JP2001210602A - Substrate-processing apparatus - Google Patents

Substrate-processing apparatus

Info

Publication number
JP2001210602A
JP2001210602A JP2000018399A JP2000018399A JP2001210602A JP 2001210602 A JP2001210602 A JP 2001210602A JP 2000018399 A JP2000018399 A JP 2000018399A JP 2000018399 A JP2000018399 A JP 2000018399A JP 2001210602 A JP2001210602 A JP 2001210602A
Authority
JP
Japan
Prior art keywords
substrate
cassette
processing apparatus
housing
reaction furnace
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2000018399A
Other languages
Japanese (ja)
Other versions
JP4384770B2 (en
Inventor
Katsuaki Nogami
克明 野上
Akinari Hayashi
昭成 林
Tomoshi Taniyama
智志 谷山
Nobuatsu Kasashima
信篤 笠島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Kokusai Electric Inc
Original Assignee
Hitachi Kokusai Electric Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Kokusai Electric Inc filed Critical Hitachi Kokusai Electric Inc
Priority to JP2000018399A priority Critical patent/JP4384770B2/en
Publication of JP2001210602A publication Critical patent/JP2001210602A/en
Application granted granted Critical
Publication of JP4384770B2 publication Critical patent/JP4384770B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

PROBLEM TO BE SOLVED: To enable a substrate-processing apparatus to be lessened in occupancy area in a clan room. SOLUTION: A substrate-processing apparatus body is equipped with a case 20, in which a cassette stage 1 is provided at its fore part, and a vertical reaction furnace 10 is provided above its hind part. A cassette loader 2, cassette shelves 3 and 4, and a wafer transfer device 5 are provided on the hind side of the cassette stage 1, a boat elevator 8 is provided below the reaction furnace 10, and utility units such as a gas feed unit 11, a power supply unit 12, a control unit 13, an exhaust unit and the like are provided integrally to the case 20.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【０００１】[0001]

【発明の属する技術分野】本発明は、半導体ウェハ等の
基板をバッチ処理するための基板処理装置に関する。[0001] 1. Field of the Invention [0002] The present invention relates to a substrate processing apparatus for batch processing substrates such as semiconductor wafers.

【０００２】[0002]

【従来の技術】半導体ウェハに対して酸化膜の形成、ド
ーパントの拡散、アニールあるいはＣＤＶといった熱処
理を行う装置として縦型の基板処理装置が知られてい
る。2. Description of the Related Art A vertical substrate processing apparatus is known as an apparatus for performing a heat treatment such as formation of an oxide film, diffusion of a dopant, annealing or CDV on a semiconductor wafer.

【０００３】図４、図５は、従来の基板処理装置の外観
構成を示している。この装置は、処理装置本体５１と、
それと別置きにされたユーティリティボックス５２とか
ら構成されている。図６は処理装置本体５１の内部構成
を示す側面図である。FIGS. 4 and 5 show the external structure of a conventional substrate processing apparatus. This apparatus includes a processing apparatus main body 51,
It is composed of a utility box 52 and a separate utility box 52. FIG. 6 is a side view showing the internal configuration of the processing apparatus main body 51.

【０００４】処理装置本体５１には、ウェハカセットを
外部との間で搬入出するためのカセットステージ１が設
けられ、その後側にカセットローダ２、カセット棚３、
バッファカセット棚４、ウェハ移載機５、ウェハエレベ
ータ６が設けられ、さらにその後側にボート７、ボート
エレベータ８が設けられ、ボートエレベータ８の上側に
反応炉１０が設けられている。そして、反応炉心のヒー
タ１０Ａを交換する場合には、装置本体５１の背面上部
より出し入れを行い、電動リフタ５３の上に載せるよう
にしている。The processing apparatus main body 51 is provided with a cassette stage 1 for carrying a wafer cassette in and out of the apparatus, and a cassette loader 2, a cassette shelf 3,
A buffer cassette shelf 4, a wafer transfer machine 5, and a wafer elevator 6 are provided. Further, a boat 7 and a boat elevator 8 are provided on the rear side, and a reaction furnace 10 is provided above the boat elevator 8. When the heater 10A of the reactor core is to be replaced, the heater 10A is inserted into and removed from the upper rear surface of the apparatus main body 51, and is mounted on the electric lifter 53.

