JP2001308521A - Method for manufacturing multilayered circuit board - Google Patents

Method for manufacturing multilayered circuit board

Info

Publication number
JP2001308521A
JP2001308521A JP2000125735A JP2000125735A JP2001308521A JP 2001308521 A JP2001308521 A JP 2001308521A JP 2000125735 A JP2000125735 A JP 2000125735A JP 2000125735 A JP2000125735 A JP 2000125735A JP 2001308521 A JP2001308521 A JP 2001308521A
Authority
JP
Japan
Prior art keywords
circuit pattern
adhesive layer
circuit board
base material
metal foil
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000125735A
Other languages
Japanese (ja)
Inventor
Susumu Matsuoka
進 松岡
Toshio Sugawa
俊夫 須川
Sadashi Nakamura
禎志 中村
Hideki Higashiya
秀樹 東谷
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2000125735A priority Critical patent/JP2001308521A/en
Publication of JP2001308521A publication Critical patent/JP2001308521A/en
Pending legal-status Critical Current

Links

Landscapes

  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)
  • Manufacturing Of Printed Wiring (AREA)

Abstract

PROBLEM TO BE SOLVED: To provide a method for manufacturing a multilayered circuit board which is excellent in lamination accuracy and productivity. SOLUTION: A releasing film 309 on one surface of an insulative composite body 310 comprised of an insulative base material 306, an adhesive agent 308, and a releasing film 309 is peeled off, and it is is overlapped with a circuit pattern 307a so that it may be brought into contact with it. Then they are pressurized and heated, and are temporarily fixed and laminated for fixation. After a position corresponding to the circuit pattern is recognized, a non-through hole 303 is made, and it is filled with a conductive paste 302. Then, the releasing film 309 is peeled off, a metallic foil 304 provided with an opening 311 is positioned and overlapped, and it is temporarily fixed and laminated for fixation. Furthermore, an alignment mark 307b of a supporting base material 320 and an exposure mask are positioned, and a pattern is formed. After the steps are repeated, the board is pressurized and heated at a temperature for curing the adhesive agent 308 when a metallic foil is laminated as an outermost layer, so that a circuit pattern 337 is formed. Finally, the supporting base material is selectively removed to leave a circuit pattern, thereby obtaining a multilayered circuit board.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、インナービアホー
ル接続により複数層の回路パターンが電気的に接続され
た多層回路基板の製造方法に関するものである。
The present invention relates to a method for manufacturing a multilayer circuit board in which a plurality of circuit patterns are electrically connected by inner via hole connection.

【0002】[0002]

【従来の技術】近年、電子機器の小型化、高密度化に伴
い、産業用にとどまらず民生用の分野においてもLSI
等の半導体チップを高密度に実装できる多層回路基板が
安価で供給されることが強く要望されている。このよう
な多層回路基板では、実装密度の向上による小型化の目
的を果たすために、より微細な配線ピッチを容易かつ高
歩留まりに生産できることが重要である。このような市
場の要望に対して、旧来の多層回路基板の層間接続の主
流になっていたスルーホール内蔵の金属メッキ導体に変
えて、多層回路基板の任意の電極を任意の配線パターン
位置において層間接続できるインナービアホール(IV
H)接続法を採用した多層回路基板、すなわち全層IV
H構造樹脂多層回路基板と呼ばれているものが知られて
いる(例えば、特開平6−268345号公報参照)。
2. Description of the Related Art In recent years, with the miniaturization and high density of electronic devices, LSIs have been used not only in industrial applications but also in consumer applications.
It is strongly desired that a multilayer circuit board on which semiconductor chips such as those described above can be mounted at high density be supplied at low cost. In such a multilayer circuit board, it is important that a finer wiring pitch can be easily produced at a high yield in order to achieve the purpose of miniaturization by increasing the mounting density. In response to such market demands, instead of using metal-plated conductors with built-in through-holes, which have become the mainstream of interlayer connections in conventional multilayer circuit boards, any electrode of the multilayer circuit board can be placed at any wiring pattern position. Connectable inner via hole (IV
H) A multilayer circuit board employing a connection method, that is, all layers IV
An H-structure resin multilayer circuit board is known (see, for example, Japanese Patent Application Laid-Open No. 6-268345).

【0003】この全層IVH構造樹脂多層回路基板は多
層回路基板のビアホール内に導電ペーストを充填するこ
とにより、必要な層間のみを接続することが可能であ
り、部品ランド直下にインナービアホールを設けること
ができるために、基板サイズの小型化や高密度実装を実
現することができる。
In this all-layer IVH structure resin multilayer circuit board, only necessary layers can be connected by filling a conductive paste in a via hole of the multilayer circuit board, and an inner via hole is provided directly below a component land. Therefore, a reduction in the size of the substrate and high-density mounting can be realized.

【0004】ここでは4層基板の製造方法について説明
する。まず多層基板のベースとなる両面回路基板の製造
方法を説明する。図2(a)〜(g)は両面回路基板の
工程断面図である。
Here, a method for manufacturing a four-layer substrate will be described. First, a method for manufacturing a double-sided circuit board serving as a base of a multilayer board will be described. 2A to 2G are process cross-sectional views of a double-sided circuit board.

