position of the opening, and the position accuracy of the support member can be easily increased, so that the liquid crystal layer is not broken due to the displacement of the support member. By reducing the area occupied by the support member, a liquid crystal display element having a high contrast ratio can be manufactured. In addition, since it is not necessary to align the mask as in the case where a separate mask is used, the manufacturing cost can be reduced.

According to a twenty-ninth aspect of the present invention, in the method for manufacturing a liquid crystal display element according to the twenty-eighth aspect, the photosensitive resin layer is formed of a positive resist.

Thus, since a general material can be applied to the formation of the support member, the support member can be manufactured easily and at low manufacturing cost.

The invention according to claim 30 is the method for manufacturing a liquid crystal display element according to claim 28, wherein the step of forming the liquid crystal layer comprises a step of forming a liquid crystal and a photosensitive material between the substrate and the sealing plate. A step of enclosing a mixed solution containing a molecular precursor, and exposing the mixed solution from the sealing plate side to cure the polymer precursor in the mixed solution, thereby forming a polymer and a polymer. Forming the liquid crystal layer including liquid crystal dispersed and held in the substrate, and fixing the sealing plate to the substrate.

Thus, the substrate and the sealing plate can be easily and reliably fixed by the polymer cured by the exposure.

A thirty-first aspect of the present invention is a method for manufacturing a liquid crystal display element according to the twenty-seventh aspect, wherein a new photosensitive resin layer is further formed on the sealing plate in addition to the steps of the twenty-eighth aspect. Forming, exposing the new photosensitive resin layer in a portion where the light-shielding film is not formed from the substrate side, and removing the exposed portion in the new photosensitive resin layer by development Forming a new support member at the position where the light-shielding film is formed; and bringing a new sealing plate into close contact with the new support member; It is characterized in that a plurality of liquid crystal layers are formed by performing at least once each of the steps of sealing a liquid crystal and forming a new liquid crystal layer with a new sealing plate.

Thus, a liquid crystal display device capable of displaying a color image can be manufactured.

[0071]

(Embodiment 1) FIGS. 1 to 10 show a liquid crystal display device according to Embodiment 1 of the present invention.
It will be described based on.

FIG. 1 is a partial plan view showing a configuration per pixel of a liquid crystal display device.

FIG. 2 is a sectional view taken on line AA of FIG.

FIGS. 3 to 10 are explanatory views showing the steps of manufacturing the liquid crystal display device.

Note that in the above and following figures,
For convenience, the scale and dimensions of each part may be enlarged, reduced,
And it is drawn schematically. In addition, members that obstruct the understanding of the configuration are omitted.

First, the structure of the liquid crystal display device will be described with reference to FIGS.

As shown in FIGS. 1 and 2, thin film transistors (hereinafter, referred to as “TFT elements”) 2 to 4 are formed on a substrate 1 made of borosilicate glass.
The TFT elements 2 to 4 have semiconductor layers 2a to 4a made of amorphous silicon, gate electrodes 2b to 4b, source electrodes 2c to 4c, and drain electrodes 2d to 4d. The drain electrode 2d of the TFT element 2 is constituted by a part of the first pixel electrode 9 formed in a region of the substrate 1 corresponding to a pixel.

The first pixel electrode 9 is made of aluminum and serves also as a reflection film. A black matrix 5 is provided around the first pixel electrode 9. The black matrix 5 is formed from a resist containing black carbon particles, and absorbs light incident on a region other than the first pixel electrode 9 to increase the contrast ratio. The first pixel electrode 9 and the black matrix 5 have a square opening 5
a, 9a are formed at an equal interval at a pitch of 30 μm. The black matrix 5 further includes a TFT.
Openings 5b are also formed in the drain electrodes 3d and 4d of the elements 3 and 4 and in the vicinity thereof (in FIG. 1, the area where the black matrix 5 is formed is indicated by stippling).

At the positions of the openings 9a, 5a, 5b of the first pixel electrode 9 and the black matrix 5 on the substrate 1, a negative resist cured by exposure through these openings 9a, 5a, 5b is formed. , Cross section 7μ
A support member 18 is provided as a spacer having an m square and a height of 4 μm. Above the support member 18, there is provided a sealing plate 11 supported by the support member 18 and maintained at a distance of 4 μm from the substrate 1. Substrate 1 and sealing plate 1
1, a liquid crystal layer 21 is provided. This liquid crystal layer 21 is a so-called polymer dispersed liquid crystal in which a guest-host liquid crystal in which a cyan dichroic dye is dissolved in a fluorine-based nematic liquid crystal is held in a polymer network of an acrylic polymer. However, the liquid crystal layer 21 is the sealing plate 1
1, the amount of the network polymer in the liquid crystal layer 21 may be such that the sealing plate 11 can be fixed. Therefore, as compared with the liquid crystal display device as shown in FIG. 32, the ratio of the liquid crystal occupies a large portion and the substantial aperture ratio is large, so that a high contrast ratio can be obtained. In the sealing plate 11 and the liquid crystal layer 21, openings 11a and 21a for three-dimensional wiring are formed above the drain electrodes 3d and 4d of the TFT elements 3 and 4, respectively.

The first display layer 6 is constituted by the first pixel electrode 9, the liquid crystal layer 21, the support member 18, and the sealing plate 11. Above the first display layer 6, a second display layer 7 and a third display layer 8 are stacked. Each of the second display layer 7 and the third display layer 8 includes the second pixel electrode 14, the liquid crystal layer 22, and the support member 1 similarly to the first display layer 6.
9, a sealing plate 12, or a third pixel electrode 15, a liquid crystal layer 23, a support member 20, and a sealing plate 13.

However, the second display layer 7 is different mainly in that a magenta dichroic dye is used in place of cyan for the guest host liquid crystal of the liquid crystal layer 22. Also, the sealing plate 11
The second pixel electrode 14 formed in a region corresponding to a pixel on the upper surface of the first embodiment is formed of a transparent conductive film made of indium tin oxide (hereinafter, referred to as “ITO”) instead of aluminum. The second pixel electrode 14 is connected to the drain electrode 3d of the TFT element 3 via the sealing plate 11 and the openings 11a, 21a of the liquid crystal layer 21. Further, the sealing plate 12 and the liquid crystal layer 22 include a TFT.
Openings 12a and 22a for three-dimensional wiring are formed only above the drain electrode 4d of the element 4.

On the other hand, the third display layer 8 uses a dichroic dye of yellow for the liquid crystal layer 23, and the third pixel electrode 15 is made of the same transparent conductive film as the second pixel electrode 14. It is connected to the drain electrode 4d of the TFT element 4 through the plate 12, the liquid crystal layer 22, the sealing plate 11, and the openings 12a, 22a, 11a, 21a of the liquid crystal layer 21. Further, no openings are formed in the sealing plate 13 and the liquid crystal layer 23.

Here, the support members 19 and 20 of the second display layer 7 and the third display layer 8 are, like the support member 18 of the first display layer 6, formed of the first pixel electrode 9 and the black matrix 5. By being formed of a negative resist hardened by exposure through the openings 9a, 5a, 5b, it is arranged exactly at the same position as the support member 18 of the first display layer 6. The guest host liquid crystal contained in the liquid crystal layers 21 to 23 of the display layers 6 to 8 is adjusted in density of cyan, magenta, and yellow dichroic dyes so as to have an appropriate color balance.

Above the third display layer 8, that is, the sealing plate 13
Is formed of a transparent conductive film, and a common electrode 16 common to each pixel is provided. In addition, a protective film 17 made of a transparent resin is formed on the upper surface of the common electrode 16 to protect the liquid crystal display element from external pressure or the like.

The liquid crystal display device configured as described above is
First to third pixel electrodes 9 and 1 via TFT elements 2 to 4
The voltages applied to the first and second pixel electrodes 9 and 14, the second pixel electrode 14 and the third pixel electrode 15, and the third pixel electrode 1
5 and the common electrode 16, that is, each liquid crystal layer 21
23, the amount of light of each color absorbed by each of the display layers 6 to 8 changes accordingly. Therefore, light (external light) incident from the protective film 17 side passes through the third, second, and first display layers 8, 7, and 6 in that order, is reflected by the first pixel electrode 9, and then is reflected by the first pixel electrode 9. , The second and third display layers 6,
While passing through in order of 7 and 8, light of each color is absorbed according to the applied voltage, and color display is performed by subtractive color mixture.

