JP2001167917A - R-Fe-B PERMANENT MAGNET AND MANUFACTURING METHOD OF THE SAME - Google Patents
R-Fe-B PERMANENT MAGNET AND MANUFACTURING METHOD OF THE SAMEInfo
- Publication number
- JP2001167917A JP2001167917A JP2000276798A JP2000276798A JP2001167917A JP 2001167917 A JP2001167917 A JP 2001167917A JP 2000276798 A JP2000276798 A JP 2000276798A JP 2000276798 A JP2000276798 A JP 2000276798A JP 2001167917 A JP2001167917 A JP 2001167917A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polyimide resin
- aluminum
- permanent magnet
- magnet
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01F—MAGNETS; INDUCTANCES; TRANSFORMERS; SELECTION OF MATERIALS FOR THEIR MAGNETIC PROPERTIES
- H01F41/00—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties
- H01F41/02—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets
- H01F41/0253—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets
- H01F41/026—Apparatus or processes specially adapted for manufacturing or assembling magnets, inductances or transformers; Apparatus or processes specially adapted for manufacturing materials characterised by their magnetic properties for manufacturing cores, coils, or magnets for manufacturing permanent magnets protecting methods against environmental influences, e.g. oxygen, by surface treatment
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Power Engineering (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Environmental & Geological Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Physical Vapour Deposition (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Hard Magnetic Materials (AREA)
- Manufacturing Cores, Coils, And Magnets (AREA)
- Powder Metallurgy (AREA)
Abstract
Description
【0001】[0001]
【発明の属する技術分野】本発明は、R−Fe−B系永
久磁石およびその製造方法に関する。より詳細には、自
動車モータに使用される磁石などに求められる優れた耐
食性・電気絶縁性・耐熱性を発揮するR−Fe−B系永
久磁石およびその簡便な製造方法に関する。The present invention relates to an R-Fe-B permanent magnet and a method for producing the same. More specifically, the present invention relates to an R-Fe-B-based permanent magnet exhibiting excellent corrosion resistance, electrical insulation, and heat resistance required for a magnet used for an automobile motor and the like, and a simple method for producing the same.
【0002】[0002]
【従来の技術】Fe−B−Nd系永久磁石に代表される
R−Fe−B系永久磁石は、Sm−Co系永久磁石に比
べて、資源的に豊富で安価な材料が用いられ、かつ、高
い磁気特性を有していることから、種々の用途で実用化
されている。しかしながら、R−Fe−B系永久磁石
は、反応性の高いRとFeを含むため、大気中で酸化腐
食されやすく、何の表面処理をも行わずに使用した場合
には、わずかな酸やアルカリや水分などの存在によって
表面から腐食が進行して錆が発生し、それに伴って、磁
石特性の劣化やばらつきを招く。さらに、錆が発生した
磁石を磁気回路などの装置に組み込んだ場合、錆が飛散
して周辺部品を汚染するおそれがある。2. Description of the Related Art R-Fe-B permanent magnets typified by Fe-B-Nd-based permanent magnets use abundant and inexpensive materials as resources compared to Sm-Co-based permanent magnets, and Because of its high magnetic properties, it has been put to practical use in various applications. However, since the R-Fe-B-based permanent magnet contains highly reactive R and Fe, it is easily oxidized and corroded in the air, and when used without any surface treatment, a slight amount of acid or Corrosion progresses from the surface due to the presence of alkali, moisture, etc., and rust is generated, which leads to deterioration and variation in magnet characteristics. Furthermore, when the rusted magnet is incorporated into a device such as a magnetic circuit, the rust may scatter and contaminate peripheral components.
【0003】上記の点に鑑み、R−Fe−B系永久磁石
の耐食性を改善するため、磁石表面に無電解めっき法や
電気めっき法のような湿式めっき法によって耐食性を有
する金属めっき被膜を形成した磁石が既に提案されてい
る(特公平3−74012号公報参照)。しかしなが
ら、この方法では、めっき処理の前処理で用いられる酸
性溶液やアルカリ性溶液が磁石孔内に残留し、磁石が時
間の経過とともに腐食することがある。また、該磁石は
耐薬品性に劣るため、めっき処理時に磁石表面が腐食す
ることがある。さらに、上記のように磁石表面に金属め
っき被膜を形成しても、温度60℃×相対湿度90%の
条件下での耐食性試験を行うと、100時間後にその磁
気特性が初期値よりも10%以上劣化することがある。In view of the above, in order to improve the corrosion resistance of R-Fe-B permanent magnets, a metal plating film having corrosion resistance is formed on the magnet surface by a wet plating method such as electroless plating or electroplating. The proposed magnet has already been proposed (see Japanese Patent Publication No. 3-74012). However, in this method, an acidic solution or an alkaline solution used in the pretreatment of the plating treatment may remain in the magnet hole, and the magnet may corrode with time. Further, since the magnet has poor chemical resistance, the surface of the magnet may be corroded during plating. Further, even if a metal plating film is formed on the magnet surface as described above, when the corrosion resistance test is performed under the conditions of a temperature of 60 ° C. and a relative humidity of 90%, after 100 hours, the magnetic property is 10% lower than the initial value. The above may be deteriorated.
【0004】また、R−Fe−B系永久磁石の表面にリ
ン酸塩被膜やクロム酸塩被膜などの耐酸化性化成被膜を
形成する方法も提案されているが(特公平4−2200
8号公報参照)、この方法で得られる被膜は磁石との密
着性の点では優れるものの、温度60℃×相対湿度90
%の条件下での耐食性試験を行うと、300時間後にそ
の磁気特性が初期値よりも10%以上劣化することがあ
る。A method of forming an oxidation-resistant chemical conversion film such as a phosphate film or a chromate film on the surface of an R—Fe—B permanent magnet has also been proposed (Japanese Patent Publication No. 4-2200).
