JP2001234073A - Resin composition for semiconductor sealing and sealed semiconductor device - Google Patents

Resin composition for semiconductor sealing and sealed semiconductor device

Info

Publication number
JP2001234073A
JP2001234073A JP2000042113A JP2000042113A JP2001234073A JP 2001234073 A JP2001234073 A JP 2001234073A JP 2000042113 A JP2000042113 A JP 2000042113A JP 2000042113 A JP2000042113 A JP 2000042113A JP 2001234073 A JP2001234073 A JP 2001234073A
Authority
JP
Japan
Prior art keywords
resin composition
resin
semiconductor
sealing
ethyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000042113A
Other languages
Japanese (ja)
Inventor
Yuko Takahashi
優子 高橋
Masahiko Ito
昌彦 伊藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kyocera Chemical Corp
Original Assignee
Toshiba Chemical Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Chemical Corp filed Critical Toshiba Chemical Corp
Priority to JP2000042113A priority Critical patent/JP2001234073A/en
Publication of JP2001234073A publication Critical patent/JP2001234073A/en
Pending legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To provide a resin composition for semiconductor sealing more excellent in respect to a storage stability, a thermal resistance of the hardened material and preventing property to discoloration of a white colored sealing material without damaging formerly dissolved character such as a thermal conductivity or the like and a sealed semiconductor device. SOLUTION: This resin composition for semiconductor sealing includes (A) an inorganic filler, (B) titanium dioxide, (C) 2,2'-methylenebis(4-ethyl-6-tert- butylphenol) and (D) a thermosetting resin as essential component, and includes (A) 30-95 wt.% of the inorganic filler, (B) 1-40 wt.% of the titanium dioxide, (C) 0.01-5 wt.% of the 2,2'-methylenebis(4-ethyl-6-tert-butylphenol) to the resin composition. The sealed semiconductor device comprises a semiconductor tip sealed with the resin composition for semiconductor sealing.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体等の電子部
品の封止用樹脂組成物に関する。更に詳しくは白色封止
材によって樹脂封止されるフォトカプラー等の半導体に
用いられる耐変色性に優れ、高信頼性、保存安定性にも
優れたエポキシ樹脂組成物および半導体封止装置に関す
る。
The present invention relates to a resin composition for sealing electronic parts such as semiconductors. More specifically, the present invention relates to an epoxy resin composition excellent in discoloration resistance, high reliability, and excellent storage stability used in a semiconductor such as a photocoupler resin-sealed with a white sealing material, and a semiconductor sealing device.

【0002】[0002]

【従来の技術】半導体および電子部品は、それを外部環
境から保護するためにセラミックパッケージまたは樹脂
パッケージなどで封止されているが、この封止材料につ
いてはコスト、生産性等の面から無機質充填剤を含有さ
せた合成樹脂組成物によるものが普及している。
2. Description of the Related Art Semiconductor and electronic components are sealed with a ceramic package or a resin package in order to protect them from the external environment. However, this sealing material is not filled with an inorganic material in terms of cost and productivity. The use of a synthetic resin composition containing an agent is widespread.

【0003】この合成樹脂組成物は、エポキシ樹脂等の
熱硬化性樹脂とシリカ等の無機質充填剤とから構成され
ているが、これらの組成物は熱膨張係数が小さく、良熱
伝導性、低透湿性で機械的特性に優れ、かつ保存安定性
にも優れており、しかも低コストであるものが望まし
い。特に、白色封止材においては、成形後およびポスト
キュア後の硬化物の反射率が高く、変色が少ないことが
望ましい。
[0003] This synthetic resin composition is composed of a thermosetting resin such as an epoxy resin and an inorganic filler such as silica. These compositions have a small coefficient of thermal expansion, good thermal conductivity and low thermal conductivity. It is desirable that the material has excellent moisture permeability, excellent mechanical properties, excellent storage stability, and low cost. In particular, in the case of a white sealing material, it is desirable that the cured product after molding and post-curing has a high reflectance and a small discoloration.