【０００５】また、図４、図５に示すように、ユーティ
リティボックス５２には、反応炉１０内に処理ガスを供
給するためのガス供給ユニット１１、反応炉心のヒータ
１０Ａ等に電源を供給する電源供給ユニット１２、駆動
部のコントローラなどを含む制御ユニット１３、反応炉
１０内を真空排気するための排気ユニット１４等が設け
られており、処理装置本体５１とユーティリティボック
ス５２との間には、配管やケーブル等が引き回されてい
る。As shown in FIGS. 4 and 5, a utility box 52 includes a gas supply unit 11 for supplying a processing gas into the reactor 10 and a power supply for supplying power to a heater 10A of the reactor core. A supply unit 12, a control unit 13 including a controller of a drive unit, and the like, an exhaust unit 14 for evacuating the inside of the reaction furnace 10, and the like are provided. And cables are routed.

【０００６】[0006]

【発明が解決しようとする課題】上述のように、従来で
は、処理装置本体５１に対して別置きで、ガス供給ユニ
ット１１、電源供給ユニット１２、制御ユニット１３、
排気ユニット１４を含むユーティリティボックス５２を
配置していたので、クリーンルーム内における装置の設
置占有面積が大きくなっていた。また、処理装置本体５
１のメンテナンスエリアの他にユーティリティボックス
５２のメンテナンスエリアも確保しなくてはならない場
合もあり、基板処理装置１台に対して広いメンテナンス
エリアが必要となっていた。As described above, conventionally, the gas supply unit 11, the power supply unit 12, the control unit 13,
Since the utility box 52 including the exhaust unit 14 was provided, the installation area of the device in the clean room was large. Further, the processing apparatus main body 5
In some cases, it is necessary to secure a maintenance area for the utility box 52 in addition to the first maintenance area, and a large maintenance area is required for one substrate processing apparatus.

【０００７】さらに、そのような占有面積が広く必要で
あるという事情により、ユーザーによってユーティリテ
ィボックスのレイアウトを異ならせる必要が生じ、その
ために多種多様な仕様が存在することになって、結果的
に、設計・製造の負担が多くかかり、設備を新設する場
合に工期の長期化を招く等の問題もあった。[0007] Furthermore, due to the necessity of such a large occupied area, it is necessary to vary the layout of the utility box depending on the user, and as a result, there are a variety of specifications. There is also a problem in that the burden of design and manufacturing is large, and when installing new equipment, the construction period is lengthened.

【０００８】また、処理装置本体５１とユーティリティ
ボックス５２が一体性を持つものではなかったため、あ
る場所から別の場所に装置を移動する場合に、いちいち
処理装置本体５１とユーティリティボックス５２の接続
を切り離し、搬送後に再び接続を戻さなくてはならず、
作業が非常に煩わしいものであった。Further, since the processing apparatus body 51 and the utility box 52 are not integrated, when the apparatus is moved from one place to another, the connection between the processing apparatus body 51 and the utility box 52 is disconnected. , The connection must be restored after transport,
The work was very cumbersome.

【０００９】本発明は、上記事情を考慮し、クリーンル
ーム内での占有面積の縮小を図ることができると共に、
装置のレイアウトを標準化することができ、しかも移設
する際にユーティリティユニットを含めて一体的な取り
扱いが可能になる基板処理装置を提供することを目的と
する。The present invention can reduce the area occupied in a clean room in consideration of the above circumstances,
It is an object of the present invention to provide a substrate processing apparatus that can standardize the layout of the apparatus and can integrally handle the apparatus including the utility unit when relocating the apparatus.