【0005】まず、図2(a)に示すように、芳香性ポ
リアミド繊維に熱硬化性エポキシ樹脂を含浸させた厚さ
(t1=約150μm)絶縁性基材101の両面に厚さ
約20μmポリエチレンテレフタレート(PET)等の
離型フィルム105をラミネートする。次に、図2
(b)に示すように離型フイルム105、絶縁性基材1
01の全てを貫通する貫通孔103を形成する。次に、
図(c)に示すように貫通孔103に導電ペースト10
2を充填する。充填する方法としては、貫通孔103を
有する絶縁性基材101をスクリーン印刷機(図示せ
ず)のテーブル上に設置し、直接導電ペースト102が
離型フイルム105の上から印刷される。このとき、上
面の離型フィルム105は印刷マスクの役割と絶縁性基
材101の汚染防止の役割を果たしている。
First, as shown in FIG. 2 (a), a thickness (t1 = about 150 μm) obtained by impregnating an aromatic polyamide fiber with a thermosetting epoxy resin is approximately 20 μm thick on both sides of an insulating substrate 101. A release film 105 such as terephthalate (PET) is laminated. Next, FIG.
Release film 105 and insulating substrate 1 as shown in FIG.
01 are formed. next,
As shown in FIG.
Fill 2 As a filling method, the insulating base material 101 having the through-holes 103 is placed on a table of a screen printing machine (not shown), and the conductive paste 102 is directly printed on the release film 105. At this time, the release film 105 on the upper surface plays a role of a printing mask and a role of preventing contamination of the insulating base material 101.

【0006】次に、図2(d)に示すように絶縁性基材
101の両面から離型フィルム105を剥離して絶縁接
合体106が得られる。そして、図2(e)に示すよう
に絶縁接合体106の両面に厚さ18μmのCuなどの
金属箔104を重ねる。この状態で熱プレスで加圧加熱
することにより、図2(f)に示すように絶縁性基材1
01の厚みが圧縮される(t2=約100μm)ととも
に絶縁接合体106と金属箔104が接着され、両面の
金属箔104は所定の位置に設けた貫通孔103に充填
された導電ペースト102により電気的に接続される。
Next, as shown in FIG. 2D, the release film 105 is peeled off from both surfaces of the insulating base material 101 to obtain an insulating joined body 106. Then, as shown in FIG. 2E, an 18 μm-thick metal foil 104 made of Cu or the like is overlaid on both surfaces of the insulating joint body 106. Pressing and heating with a hot press in this state causes the insulating base material 1 to be heated as shown in FIG.
01 is compressed (t2 = approximately 100 μm), the insulating joint 106 and the metal foil 104 are bonded together, and the metal foils 104 on both surfaces are electrically conductive by the conductive paste 102 filled in the through holes 103 provided at predetermined positions. Connected.

【0007】そして、図2(g)両面の金属箔104を
選択的にエッチングして回路パターン107a、107
bが形成されて、両面回路基板110が得られる。
2 (g), the metal foils 104 on both sides are selectively etched to form circuit patterns 107a and 107.
As a result, the double-sided circuit board 110 is obtained.

【0008】図3(a)〜(e)は従来の多層回路基板
の製造方法示す工程断面図であり、4層基板を例として
示している。まず、図3(a)に示すように、図2
(a)〜(g)によって製造された回路パターン107
a、107bを有する両面回路基板110と、貫通孔に
導電ペースト202を充填した絶縁接合体206a、2
06b(この絶縁接合体206a、206bは、図2の
(a)〜(d)の工程により製造される)を準備する。
FIGS. 3A to 3E are cross-sectional views showing steps of a conventional method for manufacturing a multilayer circuit board, and show a four-layer board as an example. First, as shown in FIG.
Circuit patterns 107 manufactured according to (a) to (g)
a, a double-sided circuit board 110 having an insulating joint body 206 a having a through-hole filled with a conductive paste 202.
06b (the insulating joints 206a and 206b are manufactured by the steps (a) to (d) of FIG. 2).

【0009】作業ステージ209に、両面回路基板11
0、絶縁接合体206aの順で、位置決め孔211を画
像認識などによって位置決めして重ね、所定の位置の上
下に設けた先端が10mm×6mmの300〜350℃
に加熱したヒータチップ208で約5kg/cm2 の圧
力を3秒間加えて絶縁接合体206aの樹脂成分を硬化
させて両面回路基板110と接着をする。
The work stage 209 has a double-sided circuit board 11
0, and the positioning holes 211 are positioned and overlapped by image recognition or the like in the order of the insulating joint body 206a, and the tip provided above and below a predetermined position has a 10 mm × 6 mm tip at 300 to 350 ° C.
A pressure of about 5 kg / cm 2 is applied for 3 seconds by the heater chip 208 heated to a temperature of 3 mm to cure the resin component of the insulating joint body 206 a and adhere to the double-sided circuit board 110.

【0010】次に、図3(b)に示すように、絶縁接合
体206aを接着して固定した両面回路基板110を作
業ステージ209から取り出し、両面回路基板110を
上側にして作業ステージ209に設置し、位置決め認識
孔211を画像認識などによって絶縁接合体206bを
位置決めして重ねた後、ヒータチップ208で加圧加熱
して絶縁接合体206bの樹脂成分を硬化させて両面回
路基板110と接着する。
Next, as shown in FIG. 3 (b), the double-sided circuit board 110 to which the insulating joint body 206a is bonded and fixed is taken out of the work stage 209, and is set on the work stage 209 with the double-sided circuit board 110 facing upward. Then, after positioning and recognizing the insulating joint body 206b by image recognition or the like and positioning the insulating joint body 206b, the heater component 208 presses and heats to cure the resin component of the insulating joint body 206b and adhere to the double-sided circuit board 110. .

