JP2008235920A - Vacuum treatment apparatus and vacuum treatment method - Google Patents
Vacuum treatment apparatus and vacuum treatment method Download PDFInfo
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- 238000009489 vacuum treatment Methods 0.000 title abstract 6
- 238000000034 method Methods 0.000 title description 12
- 238000012545 processing Methods 0.000 claims description 85
- 238000003672 processing method Methods 0.000 claims description 5
- 235000012431 wafers Nutrition 0.000 description 16
- 239000007789 gas Substances 0.000 description 10
- 238000005530 etching Methods 0.000 description 6
- 238000010926 purge Methods 0.000 description 3
- 238000004380 ashing Methods 0.000 description 2
- 238000005260 corrosion Methods 0.000 description 2
- 230000007797 corrosion Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229910052736 halogen Inorganic materials 0.000 description 2
- 150000002367 halogens Chemical class 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 239000011261 inert gas Substances 0.000 description 2
- 238000012805 post-processing Methods 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
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Abstract
Description
本発明は、複数の真空処理室を有する真空処理装置及び真空処理方法に係り、特に、ハロゲンガスなどの腐食性ガスを使用した真空処理での稼働率・歩留まり向上に関するものである。 The present invention relates to a vacuum processing apparatus and a vacuum processing method having a plurality of vacuum processing chambers, and more particularly to improvement in operating rate and yield in vacuum processing using corrosive gas such as halogen gas.
従来の真空処理装置は、少なくとも2組以上のプロセス処理装置を使って処理する真空処理装置により運転中にどれかの処理室が故障等で使用できなくなった時に、正常な処理室を処理経路として使って運転することで稼働率を高めていた(例えば、特許文献1参照)。 A conventional vacuum processing apparatus uses a normal processing chamber as a processing path when any processing chamber becomes unusable due to a failure or the like during operation by a vacuum processing apparatus that uses at least two sets of process processing apparatuses. The operating rate has been increased by operating using the system (for example, see Patent Document 1).
しかし、エッチング処理後ウェハをそのまま搬出して大気開放したり後処理室を有する装置では、アッシング処理を施したり、加熱処理を施したりするのみで、ウェハ上の残留ガスを低減させて、歩留まりを向上させるような運用について十分な配慮がなされていなかった。デバイス工程上アッシング処理や加熱処理を施すことが出来ない場合は、そのまま搬出するしかなかった。エッチング処理後FOUP(Front Openinng Unified Pod)などのキャリアに回収された処理済みウェハ上の残留ガスが未処理ウェハへの異物付着をもたらし、エッチング処理時にハロゲンガス起因と思われる異物がマスクとなり、エッチング残りなどの歩留まり低下の原因となっていた。また、残留ガスを完全に除去することが出来ず、FOUPなどのキャリア内の残留ガス高濃度化によるなど周辺環境が問題になるようになってきた。 However, in an apparatus having a post-processing chamber that can be taken out of the wafer as it is after the etching process and has a post-processing chamber, the residual gas on the wafer can be reduced and the yield can be reduced simply by performing an ashing process or a heating process. Sufficient consideration was not given to the operation to improve. If ashing or heat treatment could not be performed in the device process, it had to be carried out as it was. Residual gas collected on the treated wafer such as FOUP (Front Opening Unified Pod) after the etching process causes foreign substances to adhere to the unprocessed wafer, and the foreign substances that may be caused by the halogen gas during the etching process serve as a mask. It was the cause of the yield reduction such as the rest. In addition, the residual gas cannot be completely removed, and the surrounding environment has become a problem due to high concentration of residual gas in the carrier such as FOUP.
また、バッチ方式の真空処理でカセット内のウェハの順序が元の状態に戻るようにウェハの搬送路上に第三のカセットを設置したものがある(例えば、特許文献2参照)。しかしながら、この技術は、未処理の試料と処理済試料のいずれかの試料を待避させ混在を防止させる技術内容は開示されていない。
上記従来技術では、処理済みウェハ(処理済試料)と未処理ウェハ(未処理の試料)をFOUPなどの同一キャリアに収納・混在した状況が存在することにより、処理済ウェハからの異物発生などによる製品の歩留まり低下を招いていた。本発明の目的は、製品の歩留まり向上が図られる真空処理装置及び真空処理方法を提供することにある。 In the above prior art, there is a situation in which a processed wafer (processed sample) and an unprocessed wafer (unprocessed sample) are stored and mixed in the same carrier such as FOUP, thereby causing foreign matter from the processed wafer. The product yield was reduced. An object of the present invention is to provide a vacuum processing apparatus and a vacuum processing method capable of improving the yield of products.
