JP4469054B2 - 誘導結合形プラズマ処理装置 - Google Patents

誘導結合形プラズマ処理装置 Download PDF

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Publication number
JP4469054B2
JP4469054B2 JP2000067107A JP2000067107A JP4469054B2 JP 4469054 B2 JP4469054 B2 JP 4469054B2 JP 2000067107 A JP2000067107 A JP 2000067107A JP 2000067107 A JP2000067107 A JP 2000067107A JP 4469054 B2 JP4469054 B2 JP 4469054B2
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JP
Japan
Prior art keywords
dielectric window
processing chamber
mask member
processing apparatus
inductively coupled
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP2000067107A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001254188A5 (https=
JP2001254188A (ja
Inventor
道広 平本
博彦 中野
理 辻
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Samco Inc
Original Assignee
Samco Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Samco Inc filed Critical Samco Inc
Priority to JP2000067107A priority Critical patent/JP4469054B2/ja
Priority to TW090104983A priority patent/TWI247050B/zh
Priority to KR1020010011090A priority patent/KR100778294B1/ko
Publication of JP2001254188A publication Critical patent/JP2001254188A/ja
Publication of JP2001254188A5 publication Critical patent/JP2001254188A5/ja
Application granted granted Critical
Publication of JP4469054B2 publication Critical patent/JP4469054B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32238—Windows
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32623—Mechanical discharge control means
    • H01J37/32651—Shields, e.g. dark space shields, Faraday shields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/32—Processing objects by plasma generation
    • H01J2237/33—Processing objects by plasma generation characterised by the type of processing
    • H01J2237/334—Etching
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
    • Y02E30/00—Energy generation of nuclear origin
    • Y02E30/10—Nuclear fusion reactors

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Power Engineering (AREA)
  • Plasma Technology (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP2000067107A 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置 Expired - Fee Related JP4469054B2 (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2000067107A JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置
TW090104983A TWI247050B (en) 2000-03-10 2001-03-05 Inductively coupled plasma treatment apparatus
KR1020010011090A KR100778294B1 (ko) 2000-03-10 2001-03-05 유도결합형 플라스마 처리장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000067107A JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置

Publications (3)

Publication Number Publication Date
JP2001254188A JP2001254188A (ja) 2001-09-18
JP2001254188A5 JP2001254188A5 (https=) 2006-12-07
JP4469054B2 true JP4469054B2 (ja) 2010-05-26

Family

ID=18586350

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000067107A Expired - Fee Related JP4469054B2 (ja) 2000-03-10 2000-03-10 誘導結合形プラズマ処理装置

Country Status (3)

Country Link
JP (1) JP4469054B2 (https=)
KR (1) KR100778294B1 (https=)
TW (1) TWI247050B (https=)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20040019608A (ko) * 2002-08-28 2004-03-06 가부시키가이샤 히다치 하이테크놀로지즈 플라즈마처리장치 및 플라즈마처리방법
US8356575B2 (en) * 2005-09-09 2013-01-22 Ulvac, Inc. Ion source and plasma processing apparatus
JP5822133B2 (ja) * 2011-12-22 2015-11-24 サムコ株式会社 誘導結合形プラズマ処理装置のマスク部材
JP6762026B2 (ja) * 2016-08-17 2020-09-30 サムコ株式会社 誘導結合型プラズマ処理装置
JP6867686B2 (ja) * 2017-06-30 2021-05-12 株式会社 セルバック 接合装置
JP7469625B2 (ja) * 2020-04-13 2024-04-17 日新電機株式会社 プラズマ源及びプラズマ処理装置
JP7688258B2 (ja) * 2021-08-04 2025-06-04 日新電機株式会社 プラズマ処理装置
JP2024067696A (ja) * 2022-11-07 2024-05-17 日新電機株式会社 プラズマ処理装置

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3371176B2 (ja) * 1995-01-25 2003-01-27 ソニー株式会社 プラズマ処理装置および半導体装置の製造方法
EP0831680A4 (en) * 1996-03-28 2000-02-02 Sumitomo Metal Ind DEVICE AND METHOD FOR TREATING PLASMA
TW409487B (en) * 1998-04-10 2000-10-21 Sumitomo Metal Ind Microwave plasma treatment apparatus and microwave plasma treatment method

Also Published As

Publication number Publication date
TWI247050B (en) 2006-01-11
JP2001254188A (ja) 2001-09-18
KR20010102839A (ko) 2001-11-16
KR100778294B1 (ko) 2007-11-22

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