【0011】次に、図3(c)示すように、両面に絶縁
接合体206a、206bを接着して固定した両面回路
基板110を作業ステージ209から取り出し、両面に
金属箔204を重ねる。図3(d)に示すように、両面
に金属箔204を重ねた後、全面を熱プレスにより圧力
50kg/cm2、温度200℃で1時間の加圧加熱す
ることにより、絶縁接合体206a、206bの厚みが
圧縮されるとともに、絶縁接合体206a、206bで
両面回路基板110と金属箔204と接着し、回路パタ
ーン107a、107bは導電ペースト202により金
属箔204とインナビアホール接続される。
Next, as shown in FIG. 3 (c), the double-sided circuit board 110 to which the insulating joints 206a and 206b are adhered and fixed on both sides is taken out from the work stage 209, and the metal foil 204 is overlaid on both sides. As shown in FIG. 3 (d), after the metal foil 204 is overlaid on both sides, the entire surface is pressurized and heated at a pressure of 50 kg / cm 2 at a temperature of 200 ° C. for 1 hour by a hot press, so that the insulating bonded body 206a While the thickness of 206b is compressed, the double-sided circuit board 110 and the metal foil 204 are bonded by the insulating joints 206a and 206b, and the circuit patterns 107a and 107b are connected to the metal foil 204 and the inner via hole by the conductive paste 202.

【0012】そして、図3(e)に示すように、両面の
金属箔204を選択的にエッチングして回路パターン2
07a、207bを形成することで4層基板が得られ
る。4層以上の多層回路基板を得ようとするなら、上記
製造方法で製造した多層回路基板を両面回路基板に代わ
りに用い、上述と同じ工程を繰り返す。
Then, as shown in FIG. 3E, the metal foils 204 on both sides are selectively etched to form a circuit pattern 2.
By forming the layers 07a and 207b, a four-layer substrate can be obtained. If a multilayer circuit board having four or more layers is to be obtained, the same steps as described above are repeated using the multilayer circuit board manufactured by the above manufacturing method instead of the double-sided circuit board.

【0013】[0013]

【発明が解決しようとする課題】しかしながら上記の従
来の多層回路基板の製造方法では、今後さらなるパター
ン高密度化、ビアの小径化、多層化の要求に対して、絶
縁性基材と金属箔の接着を熱プレス機により加圧加熱す
ることで、絶縁性基材に含浸させたエポキシ樹脂及び導
電ペースト中のエポキシ樹脂を硬化させ、銅箔との電気
的接続を行うという工程を繰り返し製造しており、プレ
ス工程は昇温、硬化温度キープ、冷却等のプレスサイク
ルに2〜3時間かかり、多層化すればするほどリードタ
イムが長くなるという問題や、フォトリソ法によるパタ
ーン形成において熱硬化した基板の構成材料の熱膨張係
数の相違から生じる寸法ずれにより電気的接続が不安定
になり、信頼性を低下させるという問題を有していた。
However, in the above-mentioned conventional method for manufacturing a multilayer circuit board, in order to meet the demands for further increasing the pattern density, reducing the diameter of vias, and increasing the number of layers, the use of an insulating base material and a metal foil will increase. By repeating the process of curing the epoxy resin impregnated in the insulating base material and the epoxy resin in the conductive paste by applying pressure and heating to the adhesive with a hot press, and making an electrical connection with the copper foil. The pressing process takes 2 to 3 hours for a press cycle such as heating, curing temperature keeping, cooling, etc., and the longer the number of layers, the longer the lead time. There has been a problem that the electrical connection becomes unstable due to a dimensional deviation caused by a difference in the thermal expansion coefficients of the constituent materials, and reliability is reduced.

【0014】本発明は上記従来の課題を解決するための
もので、積層精度が高く、生産性に優れた多層化回路基
板を実現を可能とする多層回路基板の製造方法を提供す
るものである。
The present invention has been made to solve the above-mentioned conventional problems, and provides a method of manufacturing a multilayer circuit board which can realize a multilayer circuit board having high lamination accuracy and excellent productivity. .

【0015】[0015]

【課題を解決するための手段】上記目的を達成するため
に本発明の多層回路基板の製造方法としては、以下の工
程からなる方法により実現できる。
In order to achieve the above object, a method for manufacturing a multilayer circuit board according to the present invention can be realized by a method comprising the following steps.

【0016】a.支持基材の表面に導電体からなる所望
の回路パターンとアライメントマークを形成する工程。
A. A step of forming a desired circuit pattern and an alignment mark made of a conductor on the surface of the supporting substrate;

【0017】b.絶縁性基材の両面に接着剤層が形成さ
れ、さらに前記接着剤層に離型フィルムがラミネートし
てある絶縁性基材合成体の片面の離型フィルムを剥離し
て前記接着剤層と前記支持基材の回路パターンに当接す
るように重ね、前記接着剤層の硬化温度より低温で加圧
加熱し仮止め積層固定する工程。
B. An adhesive layer is formed on both sides of the insulating base material, and the release layer on one side of the insulating base composite body further having a release film laminated on the adhesive layer is peeled off to form the adhesive layer and the adhesive layer. A step of superimposing the circuit pattern on the supporting base material so as to be in contact with the circuit pattern, and applying pressure and heating at a temperature lower than the curing temperature of the adhesive layer to temporarily fix and fix the adhesive layer.

【0018】c.電気的接続を行う箇所に前記離型フィ
ルムを備えた絶縁性基材に回路パターンを認識して所定
の位置にレーザを照射して前記回路パターン表面に到達
する非貫通孔をあける工程。
C. A step of recognizing a circuit pattern on an insulating base material provided with the release film at a place where an electrical connection is to be made, and irradiating a predetermined position with a laser to form a non-through hole reaching the surface of the circuit pattern;

【0019】d.前記非貫通孔に導電性ペーストを充填
する工程。
D. Filling a conductive paste into the non-through holes.

