JP2001266784A - Focused ion beam device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To reduce the size of a gas inlet mechanism. SOLUTION: An ion beam irradiation system 1 and a gas inlet mechanism 21 are attached to an irradiated material chamber 2. The gas inlet mechanism 21 has a gas inlet system casing 22, having a gasified material chamber 23 and a gas inlet pipe 22S for guiding a gas after gasified to a irradiated material 3, which is formed to be movable in the direction of the irradiated material 3 and the counter direction of the radiated material, and a gasified material chamber valve driving shaft 24 or driving a valve mechanism for moving the gasified material chamber 23 in the direction of the radiated material 3 and the counter direction of the gasified material for carrying the gas in the gasified material chamber to the gas inlet pipe 22 or stopping the flow thereof. The gasified material chamber valve driving shaft 24 is mounted on the gas inlet system casing 22, to be movable along the gas inlet system casing 22 with the drive of an actuator 35.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a focused ion beam apparatus provided with a mechanism for supplying a gas into an object chamber.

[0002]

2. Description of the Related Art In a focused ion beam apparatus for focusing and irradiating an ion beam from an ion source on an object to be irradiated, an ion beam of the object to be irradiated is used for etching or deposition of the object to be irradiated. Some include a gas introduction mechanism for blowing an appropriate gas to an irradiation point.

FIG. 1 schematically shows a focused ion beam apparatus provided with such a gas introduction mechanism. In the figure, reference numeral 1 denotes a focused ion beam optical system barrel, in which an ion source,
A focusing lens for focusing the ion beam from the ion source on the irradiation object, a deflector for controlling the irradiation position of the ion beam on the irradiation object, and irradiation of the ion beam toward the irradiation object A blanking mechanism for performing / non-irradiation (on / off) is provided.

[0004] In the figure, reference numeral 2 denotes an irradiation object chamber on which the focused ion beam optical system 1 is mounted, and a stage 4 on which the irradiation object 3 is mounted and a gas introduction mechanism 5 are provided.

The gas introducing mechanism 5 is attached to the upper wall of the chamber 2 and has a double-pipe structure. The outer pipe contains a gas for storing a gasification material (referred to as a gasification material). The inner tube, that is, the tube on the central axis O is the gas introduction tube 7. The gas introduction pipe extends from the member having the double pipe structure to the object to be irradiated as it is, and has a nozzle-shaped tip. The gasification material storage section 6 and the gas introduction pipe 7 are connected to an upper space section 8.
The gas supply control valve 9 that moves along the central axis O is provided in this space. An actuator 10 controls the movement of the valve. A heating heater 11 is provided outside the single pipe portion where the double pipe structural member and the gas introduction pipe extend.

In such a focused ion beam apparatus,
For example, when performing deposition, the actuator 10 is operated based on a command from the outside, the gas supply control valve 9 is moved in the direction of the irradiation object, and the space between the gasification material storage unit 6 and the gas introduction pipe 7 is moved. The irradiation target chamber 2 is kept shut off, and is evacuated (not shown).
After the inside is at a predetermined degree of vacuum, the heating heater 11 is turned on to heat the gasified material (for example, an organic metal in the case of deposition or the like) stored in the gasified material storage unit 6. Sublimation (gasification). At this time, the actuator 10 is actuated based on a command from the outside, and the gas supply control valve 9 is moved in the direction of the non-irradiated object to establish communication between the gasification material storage section 6 and the gas introduction pipe 7. I do. As a result, the gasified material sublimated in the storage section 6 passes through the gas introduction pipe 7 and is blown out toward the irradiation target 3 from the nozzle at the tip thereof. By irradiating a focused ion beam from an ion source (not shown) of the focused ion beam optical system barrel 1 to a predetermined position on the irradiation object, together with the injection of the gasification material onto the irradiation object, Gasification material is deposited at that location.

