JP2001308678A - 共振器用の多重周波数音響反射器アレイ及びモノリシック・カバー、及び方法 - Google Patents

共振器用の多重周波数音響反射器アレイ及びモノリシック・カバー、及び方法

Info

Publication number
JP2001308678A
JP2001308678A JP2001047398A JP2001047398A JP2001308678A JP 2001308678 A JP2001308678 A JP 2001308678A JP 2001047398 A JP2001047398 A JP 2001047398A JP 2001047398 A JP2001047398 A JP 2001047398A JP 2001308678 A JP2001308678 A JP 2001308678A
Authority
JP
Japan
Prior art keywords
frequency
acoustic
resonator
reflector array
acoustic reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2001047398A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001308678A5 (https=
Inventor
Carl M Panasik
エム、パナシック カール
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Texas Instruments Inc
Original Assignee
Texas Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Texas Instruments Inc filed Critical Texas Instruments Inc
Publication of JP2001308678A publication Critical patent/JP2001308678A/ja
Publication of JP2001308678A5 publication Critical patent/JP2001308678A5/ja
Abandoned legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/46—Filters
    • H03H9/54—Filters comprising resonators of piezoelectric or electrostrictive material
    • H03H9/58—Multiple crystal filters
    • H03H9/582—Multiple crystal filters implemented with thin-film techniques
    • H03H9/586—Means for mounting to a substrate, i.e. means constituting the material interface confining the waves to a volume
    • H03H9/589—Acoustic mirrors
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/02—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks
    • H03H3/04—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of piezoelectric or electrostrictive resonators or networks for obtaining desired frequency or temperature coefficient
    • H03H2003/0414—Resonance frequency
    • H03H2003/0471—Resonance frequency of a plurality of resonators at different frequencies
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/42—Piezoelectric device making

Landscapes

  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
JP2001047398A 2000-01-18 2001-01-18 共振器用の多重周波数音響反射器アレイ及びモノリシック・カバー、及び方法 Abandoned JP2001308678A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US484803 2000-01-18
US09/484,803 US6441703B1 (en) 2000-01-18 2000-01-18 Multiple frequency acoustic reflector array and monolithic cover for resonators and method

Publications (2)

Publication Number Publication Date
JP2001308678A true JP2001308678A (ja) 2001-11-02
JP2001308678A5 JP2001308678A5 (https=) 2008-03-06

Family

ID=23925666

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001047398A Abandoned JP2001308678A (ja) 2000-01-18 2001-01-18 共振器用の多重周波数音響反射器アレイ及びモノリシック・カバー、及び方法

Country Status (4)

Country Link
US (1) US6441703B1 (https=)
EP (1) EP1120910B1 (https=)
JP (1) JP2001308678A (https=)
DE (1) DE60137985D1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
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JP2008085562A (ja) * 2006-09-27 2008-04-10 Renesas Technology Corp 弾性波フィルタおよびその製造方法
JP2009521141A (ja) * 2005-12-21 2009-05-28 エプコス アクチエンゲゼルシャフト バルク超音波により動作する共振器
JP2024509313A (ja) * 2021-03-15 2024-02-29 偲百創（深▲せん▼）科技有限公司 厚さ方向にせん断モードを励起する音響共振器