上記目的を達成するために、本発明は、同一キャリア内に未処理ウェハと処理済みウェハを混在させないように大気搬送ユニット内に待避ステーションを追加したものである。そして待避ステーション内の処理済みウェハによる残留含有ガスの置換を促進させるためパージ機構などを追加したものである。また、処理前ウェハを待避ステーション内に搬送し、処理済ウェハを元のキャリアに搬送したものでもよい。 In order to achieve the above object, according to the present invention, an evacuation station is added in the atmospheric transfer unit so that unprocessed wafers and processed wafers are not mixed in the same carrier. A purge mechanism or the like is added to promote the replacement of the residual contained gas with the processed wafer in the evacuation station. In addition, the wafer before processing may be transferred into a waiting station and the processed wafer may be transferred to the original carrier.
さらに、待避ステーション追加によるスループット影響を軽減するための搬送シーケンスを最適化したものである。 Furthermore, the transport sequence for reducing the throughput effect due to the addition of the save station is optimized.
すなわち、本発明は、真空処理装置において、試料を真空中で処理する複数の真空処理室と、該真空処理室に試料を搬入出する真空搬送手段と、前記真空処理室へ試料を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室と、試料を収納できる複数のカセットを載置し得るカセット載置手段と、前記カセット載置手段に載置されるカセットとは異なる待避カセットを大気雰囲気下で載置し得る待避カセット載置手段と、前記カセット載置手段に載置された任意のカセット内もしくは前記待避カセット載置手段に載置された待避カセット内から試料を抜き取れるように上下動可能に構成された大気搬送手段と、前記任意のカセット内から大気搬送手段によって抜き取った未処理の試料を前記切り替え可能な室及び前記真空搬送手段を介して前記真空処理室に搬入する制御、前記真空処理室で処理された処理済試料を前記任意のカセットとは異なる待避カセットに搬送する制御、前記任意のカセット内に未処理の試料が存在しない状態で前記待避カセットから処理済試料を前記任意のカセットに戻す制御を行う制御手段とを具備した。 That is, according to the present invention, in a vacuum processing apparatus, a plurality of vacuum processing chambers for processing a sample in vacuum, a vacuum transfer means for loading / unloading the sample into / from the vacuum processing chamber, and a sample loading / unloading into / from the vacuum processing chamber. A chamber that can be switched to an air atmosphere or a vacuum atmosphere, a cassette placing means that can place a plurality of cassettes that can store samples, and a retracting cassette that is different from the cassette placed on the cassette placing means. A retractable cassette placing means that can be placed in an atmosphere, and a sample can be extracted from any cassette placed on the cassette placing means or the retracted cassette placed on the retracted cassette placing means. The atmospheric transfer means configured to be movable up and down, the switchable chamber and the vacuum transfer of an unprocessed sample extracted from the arbitrary cassette by the atmospheric transfer means Control to carry into the vacuum processing chamber through a stage, control to transport a processed sample processed in the vacuum processing chamber to a retreat cassette different from the arbitrary cassette, unprocessed sample in the arbitrary cassette And a control means for performing control to return the processed sample from the evacuation cassette to the arbitrary cassette in the absence.
