JP2001217295A - Semiconductor manufacturing device - Google Patents

Semiconductor manufacturing device

Info

Publication number
JP2001217295A
JP2001217295A JP2000028809A JP2000028809A JP2001217295A JP 2001217295 A JP2001217295 A JP 2001217295A JP 2000028809 A JP2000028809 A JP 2000028809A JP 2000028809 A JP2000028809 A JP 2000028809A JP 2001217295 A JP2001217295 A JP 2001217295A
Authority
JP
Japan
Prior art keywords
wafer
cassette
robot
transfer tool
semiconductor manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000028809A
Other languages
Japanese (ja)
Other versions
JP4505924B2 (en
Inventor
Yasutoku Harada
泰徳 原田
Yoshiaki Kubota
義昭 久保田
Yoichi Motomura
洋一 本村
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Yaskawa Electric Corp
Original Assignee
Yaskawa Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Yaskawa Electric Corp filed Critical Yaskawa Electric Corp
Priority to JP2000028809A priority Critical patent/JP4505924B2/en
Publication of JP2001217295A publication Critical patent/JP2001217295A/en
Application granted granted Critical
Publication of JP4505924B2 publication Critical patent/JP4505924B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To offer a semiconductor device of a low cost by reducing the time to transport wafers. SOLUTION: A wafer transporting system is arranged between a load port 31 for supporting a cassette 30 and a wafer processing chamber in this semiconductor manufacturing device wherein a robot 10a used for a wafer transporting system, a transporting tool which can support one wafer, a transporting tool 11 which can support a plurality of wafers, an ATC rack 70, and a buffer cassette 40 for storing a plurality of wafers in the cassette 30 are provided.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、カセットを保持す
るロードボートとウエハ処理室の間にウエハ搬送システ
ムを配置した半導体製造装置に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor manufacturing apparatus in which a wafer transfer system is arranged between a load boat holding a cassette and a wafer processing chamber.

【0002】[0002]

【従来の技術】従来の半導体製造装置は、例えば図5の
ように構成されている。すなわち、カセット1を保持す
るロードポート2とウエハ処理室3の間にロボット4
a、4bを配置するとともに、ロボット4a、4bに、
枚葉式でウエハを搬送するための搬送ツール5を固定
し、さらに、ロボット4aを走行軸6により直線移動す
ることができるようにしている。以下、図6を参照しな
がら、前記ロボット4aがウエハを搬送する手順を説明
する。製造装置を始動すると、ロボット4aは、カセッ
ト1より未処理ウエハ(図示せず)を取り出し、バッフ
ァスペース7を介してロボット4bに送給する。その
後、ウエハはロードロック室8aから、ウエハ処理室3
に送られる。ロボット4aは、処理済ウエハをロードロ
ック室8bより取り出し、カセット1へ戻す。そしてま
たカセット1より未処理ウエハを取り出す、という動作
を繰り返す。
2. Description of the Related Art A conventional semiconductor manufacturing apparatus is configured, for example, as shown in FIG. That is, the robot 4 is located between the load port 2 holding the cassette 1 and the wafer processing chamber 3.
a and 4b, and the robots 4a and 4b
A transfer tool 5 for transferring wafers in a single-wafer system is fixed, and the robot 4a can be moved linearly by a traveling shaft 6. Hereinafter, a procedure of transferring the wafer by the robot 4a will be described with reference to FIG. When the manufacturing apparatus is started, the robot 4a takes out an unprocessed wafer (not shown) from the cassette 1 and sends it to the robot 4b via the buffer space 7. Thereafter, the wafer is moved from the load lock chamber 8a to the wafer processing chamber 3
Sent to The robot 4a takes out the processed wafer from the load lock chamber 8b and returns it to the cassette 1. Then, the operation of taking out the unprocessed wafer from the cassette 1 is repeated.