Here, the size, pitch, and aperture ratio of the support members 18 in the liquid crystal display element will be described.

The aperture ratio of the liquid crystal display element is the ratio of the area of the pixel to the area of the display screen (the aperture ratio of the pixel in the display screen).
And the ratio of the area of the pixel to the area of the region excluding the portion occupied by the support members 18 in the pixel (the aperture ratio in the pixel). Since the aperture ratio of a pixel in the display screen is determined by the area occupied by the TFT elements 2 and its sources and gate lines, the aperture ratio in the pixel is increased in order to increase the overall aperture ratio. There is a need. That is, the aperture ratio can be increased and the contrast ratio can be increased as the pitch of the support members 18 is increased and as the support members 18 are decreased.

However, if the pitch of the support members 18 is, for example, 50 μm or more, as shown in FIG. 35, the sealing plate 11 is deformed so as to hang between the adjacent support members 18 and It is difficult to keep the gap between the sealing plate 11 and the thickness of the liquid crystal layer 21 and the like constant. Therefore, in order to keep the thickness of the liquid crystal layer 21 constant, it is preferable to form the support members 18 at a high density. For example, by setting the pitch of the support members 18 to 30 μm as described above, A high aperture ratio can be obtained while keeping the thickness of the liquid crystal layer 21 constant.

If the positional accuracy of the support members 18 is low, it is necessary to increase the size of the support members 18 in order to prevent the problems shown in FIG. For example, if it is 10 μm square, the area occupied by the support members 18 in the pixel becomes 10% or more, the aperture ratio in the pixel decreases, and the contrast ratio decreases. On the other hand, in the first embodiment, each of the display layers 6 to 8
Of the first pixel electrode 9 as described above.
And openings 9a, 5a, 5b of black matrix 5
Since the support members 18 to 20 are arranged at the exact same position by being formed of a negative resist cured by exposure through the above, the support members 18. It can be as small as an angle, and an aperture ratio in a pixel of 95% or more can be obtained. Since the liquid crystal layers 21 include a polymer network, the substantial aperture ratio is slightly smaller than this.

Next, a method of manufacturing the above-mentioned liquid crystal display device will be described with reference to FIG.
This will be described with reference to FIG.

The following manufacturing steps are mainly performed in a room (yellow room) illuminated with long-wavelength light to which a photosensitive material such as a negative resist is not exposed, in order to prevent unnecessary exposure.

(1) First, as shown in FIG.
TFT elements 2 to 4 made of amorphous silicon are formed on a substrate 1 made of borosilicate glass. Next, a reflective film of aluminum is formed by vacuum deposition, and is patterned into a pixel shape by photolithography and etching to form a first pixel electrode 9 which also serves as the reflective film and the drain electrode 2d of the TFT element 2. At the time of the patterning, an opening 9a is also formed.

(2) Next, as shown in FIG.
After a carbon-containing positive resist is applied to a thickness of 1 μm, openings 5a and 5b are formed by mask exposure and development on the region of the first pixel electrode 9 and the regions for forming openings 5a and 5b. A black matrix 5 is formed.

Next, the support member 18 is formed by the following steps (3) to (5).

(3) As shown in FIG. 4C, a negative resist 18 for forming a support member 18 is formed on the substrate 1 on which the first pixel electrodes 9 and the black matrix 5 are formed as described above. 'Is applied by spin coating (at 600 rpm for 30 seconds) and then pre-baked (at 80 ° C. for 3 minutes on a hot plate).

(4) As shown in FIG.
Irradiate ultraviolet rays (UV) of 100 mJ / cm ² from the side. Thus, only the negative resist 18 'in the openings 9a, 5a, and 5b is exposed using the first pixel electrode 9 and the black matrix 5 as a mask. That is, back exposure (self-alignment) for exposing only the portion forming the support member 18 is performed, and the negative resist 18 'is polymerized and cured.

(5) After developing the negative type resist 18 'with a developing solution, it is baked (at 120 ° C. for 1 hour) to form openings 9a, 5a, 5b as shown in FIG. 5 (e).
The support member 18 having a height of 4 μm is formed at the portion.

(6) As shown in FIG. 5 (f), after the release layer 26 is formed on the surface of the transfer base material 27 made of the ultraviolet ray transmitting glass on which the predetermined mask pattern 27a is formed, the sealing is performed. The plate 11 is formed. (In FIG. 5F, the side on which the sealing plate 11 is formed is drawn downward.) The mask pattern 27a is located at a position corresponding to the drain electrodes 3d and 4d of the TFT elements 3 and 4. It is formed so as to block light. Specifically, the release layer 26 is formed by, for example, spin-coating a 10% by weight aqueous solution of polyvinyl alcohol (hereinafter referred to as “PVA”) (at a rotation speed of 2).
000 rpm for 30 seconds) and dried on a hot plate at 110 ° C. for 2 minutes. Further, the sealing plate 11 is formed by applying a negative resist on the release layer 26 by spin coating (at 2,000 rpm for 30 seconds) and performing pre-baking.

(7) Next, as shown in FIG.
The transfer substrate 27 and the substrate 1 are bonded so that the sealing plate 11 and the support member 18 are in close contact with each other. At this time, the mask position of the mask pattern 27a of the transfer base material 27 and T
Positioning is performed so that the drain electrodes 3d and 4d of the FT elements 3 and 4 correspond to each other. This bonding forms a gap of 4 μm between the substrate 1 and the sealing plate 11.

(8) A guest-host liquid crystal containing a cyan dichroic dye in a fluorine-based nematic liquid crystal and a polymer precursor containing 3% by weight of a photopolymerization initiator were mixed with 80% by weight of the guest-host liquid crystal. % And a polymer precursor in a ratio of 20% by weight to prepare a mixed solution 21 ′. As shown in FIG. 6 (h), this mixed solution 21 ′ was mixed with the substrate 1 and the sealing plate 1
And injected from the transfer substrate 27 side to 5
Irradiate with ultraviolet light (UV) of 00 mJ / cm ² .

By the irradiation of the ultraviolet rays, the negative resist of the sealing plate 11 is polymerized in portions other than the drain electrodes 3d and 4d of the TFT elements 3 and 4 which are shielded from light by the mask pattern 27a of the transfer base material 27. The polymer precursor in the mixed solution 21 ′ injected into the gap is polymerized to form the polymer dispersed liquid crystal liquid crystal layer 21 in which the guest host liquid crystal is dispersed and held in the polymer network. The sealing plate 11 is fixed on the substrate 1 by a polymer network constituting the liquid crystal layer 21.

(9) As shown in FIG.
Is immersed in warm water, the release layer 26 is dissolved, the sealing plate 11 is released from the transfer base material 27, and the liquid crystal layer 21 is sealed between the substrate 1 and the transferred sealing plate 11. First display layer 6
Is formed.

(10) When the sealing plate 11 is developed with a developing solution of a negative resist, as shown in FIG. The portions above the drain electrodes 3d and 4d of the TFT elements 3 and 4 that have not been removed are removed, and an opening 11a is formed. In addition, the TF in the liquid crystal layer 21
Since the portions above the drain electrodes 3d and 4d of the T elements 3 and 4 were not irradiated with the ultraviolet rays, the polymer precursor did not polymerize and the form of the polymer dispersed liquid crystal was not formed.
The sealing plate 11 is easily washed away by the developing solution, and the opening 2
1a is formed.

(11) Next, as shown in FIG. 8 (k), a transparent conductive film of ITO is formed on the sealing plate 11 by sputtering, and is patterned into a pixel shape by photolithography and etching. The second pixel electrode 14 is formed. The second pixel electrode 14 is formed in the opening 1 of the sealing plate 11.
1 a and the transparent conductive film formed on the side wall of the support member 18 are connected to the drain electrode 3 d of the TFT element 3, and the voltage of the second pixel electrode 14 is controlled by the TFT element 3. Here, in order to facilitate the formation of the transparent conductive film on the side wall of the support member 18, so-called heat dripping is slightly generated in the support member 18 by post-baking, and the support member 18 is formed into a tapered shape. May be.