No. 8, the coating obtained by this method is excellent in terms of adhesion to a magnet, but has a temperature of 60 ° C. and a relative humidity of 90.
%, The magnetic properties may deteriorate by 10% or more from the initial value after 300 hours.
【0005】また、R−Fe−B系永久磁石の耐食性を
改善するために提案された、気相成長法によってアルミ
ニウム被膜を形成した後、クロム酸塩処理する方法、い
わゆるアルミ−クロメート処理方法(特公平6−661
73号公報参照)は、磁石の耐食性を著しく改善するも
のである。しかしながら、この方法に用いるクロム酸塩
処理は、環境上望ましくない六価クロムを用いるため、
廃液処理方法が複雑である。また、この方法によって得
られる被膜は、微量ながら六価クロムを含有するため、
磁石の取り扱い時における人体に対する影響も懸念され
る。Further, a method of forming an aluminum film by a vapor phase growth method and then performing a chromate treatment, that is, a so-called aluminum-chromate treatment method (proposed to improve the corrosion resistance of R—Fe—B permanent magnets) has been proposed. 6-661
No. 73) significantly improves the corrosion resistance of the magnet. However, the chromate treatment used in this method uses hexavalent chromium, which is environmentally undesirable,
The wastewater treatment method is complicated. In addition, since the coating obtained by this method contains hexavalent chromium in a trace amount,
There are also concerns about the effects on the human body when handling magnets.
【0006】[0006]
【発明が解決しようとする課題】一方、自動車モータに
組み込まれて使用されるR−Fe−B系永久磁石には、
耐食性についてはもちろんのこと、電気絶縁性や耐熱性
についても優れた性能が求められるが、上記のアルミ−
クロメート処理方法では、優れた電気絶縁性と耐熱性を
付与することはできない。そこで、本発明においては、
自動車モータに使用される磁石などに求められる優れた
耐食性・電気絶縁性・耐熱性を発揮するR−Fe−B系
永久磁石および溶液法を用いたその簡便な製造方法を提
供することを目的としている。On the other hand, R-Fe-B-based permanent magnets incorporated and used in automobile motors include:
Not only corrosion resistance, but also excellent electrical insulation and heat resistance are required.
Chromate treatment cannot provide excellent electrical insulation and heat resistance. Therefore, in the present invention,
An object of the present invention is to provide an R-Fe-B permanent magnet exhibiting excellent corrosion resistance, electrical insulation, and heat resistance required for magnets used in automobile motors and the like and a simple manufacturing method using a solution method. I have.
【0007】[0007]
【課題を解決するための手段】本発明者らは上記の点に
鑑み鋭意検討を行った結果、R−Fe−B系永久磁石表
面にアルミニウム被膜を形成し、その上にポリイミド樹
脂被膜を形成することで、優れた耐食性に加え、優れた
電気絶縁性と耐熱性を発揮させることに想到した。R−
Fe−B系永久磁石表面にアルミニウム被膜を形成し、
その上にポリイミド樹脂被膜を形成する技術は、すで
に、特開平8−279407号公報に開示されている。
しかしながら、該技術におけるポリイミド樹脂被膜の形
成方法は、二種類の原料モノマー(芳香族カルボン酸二
無水物と芳香族ジアミン)を用いて縮合型ポリイミド樹
脂被膜を蒸着重合法によって形成するものである。この
技術はアルミニウム被膜の上に優れた性能を有するポリ
イミド樹脂被膜を形成する方法として価値あるものであ
るが、蒸着重合法を行うためには大がかりな装置が必要
である。また、清浄化などの前処理を厳格に行わなけれ
ばならない。したがって、製造コストの上昇を招き、量
産化の観点からは必ずしも満足すべきものではない。Means for Solving the Problems The present inventors have made intensive studies in view of the above points, and as a result, have formed an aluminum film on the surface of an R-Fe-B-based permanent magnet and formed a polyimide resin film thereon. By doing so, they have conceived to exert excellent electrical insulation and heat resistance in addition to excellent corrosion resistance. R-
Forming an aluminum coating on the surface of the Fe-B permanent magnet;
A technique for forming a polyimide resin film thereon has already been disclosed in Japanese Patent Application Laid-Open No. 8-279407.
However, the method of forming a polyimide resin film in this technique is to form a condensation type polyimide resin film by vapor deposition polymerization using two kinds of raw material monomers (aromatic carboxylic dianhydride and aromatic diamine). Although this technique is valuable as a method of forming a polyimide resin film having excellent performance on an aluminum film, a large-scale apparatus is required to perform the vapor deposition polymerization method. In addition, pretreatment such as cleaning must be strictly performed. Therefore, it causes an increase in manufacturing cost and is not always satisfactory from the viewpoint of mass production.
【0008】本発明者らは上記の点に鑑みさらに鋭意検
討を行った結果、R−Fe−B系永久磁石上のアルミニ
ウム被膜表面に酸化被膜層を形成し、その上にポリイミ
ド樹脂被膜を形成すると、酸化被膜層の存在によって、
ポリイミド樹脂被膜はアルミニウム被膜表面に強固に密
着し、アルミニウム被膜とともに優れた耐食性・電気絶
縁性・耐熱性を発揮することを知見した。また、酸化被
膜層の上では、ポリイミド樹脂被膜形成反応が効率よく
進行し、溶液法によってもアルミニウム被膜表面に対し
て優れた密着性を有する被膜が得られることを知見し
た。In view of the above points, the present inventors conducted further intensive studies, and as a result, formed an oxide film layer on the surface of an aluminum film on an R-Fe-B-based permanent magnet, and formed a polyimide resin film thereon. Then, due to the presence of the oxide film layer,
It has been found that the polyimide resin coating adheres firmly to the aluminum coating surface and exhibits excellent corrosion resistance, electrical insulation and heat resistance together with the aluminum coating. In addition, it has been found that a reaction of forming a polyimide resin film proceeds efficiently on the oxide film layer, and a film having excellent adhesion to the aluminum film surface can be obtained even by a solution method.
