JP2001332477A - アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法 - Google Patents

アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法

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Publication number
JP2001332477A
JP2001332477A JP2000151517A JP2000151517A JP2001332477A JP 2001332477 A JP2001332477 A JP 2001332477A JP 2000151517 A JP2000151517 A JP 2000151517A JP 2000151517 A JP2000151517 A JP 2000151517A JP 2001332477 A JP2001332477 A JP 2001332477A
Authority
JP
Japan
Prior art keywords
exposure apparatus
vibration
pressure
manufacturing
actuator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000151517A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001332477A5 (enExample
Inventor
Michio Yanagisawa
通雄 柳澤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2000151517A priority Critical patent/JP2001332477A/ja
Publication of JP2001332477A publication Critical patent/JP2001332477A/ja
Publication of JP2001332477A5 publication Critical patent/JP2001332477A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Vibration Prevention Devices (AREA)
  • Fluid-Damping Devices (AREA)
JP2000151517A 2000-05-23 2000-05-23 アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法 Withdrawn JP2001332477A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000151517A JP2001332477A (ja) 2000-05-23 2000-05-23 アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000151517A JP2001332477A (ja) 2000-05-23 2000-05-23 アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法

Publications (2)

Publication Number Publication Date
JP2001332477A true JP2001332477A (ja) 2001-11-30
JP2001332477A5 JP2001332477A5 (enExample) 2007-07-12

Family

ID=18657068

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000151517A Withdrawn JP2001332477A (ja) 2000-05-23 2000-05-23 アクティブ除振装置、露光装置、半導体デバイス製造方法、半導体製造工場、および露光装置の保守方法

Country Status (1)

Country Link
JP (1) JP2001332477A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816232B2 (en) 2002-08-06 2004-11-09 Nikon Corporation Support device and manufacturing method thereof, stage device, and exposure apparatus
JP2008002681A (ja) * 2006-06-23 2008-01-10 Integrated Dynamics Engineering Gmbh センサ／アクチュエータ整合が改善された能動振動絶縁システム
EP2728219A1 (de) * 2012-11-06 2014-05-07 Integrated Dynamics Engineering GmbH Verfahren zur Postionierung eines aktiv schwingungsisoliert gelagerten Bauteils sowie Schwingungsisolationssystem
WO2019206517A1 (en) * 2018-04-25 2019-10-31 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device
CN118516906A (zh) * 2024-07-23 2024-08-20 华南理工大学 一种用于柔性桥梁结构横竖双向减振的非线性能量阱减振装置及其应用

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6816232B2 (en) 2002-08-06 2004-11-09 Nikon Corporation Support device and manufacturing method thereof, stage device, and exposure apparatus
JP2008002681A (ja) * 2006-06-23 2008-01-10 Integrated Dynamics Engineering Gmbh センサ／アクチュエータ整合が改善された能動振動絶縁システム
EP2728219A1 (de) * 2012-11-06 2014-05-07 Integrated Dynamics Engineering GmbH Verfahren zur Postionierung eines aktiv schwingungsisoliert gelagerten Bauteils sowie Schwingungsisolationssystem
WO2019206517A1 (en) * 2018-04-25 2019-10-31 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device
US11169450B2 (en) 2018-04-25 2021-11-09 Asml Netherlands B.V. Pneumatic support device and lithographic apparatus with pneumatic support device
CN118516906A (zh) * 2024-07-23 2024-08-20 华南理工大学 一种用于柔性桥梁结构横竖双向减振的非线性能量阱减振装置及其应用

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