JP2001254188A5 - - Google Patents

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Publication number
JP2001254188A5
JP2001254188A5 JP2000067107A JP2000067107A JP2001254188A5 JP 2001254188 A5 JP2001254188 A5 JP 2001254188A5 JP 2000067107 A JP2000067107 A JP 2000067107A JP 2000067107 A JP2000067107 A JP 2000067107A JP 2001254188 A5 JP2001254188 A5 JP 2001254188A5
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JP
Japan
Prior art keywords
dielectric window
processing chamber
processing apparatus
coil electrode
inductively coupled
Prior art date
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Application number
JP2000067107A
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English (en)
Japanese (ja)
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JP4469054B2 (ja
JP2001254188A (ja
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Publication date
Application filed filed Critical
Priority to JP2000067107A priority Critical patent/JP4469054B2/ja
Priority claimed from JP2000067107A external-priority patent/JP4469054B2/ja
Priority to TW090104983A priority patent/TWI247050B/zh
Priority to KR1020010011090A priority patent/KR100778294B1/ko
Publication of JP2001254188A publication Critical patent/JP2001254188A/ja
Publication of JP2001254188A5 publication Critical patent/JP2001254188A5/ja
Application granted granted Critical
Publication of JP4469054B2 publication Critical patent/JP4469054B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2000067107A 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置 Expired - Fee Related JP4469054B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000067107A JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置
TW090104983A TWI247050B (en) 2000-03-10 2001-03-05 Inductively coupled plasma treatment apparatus
KR1020010011090A KR100778294B1 (ko) 2000-03-10 2001-03-05 유도결합형 플라스마 처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000067107A JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2001254188A JP2001254188A (ja) 2001-09-18
JP2001254188A5 true JP2001254188A5 (https=) 2006-12-07
JP4469054B2 JP4469054B2 (ja) 2010-05-26

Family

ID=18586350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000067107A Expired - Fee Related JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP4469054B2 (https=)
KR (1) KR100778294B1 (https=)
TW (1) TWI247050B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040019608A (ko) * 2002-08-28 2004-03-06 가부시키가이샤 히다치 하이테크놀로지즈 플라즈마처리장치 및 플라즈마처리방법
US8356575B2 (en) * 2005-09-09 2013-01-22 Ulvac, Inc. Ion source and plasma processing apparatus
JP5822133B2 (ja) * 2011-12-22 2015-11-24 サムコ株式会社 誘導結合形プラズマ処理装置のマスク部材
JP6762026B2 (ja) * 2016-08-17 2020-09-30 サムコ株式会社 誘導結合型プラズマ処理装置
JP6867686B2 (ja) * 2017-06-30 2021-05-12 株式会社 セルバック 接合装置
JP7469625B2 (ja) * 2020-04-13 2024-04-17 日新電機株式会社 プラズマ源及びプラズマ処理装置
JP7688258B2 (ja) * 2021-08-04 2025-06-04 日新電機株式会社 プラズマ処理装置
JP2024067696A (ja) * 2022-11-07 2024-05-17 日新電機株式会社 プラズマ処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371176B2 (ja) * 1995-01-25 2003-01-27 ソニー株式会社 プラズマ処理装置および半導体装置の製造方法
EP0831680A4 (en) * 1996-03-28 2000-02-02 Sumitomo Metal Ind DEVICE AND METHOD FOR TREATING PLASMA
TW409487B (en) * 1998-04-10 2000-10-21 Sumitomo Metal Ind Microwave plasma treatment apparatus and microwave plasma treatment method

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