【0009】本発明は、かかる知見に基づきなされたも
ので、本発明の永久磁石は、請求項1記載の通り、R−
Fe−B系永久磁石表面に、アルミニウム被膜を有し、
前記アルミニウム被膜表面に、酸化被膜層を介して、ポ
リイミド樹脂被膜を有することを特徴とする。また、請
求項2記載の永久磁石は、請求項1記載の永久磁石にお
いて、ポリイミド樹脂被膜が付加型ポリイミド樹脂被膜
であることを特徴とする。また、請求項3記載の永久磁
石は、請求項2記載の永久磁石において、付加型ポリイ
ミド樹脂被膜がビスアリルナジイミドから得られる被膜
であることを特徴とする。また、請求項4記載の永久磁
石は、請求項1乃至3のいずれかに記載の永久磁石にお
いて、アルミニウム被膜の膜厚が0.01μm〜50μ
mであることを特徴とする。また、請求項5記載の永久
磁石は、請求項1乃至4のいずれかに記載の永久磁石に
おいて、酸化被膜層の膜厚が0.01μm〜2μmであ
ることを特徴とする。また、請求項6記載の永久磁石
は、請求項1乃至5のいずれかに記載の永久磁石におい
て、ポリイミド樹脂被膜の膜厚が1μm〜15μmであ
ることを特徴とする。また、本発明の永久磁石の製造方
法は、請求項7記載の通り、R−Fe−B系永久磁石表
面に、アルミニウム被膜を形成した後、前記アルミニウ
ム被膜表面に、酸素雰囲気中での酸化処理によって酸化
被膜層を形成し、前記酸化被膜層表面に、ポリイミド樹
脂被膜形成処理液を塗布し、熱処理することによってポ
リイミド樹脂被膜を形成することを特徴とする。また、
請求項8記載の製造方法は、請求項7記載の製造方法に
おいて、気相成長法によってアルミニウム被膜を形成す
ることを特徴とする。また、請求項9記載の製造方法
は、請求項8記載の製造方法において、膜厚が0.01
μm〜50μmのアルミニウム被膜を形成することを特
徴とする。また、請求項10記載の製造方法は、請求項
7記載の製造方法において、R−Fe−B系永久磁石と
アルミニウム片を処理容器内に入れ、前記処理容器内に
て、両者に振動を加え、および/または両者を攪拌する
ことによってアルミニウム被膜を形成することを特徴と
する。また、請求項11記載の製造方法は、請求項10
記載の製造方法において、膜厚が0.01μm〜1μm
のアルミニウム被膜を形成することを特徴とする。ま
た、請求項12記載の製造方法は、請求項7乃至11の
いずれかに記載の製造方法において、酸素雰囲気中での
酸化処理を、酸素濃度が0.01%〜20%の常圧下、
または酸素圧(分圧)が0.1Pa〜2×104Paの
減圧下、10℃〜500℃にて行うことを特徴とする。
また、請求項13記載の製造方法は、請求項7乃至12
のいずれかに記載の製造方法において、ポリイミド樹脂
被膜が付加型ポリイミド樹脂被膜であることを特徴とす
る。また、請求項14記載の製造方法は、請求項13記
載の製造方法において、付加型ポリイミド樹脂被膜がビ
スアリルナジイミドから得られる被膜であることを特徴
とする。The present invention has been made based on such findings, and the permanent magnet of the present invention has the following features.
An aluminum coating on the surface of the Fe-B permanent magnet;
It is characterized in that a polyimide resin film is provided on the surface of the aluminum film via an oxide film layer. A permanent magnet according to a second aspect is characterized in that, in the permanent magnet according to the first aspect, the polyimide resin film is an additional type polyimide resin film. A permanent magnet according to a third aspect is characterized in that, in the permanent magnet according to the second aspect, the addition type polyimide resin film is a film obtained from bisallylnadiimide. The permanent magnet according to claim 4 is the permanent magnet according to any one of claims 1 to 3, wherein the thickness of the aluminum coating is 0.01 μm to 50 μm.
m. A permanent magnet according to a fifth aspect is characterized in that, in the permanent magnet according to any one of the first to fourth aspects, the thickness of the oxide film layer is 0.01 μm to 2 μm. A permanent magnet according to a sixth aspect is characterized in that, in the permanent magnet according to any one of the first to fifth aspects, the film thickness of the polyimide resin film is 1 μm to 15 μm. Further, according to the method of manufacturing a permanent magnet of the present invention, an aluminum film is formed on the surface of an R-Fe-B-based permanent magnet, and then the surface of the aluminum film is oxidized in an oxygen atmosphere. Forming a polyimide resin film on the surface of the oxide film layer, and applying a polyimide resin film forming treatment liquid on the surface of the oxide film layer, followed by heat treatment to form a polyimide resin film. Also,
According to a eighth aspect of the present invention, in the method of the seventh aspect, the aluminum film is formed by a vapor deposition method. According to a ninth aspect of the present invention, in the manufacturing method of the eighth aspect, the film thickness is 0.01.
It is characterized in that an aluminum coating of μm to 50 μm is formed. According to a tenth aspect of the present invention, in the manufacturing method of the seventh aspect, the R-Fe-B-based permanent magnet and the aluminum piece are placed in a processing container, and both are subjected to vibration in the processing container. And / or stirring both to form an aluminum coating. The manufacturing method according to claim 11 is the same as the manufacturing method according to claim 10.
