JP2001189367A - Substrate-carrying robot - Google Patents
Substrate-carrying robotInfo
- Publication number
- JP2001189367A JP2001189367A JP2000000026A JP2000000026A JP2001189367A JP 2001189367 A JP2001189367 A JP 2001189367A JP 2000000026 A JP2000000026 A JP 2000000026A JP 2000000026 A JP2000000026 A JP 2000000026A JP 2001189367 A JP2001189367 A JP 2001189367A
- Authority
- JP
- Japan
- Prior art keywords
- substrate
- fork
- transfer robot
- slope
- fork portion
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G49/00—Conveying systems characterised by their application for specified purposes not otherwise provided for
- B65G49/05—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
- B65G49/06—Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
- B65G49/061—Lifting, gripping, or carrying means, for one or more sheets forming independent means of transport, e.g. suction cups, transport frames
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B65—CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
- B65G—TRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
- B65G2249/00—Aspects relating to conveying systems for the manufacture of fragile sheets
- B65G2249/02—Controlled or contamination-free environments or clean space conditions
Landscapes
- Jigs For Machine Tools (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
Abstract
Description
【０００１】[0001]
【発明の属する技術分野】本発明は基板搬送ロボットに
かかり、特に、ガラス基板を搬送するのに適した基板搬
送ロボットを提供する。BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a substrate transfer robot, and more particularly, to a substrate transfer robot suitable for transferring a glass substrate.
【０００２】[0002]
【従来の技術】従来より、真空雰囲気中で基板を搬送す
るために、基板搬送ロボットは広く用いられている。2. Description of the Related Art Conventionally, a substrate transfer robot has been widely used to transfer a substrate in a vacuum atmosphere.
【０００３】図１０(ａ)は、従来技術の基板搬送ロボッ
トのフォーク部１１０の平面図であり、同図(ｂ)は側面
図である。このフォーク部１１０は先端が二股に分かれ
ており、その部分の表面には、凹部１１２が形成されて
いる。FIG. 10A is a plan view of a fork portion 110 of a conventional substrate transfer robot, and FIG. 10B is a side view. The tip of the fork portion 110 is bifurcated, and a concave portion 112 is formed on the surface of that portion.
【０００４】この凹部１１２は、円形のシリコン基板を
落とし込めるような平面パターンに形成されている。図
１０(ｃ)の符号１０５は、凹部１１２内に落とし込んだ
状態のシリコン基板を示している。The recess 112 is formed in a plane pattern that allows a circular silicon substrate to be dropped. Reference numeral 105 in FIG. 10C indicates the silicon substrate dropped into the recess 112.
【０００５】この状態では、シリコン基板１０５の端部
は、凹部１１２の壁面と接触するか、接触しているのに
近い状態になり、フォーク部１１０を水平移動させて
も、シリコン基板１０５はフォーク部１１０上を滑らず
に搬送されるようになっている。In this state, the end of the silicon substrate 105 comes into contact with or close to the wall surface of the concave portion 112, and even if the fork portion 110 is moved horizontally, The paper is conveyed without slipping on the part 110.
【０００６】しかしながら、近年用いられているガラス
基板は上記のようなシリコン基板に比べて縁部分が破損
しやすい。また、ガラス基板は矩形であるため、それを
落とし込んで搬送できるような凹部を形成しようとする
と、フォーク部が大型化するという問題がある。However, the edge portion of a glass substrate used in recent years is more likely to be damaged than the silicon substrate described above. Further, since the glass substrate is rectangular, there is a problem in that if a concave portion is formed so that the glass substrate can be dropped and conveyed, the fork becomes large.
【０００７】[0007]
【発明が解決しようとする課題】本発明は上記従来技術
の不都合を解決するために創作されたものであり、その
目的は、ガラス基板の搬送に適した基板搬送ロボットを
提供することにある。SUMMARY OF THE INVENTION The present invention has been made to solve the above-mentioned disadvantages of the prior art, and an object of the present invention is to provide a substrate transport robot suitable for transporting a glass substrate.
【０００８】[0008]
【課題を解決するための手段】上記課題を解決するため
に、請求項１記載の発明は、フォーク部上に基板を水平
に載置し、前記フォーク部を水平方向に移動させ、基板
を搬送する基板搬送ロボットであって、前記フォーク部
の先端付近には、上部に斜面を有する突起部材が配置さ
れ、前記基板を前記フォーク部の上方に位置させ、該基
板を降下させたときに、前記基板は、端部が前記斜面上
を滑りながら前記フォーク部上に載置されるように構成
された基板搬送ロボットである。請求項２記載の発明
は、請求項１記載の基板搬送ロボットであって、前記突
起部材は、側面が前記フォーク部表面に垂直に配置され
た円柱形状の部分と、前記円柱形状の部分の上部底面上
に設けられた円錐台形状の部分で構成され、前記円錐台
形状の部分の側面が前記斜面として用いられる基板搬送
ロボットである。請求項３記載の発明は、フォーク部上
に矩形の基板を水平に載置し、前記フォーク部を水平方
向に移動させ、基板を搬送する基板搬送ロボットであっ
て、前記フォーク部の両脇には腕部が配置され、前記各
腕部には、突部を有する保持部材が設けられ、前記フォ
ーク部上に前記基板を載置したときに、前記基板の三辺
が前記突部に接触できるように構成されたことを特徴と
する基板搬送ロボットである。請求項４記載の発明は、
請求項３記載の基板搬送ロボットであって、前記各突部
の上部には斜面が設けられ、前記基板を前記フォーク部
の上方に位置させ、前記基板を降下させたときに、前記
基板は、端部が前記突部の斜面上を滑りながら前記フォ
ーク部上に載置されるように構成された基板搬送ロボッ
トである。請求項５記載の発明は、請求項３又は請求項
４のいずれか１項記載の基板搬送ロボットであって、前
記フォーク部の先端付近には突起部材が配置され、前記
フォーク部上に載置された前記基板の四辺のうち、前記
突部に接触しない辺は、前記突起部材に接触できるよう
に構成された基板搬送ロボットである。請求項６記載の
発明は、請求項５記載の基板搬送ロボットであって、前
記突起部材には斜面が設けられ、前記基板を前記フォー
ク部の上方に位置させ、前記基板を降下させたときに、
前記基板は、端部が前記突部の斜面、又は前記突起部材
の斜面のいずれか一方又は両方の斜面上を滑りながら前
記フォーク部上に配置されるように構成された基板搬送
ロボットである。請求項７記載の発明は、請求項６記載
の基板搬送ロボットであって、前記突起部材は、側面が
前記フォーク部表面に垂直に配置された円柱形状の部分
と、前記円柱形状の部分の上部底面上に設けられた円錐
台形状の部分で構成され、前記円錐台形状の部分の側面
が前記斜面として用いられる基板搬送ロボットである。
請求項８記載の発明は、請求項１乃至請求項７のいずれ
か１項記載の基板搬送ロボットであって、前記フォーク
部はアルミナで形成され、その表面にはアルミニウムの
保護膜が形成された基板搬送ロボットである。請求項９
記載の発明は、請求項１乃至請求項８のいずれか１項記
載の基板搬送ロボットであって、前記フォーク部上には
支持部材が配置され、前記基板は前記支持部材上に乗せ
られるように構成された基板搬送ロボットである。請求
項１０記載の発明は、請求項１乃至請求項９のいずれか
１項記載の基板搬送ロボットが真空槽内に配置された搬
送室である。請求項１１記載の発明は、請求項１０記載
の搬送室と、該搬送室に接続された処理室であって、真
空雰囲気中で前記基板の処理を行う処理室とを有する真