【0004】しかしながら、主剤にエポキシ樹脂を用
い、硬化剤としてフェノール樹脂やアミン系または酸無
水物系硬化剤等を用いた樹脂組成物は、熱硬化性に優れ
ている反面、保存安定性が悪くかった。また、硬化物が
熱酸化による変色を起こしやすく、白色封止材では特に
成形直後の変色やポストキュア後の変色、反射率の低下
を起こしやすった。
However, a resin composition using an epoxy resin as a main component and a phenol resin or an amine-based or acid anhydride-based curing agent as a curing agent is excellent in thermosetting properties, but has poor storage stability. won. Further, the cured product was liable to undergo discoloration due to thermal oxidation, and the white encapsulant was susceptible to discoloration immediately after molding, discoloration after post-cure, and a decrease in reflectance.

【0005】[0005]

【発明が解決しようとする課題】本発明は、上記の欠点
を解消するためになされたもので、熱伝導性など従来解
決されていた特性を損なうことなく、保存安定性や硬化
物の耐熱酸化、白色封止材の変色性防止といった面でよ
り優れた封止用樹脂組成物および半導体封止装置を提供
しようとするものである。
SUMMARY OF THE INVENTION The present invention has been made in order to solve the above-mentioned drawbacks, and it has been found that storage stability and heat-resistant oxidation of a cured product can be achieved without deteriorating characteristics which have been conventionally solved, such as thermal conductivity. Another object of the present invention is to provide a sealing resin composition and a semiconductor sealing device which are more excellent in terms of preventing discoloration of a white sealing material.

【0006】[0006]

【課題を解決するための手段】本発明者らは、上記の目
的を達成しようと鋭意研究を重ねた結果、後述する組成
の熱硬化性樹脂を使用することによって、上記目的が達
成されることを見いだし、本発明を完成したものであ
る。
Means for Solving the Problems The inventors of the present invention have conducted intensive studies to achieve the above-mentioned object, and as a result, the use of a thermosetting resin having a composition described later has achieved the above object. The present invention has been completed.

【0007】即ち、本発明は、(A)無機質充填剤、
(B)酸化チタン、(C)2,2′−メチレンビス(4
−エチル−6−tert−ブチルフェノール)および
(D)熱硬化性樹脂を必須成分とし、樹脂組成物に対し
て、前記(A)無機質充填剤を30〜95重量%、
(B)酸化チタンを1〜40重量%、(C)2,2′−
メチレンビス(4−エチル−6−tert−ブチルフェ
ノール)を0.01〜5重量%の割合で含有してなるこ
とを特徴とする封止用樹脂組成物である。またこの封止
用樹脂組成物の硬化物によって、半導体チップを封止し
てなることを特徴とする半導体封止装置である。
That is, the present invention provides (A) an inorganic filler,
(B) titanium oxide, (C) 2,2'-methylenebis (4
-Ethyl-6-tert-butylphenol) and (D) a thermosetting resin as essential components, and (A) the inorganic filler in an amount of 30 to 95% by weight based on the resin composition;
(B) 1 to 40% by weight of titanium oxide, (C) 2,2'-
A sealing resin composition comprising methylene bis (4-ethyl-6-tert-butylphenol) at a ratio of 0.01 to 5% by weight. Further, there is provided a semiconductor encapsulating apparatus characterized in that a semiconductor chip is encapsulated with a cured product of the encapsulating resin composition.

【0008】以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.

【0009】本発明の樹脂組成物は、無機質充填剤、酸
化チタンおよび2,2′−メチレンビス(4−エチル−
6−tert−ブチルフェノール)を熱硬化性樹脂に配
合させたものである。
The resin composition of the present invention comprises an inorganic filler, titanium oxide and 2,2'-methylenebis (4-ethyl-
6-tert-butylphenol) in a thermosetting resin.

【0010】本発明に用いる(A)無機質充填剤として
は、シリカ、炭酸カルシウム、アルミナといった無機化
合物等が挙げられ、これらは単独又は2種以上混合して
使用することができる。無機質充填剤の配合割合は、全
体の樹脂組成物に対して30〜90重量%含有すること
が望ましい。この割合が30重量%未満では成形品の吸
湿性が高く、半田浸漬後の耐湿性に劣り、90重量%を
超えると極端に成形材料の流動性、成形性が悪くなり好
ましくない。
Examples of the inorganic filler (A) used in the present invention include inorganic compounds such as silica, calcium carbonate, and alumina. These can be used alone or in combination of two or more. The mixing ratio of the inorganic filler is desirably 30 to 90% by weight based on the entire resin composition. If this proportion is less than 30% by weight, the molded article has high moisture absorption and is inferior in moisture resistance after solder immersion. If it exceeds 90% by weight, the fluidity and moldability of the molding material are extremely deteriorated, which is not preferable.