In the manufacturing method described above, the film thickness is 0.01 μm to 1 μm
Forming an aluminum film of According to a twelfth aspect of the present invention, in the manufacturing method according to any one of the seventh to eleventh aspects, the oxidation treatment in an oxygen atmosphere is performed under an ordinary pressure of an oxygen concentration of 0.01% to 20%.
Alternatively, the heat treatment is performed at 10 ° C. to 500 ° C. under a reduced pressure of oxygen pressure (partial pressure) of 0.1 Pa to 2 × 10 4 Pa.
The manufacturing method according to claim 13 is the method according to claims 7 to 12.
Wherein the polyimide resin coating is an addition type polyimide resin coating. A manufacturing method according to a fourteenth aspect is characterized in that, in the manufacturing method according to the thirteenth aspect, the addition type polyimide resin coating is a coating obtained from bisallylnadiimide.
【0010】[0010]
【発明の実施の形態】本発明の永久磁石は、R−Fe−
B系永久磁石表面に、アルミニウム被膜を有し、前記ア
ルミニウム被膜表面に、酸化被膜層を介して、ポリイミ
ド樹脂被膜を有することを特徴とする。BEST MODE FOR CARRYING OUT THE INVENTION The permanent magnet of the present invention
An aluminum coating is provided on the surface of the B-based permanent magnet, and a polyimide resin coating is provided on the aluminum coating surface via an oxide coating layer.
【0011】R−Fe−B系永久磁石表面にアルミニウ
ム被膜を形成する方法は特段限定されるものではない。
しかしながら、磁石とアルミニウム被膜が酸化腐食され
やすいことに配慮すれば、以下の、気相成長法による方
法とR−Fe−B系永久磁石とアルミニウム片を処理容
器内に入れ、前記処理容器内にて、両者に振動を加え、
および/または両者を攪拌することによる方法が望まし
い方法として挙げられる。The method for forming an aluminum film on the surface of the R-Fe-B permanent magnet is not particularly limited.
However, considering that the magnet and the aluminum coating are easily oxidized and corroded, the following method using a vapor phase growth method, an R-Fe-B-based permanent magnet and an aluminum piece are placed in a processing vessel, and And apply vibration to both,
And / or a method of stirring both is a desirable method.
【0012】(1)気相成長法による方法 アルミニウム被膜を形成するために採用することができ
る気相成長法としては、真空蒸着法、イオンスパッタリ
ング法、イオンプレーティング法などの公知の方法が挙
げられる。アルミニウム被膜は各方法における一般的な
条件にて形成すればよいが、形成される被膜の緻密性、
膜厚の均一性、被膜形成速度などの観点からは真空蒸着
法やイオンプレーティング法を採用することが望まし
い。なお、被膜形成前に磁石表面に対し、洗浄、脱脂、
スパッタリングなどの公知の清浄化処理を施してもよい
ことは言うまでもない。(1) Method by vapor phase epitaxy The vapor phase epitaxy that can be employed for forming an aluminum film includes known methods such as vacuum deposition, ion sputtering, and ion plating. Can be The aluminum film may be formed under general conditions in each method, but the denseness of the formed film,
From the viewpoint of the uniformity of the film thickness, the film formation speed, and the like, it is desirable to employ a vacuum evaporation method or an ion plating method. In addition, cleaning, degreasing,
It goes without saying that a known cleaning treatment such as sputtering may be performed.
【0013】被膜形成時における磁石の温度は、200
℃〜500℃に設定することが望ましい。該温度が20
0℃未満であると磁石表面に対して優れた密着性を有す
る被膜が形成されないおそれがあり、500℃を越える
と被膜形成後の冷却過程で被膜に亀裂が発生し、被膜が
磁石から剥離するおそれがあるからである。[0013] The temperature of the magnet during the film formation is 200
It is desirable that the temperature be set in the range of 500C to 500C. The temperature is 20
If the temperature is lower than 0 ° C., a film having excellent adhesion to the magnet surface may not be formed. If the temperature exceeds 500 ° C., a crack occurs in the cooling process after the film is formed, and the film peels off from the magnet. This is because there is a fear.
【0014】アルミニウム被膜の膜厚は、0.01μm
未満であると優れた耐食性を発揮できないおそれがあ
り、50μmを越えると製造コストの上昇を招くおそれ
があるだけでなく、磁石の有効体積が小さくなるおそれ
があるので、0.01μm〜50μmが望ましいが、
0.05μm〜25μmがより望ましい。The thickness of the aluminum film is 0.01 μm
If it is less than 50 μm, excellent corrosion resistance may not be exhibited. If it exceeds 50 μm, not only may the production cost be increased, but also the effective volume of the magnet may be reduced, so that 0.01 μm to 50 μm is desirable. But,
0.05 μm to 25 μm is more desirable.
【0015】(2)R−Fe−B系永久磁石とアルミニ
ウム片を処理容器内に入れ、前記処理容器内にて、両者
に振動を加え、および/または両者を攪拌することによ
る方法本方法において用いるアルミニウム片は、針状
(ワイヤー状)、円柱状、塊状など様々な形状のものを
用いることができるが、アルミニウム被膜の構成源とな
るアルミニウム微粉を効率よく生成させるためなどの観
点からは、末端が鋭利な針状や円柱状のものを用いるこ
とが望ましい。(2) A method in which an R-Fe-B-based permanent magnet and an aluminum piece are placed in a processing vessel, and both are vibrated and / or agitated in the processing vessel. The aluminum piece to be used may have various shapes such as a needle shape (wire shape), a column shape, and a lump shape. From the viewpoint of efficiently generating aluminum fine powder which is a constituent source of the aluminum film, It is desirable to use a needle-shaped or column-shaped one with a sharp end.
