JP2001223326A - Semiconductor device - Google Patents

Semiconductor device

Info

Publication number
JP2001223326A
JP2001223326A JP2000031545A JP2000031545A JP2001223326A JP 2001223326 A JP2001223326 A JP 2001223326A JP 2000031545 A JP2000031545 A JP 2000031545A JP 2000031545 A JP2000031545 A JP 2000031545A JP 2001223326 A JP2001223326 A JP 2001223326A
Authority
JP
Japan
Prior art keywords
chip
connection
flip
semiconductor device
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000031545A
Other languages
Japanese (ja)
Inventor
Toru Maeda
前田  徹
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Semiconductor Package and Test Solutions Co Ltd
Original Assignee
Hitachi Hokkai Semiconductor Ltd
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Hokkai Semiconductor Ltd, Hitachi Ltd filed Critical Hitachi Hokkai Semiconductor Ltd
Priority to JP2000031545A priority Critical patent/JP2001223326A/en
Publication of JP2001223326A publication Critical patent/JP2001223326A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16135Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/16145Disposition the bump connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/10Bump connectors; Manufacturing methods related thereto
    • H01L2224/15Structure, shape, material or disposition of the bump connectors after the connecting process
    • H01L2224/16Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
    • H01L2224/161Disposition
    • H01L2224/16151Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/16221Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/16225Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/26Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
    • H01L2224/31Structure, shape, material or disposition of the layer connectors after the connecting process
    • H01L2224/32Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
    • H01L2224/321Disposition
    • H01L2224/32135Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip
    • H01L2224/32145Disposition the layer connector connecting between different semiconductor or solid-state bodies, i.e. chip-to-chip the bodies being stacked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48095Kinked
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48225Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
    • H01L2224/48227Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73203Bump and layer connectors
    • H01L2224/73204Bump and layer connectors the bump connector being embedded into the layer connector
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73201Location after the connecting process on the same surface
    • H01L2224/73207Bump and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/73Means for bonding being of different types provided for in two or more of groups H01L2224/10, H01L2224/18, H01L2224/26, H01L2224/34, H01L2224/42, H01L2224/50, H01L2224/63, H01L2224/71
    • H01L2224/732Location after the connecting process
    • H01L2224/73251Location after the connecting process on different surfaces
    • H01L2224/73265Layer and wire connectors
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/01Chemical elements
    • H01L2924/01079Gold [Au]
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/151Die mounting substrate
    • H01L2924/153Connection portion
    • H01L2924/1531Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
    • H01L2924/15311Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

Abstract

PROBLEM TO BE SOLVED: To realize high density mounting by preventing a wire short circuit and reducing in size and thickness in a small-sized semiconductor device of a chip laminated type. SOLUTION: The semiconductor device comprises a tape board 3 for supporting a first chip 1 of a lowermost stage by flip-chip connecting, a wiring film 4 for supporting a second chip 2 laminated and disposed on the first chip by flip-chip connecting, a wire 9 for connecting a connecting electrode 4b of the film 4 to a connecting electrode 3b of the board 3, a plurality of solder bumps 11 disposed on a rear surface 3d of the board 3, and a sealing part 10 for resin-sealing two semiconductor chips, the wire 9 and the like. In this case, the laminated and disposed first and second chips 1, 2 are face down mounted. The flip-chip connecting and the wire bonding are combined to reduce a wire density in the part 10 to prevent a wire short circuit.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置に関
し、特にチップ積層形の半導体装置の高密度実装化に適
用して有効な技術に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device, and more particularly, to a technology effective when applied to high-density mounting of a chip-stacked semiconductor device.

【0002】[0002]

【従来の技術】以下に説明する技術は、本発明を研究、
完成するに際し、本発明者によって検討されたものであ
り、その概要は次のとおりである。
2. Description of the Related Art The technology described below studies the present invention,
Upon completion, they were examined by the inventor, and the outline is as follows.

【0003】近年、小形化された半導体パッケージの一
例として、CSP(Chip Size Package またはChip Sca
le Package) と呼ばれる半導体チップとほぼ同等もしく
は半導体チップより若干大きい程度の小形半導体パッケ
ージが知られている。
In recent years, as an example of a miniaturized semiconductor package, a CSP (Chip Size Package or Chip Sca) has been developed.
There is known a small semiconductor package called a “le package” which is almost equal to or slightly larger than a semiconductor chip.

【0004】また、複数の半導体チップが積層配置され
たチップ積層形の半導体装置(スタックドパッケージと
もいう)においても小形化が要求されており、CSP構
造でのスタックドパッケージの開発が進められている。
[0004] Further, miniaturization of a chip stacked type semiconductor device (also referred to as a stacked package) in which a plurality of semiconductor chips are stacked is also required, and development of a stacked package having a CSP structure has been promoted. I have.

【0005】なお、半導体チップを2段に積層させたス
タックドパッケージについては、例えば、特開平11−
204720号公報にその構造と製造方法が記載されて
いる。
A stacked package in which semiconductor chips are stacked in two stages is described in, for example,
No. 204720 describes its structure and manufacturing method.

【0006】[0006]

【発明が解決しようとする課題】ところが、前記した特
開平11−204720号公報に記載されたスタックド
パッケージでは、これをCSPに適用した場合、パッケ
ージの外観サイズも小さいため、半導体チップの外側周
囲のワイヤリング領域が非常に狭い。
However, in the case of the stacked package described in Japanese Patent Application Laid-Open No. 11-204720, when the package is applied to a CSP, the outer size of the package is small. Wiring area is very small.

【0007】したがって、このCSPでワイヤボンディ
ングを2段に亘って行うと、ワイヤの密度が非常に高く
なり、その結果、モールド時のワイヤ流れによって隣接
するワイヤ同士のワイヤショートが発生することが問題
となる。
[0007] Therefore, when wire bonding is performed in two stages by this CSP, the density of the wires becomes extremely high, and as a result, wire shortage between adjacent wires occurs due to the wire flow during molding. Becomes

【0008】さらに、最上段(2段目)の半導体チップ
がフェイスアップ実装であり、最上段の半導体チップに
対してもワイヤボンディングを行うため、最上段の半導
体チップの上方にワイヤのモールド領域を確保しなけれ
ばならない。
Further, since the uppermost (second) semiconductor chip is face-up mounted and wire bonding is performed on the uppermost semiconductor chip, a wire molding region is formed above the uppermost semiconductor chip. Must be secured.

【0009】したがって、この構造のCSPでは、パッ
ケージの薄形化を図れないことが問題となる。
Therefore, in the CSP having this structure, there is a problem that the package cannot be made thin.