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DE10124349A1 (de) * 2001-05-18 2002-12-05 Infineon Technologies Ag Piezoelektrische Resonatorvorrichtung mit Verstimmungsschichtfolge
US6657517B2 (en) * 2001-12-20 2003-12-02 Agere Systems, Inc. Multi-frequency thin film resonators
DE10163462A1 (de) * 2001-12-21 2003-07-03 Epcos Ag Symmetrisch arbeitendes Reaktanzfilter
DE10239317A1 (de) * 2002-08-27 2004-03-11 Epcos Ag Resonator und Bauelement mit hermetischer Verkapselung
DE10258422A1 (de) * 2002-12-13 2004-06-24 Epcos Ag Mit akustischen Volumenwellen arbeitendes Bauelement mit gekoppelten Resonatoren
DE10301261B4 (de) * 2003-01-15 2018-03-22 Snaptrack, Inc. Mit akustischen Volumenwellen arbeitendes Bauelement und Verfahren zur Herstellung
JP4937495B2 (ja) * 2003-12-25 2012-05-23 新光電気工業株式会社 キャパシタ装置、電子部品実装構造及びキャパシタ装置の製造方法
US6995622B2 (en) * 2004-01-09 2006-02-07 Robert Bosh Gmbh Frequency and/or phase compensated microelectromechanical oscillator
EP1575165B1 (en) * 2004-03-09 2008-05-07 Infineon Technologies AG Bulk acoustic wave filter and method for eliminating unwanted side passands
FR2889374A1 (fr) * 2005-07-29 2007-02-02 Michelin Soc Tech Structure resonnante hybride pour verifier des parametres d'un pneumatique
US7684109B2 (en) * 2007-02-28 2010-03-23 Maxim Integrated Products, Inc. Bragg mirror optimized for shear waves
JP5136134B2 (ja) * 2008-03-18 2013-02-06 ソニー株式会社 バンドパスフィルタ装置、その製造方法、テレビジョンチューナおよびテレビジョン受信機
WO2010004534A1 (en) * 2008-07-11 2010-01-14 Nxp B.V. Bulk acoustic wave resonator using acoustic reflector layers as inductive or capacitive circuit element
FR2947398B1 (fr) * 2009-06-30 2013-07-05 Commissariat Energie Atomique Dispositif resonant a ondes acoustiques guidees et procede de realisation du dispositif
US8830012B2 (en) * 2010-09-07 2014-09-09 Wei Pang Composite bulk acoustic wave resonator
EP2630479B1 (en) 2010-10-20 2020-04-08 Qorvo US, Inc. Apparatus and method for measuring binding kinetics and concentration with a resonating sensor
CN104854793B (zh) * 2012-12-21 2018-08-21 快速追踪有限公司 Baw部件、baw部件的叠层和用于制造baw部件的方法，所述baw部件包括两个不同的堆叠压电材料
US10234425B2 (en) 2013-03-15 2019-03-19 Qorvo Us, Inc. Thin film bulk acoustic resonator with signal enhancement
CN110694700A (zh) 2013-05-23 2020-01-17 Qorvo美国公司 两部分总成
PL3000133T3 (pl) 2013-05-23 2021-09-20 Qorvo Us, Inc. Czujnik piezoelektryczny
KR102029503B1 (ko) * 2014-12-08 2019-11-08 삼성전기주식회사 체적 음향 공진기 및 필터
KR102588800B1 (ko) * 2016-02-22 2023-10-13 삼성전기주식회사 음향파 필터 장치 및 이의 제조방법
US10038422B2 (en) * 2016-08-25 2018-07-31 Qualcomm Incorporated Single-chip multi-frequency film bulk acoustic-wave resonators
US10601398B2 (en) * 2018-04-13 2020-03-24 Qorvo Us, Inc. BAW structure having multiple BAW transducers over a common reflector, which has reflector layers of varying thicknesses
US11211918B2 (en) * 2018-06-01 2021-12-28 Akoustis, Inc. Effective coupling coefficients for strained single crystal epitaxial film bulk acoustic resonators
US10727811B2 (en) * 2018-06-01 2020-07-28 Akoustis, Inc. Effective coupling coefficients for strained single crystal epitaxial film bulk acoustic resonators
JP2021528664A (ja) 2018-07-06 2021-10-21 コーボ ユーエス，インコーポレイティド ダイナミックレンジが拡大されたバルク音響波共振器
DE102018132890B4 (de) * 2018-12-19 2020-08-06 RF360 Europe GmbH Mikroakustische Vorrichtung und Herstellungsverfahren
US12143094B2 (en) * 2019-07-10 2024-11-12 Epicmems(Xiamen) Co., Ltd. Bulk acoustic wave filter and method of manufacturing bulk acoustic wave filter
CN116671013B (zh) * 2020-12-31 2025-10-28 华为技术有限公司 滤波器以及滤波器的制备方法
CN114285389A (zh) * 2021-03-15 2022-04-05 偲百创(深圳)科技有限公司 声学谐振器的制备方法和声学谐振器
IT202100013004A1 (it) * 2021-05-19 2022-11-19 Spectron Microsystems S R L Dispositivo risonatore
US12316304B2 (en) * 2022-12-21 2025-05-27 Rf360 Singapore Pte. Ltd. Vertically coupled SAW resonators
CN118868846B (zh) * 2024-09-24 2025-01-17 武汉大学 啁啾型衬底、谐振器、滤波器及制备方法

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Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009521141A (ja) * 2005-12-21 2009-05-28 エプコス アクチエンゲゼルシャフト バルク超音波により動作する共振器
JP2008085562A (ja) * 2006-09-27 2008-04-10 Renesas Technology Corp 弾性波フィルタおよびその製造方法
JP2024509313A (ja) * 2021-03-15 2024-02-29 偲百創（深▲せん▼）科技有限公司 厚さ方向にせん断モードを励起する音響共振器

Also Published As

Publication number Publication date
EP1120910B1 (en) 2009-03-18
EP1120910A3 (en) 2002-01-30
EP1120910A2 (en) 2001-08-01
US6441703B1 (en) 2002-08-27
DE60137985D1 (de) 2009-04-30

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