【0016】アルミニウム片の大きさ(長径)は、アル
ミニウム微粉を効率よく生成させるためなどの観点か
ら、0.05mm〜10mmが望ましいが、より望まし
くは0.3mm〜5mmであり、さらに望ましくは0.
5mm〜3mmである。アルミニウム片は同一形状・同
一寸法のものを用いてもよく、異形状・異寸法のものを
混合して用いてもよい。The size (major axis) of the aluminum piece is preferably from 0.05 mm to 10 mm, more preferably from 0.3 mm to 5 mm, and still more preferably 0 mm, from the viewpoint of efficiently producing aluminum fine powder. .
5 mm to 3 mm. The aluminum pieces having the same shape and the same size may be used, or the aluminum pieces having different shapes and different sizes may be mixed and used.
【0017】磁石とアルミニウム片に対する、振動およ
び/または攪拌は、両者が酸化腐食されやすいことに配
慮して、乾式的に行うことが望ましく、大気雰囲気中、
常温において行うことができる。本発明において用いう
る処理容器は、複雑な装置のものを必要とせず、たとえ
ば、バレル装置の処理室などでよい。バレル装置は回転
式、振動式、遠心式など、公知の装置を用いることがで
きる。回転式の場合、その回転数は20rpm〜50r
pmとすることが望ましい。振動式の場合、その振動数
は50Hz〜100Hz、振動振幅は0.3mm〜10
mmとすることが望ましい。遠心式の場合、その回転数
は70rpm〜200rpmとすることが望ましい。The vibration and / or stirring of the magnet and the aluminum piece are desirably performed dry in consideration of the fact that both are easily oxidized and corroded.
It can be performed at room temperature. The processing vessel that can be used in the present invention does not require a complicated apparatus, and may be, for example, a processing chamber of a barrel apparatus. As the barrel device, a known device such as a rotary type, a vibration type, and a centrifugal type can be used. In the case of a rotary type, the rotation speed is 20 rpm to 50 r.
pm is desirable. In the case of the vibration type, the frequency is 50 Hz to 100 Hz, and the vibration amplitude is 0.3 mm to 10 mm.
mm. In the case of the centrifugal type, it is desirable that the rotation speed be 70 rpm to 200 rpm.
【0018】処理容器内に入れる磁石とアルミニウム片
の量は、処理容器内容積の20vol%〜90vol%
が望ましい。20vol%未満であると処理量が少なす
ぎて実用的でなく、90vol%を越えると効率よく被
膜を形成することができないおそれがあるからである。
また、処理容器内に入れる磁石とアルミニウム片との比
率は、容積比率(磁石/アルミニウム片)にして3以下
が望ましい。容積比率が3を越えると被膜の形成に時間
を要して実用的でないおそれがあるからである。また、
処理時間は処理量にも依存するが、通常、1時間〜10
時間である。The amount of the magnet and the aluminum piece to be put in the processing container is 20 vol% to 90 vol% of the volume in the processing container.
Is desirable. If the amount is less than 20 vol%, the treatment amount is too small to be practical, and if it exceeds 90 vol%, it may not be possible to form a film efficiently.
Further, the ratio of the magnet and the aluminum piece put in the processing container is desirably 3 or less in terms of volume ratio (magnet / aluminum piece). If the volume ratio exceeds 3, it may take a long time to form a coating film, which may not be practical. Also,
Although the processing time depends on the processing amount, it is usually 1 hour to 10 hours.
Time.
【0019】上記の方法によって、アルミニウム片から
生成されるアルミニウム微粉を磁石表面に被着させ、ア
ルミニウム被膜を形成する。アルミニウム微粉が磁石表
面に被着する現象は、一種のメカノケミカル的反応であ
ると考えられ、アルミニウム微粉は磁石表面に強固に被
着し、得られるアルミニウム被膜は優れた耐食性を示
す。十分な耐食性を確保する観点からは、前述の通り、
その膜厚は0.01μm以上であることが望ましい。膜
厚の上限は特段制限されるものではないが、膜厚が1μ
mを越えるアルミニウム被膜を形成するには時間を要す
るので、この方法は膜厚が1μm以下のアルミニウム被
膜を形成する方法として適している。According to the above-described method, aluminum fine powder generated from aluminum pieces is applied to the magnet surface to form an aluminum coating. The phenomenon that the aluminum fine powder adheres to the magnet surface is considered to be a kind of mechanochemical reaction, and the aluminum fine powder adheres firmly to the magnet surface, and the resulting aluminum coating shows excellent corrosion resistance. From the viewpoint of ensuring sufficient corrosion resistance, as described above,
The thickness is desirably 0.01 μm or more. Although the upper limit of the film thickness is not particularly limited, the film thickness is 1 μm.
This method is suitable as a method for forming an aluminum film having a film thickness of 1 μm or less because it takes time to form an aluminum film exceeding m.