空処理装置である。According to a first aspect of the present invention, a substrate is placed horizontally on a fork, the fork is moved in a horizontal direction, and the substrate is conveyed. In the substrate transfer robot, near the tip of the fork portion, a projection member having a slope on the upper portion is disposed, the substrate is positioned above the fork portion, and when the substrate is lowered, the The substrate is a substrate transfer robot configured to be placed on the fork while the end slides on the slope. According to a second aspect of the present invention, in the substrate transfer robot according to the first aspect, the projecting member has a columnar portion having a side surface arranged perpendicular to the surface of the fork portion, and an upper portion of the columnar portion. The substrate transport robot includes a truncated cone-shaped portion provided on a bottom surface, and a side surface of the truncated cone-shaped portion is used as the slope. The invention according to claim 3 is a substrate transport robot that horizontally places a rectangular substrate on a fork portion, moves the fork portion in a horizontal direction, and transports the substrate, and the robot is provided on both sides of the fork portion. Is provided with a holding member having a projection, and when the substrate is placed on the fork, three sides of the substrate can contact the projection. A substrate transport robot characterized in that it is configured as described above. The invention according to claim 4 is
4. The substrate transport robot according to claim 3, wherein an inclined surface is provided at an upper portion of each of the protrusions, and the substrate is located above the fork portion, and when the substrate is lowered, the substrate is: A substrate transport robot configured such that an end portion is placed on the fork portion while sliding on an inclined surface of the projection. According to a fifth aspect of the present invention, there is provided the substrate transfer robot according to any one of the third and fourth aspects, wherein a protruding member is disposed near a tip of the fork portion, and is placed on the fork portion. A side of the four sides of the substrate that does not contact the protrusion is a substrate transfer robot configured to be able to contact the protrusion member. The invention according to claim 6 is the substrate transport robot according to claim 5, wherein the projection member is provided with a slope, and the substrate is positioned above the fork, and the substrate is lowered. ,
The substrate transport robot is configured such that the substrate is disposed on the fork while the end portion slides on one or both of the inclined surfaces of the protrusions and the inclined surfaces of the protrusion members. According to a seventh aspect of the present invention, in the substrate transfer robot according to the sixth aspect, the projecting member has a columnar portion having a side surface arranged perpendicular to the surface of the fork portion, and an upper portion of the columnar portion. The substrate transport robot includes a truncated cone-shaped portion provided on a bottom surface, and a side surface of the truncated cone-shaped portion is used as the slope.
An eighth aspect of the present invention is the substrate transfer robot according to any one of the first to seventh aspects, wherein the fork portion is formed of alumina, and a surface of the fork portion is formed with an aluminum protective film. It is a substrate transfer robot. Claim 9
The present invention is the substrate transfer robot according to any one of claims 1 to 8, wherein a support member is disposed on the fork portion, and the substrate is placed on the support member. It is a configured substrate transfer robot. According to a tenth aspect of the present invention, there is provided a transfer chamber in which the substrate transfer robot according to any one of the first to ninth aspects is disposed in a vacuum chamber. An eleventh aspect of the present invention is a vacuum processing apparatus comprising: the transfer chamber according to the tenth aspect; and a processing chamber connected to the transfer chamber, wherein the processing chamber processes the substrate in a vacuum atmosphere. .
【０００９】本発明は上記のように構成されており、フ
ォーク部の両脇に配置された腕部に、突部を有する保持
部材が配置されている。The present invention is configured as described above, and the holding member having the protrusion is disposed on the arms arranged on both sides of the fork.
【００１０】フォーク部上に矩形形状の基板を配置した
場合、その基板の四辺のうち、三辺が突部に接触できる
ように構成されており、各突部により、基板がフォーク
部に対して静止されるようになっている。基板の三辺は
突部に近接して位置し、突部に接触できるようになって
いればよく、必ずしも三辺が同時に突部に接触している
必要はない。When a rectangular substrate is placed on the fork, three of the four sides of the substrate can be brought into contact with the projections. It is designed to be stationary. It is sufficient that the three sides of the substrate are located close to the protrusion and can come into contact with the protrusion, and the three sides do not necessarily need to be in contact with the protrusion at the same time.
【００１１】また、フォーク部の先端には、突起部材が
配置されており、基板の残りの一辺は、突起部材に接触
できるようになっている。従って、基板の四辺が保持部
材の突部又は突起部材に接触できるようになっており、
矩形の基板はフォーク部上にしっかり保持されることに
なる。A protruding member is disposed at the tip of the fork, and the other side of the substrate can be brought into contact with the protruding member. Therefore, the four sides of the substrate can come into contact with the protrusion or the protrusion member of the holding member,
The rectangular substrate will be securely held on the fork.