(12) The second display layer 7 is formed in the same manner as in the above (3) to (11). That is, FIG.
After forming the support member 19 as shown in FIG. 9, a liquid crystal layer 22, a sealing plate 12, and a third pixel electrode 15 are formed as shown in FIG. However, the following points are different from the step of forming the first display layer 6. That is, as the guest host liquid crystal included in the liquid crystal layer 22, a guest host liquid crystal containing a magenta dichroic dye instead of the cyan dichroic dye is used. The drain electrode 4 of the TFT element 4 is used as a mask pattern of a transfer base material for forming the sealing plate 12.
By using a pattern that masks only above d, the support member 19 and the liquid crystal layer 22 have openings 12a,
Only 22a is formed.

Here, the support member 19 is formed by using the first pixel electrode 9 and the black matrix 5 as a mask in the same manner as the formation of the support member 18 in the first display layer 6 ((4)). By irradiating ultraviolet rays. As a result, the support member 19 can accurately support the support member 1.
8 is formed at the same position. That is, without using a mask as in the case of using a separate mask,
The inconvenience as shown in FIG. 34 can be reliably prevented.

When the above-described ultraviolet exposure is performed, the ultraviolet rays are irradiated via the support member 18. For this reason, if the amount of irradiation of the negative resist forming the support member 19 becomes insufficient due to the absorption of the ultraviolet rays by the support member 18, the negative resist does not sufficiently polymerize,
In some cases, the height of the support member 19 is reduced, the thickness of the liquid crystal layer 22 is not kept constant, and the color balance of the liquid crystal display element is lost. In such a case, the support member 1 is used as a negative resist for forming the support member 19.
8 is different from that of FIG. 8 in that the wavelength characteristic of absorption (photosensitivity) of ultraviolet rays is different from that of the negative type resist. The support member 19 having a height can be easily formed. As the negative resist, a resist whose ultraviolet absorption wavelength characteristic changes before and after polymerization is used. Although the transmittance of the support member 18 already polymerized is high, the negative resist before polymerization for forming the support member 19 is used. May be irradiated with ultraviolet light having a low wavelength.

(13) Further, similarly, FIG.
As shown in (o), by forming the support member 20, the liquid crystal layer 23, and the sealing plate 13, the third display layer 8 is formed, and the common electrode 16 is formed on the sealing plate 13. In this case, as the guest host liquid crystal contained in the liquid crystal layer 23, a guest host liquid crystal containing a dichroic dye of yellow is used. In addition, a mask pattern is not formed on a transfer base material for forming the sealing plate 12, and ultraviolet light is irradiated on the entire surface of the sealing plate 13, and no opening is formed in the sealing plate 13 and the liquid crystal layer 23. .

Similarly to the support member 19 of the second display layer 7, the third display layer 8 is also irradiated with ultraviolet rays from the substrate 1 using the first pixel electrode 9 and the black matrix 5 as a mask. The support member 20 is formed at exactly the same position as the support members 18 and 19. The support member 2
0 as a negative resist, the support members 18 and
It is preferable to use a material having a different ultraviolet absorption (photosensitivity) wavelength characteristic from that of 19, and to irradiate the support members 18 and 19 with ultraviolet light having a high transmittance.

(14) By forming a protective film 17 made of a transparent acrylic resin on the common electrode 16, the liquid crystal display device shown in FIGS. 1 and 2 is obtained.

As described above, the support members 18 to 20 of the display layers 6 to 8 are formed by back exposure through the first pixel electrodes 9 and the openings 9 a, 5 a, 5 b of the black matrix 5. Since the support members 18 to 20 are not displaced so as to cause destruction of the first display layer 6 and the like, the support members 18 can be easily reduced to 7 μm square, and the aperture ratio is increased to increase the contrast ratio. Can be higher. Moreover, there is no need to align the mask as in the case of using a separate mask.

In the above example, the support members 18 are
Although an example in which the cross-sectional shape is a square and arranged at an equal distance has been described, the present invention is not limited to this, and the same effect can be obtained even when formed in various shapes and arrangements. In addition, the support members 18 are not limited to those having the same cross-sectional shape. For example, only the support members 18 formed in the region of the first pixel electrode 9 are formed in regions other than the pixels. The cross-sectional shape may be smaller than that.

In the above example, the substrate 1 and the sealing plate 11
And between the sealing plates 11 to 13, the so-called polymer dispersion type liquid crystal layers 21 to 23 are provided.
Instead, a liquid crystal that does not include a polymer network may be used. That is, the liquid crystal is applied to the sealing plate 11.
, It is not always necessary to use a polymer network. As a result, the ratio of the liquid crystal in the display layers 6 to 8 increases, so that the contrast ratio can be further increased.

However, in this case, the sealing plates 11
Since it is not fixed on the substrate 1 by the polymer network as described above, it is necessary to fix it by bonding or the like.

For this purpose, for example, an adhesive may be applied to the sealing plates 11 or the support members 18 and bonded to each other. Specifically, for example, a thermosetting epoxy resin is used as an adhesive,
8 and then bonded to the sealing plates 11 and then heated in an oven to cure and bond the epoxy resin. As the adhesive, another material such as a two-component reactive adhesive may be used.

The support members 18 or the sealing plate 11
Use plastic material as a material for ...
The support member 18 and the sealing plate 11 are brought into close contact with each other and pressurized or heated to plasticize and weld the support member 18 or the sealing plate 11. May be integrated. Specifically, a resist having thermoplasticity is used as a resist constituting the sealing plates 11. After the support members 18 and the sealing plates 11 are bonded to each other, they are heated in an oven while applying pressure. Thus, the plasticized sealing plates 11 may be welded to the support members 18.

In the above example, the liquid crystal layers 21 to 23 are formed each time the display layers 6 to 8 are formed. However, when a liquid crystal containing no polymer network is used, first, Support members 18 to 20 and sealing plates 11 to 13
After the formation, the liquid crystal layers 21 to 23 may be formed in each gap. Further, even when a liquid crystal containing a polymer network is used, it can be manufactured in the same manner. However, in order to easily form the polymer network, as described for the support members 18. It is preferable to use polymer precursors having different properties.

Further, as described above, instead of forming the sealing plates 11 on the transfer base material 27 and then transferring, the support members 18 are formed and then a sublimable material, for example, camphor. May be applied at the same height as the supporting members 18 and the sealing plate 11 may be formed thereon. That is, a thin film-like sealing plate 11 can be easily formed on the camphor coating, and since camphor has a sublimation property, it can be formed after the sealing plate 11 is formed. , The substrate 1 and the sealing plate 1 are easily removed by sublimation and removal.
A gap can be formed between 1 and the like. Further, instead of the sublimable material, a material that is vaporized by irradiation with ultraviolet light or heating, for example, polyphthalaldehyde (P
PA) to the onium salt triphenylsulfonium
Hexafluoroantimony (Ph ₃ S ⁺ -SbF ₆ )
A positive resist dissolved in cyclohexanone in addition to the weight% may be used.

(Embodiment 2) A liquid crystal display device according to Embodiment 2 of the present invention will be described with reference to FIGS.

FIG. 11 is a partial plan view showing the structure of one pixel of the liquid crystal display device.

FIG. 12 is a sectional view taken along the line BB of FIG.

FIGS. 13 to 17 are explanatory diagrams showing the steps of manufacturing the liquid crystal display element.

In the second embodiment, the same components as those in the first embodiment are denoted by the same reference numerals, and the description is omitted.

The liquid crystal display device of the second embodiment is different from the liquid crystal display device of the first embodiment in that a first pixel electrode having an opening is formed and a support member is formed by irradiating ultraviolet rays through the opening. It is similar to a liquid crystal display element, but differs mainly in the following points. That is, in the first embodiment, after the support members 18 are formed on the substrate 1 or the like by irradiation of ultraviolet rays, the sealing plates 11 are bonded to form the liquid crystal layers 21. In 2, the mixed solution 41 ′ of the liquid crystal and the polymer precursor is attached after the sealing plates 11 are attached.
Are sealed, and the mixed solution 41 'is irradiated with ultraviolet light to precipitate and cure the polymer precursor (photopolymerizable polymer) in the mixed solution 41' to form the support members 31. , Liquid crystal layers 41... Further, unlike the liquid crystal layers 21 of the first embodiment, the liquid crystal layers 41 are made of a guest-host liquid crystal that does not include a polymer network.