【0020】アルミニウム被膜表面に酸化被膜層を形成
する前工程として、ショットピーニング(硬質粒子を衝
突させることによって表面を改質する方法)を行っても
よい。ショットピーニングを行うことによって、アルミ
ニウム被膜の平滑化を行い、アルミニウム被膜自体の耐
食性を向上させるとともに、均一な酸化被膜層を形成し
やすくして、薄膜でも優れた性能を有するポリイミド樹
脂被膜を形成しやすくすることができる。ショットピー
ニングに用いる粉末としては、形成したアルミニウム被
膜の硬度と同等以上の硬度のものが望ましく、たとえ
ば、スチールボールやガラスビーズなどのようなモース
硬度が3以上の球状硬質粉末が挙げられる。該粉末の平
均粒度が30μm未満であるとアルミニウム被膜に対す
る押圧力が小さくて処理に時間を要する。一方、300
0μmを越えると表面粗度が荒くなりすぎて仕上がり面
が不均一となるおそれがある。したがって、該粉末の平
均粒径は、30μm〜3000μmが望ましく、40μ
m〜2000μmがより望ましい。ショットピーニング
における噴射圧は、1.0kg/cm2〜5.0kg/
cm2が望ましい。噴射圧が1.0kg/cm2未満で
あると金属被膜に対する押圧力が小さくて処理に時間を
要し、5.0kg/cm2を越えると金属被膜に対する
押圧力が不均一になって表面粗度の悪化を招くおそれが
あるからである。ショットピーニングにおける噴射時間
は、1分〜1時間が望ましい。噴射時間が1分未満であ
ると全表面に対して均一な処理ができないおそれがあ
り、1時間を越えると表面粗度の悪化を招くおそれがあ
るからである。As a step prior to forming an oxide film layer on the aluminum film surface, shot peening (a method of modifying the surface by colliding hard particles) may be performed. By performing shot peening, the aluminum film is smoothed, the corrosion resistance of the aluminum film itself is improved, and a uniform oxide film layer is easily formed, forming a polyimide resin film having excellent performance even in a thin film. Can be easier. As the powder used for shot peening, a powder having a hardness equal to or higher than the hardness of the formed aluminum film is desirable. For example, a spherical hard powder having a Mohs hardness of 3 or more, such as a steel ball or a glass bead, may be used. When the average particle size of the powder is less than 30 μm, the pressing force against the aluminum film is small, and it takes time to process. On the other hand, 300
If it exceeds 0 μm, the surface roughness may be too rough and the finished surface may be non-uniform. Therefore, the average particle size of the powder is desirably 30 μm to 3000 μm, and 40 μm.
m to 2000 μm is more desirable. The injection pressure in shot peening is 1.0 kg / cm 2 to 5.0 kg /
cm 2 is desirable. If the injection pressure is less than 1.0 kg / cm 2 , the pressing force on the metal film is small and it takes time to process, and if it exceeds 5.0 kg / cm 2 , the pressing force on the metal film becomes uneven and the surface roughness is increased. This is because the degree of deterioration may be caused. The injection time in shot peening is preferably 1 minute to 1 hour. If the injection time is less than 1 minute, uniform treatment may not be performed on the entire surface, and if it exceeds 1 hour, the surface roughness may be deteriorated.
【0021】磁石表面にアルミニウム被膜を形成した
後、熱処理することによって、磁石表面とアルミニウム
被膜との密着性を高めることもできる。熱処理の温度
は、200℃未満であると磁石とアルミニウム被膜との
界面反応が十分に進行せずに密着性が向上しないおそれ
があり、500℃を越えると磁石の磁気特性の劣化を招
くおそれや、アルミニウム被膜が溶解してしまうおそれ
がある。したがって、熱処理は、200℃〜500℃で
行うことが望ましいが、生産性や製造コストの観点から
は200℃〜350℃で行うことがより望ましい。な
お、後述する酸化被膜層表面にポリイミド樹脂被膜形成
処理液を塗布した後の熱処理によっても同様の効果を得
ることができる。After forming an aluminum coating on the magnet surface, heat treatment can be performed to increase the adhesion between the magnet surface and the aluminum coating. If the temperature of the heat treatment is less than 200 ° C., the interface reaction between the magnet and the aluminum coating may not sufficiently proceed to improve the adhesion, and if it exceeds 500 ° C., the magnetic properties of the magnet may be deteriorated. The aluminum coating may be dissolved. Therefore, the heat treatment is desirably performed at 200 ° C. to 500 ° C., but is more desirably performed at 200 ° C. to 350 ° C. from the viewpoint of productivity and manufacturing cost. The same effect can be obtained by a heat treatment after applying a polyimide resin film forming treatment liquid to the surface of the oxide film layer described later.
【0022】アルミニウム被膜表面に酸化被膜層を形成
する方法としては、たとえば、酸素雰囲気中での酸化処
理方法、水蒸気を含む雰囲気中での酸化処理方法(一般
的な水蒸気処理を含む)などが挙げられる。酸素雰囲気
中での酸化処理方法には、たとえば、処理室内で酸素濃
度と温度を制御しながら行う方法や大気中での自然酸化
などがある。処理条件としては、酸素濃度が0.01%
〜20%の常圧下、または酸素圧(分圧)が0.1Pa
〜2×104Paの減圧下、10℃〜500℃にて行う
ことが望ましい。酸素濃度が0.01%〜20%の常圧
条件は、大気自体を利用したものであってもよいし、窒
素ガスやアルゴンガスなどの不活性ガスを用いて所望す
る成分組成に調整されたものであってもよい。酸素圧
(分圧)が0.1Pa〜2×104Paの減圧条件は、
酸素圧のみで調整されたものであってもよいし、窒素ガ
スやアルゴンガスなどの不活性ガスを用いて所望する成
分組成や圧力に調整されたものであってもよい。酸化処
理を10℃〜500℃で行うことが望ましい理由は、5
00℃を超えると、磁石の磁気特性の劣化やアルミニウ
ム被膜の変形を招くおそれがあるからである。また、処
理温度が高くなるにつれて、緻密で薄い酸化被膜層を形
成することが困難となったり、酸化被膜層の表面粗度が
粗くなることによって、ポリイミド樹脂被膜の形成に悪
影響を及ぼし、結果的に優れた耐食性などの性能を有す
る磁石が得られないおそれがあるからである。上記の処
理条件にて処理室内で酸化処理を行う場合の処理時間
は、通常、5分〜48時間である。酸素雰囲気中での酸
化処理方法としては、上記のような方法の他にも、前述
のアルミニウム被膜表面に対するショットピーニング
や、ショットブラスト処理、弱電圧下でのスパッタ処理
や高周波による酸素プラズマ形成下での酸化処理などが
ある。水蒸気を含む雰囲気中での酸化処理方法(一般的
な水蒸気処理を含む)は、水蒸気濃度と温度を制御しな
がら行うものであり、その具体的な処理条件は、たとえ
ば、水蒸気濃度が0.01%〜100%、処理温度が1
0℃〜300℃である。As a method of forming an oxide film layer on the surface of the aluminum film, for example, an oxidation treatment method in an oxygen atmosphere, an oxidation treatment method in an atmosphere containing steam (including general steam treatment) and the like can be mentioned. Can be As an oxidation treatment method in an oxygen atmosphere, for example, there are a method in which oxygen concentration and temperature are controlled in a treatment chamber and a natural oxidation in the air. As the processing conditions, the oxygen concentration is 0.01%.
