JP2001307899A5 - - Google Patents

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Publication number
JP2001307899A5
JP2001307899A5 JP2000116642A JP2000116642A JP2001307899A5 JP 2001307899 A5 JP2001307899 A5 JP 2001307899A5 JP 2000116642 A JP2000116642 A JP 2000116642A JP 2000116642 A JP2000116642 A JP 2000116642A JP 2001307899 A5 JP2001307899 A5 JP 2001307899A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000116642A
Other languages
Japanese (ja)
Other versions
JP2001307899A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000116642A priority Critical patent/JP2001307899A/ja
Priority claimed from JP2000116642A external-priority patent/JP2001307899A/ja
Priority to US09/829,191 priority patent/US6401653B1/en
Publication of JP2001307899A publication Critical patent/JP2001307899A/ja
Publication of JP2001307899A5 publication Critical patent/JP2001307899A5/ja
Pending legal-status Critical Current

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JP2000116642A 2000-04-18 2000-04-18 プラズマ発生装置 Pending JP2001307899A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2000116642A JP2001307899A (ja) 2000-04-18 2000-04-18 プラズマ発生装置
US09/829,191 US6401653B1 (en) 2000-04-18 2001-04-09 Microwave plasma generator

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000116642A JP2001307899A (ja) 2000-04-18 2000-04-18 プラズマ発生装置

Publications (2)

Publication Number Publication Date
JP2001307899A JP2001307899A (ja) 2001-11-02
JP2001307899A5 true JP2001307899A5 (cg-RX-API-DMAC7.html) 2007-06-07

Family

ID=18628080

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000116642A Pending JP2001307899A (ja) 2000-04-18 2000-04-18 プラズマ発生装置

Country Status (1)

Country Link
JP (1) JP2001307899A (cg-RX-API-DMAC7.html)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4967107B2 (ja) * 2006-02-20 2012-07-04 国立大学法人名古屋大学 マイクロ波導入器、プラズマ発生装置及びプラズマ処理装置

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6232703A (ja) * 1985-08-06 1987-02-12 Rikagaku Kenkyusho マイクロ波電力導入装置
JPH0673318B2 (ja) * 1986-09-02 1994-09-14 理化学研究所 マイクロ波導入装置
JP3233575B2 (ja) * 1995-05-26 2001-11-26 東京エレクトロン株式会社 プラズマ処理装置
JPH0963793A (ja) * 1995-08-25 1997-03-07 Tokyo Electron Ltd プラズマ処理装置
JPH09148097A (ja) * 1995-11-22 1997-06-06 Hitachi Ltd プラズマ生成装置及びそれを用いた半導体素子の製造方法、半導体素子
JP2875221B2 (ja) * 1996-11-15 1999-03-31 ニチメン電子工研株式会社 プラズマ発生装置
JP2959508B2 (ja) * 1997-02-14 1999-10-06 日新電機株式会社 プラズマ発生装置
JP4089022B2 (ja) * 1998-07-22 2008-05-21 日新イオン機器株式会社 自己電子放射型ｅｃｒイオンプラズマ源
JP3437772B2 (ja) * 1998-08-17 2003-08-18 長崎県 管内面の表面処理方法及び装置

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