JP2000323086A - Focused ion beam device - Google Patents

Abstract

PROBLEM TO BE SOLVED: To prevent adhesion of a gasification material onto a gas supply control valve. SOLUTION: This focused ion beam device has a heater 12 within a gas supply control valve 9. When supplying a sublimated gasification material onto a target 3, the gas supply control valve 9 is moved to the opposite target direction to connect a gasification material storage part 6 and a gas inlet pipe 7. When stopping the supply of the gasification material, the gas supply control valve 9 is moved toward the target 3 to shut off the gasification material storage part 6 and the gas inlet pipe 7. In either case, the heater 12 continuously directly heats the valve 9. Accordingly, even if a portion of the sublimated gasification material collides with the valve 9, the heating of the valve 9 prevents adhesion of the sublimated gasification material onto a surface of the valve 9.

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

The present invention relates to a focused ion beam apparatus provided with a mechanism for supplying a gas into a target chamber.

[0002]

2. Description of the Related Art In a focused ion beam apparatus for focusing and irradiating an ion beam from an ion source on a target,
In order to perform target etching or deposition,
Some include a gas introduction mechanism for blowing an appropriate gas to an ion beam irradiation point of a target.

FIGS. 1 and 2 schematically show a focused ion beam apparatus provided with such a gas introduction mechanism. In the figure, reference numeral 1 denotes a focused ion beam optical system barrel, in which an ion source, a focusing lens for focusing an ion beam from the ion source on a target, and an irradiation position of the ion beam on the target are controlled. Deflector for irradiating / non-irradiating (on / off) the ion beam in the target direction
OFF) is provided.

[0004] In the figure, reference numeral 2 denotes a target chamber in which the focused ion beam optical system 1 is mounted. Inside the target chamber, a stage 4 on which a target 3 is mounted and a gas introducing mechanism 5 are provided.

The gas introducing mechanism 5 is attached to the upper wall of the chamber 2 and has a double-pipe structure. The outer pipe contains a gas for storing a gasification material (referred to as a gasification material). The inner tube, that is, the tube on the central axis O is the gas introduction tube 7. The gas introduction pipe extends from the member having the double pipe structure to the target side as it is, and has a nozzle-like tip. The gasification material storage section 6 and the gas introduction pipe 7 are connected to an upper space section 8.
The gas supply control valve 9 that moves along the central axis O is provided in this space. An actuator 10 controls the movement of the valve. A heating heater 11 is provided outside the single pipe portion where the double pipe structural member and the gas introduction pipe extend.

In such a focused ion beam apparatus,
For example, when deposition is performed, the actuator 10 is operated based on an external command, the gas supply control valve 9 is moved in the target direction, and the space between the gasification material storage unit 6 and the gas introduction pipe 7 is shut off. After the inside of the target chamber 2 was evacuated (not shown) to a predetermined degree of vacuum by the exhaust means (not shown), the heating heater 11 was turned on and stored in the gasified material storage section 6. Gasification materials (for example, in the case of deposition, etc.,
The organic metal) is heated and sublimated (gasified). At this time, the actuator 10 is actuated based on a command from the outside, and the gas supply control valve 9 is moved in the direction opposite to the target to establish communication between the gasification material storage section 6 and the gas introduction pipe 7 (FIG. 2) Do it. As a result, the gasified material sublimated in the storage section 6 passes through the gas introduction pipe 7 and is blown out onto the target 3 from the nozzle section at the tip thereof. Along with the injection of the gasified material onto the material, a focused ion beam from an ion source (not shown) of the focused ion beam optical system barrel 1 is irradiated to a predetermined position on the target, so that the gas is brought to that position. Material is deposited. When the supply of the gasification material from the gasification material storage section 6 to the gas introduction pipe 7 is stopped, the actuator 10 is operated to move the gas supply control valve 9 in the target direction, and the gasification material storage section 6 It is in a state of being cut off from the introduction pipe 7 (FIG. 1).

[0007]

In such an apparatus, as described above, when supplying the sublimated gasified material from the gasified material storage section 6 to the gas introduction pipe 7, the valve 9 is set to the opposite target. In the case where the gasification material is placed in the space 8 so as to communicate with the gasification material storage unit 6 and the gas introduction pipe 7 (FIG. 2) and the supply of the gasification material is stopped, , The valve 9 is moved in the direction of the target, and the opening of the gasification material storage section 6 and the gas introduction pipe 7 are moved.
Is completely closed with a valve to shut off the space between the gasified material storage section 6 and the gas introduction pipe 7 (FIG. 1). Further, as described above, the gasification material storage section 6 is configured to be heated by the heater 11 for heating. Therefore, when the supply of the sublimated gasification material to the gas introduction pipe 7 is stopped, the valve 9 contacts a part of the wall of the gasification material storage unit 6, and the wall of the gasification material storage unit 6 is closed. The valve 9 is heated by the heater 11 for heating.