Under normal pressure of ~ 20% or oxygen pressure (partial pressure) 0.1 Pa
It is desirable to carry out at a temperature of 10 ° C. to 500 ° C. under a reduced pressure of 22 × 10 4 Pa. The normal pressure condition in which the oxygen concentration is 0.01% to 20% may use the atmosphere itself or may be adjusted to a desired component composition using an inert gas such as a nitrogen gas or an argon gas. It may be something. Oxygen pressure (partial pressure) is 0.1 Pa to 2 × 10 4 Pa.
The composition may be adjusted only by oxygen pressure, or may be adjusted to a desired component composition or pressure using an inert gas such as nitrogen gas or argon gas. The reason why it is desirable to perform the oxidation treatment at 10 ° C to 500 ° C is as follows.
If the temperature exceeds 00 ° C., the magnetic properties of the magnet may be deteriorated and the aluminum coating may be deformed. Also, as the processing temperature increases, it becomes difficult to form a dense and thin oxide film layer, or the surface roughness of the oxide film layer becomes rough, which adversely affects the formation of the polyimide resin film, resulting in This is because a magnet having excellent performance such as corrosion resistance may not be obtained. The processing time when performing the oxidation treatment in the processing chamber under the above processing conditions is usually 5 minutes to 48 hours. As an oxidation treatment method in an oxygen atmosphere, in addition to the above-described methods, the above-described shot peening or shot blasting of the aluminum coating surface, sputtering treatment under a weak voltage, or under oxygen plasma formation by high frequency. Oxidation treatment. The oxidation treatment method (including general steam treatment) in an atmosphere containing steam is carried out while controlling the steam concentration and the temperature. % To 100%, processing temperature is 1
0 ° C to 300 ° C.
【0023】上記のような方法によって形成される酸化
被膜層の膜厚は、0.01μm以上であることが望まし
い。膜厚が0.01μm未満であるとアルミニウム被膜
表面へのポリイミド樹脂被膜の優れた密着性に寄与しな
いおそれがあるからである。一方、酸化被膜層の膜厚
は、2μm以下であることが望ましい。膜厚が2μmを
超えるとアルミニウム被膜表面へのポリイミド樹脂被膜
の優れた密着性を逆に阻害するおそれがあるからであ
る。さらに、磁石自体の小型化に基づく要請などを加味
すれば、酸化被膜層の膜厚は、1μm以下であることが
より望ましい。The thickness of the oxide film layer formed by the above method is desirably 0.01 μm or more. This is because if the film thickness is less than 0.01 μm, it may not contribute to excellent adhesion of the polyimide resin film to the surface of the aluminum film. On the other hand, the thickness of the oxide film layer is desirably 2 μm or less. If the thickness exceeds 2 μm, excellent adhesion of the polyimide resin film to the surface of the aluminum film may be adversely affected. Further, in consideration of a demand based on miniaturization of the magnet itself, the thickness of the oxide film layer is more preferably 1 μm or less.
【0024】次に、酸化被膜層表面にポリイミド樹脂被
膜を形成する方法について述べる。ポリイミド樹脂被膜
は、付加型ポリイミド樹脂被膜であっても縮合型ポリイ
ミド樹脂被膜であってもよいが、望ましくは、付加型ポ
リイミド樹脂被膜がよい。付加型ポリイミド樹脂は、樹
脂分子の末端に不飽和基を有し、付加反応やラジカル反
応による三次元架橋により得られるものであるが、硬化
に際して水が生成することがないので、磁石が酸化腐食
されやすいことを考慮すれば非常に都合のよい樹脂であ
る。付加型ポリイミド樹脂としては、無水アリルナジッ
ク酸とジアミンから合成され、脱水閉環反応が完結した
両末端にアリル基を有するイミドモノマーであるビスア
リルナジイミド(BANI:図1参照)から得られる樹
脂の他、末端ナジック酸型ポリイミド樹脂(PMR)、
ビスマレイミド型ポリイミド樹脂、末端アセチレン型ポ
リイミド樹脂など公知のものを使用することができる。Next, a method for forming a polyimide resin film on the surface of the oxide film layer will be described. The polyimide resin coating may be an addition type polyimide resin coating or a condensation type polyimide resin coating, but is preferably an addition type polyimide resin coating. The addition type polyimide resin has an unsaturated group at the terminal of the resin molecule and is obtained by three-dimensional crosslinking by addition reaction or radical reaction.However, since water is not generated during curing, the magnet is oxidized and corroded. It is a very convenient resin considering that it is easy to perform. Examples of the addition type polyimide resin include a resin obtained from bisallylnadiimide (BANI: see FIG. 1) which is an imide monomer synthesized from allylnadic anhydride and a diamine and having an allyl group at both ends after completion of the dehydration ring closure reaction. Other, nadic acid type polyimide resin (PMR),
Known resins such as bismaleimide type polyimide resin and acetylene terminal type polyimide resin can be used.