【００１０】[0010]

【課題を解決するための手段】請求項１の発明は、筐体
内の前部に外部との間で基板カセットの搬入出を行うカ
セットステージが設けられ、筐体内の後部上方に基板に
対して所定の処理を行う縦型の反応炉が設けられ、前記
カセットステージの後側に、基板カセットを搬送するカ
セットローダ、基板カセットを保管するカセット棚、基
板カセットの中から基板を取り出してボートに移載する
基板移載手段が設けられ、前記反応炉の下側に、基板が
搭載されたボートを反応炉に対し出し入れするボートエ
レベータが設けられた処理装置本体を具備してなる基板
処理装置において、前記処理装置本体の筐体に、用力ユ
ニットを一体に装備したことを特徴とする。According to a first aspect of the present invention, a cassette stage for carrying a substrate cassette in and out of the housing is provided at a front portion inside the housing, and a substrate stage is provided above the rear portion inside the housing. A vertical reaction furnace for performing predetermined processing is provided. A cassette loader for transporting the substrate cassette, a cassette shelf for storing the substrate cassette, and a substrate taken out of the substrate cassette and transferred to a boat are provided behind the cassette stage. In a substrate processing apparatus, a substrate transfer means for mounting is provided, and a processing apparatus main body provided with a boat elevator for taking a boat loaded with substrates in and out of the reaction furnace is provided below the reaction furnace. A utility unit is integrally provided in a housing of the processing apparatus main body.

【００１１】この発明では、用力ユニットを処理装置本
体の筐体に一体的に装備したので、従来のユーティリテ
ィボックスを別置きする場合に比べて、装置１台当りの
クリーンルーム内での占有面積を小さくすることができ
る。また、占有面積の縮小により標準化が可能になるた
め、ユーザー毎にレイアウト仕様を変える等の煩わしさ
がなくなる。また、用力ユニットが処理装置本体と一体
であるため、装置を移設する際に、接続を切り離して再
接続する等の面倒な手間を要さずに一体的な取り扱いが
できる。According to the present invention, since the utility unit is integrally provided in the housing of the processing apparatus main body, the area occupied in the clean room per apparatus is reduced as compared with the case where a conventional utility box is separately provided. can do. In addition, since the standardization can be performed by reducing the occupied area, it is not necessary to change the layout specification for each user. Further, since the utility unit is integrated with the main body of the processing apparatus, when the apparatus is relocated, it can be integrally handled without troublesome work such as disconnecting and reconnecting.

【００１２】[0012]

【発明の実施の形態】以下、本発明の実施形態を図面に
基づいて説明する。図１は実施形態の基板処理装置の一
例としての縦型ＣＶＤ装置の前方左側から見た斜視図で
あり、（ａ）は詳細図、（ｂ）はレイアウト図、図２は
同前方右側から見た詳細斜視図、図３は同装置の内部構
成を示す側面図である。Embodiments of the present invention will be described below with reference to the drawings. FIG. 1 is a perspective view of a vertical CVD apparatus as an example of a substrate processing apparatus according to an embodiment, as viewed from the front left side, where FIG. 1A is a detailed view, FIG. 1B is a layout view, and FIG. FIG. 3 is a side view showing the internal configuration of the device.

【００１３】この縦型ＣＶＤ装置は、全体的に見た場
合、直方体形状の筐体２０に、装置本体を構成するほと
んど全ての主要部品を一体的に装備したものである。全
体はいくつかのボックスＢ１〜Ｂ４に分けられており、
それらのボックスＢ１〜Ｂ４を互いに連結することで、
装置が完成されている。When viewed as a whole, this vertical CVD apparatus has a rectangular parallelepiped casing 20 integrally provided with almost all the main components constituting the apparatus main body. The whole is divided into several boxes B1 to B4,
By connecting those boxes B1 to B4 to each other,
The device has been completed.

【００１４】図１（ｂ）のレイアウト図に示すように、
上部中央のボックスはヒータボックスＢ１、上部前側の
ボックスはコントローラボックスＢ２、下部前後のボッ
クスはウェハ搬送ボックスＢ３、上部後側のボックスは
ガスボックスＢ４となっている。これらは各々が単独で
組み上げられており、それぞれが自立した構造になって
いる。よって、各々のボックスＢ１〜Ｂ４毎の組立を完
了した後、最終組立として４個のボックスＢ１〜Ｂ４を
互いに連結することにより、装置が完成されている。As shown in the layout diagram of FIG.
The upper center box is a heater box B1, the upper front box is a controller box B2, the lower front and rear boxes are a wafer transfer box B3, and the upper rear box is a gas box B4. Each of these is assembled independently, and each has an independent structure. Therefore, after the assembly of each of the boxes B1 to B4 is completed, the device is completed by connecting the four boxes B1 to B4 to each other as a final assembly.