【００１２】また、保持部材や突起部材には斜面が設け
られており、基板をフォーク部上に載置する際に、基板
とフォーク部との相対的な位置がずれていた場合、フォ
ーク部の上方に基板を静止させた状態から降下させる
と、基板の端部が斜面に当たり、基板が斜面上を滑り、
フォーク部上に乗せられるようになっている。従って、
基板の位置がずれていた場合でも、フォーク部上の正確
な位置に載置することができる。Further, the holding member and the projection member are provided with a slope, and when the substrate is placed on the fork, if the relative position between the substrate and the fork is misaligned, When the board is lowered from a state where it is stationary above, the edge of the board hits the slope, and the board slides on the slope,
It can be put on the fork. Therefore,
Even when the position of the substrate is shifted, it can be placed at an accurate position on the fork.
【００１３】カーボン製の部材等の上を基板が滑り落ち
る場合には、パーティクルが発生するので、突起部材や
保持部材を耐熱性の樹脂で構成しておき、斜面上を基板
が滑っても、パーティクルが発生しないようにするとよ
い。When the substrate slides down on a member made of carbon or the like, particles are generated. Therefore, the projecting member and the holding member are made of a heat-resistant resin. Should not occur.
【００１４】また、本発明ではフォーク部上には耐熱性
を有する支持部材が配置されており、基板は支持部材の
上端部に接触した状態でフォーク部上に載置されるよう
になっている。従って、基板はフォーク部とは直接接触
しないので、高温に加熱された基板を載置しても、フォ
ーク部が高温に加熱されないようになっている。In the present invention, a support member having heat resistance is arranged on the fork portion, and the substrate is placed on the fork portion in a state of contacting the upper end portion of the support member. . Therefore, since the substrate does not directly contact the fork, the fork is not heated to a high temperature even if the substrate heated to a high temperature is placed.
【００１５】更に、フォーク部はアルミナで構成され、
その表面には輻射率の小さいアルミニウムから成る保護
膜が形成されているので、基板から放射される輻射熱が
大きくても、フォーク部を構成する材料が昇温しにくい
ようになっている。従って、基板の温度ムラが無くな
り、反りが補正される。Further, the fork portion is made of alumina,
Since a protective film made of aluminum having a low emissivity is formed on the surface, the material constituting the fork portion is unlikely to be heated even if the radiant heat radiated from the substrate is large. Therefore, unevenness in the temperature of the substrate is eliminated, and the warpage is corrected.
【００１６】[0016]
【発明の実施の形態】図１を参照し、符号１０は本発明
の一例の基板搬送ロボットであり、搬送室５９内に配置
されている。DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS Referring to FIG. 1, reference numeral 10 denotes a substrate transfer robot according to an example of the present invention, which is disposed in a transfer chamber 59.
【００１７】この搬送室５９には、複数の処理室５１〜
５５と、基板搬出入室５６とが接続されており、各室５
１〜５９によってマルチチャンバ型の真空処理装置５０
が構成されている。The transfer chamber 59 includes a plurality of processing chambers 51 to 51.
55 and the substrate loading / unloading chamber 56 are connected to each other.
1 to 59, a multi-chamber type vacuum processing apparatus 50
Is configured.
【００１８】基板搬送ロボット１０を説明すると、図２
(ａ)を参照し、この基板搬送ロボット１０は、回転機構
１７と、左腕１１及び右腕１２と、載置部１３とを有し
ている。The substrate transfer robot 10 will be described with reference to FIG.
Referring to FIG. 1A, the substrate transfer robot 10 includes a rotation mechanism 17, a left arm 11, a right arm 12, and a mounting unit 13.
【００１９】回転機構１７内には図示しないモータが配
置されており、該モータには回転軸１５が取り付けられ
ている。回転軸１５は、二重構造になっており、筒状の
外周部分と、その外周部分の内部に挿通された棒状の内
部部分とで構成されている。外周部分と内部部分は、モ
ータの回転力が同方向にも逆方向にも伝達されるように
構成されており、逆方向に伝達された場合、外周部分と
内部部分とは、反対方向に回転するように構成されてい
る。A motor (not shown) is disposed in the rotation mechanism 17, and a rotation shaft 15 is attached to the motor. The rotating shaft 15 has a double structure, and includes a cylindrical outer peripheral portion and a rod-shaped internal portion inserted inside the outer peripheral portion. The outer peripheral portion and the inner portion are configured so that the rotational force of the motor is transmitted in the same direction and in the opposite direction, and when transmitted in the opposite direction, the outer peripheral portion and the inner portion rotate in opposite directions. It is configured to be.
【００２０】この回転軸１５の上端部分は、回転機構１
７の上部に突き出されており、左腕１１の一端と右腕１
２の一端とが、水平に配置された状態で、それぞれ外周
部分と内部部分に接続されている。The upper end of the rotating shaft 15 is
7, one end of the left arm 11 and the right arm 1
The two ends are connected to the outer peripheral portion and the inner portion, respectively, while being arranged horizontally.
【００２１】左腕１１及び右腕１２は、それぞれ２個の
部材１１1、１１2、１２1、１２2が連結されて構成され
ており、折れ曲げ可能になっている。The left arm 11 and the right arm 12 are formed by connecting two members 11 1 , 11 2 , 12 1 , and 12 2 , respectively, and can be bent.
【００２２】左腕１１の他端と右腕１２の他端とは、１
個の載置部１３に取り付けられており、左腕１１と右腕
１２の根本の部材１１1、１２1が互いに反対方向に回転
する場合、左腕１１及び右腕１２は折り畳まれるか、又
は折り畳まれた状態が元に戻され、その結果、載置部１
３が水平方向に直線的に移動するようになっている。他
方、左腕１１及び右腕１２が同方向に回転する場合、載
置部１３は、水平面内で回転移動するようになってい
る。The other end of the left arm 11 and the other end of the right arm 12
When the root members 11 1 and 12 1 of the left arm 11 and the right arm 12 rotate in opposite directions to each other, the left arm 11 and the right arm 12 are folded or folded. Is restored, and as a result, the receiver 1
3 moves linearly in the horizontal direction. On the other hand, when the left arm 11 and the right arm 12 rotate in the same direction, the mounting unit 13 is configured to rotate and move in a horizontal plane.