【0003】[0003]

【発明が解決しようとする課題】前述のように、従来、
ロードポートとウエハ処理室間のロボットは枚葉式と呼
ばれる方式で1枚ずつウエハを搬送している。しかし、
ウエハの大口径化への流れの中、半導体製造装置も大き
くなり、それに伴いウエハを搬送する距離も長くなって
いる。しかし、ウエハ処理の時間に比べ、搬送にかかる
時間が多くなるようなことがあればスループットが低下
してしまうので、搬送にかかる時間は少ない方がよい。
しかしながら、従来技術では、ロボット4aが未処理ウ
エハを取り出しながら、処理済ウエハを回収する必要が
あり、搬送時間の短縮化は、ロボット4aの動作性能で
制限されていた。そこで、図7に示すように、ウエハを
搬送する時間を減らすために、装置内にロボット4cを
1台増やして、未処理ウエハ搬送専用のロボット4cと
処理済ウエハ搬送専用のロボット4aを持つ半導体製造
装置が考えられている。ただし、ロボットの台数が増え
るためコストはあがり、また、同じ走行軸上にロボット
が2台存在しており、互いの動きが干渉することがある
ので、制御が難しくなるという問題がある。本発明は、
このような問題を解消するためになされたもので、ウェ
ハの搬送にかかる時間を減らし、更にコストのかからな
い半導体製造装置を提供することを目的とするものであ
る。
As described above, as described above,
The robot between the load port and the wafer processing chamber transports wafers one by one by a method called a single wafer type. But,
As the diameter of wafers increases, the size of semiconductor manufacturing equipment also increases, and accordingly, the distance for transferring wafers also increases. However, if the time required for the transfer is longer than the time required for the wafer processing, the throughput is reduced. Therefore, the shorter the time required for the transfer is, the better.
However, in the related art, it is necessary for the robot 4a to collect the processed wafer while taking out the unprocessed wafer, and the reduction of the transfer time is limited by the operation performance of the robot 4a. Therefore, as shown in FIG. 7, in order to reduce the time for transferring a wafer, a single robot 4c is added in the apparatus, and a semiconductor having a robot 4c dedicated to transferring an unprocessed wafer and a robot 4a dedicated to transferring a processed wafer Manufacturing equipment is being considered. However, the cost increases because the number of robots increases, and there is a problem that control becomes difficult because two robots exist on the same traveling axis and their movements may interfere with each other. The present invention
An object of the present invention is to solve such a problem, and an object of the present invention is to provide a semiconductor manufacturing apparatus which reduces the time required for carrying a wafer and which does not require much cost.

【0004】[0004]

【課題を解決するための手段】上記問題を解決するた
め、本発明は、カセットを保持するロードポートとウエ
ハ処理室の間にウエハ搬送システムを配置した半導体製
造装置において、ウエハ搬送システムに使用するロボッ
トと、1枚のウエハを保持することができる搬送ツール
と、複数牧のウエハを保持することができる搬送ツール
と、それらを保管するATCラックと、カセットのウエ
ハを複数枚保管するためのバッファカセットとを具備
し、前記ロボットにガイドを有し、圧縮コイルばねの両
側にストッパを配置するようにしたものである。
SUMMARY OF THE INVENTION In order to solve the above problems, the present invention is used for a wafer transfer system in a semiconductor manufacturing apparatus in which a wafer transfer system is disposed between a load port holding a cassette and a wafer processing chamber. Robot, transfer tool capable of holding one wafer, transfer tool capable of holding multiple wafers, ATC rack for storing them, and buffer for storing multiple wafers in cassette A cassette, wherein the robot has a guide, and stoppers are arranged on both sides of the compression coil spring.

【0005】[0005]