Hereinafter, the structure of the liquid crystal display device will be described with reference to FIGS.

In the area of the liquid crystal display element where the first pixel electrode 9 and the openings 9a, 5a of the black matrix 5 are formed, liquid crystal is mixed with liquid crystal instead of the support members 18 to 20 of the first embodiment. The support members 31 to 33 having a height of 4 μm formed by polymerizing and curing the polymer precursor are provided. Further, the support member 1 of the first embodiment is provided on the TFT elements 3 and 4 and on the black matrix 5 in the vicinity thereof.
8 supporting members on the element as auxiliary supporting members having a height of 4 μm, which are formed from the same negative resist as that of 8.
(The shape of the element upper support member 28 is
Is indicated by a thick line. ).

The element supporting member 28 of the first display layer 6 includes
Openings 28a for three-dimensional wiring are formed above the drain electrodes 3d and 4d of the TFT elements 3 and 4. In addition, an opening 29a for a three-dimensional wiring is formed in the on-element support member 29 of the second display layer 7 only at a position above the drain electrode 4d of the TFT element 4. No opening is formed in the on-element support member 30 of the third display layer 8.

A guest-host liquid crystal containing a dichroic dye of cyan, magenta, or yellow is sealed between the substrate 1 and the sealing plate 11 and between the sealing plates 11 to 13, respectively. Layers 41 to 43 are formed. That is, the polymer dispersed liquid crystal layers 21 to 21 as in the first embodiment are used.
Since the ratio of the liquid crystal in each of the display layers 6 to 8 is larger than in the case of using No. 23, a higher contrast ratio can be obtained.

Next, a method of manufacturing the above liquid crystal display device will be described with reference to FIG.
This will be described with reference to FIGS.

(1) First, similarly to (1) of the first embodiment, as shown in FIG. 13A, a TFT element 2 to 4 and an opening 9 are formed on a substrate 1 made of borosilicate glass.
The first pixel electrode 9 having a is formed.

(2) Similar to (2) of the first embodiment,
As shown in FIG. 13B, a black matrix 5 having openings 5a and 5b is formed.

Next, an on-element support member 28 is formed on the black matrix 5 by the following steps (3) and (4).

(3) First, as shown in FIG. 14C, on the substrate 1 on which the first pixel electrodes 9 and the black matrix 5 are formed, a negative resist 28 for forming the on-element support member 28 is formed. Is applied by spin coating (at 600 rpm, for 30 seconds), pre-baked (at 80 ° C. for 3 minutes on a hot plate), and a mask substrate 25 having a mask pattern 25a is overlaid thereon to apply ultraviolet rays (UV). Irradiate and expose. The above mask pattern 25
“a” is formed so as to shield the portion other than the portion above the element supporting member 28 and the portion of the opening 28 a from light.

(4) Next, the exposed negative resist 28 'is developed with a developing solution and baked in an oven (15).
By carrying out at 0 ° C. for 1 hour), an on-device support member 28 is formed on the TFT devices 3 and 4 as shown in FIG. This element upper support member 28 has a height of 4 μm,
The plane shape is formed in a rectangular shape of 20 μm × 30 μm. Further, the drain electrodes 3d, 4d of the TFT elements 3, 4
An opening 28a of 10 μm square is formed in the upper part of FIG.

(5) As in (6) of the first embodiment,
As shown in FIG. 15E, the release layer 26 and the sealing are formed on the surface of the transfer substrate 27 on which the mask pattern 27a for masking the positions corresponding to the drain electrodes 3d and 4d of the TFT elements 3 and 4 is formed. The plate 11 is formed.

(6) As shown in FIG. 15F, the transfer base material 27 and the substrate 1 are connected to the mask position of the mask pattern 27a of the transfer base material 27 and the drain electrodes 3d of the TFT elements 3 and 4. , 4d are aligned so as to correspond to each other, and the sealing plate 11 and the element supporting member 28 are bonded so as to be in close contact with each other, so that a gap of 4 μm is formed between the substrate 1 and the sealing plate 11. Next, a mixed solution 41 ′ was prepared by mixing a guest-host liquid crystal containing a dichroic dye of cyan and a polymer precursor in a ratio of 95% by weight of the guest-host liquid crystal and 5% by weight of the polymer precursor. Then, it is injected into a gap between the substrate 1 and the sealing plate 11.

(7) As shown in FIG. 16G, the substrate 1 is irradiated with 500 mJ / cm ² of ultraviolet light (UV). Thus, only the mixed solution 41 'in the openings 9a and 5a is exposed using the first pixel electrode 9 and the black matrix 5 as a mask. That is, back exposure (self-alignment) for exposing only the portion where the support member 31 is formed is performed. By this ultraviolet irradiation,
Mixed solution 4 injected into gap between substrate 1 and sealing plate 11
The polymer precursor in 1 'begins to polymerize above the openings 9a, 5a. Then, the concentration of the polymer precursor in the mixed solution 41 ′ becomes lower near the upper portions of the openings 9 a and 5 a, and the polymer precursor is condensed by diffusion due to uneven concentration with other portions. The support member 31 is formed by solidifying as a polymer above the openings 9a and 5a. At the same time, between the substrate 1 and the sealing plate 11 and the like, the polymer precursor is consumed for forming the support members 31. Is formed.

Here, assuming that the ratio of the area occupied by the support members 31 to the area of the region filled with the mixed solution 41 'is 5%, the ratio of the guest-host liquid crystal in the mixed solution 41' is reduced as described above. By setting it to 95%, all of the polymer precursor in the mixed solution 41 ′ was used to form the support member 31, and only the guest-host liquid crystal was sealed between the substrate 1 and the sealing plate 11. State.

(8) 100 mJ from the transfer substrate 27 side
The substrate 1 was immersed in warm water to release the sealing plate 11 from the transfer base material 27 in the same manner as in (9) of Embodiment 1 after irradiating ultraviolet rays (UV) at / cm ² . Thereafter, when the sealing plate 11 is developed with a developer of a negative resist, FIG.
As shown in (h), at the time of the above-mentioned ultraviolet irradiation, the transfer substrate 2
7 that were not exposed by the mask pattern 27a
Portions of the T elements 3 and 4 above the drain electrodes 3d and 4d are removed to form openings 11a for three-dimensional wiring.

(9) Similarly to (11) of the first embodiment, as shown in FIG.
A transparent conductive film of O is formed by sputtering and patterned into a pixel shape by photolithography and etching to form a second pixel electrode 14. This second pixel electrode 1
4 denotes an opening 1 of the sealing plate 11 and the element supporting member 28.
The transparent conductive film formed on the sidewalls of
Connected to the drain electrode 3 d of the FT element 3, the voltage of the second pixel electrode 14 is controlled by the TFT element 3.

(10) The same steps as the above (3) to (9) are repeated twice to obtain the second pixel electrode 14, the element supporting member 29, the supporting member 32, the liquid crystal layer 42, and the sealing plate 12
And a third display layer 8 having a third pixel electrode 15, an on-device support member 30, a support member 33, a liquid crystal layer 43, and a sealing plate 13. A common electrode 16 is formed on 13. Also, the common electrode 1
By forming a protective film 17 made of a transparent acrylic resin on 6, the liquid crystal display device shown in FIGS. 11 and 12 is obtained. Here, the liquid crystal layers 42 and 43 are each formed of a guest-host liquid crystal containing a dichroic dye of magenta or yellow. Further, openings 12a and 29a are formed only above the drain electrode 4d of the TFT element 4 in the sealing plate 12 and the element supporting member 29, and the openings are formed in the sealing plate 13 and the element supporting member 30. Not formed.

As described above, as in the first embodiment, the first pixel electrode 9 and the opening 5 of the black matrix 5 are formed.
By forming the support members 31 to 33 of each of the display layers 6 to 8 by back exposure through a and 9a, the aperture ratio can be easily increased by reducing the support members 31 to 7 μm square.

In the first embodiment, the weight ratio of the liquid crystal contained in the polymer-dispersed liquid crystal layers 21 is 8%.
On the other hand, the polymer precursor in the mixed solution 41 ′ of the guest-host liquid crystal and the polymer precursor was 0%.
Are formed, and only the guest-host liquid crystal is sealed between the substrate 1 and the sealing plate 11, etc., so that the contrast ratio can be further increased.

