JP2001308043A5 - - Google Patents
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- Publication number
- JP2001308043A5 JP2001308043A5 JP2000131550A JP2000131550A JP2001308043A5 JP 2001308043 A5 JP2001308043 A5 JP 2001308043A5 JP 2000131550 A JP2000131550 A JP 2000131550A JP 2000131550 A JP2000131550 A JP 2000131550A JP 2001308043 A5 JP2001308043 A5 JP 2001308043A5
- Authority
- JP
- Japan
- Prior art keywords
- water
- polishing
- additive
- cerium oxide
- organic polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000005498 polishing Methods 0.000 description 14
- 239000000654 additive Substances 0.000 description 11
- 230000000996 additive effect Effects 0.000 description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 11
- 229910000420 cerium oxide Inorganic materials 0.000 description 9
- BMMGVYCKOGBVEV-UHFFFAOYSA-N oxo(oxoceriooxy)cerium Chemical compound [Ce]=O.O=[Ce]=O BMMGVYCKOGBVEV-UHFFFAOYSA-N 0.000 description 9
- 125000000129 anionic group Chemical group 0.000 description 7
- 229920000620 organic polymer Polymers 0.000 description 7
- 239000002270 dispersing agent Substances 0.000 description 6
- 239000002245 particle Substances 0.000 description 6
- 238000000034 method Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 239000003795 chemical substances by application Substances 0.000 description 4
- 239000007788 liquid Substances 0.000 description 3
- 239000002002 slurry Substances 0.000 description 3
- 239000004744 fabric Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000131550A JP2001308043A (ja) | 2000-04-26 | 2000-04-26 | Ｃｍｐ研磨剤及び基板の研磨方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000131550A JP2001308043A (ja) | 2000-04-26 | 2000-04-26 | Ｃｍｐ研磨剤及び基板の研磨方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001308043A JP2001308043A (ja) | 2001-11-02 |
| JP2001308043A5 true JP2001308043A5 (enExample) | 2006-08-31 |
Family
ID=18640427
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000131550A Pending JP2001308043A (ja) | 2000-04-26 | 2000-04-26 | Ｃｍｐ研磨剤及び基板の研磨方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2001308043A (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2009187984A (ja) | 2008-02-01 | 2009-08-20 | Fujimi Inc | 研磨用組成物及びそれを用いた研磨方法 |
| US9796894B2 (en) | 2011-12-22 | 2017-10-24 | Konica Minolta, Inc. | Abrasive material regeneration method and regenerated abrasive material |
| JP6107669B2 (ja) * | 2012-02-16 | 2017-04-05 | コニカミノルタ株式会社 | 研磨材再生方法 |
| JP6406010B2 (ja) * | 2012-07-25 | 2018-10-17 | コニカミノルタ株式会社 | 研磨材再生方法 |
-
2000
- 2000-04-26 JP JP2000131550A patent/JP2001308043A/ja active Pending
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