【0011】本発明に用いる(B)酸化チタンの配合割
合は、全体の樹脂組成物に対して1〜40重量%含有す
ることが望ましい。この割合が1重量%未満では白色度
が十分でなく、40重量%をを超えると半導体装置の特
性を損うおそれがある。
The mixing ratio of titanium oxide (B) used in the present invention is preferably 1 to 40% by weight based on the whole resin composition. If this ratio is less than 1% by weight, the whiteness is not sufficient, and if it exceeds 40% by weight, the characteristics of the semiconductor device may be impaired.

【0012】本発明に用いる(C)2,2′−メチレン
ビス(4−エチル−6−tert−ブチルフェノールと
しては、具体的には、川口化学工業社製、W−500が
挙げられる。2,2′−メチレンビス(4−エチル−6
−tert−ブチルフェノール))の配合割合は、全体
の樹脂組成物に対して0.01〜5重量%含有すること
が望ましい。この割合が0.01重量%未満では、変色
防止に効果なく、また、5重量%を超えると、ブリード
を起していずれも好ましくない。
Specific examples of (C) 2,2'-methylenebis (4-ethyl-6-tert-butylphenol) used in the present invention include W-500 manufactured by Kawaguchi Chemical Industry Co., Ltd. '-Methylenebis (4-ethyl-6
-Tert-butylphenol)) is desirably contained in an amount of 0.01 to 5% by weight based on the entire resin composition. If this proportion is less than 0.01% by weight, there is no effect in preventing discoloration, and if it exceeds 5% by weight, bleeding occurs, and both are not preferred.

【0013】本発明に用いる(D)熱硬化性樹脂として
は、例えば、ユリア樹脂、メラミン樹脂、フェノール樹
脂、レゾルシノール樹脂、エポキシ樹脂、ポリウレタン
樹脂、酢酸ビニル樹脂、ポリビニルアルコール樹脂、ア
クリル樹脂、ビニルウレタン樹脂、シリコーン樹脂、α
−オレフィン無水マレイン酸樹脂、ポリアミド樹脂、ポ
リイミド樹脂等が挙げられ、これらは、単独もしくは2
種以上混合して用いることができるが、このなかで、エ
ポキシ樹脂が工業的に有利に用いることができる。熱硬
化性樹脂の配合割合は、全体の樹脂組成物に対して5〜
50重量%含有することが望ましい。これら熱硬化性樹
脂の配合量には、それぞれの硬化剤、触媒の配合量が含
まれる。
The thermosetting resin (D) used in the present invention includes, for example, urea resin, melamine resin, phenol resin, resorcinol resin, epoxy resin, polyurethane resin, vinyl acetate resin, polyvinyl alcohol resin, acrylic resin, vinyl urethane Resin, silicone resin, α
-Olefin maleic anhydride resin, polyamide resin, polyimide resin and the like, and these may be used alone or
A mixture of more than two kinds can be used, and among them, epoxy resins can be used industrially advantageously. The compounding ratio of the thermosetting resin is 5 to the entire resin composition.
It is desirable to contain 50% by weight. The compounding amounts of these thermosetting resins include the compounding amounts of the respective curing agents and catalysts.

【0014】本発明において、熱硬化性樹脂組成物は、
上述した無機質充填剤、酸化チタン、2,2′−メチレ
ンビス(4−エチル−6−tert−ブチルフェノー
ル)および熱硬化性樹脂を必須成分とするが、本発明の
目的に反しない限度において、また必要に応じて、粘度
調整用の溶剤、カップリング剤その他の添加剤を適宜、
添加配合することができる。その溶剤としては、ジオキ
サン、ソルベントナフサ、工業用ガソリン、酢酸セロソ
ルブ、エチルセロソルブ、ブチルセロソルブアセテー
ト、ブチルカルビトールアセテート、ジメチルホルムア
ミド、ジメチルアセトアミド、N−メチルピロリドン等
が挙げられ、これらは単独又は2種以上混合して使用す
ることができる。
In the present invention, the thermosetting resin composition comprises:
The above-mentioned inorganic filler, titanium oxide, 2,2'-methylenebis (4-ethyl-6-tert-butylphenol) and a thermosetting resin are required as essential components. Depending on the solvent for viscosity adjustment, coupling agent and other additives as appropriate,
It can be added and blended. Examples of the solvent include dioxane, solvent naphtha, industrial gasoline, cellosolve acetate, ethyl cellosolve, butyl cellosolve acetate, butyl carbitol acetate, dimethylformamide, dimethylacetamide, N-methylpyrrolidone, and the like. It can be mixed and used.