本発明は、真空処理装置において、試料を真空中で処理する複数の真空処理室と、該真空処理室に試料を搬入出する真空搬送手段と、前記真空処理室へ試料を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室と、試料を収納できる複数のカセットを載置し得るカセット載置手段と、前記カセット載置手段に載置されるカセットとは異なる待避カセットを大気雰囲気下で載置し得る待避カセット載置手段と、前記カセット載置手段に載置された任意のカセット内もしくは前記待避カセット載置手段に載置された待避カセット内から試料を抜き取れるように上下動可能に構成された大気搬送手段と、前記任意のカセット内から大気搬送手段によって抜き取った未処理の試料を前記任意のカセットとは異なる待避カセットに搬送する制御、前記任意のカセットまたは前記待避カセット内の未処理の試料を前記切り替え可能な室及び前記真空搬送手段を介して前記真空処理室に搬入する制御、前記真空処理室で処理された処理済試料を前記試料を抜き取った未処理の試料がない状態の前記任意のカセット内に搬送する制御を行う制御手段とを具備した。 In the vacuum processing apparatus, the present invention provides a plurality of vacuum processing chambers for processing a sample in a vacuum, a vacuum transfer means for loading / unloading the sample into / from the vacuum processing chamber, and a sample for loading / unloading the sample into / from the vacuum processing chamber. A chamber that can be switched to an air atmosphere or a vacuum atmosphere, a cassette placing means that can place a plurality of cassettes that can store samples, and a retracting cassette that is different from the cassette placed on the cassette placing means in an air atmosphere The retractable cassette placing means that can be placed in the upper and lower parts, and the vertical movement so that the sample can be extracted from any cassette placed on the cassette placing means or from the retracted cassette placed on the retracted cassette placing means The atmospheric transfer means configured to be capable of transferring the unprocessed sample extracted from the arbitrary cassette by the atmospheric transfer means to a retreat cassette different from the arbitrary cassette. A control for transferring an unprocessed sample in the arbitrary cassette or the evacuation cassette into the vacuum processing chamber via the switchable chamber and the vacuum transfer means, and a processing performed in the vacuum processing chamber. And a control means for performing control for transporting the sample into the arbitrary cassette in a state where there is no unprocessed sample from which the sample has been extracted.
上記課題を解決するために、本発明は、カセット載置手段に載置される複数のカセットのうちの任意のカセット内から試料を抜き取り、大気雰囲気もしくは真空雰囲気に切り替え可能な室を経由して複数の真空処理室のいずれかに搬入し、該未処理の試料を真空処理後、処理済試料を前記任意のカセット内に搬送する真空処理方法において、前記任意のカセット内から抜き取った試料を処理中、前記任意のカセット内の未処理の試料または前記真空処理室で処理後の処理済試料のいずれかのみを大気雰囲気下に設けられた待避カセット載置手段に載置した待避カセットに待避させ、未処理の試料と処理済試料とを前記任意のカセット内で混在させないように試料を搬送し、前記任意のカセットから抜き取って真空処理した処理済試料を待避カセットに待避させ、前記任意のカセット内に未処理の試料が存在しない状態で前記待避カセットから処理済試料を前記任意のカセットに戻すか、前記任意のカセットから未処理の試料を抜き取り各真空処理室へ搬送し、前記任意のカセットに残された未処理の試料を抜き取り待避カセットに待避させ、前記任意のカセットまたは待避カセットから抜き取られた未処理の試料を真空処理し、前記任意のカセット内に未処理の試料が存在しない状態で前記処理済試料を前記任意のカセットに戻すようにした。 In order to solve the above-described problems, the present invention is configured to extract a sample from an arbitrary cassette among a plurality of cassettes placed on the cassette placing means, and pass through a chamber that can be switched to an air atmosphere or a vacuum atmosphere. In a vacuum processing method in which the unprocessed sample is transferred to one of the plurality of vacuum processing chambers, the unprocessed sample is vacuum processed, and the processed sample is transported into the arbitrary cassette, the sample extracted from the arbitrary cassette is processed. In the middle, only the unprocessed sample in the arbitrary cassette or the processed sample after being processed in the vacuum processing chamber is retracted in a retracting cassette mounted on a retracting cassette mounting means provided in an air atmosphere. The sample is transported so that the unprocessed sample and the processed sample are not mixed in the arbitrary cassette, and the processed sample extracted from the arbitrary cassette and vacuum-processed is saved. And then return the processed sample from the storage cassette to the arbitrary cassette in a state where there is no unprocessed sample in the arbitrary cassette, or remove the unprocessed sample from the arbitrary cassette and remove each vacuum. The unprocessed sample left in the arbitrary cassette is transported to the processing chamber, and the unprocessed sample extracted from the optional cassette or the retractable cassette is vacuum-treated by removing the unprocessed sample remaining in the optional cassette. The processed sample was returned to the arbitrary cassette in a state in which no unprocessed sample was present.