【００２３】載置部１３を説明すると、該載置部１３
は、取付板１４と、フォーク部２２とを有している。載
置部１３は、取付板１４が左腕１１及び右腕１２に取り
付けられており、フォーク部２２は、水平に配置され、
板２１を介して取付板１４に取り付けられている。The mounting section 13 will be described.
Has a mounting plate 14 and a fork portion 22. The mounting portion 13 has a mounting plate 14 attached to the left arm 11 and the right arm 12, and the fork portion 22 is disposed horizontally,
It is mounted on the mounting plate 14 via a plate 21.
【００２４】図２(ｂ)は、上記の基板搬送ロボット１０
が配置された搬送室５９と、該搬送膣５９に接続された
処理室５１〜５５との関係を示す図である。FIG. 2B shows the substrate transfer robot 10 described above.
FIG. 5 is a diagram showing a relationship between a transfer chamber 59 in which is disposed and processing chambers 51 to 55 connected to the transfer vagina 59.
【００２５】各処理室５１〜５５内には、基板載置台６
４が配置されており、該基板載置台６４には、昇降ピン
６５が挿通されている。In each of the processing chambers 51 to 55, a substrate mounting table 6 is provided.
The lifting pins 65 are inserted through the substrate mounting table 64.
【００２６】搬送室５９と各処理室５１〜５５の間に配
置された隔壁６２には、開閉可能な通路６３が設けられ
ており、回転機構１７を動作させ、載置部１３を水平方
向に直線移動させると、フォーク部２２が通路６３を通
過し、処理室５１〜５５内を出入りできるようになって
いる。A partition 63 disposed between the transfer chamber 59 and each of the processing chambers 51 to 55 is provided with an openable and closable passage 63. The rotating mechanism 17 is operated to move the mounting portion 13 in the horizontal direction. When the fork portion 22 is moved linearly, the fork portion 22 can pass through the passage 63 and enter and exit the processing chambers 51 to 55.
【００２７】上記フォーク部２２の付近Ａの拡大図を図
３に示す。図３を参照し、フォーク部２２は、アルミナ
から成り先端側が二股に分かれた板で構成されており、
その表面には、アルミニウム等の輻射率の小さな材料か
ら成る保護膜２７が形成されている。FIG. 3 is an enlarged view of the vicinity A of the fork portion 22. Referring to FIG. 3, the fork portion 22 is formed of a plate made of alumina and having a forked distal end.
A protective film 27 made of a material having a low emissivity such as aluminum is formed on the surface.
【００２８】図中、二股に分かれた部分のうち、一方の
二股部分を符号２６ａで示し、他方の二股部分を符号２
６ｂで示す。各二股部分２６ａ、２６ｂの保護膜２７上
には、支持部材２５1〜２５8と突起部材２８ａ、２８ｂ
とがそれぞれ配置されている。In the drawing, one of the two forked portions is indicated by reference numeral 26a, and the other forked portion is indicated by reference numeral 2a.
6b. Each bifurcated portion 26a, on the protective film 27 of 26b, the support member 25 1 to 25 8 and the protrusion member 28a, 28b
And are respectively arranged.
【００２９】支持部材２５1〜２５8は、各二股部分２６
ａ、２６ｂ上に離間してそれぞれ４個ずつ固定されてお
り、また、突起部材２８ａ、２８ｂは各二股部分２６
ａ、２６ｂの先端付近の位置に固定されている。Each of the support members 25 1 to 25 8 is
a and 26b are fixed on each of the four forked portions 26a and 28b.
a, 26b are fixed at positions near the tips.
【００３０】図４に、支持部材２５1〜２５8の斜視図を
示す。支持部材２５1〜２５8は、カーボンが有底円筒形
状に成形されて構成されており、ねじ３７によって、底
面がフォーク部２２上にねじ止め固定されている。FIG. 4 is a perspective view of the support members 25 1 to 25 8 . Support members 25 1 to 25 8, carbon have been constructed by molding a bottomed cylindrical shape, by screws 37, the bottom surface is screwed on the fork unit 22.
【００３１】ねじ３７の上端は、支持部材２５1〜２５8
の上端よりも低い位置に存しており、The upper ends of the screws 37 are connected to the support members 25 1 to 25 8.
Is located lower than the top of
【００３２】支持部材２５1〜２５8上に後述する基板を
乗せたときに、基板はねじ３７には接触しないようにな
っている。When a substrate to be described later is placed on the support members 25 1 to 25 8 , the substrate does not contact the screws 37.
【００３３】図５に、突起部材２８ａ、２８ｂの拡大斜
視図を示す。図６に、突起部材２８ａ、２８ｂ及びフォ
ーク部２２の断面図を示す。突起部材２８ａ、２８ｂ
は、ポリイミド等の耐熱性樹脂が略円柱形状に成形され
て構成されており、その一方の底面がフォーク部材２２
の保護膜２７表面に密着されている。他方の底面は、フ
ォーク部２２の鉛直上方を向いており、その先端部分は
面取り成形され、その結果、突起部材２８ａ、２８ｂに
は、円柱形状の部分３４と円錐台形状の部分３５とが構
成されている。FIG. 5 is an enlarged perspective view of the protruding members 28a and 28b. FIG. 6 is a sectional view of the protrusion members 28a and 28b and the fork portion 22. Projection members 28a, 28b
Is formed by molding a heat-resistant resin such as polyimide into a substantially cylindrical shape, and one bottom surface thereof is formed by a fork member 22.
Of the protective film 27. The other bottom surface faces vertically above the fork portion 22, and the tip portion is chamfered. As a result, the projection members 28a and 28b have a cylindrical portion 34 and a truncated cone portion 35. Have been.
【００３４】円柱形状の部分３４の側面４８1はフォー
ク部２２表面に対して垂直になっており、他方、円錐台
形状の部分３５の外周部分により、突起部材２８ａ、２
８ｂの中心位置から外方に向けて傾斜された斜面４８2
が構成されている。側面４８1と斜面４８2とは、突起部
材２８ａ、２８ｂの全周に亘って設けられている。The side surface 48 1 of the cylindrical portion 34 is perpendicular to the surface of the fork portion 22, while the outer peripheral portion of the frusto-conical portion 35 allows the protrusion members 28 a, 2
Slope 48 2 inclined outward from the center of 8b
Is configured. The side surface 48 1 and the slope 48 2 is provided over the entire circumference of the protrusion members 28a, 28b.