【0010】本発明の目的は、ワイヤショートを防止す
るとともに、小形化・薄形化を図って高密度実装を実現
するチップ積層形の半導体装置を提供することにある。
SUMMARY OF THE INVENTION An object of the present invention is to provide a chip-stacked semiconductor device which realizes high-density mounting by miniaturizing and thinning while preventing a wire short.

【0011】本発明の前記ならびにその他の目的と新規
な特徴は、本明細書の記述および添付図面から明らかに
なるであろう。
The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.

【0012】[0012]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば、
以下のとおりである。
SUMMARY OF THE INVENTION Among the inventions disclosed in the present application, the outline of a representative one will be briefly described.
It is as follows.

【0013】すなわち、本発明の半導体装置は、複数の
半導体チップが積層されて組み込まれたものであり、最
下段に配置される半導体チップを突起電極を介してフリ
ップチップ接続によって支持する共通配線基板と、前記
最下段の半導体チップのフリップチップ接続が行われる
主面と反対側の面に配置され、前記最下段の半導体チッ
プと積層配置される上段の半導体チップを上段の突起電
極を介してフリップチップ接続によって支持する上段配
線基板と、前記上段の突起電極に配線を介して接続され
る前記上段配線基板の接続電極と前記共通配線基板の接
続電極とを接続するボンディング用のワイヤと、前記共
通配線基板のチップ支持面と反対側の面に配置される複
数の外部端子とを有し、積層配置された複数の前記半導
体チップがそれぞれフェイスダウン実装されるととも
に、前記上段の半導体チップの表面電極と前記共通配線
基板の前記接続電極とがフリップチップ接続およびワイ
ヤボンディングによって接続され、前記最下段の半導体
チップが前記共通配線基板にフリップチップ接続されて
いるものである。
That is, the semiconductor device of the present invention is a device in which a plurality of semiconductor chips are stacked and assembled, and a common wiring substrate for supporting the lowermost semiconductor chip by flip-chip connection via bump electrodes. And an upper semiconductor chip, which is arranged on a surface opposite to the main surface of the lowermost semiconductor chip to which flip chip connection is performed and is stacked with the lowermost semiconductor chip, via an upper projection electrode. An upper wiring substrate supported by chip connection, a bonding wire for connecting a connection electrode of the upper wiring substrate connected to the upper protruding electrode via a wiring and a connection electrode of the common wiring substrate, and A plurality of external terminals arranged on a surface opposite to the chip supporting surface of the wiring board, and a plurality of the semiconductor chips arranged in a stack While being mounted face down, the surface electrodes of the upper semiconductor chip and the connection electrodes of the common wiring board are connected by flip chip connection and wire bonding, and the lowermost semiconductor chip is flip chip mounted on the common wiring board. What is connected.

【0014】本発明によれば、最下段の半導体チップが
フリップチップ接続のみによって接続されるため、複数
の半導体チップと最下段の共通配線基板との接続をフリ
ップチップ接続とワイヤボンディングとに分けることが
できる。
According to the present invention, since the lowermost semiconductor chip is connected only by flip chip connection, the connection between the plurality of semiconductor chips and the lowermost common wiring board is divided into flip chip connection and wire bonding. Can be.

【0015】その結果、封止部内のワイヤの密度を低減
することができ、これにより、ワイヤショートを防止す
ることができる。
As a result, it is possible to reduce the density of the wires in the sealing portion, thereby preventing wire shorts.

【0016】[0016]

【発明の実施の形態】以下、本発明の実施の形態を図面
に基づいて詳細に説明する。なお、実施の形態を説明す
るための全図において、同一の機能を有する部材には同
一の符号を付し、その繰り返しの説明は省略する。
Embodiments of the present invention will be described below in detail with reference to the drawings. In all the drawings for describing the embodiments, members having the same functions are denoted by the same reference numerals, and the repeated description thereof will be omitted.

【0017】図1は本発明の実施の形態の半導体装置の
構造の一例を示す断面図、図2は図1に示す半導体装置
の共通配線基板と上段配線基板における配線および接続
電極の配置状態の一例を示す拡大部分平面図、図3は図
1に示す半導体装置の製造方法における共通配線基板へ
のアンダーフィル材形成状態の一例を示す断面図、図4
は図1に示す半導体装置の製造方法における共通配線基
板への1stチップ取り付けと上段配線基板の取り付け
状態の一例を示す断面図、図5は図1に示す半導体装置
の製造方法における上段配線基板への2ndチップ取り
付け状態の一例を示す断面図、図6は図1に示す半導体
装置の製造方法におけるワイヤボンディングの接続状態
の一例を示す断面図、図7は図1に示す半導体装置の製
造方法におけるモールドの状態の一例を示す断面図、図
8は図1に示す半導体装置の製造方法における半田バン
プ取り付け状態の一例を示す断面図である。
FIG. 1 is a sectional view showing an example of the structure of a semiconductor device according to an embodiment of the present invention, and FIG. 2 is a view showing the arrangement of wiring and connection electrodes on a common wiring board and an upper wiring board of the semiconductor device shown in FIG. FIG. 3 is an enlarged partial plan view showing an example. FIG. 3 is a cross-sectional view showing an example of a state of forming an underfill material on a common wiring substrate in the method for manufacturing the semiconductor device shown in FIG.
FIG. 5 is a cross-sectional view showing an example of the first chip mounting on the common wiring substrate and the mounting state of the upper wiring substrate in the method of manufacturing the semiconductor device shown in FIG. 1; FIG. 6 is a cross-sectional view showing an example of a 2nd chip attachment state of FIG. 6, FIG. 6 is a cross-sectional view showing an example of a connection state of wire bonding in the method of manufacturing the semiconductor device shown in FIG. 1, and FIG. 7 is a method of manufacturing the semiconductor device shown in FIG. FIG. 8 is a cross-sectional view showing an example of a state of a mold, and FIG. 8 is a cross-sectional view showing an example of a solder bump mounting state in the method of manufacturing the semiconductor device shown in FIG.

【0018】図1に示す本実施の形態の半導体装置は、
複数の半導体チップを積層配置させたチップ積層形のも
のであり、それぞれの前記半導体チップがフェイスダウ
ン実装でフリップチップ接続されるとともに、複数の前
記半導体チップとインタポーザとなる共通配線基板との
電気的接続に、フリップチップ接続とワイヤボンディン
グとを組み合わせて用いたものである。
The semiconductor device of the present embodiment shown in FIG.
A chip stacked type in which a plurality of semiconductor chips are stacked and arranged. Each of the semiconductor chips is flip-chip connected by face-down mounting, and the electrical connection between the plurality of semiconductor chips and a common wiring substrate serving as an interposer is established. The connection uses a combination of flip-chip connection and wire bonding.