本発明は、以上説明したように未処理ウェハと処理済みウェハを大気中で混在させないことで稼動率を下げることなく、歩留まり低下を軽減することが可能となる。 As described above, according to the present invention, it is possible to reduce the yield reduction without lowering the operation rate by not mixing the unprocessed wafer and the processed wafer in the atmosphere.
以下、本発明の実施の形態について詳細に説明する。図1は本発明による装置構成図を示す。真空処理装置1は、試料2(2−1、2−2、2−3、2−4、2−5)を真空処理する複数の真空処理室7(7−1,7−2,7−3)と、該真空処理室7に試料2を搬入出する真空搬送手段8と、前記真空処理室7へ試料2を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室9(9−1,9−2)と、試料2を収納できる複数のカセット3(3−1,3−2,3−3)を載置し得るカセット載置手段10(10−1,10−2,10−3)と、該カセット載置手段の任意のカセット内から試料2を抜き取れるように上下動可能に構成された搬送手段4と、前記任意のカセット内の試料2を前記搬送手段4および前記切り替え可能な室9ならびに前記真空搬送手段8を介して真空処理室7内に搬送し・前記真空処理室で処理後の処理済試料を搬出するための搬送制御を行うための制御手段と、今回新たに大気雰囲気下に設けられ、未処理の試料または処理済試料を待避させる待避カセット5と、真空雰囲気内に処理済み試料を待避させる待避室6で構成されている。また、真空搬送手段8および大気雰囲気内の搬送手段4に付随するハンドについては1本に限定するものではない。
Hereinafter, embodiments of the present invention will be described in detail. FIG. 1 shows an apparatus configuration diagram according to the present invention. The
実施例1として、カセット3−1から大気雰囲気下に設けられた搬送手段4にて搬出された1枚目の試料2−1を切り替え可能な室9−1ならびに前記真空搬送手段8を介して真空処理室7−1へ搬送し、エッチング処理を実行する。複数の真空処理室7にて連続して同じレシピを処理する運用の場合、引き続き2枚目の試料2−1を連続処理可能なように、搬送手段を介して真空処理室7−2へ搬送され、エッチング処理が開始される。同様に3枚目の試料2−1も真空処理室7−3にてエッチング処理が開始される。その後、カセット3−1上に残された未処理の試料全数を例えばn枚収納カセットならn枚目から順次大気雰囲気下に設けられた待避カセット5へと搬送手段4を介して搬送する。カセット3−1から全ての未処理の試料がなくなれば、真空処理室7−1内の処理済試料2−1からカセット3−1へ戻し入れることで、同一のカセット内に未処理の試料と処理済試料が混在することを防ぐことが可能となる。
As Example 1, through the chamber 9-1 and the vacuum transfer means 8 capable of switching the first sample 2-1 carried out by the transfer means 4 provided in the atmospheric air from the cassette 3-1. It conveys to the vacuum processing chamber 7-1, and performs an etching process. When the same recipe is continuously processed in a plurality of vacuum processing chambers 7, the second sample 2-1 can be continuously transferred to the vacuum processing chamber 7-2 through the transfer means so that it can be continuously processed. Then, the etching process is started. Similarly, the etching process for the third sample 2-1 is started in the vacuum processing chamber 7-3. Thereafter, the entire number of unprocessed samples remaining on the cassette 3-1 is transferred via the transfer means 4 sequentially from the n-th storage cassette to the
待避カセット5は、前記運用であればm個の真空処理室があればn−m以上の収納容量を備えておくことが望ましく、例えば製品処理用に2カセット処理連続処理可能であれば、複数カセット分の許容可能な待避カセット構造となっており、上下動または左右動ができる。搬送手段(大気ロボット)4の駆動領域であれば待避カセット5内のカセットを固定した状態で稼動機能を有していなくてもよい。処理運用にもよるが、1枚目の試料から待避カセットに移動させないで、処理可能な試料から待避させずに処理開始することで、スループットを低下させずに搬送制御することができる。
In the case of the above operation, the