【００３５】円柱形状の部分３４の底面には、ねじ部３
９が設けられており、突起部材２８ａ、２８ｂは、フォ
ーク部２２に設けられたねじ穴２９に、ねじ部３９によ
ってねじ止め固定されている。The bottom of the cylindrical portion 34 is provided with a thread 3
9 are provided, and the protrusion members 28 a and 28 b are screwed and fixed to the screw holes 29 provided in the fork portion 22 by screw portions 39.
【００３６】突起部材２８ａ、２８ｂの斜面４８2は、
上述したように、全周に亘って設けられているから、ね
じ止めする際に、突起部材２８ａ、２８ｂが静止した向
きによらずに、斜面４８2には、フォーク部２２の根本
方向に面する部分が存している。The slopes 48 2 of the projecting members 28a, 28b
As described above, since provided over the entire circumference, at the time of screwing, the projecting members 28a, regardless of the direction 28b is stationary, the slope 48 2, the surface in the underlying direction of the fork portion 22 There is a part to do.
【００３７】次に、再度図３を参照し、フォーク部２２
の両脇には、それぞれ腕部２３ａ、２３ｂが配置されて
いる。Next, referring again to FIG.
Arms 23a and 23b are arranged on both sides of the arm.
【００３８】この腕部２３ａ、２３ｂは、金属の棒であ
る、水平にされた状態で、一端が取付板１２にそれぞれ
取り付けられている。この腕部２３ａ、２３ｂは、フォ
ーク部２２の両脇に、フォーク部２２とは離れた位置に
配置されており、フォーク部２２の根本付近であって、
各腕部２３ａ、２３ｂのフォーク部２２と面する位置
に、保持部材２４ａ、２４ｂが取り付けられている。One end of each of the arms 23a and 23b is attached to the attachment plate 12 in a horizontal state, which is a metal bar. The arms 23a and 23b are arranged on both sides of the fork 22 at a position away from the fork 22, and near the base of the fork 22,
Holding members 24a and 24b are attached to the arms 23a and 23b at positions facing the fork portion 22.
【００３９】腕部２４ａ、２４ｂのうち、図３の上部に
記載された腕部２４ａの先端部分Ｂの拡大図を図７に示
す。FIG. 7 shows an enlarged view of the tip B of the arm 24a shown in the upper part of FIG. 3 among the arms 24a and 24b.
【００４０】保持部材２４ａ、２４ｂはポリイミド等の
耐熱性樹脂で構成されており、各保持部材２４ａ、２４
ｂのフォーク部２２に対向する部分には、その耐熱性樹
脂から成り、フォーク部２２側にそれぞれ突出された大
突部３１と小突部３２、３３が設けられている。大突部
３１の突出量は、小突部３２、３３よりも大きくなって
いる。The holding members 24a and 24b are made of a heat-resistant resin such as polyimide.
A portion b facing the fork portion 22 is provided with a large protrusion 31 and small protrusions 32, 33 made of the heat resistant resin and protruding toward the fork portion 22 side. The protrusion amount of the large protrusion 31 is larger than that of the small protrusions 32 and 33.
【００４１】各突部３１〜３３は、腕部２３ａ、２３ｂ
の長手方向に沿って列設されている。各突部３１〜３３
のうち、大突部３１は、フォーク部２２先端の突起部材
２８ａ、２８ｂから最も離れた位置に配置されており、
小突部３２、３３は、大突部３１よりも突起部材２８
ａ、２８ｂに近い位置に配置されている。Each of the projections 31 to 33 has an arm 23a, 23b.
Are arranged in a row along the longitudinal direction. Each projection 31-33
Among them, the large protrusion 31 is disposed at a position farthest from the protrusion members 28a, 28b at the tip of the fork portion 22,
The small projections 32 and 33 are more protruding members 28 than the large projections 31.
a, 28b.
【００４２】大突部３１の、フォーク部２２先端方向に
向いた部分は、フォーク部２２の表面に対して垂直な側
面４１1が形成されており、また、大突部３１の上端部
分であって、側面４１1と連続した部分には、フォーク
部２２の先端に向けて傾斜された斜面４１2が設けられ
ている。The large projections 31, the portion facing the fork portion 22 distally is formed with vertical sides 41 1 relative to the surface of the fork portion 22 and, there at the upper end portion of the large protuberance 31 Te, the continuous portion with the side 41 1, the slope 41 2 which is inclined toward the tip of the fork portion 22 is provided.
【００４３】各小突部３１、３２は、フォーク部２２に
面する部分に、フォーク部２２表面に対して垂直な側面
４２1、４３1がそれぞれ設けられており、また、各突部
３１、３２の上端の側面４２1、４２2と連続した部分に
は、フォーク部２２に向けて傾斜された斜面４２2、４
３2が設けられている。[0043] Each small protuberances 31 and 32, the portion facing the fork part 22 is provided, each side 42 1, 43 1 perpendicular to the fork unit 22 the surface, and each projection 31, side 42 of the upper end of the 32 1, 42 2 and successive portions, inclined surfaces 42 2, 4 which is inclined toward the fork portion 22
3 2 is provided.
【００４４】図３紙面の上部に記載された保持部材２４
ａは上記のような構成であり、同図の下部に記載された
保持部材２４ｂも、上記保持部材２４ａと同様の構成に
なっている。各保持部材２４ａ、２４ｂの突部３１〜３
３は、それぞれフォーク部２２に向けられており、２個
の保持部材２４ａ、２４ｂの突部３１〜３３同士は、フ
ォーク部２２を間に挟んで向かい合わせになっている。The holding member 24 shown in the upper part of FIG.
"a" has the above-described configuration, and the holding member 24b shown in the lower part of the figure has the same configuration as the above-described holding member 24a. Projections 31 to 3 of each holding member 24a, 24b
Numerals 3 are directed to the fork portion 22, respectively, and the projections 31 to 33 of the two holding members 24a, 24b face each other with the fork portion 22 interposed therebetween.