When the support members 31 to 33 are formed, it is not necessary to position the mask as in the case of using a separate mask as described above. When forming, it is necessary to align the mask substrate 25 and the like to some extent. However, the element supporting members 28 to 30 are 20 μm × 30 on the pixel plane.
Since it is formed in a relatively large shape of μm, even if the formation position is slightly shifted, the problem shown in FIG. 34 does not occur, so that it is not necessary to perform high-precision alignment.

In the second embodiment, as described in the first embodiment, the photopolymerization initiator in the polymer precursor forming the support members 31 to 33 absorbs ultraviolet rays ( (Photosensitivity) The polymer precursor may be polymerized more efficiently by using one having a different wavelength characteristic.

As described above, instead of forming the sealing plates 11 on the transfer base material 27 and then transferring, the solid or high-viscosity liquid containing the guest-host liquid crystal and the polymer precursor is used. The mixed solution is applied on a substrate, and a substance which promotes the polymerization of the polymer precursor in the mixed solution, for example, an amine activator of an acrylic resin is applied to the surface of the mixed solution at a volume ratio of pure water to isopropyl alcohol of 10: 1. Alternatively, the sealing plate may be formed by contacting a solution obtained by dissolving 5% by weight in the mixed solvent described above or by irradiating ultraviolet rays to polymerize only the surface of the mixed solution near the surface.

(Embodiment 3) A liquid crystal display device according to Embodiment 3 of the present invention will be described with reference to FIGS.

FIG. 18 is a partial cross-sectional view showing the structure of one pixel of the liquid crystal display element.

FIGS. 19 to 24 are explanatory views showing the steps of manufacturing the liquid crystal display device.

In the third embodiment, the same components as those in the first or second embodiment are designated by the same reference numerals, and the description is omitted.

The liquid crystal display device of the third embodiment has the structure shown in FIG.
As shown in FIG. 8, the support members 18 to 20 formed by polymerizing and curing a negative resist as in Embodiment 1 and the polymer precursor mixed with liquid crystal as in Embodiment 2 are polymerized and cured. The supporting members 31 to 33 formed as described above are provided alternately. Note that these support members 18
20 to 31 and 33 are formed by the exposure of ultraviolet rays through the first pixel electrode 9 and the openings 9a, 5a and 5b of the black matrix 5, respectively, in the same manner as in the first or second embodiment. It is. As in the second embodiment, the liquid crystal layers 41 between the substrate 1 and the sealing plate 11 are made of only the guest-host liquid crystal remaining after the polymer precursor is consumed for forming the support members 31. It is configured to be sealed. Except for the support members 31 to 33 and the liquid crystal layer 41, the configuration is the same as that of the first embodiment.

Next, a method for manufacturing the above-mentioned liquid crystal display device will be described with reference to FIG.
This will be described with reference to FIGS.

(1) First, similarly to (1) of the first embodiment, as shown in FIG. 19A, a TFT element 2 to 4 and an opening 9 are formed on a substrate 1 made of borosilicate glass.
The first pixel electrode 9 having a is formed.

(2) Similar to (2) of the first embodiment,
As shown in FIG. 19B, a black matrix 5 having openings 5a and 5b is formed.

Next, about half of the supporting members 18 of the first embodiment are formed by the following steps (3) to (5).

(3) As in (3) of the first embodiment,
As shown in FIG. 20C, the support member 18 is provided on the substrate 1.
Is applied and a pre-baking is performed.

(4) As shown in FIG.
Of the pixel electrodes 9 and the openings 9a, 5a in the black matrix 5, a mask substrate 34 on which a mask pattern 34a for shielding the openings 9a ″, 5a ″ is formed is disposed outside the substrate 1, and from the substrate 1 side. Irradiate with ultraviolet light,
Negative resist 1 at openings 9a ', 5a', 5b
8 'is polymerized and cured.

(5) Similar to (5) of the first embodiment,
The negative resist 18 'is developed with a developing solution and baked to form openings 9a', 5a ', 5b as shown in FIG.
The support member 18 is formed at the portion.

(6) As in (6) of the first embodiment,
As shown in FIG. 21F, the release layer 26 and the sealing are formed on the surface of the transfer base material 27 on which the mask pattern 27a for masking the positions corresponding to the drain electrodes 3d and 4d of the TFT elements 3 and 4 is formed. The plate 11 is formed.

(7) As in (6) of the second embodiment,
As shown in FIG. 22 (g), the transfer substrate 27 and the substrate 1
Are bonded so that the sealing plate 11 and the support member 18 are in close contact with each other, and a mixed solution 41 ′ of a guest-host liquid crystal containing a cyan dichroic dye and a polymer precursor is applied to the substrate 1
Is injected into a gap between the sealing plate 11 and.

(8) Similar to (7) of the second embodiment,
As shown in FIG. 22H, 500 mJ from the substrate 1 side.
/ Cm ² of ultraviolet light (UV), and the first pixel electrode 9
And openings 9a, 5a in black matrix 5
Of these, at the openings 9a ″ and 5a ″ where the support member 18 was not formed in the above (4) and (5), the mixed solution 41 ′ was formed.
The support member 31 is formed by polymerizing the polymer precursor therein, and the liquid crystal layer 41 is formed.

Here, the ratio of the polymer precursor in the mixed solution 41 ′ is defined as the area of the region filled with the mixed solution 41 ′ (the area excluding the portion where the support member 18 of the negative resist is formed first). By setting the ratio of the area of the portion where the support member 31 is formed, the polymer precursor is entirely used for forming the support member 31 and the substrate 1 and the sealing plate 1 are formed.
1, only the guest host liquid crystal is sealed, so that the substantial aperture ratio can be increased as in the second embodiment.

(9) As in (8) of the second embodiment,
As shown in FIG. 23 (i), after irradiating ultraviolet rays (UV) from the transfer substrate 27 side, the substrate 1 is immersed in warm water,
After releasing the sealing plate 11 from the transfer substrate 27, the sealing plate 1
24 is developed with a developing solution of a negative resist to obtain FIG.
As shown in (j), an opening 11a for a three-dimensional wiring is formed.

(10) As in (11) of the first embodiment, as shown in FIG.
A transparent conductive film of O is formed by sputtering and patterned into a pixel shape by photolithography and etching to form a second pixel electrode 14.

(11) The same steps as (3) to (10) are repeated twice to obtain the second pixel electrode 14 and the support member 1.
9, 32, the liquid crystal layer 42, and the second
The display layer 7, the third pixel electrode 15, the support members 20, 33,
The liquid crystal layer 43 and the third display layer 8 having the sealing plate 13 are formed, and the common electrode 16 is formed on the sealing plate 13. Also, by forming a protective film 17 made of a transparent acrylic resin on the common electrode 16, the liquid crystal display element shown in FIG. 18 can be obtained.

As described above, similarly to the first embodiment, the gap between the substrate 1 and the sealing plate 11 and the gaps between the sealing plates 11 to 13 are kept uniform by the support members 18 to 20, and the liquid crystal display element While keeping the balance of the display colors constant, as in the second embodiment, the substantial aperture ratio can be increased to further increase the contrast ratio.

As described above, when the support members 18 to 20 of the negative resist and the support members 31 to 33 of the polymer are alternately formed, the distance between the substrate 1 and the sealing plate 11 or the like is increased. Is preferable because it is easy to efficiently condense the polymer precursor while keeping the constant, but the number ratio and arrangement are not limited thereto.

(Embodiment 4) A liquid crystal display device according to Embodiment 4 of the present invention will be described with reference to FIGS.

FIG. 25 is a partial plan view showing the structure of one pixel of the liquid crystal display element.

FIG. 26 is a sectional view taken along the line CC of FIG.

FIGS. 27 to 31 are explanatory views showing the steps of manufacturing the liquid crystal display device.

In the fourth embodiment, the same components as those in the first to third embodiments are denoted by the same reference numerals, and the description is omitted.