【００１５】各ボックスＢ１〜Ｂ４間には配線や配管の
接続部が存在するが、それらの接続部は全て分割マウン
ト方式となっていて、接続・離脱が可能となっている。
そして、装置の搬入時に、仕様の異なる個々のボックス
Ｂ１〜Ｂ４を組み合わせることにより、顧客の要求や膜
種の別に対応できるようになっている。Although there are wiring and piping connections between the boxes B1 to B4, all of these connections are of the split mount type and can be connected and disconnected.
Then, by combining the individual boxes B1 to B4 having different specifications when the apparatus is carried in, it is possible to respond to customer requirements and film types.

【００１６】装置本体の主要部品として、図１（ａ）、
図２に示すように、筐体２０内の前部には、外部との間
でウェハカセット（基板カセット）Ｃの搬入出を行うカ
セットステージ１が設けられ、筐体２０内の後部上方に
は、ウェハに対して所定の処理（ＣＶＤ）を行う縦型の
反応炉１０が設けられている。反応炉１０は、ヒータ１
０Ａと、その内部の反応室１０Ｂとから構成されてい
る。As the main parts of the apparatus main body, FIG.
As shown in FIG. 2, a cassette stage 1 for carrying in / out a wafer cassette (substrate cassette) C with the outside is provided at a front portion inside the housing 20. A vertical reaction furnace 10 for performing a predetermined process (CVD) on a wafer is provided. The reactor 10 includes the heater 1
0A and a reaction chamber 10B therein.

【００１７】また、筐体２０内のカセットステージ１の
後側には、ウェハカセットＣを搬送するカセットローダ
２と、ウェハカセットＣを保管するカセット棚３と、ウ
ェハカセットＣを一時的に保管するバッファカセット棚
４と、ウェハカセットＣの中からウェハを取り出してボ
ート７に移載するウェハ移載機（基板移載手段）５及び
移載エレベータ６とが設けられ、反応炉１０の下側に
は、ウェハが搭載されたボート７を反応炉１０の反応室
１０Ｂに対して出し入れするボートエレベータ８が設け
られている。Further, behind the cassette stage 1 in the housing 20, a cassette loader 2 for transporting the wafer cassette C, a cassette shelf 3 for storing the wafer cassette C, and a temporary storage for the wafer cassette C. A buffer cassette shelf 4, a wafer transfer machine (substrate transfer means) 5 for transferring wafers from the wafer cassette C and transferring them to the boat 7, and a transfer elevator 6 are provided. Is provided with a boat elevator 8 for taking a boat 7 loaded with wafers into and out of the reaction chamber 10B of the reaction furnace 10.

【００１８】反応炉１０はヒータボックスＢ１に装備さ
れ、カセットステージ１からボートエレベータ８までの
搬送系はウェハ搬送ボックスＢ３に装備されている。ま
た、ユーティリティユニット（用力ユニット）として
は、反応炉１０に処理ガスを供給するガス供給ユニット
１１と、反応炉１０のヒータ１０Ａや各種駆動部あるい
は制御部等に対して電源を供給する電源供給ユニット１
２と、駆動部のコントローラや各種計器類などを含む制
御ユニット１３と、反応炉１０内を真空排気するための
排気ユニット１４とが設けられており、これらは全て装
置本体の筐体２０の内部、あるいは筐体２０の外部に直
接一体的に装備されている。特に、制御ユニット１３は
コントローラボックスＢ２に装備され、ガス供給ユニッ
ト１１はガスボックスＢ４に装備されている。The reaction furnace 10 is provided in a heater box B1, and a transfer system from the cassette stage 1 to the boat elevator 8 is provided in a wafer transfer box B3. The utility unit (utility unit) includes a gas supply unit 11 that supplies a processing gas to the reaction furnace 10 and a power supply unit that supplies power to the heater 10A of the reaction furnace 10, various driving units, a control unit, and the like. 1
2, a control unit 13 including a controller of a driving unit and various instruments, and an exhaust unit 14 for evacuating the inside of the reaction furnace 10, all of which are provided inside a housing 20 of the apparatus main body. Alternatively, it is directly and integrally provided outside the housing 20. In particular, the control unit 13 is provided in the controller box B2, and the gas supply unit 11 is provided in the gas box B4.