【００４５】各突部３１〜３３の高さは、側面４１1〜
４３1の下端部がフォーク部２２表面と同じ高さかそれ
よりも低く、斜面４１2〜４３2がフォーク部２２表面よ
りも高い位置に存するように配置されている。The height of each of the projections 31 to 33 is set to the side surface 41 1 to
43 1 of the lower end is lower than or the same height as the fork unit 22 the surface, the inclined surface 41 2-43 2 are disposed such exists at a position higher than the fork 22 surface.
【００４６】また、突起部材２８ａ、２８ｂは、フォー
ク部２２の表面上に配置されているから、突起部材２８
ａ、２８ｂと各突部３１〜３３で定められる領域内のフ
ォーク部２２表面に矩形形状の基板を配置する場合、そ
の基板の大きさは、一辺が大突部３１と突起部材２８
ａ、２８ｂの間の間隔で決まり、他の辺が２個の保持部
材２４ａ、２４ｂの小突部３２、３３の間の間隔で決ま
る。Further, since the projection members 28a and 28b are arranged on the surface of the fork portion 22, the projection members 28a and 28b
When a rectangular substrate is arranged on the surface of the fork portion 22 in the area defined by the projections 31 to 33 and the projections 31 to 33, the size of the substrate is such that one side has the large projection 31 and the projection member 28.
a, 28b, and the other side is determined by the spacing between the small projections 32, 33 of the two holding members 24a, 24b.
【００４７】図８の符号８は、上記のようなフォーク部
２２上に載置可能な大きさの矩形形状の基板を示してい
る。Reference numeral 8 in FIG. 8 denotes a rectangular substrate large enough to be placed on the fork portion 22 as described above.
【００４８】図２(ｂ)は、その大きさの基板８が、昇降
ピン６５の先端に乗せられた状態を示している。FIG. 2B shows a state in which the substrate 8 of that size is placed on the tip of the lifting pin 65.
【００４９】次いで、左腕１１及び右腕１２を伸ばし、
フォーク部２２を昇降ピン６５間に差し挟む。図９(ａ)
は、フォーク部２２が基板８の直下位置で静止している
状態を示している。Next, the left arm 11 and the right arm 12 are extended,
The fork 22 is inserted between the lifting pins 65. FIG. 9 (a)
Indicates a state in which the fork portion 22 is stationary at a position directly below the substrate 8.
【００５０】この状態から昇降ピン６５を降下させ、基
板８をフォーク部２２上に載置する場合、基板８がフォ
ーク部２２の根本側(板２１側)にずれていると、図９
(ｂ)の符号Ｄで示すように、基板８の端部が保持部材２
４ａ、２４ｂの大突部３１の斜面４１2に当接される。When the lifting pins 65 are lowered from this state and the substrate 8 is placed on the fork portion 22, if the substrate 8 is displaced to the root side (the plate 21 side) of the fork portion 22, FIG.
As shown by the symbol D in (b), the end of the substrate 8 is
4a, it is brought into contact with the inclined surface 41 2 of the large protuberance 31 of 24b.
【００５１】昇降ピン６５が更に下方に移動されると、
基板８は斜面４２2を滑りながら下方に移動し、同図
(ｄ)に示すように、支持部材２５上に乗せられる。When the lifting pin 65 is further moved downward,
Substrate 8 moves downward while sliding slope 42 2, Fig.
As shown in (d), it is put on the support member 25.
【００５２】基板８が支持部材２５上に乗った状態で
は、基板８の四辺は、２個の支持部材２４ａ、２４ｂの
大突部３１の側面４１1と小突部３２、３３の側面４
２1、４３ 1と、２個の突起部材２８ａ、２８ｂの側面４
８1に接触するか、非接触であっても非常に近接して位
置している。従って、基板８は、支持部材２４ａ、２４
ｂと突起部材２８ａ、２８ｂによって保持されているこ
とになり、左腕１１及び右腕１２が伸縮し、フォーク部
２２が水平移動しても、基板８は、フォーク部２２に対
して静止した状態が維持される。With the substrate 8 resting on the support member 25,
Indicates that the four sides of the substrate 8 correspond to the two support members 24a and 24b.
Side 41 of large projection 311And the side surfaces 4 of the small projections 32 and 33
21, 43 1And the side surfaces 4 of the two protrusion members 28a and 28b.
81Contact or very close even without contact
It is location. Therefore, the substrate 8 is supported by the support members 24a and 24a.
b and the projection members 28a and 28b
And the left arm 11 and the right arm 12 expand and contract,
Even if the substrate 22 moves horizontally, the substrate 8 is
And the stationary state is maintained.
【００５３】他方、基板８がフォーク部２２の先端側に
ずれていた場合、同図(ｃ)の符号Ｅで示すように、基板
８の端部が突起部材２８ａ、２８ｂの斜面４８2に当接
され、斜面４８2上を滑りながら下方に移動し、支持部
材２５上に乗せられる(同図(ｄ))。[0053] On the other hand, when the substrate 8 is deviated to the distal side of the fork unit 22, as shown at E in FIG. (C), ends projecting member 28a of the substrate 8, the slope 48 2 28b equivalents It is contact, moves downward while sliding on the inclined surface 48 2 is placed on the support member 25 (FIG. (d)).
【００５４】また、基板８が、フォーク部２２の長手方
向に対し、垂直方向にずれていた場合、基板８の端部は
小突部３２、３３の斜面４２2、４３2に当接され、その
斜面４２2、４３2を滑りながら移動し、支持部材２５
(２５1〜２５8)に乗せられる。結局、基板８が斜面４１
2〜４３2、４８2に当接できる範囲であれば、位置ズレ
があってもフォーク部２２上の定まった位置に配置され
ることになる。[0054] The substrate 8 is, the longitudinal direction of the fork 22, when offset in the vertical direction, the end portion of the substrate 8 is in contact with the inclined surface 42 2, 43 2 of the small protuberances 32 and 33, The support member 25 moves while sliding on the slopes 42 2 and 43 2.
It is placed on the (25 1 to 25 8). As a result, the substrate 8 becomes the slope 41
If 2-43 2, 48 2 in the range that can abut, so that even if there is misalignment is disposed in the stated positions on the fork unit 22.