【発明の実施の形態】以下、本発明の実施例を図に基づ
いて説明する。図1は本発明の半導体製造装置の実施例
を示す斜視図である。図において、10a、10bはロ
ボットであり、20は走行軸であり、30はカセットで
あり、40はバッファカセットであり、50a、50b
はロードロック室であり、60はウエハ処理室であり、
70はATCラックである。図2を参照しながら、ロボ
ット10aがウエハを搬送する手順を説明する。内部に
未処理ウエハが保持されているカセット30をロードポ
ート31上表面上に配置する。ロボット10aには多段
の搬送ツールによって、カセット30から未処理ウエハ
を複数枚同時に取り出し、バッファカセット40へ未処
理ウエハを送給する。ロボットl0bは、1段の搬送ツ
ールで未処理ウエハをバッファカセット40からロード
ロック室50aに1枚ずつ搬送する。ロボット10a
は、ウエハ処理室60でウエハが処理されている間に、
ATCラック70に保管されている1段の搬送ツールと
多段の搬送ツールとを自動的に交換する。そして、ロー
ドロック室50bから処理済ウエハを取り出し、カセッ
ト30に戻す。バッファカセット40内のウエハがなく
なるまで、ロボット10aはロードロック室50bとカ
セット30の往復をする。バッファカセット40内のウ
エハがなくなったときだけ、搬送ツールを1段のものか
ら多段のものに取り替えて、未処理ウエハをカセット3
0からバッファカセット40に搬送すればよい。図3は
搬送ツールの交換をする機構の構成を示す断面図であ
る。ロボット側は、搬送ロボットのアーム12の先端中
央部にガイド13が取り付けられている。また搬送ツー
ル側は、圧縮コイルばね14の両側に配置した1対の搬
送ツールストッパ15を、搬送ツールストッパカバ16
で上方から覆うことで、搬送ツール11に取り付けてい
る。従って、圧縮コイルばね14の伸縮によって、搬送
ツールストッパ15の開閉運動が可能となる。図4は搬
送ツール交換の手順を示す斜視図である。まず、搬送ツ
ール11をロボットのアーム12に取り付ける手順を説
明する。図1中、ATCラック70近傍にはエアシリン
ダ71が配置されており、このエアシリンダ71先端で
搬送ツールストッパ15を上方から挟み、エアシリンダ
71先端を開閉させることにより、搬送ツールストッパ
15を開閉させることができる。エアシリンダ71によ
って搬送ツールストッパ15を閉じた状態で、ロボット
アーム12を動作させ、搬送ツールストッパ15がガイ
ド13の切り欠きの奥まで嵌合するまで通し、エアシリ
ンダ71先端を開き、搬送ツールストッパ15を開く
と、搬送ツール11とガイド13が結合する。取り外す
手順は取付けと同様、搬送ツールストッパ15をエアシ
リンダ71先端で閉めた状態で、ロボットアーム12を
動作させ、搬送ツールストッパ15からガイド13の切
り欠きを抜けばよい。搬送ツール11をガイド13に固
定するには、搬送ツールストッパ15とガイド13の接
触面にテーパを形成しておくことなどが考えられる。
DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS An embodiment of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view showing an embodiment of the semiconductor manufacturing apparatus of the present invention. In the figure, 10a and 10b are robots, 20 is a traveling axis, 30 is a cassette, 40 is a buffer cassette, 50a and 50b
Is a load lock chamber, 60 is a wafer processing chamber,
70 is an ATC rack. The procedure for transferring the wafer by the robot 10a will be described with reference to FIG. The cassette 30 in which an unprocessed wafer is held is placed on the upper surface of the load port 31. The robot 10 a takes out a plurality of unprocessed wafers from the cassette 30 at the same time by a multi-stage transfer tool and sends the unprocessed wafers to the buffer cassette 40. The robot 10b transports unprocessed wafers one by one from the buffer cassette 40 to the load lock chamber 50a using a one-stage transport tool. Robot 10a
While the wafer is being processed in the wafer processing chamber 60,
The one-stage transfer tool and the multi-stage transfer tool stored in the ATC rack 70 are automatically exchanged. Then, the processed wafer is taken out from the load lock chamber 50b and returned to the cassette 30. The robot 10 a reciprocates between the load lock chamber 50 b and the cassette 30 until there are no more wafers in the buffer cassette 40. Only when the wafers in the buffer cassette 40 run out, the transfer tool is changed from a single-stage transfer tool to a multi-stage transfer tool, and the unprocessed wafers are transferred to the cassette 3.
What is necessary is just to carry from 0 to the buffer cassette 40. FIG. 3 is a cross-sectional view showing a configuration of a mechanism for exchanging a transfer tool. On the robot side, a guide 13 is attached to the center of the tip of the arm 12 of the transfer robot. On the transfer tool side, a pair of transfer tool stoppers 15 arranged on both sides of the compression coil spring 14 are connected to the transfer tool stopper cover 16.
To cover the transfer tool 11 from above. Therefore, the opening and closing movement of the transfer tool stopper 15 is enabled by the expansion and contraction of the compression coil spring 14. FIG. 4 is a perspective view showing a procedure for exchanging the transfer tool. First, a procedure for attaching the transfer tool 11 to the robot arm 12 will be described. In FIG. 1, an air cylinder 71 is disposed near the ATC rack 70. The transfer tool stopper 15 is sandwiched by the tip of the air cylinder 71 from above, and the transfer tool stopper 15 is opened and closed by opening and closing the tip of the air cylinder 71. Can be done. With the transfer tool stopper 15 closed by the air cylinder 71, the robot arm 12 is operated, and the transfer tool stopper 15 is passed until it is fitted into the notch of the guide 13, and the tip of the air cylinder 71 is opened. When opening 15, the transfer tool 11 and the guide 13 are connected. As with the mounting procedure, the robot arm 12 is operated while the transfer tool stopper 15 is closed at the tip of the air cylinder 71, and the notch of the guide 13 may be removed from the transfer tool stopper 15. In order to fix the transfer tool 11 to the guide 13, it is conceivable to form a taper on the contact surface between the transfer tool stopper 15 and the guide 13.