[0007]

When an object to be irradiated is etched, a corrosive gas optimum for improving the etching depends on the type of the object to be etched. Further, there are cases where a plurality of types of irradiation objects are deposited on the irradiation object, and when such deposition is performed or when the above-described optimum etching is performed, a plurality of different gasification materials are used. Is mounted on the irradiation object chamber 2, and only the gas introduction mechanism containing the gasification material of the type to be used is brought close to the irradiation object, and other gas introduction mechanisms do not interfere with the gas introduction mechanism in use. Away from the object to be irradiated. Regardless of the number of units, in a focused ion beam system equipped with a gas introduction mechanism, a pattern can be drawn on an irradiation target without being etched or deposited, or a focused ion beam can be focused on a minute spot on the irradiation target. When the analysis of a minute portion is performed based on the ions from the minute portion detected by irradiating the gas, the gas introducing mechanism is separated from the object to be irradiated.

Although not particularly shown in FIG. 1 in order to move the gas introduction mechanism closer to or away from the object to be irradiated, for example, the entire gas introduction mechanism 5 is moved in the direction of the object 3 to be irradiated, A retractable mechanism including an actuator for moving the object to be irradiated and the like has to be separately attached to the object chamber 2. By separately providing the retractable mechanism in this way, the combined gas introduction mechanism and retractable mechanism becomes extremely large, and the entire focused ion beam apparatus becomes large.

The present invention has been made to solve such a problem, and an object of the present invention is to provide a new focused ion beam apparatus.

[0010]

SUMMARY OF THE INVENTION A focused ion beam apparatus according to the present invention includes an ion beam irradiation system for irradiating a focused ion beam to an object to be irradiated and a gas beam to an ion beam irradiated portion on the object to be irradiated. A focused ion beam apparatus having a gas introduction mechanism attached to an irradiation object chamber, wherein a gas introduction pipe of the gas introduction mechanism facing at least the irradiation object blows gas by driving a common actuator. It is characterized in that it is configured to be movable between positions where it is not sprayed.

The focused ion beam apparatus according to the present invention includes an ion beam irradiation system for irradiating a focused ion beam to an object to be irradiated and a gas introduction mechanism for blowing gas to an ion beam irradiated portion on the object to be irradiated. A focused ion beam device attached to an irradiation object chamber, wherein the gas introduction mechanism has a gasification material chamber and a gas introduction pipe for guiding gas gasified in the gasification material chamber onto the irradiation object. A gas introduction system casing configured to be movable in the direction of the object to be irradiated and the direction of the object to be irradiated and the gasified material by moving the gasification material chamber in the direction of the object to be irradiated and the direction of the object to be irradiated. A gasification material chamber valve drive shaft configured to drive a valve mechanism for flowing or stopping the gas in the chamber to the gas introduction pipe; It characterized in that form as attaching the gasification material chamber valve drive shaft to the gas introduction system casing movably driven by a common actuator Te.

[0012]

Embodiments of the present invention will be described below in detail with reference to the drawings.

FIG. 2 shows one embodiment of the focused ion beam apparatus of the present invention.
This is a schematic example, in which the same reference numerals as those in FIG. 1 denote the same components.

In the figure, reference numeral 21 denotes a gas introduction mechanism, which is attached to the upper wall of the irradiation object chamber 2. Reference numeral 22 denotes a gas introduction system casing composed of a large-diameter tube portion and a thin tube portion (gas introduction tube) 22S, and a gasification material chamber valve having a gasification material chamber 23 attached to the tip inside the large-diameter tube portion. The drive shaft 24 is fitted. Note that the thin tube portion 22S
Is shaped like a nozzle.

The gasification material chamber 23 has a valve 2 at its tip.
A valve spring 26 to which the gaseous material 5 is attached is mounted, and a gasified material is stored in the gasified material chamber. The valve 25 is provided inside the gas introduction casing 22 by the pressing force of the spring 26, and is always in contact with the opening so as to close the opening of the convex portion 27 connected to the thin tube portion (gas introduction tube) 22S. And
At the time of gas supply, the gasification material chamber valve drive shaft 24 is pushed in the direction of the irradiation object 3, whereby the spring 26 contracts and only the outer frame of the gas material chamber 23 moves in the irradiation object direction. The gasified material gasified through a gas passage 27H opened near the opening on the side of the convex portion 27 is blown onto the irradiation target 3 through the thin tube portion 22S of the gas introduction casing 22. Made up of

Although the gasification material chamber valve drive shaft 24 is fitted in the gas introduction system casing 22 as described above, the gasification material chamber valve drive shaft 24 can move within the gas introduction system casing 22 and The gaseous material chamber valve drive shaft 2
A retaining pin 29 is provided between the elongated hole 28 formed in the casing 4 and the gas introduction system casing 22. When the gas material is not supplied onto the irradiation object, the difference between the long diameter of the long hole 28 and the outside diameter of the retaining pin 29 corresponds to the gap G between the gasification material chamber valve drive shaft 24 and the gas introduction casing 22. are doing.