In the liquid crystal display device of the fourth embodiment, mainly, the support members 61 to 63 are replaced by a negative resist.
The difference from the first to third embodiments is that the positive resist is formed by polymerization and curing. For this reason, the light-shielding film 35 is provided on the substrate 1 at a position where the support members 61 are formed. Also, in place of the TFT elements 2 to 4, a drain electrode 82d.
FT elements 82 to 84 are provided.

Hereinafter, the structure of the liquid crystal display device will be described with reference to FIGS. 25 and 26.

First pixel electrode 36 and TFT element 82
The drain electrodes 82d to 84d are formed of ITO which is a transparent conductive film. Note that the TFT element 8
Regarding other gate electrodes 82b and the like in 2 to 84,
This is the same as the TFT element 2 and the like. In addition, a light-shielding film is provided at the position corresponding to the openings 9a and 5a of the first pixel electrode 9 and the like in the first pixel electrode 36 and the periphery thereof and on the TFT elements 83 and 84 and in the vicinity thereof. 35 are provided. In the light-shielding film 35, the drain electrodes 83d and 84d of the TFT elements 83 and 84
An opening 35b is formed. (In FIG. 25,
The area where the light-shielding film 35 is formed is indicated by stippling. As the light shielding film 35, a black resist containing carbon particles, that is, the same as the black matrix 5 of the first embodiment is used. In addition, as the light-shielding film 35, for example, a film formed by forming a metal thin film such as aluminum and then performing photolithography and etching may be used.

On the light-shielding film 35, there are provided support members 61 to 63 and support members 71 to 73, which are formed by hardening a positive resist. The drain electrodes 83d and 84 of the TFT elements 83 and 84 are provided on the element supporting member 71.
An opening 71a for a three-dimensional wiring is formed at a position above d. An opening 72a is formed in the element supporting member 72 only at a position above the drain electrode 84d of the TFT element 84.

On the upper surface of the sealing plate 13 of the third display layer 8, the common electrode 1 made of a transparent conductive film as in the first to third embodiments is formed.
Instead of 6, a common electrode 39 made of a reflective film is provided. Further, on the upper surface of the common electrode 39, the first to third embodiments are provided.
A protective film 17 similar to that of No. 3 is formed. However, the protective film 17 does not necessarily have to be transparent.

In the liquid crystal display device configured as described above,
Light (external light) incident from the substrate 1 side passes through the substrate 1, the first, second, and third display layers 6, 7, 8 in this order, is reflected by the common electrode 39, and then reflected by the third and second display layers. , The first display layers 8, 7,
6. The display is performed by passing through the substrate 1 in this order. That is, the display screen is viewed from the substrate 1 side.

Next, a method of manufacturing the above liquid crystal display device will be described with reference to FIG.
This will be described with reference to FIGS.

(1) First, as shown in FIG. 27A, after a portion other than the drain electrodes 82d to 84d of the TFT elements 82 to 84 is formed on the substrate 1, a transparent conductive film of ITO is formed by sputtering. The first pixel electrode 3 is patterned by photolithography and etching.
6, and the drain electrodes 83 of the TFT elements 83 and 84
d, 84d are formed. The first pixel electrode 36 is different from the first embodiment in that the first pixel electrode 36 is made of a transparent conductive film as described above and does not have an opening.
The point which also serves as the second drain electrode 82d is the same.

(2) Next, a light shielding film 35 is formed. That is, a black resist containing carbon particles is applied on the substrate 1 to a thickness of 0.5 μm, and the support member 6 is formed in a later step.
Mask exposure and development are performed so that the resist remains only at predetermined positions where the elements 1 to 63 and the element supporting members 71 to 73 are to be provided, and a light shielding film 35 is formed as shown in FIG.

Next, the supporting member 61 and the device-on-element supporting member 71 are formed by the following steps (3) to (5).

(3) On the substrate 1 on which the first pixel electrode 36 and the light-shielding film 35 are formed as described above, FIG.
As shown in FIG.
Is applied by spin coating (at a rotation speed of 600 rpm for 30 seconds) and then pre-baked (on a hot plate at 80 ° C. for 3 minutes).

(4) As shown in FIG. 28D, the substrate 1 is irradiated with ultraviolet rays (UV) of 100 mJ / cm ² . That is, using the light shielding film 35 as a mask,
Only the portion of the positive resist 61 'where no is formed is exposed.

(5) After developing the positive resist 61 'with a developing solution, it is baked (at 120 ° C. for 1 hour), so that a support member is formed on the light shielding film 35 as shown in FIG. 61 and an element upper support member 71 are formed. Here, since the drain electrodes 83d and 84d of the TFT elements 83 and 84 are formed of a transparent conductive film as described above, the drain electrodes 83d and 84d of the on-element support member 71 are formed.
An opening 71a is formed at a position above 84d. The above-mentioned device supporting member 71 has the same shape as that of the above-mentioned device supporting member 28 of the second embodiment, but is formed in the same process as the supporting member 61 by back exposure as described above. .

The first display layer 6 is formed in the same manner as in the first embodiment. That is, (6) as in (6) of the first embodiment, FIG.
As shown in (2), the release layer 26 and the sealing plate 11 are formed on the surface of the transfer substrate 27.

(7) As in (7) of the first embodiment,
As shown in FIG. 30G, the transfer base material 27 and the substrate 1 are bonded.

(8) As in (8) of the first embodiment,
As shown in FIG. 30 (h), a mixed solution 21 ′ of the guest-host liquid crystal and the polymer precursor was injected into the gap between the substrate 1 and the sealing plate 11, and 500 mJ /
The liquid crystal layer 21 of polymer dispersed liquid crystal is formed by irradiating ultraviolet rays (UV) of cm ² .

(9) As in (9) of the first embodiment,
The substrate 1 is immersed in warm water, and the sealing plate 11 is transferred to the transfer substrate 27.
After releasing from the mold, the sealing plate 11 is developed with a developer of a negative resist to form an opening 11a as shown in FIG. 31 (i).

(10) Similarly to (11) of the first embodiment, as shown in FIG.
A transparent conductive film of O is formed by sputtering and patterned into a pixel shape by photolithography and etching to form a second pixel electrode 14.

(11) The same steps as the above (3) to (10) are repeated twice to obtain the second pixel electrode 14, the element supporting member 72, the supporting member 62, the liquid crystal layer 22, and the sealing plate 1.
2 and a third display layer 8 having a third pixel electrode 15, an on-element support member 73, a support member 63, a liquid crystal layer 23, and a sealing plate 13. However, on the sealing plate 13 of the third display layer 8, a common electrode 39 also serving as a reflective film is formed by depositing aluminum to a thickness of 2000 angstroms by vapor deposition. Further, the protective film 17 for protecting the liquid crystal display element from external pressure or the like is formed on the common electrode 39, and the liquid crystal display element shown in FIGS. 25 and 26 is obtained.

As described above, each of the first display layers 6 to 6 is exposed by back exposure using a positive resist and light shielding by the light shielding film 35.
By forming the support members 61 to 63 of the eighth embodiment, similarly to the liquid crystal display element of the first embodiment, there is no displacement of the support members 61 to 63 that may cause the destruction of the first display layer 6 and the like. Therefore, the support members 61 can be easily reduced in size without aligning the mask, and the aperture ratio can be increased to increase the contrast ratio.

In the above example, a reflection type liquid crystal display element is described. However, a transmission type liquid crystal display element can be formed by forming the common electrode 39 with a transparent conductive film. .

Further, in the above example, the example in which the polymer-dispersed liquid crystal layers 21 to 23 are formed is shown. However, as described in Embodiment 1, a liquid crystal containing no polymer network is used. You may do so.

Further, instead of forming the sealing plates 11 on the transfer base material 27 and then transferring as described above, after forming the support members 18, the support plates 18 are formed, and the support members 18 are irradiated with heat or vaporized. Material such as polyphthalaldehyde (P
PA) to the onium salt triphenylsulfonium
Hexafluoroantimony (Ph ₃ S ⁺ -SbF ₆ )
A positive resist dissolved in cyclohexanone in addition to the weight% may be applied at the same height as the support members 18 and the sealing plate 11 may be formed thereon. That is, a thin sealing plate 11 in the form of a film can be easily formed on the coated material as described above.
Since it becomes vaporizable by irradiation with ultraviolet light, etc.,
After the sealing plates 11 are formed, they are vaporized and removed, so that a gap can be easily formed between the substrate 1 and the sealing plate 11 or the like.