すなわち、この実施例では、真空処理装置において、試料を真空処理する複数の真空処理室と、該真空処理室に試料を搬入出する真空搬送手段と、前記真空処理室へ試料を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室と、試料を収納できる複数のカセットを載置し得るカセット載置手段と、該カセット載置手段の任意のカセット内から試料を抜き取れるように上下動可能に構成された搬送手段と、前記任意のカセット内の試料を前記搬送手段及び前記切り替え可能な室並びに前記真空搬送手段を介して前記真空処理室に搬入し、前記真空処理室で処理後の処理済試料を搬出するための搬送制御を行う制御手段とで構成された真空処理装置において、前記処理済試料と未処理の試料とを混在させないための待避カセットを載置し得る待避カセット載置手段を設けた。そして、前記大気雰囲気下に設けた待避カセット載置手段に、未処理の試料を待避させる待避カセットを載置し得るようにした。 That is, in this embodiment, in the vacuum processing apparatus, a plurality of vacuum processing chambers for vacuum processing a sample, a vacuum transfer means for loading / unloading the sample into / from the vacuum processing chamber, and a sample for loading / unloading the sample into / from the vacuum processing chamber A chamber that can be switched to an air atmosphere or a vacuum atmosphere, cassette placing means that can place a plurality of cassettes that can store samples, and vertical movement so that a sample can be extracted from any cassette in the cassette placing means A transfer means configured to be capable of carrying the sample in the arbitrary cassette into the vacuum processing chamber via the transfer means, the switchable chamber, and the vacuum transfer means; In a vacuum processing apparatus composed of a control means for carrying out control for carrying out processed samples, a retreat cassette for preventing the processed samples and unprocessed samples from being mixed together Provided shunting cassette mounting means capable of mounting. Then, a retracting cassette for retracting an unprocessed sample can be mounted on the retracting cassette mounting means provided in the air atmosphere.
また、実施例1では、未処理の試料を待避させる内容で説明したが、本発明はこの方式に限定されるものではない。実施例2では、カセット3から未処理の試料2を順次真空処理室7に搬送し、処理を開始する。真空処理室での処理後の処理済試料は待避カセット5へ待避させる。そしてカセット3内の全ての未処理試料を搬出したことを搬送制御にて判断すると、処理後の処理済試料を待避カセット5から元のカセット3へ搬出する。この場合も全ての処理済試料が待避カセット5に待避されるまで待つのではなく、カセット3から全ての未処理の試料が搬出されたことを判断することでスループットを低下させずに運用することが可能となる。すなわち、この実施例では、また、本発明は、大気雰囲気下に設けた待避カセット載置手段に、処理済試料を待避させる待避カセットを載置し得るようにした。
Further, in the first embodiment, the description has been made with respect to the content of saving the untreated sample, but the present invention is not limited to this method. In the second embodiment, the
周辺環境に影響を及ぼす残留腐食性ガスが付着した処理済試料と大気中の水分等が反応することを軽減するために、待避カセット5内を不活性ガス等でガス置換できるようなパージ機構を設けることが望ましい。パージ機構としては待避カセット外部から待避カセット内部に向けて、または待避カセット上部から不活性ガスを導入することでカセット内環境雰囲気を改善することができる。そして待避カセット下部に排気機構を設けてもよい。また、待避カセット5に開閉扉を設け、待避カセット5に対し搬送手段4が動作しないときに扉を閉じることでガス置換をより効果的に働かせてもよい。
In order to reduce the reaction between the treated sample with residual corrosive gas that affects the surrounding environment and moisture in the atmosphere, a purge mechanism that can replace the inside of the
実施例3は、真空雰囲気下に設けられた待避室6を運用した例である。カセット3から搬出された試料2を真空処理室7で処理後、処理済試料2を待避室6へ待避させるものである。実施例2同様、カセット3から未処理の試料が全て搬出されてことを判断できる搬送手段を有し、待避室6から順次元のカセット3へ搬出される。真空下に待避室を設けることで、試料表面が大気に曝されることがなく、腐食などの歩留まり低下を招く影響を軽減することができる。
Example 3 is an example in which a
すなわち、この実施例では、上記真空処理装置において、前記待避カセット載置手段を、真空雰囲気内に設け、処理済試料を待避させる待避室を具備するようにした。 That is, in this embodiment, in the above vacuum processing apparatus, the retracting cassette mounting means is provided in a vacuum atmosphere and includes a retracting chamber for retracting the processed sample.