【0019】さらに、前記半導体装置は、その複数の外
部端子が、前記共通配線基板のチップ支持面3cと反対
側の面(以降、裏面3dという)に配置されたエリアア
レイ形のものである。
Further, the semiconductor device is of an area array type in which a plurality of external terminals are arranged on a surface of the common wiring board opposite to the chip supporting surface 3c (hereinafter referred to as a back surface 3d).

【0020】なお、本実施の形態では、前記半導体チッ
プを2段に積層させ、かつ前記半導体装置が小形の半導
体パッケージであるCSP12の場合について説明す
る。
In this embodiment, a case will be described in which the semiconductor chips are stacked in two stages and the semiconductor device is a CSP 12 which is a small semiconductor package.

【0021】したがって、CSP12は、スタック形C
SPとも呼ばれ、例えば、携帯用電子機器などの小形民
生機器に組み込まれるものであるが、2つの半導体チッ
プを有した小形の半導体パッケージであるため、MCM
(Multi-Chip-Module)やシステムLSI(Large Scale
Integration)として利用することも可能である。
Therefore, the CSP 12 is a stack type C
Also called SP, for example, it is incorporated in a small consumer device such as a portable electronic device. However, since it is a small semiconductor package having two semiconductor chips, the MCM
(Multi-Chip-Module) and system LSI (Large Scale)
Integration).

【0022】本実施の形態の図1に示すCSP12の構
成について説明すると、最下段に配置される半導体チッ
プである1stチップ1をAuバンプ6(突起電極)を
介してフリップチップ接続によって支持するテープ基板
3(共通配線基板)と、1stチップ1のフリップチッ
プ接続が行われる主面1aと反対側の面である裏面1c
に配置され、かつ1stチップ1の上に積層配置される
2ndチップ2(上段の半導体チップ)を上段Auバン
プ7(上段の突起電極)を介してフリップチップ接続に
よって支持する配線フィルム4(上段配線基板)と、上
段Auバンプ7に配線4aを介して接続される配線フィ
ルム4のボンディングパッドである接続電極4bとテー
プ基板3のボンディングパッドである接続電極3bとを
接続するボンディング用のワイヤ9と、テープ基板3の
裏面3dに配置される複数の外部端子である半田バンプ
11と、テープ基板3と1stチップ1との間隙および
配線フィルム4と2ndチップ2との間隙を埋めるアン
ダーフィル材5と、2つの半導体チップとワイヤ9など
を樹脂封止して形成された封止部10とからなり、積層
配置された1stチップ1と2ndチップ2とがそれぞ
れフェイスダウン実装でフリップチップ接続されるとと
もに、2ndチップ2のパッド2b(表面電極)とテー
プ基板3の接続電極3bとがフリップチップ接続および
ワイヤボンディングによって接続されるものである。
The structure of the CSP 12 shown in FIG. 1 of the present embodiment will be described. A tape for supporting the first chip 1, which is a semiconductor chip disposed at the lowest level, by flip-chip connection via Au bumps 6 (protruding electrodes) Substrate 3 (common wiring substrate) and back surface 1c opposite to main surface 1a where flip chip connection of 1st chip 1 is performed
And a 2nd chip 2 (upper semiconductor chip) stacked on the 1st chip 1 and supported by flip-chip connection via an upper Au bump 7 (upper projecting electrode). A bonding wire 9 for connecting a connection electrode 4b, which is a bonding pad of the wiring film 4 connected to the upper Au bump 7 via the wiring 4a, to a connection electrode 3b, which is a bonding pad of the tape substrate 3. Solder bumps 11 which are a plurality of external terminals arranged on the back surface 3d of the tape substrate 3, and an underfill material 5 which fills a gap between the tape substrate 3 and the first chip 1 and a gap between the wiring film 4 and the second chip 2. 1st stack consisting of two semiconductor chips and a sealing portion 10 formed by resin-sealing the wires 9 and the like. The flip chip 1 and the 2nd chip 2 are flip-chip connected by face-down mounting, respectively, and the pads 2b (surface electrodes) of the 2nd chip 2 and the connection electrodes 3b of the tape substrate 3 are connected by flip chip connection and wire bonding. Things.

【0023】これにより、本実施の形態のCSP12
は、チップ積層形であるとともに、フリップチップ接続
とワイヤボンディングとを組み合わせたことにより、封
止部10におけるワイヤ密度を少なくしてモールド時の
ワイヤ流れなどによるワイヤショートを防止するもので
ある。
Thus, the CSP 12 according to the present embodiment
Is a chip stacked type, and by combining flip chip connection and wire bonding, reduces the wire density in the sealing portion 10 and prevents wire shorting due to wire flow during molding.

【0024】さらに、フリップチップ接続とワイヤボン
ディングとを組み合わせたことにより、テープ基板3に
おける接続電極3bの数を減らしてチップ積層形のCS
P12の水平方向の面積を小さくし、これにより、パッ
ケージの小形化を図るとともに、最上段の半導体チップ
である2ndチップ2をフェイスダウン実装したことに
より、パッケージの薄形化を図るものである。
Further, by combining flip-chip connection and wire bonding, the number of connection electrodes 3b on the tape substrate 3 is reduced, and the chip-stacked CS
The area of the P12 in the horizontal direction is reduced to thereby reduce the size of the package, and the 2nd chip 2, which is the uppermost semiconductor chip, is mounted face-down to reduce the thickness of the package.

【0025】ここで、CSP12では、1stチップ1
は、テープ基板3に対してその配線3aにフリップチッ
プ接続のみによって接続され、また、2ndチップ2
は、1stチップ1の上段側である裏面1cに取り付け
られた配線フィルム4の配線4aにフリップチップ接続
によって接続され、この配線4aに接続された配線フィ
ルム4の接続電極4bと共通配線基板(インタポーザ)
であるテープ基板3の接続電極3bとがワイヤボンディ
ングによるワイヤ9によって接続されている。
Here, in the CSP 12, the first chip 1
Is connected to the wiring 3a of the tape substrate 3 only by flip-chip connection.
Is connected by flip-chip connection to the wiring 4a of the wiring film 4 attached to the back surface 1c, which is the upper side of the first chip 1, and the connection electrode 4b of the wiring film 4 connected to this wiring 4a and the common wiring board (interposer) )
And the connection electrodes 3b of the tape substrate 3 are connected by wires 9 by wire bonding.