【0006】[0006]

【発明の効果】本発明の半導体製造装置は、複数枚のウ
エハを搬送することができるロボットを配置することに
よって、従来の技術に比べ、カセットとバッファカセッ
ト間の往復動作を減らすことができるので、搬送にかか
る時間を実質的に減らすことができ、また、ロボットの
台数を減らすことができるので、コストがかからないと
いう効果がある。
According to the semiconductor manufacturing apparatus of the present invention, the reciprocating operation between the cassette and the buffer cassette can be reduced as compared with the prior art by arranging a robot capable of transporting a plurality of wafers. In addition, the time required for transportation can be substantially reduced, and the number of robots can be reduced, so that there is an effect that no cost is required.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の半導体製造装置の実施例を示す斜視図
である。
FIG. 1 is a perspective view showing an embodiment of a semiconductor manufacturing apparatus of the present invention.

【図2】図1に示す本発明の半導体製造装置におけるロ
ボット10aがウエハを搬送する手順を示したフローチ
ャートである。
FIG. 2 is a flowchart showing a procedure for transferring a wafer by a robot 10a in the semiconductor manufacturing apparatus of the present invention shown in FIG.

【図3】本発明の半導体製造装置における搬送ツールの
交換をする機構の構成を示す断面図である。
FIG. 3 is a sectional view showing a configuration of a mechanism for exchanging a transfer tool in the semiconductor manufacturing apparatus of the present invention.

【図4】本発明の半導体製造装置における搬送ツール交
換の手順を示す斜視図である。
FIG. 4 is a perspective view showing a procedure for exchanging a transfer tool in the semiconductor manufacturing apparatus of the present invention.

【図5】従来の半導体製造装置を示す斜視図である。FIG. 5 is a perspective view showing a conventional semiconductor manufacturing apparatus.

【図6】図5に示す従来の半導体製造装置におけるロボ
ット4aがウエハを搬送する手順を示したフローチャー
トである。
6 is a flowchart showing a procedure for transferring a wafer by a robot 4a in the conventional semiconductor manufacturing apparatus shown in FIG.

【図7】従来の半導体製造装置にバッファカセット7と
ロボット4cを加えた半導体製造装置を示す図である。
FIG. 7 is a diagram showing a semiconductor manufacturing apparatus in which a buffer cassette 7 and a robot 4c are added to a conventional semiconductor manufacturing apparatus.

【符号の説明】[Explanation of symbols]

10a、l0b ロボット 11 搬送ツール 12 ロボットアーム 13 ガイド 14 圧縮コイルばね 15 搬送ツールストッパ 16 搬送ツールストッパカバ 20 走行軸 30 カセット 31 ロードポート 40 バッファカセット 50a、50b ロードロック室 60 ウエハ処理室 70 ATCラック 71 エアシリンダ 10a, 10b Robot 11 Transfer Tool 12 Robot Arm 13 Guide 14 Compression Coil Spring 15 Transfer Tool Stopper 16 Transfer Tool Stopper Cover 20 Travel Axis 30 Cassette 31 Load Port 40 Buffer Cassette 50a, 50b Load Lock Room 60 Wafer Processing Room 70 ATC Rack 71 Air cylinder

Claims (2)