【0020】e.前記離型フィルム剥離後、金属箔を前
記支持基材に位置決めして重ね、前記接着剤層の硬化温
度より低温で加圧加熱し仮止め積層固定する工程。
E. A step of positioning a metal foil on the support substrate after the release film is peeled off, and applying pressure and heating at a temperature lower than the curing temperature of the adhesive layer to temporarily fix and fix the laminate.

【0021】f.露光用マスクと前記支持基材に形成し
たアライメントマークを位置決めし、前記金属箔を所望
の回路パターンと次層アライメントマークを形成する工
程。
F. A step of positioning an exposure mask and an alignment mark formed on the supporting base material, and forming a desired circuit pattern and a next layer alignment mark on the metal foil.

【0022】g.工程b〜工程fを繰り返した後、必要
積層数の最表層の回路パターンを形成する際に金属箔積
層後、前記接着剤層の硬化温度で加圧加熱してから回路
パターン形成を行う工程。h.支持基材の回路パターン
を残して前記支持基材を選択除去する工程。
G. A step of forming a circuit pattern by pressurizing and heating at a curing temperature of the adhesive layer after laminating a metal foil when forming a circuit pattern of a required number of outermost layers after repeating steps b to f. h. A step of selectively removing the support substrate while leaving a circuit pattern of the support substrate.

【0023】上記のように絶縁性基材の接着剤層の硬化
温度より低温で加圧加熱により仮止め積層固定を順次繰
り返し、必要積層数の最外層形成時に接着剤層の硬化温
度で熱プレスすることで電気的、機械的に接合した多層
回路基板が実現できる。
As described above, the temporary fixing lamination and fixing are sequentially repeated by pressurizing and heating at a temperature lower than the curing temperature of the adhesive layer of the insulating base material, and the hot pressing is performed at the curing temperature of the adhesive layer when forming the required number of outermost layers. By doing so, a multilayer circuit board electrically and mechanically joined can be realized.

【0024】また、絶縁性フィルムおよび金属箔の加圧
加熱による仮止め積層固定する手段にラミネート、真空
熱プレスおよびオートクレーブからなる群から選択され
た少なくともひとつの手段であることが好ましい。
It is preferable that the means for temporarily fixing and laminating the insulating film and the metal foil by pressurizing and heating is at least one means selected from the group consisting of laminating, vacuum hot pressing and autoclave.

【0025】また、絶縁性基材がポリイミドフィルム、
液晶ポリマーフィルム、アラミドフィルムからなる群か
ら選択された少なくともひとつの材料であることが好ま
しい。フィルム材料に高耐熱、高剛性のものを選ぶこと
により、半導体実装に適した性質を持たせることができ
る。
Further, the insulating base material is a polyimide film,
It is preferably at least one material selected from the group consisting of a liquid crystal polymer film and an aramid film. By selecting a film material having high heat resistance and high rigidity, properties suitable for semiconductor mounting can be provided.

【0026】また、フィルムは均一な組成を有した薄い
ものが作成できるので微細径のビアホールを形成するこ
とができる。
Further, since a thin film having a uniform composition can be formed, a via hole having a fine diameter can be formed.

【0027】また、絶縁性基材の接着剤層が半硬化状態
の有機樹脂であることが好ましい。これによりパターン
が接着剤層に埋め込みまれ、アンカー効果により強固な
仮固定を維持することができる。
Preferably, the adhesive layer of the insulating substrate is a semi-cured organic resin. As a result, the pattern is embedded in the adhesive layer, and strong temporary fixing can be maintained by the anchor effect.

【0028】また、導電ペーストの導電物質がCu、A
gおよびこれらの合金からなる群から選択された少なく
ともひとつの金属粉末を含むことが好ましい。接続抵抗
の極めて良好な層間接続が得られるからである。
The conductive material of the conductive paste is Cu, A
g and at least one metal powder selected from the group consisting of these alloys. This is because an interlayer connection with extremely good connection resistance can be obtained.

【0029】また、加圧する前の絶縁性基材に形成され
た接着剤層の厚さが、前記接着剤層に埋設される回路パ
ターンの厚さとほぼ等しいか薄いと、ほぼ絶縁性基材ま
で回路パターンを埋め込むことができ、圧縮時の接着剤
層が横方向に広がることによる導電ペーストの圧縮力の
低下を最小にすることができる。
Further, if the thickness of the adhesive layer formed on the insulating base material before pressing is substantially equal to or smaller than the thickness of the circuit pattern embedded in the adhesive layer, the insulating base material may be substantially removed. The circuit pattern can be embedded, and the reduction in the compressive force of the conductive paste due to the lateral spread of the adhesive layer during compression can be minimized.

【0030】また、下層に設けたアライメントマークが
見えるように上層に設けた金属箔が開口部を有すること
が好ましい。開口部内の既に形成されているアライメン
トマークと露光マスクの位置および形状認識を簡易に行
うことができる。
Preferably, the metal foil provided on the upper layer has an opening so that the alignment mark provided on the lower layer can be seen. Recognition of the position and shape of the alignment mark and the exposure mask already formed in the opening can be easily performed.

【0031】[0031]

【発明の実施の形態】以下、本発明の一実施形態につい
て図面を参照して説明する。
DESCRIPTION OF THE PREFERRED EMBODIMENTS One embodiment of the present invention will be described below with reference to the drawings.

【0032】図1(a)〜(h)は本発明の一実施形態
を示す工程断面図であり、4層基板を例として示してい
る。以下に実施形態を、その実施例をもとにして詳細に
説明する。
FIGS. 1A to 1H are process sectional views showing an embodiment of the present invention, and show a four-layer substrate as an example. Hereinafter, embodiments will be described in detail based on examples.