【0015】本発明の封止用樹脂組成物を成形材料とし
て調製する場合の一般的な方法としては、前述の熱硬化
性樹脂に無機充填剤、酸化チタン、2,2´−メチレン
ビス(4−エチル−6−tert−ブチルフェノール)
および添加剤などを配合し、通常、ニーダ、ロールミ
ル、ミキサー等を用いて、常法により加熱混練を行い冷
却し、次いで適当な大きさに粉砕して成形材料とするこ
とができる。こうして得られた成形材料は、半導体装置
をはじめとする電子部品あるいは電気部品の封止、被
覆、絶縁等に適用すれば、優れた特性と信頼性を付与さ
せることができる。
As a general method for preparing the encapsulating resin composition of the present invention as a molding material, an inorganic filler, titanium oxide, 2,2'-methylenebis (4- Ethyl-6-tert-butylphenol)
The mixture is mixed with additives and the like, and usually heated and kneaded using a kneader, a roll mill, a mixer or the like in a usual manner, cooled, and then pulverized to an appropriate size to obtain a molding material. If the molding material thus obtained is applied to sealing, coating, insulating, etc. of electronic parts or electric parts such as semiconductor devices, excellent properties and reliability can be imparted.

【0016】本発明の半導体封止装置は、上記のように
して得られた封止用樹脂を用いて、半導体チップを封止
することにより容易に製造することができる。封止を行
う半導体装置としては、例えば集積回路、大規模集積回
路、トランジスタ、サイリスタ、ダイオード等で特に限
定されるものではない。しかし、特に白色封止材を用い
る光回路に対し有効である。封止の最も一般的な方法と
しては、低圧トランスファー成形法があるが、射出成
形、圧縮成形、注型等による封止も可能である。封止用
樹脂組成物を封止の際に加熱して硬化させ、最終的には
この組成物の硬化物によって封止された半導体封止装置
が得られる。加熱による硬化は、150℃以上に加熱し
て硬化させることが望ましい。
The semiconductor sealing device of the present invention can be easily manufactured by sealing a semiconductor chip using the sealing resin obtained as described above. As a semiconductor device for sealing, for example, an integrated circuit, a large-scale integrated circuit, a transistor, a thyristor, a diode, and the like are not particularly limited. However, it is particularly effective for an optical circuit using a white sealing material. The most common sealing method is a low-pressure transfer molding method, but sealing by injection molding, compression molding, casting or the like is also possible. The sealing resin composition is heated and cured at the time of sealing, and finally a semiconductor sealing device sealed with a cured product of this composition is obtained. Curing by heating is desirably performed by heating to 150 ° C. or higher.

【0017】[0017]

【作用】本発明の封止用樹脂組成物および半導体封止装
置は、樹脂成分と充填剤成分に加えて酸化チタンと、
2,2′−メチレンビス(4−エチル−6−tert−
ブチルフェノール)を用いたことによって、目的とする
特性が得られるものである。即ち、充填性や作業性が良
く、樹脂硬化物の外観や耐変色性の著しく向上した半導
体等の電子部品を成形することができる。
The encapsulating resin composition and the semiconductor encapsulating apparatus according to the present invention comprise a titanium oxide in addition to a resin component and a filler component.
2,2'-methylenebis (4-ethyl-6-tert-
By using (butylphenol), desired characteristics can be obtained. That is, it is possible to mold an electronic component such as a semiconductor having a good filling property and workability, and significantly improved appearance and discoloration resistance of the cured resin.