Reference numeral 30 denotes a flange for mounting a gas introduction mechanism, which is mounted on the outer wall of the chamber 2 so as to support a part of the outer periphery of the gas introduction casing 22.

A flange 31 is provided on the outside of the gas introduction system casing 22, and the flange 31 and the flange 30 are provided.
A retractable spring 32 is attached between the two. When the gas introduction casing 22 is brought closer to the irradiation target (gasification material supply position), the target gas introduction system casing 22 is pushed in the direction of the irradiation target, and the pushing is performed. When the retractor spring 32 contracts and the gas introduction system casing 22 moves in the direction of the irradiation target 3, and the flange 31 hits the end 33 of the flange 30, the tip of the thin tube of the gas introduction system casing 22 becomes the target. 3 (gas supply position). Note that a rotation stopping pin 34 is provided between the gas introduction system casing 22 and the flange 30 so that the gas introduction system casing 22 moves only linearly and does not rotate.

Reference numeral 35 denotes an actuator for driving the gas introduction system casing 22 and the gasification material chamber valve drive shaft 24, 36 denotes an actuator shaft that rotates along the central axis O by the actuator, and 37 denotes an actuator shaft attached to the actuator shaft. An actuator output rod which rotates while being in contact with the gas introduction system casing 22 and the gasification material chamber valve drive shaft 24. 38 is an actuator support frame for supporting the actuator 35,
It is mounted on the gas introduction mechanism mounting flange 30.

As shown in FIG. 3, the gas introduction system casing 22 and the gasification material chamber valve drive shaft 24 respectively have
For example, spiral steps 39 and 40 are formed so as to rise to the right, and the actuator output rod 37 is attached to the actuator shaft 36 so as to contact this step. The distal end of the actuator output rod 37 is connected to the gas introduction system so that the actuator output rod 37 smoothly contacts the step 40 of the gas material chamber valve drive shaft 24 from the step 39 of the gas introduction system casing 22. The casing 22 and the gasification material chamber valve drive shaft 24 are formed in a spherical shape having a diameter larger than the length d of the gap G. Although not particularly shown, the gas introduction casing 2
A heating heater is provided on the outer periphery of the second thin tube portion 22S and / or a large tube portion close to the thin tube portion.

In such a focused ion beam apparatus,
For example, the operation in the case of performing deposition will be described below.

In the initial state, that is, when the gas material is not supplied onto the irradiation object, as shown in FIG.
The tip of the actuator output rod 37 is in contact with the lowermost portion (tip) of the step 39 of the gas introduction casing 22, and the tip of the thin tube portion 22 </ b> S of the gas introduction casing 22 is separated from the irradiation target 3. State and the gap G
Is maintained at the distance d, so that the inside of the gasification material chamber 23 and the gas flow path 27H of the convex portion of the thin tube portion 22S of the gas introduction casing 22 are in a state of being shut off by the valve 25.

In such a state, when supplying the gasified material onto the irradiation target 3, the actuator 35 is operated based on an external command, and the actuator shaft 36 is operated.
, The actuator output rod 37 is rotated counterclockwise. Thus, the step 3 of the gas introduction system casing 22
When the actuator output rod 37, which has been in contact with the lowermost (tip) portion of the actuator output rod 9, is rotated counterclockwise, the tip of the actuator output rod 37 presses the step 39, and the retractable spring 32 is pressed by the pressing. The gas introduction system casing 22 moves in the direction of the irradiation target 3 along the central axis O until the flange 31 of the gas introduction system casing 22 hits the outermost end 33 of the flange 30. When the flange 31 of the gas introduction casing 22 hits the outermost end 33 of the flange 30, the tip of the narrow tube portion 22S comes to the gas material supply position.