【0033】図1(a)に示すように、片面に回路パタ
ーン307a、アライメントマーク307bが、形成さ
れた支持基材320を用意する。このような材料として
は、例えば古川サーキットフォイル(株)製のアルミキ
ャリア付き銅箔(商品名はUTC銅箔)が市販されてい
る。支持基材320として厚さ40μm程度のアルミニ
ウム箔の片面にジンケート処理を行い、その後、電解メ
ッキにて厚さ5〜20μm程度の銅を析出させ、表面に
粗化処理したものである。
As shown in FIG. 1A, a supporting substrate 320 having a circuit pattern 307a and an alignment mark 307b formed on one side is prepared. As such a material, for example, a copper foil with an aluminum carrier (trade name is UTC copper foil) manufactured by Furukawa Circuit Foil Co., Ltd. is commercially available. A zincate treatment is performed on one surface of an aluminum foil having a thickness of about 40 μm as the support substrate 320, and then a copper having a thickness of about 5 to 20 μm is precipitated by electrolytic plating, and the surface is roughened.

【0034】本実施例では、支持基材320として厚さ
40μmのアルミニウム箔に厚さ9μmの銅メッキした
UTC銅箔を用いて、感光性レジスト塗布、レジストベ
ーク、マスク露光、現像等を行い、過硫酸−過酸化水素
水系溶液により銅の部分を選択エッチングして、回路パ
ターン307a及びアライメントマーク307bを形成
した。
In this embodiment, a photosensitive resist coating, resist baking, mask exposure, development, and the like are performed by using a UTC copper foil having a thickness of 9 μm on an aluminum foil having a thickness of 40 μm as a supporting substrate 320. The copper portion was selectively etched with a persulfuric acid-hydrogen peroxide solution to form a circuit pattern 307a and an alignment mark 307b.

【0035】次に、図1(b)に示すように、絶縁性基
材306の両面に接着剤層308を形成し、さらに接着
剤層308に離型フィルム309がラミネートされた構
成からなる絶縁基材合成体310の片面の離型フィルム
を剥離したものを準備して、接着剤層308と支持基材
320の回路パターン307a及びアライメントマーク
307bに当接するように重ね、ラミネート、真空熱プ
レス、オートクレーブ等により加圧加熱することにより
仮止め積層固定する。
Next, as shown in FIG. 1B, an adhesive layer 308 is formed on both surfaces of the insulating base material 306, and a release film 309 is laminated on the adhesive layer 308. A material obtained by peeling the release film on one side of the base composite body 310 is prepared, and the adhesive layer 308 is overlapped with the circuit pattern 307a and the alignment mark 307b of the support base 320 so as to be in contact with each other. It is temporarily fixed and fixed by heating under pressure in an autoclave or the like.

【0036】離型フィルム309としては、たとえばP
ET(ポリエチレンテレフタレート)フィルムやPEN
(ポリエチレンナフタレート)フィルムを用いることが
できる。但し、波長351nmのYAGレーザで加工す
る場合は、PETフィルムは波長351nmのレーザ光
を吸収しないので、波長351nmのレーザ光を吸収す
る紫外線吸収剤をPETフィルムに混ぜたり、PETフ
ィルムの表面にコーティングすればよい。
As the release film 309, for example, P
ET (polyethylene terephthalate) film and PEN
(Polyethylene naphthalate) films can be used. However, when processing with a YAG laser having a wavelength of 351 nm, the PET film does not absorb the laser light having a wavelength of 351 nm. Therefore, an ultraviolet absorber that absorbs the laser light having a wavelength of 351 nm is mixed with the PET film, or the surface of the PET film is coated. do it.

【0037】接着剤層308としては、例えば熱硬化型
のエポキシ樹脂やポリイミド樹脂を用い、熱硬化型樹脂
は回路パターン及びアライメントマークの埋め込み性を
確保するため半硬化状態にしておくのが好ましい。絶縁
性基材306は特に限定されることなく、例えば、ポリ
イミドフィルム、アラミドフィルム、液晶ポリマーフィ
ルムなどを用いることができる。
As the adhesive layer 308, for example, a thermosetting epoxy resin or a polyimide resin is preferably used, and the thermosetting resin is preferably kept in a semi-cured state in order to secure the embedding property of the circuit pattern and the alignment mark. The insulating substrate 306 is not particularly limited, and for example, a polyimide film, an aramid film, a liquid crystal polymer film, or the like can be used.

【0038】本実施例では絶縁性基材306として12
μm厚のポリイミドフィルムを用いた。接着剤層308
とては塗布後乾燥した半硬化状態の5μm厚の熱硬化タ
イプの変成ポリイミド樹脂を用いた。離型フィルム30
9としては9μm厚のPENフィルムを用いた。仮止め
積層固定として真空ラミネートにより圧力5kg/cm
2、温度70〜80℃、1min、加圧加熱した。
In this embodiment, as the insulating base material 306, 12
A μm thick polyimide film was used. Adhesive layer 308
In particular, a 5 μm-thick thermosetting modified polyimide resin which was dried after application was used. Release film 30
As 9, a 9 μm thick PEN film was used. Pressure of 5kg / cm by vacuum lamination for temporary fixing
2. Pressurized and heated at a temperature of 70 to 80 ° C for 1 minute.

【0039】次に、図1(c)に示すように、離型フィ
ルム309を設けた絶縁基材306に回路パターン30
7aの位置および形状を認識しながら電気的接続を行う
所定の位置にレーザを照射して、回路パターン307a
表面に到達する非貫通孔303を形成した。レーザとし
ては波長351nmの3倍高調波YAG固体レーザを用
いた。上記短波調レーザにより孔径約50μmの非貫通
孔303を形成した。
Next, as shown in FIG. 1C, the circuit pattern 30 is placed on an insulating base material 306 provided with a release film 309.
A laser is irradiated to a predetermined position where electrical connection is made while recognizing the position and shape of the circuit pattern 307a.
A non-through hole 303 reaching the surface was formed. As the laser, a third harmonic YAG solid-state laser having a wavelength of 351 nm was used. A non-through hole 303 having a hole diameter of about 50 μm was formed by the short-wavelength laser.