【００１９】各ユニット１１〜１４の配置については適
宜変更可能であるが、本実施形態では、ガス供給ユニッ
ト１１が筐体２０の背面上部に配置され、電源供給ユニ
ット１２及び排気ユニット１４が、筐体２０の背面の反
応炉１０の交換の邪魔にならない側方位置に配置され、
制御ユニット１３が、バッファカセット棚４を前方下部
に配置したことによってできる筐体２０内の前側上部の
空きスペースに配置されている。Although the arrangement of the units 11 to 14 can be changed as appropriate, in the present embodiment, the gas supply unit 11 is arranged on the upper rear surface of the housing 20, and the power supply unit 12 and the exhaust unit 14 are mounted on the housing. It is arranged on the back side of the body 20 at a side position that does not hinder the replacement of the reactor 10,
The control unit 13 is arranged in an empty space on the upper front side in the housing 20 formed by disposing the buffer cassette shelf 4 at the lower front.

【００２０】このように、ユーティリティユニット（ガ
ス供給ユニット１１、電源供給ユニット１２、制御ユニ
ット１３、排気ユニット１４）を全て装置本体の筐体２
０に直接装備したことにより、従来の別置きするタイプ
と比べて、設置面積やメンテナンスエリアを縮小するこ
とができる。As described above, the utility units (the gas supply unit 11, the power supply unit 12, the control unit 13, and the exhaust unit 14) are all provided in the housing 2 of the apparatus main body.
By directly equipping the device with 0, the installation area and the maintenance area can be reduced as compared with the conventional separately installed type.

【００２１】また、特に、ガス供給ユニット１１を筐体
２０の背面上部に配置したことにより、反応炉１０の直
近に位置するガス供給ユニットから反応炉１０までのガ
ス配管を短縮することができ、ガス交換に要するガス消
費量を削減することが可能となる。Further, in particular, by disposing the gas supply unit 11 at the upper rear portion of the housing 20, the gas piping from the gas supply unit located immediately near the reaction furnace 10 to the reaction furnace 10 can be shortened. Gas consumption required for gas exchange can be reduced.

【００２２】同様に、排気ユニット１４を筐体２０の背
面に直接装備したことにより、排気配管の短縮を図るこ
とができる上、反応室１０Ｂの副生成物付着を防止する
ために設ける配管加熱ヒータの使用面積を減らすことが
でき、その消費電力の削減が可能となる。Similarly, since the exhaust unit 14 is provided directly on the back of the housing 20, the exhaust pipe can be shortened, and a pipe heater provided to prevent by-products from adhering to the reaction chamber 10B. Can be used, and the power consumption thereof can be reduced.

【００２３】また、電源供給ユニット１２を筐体２０の
背面に直接装備したことにより、電源ケーブルの短縮を
図れる上、ケーブル引き回しの繁雑さを回避することが
できる。同様に、制御ユニット１３を筐体２０内の前部
空きスペースに配置したことにより、制御関係の配線の
短縮が図れる上、配線の引き回しの簡略化が図れる。な
お、制御ユニット１３の計器類については、計測関係の
センサの出力信号をコントローラに取り込んで図示略の
主操作装置に送ることにより、主操作装置のモニタ画面
に集約的に表示させることも可能であり、そうすること
で計器類の搭載を最小限に留めることもできる。Further, since the power supply unit 12 is provided directly on the rear surface of the housing 20, the power cable can be shortened, and the complexity of cable routing can be avoided. Similarly, by arranging the control unit 13 in the front empty space in the housing 20, it is possible to shorten the wiring related to the control and to simplify the wiring. The instruments of the control unit 13 can be collectively displayed on a monitor screen of the main operation device by taking output signals of sensors related to measurement into a controller and sending the signals to a main operation device (not shown). Yes, so that instrumentation can be kept to a minimum.