Further, when the actuator output rod 37 continues to rotate counterclockwise, the actuator output rod 37
Presses the step 40 of the gasification material chamber valve drive shaft 24 from the step 39 of the gas introduction system casing 22, and the gasification material chamber valve drive shaft 24 is covered along the central axis O by the pressing. It moves in the direction of the irradiation object 3 by the distance d of the gap. By the movement of the gasification material chamber valve drive shaft 24, the valve spring 25 contracts and the gasification material chamber 23
By moving only the outer frame in the direction of the object to be irradiated, the gasified material already gasified by heating by the heating coil (not shown) in the gasified material chamber 23 is supplied to the narrow tube portion 22S through the gas flow path 27H. And is blown out onto the irradiation object 3 through the light source.

Along with the injection of the gasified material onto the object to be irradiated, a focused ion beam from an ion source (not shown) of the focused ion beam optical system barrel 1 is applied to a predetermined position on the object to be irradiated. As a result, the gasified material is deposited at that position.

Next, when the supply of the gasified material is stopped and the gas introducing system casing narrow tube portion 22S is returned to the initial position,
The operation is completely opposite to that at the time of supplying the gasified material. That is,
The actuator 35 is operated based on an external command, and the actuator output rod 37 is rotated clockwise via the actuator shaft 36. Then, at this time, the distal end of the actuator output rod 37 pressing the top of the step 40 of the gasification material chamber valve drive shaft 24 releases the pressing of the step 40, and the gas is released according to the pressing release. The chemical material chamber valve drive shaft 24 moves along the central axis O in the direction opposite to the irradiation object by the distance d of the gap. In conjunction with the movement, the valve spring 25 is extended, and only the outer frame of the gasification material chamber 23 moves in the direction of the non-irradiated object, so that the space between the inside of the gasification material chamber 23 and the gas flow path 27H is closed. 26, the blowing of the gasified material onto the irradiation target 3 is stopped.

Further, when the actuator output rod 37 continues to rotate clockwise, the tip of the actuator output rod 37 reaches the step 39 of the gas introduction system casing 22 and releases the pressing on the step. The retractable spring 32 shrinks accordingly, and accordingly, the gas introduction system casing 22 moves along the central axis O in the direction of the object to be irradiated until the tip of the actuator output rod 37 comes to the tip (lowest) of the step 39. Go to The time when the tip of the actuator output rod 37 comes to the tip (lowest part) of the step 39 is the initial state shown in FIG.

As described above, at least the gas introduction pipe of the gas introduction mechanism can be moved closer to or away from the object to be irradiated by one actuator, so that the gas introduction mechanism is not only downsized, but also such a gas introduction mechanism is used. As a result, the focused ion beam apparatus provided with is also compact.

In the above example, the gas introducing system casing 22 is used.
Although the step 39 provided on the upper side and the step 40 provided on the gasification material chamber valve drive shaft 24 rise rightward, they may both rise leftward. However, in the case of a step rising leftward, the rotation direction of the tutor output rod 37 is opposite to that in the case of a step rising rightward. That is, it is rotated clockwise when supplying gasified material, and counterclockwise when stopping supply of gasified material.

As shown in FIG. 4, the diameter of the gas introduction system casing 22 'is made smaller than the diameter of the gasification material chamber valve drive shaft 24', and a plurality of circumferential steps 39 'are formed in the gas introduction system casing 22'. A contact 41 that contacts the step 39 ′ is provided at the tip of the actuator output rod 37 ′, and the gasification material chamber valve drive shaft 24 ′ is located closer to the object to be irradiated than the tip.
Are provided in contact with the steps 40 ′ provided in the gas supply system.
The contact 42 may contact the step 39 'of the gaseous material chamber valve drive shaft 24'. By doing so, the output of the actuator 35 can be considerably reduced.

In the above-described example, the case where deposition is performed has been described. However, the present invention is naturally applicable to the case where etching or the like is performed.

In the above example, the case where one gas introduction mechanism is provided has been described, but the present invention is also applicable to the case where a plurality of gas introduction mechanisms are provided.

The gas introduction mechanism described in the above example is similar to that shown in FIG.
Needless to say, the present invention is not limited to that shown in FIG.

[Brief description of the drawings]

FIG. 1 shows a schematic example of a conventional focused ion beam apparatus.

FIG. 2 shows a schematic example of a focused ion beam device of the present invention.

FIG. 3 shows a partly detailed example of the focused ion beam device of the present invention.