【0026】すなわち、1stチップ1はテープ基板3
に対してフリップチップ接続のみによって接続され、2
ndチップ2はテープ基板3に対してフリップチップ接
続とワイヤボンディングによって接続されている。
That is, the first chip 1 is a tape substrate 3
Connected only by flip chip connection to
The nd chip 2 is connected to the tape substrate 3 by flip chip connection and wire bonding.

【0027】したがって、1stチップ1は、そのパッ
ド1bがAuバンプ6によってテープ基板3の配線3a
に対してフリップチップ接続され、一方、2ndチップ
2は、そのパッド2bが上段Auバンプ7によって配線
フィルム4の配線4aに対してフリップチップ接続され
ている。
Accordingly, the first chip 1 has its pad 1 b whose wiring 3 a of the tape substrate 3 is
On the other hand, the pad 2b of the second chip 2 is flip-chip connected to the wiring 4a of the wiring film 4 by the upper Au bump 7.

【0028】なお、テープ基板3は、例えば、ポリイミ
ドテープなどによって形成され、そこには、図2に示す
ように、銅、金または銀などの金属からなる配線3a、
ボンディングパッドである接続電極3bおよび半田バン
プ搭載用のバンプランド3eなどが形成され、このバン
プランド3eは、テープ基板3のくり抜きによりその裏
面3d側に露出しており、そこに図1に示す外部端子で
ある複数の半田バンプ11が取り付けられている。
The tape substrate 3 is formed of, for example, a polyimide tape or the like, and has a wiring 3a made of a metal such as copper, gold or silver, as shown in FIG.
A connection electrode 3b serving as a bonding pad, a bump land 3e for mounting a solder bump, and the like are formed. The bump land 3e is exposed on the back surface 3d side by hollowing out the tape substrate 3, and the external surface shown in FIG. A plurality of solder bumps 11 as terminals are attached.

【0029】また、配線フィルム4は、その裏面4d
が、1stチップ1の裏面1c側すなわち上段側に熱可
塑性の接着材8または耐熱性の高い両面テープなどによ
って貼り付けられており、テープ基板3と同様に、例え
ば、ポリイミドテープなどによって形成され、その表面
には、銅、金または銀などの金属からなる配線4aやボ
ンディングパッドである接続電極4bが形成されてい
る。
The wiring film 4 has a rear surface 4d.
Is bonded to the back surface 1c side of the 1st chip 1, that is, the upper side by a thermoplastic adhesive 8 or a double-sided tape having high heat resistance, and is formed of, for example, a polyimide tape or the like, like the tape substrate 3. A wiring 4a made of a metal such as copper, gold or silver and a connection electrode 4b as a bonding pad are formed on the surface.

【0030】また、アンダーフィル材5の代わりとし
て、絶縁性のペースト材を用いてもよいが、アンダーフ
ィル材5としてACF(Anisotropic Conductive Film,
異方性導電性フィルム)を用いることが好ましい。
In place of the underfill material 5, an insulating paste material may be used, but as the underfill material 5, ACF (Anisotropic Conductive Film, ACF) may be used.
It is preferable to use an anisotropic conductive film).

【0031】すなわち、ACFを用いて1stチップ1
および2ndチップ2をACF実装してもよく、この場
合には、Auバンプ6および上段Auバンプ7の接続部
は導通が図れるとともに、その周囲には、絶縁部材を埋
め込むことができる。
That is, the first chip 1 using the ACF
In this case, the connection between the Au bump 6 and the upper Au bump 7 can be conducted, and an insulating member can be embedded around the connection.

【0032】また、テープ基板3のチップ支持面側に
は、モールド樹脂、例えば、熱硬化性のエポキシ樹脂な
どを用いたモールドによる封止部10が形成され、これ
により、1stチップ1、2ndチップ2、配線フィル
ム4およびワイヤ9が封止されている。
On the chip supporting surface side of the tape substrate 3, a sealing portion 10 is formed by molding using a molding resin, for example, a thermosetting epoxy resin. 2. The wiring film 4 and the wire 9 are sealed.

【0033】なお、ボンディング用のワイヤ9は、例え
ば、金線などである。
The bonding wire 9 is, for example, a gold wire.

【0034】また、CSP12に搭載される半導体チッ
プの機能としては、例えば、1stチップ1がASIC
(Application Specific Integrated Circuit)、2nd
チップ2がDRAM(Dynamic Random Access Memory)
などのメモリであり、異なった機能の半導体チップを有
したマルチチップパッケージとしてもよい。
As a function of the semiconductor chip mounted on the CSP 12, for example, the first chip 1 is an ASIC.
(Application Specific Integrated Circuit), 2nd
Chip 2 is a DRAM (Dynamic Random Access Memory)
And a multi-chip package having semiconductor chips of different functions.

【0035】これは、1stチップ1は、2ndチップ
2よりも大きいことにより、多ピン対応とすることがで
きるためであり、上段の半導体チップをメモリ用として
組み込むことが好適である。
This is because the first chip 1 is larger than the second chip 2 so that it can handle a large number of pins, and it is preferable to incorporate the upper semiconductor chip for a memory.

【0036】ただし、複数の半導体チップを全てメモリ
としてもよく、または、マイコンとフラッシュメモリな
どとの組み合わせとしてもよい。
However, all of the plurality of semiconductor chips may be used as a memory, or a combination of a microcomputer and a flash memory may be used.

【0037】次に、本実施の形態の半導体装置であるC
SP12の製造方法を説明する。
Next, the semiconductor device C of this embodiment is
A method for manufacturing SP12 will be described.

【0038】まず、図3に示すように、テープ基板3を
準備し、これのチップ支持面3cの1stチップ実装領
域にアンダーフィル材5を塗布または貼り付ける。
First, as shown in FIG. 3, a tape substrate 3 is prepared, and an underfill material 5 is applied or affixed to a first chip mounting area of the chip supporting surface 3c.

【0039】本実施の形態では、アンダーフィル材5と
してACFを用いる場合を説明するが、アンダーフィル
材5の代わりとして絶縁性のペースト材などを塗布して
もよい。
In this embodiment, a case where ACF is used as the underfill material 5 will be described. However, an insulating paste material or the like may be applied instead of the underfill material 5.

【0040】続いて、図4に示すように、1stチップ
1をテープ基板3のチップ支持面3cにフェイスダウン
実装する。
Subsequently, as shown in FIG. 4, the first chip 1 is mounted face-down on the chip supporting surface 3c of the tape substrate 3.