【0040】次に、図1(d)に示すように、非貫通孔
303に導電ペースト302を充填した。充填方法とし
てスクリーン印刷法、真空遠心法、ローラ加圧法等があ
る。本実施例ではスクリーン印刷法で離型フィルム30
9上に直接、厚さ0.2〜0.3mmの導電ペースト3
02を全面に形成した後、真空遠心法で導電ペースト3
02を非貫通孔303に充填し、さらにスクリーン印刷
法により離型フィルム309上に残留した導電ペースト
302を除去回収した。この際、離型フイルム309は
印刷マスクの役割と接着剤層308の表面の汚染防止の
役割を果たしている。
Next, as shown in FIG. 1D, the non-through holes 303 were filled with the conductive paste 302. As a filling method, there are a screen printing method, a vacuum centrifugal method, a roller pressing method and the like. In this embodiment, the release film 30 is screen-printed.
9, a conductive paste 3 having a thickness of 0.2 to 0.3 mm
02 is formed on the entire surface, and then the conductive paste 3 is formed by vacuum centrifugation.
02 was filled in the non-through holes 303, and the conductive paste 302 remaining on the release film 309 was removed and recovered by a screen printing method. At this time, the release film 309 plays a role of a printing mask and a role of preventing contamination of the surface of the adhesive layer 308.

【0041】次に、図1(e)に示すように、離型フィ
ルム309を剥離し、接着剤層308に支持基材320
のアライメントマーク307bに対応する開口部311
を設けた金属箔304を重ね合わせ真空熱プレスで圧力
150〜200kg/cm2、温度70〜80℃で10
min加圧加熱して仮止め積層固定した。金属箔304
として厚みは9μmの両面を1〜1.5μm程度、粗化
処理したCu箔を用いた。
Next, as shown in FIG. 1E, the release film 309 is peeled off, and
311 corresponding to the alignment mark 307b of FIG.
The metal foil 304 provided with the pressure is superimposed and the pressure is 150 to 200 kg / cm 2 at a temperature of 70 to 80 ° C. by a vacuum hot press.
The laminate was temporarily fixed and fixed by heating under pressure. Metal foil 304
A roughened Cu foil having a thickness of 9 μm on both sides of about 1 to 1.5 μm was used.

【0042】次に、図1(f)に示すように、仮止め積
層固定した金属箔304の開口部311の対応したアラ
イメントマーク307bと露光マスク(図示せず)のア
ライメントマークを画像認識して位置決めを行い、所望
の回路パターン317aおよび次層のアライメントマー
ク317bを形成する。
Next, as shown in FIG. 1 (f), the alignment mark 307b corresponding to the opening 311 of the metal foil 304 temporarily fixed and fixed and the alignment mark of an exposure mask (not shown) are image-recognized. Positioning is performed to form a desired circuit pattern 317a and a next layer alignment mark 317b.

【0043】次に、図1(g)に示すように、図1
(b)〜図1(g)の工程を繰り返した後、必要積層数
の最表層(本実施例の場合は4層目)の回路パターン3
37aを形成する際、金属箔304を積層後、接着剤層
308の硬化温度で真空熱プレスしてから回路パターン
形成する。本実施例では真空熱プレスとして圧力150
〜200kg/cm2、温度200℃で1Hr加圧加熱
した。
Next, as shown in FIG.
After repeating the steps of (b) to (g) of FIG. 1, the circuit pattern 3 of the outermost layer (the fourth layer in the case of the present embodiment) of the required number of layers
In forming the layer 37a, after laminating the metal foil 304, a circuit pattern is formed after vacuum hot pressing at the curing temperature of the adhesive layer 308. In this embodiment, a pressure of 150 is used as a vacuum hot press.
Heating was performed under a pressure of 200 kg / cm 2 and a temperature of 200 ° C. for 1 hour.

【0044】この加圧加熱により接着剤層308は流動
し、回路パターン307a、317a、327aは接着
剤層308に埋め込まれることにより絶縁性基材306
は変形し、非貫通孔303内の導電ペースト302が圧
縮され、導電ペースト302内の樹脂成分が接着剤層3
08に流れ出し、導電ペースト302内の導体成分が緻
密化し、各層の回路パターンとの良好な電気的接続が得
られる。
The adhesive layer 308 flows by the pressure and heating, and the circuit patterns 307a, 317a, and 327a are embedded in the adhesive layer 308 to form the insulating base material 306.
Is deformed, the conductive paste 302 in the non-through hole 303 is compressed, and the resin component in the conductive paste 302 is
08, the conductive component in the conductive paste 302 is densified, and good electrical connection with the circuit pattern of each layer is obtained.

【0045】次に、図1(h)に示すように、支持基材
320の銅材料からなる回路パターン307a、アライ
メントマーク307bを残して、支持基材320を選択
除去して4層基板330が得られる。このとき、支持基
材320のアルミニウム箔の選択除去としては塩酸:純
水=1:1の割合のエッチング液を用いることで容易に
除去が可能である。
Next, as shown in FIG. 1 (h), the support base 320 is selectively removed while leaving the circuit pattern 307a and the alignment marks 307b made of the copper material of the support base 320, thereby forming the four-layer substrate 330. can get. At this time, the aluminum foil of the supporting base material 320 can be easily removed by using an etching solution having a ratio of hydrochloric acid: pure water = 1: 1.