FIG. 4 shows another partially detailed example of the focused ion beam device of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Focused ion beam optical column 2 ... Irradiation object chamber 3 ... Irradiation object 4 ... Stage 5 ... Gas introduction mechanism 6 ... Gasification material storage part 7 ... Gas introduction pipe 8 ... Space part 9 ... Gas supply control valve DESCRIPTION OF SYMBOLS 10 ... Actuator 11 ... Heater 21 ... Gas introduction mechanism 22 ... Gas introduction system casing 22S ... Thin tube part 23 ... Gasification material chamber 24 ... Gasification material chamber valve drive shaft 25 ... Valve 26 ... Valve spring 27 ... Convex part 27H: gas flow path 28: elongated hole 29: retaining pin 30 ... flange for mounting a gas introduction mechanism 31 ... flange 32 ... retractable spring 33 ... extreme end 34 ... rotation stopping pin 35 ... actuator 36 ... actuator shaft 37 ... actuator output rod 38 ... actuator support frame 39, 40 ... step G ... gap 41 42 ... contact

Claims (7)

[Claims] An ion beam irradiation system for irradiating an object to be irradiated with a focused ion beam, and a focusing system in which a gas introduction mechanism for blowing gas to an ion beam irradiation position on the object to be irradiated is attached to an object chamber. An ion beam apparatus, wherein at least a gas introduction pipe of the gas introduction mechanism facing the object to be irradiated is configured to be movable between a position where the gas is blown by driving a common actuator and a position where the gas is not blown. Focused ion beam equipment. 2. An ion beam irradiation system for irradiating an object to be irradiated with a focused ion beam, and a focusing system in which a gas introduction mechanism for blowing gas to an ion beam irradiation location on the object to be irradiated is attached to an object chamber. An ion beam apparatus, wherein the gas introduction mechanism has a gasification material chamber and a gas introduction pipe for guiding a gas that has been gasified in the gasification material chamber onto the object to be irradiated, and the direction of the object to be irradiated and A gas introduction system casing configured to be movable in the direction of the object to be irradiated, and the gasification material chamber is moved in the direction of the object to be irradiated and in the direction of the object to be irradiated so that the gas in the gasification material chamber is introduced into the gas. A gasification material chamber valve drive shaft configured to drive a valve mechanism for flowing or stopping the flow to the pipe, and driving a common actuator along the gas introduction system casing. A focused ion beam apparatus configured to attach the gasification material chamber valve drive shaft to the gas introduction system casing so as to be movable. 3. A step which becomes wider as it moves away from the object to be irradiated is provided on a part of the outer periphery of the gas introduction system casing and the valve shaft of the gasification material chamber on the side opposite to the object to be irradiated, and rotates in contact with the step. 3. The focused ion beam device according to claim 2, wherein a pressing body having a curved surface portion is attached to the common actuator. 4. The focused ion beam according to claim 3, wherein the diameter of the gas introduction system casing is smaller than the diameter of the gasification material chamber valve drive shaft, and the gas introduction system casing has a plurality of steps. 5. The focused ion beam according to claim 3, wherein a support supporting a common actuator for driving the pressing body is attached to a wall of the object chamber. 6. The gas introduction system casing is attached to a chamber wall so that the gas introduction system casing is always pressed in the direction of the object to be irradiated, and the gasification material chamber is constantly pressed in the direction of the object to be irradiated. The gasification material chamber is provided in the gas introduction system casing as described above, and the gasification material chamber and the gas introduction system casing are driven through the gasification material chamber drive shaft by driving the pressing body. 4. The focused ion beam according to claim 3, wherein the focused ion beam can be moved against pressure. 7. A flange is provided on the outer periphery of the gas introduction system casing, and an elastic body is attached between the flange and the chamber wall so that the gas introduction system casing is constantly pressed in the direction of the object to be irradiated. In the gasification material chamber, a hole larger than the gas introduction pipe is formed on the irradiation object side, a hole is formed near an opening on a side portion of the gas introduction pipe, and the opening of the gas introduction pipe is closed. An elastic body is attached to the gasification material chamber so as to press the valve to the open end, and the gasification material chamber and the gas introduction casing are moved through the gasification material chamber drive shaft by driving the pressing body. 4. The focused ion beam according to claim 3, wherein the focused ion beam can be moved against pressure.