また、これらの実施例では、上記真空処理装置において、前記待避カセット載置手段を、ロット処理終了まで前記処理済試料または前記未処理の試料を待避させる待避カセットを載置し得るようにした。 In these embodiments, in the vacuum processing apparatus, the retracting cassette mounting means can mount a retracting cassette for retracting the processed sample or the unprocessed sample until the end of lot processing.
さらに、上記真空処理装置において、前記待避カセット載置手段は、大気雰囲気下に設けられ、上下動又は左右動可能に構成される。このことにより複数のカセットから未処理試料を取り出し、処理済の試料または未処理試料を待避カセットに取り出したカセット毎に分別して待避させることができる。 Furthermore, in the vacuum processing apparatus, the retracting cassette mounting means is provided in an air atmosphere and configured to be vertically movable or horizontally movable. As a result, unprocessed samples can be taken out from a plurality of cassettes, and processed samples or unprocessed samples can be sorted and saved for each cassette that has been taken out to a save cassette.
上記各実施例では、大気雰囲気下に設けられた待避カセット5または真空雰囲気下に設けられた待避室6のどちらかを運用する例を示したが、両方を同時に使用してもよい。
In each of the above-described embodiments, an example is shown in which one of the
本発明は、以上説明したように、未処理の試料と処理済試料を大気中で混在させないことで稼働率を下げることなく、腐食などの歩留まり低下を軽減することができる。 As described above, according to the present invention, it is possible to reduce the yield reduction such as corrosion without lowering the operation rate by not mixing the untreated sample and the treated sample in the atmosphere.
1.真空処理装置
2.試料
3.カセット
4.大気搬送手段
5.待避カセット
6.真空待避室
7.真空処理室
8.真空搬送機構
9.大気・真空雰囲気切替室
10.カセット載置機構
1. 1. Vacuum processing apparatus Sample 3.
Claims (3)
該真空処理室に試料を搬入出する真空搬送手段と、
前記真空処理室へ試料を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室と、
試料を収納できる複数のカセットを載置し得るカセット載置手段と、
前記カセット載置手段に載置されるカセットとは異なる待避カセットを大気雰囲気下で載置し得る待避カセット載置手段と、
前記カセット載置手段に載置された任意のカセット内もしくは前記待避カセット載置手段に載置された待避カセット内から試料を抜き取れるように上下動可能に構成された大気搬送手段と、
前記任意のカセット内から大気搬送手段によって抜き取った未処理の試料を前記切り替え可能な室及び前記真空搬送手段を介して前記真空処理室に搬入する制御、前記真空処理室で処理された処理済試料を前記任意のカセットとは異なる待避カセットに搬送する制御、前記任意のカセット内に未処理の試料が存在しない状態で前記待避カセットから処理済試料を前記任意のカセットに戻す制御を行う制御手段とを具備したことを特徴とする真空処理装置。 A plurality of vacuum processing chambers for processing samples in vacuum;
A vacuum transfer means for transferring the sample into and out of the vacuum processing chamber;
A chamber that can be switched to an air atmosphere or a vacuum atmosphere to carry the sample in and out of the vacuum processing chamber;
Cassette mounting means capable of mounting a plurality of cassettes capable of storing samples; and
A retracting cassette mounting means capable of mounting a retracting cassette different from the cassette mounted on the cassette mounting means in an air atmosphere;
An atmospheric transfer means configured to be movable up and down so as to extract a sample from an arbitrary cassette placed on the cassette placing means or from a retracted cassette placed on the retracted cassette placing means;
Control of carrying an unprocessed sample extracted from the arbitrary cassette by the atmospheric transfer means into the vacuum processing chamber via the switchable chamber and the vacuum transfer means, processed sample processed in the vacuum processing chamber Control means for transporting the processed sample to a storage cassette different from the arbitrary cassette, and control for returning the processed sample from the storage cassette to the arbitrary cassette in a state where there is no unprocessed sample in the arbitrary cassette; A vacuum processing apparatus comprising:
該真空処理室に試料を搬入出する真空搬送手段と、
前記真空処理室へ試料を搬入出するための大気雰囲気もしくは真空雰囲気に切り替え可能な室と、
試料を収納できる複数のカセットを載置し得るカセット載置手段と、
前記カセット載置手段に載置されるカセットとは異なる待避カセットを大気雰囲気下で載置し得る待避カセット載置手段と、
前記カセット載置手段に載置された任意のカセット内もしくは前記待避カセット載置手段に載置された待避カセット内から試料を抜き取れるように上下動可能に構成された大気搬送手段と、