【0041】すなわち、テープ基板3のチップ支持面3
cと1stチップ1の主面1aとを対向させてアンダー
フィル材5であるACF上に1stチップ1を載置し、
熱圧着によって1stチップ1をテープ基板3上に固定
する(マウントする)。
That is, the chip supporting surface 3 of the tape substrate 3
c and the main surface 1a of the first chip 1 are opposed to each other, and the first chip 1 is placed on the ACF as the underfill material 5,
The first chip 1 is fixed (mounted) on the tape substrate 3 by thermocompression bonding.

【0042】これにより、テープ基板3のチップ支持面
3cにAuバンプ6を介して1stチップ1がフリップ
チップ接続される。
As a result, the first chip 1 is flip-chip connected to the chip supporting surface 3c of the tape substrate 3 via the Au bump 6.

【0043】すなわち、1stチップ1の各パッド1b
と、これに対応するテープ基板3の配線3aとがAuバ
ンプ6を介して接続される。
That is, each pad 1b of the first chip 1
And the corresponding wiring 3 a of the tape substrate 3 are connected via the Au bumps 6.

【0044】なお、1stチップ1の裏面1cの配線フ
ィルム4は、予め、ウェハ段階で熱可塑性の接着材8な
どを用いて貼り付けられたものであり、したがって、ダ
イシングして1stチップ1を取得した際には、既にそ
の裏面1cに、接着材8を介して配線フィルム4が貼り
付けられている。
The wiring film 4 on the back surface 1c of the first chip 1 is previously bonded at the wafer stage using a thermoplastic adhesive 8 or the like. Therefore, the first chip 1 is obtained by dicing. In this case, the wiring film 4 is already attached to the back surface 1c via the adhesive 8.

【0045】その後、図5に示すように、1stチップ
1の裏面1c側である1stチップ1の上段側の配線フ
ィルム4のチップ支持面4cの2ndチップ実装領域に
アンダーフィル材5であるACFを配置する。
Thereafter, as shown in FIG. 5, the ACF as the underfill material 5 is placed on the second chip mounting area of the chip supporting surface 4c of the wiring film 4 on the upper stage side of the first chip 1, which is on the back surface 1c side of the first chip 1. Deploy.

【0046】続いて、1stチップ1の上段側におい
て、2ndチップ2を配線フィルム4のチップ支持面4
cにフェイスダウン実装する。
Subsequently, on the upper side of the first chip 1, the second chip 2 is connected to the chip supporting surface 4 of the wiring film 4.
Mount face down on c.

【0047】すなわち、配線フィルム4のチップ支持面
4cと、2ndチップ2の主面2aとを対向させてアン
ダーフィル材5であるACF上に2ndチップ2を載置
し、熱圧着によって2ndチップ2を配線フィルム4上
に固定する(マウントする)。
That is, the chip supporting surface 4c of the wiring film 4 and the main surface 2a of the chip 2 are opposed to each other, and the chip 2 is placed on the ACF which is the underfill material 5, and the chip 2 is thermally compressed. Is fixed (mounted) on the wiring film 4.

【0048】これにより、配線フィルム4のチップ支持
面4cに上段Auバンプ7を介して2ndチップ2がフ
リップチップ接続され、その結果、1stチップ1上に
2ndチップ2が積層配置される。
As a result, the second chip 2 is flip-chip connected to the chip supporting surface 4 c of the wiring film 4 via the upper Au bump 7, and as a result, the second chip 2 is stacked on the first chip 1.

【0049】つまり、2ndチップ2の各パッド2b
と、これに対応する配線フィルム4の配線4aとが上段
Auバンプ7を介して接続される。
That is, each pad 2b of the second chip 2
And the corresponding wiring 4 a of the wiring film 4 are connected via the upper Au bump 7.

【0050】なお、2ndチップ2の固定の際に用いる
アンダーフィル材5として、ACFではなく、例えば、
導電性接着剤などを用いてもよい。
The underfill material 5 used for fixing the second chip 2 is not ACF but, for example,
A conductive adhesive or the like may be used.

【0051】すなわち、ACF同様、前記導電性接着剤
を用いた場合でも、2ndチップ2の固定の際にスクラ
ブなどを行わなくて済むため、1stチップ1への衝撃
を和らげることができる。
That is, similarly to the ACF, even when the conductive adhesive is used, the second chip 2 does not need to be scrubbed when fixed, so that the impact on the first chip 1 can be reduced.

【0052】その後、図6に示すように、配線フィルム
4のボンディングパッドである接続電極4bとテープ基
板3のボンディングパッドである接続電極3bとを金線
のワイヤ9を用いてワイヤボンディングする。
Thereafter, as shown in FIG. 6, the connection electrode 4b, which is a bonding pad of the wiring film 4, and the connection electrode 3b, which is a bonding pad of the tape substrate 3, are wire-bonded using gold wires 9.

【0053】これにより、2ndチップ2とインタポー
ザであるテープ基板3とがフリップチップ接続とワイヤ
ボンディングによって電気的に接続される。
Thus, the second chip 2 and the tape substrate 3 as an interposer are electrically connected by flip chip connection and wire bonding.

【0054】その後、図7に示すように、トランスファ
ーモールドによってテープ基板3のチップ支持面3c側
を樹脂封止し、チップ支持面3c側に封止部10を形成
する。
Thereafter, as shown in FIG. 7, the chip supporting surface 3c side of the tape substrate 3 is resin-sealed by transfer molding, and a sealing portion 10 is formed on the chip supporting surface 3c side.

【0055】続いて、図8に示すように、CSP12の
表裏を反転させ、テープ基板3の裏面3d側を上方に向
け、この裏面3d側に露出した複数のバンプランド3e
に半田バンプ11を取り付ける。
Subsequently, as shown in FIG. 8, the CSP 12 is turned upside down so that the back surface 3d side of the tape substrate 3 faces upward, and a plurality of bump lands 3e exposed on the back surface 3d side.
Solder bumps 11 are attached to the substrate.

【0056】なお、半田バンプ11の取り付け(搭載)
は、例えば、転写法などによって行う。
Attachment (mounting) of solder bump 11
Is performed by, for example, a transfer method.

【0057】これにより、図1に示す本実施の形態のC
SP12の完成となる。
As a result, C of the present embodiment shown in FIG.
SP12 is completed.

【0058】なお、CSP12では、チップセレクト用
として、2ndチップ2のみを接続する場合があり、そ
の際には、例えば、1stチップ1の対応するパッド1
bにはAuバンプ6を接続しないものとする。
In the CSP 12, there is a case where only the second chip 2 is connected for chip selection. In this case, for example, the corresponding pad 1 of the first chip 1 is connected.
It is assumed that no Au bump 6 is connected to b.