【0046】なお上記実施例では4層基板までの製造方
法を説明したが、上記工程を繰り返すことによって所望
層数の多層回路基板を得ることができることは明らかで
ある。
In the above-described embodiment, the method for manufacturing up to a four-layer board has been described. However, it is apparent that a multilayer circuit board having a desired number of layers can be obtained by repeating the above steps.

【0047】[0047]

【発明の効果】以上のように本発明は、絶縁性基材、金
属箔を順次仮止め積層固定し、パターンおよびアライメ
ントマーク認識によりビア穴形成、回路パターン形成を
することによって、パターンの高密度化、ビアの小径
化、多層化が要求される多層回路基板において生産性に
優れた製造方法を提供できるものである。
As described above, according to the present invention, the insulating substrate and the metal foil are sequentially temporarily fixed and fixed, and the via holes and the circuit pattern are formed by recognizing the pattern and the alignment mark. The present invention can provide a manufacturing method excellent in productivity in a multilayer circuit board which is required to have a smaller size, a smaller via diameter, and a larger number of layers.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態における多層回路基板の製
造方法示す工程断面図
FIG. 1 is a process sectional view showing a method for manufacturing a multilayer circuit board according to an embodiment of the present invention.

【図2】従来例の両面回路基板の製造方法を示す工程断
面図
FIG. 2 is a process sectional view showing a method for manufacturing a conventional double-sided circuit board.

【図3】従来例の4層基板の製造方法を示す工程断面図FIG. 3 is a process sectional view showing a method for manufacturing a conventional four-layer substrate.

【符号の説明】[Explanation of symbols]

101,306 絶縁性基材 102,202,302 導電ペースト 103 貫通孔(ビア穴) 104,204,304 金属箔 105,309 離型フィルム 106 絶縁接合体 107a,107b,207a,207b,307a,
317a,327a,337a 回路パターン 110 両面回路基板 303 非貫通孔 306 絶縁性基材 307b,317b,327b アライメントマーク 308 接着剤層 320 支持基材 330 4層基板
101, 306 Insulating base material 102, 202, 302 Conductive paste 103 Through hole (via hole) 104, 204, 304 Metal foil 105, 309 Release film 106 Insulating joined body 107a, 107b, 207a, 207b, 307a,
317a, 327a, 337a Circuit pattern 110 Double-sided circuit board 303 Non-through hole 306 Insulating substrate 307b, 317b, 327b Alignment mark 308 Adhesive layer 320 Supporting substrate 330 4-layer substrate

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) H05K 3/40 H05K 3/40 K (72)発明者 中村 禎志 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 (72)発明者 東谷 秀樹 大阪府門真市大字門真1006番地 松下電器 産業株式会社内 Fターム(参考) 5E317 AA21 AA24 BB03 BB12 BB14 BB18 CC25 CD27 CD32 5E343 AA02 AA11 AA18 AA33 BB24 BB67 BB72 DD02 DD53 DD56 DD63 DD76 ER55 ER58 FF07 FF13 FF24 GG08 5E346 AA12 AA16 CC10 CC32 DD12 EE12 EE13 FF18 GG15 GG22 HH26 HH33 ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) H05K 3/40 H05K 3/40 K (72) Inventor Satoshi Nakamura 1006 Kazuma Kadoma, Kadoma, Osaka Matsushita Electric Industrial (72) Inventor Hideki Higashiya 1006 Kazuma Kadoma, Kadoma-shi, Osaka Matsushita Electric Industrial Co., Ltd. F-term (reference) DD63 DD76 ER55 ER58 FF07 FF13 FF24 GG08 5E346 AA12 AA16 CC10 CC32 DD12 EE12 EE13 FF18 GG15 GG22 HH26 HH33

Claims (7)