【００５５】大突部３１や小突部３２、３３、及び突起
部材２８ａ、２８ｂは耐熱性の樹脂で構成されており、
基板８の端部が、いずれの斜面４１2〜４３2、４８2上
を滑ってもパーティクルは発生しないようになってい
る。The large projections 31, the small projections 32 and 33, and the projection members 28a and 28b are made of heat-resistant resin.
End of the substrate 8, the particles also slipped any slope 41 2-43 2, 48 2 above so as not to occur.
【００５６】この基板８は、処理室５１〜５５内で、ス
パッタリングやエッチング等の真空処理がされており、
４００℃以上の温度に昇温されている。基板８は、フォ
ーク部２２上では、支持部材２５1〜２５8上に乗せられ
ている。支持部材２５1〜２５8はカーボン製であり、耐
熱性が高いので、基板８によって加熱されても変形しな
い。また、真空中であるから、支持部材２５1〜２５8が
高温になっても、酸素と反応することはない。The substrate 8 is subjected to vacuum processing such as sputtering and etching in the processing chambers 51 to 55,
The temperature has been raised to a temperature of 400 ° C. or higher. Substrate 8, on the fork portion 22 is placed on the support member 25 1 to 25 8. Support members 25 1 to 25 8 is made of carbon, since high heat resistance and does not deform even when heated by the substrate 8. Also, because it is in a vacuum, the support member 25 1 to 25 8 is also heated to a high temperature, it does not react with oxygen.
【００５７】更に、アルニナ製のフォーク部２２の表面
には、アルミニウムから成る保護膜２７が形成されてい
るので、基板８の熱輻射は保護膜２７によって反射さ
れ、フォーク部２２が昇温しにくいようになっている。
従って、基板の温度ムラが無くなり、反りが補正され
る。Further, since a protective film 27 made of aluminum is formed on the surface of the fork portion 22 made of alumina, the heat radiation of the substrate 8 is reflected by the protective film 27, and the temperature of the fork portion 22 does not easily rise. It has become.
Therefore, unevenness in the temperature of the substrate is eliminated, and the warpage is corrected.
【００５８】なお、上記真空処理装置５０は、一つの搬
送室５９に対し、複数台の処理室５１〜５５が接続され
たマルチチャンバ型であったが、本発明の真空処理装置
はそれに限定されるものではなく、搬送室に１台の処理
室が接続された真空処理装置も含まれる。Although the vacuum processing apparatus 50 is a multi-chamber type in which a plurality of processing chambers 51 to 55 are connected to one transfer chamber 59, the vacuum processing apparatus of the present invention is not limited to this. However, a vacuum processing apparatus in which one processing chamber is connected to the transfer chamber is also included.
【００５９】また、上記基板搬送ロボット１０は、二本
の腕(左腕１１と右腕１２)が折れ曲がることで伸縮し、
フォーク部２２上の基板８を搬送する構造であったが、
本発明の基板搬送ロボットは腕の本数によって限定され
るものではない。The substrate transfer robot 10 expands and contracts by bending two arms (left arm 11 and right arm 12).
Although the substrate 8 on the fork portion 22 was transported,
The substrate transfer robot of the present invention is not limited by the number of arms.
【００６０】[0060]
【発明の効果】本発明によれば、基板とフォーク部の相
対位置がずれていても、フォーク部の所定位置に基板を
載置することができる。また、基板が高温であっても、
フォーク部上に載置して搬送することができる。According to the present invention, the substrate can be placed at a predetermined position on the fork even if the relative position between the substrate and the fork is shifted. Also, even if the substrate is hot,
It can be placed on a fork and transported.
【図１】本発明の真空処理装置の一例FIG. 1 shows an example of a vacuum processing apparatus of the present invention.
【図２】(ａ)：本発明の基板搬送装置の一例 (ｂ)：
搬送室と処理室の関係を説明するための図FIG. 2 (a): One example of the substrate transfer device of the present invention (b):
Diagram for explaining the relationship between the transfer chamber and the processing chamber
【図３】本発明の基板搬送装置のフォーク部とその周辺
の拡大斜視図FIG. 3 is an enlarged perspective view of a fork portion and its periphery of the substrate transfer device of the present invention.
【図４】支持部材の拡大斜視図FIG. 4 is an enlarged perspective view of a support member.
【図５】突起部材の拡大斜視図FIG. 5 is an enlarged perspective view of a projection member.
【図６】突起部材の断面図FIG. 6 is a sectional view of a protruding member.
【図７】保持部材の拡大斜視図FIG. 7 is an enlarged perspective view of a holding member.
【図８】フォーク部に基板を乗せた状態を説明するため
の図FIG. 8 is a view for explaining a state in which a substrate is placed on a fork portion.
【図９】(ａ)〜(ｄ)：基板が斜面上を滑る状態を説明す
るための図FIGS. 9A to 9D are diagrams for explaining a state in which a substrate slides on a slope.
【図１０】従来技術の基板搬送装置のフォーク部を説明
するための図FIG. 10 is a diagram for explaining a fork portion of a conventional substrate transfer device.