【0059】すなわち、Auバンプ6は必ずしも全ての
パッド1bに接続させて配置するものとは限らない。
That is, the Au bumps 6 are not always connected to all the pads 1b.

【0060】本実施の形態の半導体装置(CSP12)
によれば、以下のような作用効果が得られる。
Semiconductor device of this embodiment (CSP 12)
According to this, the following operation and effect can be obtained.

【0061】すなわち、積層配置された複数の半導体チ
ップがそれぞれフェイスダウン実装され、これにより、
1stチップ1(最下段の半導体チップ)がフリップチ
ップ接続のみによって接続されるため、前記複数の半導
体チップとインタポーザである最下段のテープ基板3
(共通配線基板)との接続をフリップチップ接続とワイ
ヤボンディングとに分けることができる。
That is, a plurality of semiconductor chips arranged in a stack are face-down mounted respectively, whereby
Since the first chip 1 (the lowermost semiconductor chip) is connected only by flip-chip connection, the lowermost tape substrate 3 serving as an interposer with the plurality of semiconductor chips.
The connection with the (common wiring board) can be divided into flip chip connection and wire bonding.

【0062】その結果、封止部10内のワイヤ9の密度
を低減することができ、これにより、モールド時のワイ
ヤ流れによるワイヤショートを防止することができる。
As a result, the density of the wires 9 in the sealing portion 10 can be reduced, thereby preventing a wire short due to a wire flow during molding.

【0063】つまり、フリップチップ接続とワイヤボン
ディングとを組み合わせたことにより、ワイヤボンディ
ングだけを用いた従来のチップ積層形の半導体装置と比
較すると、封止部10内のワイヤ9の密度を大幅に低減
することができ、その結果、本実施の形態のチップ積層
形のCSP12においてワイヤショートの発生を防ぐこ
とができる。
That is, the combination of flip-chip connection and wire bonding greatly reduces the density of the wires 9 in the sealing portion 10 as compared with a conventional chip-stacked semiconductor device using only wire bonding. As a result, in the chip-stacked CSP 12 of the present embodiment, it is possible to prevent occurrence of wire short-circuit.

【0064】さらに、フリップチップ接続だけを用いた
従来のチップ積層形の半導体装置と比較すると、本実施
の形態のチップ積層形のCSP12は、外部端子である
半田バンプ11の配置がエリアアレイ形であり、したが
って、高密度実装に適しているのに対し、前記フリップ
チップ接続だけを用いた従来のチップ積層形の半導体装
置は、外部端子となるアウタリードが封止部10から突
出する構造となるため、半導体装置の実装面積が増え
て、その結果、高密度実装には適していない。
Further, as compared with a conventional chip-stacked semiconductor device using only flip-chip connection, the chip-stacked CSP 12 of the present embodiment has an area array type of solder bumps 11 as external terminals. Yes, therefore, while suitable for high-density mounting, the conventional chip-stacked semiconductor device using only the flip-chip connection has a structure in which the outer leads serving as external terminals protrude from the sealing portion 10. However, the mounting area of the semiconductor device increases, and as a result, it is not suitable for high-density mounting.

【0065】これにより、フリップチップ接続とワイヤ
ボンディングとを組み合わせた本実施の形態のチップ積
層形のCSP12の方が高密度実装に適している。
Thus, the chip-stacked CSP 12 of the present embodiment, in which flip-chip connection and wire bonding are combined, is more suitable for high-density mounting.

【0066】また、複数の半導体チップとインタポーザ
であるテープ基板3との接続をフリップチップ接続とワ
イヤボンディングとに分けることにより、テープ基板3
におけるワイヤボンディング用のボンディングパッドで
ある接続電極3bの設置領域も少なくすることができ、
これにより、本実施の形態のチップ積層形の半導体装置
をCSP12として実現できる。
The connection between the plurality of semiconductor chips and the tape substrate 3 as an interposer is divided into flip-chip connection and wire bonding, so that the tape substrate 3
The installation area of the connection electrode 3b, which is a bonding pad for wire bonding, can be reduced.
Thereby, the chip-stacked semiconductor device of the present embodiment can be realized as the CSP 12.

【0067】したがって、チップ積層形の半導体装置の
小形化を実現できる。
Therefore, the miniaturization of the chip-stacked semiconductor device can be realized.

【0068】さらに、積層配置された複数の半導体チッ
プがフェイスダウン実装され、したがって、2ndチッ
プ2(最上段の半導体チップ)もフリップチップ接続と
なるため、この2ndチップ2上にはワイヤ9のための
封止部10の領域を確保する必要性が無くなる。
Further, a plurality of stacked semiconductor chips are mounted face-down, so that the second chip 2 (the uppermost semiconductor chip) is also flip-chip connected, so that the wires 9 are provided on the second chip 2. There is no need to secure an area for the sealing portion 10.

【0069】その結果、2ndチップ2の裏面2cの上
方の封止部10を非常に薄く形成することができ、これ
により、チップ積層形のCSP12の薄形化をさらに図
ることができる。
As a result, the sealing portion 10 above the back surface 2c of the second chip 2 can be formed very thin, whereby the chip stack type CSP 12 can be further thinned.

【0070】すなわち、最上段の半導体チップにワイヤ
ボンディングを行うタイプの従来のチップ積層形の半導
体装置と比較しても本実施の形態のCSP12は薄形化
を図ることができる。
That is, the CSP 12 of the present embodiment can be made thinner than a conventional chip-stacked semiconductor device of the type in which wire bonding is performed on the uppermost semiconductor chip.

【0071】したがって、本実施の形態のチップ積層形
のCSP12は、その小形化および薄形化を図ることが
できるため、このCSP12の高密度実装を実現でき
る。
Therefore, the chip-stacked CSP 12 of the present embodiment can be reduced in size and thickness, and can be mounted at a high density.

【0072】また、積層配置した2ndチップ2をフリ
ップチップ接続とワイヤボンディングによる接続でイン
タポーザであるテープ基板3(共通配線基板)に接続す
るため、新たな設備投資を必要とせず、既存設備の活用
でチップ積層形の小形の半導体装置(CSP12)を製
造でき、したがって、この半導体装置のコストアップを
抑えることができる。
Further, since the 2nd chips 2 arranged in a stack are connected to the tape substrate 3 (common wiring substrate) as an interposer by flip-chip connection and connection by wire bonding, new capital investment is not required and existing equipment can be used. Thus, a small-sized semiconductor device (CSP 12) of a chip-stacked type can be manufactured, so that an increase in the cost of the semiconductor device can be suppressed.

