JP2001201682A5 - - Google Patents
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- Publication number
- JP2001201682A5 JP2001201682A5 JP2000384773A JP2000384773A JP2001201682A5 JP 2001201682 A5 JP2001201682 A5 JP 2001201682A5 JP 2000384773 A JP2000384773 A JP 2000384773A JP 2000384773 A JP2000384773 A JP 2000384773A JP 2001201682 A5 JP2001201682 A5 JP 2001201682A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US17182799P | 1999-12-21 | 1999-12-21 | |
| US60/171827 | 1999-12-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001201682A JP2001201682A (ja) | 2001-07-27 |
| JP2001201682A5 true JP2001201682A5 (cg-RX-API-DMAC10.html) | 2008-02-07 |
Family
ID=22625292
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000384773A Pending JP2001201682A (ja) | 1999-12-21 | 2000-12-19 | 光学投影システム |
Country Status (4)
| Country | Link |
|---|---|
| US (1) | US20020001141A1 (cg-RX-API-DMAC10.html) |
| EP (1) | EP1111425A3 (cg-RX-API-DMAC10.html) |
| JP (1) | JP2001201682A (cg-RX-API-DMAC10.html) |
| TW (1) | TW448307B (cg-RX-API-DMAC10.html) |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH1195095A (ja) | 1997-09-22 | 1999-04-09 | Nikon Corp | 投影光学系 |
| EP1139138A4 (en) | 1999-09-29 | 2006-03-08 | Nikon Corp | PROJECTION EXPOSURE PROCESS, DEVICE AND OPTICAL PROJECTION SYSTEM |
| WO2001023933A1 (en) | 1999-09-29 | 2001-04-05 | Nikon Corporation | Projection optical system |
| JP2002244034A (ja) | 2001-02-21 | 2002-08-28 | Nikon Corp | 投影光学系および該投影光学系を備えた露光装置 |
| JP2002323652A (ja) | 2001-02-23 | 2002-11-08 | Nikon Corp | 投影光学系，該投影光学系を備えた投影露光装置および投影露光方法 |
| WO2003075097A2 (de) * | 2002-03-01 | 2003-09-12 | Carl Zeiss Smt Ag | Refraktives projektionsobjektiv mit einer taille |
| US7154676B2 (en) | 2002-03-01 | 2006-12-26 | Carl Zeiss Smt A.G. | Very-high aperture projection objective |
| DE10224361A1 (de) * | 2002-05-03 | 2003-11-13 | Zeiss Carl Smt Ag | Projektionsobjektiv höchster Apertur |
| US7190527B2 (en) | 2002-03-01 | 2007-03-13 | Carl Zeiss Smt Ag | Refractive projection objective |
| DE10210899A1 (de) * | 2002-03-08 | 2003-09-18 | Zeiss Carl Smt Ag | Refraktives Projektionsobjektiv für Immersions-Lithographie |
| CN1295566C (zh) * | 2002-05-03 | 2007-01-17 | 卡尔蔡司Smt股份公司 | 极高孔径的投影物镜 |
| JP2009104184A (ja) * | 2002-07-04 | 2009-05-14 | Nikon Corp | 投影光学系、露光装置、およびデバイス製造方法 |
| US20050029498A1 (en) * | 2003-08-08 | 2005-02-10 | Mark Elkovitch | Electrically conductive compositions and method of manufacture thereof |
| JP2011237588A (ja) * | 2010-05-10 | 2011-11-24 | Sony Corp | ズームレンズ及び撮像装置 |
| CN101975983B (zh) * | 2010-09-13 | 2012-05-30 | 北京理工大学 | 高分辨率非球面光刻物镜 |
| CN102486569B (zh) | 2010-12-01 | 2014-06-18 | 上海微电子装备有限公司 | 一种投影物镜系统 |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3298131B2 (ja) * | 1991-10-24 | 2002-07-02 | 株式会社ニコン | 縮小投影レンズ |
| JPH07113955A (ja) * | 1993-10-18 | 1995-05-02 | Minolta Co Ltd | ズームレンズ |
| JPH0817719A (ja) * | 1994-06-30 | 1996-01-19 | Nikon Corp | 投影露光装置 |
| JP3429584B2 (ja) * | 1994-11-11 | 2003-07-22 | オリンパス光学工業株式会社 | ズームレンズ |
| JP3624973B2 (ja) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | 投影光学系 |
| JP3864399B2 (ja) * | 1996-08-08 | 2006-12-27 | 株式会社ニコン | 投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法 |
| DE19818444A1 (de) * | 1997-04-25 | 1998-10-29 | Nikon Corp | Abbildungsoptik, Projektionsoptikvorrichtung und Projektionsbelichtungsverfahren |
| JPH116957A (ja) * | 1997-04-25 | 1999-01-12 | Nikon Corp | 投影光学系および投影露光装置並びに投影露光方法 |
| US5990926A (en) * | 1997-07-16 | 1999-11-23 | Nikon Corporation | Projection lens systems for excimer laser exposure lithography |
| JPH11214293A (ja) * | 1998-01-22 | 1999-08-06 | Nikon Corp | 投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法 |
| JP3292136B2 (ja) * | 1998-05-11 | 2002-06-17 | 株式会社ニコン | 投影系及び投影露光法 |
| EP1141781B1 (de) * | 1998-11-30 | 2006-02-08 | Carl Zeiss SMT AG | Hochaperturiges projektionsobjektiv mit minimalem blendenfehler |
| DE19942281A1 (de) * | 1999-05-14 | 2000-11-16 | Zeiss Carl Fa | Projektionsobjektiv |
-
2000
- 2000-12-04 TW TW089125820A patent/TW448307B/zh not_active IP Right Cessation
- 2000-12-18 EP EP00127677A patent/EP1111425A3/en not_active Ceased
- 2000-12-19 JP JP2000384773A patent/JP2001201682A/ja active Pending
- 2000-12-21 US US09/746,728 patent/US20020001141A1/en not_active Abandoned