【0018】[0018]

【発明の実施の形態】次に本発明を実施例によって説明
するが、本発明はこれらの実施例によって限定されるも
のではない。
Next, the present invention will be described with reference to examples, but the present invention is not limited to these examples.

【0019】実施例1〜2 溶融性シリカ充填剤、酸化チタン充填剤と、2,2′−
メチレンビス(4−エチル−6−tert−ブチルフェ
ノール)(川口化学工業社製、W−500)と、エポキ
シ樹脂を表1に示す割合で配合し、ロールミルにて混練
してこれを冷却粉砕してエポキシ樹脂組成物1,2を製
造した。
Examples 1-2 Fused silica filler, titanium oxide filler and 2,2'-
Methylene bis (4-ethyl-6-tert-butylphenol) (W-500, manufactured by Kawaguchi Chemical Co., Ltd.) and an epoxy resin were blended in the ratio shown in Table 1, kneaded with a roll mill, and cooled and pulverized to obtain an epoxy resin. Resin compositions 1 and 2 were produced.

【0020】比較例1〜2 同様に、溶融性シリカ充填剤、酸化チタン充填剤と、エ
ポキシ樹脂を表1に示す割合で配合し、ロールミルにて
混練してこれを冷却粉砕してエポキシ樹脂組成物3,4
を製造した。
Comparative Examples 1 and 2 Similarly, a fusible silica filler, a titanium oxide filler and an epoxy resin were blended in the proportions shown in Table 1, kneaded in a roll mill, and cooled and pulverized to form an epoxy resin composition. Thing 3,4
Was manufactured.

【0021】実施例1〜2および比較例1〜2で得たエ
ポキシ樹脂組成物の流動性をみるために、高化式フロー
粘度および800nmの光反射率等を測定した。
In order to check the fluidity of the epoxy resin compositions obtained in Examples 1 and 2 and Comparative Examples 1 and 2, the flow viscosity at 800 nm and the light reflectance at 800 nm were measured.

【0022】その結果を表1に示したが、実施例1〜2
の樹脂組成物1,2は、比較例1〜2の樹脂組成物3,
4の樹脂組成物と同様の流動性をもち、保存安定性およ
びポストキュア後の耐変色性に優れていることが確認さ
れた。
The results are shown in Table 1. Examples 1 and 2
The resin compositions 1 and 2 of Comparative Examples 1 and 2
It has been confirmed that the resin composition has the same fluidity as the resin composition of No. 4, and has excellent storage stability and resistance to discoloration after post-cure.

【0023】[0023]

【表1】 *1:クレゾールノボラックエポキシ樹脂とノボラック
フェノール樹脂を等量配合し、有機リン系触媒を用いた
もの。
[Table 1] * 1: Cresol novolak epoxy resin and novolak phenol resin are mixed in equal amounts and an organic phosphorus-based catalyst is used.

【0024】*2:島津フローテスターCFT−500
型により175℃、荷重10kgの条件で測定した。
* 2: Shimadzu flow tester CFT-500
It was measured at 175 ° C. and a load of 10 kg by a mold.

【0025】*3:175℃×2分硬化条件で成形した
成形品表面を、日本分光社製、紫外可視分光光度計V−
530型により測定した。
* 3: The surface of the molded article molded under the curing conditions of 175 ° C. × 2 minutes was measured with an ultraviolet-visible spectrophotometer V-
It was measured by Model 530.

【0026】*4:*3の成形品を175℃×8時間の
ポストキュアをし、そのポストキュア成形品表面ついて
測定した。
* 4: The molded article of * 3 was post-cured at 175 ° C. for 8 hours, and the surface of the post-cured molded article was measured.

【0027】[0027]

【発明の効果】以上の説明および表1から明らかなよう
に、本発明の封止用樹脂組成物は流動性を減少させず
に、保存安定性や耐熱性、白色封止材の耐変色性の改善
をはかることができるため、この樹脂組成物を電子部品
の封止に使用することにより、半導体封止装置の性能・
外観の向上をはかることができる。
As apparent from the above description and Table 1, the encapsulating resin composition of the present invention does not decrease the fluidity, and has storage stability, heat resistance, and discoloration resistance of the white encapsulant. By using this resin composition to seal electronic components, the performance and performance of the semiconductor sealing device can be improved.
The appearance can be improved.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) // C08L 63/00 Fターム(参考) 4J002 BB211 BE021 BF021 BG001 BQ001 CC021 CC161 CC181 CD001 CK001 CL001 CP031 DE137 DE146 DE236 DJ016 EJ038 FD016 FD097 GQ00 4M109 CA21 EA11 EB08 EC11 EC20 GA01 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) // C08L 63/00 F term (Reference) 4J002 BB211 BE021 BF021 BG001 BQ001 CC021 CC161 CC181 CD001 CK001 CL001 CP031 DE137 DE146 DE236 DJ016 EJ038 FD016 FD097 GQ00 4M109 CA21 EA11 EB08 EC11 EC20 GA01