【0073】以上、本発明者によってなされた発明を発
明の実施の形態に基づき具体的に説明したが、本発明は
前記発明の実施の形態に限定されるものではなく、その
要旨を逸脱しない範囲で種々変更可能であることは言う
までもない。
Although the invention made by the inventor has been specifically described based on the embodiments of the present invention, the present invention is not limited to the embodiments of the invention, and does not depart from the gist of the invention. It is needless to say that various changes can be made.

【0074】例えば、前記実施の形態では、半導体装置
の製造方法において、予め裏面1cに配線フィルム4が
貼り付けられた1stチップ1を準備し、その後、1s
tチップ1に2ndチップ2を積層する場合を説明した
が、配線フィルム4への2ndチップ2のフリップチッ
プ接続を前記半導体装置の製造方法とは異なる別工程で
行い、1stチップ1の裏面1c(上段)への2ndチ
ップ2の積層を配線フィルム4ごと行ってもよい。
For example, in the above-described embodiment, in the method of manufacturing a semiconductor device, the first chip 1 having the wiring film 4 adhered to the back surface 1c in advance is prepared.
Although the case where the 2nd chip 2 is laminated on the t chip 1 has been described, the flip chip connection of the 2nd chip 2 to the wiring film 4 is performed in another process different from the method of manufacturing the semiconductor device, and the back surface 1c ( The lamination of the 2nd chip 2 on the upper stage) may be performed together with the wiring film 4.

【0075】また、前記実施の形態では、チップ積層数
が2段の場合を説明したが、前記チップ積層数は、2段
以上であれば何段であってもよい。
In the above embodiment, the case where the number of stacked chips is two is described. However, the number of stacked chips may be any number as long as it is two or more.

【0076】また、前記実施の形態では、共通配線基板
および配線フィルム4がポリイミドテープなどの基板か
らなる場合を説明したが、両基板は、ポリイミドテープ
の基板に限定されずに、例えば、ガラス入りのエポキシ
樹脂などからなる樹脂基板やセラミック基板などであっ
てもよい。
Further, in the above embodiment, the case where the common wiring substrate and the wiring film 4 are made of a substrate such as a polyimide tape has been described. However, the two substrates are not limited to the substrate of the polyimide tape. A resin substrate or a ceramic substrate made of epoxy resin or the like may be used.

【0077】さらに、前記実施の形態では、封止部10
がトランスファーモールドによって形成される場合を説
明したが、封止部10は、ポッティングによって形成し
てもよい。
Further, in the above embodiment, the sealing portion 10
Is formed by transfer molding, but the sealing portion 10 may be formed by potting.

【0078】また、前記実施の形態では、半導体装置が
CSP12の場合について説明したが、前記半導体装置
は、チップ積層形で、かつ外部端子がエリアアレイ配置
であり、さらに、それぞれの半導体チップがフェイスダ
ウン実装でフリップチップ接続されるとともに、フリッ
プチップ接続とワイヤボンディングとを組み合わせた接
続のものであれば、CSP12以外の例えば、LGA
(Land Grid Array)などであってもよい。
In the above embodiment, the case where the semiconductor device is the CSP 12 has been described. However, the semiconductor device is of a chip stack type, the external terminals are arranged in an area array, and each semiconductor chip is a face-to-face type. If the flip-chip connection is performed by down mounting and the connection is a combination of the flip-chip connection and the wire bonding, for example, an LGA other than the CSP 12 may be used.
(Land Grid Array).

【0079】[0079]

【発明の効果】本願において開示される発明のうち、代
表的なものによって得られる効果を簡単に説明すれば、
以下のとおりである。
Advantageous effects obtained by typical ones of the inventions disclosed in the present application will be briefly described.
It is as follows.

【0080】(1).積層配置された複数の半導体チッ
プがそれぞれフェイスダウン実装され、これにより、最
下段の半導体チップがフリップチップ接続のみによって
接続されるため、複数の半導体チップと最下段の共通配
線基板との接続をフリップチップ接続とワイヤボンディ
ングとに分けることができる。その結果、封止部内のワ
イヤの密度を低減することができ、これにより、モール
ド時のワイヤ流れによるワイヤショートを防止すること
ができる。
(1). A plurality of semiconductor chips arranged in a stack are mounted face-down, and the lowermost semiconductor chip is connected only by flip-chip connection, so that the connection between the plurality of semiconductor chips and the lowermost common wiring board is flipped. It can be divided into chip connection and wire bonding. As a result, it is possible to reduce the density of the wires in the sealing portion, thereby preventing a wire short due to a wire flow during molding.

【0081】(2).複数の半導体チップと最下段の共
通配線基板との接続をフリップチップ接続とワイヤボン
ディングとに分けることにより、共通配線基板における
ワイヤボンディング用の接続電極の設置領域も少なくす
ることができ、これにより、チップ積層形の半導体装置
をCSP対応とすることができる。したがって、チップ
積層形の半導体装置の小形化を実現できる。
(2). By dividing the connection between the plurality of semiconductor chips and the lowermost common wiring board into flip-chip connection and wire bonding, the installation area of the connection electrodes for wire bonding on the common wiring board can also be reduced, whereby The chip-stacked semiconductor device can be compatible with the CSP. Therefore, miniaturization of a chip-stacked semiconductor device can be realized.

【0082】(3).積層配置された複数の半導体チッ
プがフェイスダウン実装され、したがって、最上段の半
導体チップもフリップチップ接続となるため、この半導
体チップ上にはワイヤのための封止部の領域を確保する
必要性が無くなる。その結果、チップ積層形の半導体装
置の薄形化を図ることができる。
(3). A plurality of stacked semiconductor chips are mounted face-down, so the topmost semiconductor chip is also flip-chip connected. Therefore, it is necessary to secure an area for a sealing portion for wires on this semiconductor chip. Disappears. As a result, the thickness of the chip-stacked semiconductor device can be reduced.

【0083】(4).前記(2),(3)により、チップ
積層形の半導体装置の小形化および薄形化を図ることが
できるため、この半導体装置の高密度実装を実現でき
る。
(4). According to the above (2) and (3), the chip stacked semiconductor device can be reduced in size and thickness, so that high-density mounting of the semiconductor device can be realized.