【００２４】ところで、この種の縦型ＣＶＤ装置におい
ては、反応炉１０の特にヒータ１０Ａの交換作業が適当
な間隔で必要になる。従来では、反応炉１０を筐体２０
の背面上部より交換していた。しかし、上記の縦型ＣＶ
Ｄ装置では、ガス供給ユニット１１を筐体２０の背面上
部に配置したことにより、筐体２０の背面上部から反応
炉１０の出し入れを行うことはできなくなる。In this type of vertical CVD apparatus, replacement of the reaction furnace 10, especially the heater 10A, becomes necessary at appropriate intervals. Conventionally, the reactor 10 is
Was replaced from the upper back of the. However, the above vertical CV
In the D apparatus, since the gas supply unit 11 is disposed at the upper rear portion of the housing 20, the reactor 10 cannot be moved in and out of the upper rear portion of the housing 20.

【００２５】そこで、反応炉１０の交換作業を行う場合
は、図３に示すように、ボートエレベータ８を利用して
反応炉１０を昇降させることにより、装置の背面下部の
移載室を通して反応炉１０の交換を行う。こうすること
により、リフタ付きでない台車３０を用いて反応炉１０
の交換作業を行うことができる。Therefore, when replacing the reactor 10, as shown in FIG. 3, the reactor 10 is raised and lowered by using the boat elevator 8, so that the reactor Replace 10 By doing so, the reaction furnace 10 can be mounted using the carriage 30 without a lifter.
Can be replaced.

【００２６】なお、上記実施形態では、本発明を縦型Ｃ
ＶＤ装置に適用した場合を説明したが、本発明は縦型拡
散装置等の他の基板処理装置にも適用可能である。In the above embodiment, the present invention relates to a vertical C
Although the case where the present invention is applied to a VD apparatus has been described, the present invention is also applicable to other substrate processing apparatuses such as a vertical diffusion apparatus.

【００２７】また、上記実施形態では、制御ユニット１
３を筐体２０の前面上部、ガス供給ユニット１１を筐体
２０の背面上部、電源供給ユニット１２を背面側方下
部、排気ユニット１４を筐体２０の背面に配置したが、
それら各々のユニットの配置は適宜変更可能である。In the above embodiment, the control unit 1
3, the gas supply unit 11 is disposed on the rear upper part of the housing 20, the power supply unit 12 is disposed on the rear side lower part, and the exhaust unit 14 is disposed on the rear side of the housing 20.
The arrangement of these units can be changed as appropriate.

【００２８】[0028]

【発明の効果】以上説明したように、本発明によれば、
用力ユニットを装置本体の筐体に一体的に装備したの
で、装置の占有面積やメンテナンスエリアの縮小を図る
ことができる。従って、クリーンルーム内のスペースを
効率良く利用できるようになり、設備投資を抑えること
ができる。また、占有面積の縮小により標準化が可能に
なるため、ユーザー毎にレイアウト仕様を変える等の煩
わしさがなくなる。また、用力ユニットが処理装置本体
と一体であるため、装置を移設する際に、接続を切り離
して再接続する等の面倒な手間も要しなくなり作業の簡
略化が図れる。As described above, according to the present invention,
Since the utility unit is integrally provided in the housing of the apparatus main body, the area occupied by the apparatus and the maintenance area can be reduced. Therefore, the space in the clean room can be used efficiently, and capital investment can be reduced. In addition, since the standardization can be performed by reducing the occupied area, the trouble of changing the layout specification for each user is eliminated. Further, since the utility unit is integrated with the main body of the processing apparatus, when the apparatus is relocated, troublesome work such as disconnection and reconnection is not required, and the operation can be simplified.

【図面の簡単な説明】[Brief description of the drawings]

【図１】本発明の実施形態の縦型ＣＶＤ装置の前方左側
から見た斜視図であり、（ａ）は詳細図、（ｂ）はレイ
アウト図である。FIG. 1 is a perspective view of a vertical CVD apparatus according to an embodiment of the present invention as viewed from the front left side, where (a) is a detailed view and (b) is a layout view.