However, when the sublimated gasified material is supplied to the gas introducing pipe 7, the valve 9 is located in the space 8 without contacting any part. It cools without being heated. For this reason, a part of the sublimated gasified material that collides with the cold valve 9 adheres to the valve and solidifies on the valve surface. As a result, the valve 9 may not operate.

The present invention has been made to solve such a problem, and an object of the present invention is to provide a new focused ion beam apparatus.

[0010]

A focused ion beam apparatus according to the present invention comprises an ion beam irradiation system for irradiating a target placed on a stage with a focused ion beam, and a gas irradiation portion on the target. A focused ion beam apparatus provided with a gas introduction mechanism for spraying gas, wherein the gas introduction mechanism includes a gasification material storage section, a gas introduction pipe for guiding gas that has been gasified in the storage section onto the target, A valve for controlling the supply of gas from the gasification material storage section to the gas introduction pipe; and a heating means for heating the gasification material, wherein a heating means for heating the valve is provided. It is characterized by the following.

Further, the focused ion beam apparatus according to the present invention is characterized in that a heater is built in a valve. or,
The focused ion beam device of the present invention includes an ion beam irradiation system for irradiating a target mounted on a stage with a focused ion beam, and a gas introduction mechanism for blowing gas to an ion beam irradiation location on the target. A focused ion beam device, wherein the gas introduction mechanism includes a gasification material storage unit, a gas introduction pipe for guiding gas gasified in the storage unit onto the target, the gasification material storage unit and the gas A valve for controlling supply of gas from the gasification material storage section to the gas introduction pipe based on movement in a space connecting the introduction pipe, and heating means for heating the gasification material storage section; And when the gas is supplied from the gasification material storage section to the gas introduction pipe based on the movement of the valve in the space, and when the gas is not supplied, the valve operates the gas valve. Characterized in that form in contact with the part of the container which encloses the space portion that is connected to a part or the gasification material storage of reducing material accommodating portion.

[0012]

Embodiments of the present invention will be described below in detail with reference to the drawings.

FIGS. 3 and 4 show a schematic example of a focused ion beam apparatus according to the present invention, in which the same reference numerals as in FIGS. 1 and 2 denote the same components.

The configuration shown in FIGS. 3 and 4 differs from the configuration shown in FIGS. 1 and 2 in the configuration of a gas supply control valve 9. 3 and 4, a heating heater 12 is provided in the valve 9. That is, the structure is such that the gas supply control valve 9 is heated by the heater 12.

In the focused ion beam apparatus having such a structure, for example, when deposition is performed, the actuator 10 is actuated based on an external command to move the gas supply control valve 9 in the direction of the target, thereby causing the gasification material to move. After the space between the storage section 6 and the gas introduction pipe 7 is shut off (FIG. 3), the interior of the target chamber 2 is evacuated to a predetermined degree of vacuum by an exhaust means (not shown), and then the heaters 11 and 12 are heated. Is turned on to heat and sublimate (gasify) the gasification material (for example, an organic metal in the case of deposition or the like) stored in the gasification material storage unit 6 and simultaneously control the gas supply. The valve 9 is heated. Therefore, the valve 9 is directly heated by the heating heater 12 and at the same time, is heated by the heating heater 11 via the wall of the gasified material storage section 6.

Next, the actuator 10 is actuated based on a command from the outside, and the gas supply control valve 9 is moved in the direction opposite to the target so that the gasification material storage section 6 and the gas introduction pipe 7 communicate with each other. State (FIG. 4).
As a result, the gasified material sublimated in the storage section 6 passes through the gas introduction pipe 7 and is blown out onto the target 3 from the nozzle section at the tip thereof. Along with the injection of the gasified material onto the material, a focused ion beam from an ion source (not shown) of the focused ion beam optical system barrel 1 is irradiated to a predetermined position on the target, so that the gas is brought to that position. Material is deposited. At this time, the valve 9 is directly heated by the heater 12 continuously. Therefore, even if a part of the sublimated gasified material collides with the valve 9, the sublimated gasified material does not adhere to the valve surface because the valve is in a heated state. When the supply of the gasification material from the gasification material storage section 6 to the gas introduction pipe 7 is stopped, the actuator 10 is operated to move the gas supply control valve 9 in the target direction, and the gasification material storage section 6 It is in a state of being cut off from the introduction pipe 7 (FIG. 3).

FIGS. 5 and 6 show another schematic example of the focused ion beam apparatus according to the present invention.
Those denoted by the same reference numerals indicate the same components.