８……基板 １０……基板搬送ロボット ２２……フォーク部 ２３ａ、２３ｂ……腕部 ２４ａ、２４ｂ保持部材 ２５1〜２５8……支持部材 ２７……保護膜 ２８ａ、２８ｂ……突起部材 ３１〜３３……突部 ３４……円柱形状の部分 ３５……円錐台形状の部分 ４１2〜４１3、４８2……斜面 ５０……真空処理装置 ５９……搬送室8 Substrate 10 Substrate transfer robot 22 Fork 23a, 23b Arm 24a, 24b Holding member 25 1 to 25 8 Support member 27 Protective film 28a, 28b Projection member 31 33 ...... projections 34 ...... cylindrical portion 35 ...... frustoconical portion 41 2-41 3 of 48 2 ...... slopes 50 ...... vacuum processing apparatus 59 ...... conveying chamber
フロントページの続き (72)発明者 平田 正順 神奈川県茅ヶ崎市萩園2500番地 日本真空 技術株式会社内 Ｆターム(参考） 3C016 HA12 HA13 HB01 5F031 CA02 CA05 FA01 GA06 GA10 GA14 GA15 GA32 GA38 GA44 MA04 NA05 Continuation of front page (72) Inventor Masajun Hirata 2500 Hagizono, Chigasaki-shi, Kanagawa F-term in Japan Vacuum Engineering Co., Ltd. 3C016 HA12 HA13 HB01 5F031 CA02 CA05 FA01 GA06 GA10 GA14 GA15 GA32 GA38 GA44 MA04 NA05
Claims (11)
フォーク部を水平方向に移動させ、基板を搬送する基板
搬送ロボットであって、 前記フォーク部の先端付近には、上部に斜面を有する突
起部材が配置され、 前記基板を前記フォーク部の上方に位置させ、該基板を
降下させたときに、前記基板は、端部が前記斜面上を滑
りながら前記フォーク部上に載置されるように構成され
た基板搬送ロボット。1. A substrate transfer robot for placing a substrate horizontally on a fork portion, moving the fork portion in a horizontal direction, and transporting the substrate, wherein the fork portion has a slope on an upper portion near a tip thereof. When the substrate is positioned above the fork, and when the substrate is lowered, the substrate is placed on the fork while the end slides on the slope. Transfer robot configured to be configured as follows.
面に垂直に配置された円柱形状の部分と、前記円柱形状
の部分の上部底面上に設けられた円錐台形状の部分で構
成され、前記円錐台形状の部分の側面が前記斜面として
用いられる請求項１記載の基板搬送ロボット。2. The projection member includes a columnar portion having a side surface arranged perpendicular to the surface of the fork portion, and a truncated conical portion provided on an upper bottom surface of the columnar portion, The substrate transfer robot according to claim 1, wherein a side surface of the truncated conical portion is used as the slope.
し、前記フォーク部を水平方向に移動させ、基板を搬送
する基板搬送ロボットであって、 前記フォーク部の両脇には腕部が配置され、前記各腕部
には、突部を有する保持部材が設けられ、 前記フォーク部上に前記基板を載置したときに、前記基
板の三辺が前記突部に接触できるように構成されたこと
を特徴とする基板搬送ロボット。3. A substrate transport robot for horizontally placing a rectangular substrate on a fork portion, moving the fork portion in a horizontal direction, and transporting the substrate, wherein arms are provided on both sides of the fork portion. Is disposed, and a holding member having a protrusion is provided on each of the arms, so that when the substrate is placed on the fork, three sides of the substrate can contact the protrusion. A substrate transfer robot, characterized in that:
を降下させたときに、前記基板は、端部が前記突部の斜
面上を滑りながら前記フォーク部上に載置されるように
構成された請求項３記載の基板搬送ロボット。4. An inclined surface is provided at an upper portion of each of the protrusions, and the substrate is positioned above the fork portion, and when the substrate is lowered, the substrate has an end formed by the protrusion. 4. The substrate transfer robot according to claim 3, wherein the substrate transfer robot is configured to be placed on the fork while sliding on a slope.
配置され、前記フォーク部上に載置された前記基板の四
辺のうち、前記突部に接触しない辺は、前記突起部材に
接触できるように構成された請求項３又は請求項４のい
ずれか１項記載の基板搬送ロボット。5. A protruding member is disposed near a tip of the fork, and a side of the substrate placed on the fork that does not contact the protruding portion can contact the protruding member. The substrate transfer robot according to claim 3, wherein the substrate transfer robot is configured as described above.
を降下させたときに、前記基板は、端部が前記突部の斜
面、又は前記突起部材の斜面のいずれか一方又は両方の
斜面上を滑りながら前記フォーク部上に配置されるよう
に構成された請求項５記載の基板搬送ロボット。6. The projection member is provided with a slope, and when the substrate is positioned above the fork portion, and the substrate is lowered, the substrate has an end having a slope of the projection, or The substrate transfer robot according to claim 5, wherein the substrate transfer robot is configured to be disposed on the fork while sliding on one or both of the slopes of the projection member.
面に垂直に配置された円柱形状の部分と、前記円柱形状
の部分の上部底面上に設けられた円錐台形状の部分で構
成され、前記円錐台形状の部分の側面が前記斜面として
用いられる請求項６記載の基板搬送ロボット。7. The projection member includes a columnar portion having a side surface arranged perpendicular to the surface of the fork portion, and a truncated conical portion provided on an upper bottom surface of the columnar portion. 7. The substrate transfer robot according to claim 6, wherein a side surface of the truncated conical portion is used as the slope.
の表面にはアルミニウムの保護膜が形成された請求項１
乃至請求項７のいずれか１項記載の基板搬送ロボット。8. The fork portion is formed of alumina, and a surface of the fork portion is formed with a protective film of aluminum.
The substrate transfer robot according to claim 7.
れ、前記基板は前記支持部材上に乗せられるように構成
された請求項１乃至請求項８のいずれか１項記載の基板
搬送ロボット。9. The substrate transport robot according to claim 1, wherein a support member is disposed on the fork portion, and the substrate is placed on the support member.
載の基板搬送ロボットが真空槽内に配置された搬送室。10. A transfer chamber in which the substrate transfer robot according to claim 1 is disposed in a vacuum chamber.
接続された処理室であって、真空雰囲気中で前記基板の
処理を行う処理室とを有する真空処理装置。11. A vacuum processing apparatus comprising: the transfer chamber according to claim 10; and a processing chamber connected to the transfer chamber, wherein the processing chamber processes the substrate in a vacuum atmosphere.
Priority Applications (1)
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|---|---|---|---|
| JP2000000026A JP4346765B2 (en) | 2000-01-04 | 2000-01-04 | Substrate transfer robot |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000000026A JP4346765B2 (en) | 2000-01-04 | 2000-01-04 | Substrate transfer robot |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001189367A true JP2001189367A (en) | 2001-07-10 |
| JP2001189367A5 JP2001189367A5 (en) | 2007-01-18 |
| JP4346765B2 JP4346765B2 (en) | 2009-10-21 |
Family
ID=18529446
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000000026A Expired - Fee Related JP4346765B2 (en) | 2000-01-04 | 2000-01-04 | Substrate transfer robot |
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