【特許請求の範囲】[Claims] 【請求項1】以下の工程からなることを特徴とする多層
回路基板の製造方法。 a.支持基材の表面に導電体からなる所望の回路パター
ンとアライメントマークを形成する工程。 b.絶縁性基材の両面に接着剤層が形成され、さらに前
記接着剤層に離型フィルムがラミネートしてある絶縁性
基材合成体の片面の離型フィルムを剥離して前記接着剤
層と前記支持基材の回路パターンに当接するように重
ね、前記接着剤層の硬化温度より低温で加圧加熱し仮止
め積層固定する工程。 c.電気的接続を行う箇所に前記離型フィルムを備えた
絶縁性基材に回路パターンを認識して所定の位置にレー
ザを照射して前記回路パターン表面に到達する非貫通孔
をあける工程。 d.前記非貫通孔に導電性ペーストを充填する工程。 e.前記離型フィルム剥離後、金属箔を前記支持基材に
位置決めして重ね、前記接着剤層の硬化温度より低温で
加圧加熱し仮止め積層固定する工程。 f.露光用マスクと前記支持基材に形成したアライメン
トマークを位置決めし、前記金属箔を所望の回路パター
ンと次層のアライメントマークを形成する工程。 g.工程b〜工程fを繰り返した後、必要積層数の最表
層の回路パターンを形成する際に前記金属箔積層後、前
記接着剤層の硬化温度で加圧加熱してから回路パターン
形成を行う工程。 h.支持基材の回路パターンを残して前記支持基材を選
択除去する工程。
1. A method for manufacturing a multilayer circuit board, comprising the following steps. a. A step of forming a desired circuit pattern and an alignment mark made of a conductor on the surface of the supporting substrate; b. An adhesive layer is formed on both sides of the insulating base material, and the release layer on one side of the insulating base composite body further having a release film laminated on the adhesive layer is peeled off to form the adhesive layer and the adhesive layer. A step of superimposing the circuit pattern on the supporting base material so as to be in contact with the circuit pattern, and applying pressure and heating at a temperature lower than the curing temperature of the adhesive layer to temporarily fix and fix the adhesive layer. c. A step of recognizing a circuit pattern on an insulating base material provided with the release film at a place where an electrical connection is to be made, and irradiating a predetermined position with a laser to form a non-through hole reaching the surface of the circuit pattern; d. Filling a conductive paste into the non-through holes. e. A step of positioning a metal foil on the support substrate after the release film is peeled off, and applying pressure and heating at a temperature lower than the curing temperature of the adhesive layer to temporarily fix and fix the laminate. f. A step of positioning an exposure mask and an alignment mark formed on the supporting base material and forming a desired circuit pattern on the metal foil and an alignment mark of a next layer. g. A step of forming a circuit pattern by pressurizing and heating at a curing temperature of the adhesive layer after laminating the metal foil when forming a circuit pattern of a required number of outermost layers after repeating steps b to f. . h. A step of selectively removing the support substrate while leaving a circuit pattern of the support substrate.
【請求項2】絶縁性基材および金属箔の加圧加熱による
仮止め積層固定する手段にラミネート、真空熱プレスお
よびオートクレーブからなる群から選択された少なくと
もひとつの手段である請求項1記載の多層回路基板の製
造方法。
2. The multilayer according to claim 1, wherein the means for temporarily fixing and laminating the insulating base material and the metal foil by pressurizing and heating is at least one means selected from the group consisting of laminating, vacuum hot pressing and autoclave. A method for manufacturing a circuit board.
【請求項3】絶縁性基材がポリイミドフィルム、液晶ポ
リマーフイルム、アラミドフィルムからなる群から選択
された少なくともひとつの材料である請求項1または2
記載の多層回路基板の製造方法。
3. The material according to claim 1, wherein the insulating substrate is at least one material selected from the group consisting of a polyimide film, a liquid crystal polymer film, and an aramid film.
A method for manufacturing the multilayer circuit board according to the above.
【請求項4】絶縁性基材の接着剤層が半硬化状態の有機
樹脂である請求項1から3のいずれか1項に記載の多層
回路基板の製造方法。
4. The method for manufacturing a multilayer circuit board according to claim 1, wherein the adhesive layer of the insulating substrate is a semi-cured organic resin.
【請求項5】導電ペーストの導電物質がCu、Agおよ
びこれらの合金からなる群から選択された少なくともひ
とつの金属粉末を含む請求項1から4のいずれか1項に
記載の多層基板の製造方法。
5. The method according to claim 1, wherein the conductive material of the conductive paste includes at least one metal powder selected from the group consisting of Cu, Ag, and an alloy thereof. .
【請求項6】加圧する前の絶縁性基材に形成された接着
剤層の厚さが、前記接着剤層に埋設される回路パターン
の厚さとほぼ等しいか薄い請求項1から5のいずれか1
項に記載の多層回路基板の製造方法。
6. The method according to claim 1, wherein the thickness of the adhesive layer formed on the insulating base material before the pressing is substantially equal to or smaller than the thickness of the circuit pattern embedded in the adhesive layer. 1
Item 13. The method for producing a multilayer circuit board according to item 9.
【請求項7】下層に設けたアライメントマークが見える
ように上層に設ける金属箔が開口部を有する請求項1か
ら6のいずれか1項に記載の多層回路基板の製造方法。
7. The method according to claim 1, wherein the metal foil provided on the upper layer has an opening so that the alignment mark provided on the lower layer can be seen.
JP2000125735A 2000-04-26 2000-04-26 Method for manufacturing multilayered circuit board Pending JP2001308521A (en)

Priority Applications (1)

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Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000125735A JP2001308521A (en) 2000-04-26 2000-04-26 Method for manufacturing multilayered circuit board

Publications (1)

Publication Number Publication Date
JP2001308521A true JP2001308521A (en) 2001-11-02

Family

ID=18635635

Family Applications (1)

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Country Link
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Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217540A (en) * 2001-01-17 2002-08-02 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing multilayer wiring board
JP2003281940A (en) * 2002-03-25 2003-10-03 Hitachi Chem Co Ltd Insulation resin composition, insulator with copper foil, and laminated plate with copper foil
WO2004064465A1 (en) * 2003-01-14 2004-07-29 Matsushita Electric Industrial Co., Ltd. Circuit board and process for producing the same
JP2007149936A (en) * 2005-11-28 2007-06-14 Ishii Hyoki Corp Flexible substrate sheet temporarily adhering apparatus

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002217540A (en) * 2001-01-17 2002-08-02 Matsushita Electric Ind Co Ltd Method and apparatus for manufacturing multilayer wiring board
JP2003281940A (en) * 2002-03-25 2003-10-03 Hitachi Chem Co Ltd Insulation resin composition, insulator with copper foil, and laminated plate with copper foil
WO2004064465A1 (en) * 2003-01-14 2004-07-29 Matsushita Electric Industrial Co., Ltd. Circuit board and process for producing the same
US7181839B2 (en) 2003-01-14 2007-02-27 Matsushita Electric Industrial Co., Ltd. Method for producing a circuit board
CN100466883C (en) * 2003-01-14 2009-03-04 松下电器产业株式会社 Circuit board and process for producing the same
US7816611B2 (en) 2003-01-14 2010-10-19 Panasonic Corporation Circuit board
JP2007149936A (en) * 2005-11-28 2007-06-14 Ishii Hyoki Corp Flexible substrate sheet temporarily adhering apparatus

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