[0196]

The present invention is embodied in the form described above and has the following effects.

That is, by exposing and curing the photosensitive resin layer through the opening formed in the reflection film to form the support member, a mask positioning step for forming the support member is not required. In addition, the manufacturing cost can be reduced, and the area occupied by the support member can be reduced to easily increase the contrast ratio.

[Brief description of the drawings]

FIG. 1 is a partial plan view showing a configuration per pixel of a liquid crystal display element according to a first embodiment.

FIG. 2 is a sectional view taken along the line AA of FIG.

FIG. 3 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 4 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 5 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 6 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 7 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 8 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 9 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 10 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the first embodiment.

FIG. 11 is a partial plan view showing a configuration per pixel of a liquid crystal display element according to a second embodiment.

12 is a sectional view taken along the line BB in FIG. 11;

FIG. 13 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the second embodiment.

FIG. 14 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the second embodiment.

FIG. 15 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the second embodiment.

FIG. 16 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the second embodiment.

FIG. 17 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the second embodiment.

FIG. 18 is a partial cross-sectional view showing a configuration per pixel of the liquid crystal display element of Embodiment 3.

FIG. 19 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 20 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 21 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 22 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 23 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 24 is an explanatory diagram illustrating a manufacturing process of the liquid crystal display element of the third embodiment.

FIG. 25 is a partial plan view showing a configuration per pixel of the liquid crystal display element of Embodiment 4.

26 is a sectional view taken along the line CC of FIG. 25.

FIG. 27 is an explanatory diagram illustrating the manufacturing process of the liquid crystal display element of the fourth embodiment.

FIG. 28 is an explanatory diagram illustrating the manufacturing process of the liquid crystal display element of the fourth embodiment.

FIG. 29 is an explanatory diagram illustrating the manufacturing process of the liquid crystal display element of the fourth embodiment.

FIG. 30 is an explanatory diagram illustrating the manufacturing process of the liquid crystal display element of the fourth embodiment.

FIG. 31 is an explanatory diagram illustrating the manufacturing process of the liquid crystal display element of the fourth embodiment.

FIG. 32 is a cross-sectional view illustrating a configuration of a conventional liquid crystal display element.

FIG. 33 is a cross-sectional view showing a configuration of another conventional liquid crystal display element.

FIG. 34 is an explanatory diagram illustrating an example of a problem caused by a displacement of a support member.

FIG. 35 is an explanatory diagram showing conditions of a pitch of a support member.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 Substrate 2-4 TFT element 5 Black matrix 5a, 5b Opening 6-8 Display layer 9 1st pixel electrode 9a, 9a ', 9a "Opening 11-13 Sealing plate 11a, 12a Opening 18-20 Support member 18 'Negative resist 21-23 Liquid crystal layer 21' Mixed solution 25 Mask substrate 25a Mask pattern 26 Release layer 27 Transfer base material 27a Mask pattern 28-30 Element support members 28a, 29a Opening 28 'Negative resist 31- 33 Support Member 34 Mask Substrate 34a Mask Pattern 35 Light Shielding Film 35b Opening 36 First Pixel Electrode 39 Common Electrode 41-43 Liquid Crystal Layer 41 'Mixed Solution 61-63 Support Member 61' Positive Resist 71-73 Device Support Member 71a , 72a Opening 82-84 TFT element 82d-84d Drain electrode

──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. ⁷ Identification symbol FI Theme court ゛ (Reference) G02F 1/1368 G02F 1/1368 1/137 1/137 (72) Inventor Hiroshi Yamazoe Kazuma Kadoma, Kadoma City, Osaka Prefecture 1006 Matsushita Electric Industrial Co., Ltd. (72) Inventor Takeshi Karasawa 1006 Kadoma, Kadoma, Osaka Prefecture 1006 Matsushita Electric Industrial Co., Ltd. F term (reference) 2H088 GA10 GA13 HA14 HA21 MA02 MA20 2H089 HA04 HA10 HA23 HA27 HA32 JA01 JA04 LA10 LA11 LA12 NA14 NA22 NA44 NA45 NA53 NA56 NA60 QA12 RA06 TA09 TA13 2H091 FA14Y FA34Y FC10 JA02 LA12 LA17 2H0907 JA25 QA08 QA15

Claims (31)