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 (A)無機質充填剤、(B)酸化チタ
ン、(C)2,2′−メチレンビス(4−エチル−6−
tert−ブチルフェノール)および(D)熱硬化性樹
脂を必須成分とし、樹脂組成物に対して、前記(A)無
機質充填剤を30〜95重量%、(B)酸化チタンを1
〜40重量%、(C)2,2′−メチレンビス(4−エ
チル−6−tert−ブチルフェノール)を0.01〜
5重量%の割合で含有してなることを特徴とする封止用
樹脂組成物。
1. An inorganic filler, (B) titanium oxide, (C) 2,2'-methylenebis (4-ethyl-6-).
tert-butylphenol) and (D) a thermosetting resin as essential components, and 30 to 95% by weight of the (A) inorganic filler and 1% of (B) titanium oxide based on the resin composition.
To 40% by weight of (C) 2,2'-methylenebis (4-ethyl-6-tert-butylphenol)
A sealing resin composition comprising 5% by weight.
【請求項2】 請求項1記載の封止用樹脂組成物の硬化
物によって、半導体チップを封止されてなることを特徴
とする半導体封止装置。
2. A semiconductor sealing device, wherein a semiconductor chip is sealed with a cured product of the sealing resin composition according to claim 1.
JP2000042113A 2000-02-21 2000-02-21 Resin composition for semiconductor sealing and sealed semiconductor device Pending JP2001234073A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
JP2001234073A true JP2001234073A (en) 2001-08-28

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Family Applications (1)

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Country Link
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010212717A (en) * 2010-04-30 2010-09-24 Hitachi Chem Co Ltd Substrate for mounting optical semiconductor using light-reflecting thermosetting resin composition, method for manufacturing the same, and optical semiconductor device
JP2013138221A (en) * 2006-02-03 2013-07-11 Hitachi Chemical Co Ltd Method of manufacturing package substrate for mounting optical semiconductor element and method of manufacturing optical semiconductor device using the same
JP2014132693A (en) * 2014-04-03 2014-07-17 Hitachi Chemical Co Ltd Optical semiconductor element mounting substrate and optical semiconductor device
JP2014140070A (en) * 2014-04-14 2014-07-31 Hitachi Chemical Co Ltd Thermosetting resin composition for light reflection, optical semiconductor mounting board using the same, manufacturing method of the same and optical semiconductor device
JP2017132897A (en) * 2016-01-27 2017-08-03 三菱ケミカル株式会社 Epoxy resin composition containing phenolic resin as curing agent, cured product of the same, and electric and electronic component using the cured product

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2013138221A (en) * 2006-02-03 2013-07-11 Hitachi Chemical Co Ltd Method of manufacturing package substrate for mounting optical semiconductor element and method of manufacturing optical semiconductor device using the same
JP2010212717A (en) * 2010-04-30 2010-09-24 Hitachi Chem Co Ltd Substrate for mounting optical semiconductor using light-reflecting thermosetting resin composition, method for manufacturing the same, and optical semiconductor device
JP2014132693A (en) * 2014-04-03 2014-07-17 Hitachi Chemical Co Ltd Optical semiconductor element mounting substrate and optical semiconductor device
JP2014140070A (en) * 2014-04-14 2014-07-31 Hitachi Chemical Co Ltd Thermosetting resin composition for light reflection, optical semiconductor mounting board using the same, manufacturing method of the same and optical semiconductor device
JP2017132897A (en) * 2016-01-27 2017-08-03 三菱ケミカル株式会社 Epoxy resin composition containing phenolic resin as curing agent, cured product of the same, and electric and electronic component using the cured product

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