【図２】同縦型ＣＶＤ装置の前方右側から見た斜視図で
ある。FIG. 2 is a perspective view of the vertical CVD apparatus as viewed from the front right side.

【図３】同縦型ＣＶＤ装置の内部構成を示す側面図であ
る。FIG. 3 is a side view showing an internal configuration of the vertical CVD apparatus.

【図４】従来の基板処理装置の斜視図である。FIG. 4 is a perspective view of a conventional substrate processing apparatus.

【図５】従来の基板処理装置の別の角度から見た斜視図
である。FIG. 5 is a perspective view of a conventional substrate processing apparatus viewed from another angle.

【図６】従来の基板処理装置における装置本体の内部構
成を示す側面図である。FIG. 6 is a side view showing an internal configuration of an apparatus main body in a conventional substrate processing apparatus.

【符号の説明】[Explanation of symbols]

１ カセットステージ ２ カセットローダ ３ カセット棚 ４ バッファカセット棚 ５ ウェハ移載機 ６ 移載エレベータ ７ ボート ８ ボートエレベータ １０ 反応炉 １１ ガス供給ユニット（用力ユニット） １２ 電源供給ユニット（用力ユニット） １３ 制御ユニット（用力ユニット） １４ 排気ユニット（用力ユニット） Ｃ カセット DESCRIPTION OF SYMBOLS 1 Cassette stage 2 Cassette loader 3 Cassette shelf 4 Buffer cassette shelf 5 Wafer transfer machine 6 Transfer elevator 7 Boat 8 Boat elevator 10 Reactor 11 Gas supply unit (power unit) 12 Power supply unit (power unit) 13 Control unit ( Utility unit) 14 Exhaust unit (utility unit) C cassette

フロントページの続き (72)発明者 谷山 智志 東京都中野区東中野三丁目14番20号 国際 電気株式会社内 (72)発明者 笠島 信篤 東京都中野区東中野三丁目14番20号 国際 電気株式会社内 Ｆターム(参考） 5F031 CA02 DA17 FA01 FA03 FA09 FA11 FA12 FA15 HA67 MA09 MA28 MA30 5F045 BB10 DQ05 EM10 EN04 EN05Continuing on the front page (72) Inventor Satoshi Taniyama 3-14-20 Higashinakano, Nakano-ku, Tokyo Inside Kokusai Electric Co., Ltd. F term (reference) 5F031 CA02 DA17 FA01 FA03 FA09 FA11 FA12 FA15 HA67 MA09 MA28 MA30 5F045 BB10 DQ05 EM10 EN04 EN05

Claims (1)

【特許請求の範囲】[Claims] 【請求項１】 筐体内の前部に外部との間で基板カセッ
トの搬入出を行うカセットステージが設けられ、筐体内
の後部上方に基板に対して所定の処理を行う縦型の反応
炉が設けられ、前記カセットステージの後側に、基板カ
セットを搬送するカセットローダ、基板カセットを保管
するカセット棚、基板カセットの中から基板を取り出し
てボートに移載する基板移載手段が設けられ、前記反応
炉の下側に、基板が搭載されたボートを反応炉に対し出
し入れするボートエレベータが設けられた処理装置本体
を具備してなる基板処理装置において、 前記処理装置本体の筐体に、用力ユニットを一体に装備
したことを特徴とする基板処理装置。1. A cassette stage for carrying a substrate cassette to and from the outside is provided at a front portion inside a housing, and a vertical reaction furnace for performing a predetermined process on a substrate is provided above a rear portion inside the housing. A cassette loader for transporting a substrate cassette, a cassette shelf for storing the substrate cassette, and a substrate transfer means for removing a substrate from the substrate cassette and transferring the substrate to a boat. In a substrate processing apparatus including a processing apparatus main body provided with a boat elevator for taking a boat loaded with substrates into and out of the reaction furnace below the reaction furnace, a utility unit is provided in a housing of the processing apparatus main body. A substrate processing apparatus, wherein the substrate processing apparatus is integrally provided.
JP2000018399A 2000-01-27 2000-01-27 Substrate processing equipment Expired - Lifetime JP4384770B2 (en)

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