前記任意のカセット内から大気搬送手段によって抜き取った未処理の試料を前記任意のカセットとは異なる待避カセットに搬送する制御、前記任意のカセットまたは前記待避カセット内の未処理の試料を前記切り替え可能な室及び前記真空搬送手段を介して前記真空処理室に搬入する制御、前記真空処理室で処理された処理済試料を前記試料を抜き取った未処理の試料がない状態の前記任意のカセット内に搬送する制御を行う制御手段とを具備したことを特徴とする真空処理装置。 A plurality of vacuum processing chambers for processing samples in vacuum;
A vacuum transfer means for transferring the sample into and out of the vacuum processing chamber;
A chamber that can be switched to an air atmosphere or a vacuum atmosphere to carry the sample in and out of the vacuum processing chamber;
Cassette mounting means capable of mounting a plurality of cassettes capable of storing samples; and
A retracting cassette mounting means capable of mounting a retracting cassette different from the cassette mounted on the cassette mounting means in an air atmosphere;
An atmospheric transfer means configured to be movable up and down so as to extract a sample from an arbitrary cassette placed on the cassette placing means or from a retracted cassette placed on the retracted cassette placing means;
Control for transporting unprocessed sample extracted from the arbitrary cassette by atmospheric transport means to a retreat cassette different from the arbitrary cassette, and switching the unprocessed sample in the arbitrary cassette or the retreat cassette is possible Control of loading into the vacuum processing chamber via the chamber and the vacuum transport means, transporting the processed sample processed in the vacuum processing chamber into the arbitrary cassette without the unprocessed sample from which the sample has been extracted A vacuum processing apparatus comprising a control means for performing control.
前記任意のカセット内から抜き取った試料を処理中、前記任意のカセット内の未処理の試料または前記真空処理室で処理後の処理済試料のいずれかのみを大気雰囲気下に設けられた待避カセット載置手段に載置した待避カセットに待避させ、未処理の試料と処理済試料とを前記任意のカセット内で混在させないように試料を搬送し、
前記任意のカセットから抜き取って真空処理した処理済試料を待避カセットに待避させ、前記任意のカセット内に未処理の試料が存在しない状態で前記待避カセットから処理済試料を前記任意のカセットに戻すか、
前記任意のカセットから未処理の試料を抜き取り各真空処理室へ搬送し、前記任意のカセットに残された未処理の試料を抜き取り待避カセットに待避させ、前記任意のカセットまたは待避カセットから抜き取られた未処理の試料を真空処理し、前記任意のカセット内に未処理の試料が存在しない状態で前記処理済試料を前記任意のカセットに戻すことを特徴とする真空処理方法。 An unprocessed sample is extracted from any cassette placed on the cassette mounting means, and is carried into one of a plurality of vacuum processing chambers via a chamber that can be switched to an air atmosphere or a vacuum atmosphere. In the vacuum processing method of transporting the processed sample into the arbitrary cassette after vacuum processing of the sample,
During the processing of the sample extracted from the arbitrary cassette, only the unprocessed sample in the arbitrary cassette or the processed sample after being processed in the vacuum processing chamber is mounted on a evacuation cassette. Retreat to a retreat cassette placed on the placing means, transport the sample so that untreated sample and treated sample are not mixed in the arbitrary cassette,
Whether the processed sample extracted from the arbitrary cassette and vacuum-processed is stored in the storage cassette, and the processed sample is returned from the storage cassette to the arbitrary cassette without any unprocessed sample in the arbitrary cassette. ,
An unprocessed sample was extracted from the arbitrary cassette, transported to each vacuum processing chamber, an unprocessed sample remaining in the arbitrary cassette was extracted, retracted to a retractable cassette, and extracted from the arbitrary cassette or the retractable cassette A vacuum processing method comprising: vacuum-treating an untreated sample, and returning the treated sample to the arbitrary cassette in a state where no untreated sample exists in the arbitrary cassette.
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