【0084】(5).積層配置した半導体チップをフリ
ップチップ接続とワイヤボンディングによる接続で共通
配線基板に接続するため、新たな設備投資を必要とせ
ず、既存設備の活用でチップ積層形の小形の半導体装置
を製造でき、したがって、この半導体装置のコストアッ
プを抑えることができる。
(5). Since the stacked semiconductor chips are connected to a common wiring board by flip chip connection and wire bonding connection, no new capital investment is required, and a small semiconductor device of a chip stacked type can be manufactured by utilizing existing equipment, and therefore, Thus, an increase in the cost of the semiconductor device can be suppressed.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の実施の形態の半導体装置の構造の一例
を示す断面図である。
FIG. 1 is a cross-sectional view illustrating an example of a structure of a semiconductor device according to an embodiment of the present invention.

【図2】図1に示す半導体装置の共通配線基板と上段配
線基板における配線および接続電極の配置状態の一例を
示す拡大部分平面図である。
2 is an enlarged partial plan view showing an example of an arrangement state of wiring and connection electrodes on a common wiring board and an upper wiring board of the semiconductor device shown in FIG. 1;

【図3】図1に示す半導体装置の製造方法における共通
配線基板へのアンダーフィル材形成状態の一例を示す断
面図である。
3 is a cross-sectional view showing an example of a state in which an underfill material is formed on a common wiring board in the method of manufacturing the semiconductor device shown in FIG. 1;

【図4】図1に示す半導体装置の製造方法における共通
配線基板への1stチップ取り付けと上段配線基板の取
り付け状態の一例を示す断面図である。
FIG. 4 is a cross-sectional view showing an example of a first chip attached to a common wiring board and an attached state of an upper wiring board in the method of manufacturing the semiconductor device shown in FIG. 1;

【図5】図1に示す半導体装置の製造方法における上段
配線基板への2ndチップ取り付け状態の一例を示す断
面図である。
5 is a cross-sectional view showing an example of a state in which a 2nd chip is mounted on an upper wiring board in the method of manufacturing the semiconductor device shown in FIG. 1;

【図6】図1に示す半導体装置の製造方法におけるワイ
ヤボンディングの接続状態の一例を示す断面図である。
6 is a cross-sectional view illustrating an example of a connection state of wire bonding in the method of manufacturing the semiconductor device illustrated in FIG.

【図7】図1に示す半導体装置の製造方法におけるモー
ルドの状態の一例を示す断面図である。
FIG. 7 is a cross-sectional view showing an example of a state of a mold in the method of manufacturing the semiconductor device shown in FIG.

【図8】図1に示す半導体装置の製造方法における半田
バンプ(外部端子)取り付け状態の一例を示す断面図で
ある。
8 is a cross-sectional view illustrating an example of a state in which solder bumps (external terminals) are attached in the method of manufacturing the semiconductor device illustrated in FIG. 1;

【符号の説明】[Explanation of symbols]

1 1stチップ(最下段の半導体チップ) 1a 主面 1b パッド(表面電極) 1c 裏面(反対側の面) 2 2ndチップ(上段の半導体チップ) 2a 主面 2b パッド(表面電極) 2c 裏面 3 テープ基板(共通配線基板) 3a 配線 3b 接続電極 3c チップ支持面 3d 裏面(反対側の面) 3e バンプランド 4 配線フィルム(上段配線基板) 4a 配線 4b 接続電極 4c チップ支持面 4d 裏面 5 アンダーフィル材 6 Auバンプ(突起電極) 7 上段Auバンプ(上段の突起電極) 8 接着材 9 ワイヤ 10 封止部 11 半田バンプ(外部端子) 12 CSP(半導体装置) 1 1st chip (lowest stage semiconductor chip) 1a main surface 1b pad (front surface electrode) 1c back surface (opposite surface) 2 2nd chip (upper stage semiconductor chip) 2a main surface 2b pad (front surface electrode) 2c back surface 3 tape substrate (Common wiring substrate) 3a Wiring 3b Connection electrode 3c Chip support surface 3d Back surface (opposite surface) 3e Bump land 4 Wiring film (upper wiring substrate) 4a Wiring 4b Connection electrode 4c Chip support surface 4d Back surface 5 Underfill material 6 Au Bump (projecting electrode) 7 Upper Au bump (upper projecting electrode) 8 Adhesive 9 Wire 10 Sealing part 11 Solder bump (external terminal) 12 CSP (Semiconductor device)

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】 複数の半導体チップが積層されて組み込
まれた半導体装置であって、 最下段に配置される半導体チップを突起電極を介してフ
リップチップ接続によって支持する共通配線基板と、 前記最下段の半導体チップのフリップチップ接続が行わ
れる主面と反対側の面に配置され、前記最下段の半導体
チップと積層配置される上段の半導体チップを上段の突
起電極を介してフリップチップ接続によって支持する上
段配線基板と、 前記上段の突起電極に配線を介して接続される前記上段
配線基板の接続電極と、前記共通配線基板の接続電極と
を接続するボンディング用のワイヤと、 前記共通配線基板のチップ支持面と反対側の面に配置さ
れる複数の外部端子とを有し、 積層配置された複数の前記半導体チップがそれぞれフェ
イスダウン実装されるとともに、前記上段の半導体チッ
プの表面電極と前記共通配線基板の前記接続電極とがフ
リップチップ接続およびワイヤボンディングによって接
続され、前記最下段の半導体チップが前記共通配線基板
にフリップチップ接続されていることを特徴とする半導
体装置。
1. A semiconductor device in which a plurality of semiconductor chips are stacked and incorporated, wherein a common wiring board supporting a lowermost semiconductor chip by flip-chip connection via a protruding electrode; The lower semiconductor chip is disposed on the surface opposite to the main surface where the flip chip connection of the semiconductor chip is performed, and the upper semiconductor chip stacked and disposed with the lowermost semiconductor chip is supported by the flip chip connection via the upper projecting electrode. An upper wiring board; a connection electrode of the upper wiring board connected to the upper protruding electrode via a wiring; a bonding wire connecting the connection electrode of the common wiring board; and a chip of the common wiring board. A plurality of external terminals arranged on a surface opposite to the supporting surface, and the plurality of semiconductor chips arranged in a stack are face-down And the surface electrodes of the upper semiconductor chip and the connection electrodes of the common wiring board are connected by flip chip connection and wire bonding, and the lowermost semiconductor chip is flip chip connected to the common wiring board. A semiconductor device.
JP2000031545A 2000-02-09 2000-02-09 Semiconductor device Pending JP2001223326A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000031545A JP2001223326A (en) 2000-02-09 2000-02-09 Semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000031545A JP2001223326A (en) 2000-02-09 2000-02-09 Semiconductor device

Publications (1)

Publication Number Publication Date
JP2001223326A true JP2001223326A (en) 2001-08-17

Family

ID=18556285

Family Applications (1)

Application Number Title Priority Date Filing Date
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Country Status (1)

Country Link
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