【特許請求の範囲】[Claims] 【請求項1】 カセットを保持するロードポートとウエ
ハ処理室の間にウエハ搬送システムを配置した半導体製
造装置において、 ウエハ搬送システムに使用するロボットと、1枚のウエ
ハを保持することができる搬送ツールと、複数枚のウエ
ハを保持することができる搬送ツールと、それらを保管
するATCラックと、カセットのウエハを複数枚保管す
るためのバッファカセットとを具備することを特徴とす
る半導体製造装置。
In a semiconductor manufacturing apparatus in which a wafer transfer system is disposed between a load port holding a cassette and a wafer processing chamber, a robot used for the wafer transfer system and a transfer tool capable of holding one wafer And a transfer tool capable of holding a plurality of wafers, an ATC rack for storing them, and a buffer cassette for storing a plurality of wafers in a cassette.
【請求項2】 前記ロボットにガイドを有し、圧縮コイ
ルばねの両側にストッパを配置し、それをカバによって
前記搬送ツールに固定した機構を有するロボットを具備
することを特徴とする請求項1に記載の半導体製造装
置。
2. The robot according to claim 1, further comprising a mechanism having a guide on the robot, arranging stoppers on both sides of a compression coil spring, and fixing the stopper to the transfer tool by a cover. The semiconductor manufacturing apparatus according to the above.
JP2000028809A 2000-02-07 2000-02-07 Semiconductor manufacturing equipment Expired - Fee Related JP4505924B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000028809A JP4505924B2 (en) 2000-02-07 2000-02-07 Semiconductor manufacturing equipment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000028809A JP4505924B2 (en) 2000-02-07 2000-02-07 Semiconductor manufacturing equipment

Publications (2)

Publication Number Publication Date
JP2001217295A true JP2001217295A (en) 2001-08-10
JP4505924B2 JP4505924B2 (en) 2010-07-21

Family

ID=18554154

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000028809A Expired - Fee Related JP4505924B2 (en) 2000-02-07 2000-02-07 Semiconductor manufacturing equipment

Country Status (1)

Country Link
JP (1) JP4505924B2 (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235920A (en) * 2008-04-18 2008-10-02 Hitachi High-Technologies Corp Vacuum treatment apparatus and vacuum treatment method
JP2013222949A (en) * 2012-04-19 2013-10-28 Tokyo Electron Ltd Substrate processing device, substrate processing method and storage medium

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS591187A (en) * 1982-06-23 1984-01-06 日産自動車株式会社 Method of exchanging hand and hand used for the method
JPH10256346A (en) * 1997-03-13 1998-09-25 Tokyo Electron Ltd Cassette transferring mechanism and semiconductor manufacturing apparatus
JPH11354604A (en) * 1998-06-05 1999-12-24 Dainippon Screen Mfg Co Ltd Substrate transfer apparatus and substrate processing apparatus using the substrate transfer apparatus

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS591187A (en) * 1982-06-23 1984-01-06 日産自動車株式会社 Method of exchanging hand and hand used for the method
JPH10256346A (en) * 1997-03-13 1998-09-25 Tokyo Electron Ltd Cassette transferring mechanism and semiconductor manufacturing apparatus
JPH11354604A (en) * 1998-06-05 1999-12-24 Dainippon Screen Mfg Co Ltd Substrate transfer apparatus and substrate processing apparatus using the substrate transfer apparatus

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008235920A (en) * 2008-04-18 2008-10-02 Hitachi High-Technologies Corp Vacuum treatment apparatus and vacuum treatment method
JP4546556B2 (en) * 2008-04-18 2010-09-15 株式会社日立ハイテクノロジーズ Vacuum processing apparatus and vacuum processing method
JP2013222949A (en) * 2012-04-19 2013-10-28 Tokyo Electron Ltd Substrate processing device, substrate processing method and storage medium
KR20130118236A (en) * 2012-04-19 2013-10-29 도쿄엘렉트론가부시키가이샤 Substrate treatment apparatus, substrate treatment method and storage medium
KR101705932B1 (en) 2012-04-19 2017-02-10 도쿄엘렉트론가부시키가이샤 Substrate treatment apparatus, substrate treatment method and storage medium

Also Published As

Publication number Publication date
JP4505924B2 (en) 2010-07-21

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