The structure shown in FIGS. 5 and 6 differs from the structure shown in FIGS. 1 and 2 in the structure of a gas supply control valve. 5 and 6, the dimension of the gas supply control valve 9 ′ in the optical axis O direction is different from that of the gasification material storage section 6.
When the valve and the gas introducing pipe 7 are in communication with each other, the valve has a thickness such that the valve comes into contact with a part of the container wall forming the space 8 connected to the gasified material storage section 6. The valve is being made.

In the focused ion beam apparatus having such a structure, for example, when deposition is performed, the actuator 10 is actuated based on an external command, and the gas supply control valve 9 'is moved in the direction of the target to produce gas. In a state where the space between the material storage section 6 and the gas introduction pipe 7 is shut off (FIG. 5), the inside of the target chamber 2 is evacuated (not shown) to a predetermined degree of vacuum. The gasification material (for example, an organic metal in the case of deposition or the like) stored in the gasification material storage section 6 is turned on to heat and sublimate (gasify). At this time, the gas supply control valve 9 ′ is connected to the heating heater 11 through the wall of the gasification material storage unit 6.
Is heated.

Next, the actuator 10 is actuated based on a command from the outside, and the gas supply control valve 9 'is moved in the direction opposite to the target by a predetermined stroke, so that the gasification material storage section 6 and the gas introduction pipe 7 are moved. (FIG. 6). In this state, the valve 9 ′ is in contact with a part of the container wall forming the space 8 connected to the gasification material storage section 6. As a result, the gasified material sublimated in the storage section 6 passes through the gas introduction pipe 7,
It is blown out toward the target 3 from the nozzle portion at the tip. At this time, the valve 9 is heated by the heater 11 via the wall of the gasification material storage section 6 and a part of the container wall forming the space 8 connected to the gasification material storage section 6. I have. Therefore, even if a part of the sublimated gasified material collides with the valve 9 ', the valve 9' is in a heated state, so that the sublimated gasified material does not adhere to the valve surface. Absent. When the supply of the gasification material from the gasification material storage unit 6 to the gas introduction pipe 7 is stopped, the actuator 10 is operated to move the gas supply control valve 9 ′ in the target direction, and the gasification material storage unit 6 is stopped. In the above example, the focused ion beam device in which the gas introduction mechanism is provided in the chamber is shown, but a part of the gas introduction tube is provided in the chamber. A gasification storage container in which the gasification material is stored, a pipe for guiding the gasification material gasified in the gasification storage container to a gas introduction pipe in the chamber, and a gasified gas into the chamber. Needless to say, the present invention is also applicable to a gas introduction mechanism in which a valve or the like for controlling the introduction of the chemical material is provided outside the chamber.

[Brief description of the drawings]

FIG. 1 shows a schematic example of a conventional focused ion beam apparatus.

FIG. 2 shows a schematic example of a conventional focused ion beam apparatus.

FIG. 3 shows a schematic example of a focused ion beam device of the present invention.

FIG. 4 shows a schematic example of a focused ion beam device of the present invention.

FIG. 5 shows another schematic example of the focused ion beam device of the present invention.

FIG. 6 shows another schematic example of the focused ion beam device of the present invention.

[Explanation of symbols]

 DESCRIPTION OF SYMBOLS 1 ... Focused ion beam optical column 2 ... Target chamber 3 ... Target 4 ... Stage 5 ... Gas introduction mechanism 6 ... Gasification material storage part 7 ... Gas introduction pipe 8 ... Space part 9, 9 '... Gas supply control valve 10 ... Actuator 11, 12 ... Heater for heating

Claims (3)

[Claims] An ion beam irradiation system for irradiating a target mounted on a stage with a focused ion beam, and a focused ion beam having a gas introduction mechanism for blowing a gas to an ion beam irradiation location on the target. An apparatus, wherein the gas introduction mechanism includes a gasification material storage unit,
A gas introduction pipe for guiding the gas that has been gasified in the storage section onto the target, a valve for controlling the supply of gas from the gasification material storage section to the gas introduction pipe, and a heating section for heating the gasification material. Heating means,
A focused ion beam device provided with a heating unit for heating the bulb. 2. The focused ion beam device according to claim 1, wherein a heater is built in the valve. 3. A focused ion beam including an ion beam irradiation system for irradiating a target mounted on a stage with a focused ion beam, and a gas introduction mechanism for blowing a gas to an ion beam irradiation location on the target. An apparatus, wherein the gas introduction mechanism includes a gasification material storage unit,
A gas introduction pipe for guiding the gas that has been gasified in the storage section onto the target; and a gas introduction pipe that guides the gas from the gasification material storage section based on movement in a space connecting the gasification material storage section and the gas introduction pipe. A valve for controlling the supply of gas to the gas introduction pipe, and heating means for heating the gasification material storage unit, wherein the gasification material storage unit The valve is in contact with a part of the gasified material storage part or a part of the container surrounding the space connected to the gasified material storage part when the gas is supplied to the gas introduction pipe and when the gas is not supplied. Focused ion beam device