[Claims] 1. A substrate made of a transparent material and having a reflective film formed thereon, a sealing plate provided on a side of the substrate on which the reflective film is formed, and a sealing plate provided between the substrate and the sealing plate. A liquid crystal display element having a liquid crystal layer provided therebetween, wherein an opening is formed in the reflection film, and an opening of the reflection film is formed between the substrate and the sealing plate. A liquid crystal display device, wherein a support member for supporting the sealing plate, which is formed by exposing the photosensitive resin through the opening, is provided at a position where the resin is exposed. 2. The liquid crystal display device according to claim 1, wherein said photosensitive resin is a negative resist. 3. The liquid crystal display device according to claim 2, wherein the liquid crystal layer includes a polymer and liquid crystal dispersed and held in the polymer. 4. The liquid crystal display device according to claim 1, wherein the photosensitive resin is a polymer precursor in a mixed solution containing a liquid crystal for forming the liquid crystal layer and a photosensitive polymer precursor. A liquid crystal display element characterized by being a body. 5. The liquid crystal display element according to claim 1, wherein a plurality of sets of the liquid crystal layer and the sealing plate are provided, and an opening of the reflection film is formed between the sealing plates. A liquid crystal display device, comprising a support member for supporting each sealing plate formed by exposing a photosensitive resin through the opening at a position. 6. A liquid crystal display device according to claim 5, wherein said supporting members for supporting said sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics from each other. element. 7. The liquid crystal display device according to claim 5, wherein three sets of the liquid crystal layer and the sealing plate are provided, and each liquid crystal layer has a different color of cyan, magenta, or yellow. A liquid crystal display device comprising a guest-host liquid crystal containing a colorant and a liquid crystal. 8. The method for manufacturing a liquid crystal display element according to claim 1, wherein a step of forming a reflective film having the opening on the substrate; and a step of forming the reflective film on the substrate. A step of forming a photosensitive resin layer thereon, a step of exposing the photosensitive resin layer from the substrate side through an opening of the reflection film and curing the same, and a step of curing the reflection film in the photosensitive resin layer. Removing the portions not exposed by the shielding by development to form the support member; and bringing the sealing plate into close contact with the support member; and applying a liquid crystal between the substrate and the sealing plate. Encapsulating to form the liquid crystal layer. 9. The method for manufacturing a liquid crystal display element according to claim 8, wherein said photosensitive resin layer is formed from a negative resist. 10. The method for manufacturing a liquid crystal display element according to claim 8, wherein the step of forming the liquid crystal layer comprises: interposing a liquid crystal and a photosensitive polymer precursor between the substrate and the sealing plate. A step of enclosing the mixed solution containing, and exposing the mixed solution from the side of the sealing plate to cure the polymer precursor in the mixed solution,
Forming the liquid crystal layer including the liquid crystal dispersed and held in the polymer, and fixing the sealing plate to the substrate. 11. The method for manufacturing a liquid crystal display element according to claim 8, wherein the step of adhering the sealing plate to the support member comprises: adhering the support member and the sealing plate; A method for manufacturing a liquid crystal display device, comprising a bonding step of fixing a plate to the substrate. 12. A method for manufacturing a liquid crystal display element according to claim 11, wherein said bonding step includes a step of applying an adhesive to at least one of said support member and said sealing plate. Manufacturing method of a liquid crystal display element. 13. The method for manufacturing a liquid crystal display device according to claim 11, wherein at least one of the sealing plate and the supporting member is
It is made of a material having plasticity by at least one of heating and pressurizing, and the bonding step performs at least one of heating and pressurizing in a state where the sealing plate is in close contact with the support member. A method for manufacturing a liquid crystal display element, comprising a step of fixing a sealing plate to the substrate. 14. A method for manufacturing a liquid crystal display element according to claim 5, further comprising, in addition to the steps of claim 8, a step of forming a new photosensitive resin layer on the sealing plate. A step of exposing the new photosensitive resin layer from the substrate side through the opening of the reflection film and the already formed support member, and curing the same; and a step of curing the reflection film in the new photosensitive resin layer. Removing a portion not exposed by the shielding by development to form a new support member; and bringing a new sealing plate into close contact with the new support member; and Forming a plurality of liquid crystal layers by performing at least once each of the steps of sealing a liquid crystal and forming a new liquid crystal layer with the new sealing plate. Production method. 15. The method for manufacturing a liquid crystal display element according to claim 14, wherein said support members for supporting said sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics from each other. A method for manufacturing a liquid crystal display element, comprising exposing and curing members with light having different wavelengths. 16. A method for manufacturing a liquid crystal display element according to claim 1, wherein a step of forming a reflective film having the opening on the substrate is performed. A step of forming an auxiliary support member in a predetermined area other than the area where the opening is formed; a step of bringing the sealing plate into close contact with the auxiliary support member; Enclosing a mixed solution containing a reactive polymer precursor, and exposing the mixed solution from the substrate side through an opening of the reflective film, and polymerizing the polymer precursor in the mixed solution with the reflective film Forming and supporting the support member by depositing and hardening at a position corresponding to the opening of the liquid crystal display, and forming the liquid crystal layer by liquid crystal in the remaining liquid mixture. Method. 17. The method for manufacturing a liquid crystal display element according to claim 16, wherein the step of forming the auxiliary support member comprises: forming a negative resist layer on the substrate on which the reflection film is formed; Exposing and curing the negative resist layer from a side opposite to the substrate through a predetermined mask pattern, and removing, by development, a portion of the negative resist layer that has not been exposed due to the shielding of the mask pattern. And a process for producing a liquid crystal display element. 18. A method for manufacturing a liquid crystal display element according to claim 5, wherein in addition to the steps of claim 16, the method further supports an already formed auxiliary support member on an already formed sealing plate. A step of forming a new auxiliary support member at a position where the new auxiliary support member is to be attached, and a step of bringing a new sealing plate into close contact with the new auxiliary support member. Enclosing a new mixed solution containing a liquid crystal and a photosensitive polymer precursor, and exposing the new mixed solution from the substrate side through the opening of the reflective film and the already formed support member. Then, the polymer precursor in the new mixed liquid is deposited and cured at a position corresponding to the opening of the reflective film to form a new support member, and a new liquid crystal is formed by the liquid crystal in the remaining mixed liquid. The steps for forming the layers By performing one Kutomo, a method of manufacturing a liquid crystal display element characterized by forming a plurality of liquid crystal layers. 19. A method for manufacturing a liquid crystal display element according to claim 18, wherein said support members for supporting said sealing plates are formed of photosensitive resins having different photosensitive wavelength characteristics from each other. A method for manufacturing a liquid crystal display element, comprising exposing and curing members with light having different wavelengths. 20. The method of manufacturing a liquid crystal display device according to claim 1, wherein a step of forming a reflective film having the opening on the substrate; and a step of forming the reflective film on the substrate. A step of forming a photosensitive resin layer thereon, and a second masking member from the side of the substrate, the first masking member being used to expose a part of the first opening of the reflection film so as to expose another second opening. Cover the opening of the photosensitive resin layer,
Exposing from the substrate side through the first opening of the reflection film and curing, and removing, by development, a portion of the photosensitive resin layer that has not been exposed due to the shielding of the reflection film and the masking member. A step of forming a part of the first support member of the support member; a step of bringing the sealing plate into close contact with the first support member; and a step between the substrate and the sealing plate. Enclosing a mixed solution containing a liquid crystal and a photosensitive polymer precursor, and covering the first opening of the reflective film with a second masking member from the substrate side, Exposure is performed from the substrate side through the second opening of the reflection film, and the polymer precursor in the mixed solution is deposited and cured at a position corresponding to the second opening of the reflection film, and the support member is exposed to light. To form another second support member of And a step of forming the liquid crystal layer using liquid crystal in the remaining liquid mixture. 21. A method for manufacturing a liquid crystal display element according to claim 5, further comprising: forming a new photosensitive resin layer on the sealing plate in addition to the steps of claim 20; From the substrate side, by the first masking member,
Covering the second opening of the reflection film, exposing the new photosensitive resin layer from the substrate side through the first opening of the reflection film and the first support member already formed, Curing, and removing a portion of the new photosensitive resin layer that has not been exposed due to the shielding of the reflective film and the masking member by development to form a new first support member; A step of bringing a new sealing plate into close contact with the first supporting member, and a new step including liquid crystal and a photosensitive polymer precursor between the already formed sealing plate and the new sealing plate. Enclosing the mixed solution, and from the substrate side by the second masking member.
Covering the first opening of the reflection film, exposing the new mixed solution from the substrate side through the second opening of the reflection film and the second support member already formed, The polymer precursor in the mixed liquid is deposited and cured at a position corresponding to the second opening of the reflection film to form a new second support member, and the liquid crystal in the remaining mixed liquid is used to form a new second supporting member. Forming a plurality of liquid crystal layers by performing at least once each of the steps of forming a liquid crystal layer. 22. The method of manufacturing a liquid crystal display device according to claim 21, wherein the first support member and the second support member supporting each of the sealing plates each have a first support member supporting another sealing plate. The first support member and the second support member are formed of a photosensitive resin having different photosensitive wavelength characteristics from each other, and the first support member and the second support member supporting the respective sealing plates are each replaced with another support member. A method for manufacturing a liquid crystal display element, comprising exposing and curing a first support member and a second support member supporting a sealing plate with light having different wavelengths from each other. 23. A liquid crystal display device comprising a substrate made of a transparent material, a sealing plate provided to face the substrate, and a liquid crystal layer provided between the substrate and the sealing plate. A light-shielding film is formed in a predetermined region of the substrate, and the light-shielding film of the photosensitive resin is formed between the substrate and the sealing plate at a position where the light-shielding film is formed. A liquid crystal display device, comprising: a support member for supporting the sealing plate, formed by exposing a missing portion to light. 24. The liquid crystal display device according to claim 23, wherein said photosensitive resin is a positive resist. 25. A liquid crystal display device according to claim 23, wherein said light shielding film is formed of a black resist. 26. The liquid crystal display device according to claim 23, wherein said liquid crystal layer contains a polymer and liquid crystal dispersed and held in said polymer. 27. The liquid crystal display element according to claim 23, wherein a plurality of sets of the liquid crystal layer and the sealing plate are provided, and a position between the sealing plates where the light shielding film is formed is provided. A liquid crystal display device comprising a support member for supporting each sealing plate, which is formed by exposing a photosensitive resin through a region where the light-shielding film is not formed. 28. A method of manufacturing a liquid crystal display element according to claim 23, wherein a step of forming a light-shielding film in a predetermined area on the substrate; A step of forming a photosensitive resin layer, a step of exposing the photosensitive resin layer in a portion where the light-shielding film is not formed, from the substrate side, and developing the exposed portion of the photosensitive resin layer by development. Removing and forming the support member at the position where the light-shielding film is formed; bringing the sealing plate into close contact with the support member; sealing liquid crystal between the substrate and the sealing plate Forming a liquid crystal layer as described above. 29. The method for manufacturing a liquid crystal display device according to claim 28, wherein said photosensitive resin layer is formed from a positive resist. 30. The method for manufacturing a liquid crystal display device according to claim 28, wherein the step of forming the liquid crystal layer comprises the step of forming a liquid crystal and a photosensitive polymer precursor between the substrate and the sealing plate. A step of enclosing the mixed solution containing, exposing the mixed solution from the sealing plate side, and curing the polymer precursor in the mixed solution,
Forming the liquid crystal layer including the liquid crystal dispersed and held in the polymer, and fixing the sealing plate to the substrate. 31. A method of manufacturing a liquid crystal display element according to claim 27, further comprising the steps of: forming a new photosensitive resin layer on the sealing plate, in addition to the steps of claim 28; Exposing the new photosensitive resin layer in a portion where the light-shielding film is not formed, from the substrate side, and removing the exposed portion in the new photosensitive resin layer by development, and A step of forming a new support member at the position where the film is formed; a step of bringing a new sealing plate into close contact with the new support member; a step of forming the new sealing plate and a step of forming the new sealing plate And forming a new liquid crystal layer by enclosing the liquid crystal at least once, thereby forming a plurality of liquid crystal layers.