【0025】[0025]
【化1】 Embedded image
【0026】縮合型ポリイミド樹脂としては、ピロメリ
ット酸二無水物と4,4’−ジアミノジフェニルエーテ
ルから脱水縮合反応を経て得られるピロメリット型ポリ
イミド樹脂が挙げられる。縮合型ポリイミド樹脂は、硬
化に際して水が生成するが、酸化被膜層は、磁石表面の
いわば保護層として水が磁石表面に接触しにくくする役
割を果たすので、優れた密着性を有するポリイミド樹脂
被膜をアルミニウム被膜表面に形成することができる。Examples of the condensation type polyimide resin include a pyromellitic type polyimide resin obtained by a dehydration condensation reaction from pyromellitic dianhydride and 4,4′-diaminodiphenyl ether. Condensation type polyimide resin generates water upon curing, but the oxide film layer plays a role as a so-called protective layer on the magnet surface so that water does not easily come into contact with the magnet surface, so a polyimide resin film having excellent adhesion is provided. It can be formed on the aluminum coating surface.
【0027】酸化被膜層表面へのポリイミド樹脂被膜の
形成は、ポリイミド樹脂被膜形成処理液を酸化被膜層表
面に塗布し、熱処理する方法(いわゆる溶液法)によっ
て行うことが、蒸着重合法と比較して簡便に行え、製造
コストの上昇を招くことなく量産化が可能となる点にお
いて望ましい。The formation of the polyimide resin film on the surface of the oxide film layer is performed by applying a polyimide resin film forming treatment solution to the surface of the oxide film layer and heat-treating the solution (so-called solution method). This is desirable in that it can be performed simply and easily and can be mass-produced without increasing the manufacturing cost.
【0028】ポリイミド樹脂被膜形成処理液は、ポリイ
ミド樹脂自体、ポリイミド樹脂の原料となるモノマーや
オリゴマーなどを必要に応じて有機溶媒に溶解して調製
すればよい。たとえば、ビスアリルナジイミドは、かさ
高い構造を有した低分子量のイミドモノマーであるの
で、脂肪族炭化水素、脂肪族アルコールを除くほとんど
の有機溶媒に可溶である。また、ピロメリット型ポリイ
ミド樹脂被膜を形成するための溶液は、たとえば、ピロ
メリット酸二無水物と4,4’−ジアミノジフェニルエ
ーテルを高極性溶媒のN−メチル−2−ピロリドンに溶
解して調製すればよい。The solution for forming a polyimide resin film may be prepared by dissolving the polyimide resin itself, a monomer or oligomer used as a raw material of the polyimide resin in an organic solvent, if necessary. For example, bisallylnadiimide is a low molecular weight imide monomer having a bulky structure, and is soluble in most organic solvents except aliphatic hydrocarbons and aliphatic alcohols. A solution for forming a pyromellitic polyimide resin film is prepared by, for example, dissolving pyromellitic dianhydride and 4,4′-diaminodiphenyl ether in a highly polar solvent, N-methyl-2-pyrrolidone. I just need.
【0029】ポリイミド樹脂被膜形成処理液の酸化被膜
層表面への塗布方法としては、ディップコーティング
法、スプレー法、スピンコート法などを用いることがで
きる。As a method of applying the polyimide resin film forming treatment solution to the surface of the oxide film layer, a dip coating method, a spray method, a spin coating method, or the like can be used.
【0030】酸化被膜層表面にポリイミド樹脂被膜形成
処理液を塗布した後の熱処理は、200℃〜400℃で
行うことが望ましい。200℃未満であると硬化反応が
十分に進行しないおそれがあり、400℃を越えると被
膜の劣化を招くおそれがあるからである。熱処理時間
は、通常、5分〜24時間である。なお、必要に応じ
て、熱処理を行う前に、有機溶媒を除去するための乾燥
処理(たとえば、60℃〜90℃の条件下、5分〜1時
間)を行ってもよい。The heat treatment after applying the polyimide resin film forming treatment solution to the surface of the oxide film layer is desirably performed at 200 ° C. to 400 ° C. If the temperature is lower than 200 ° C., the curing reaction may not proceed sufficiently, and if it exceeds 400 ° C., the coating may be deteriorated. The heat treatment time is usually 5 minutes to 24 hours. Before the heat treatment, a drying treatment for removing the organic solvent (for example, at a temperature of 60 ° C. to 90 ° C. for 5 minutes to 1 hour) may be performed, if necessary.
【0031】酸化被膜層表面へのポリイミド樹脂被膜の
形成は、上記のポリイミド樹脂被膜形成処理液を酸化被
膜層表面に塗布し、熱処理する方法に限られるものでは
なく、蒸着重合法によって行ってもよい。たとえば、酸
化被膜層表面にピロメリット型ポリイミド樹脂被膜を蒸
着重合法によって形成する場合は、表面に酸化被膜層を
有するアルミニウム被膜付磁石を真空度1Pa〜10
−3Paの真空容器内に収容し、ピロメリット酸二無水
物と4,4’−ジアミノジフェニルエーテルを200℃
〜250℃で加熱蒸着してポリアミック酸被膜を形成し
た後、常圧下、280℃〜380℃でイミド化処理を行
う方法が挙げられる(特開平8−279407号公報を
参照)。The formation of the polyimide resin film on the surface of the oxide film layer is not limited to a method of applying the above-mentioned treatment solution for forming a polyimide resin film to the surface of the oxide film layer and subjecting it to a heat treatment. Good. For example, in the case where a pyromellitic polyimide resin film is formed on the surface of the oxide film layer by vapor deposition polymerization, a magnet with an aluminum film having an oxide film layer on the surface may have a degree of vacuum of 1 Pa to 10 Pa.
-3 Pa in a vacuum vessel, and pyromellitic dianhydride and 4,4′-diaminodiphenyl ether at 200 ° C.
A method of forming a polyamic acid film by heating and vapor-depositing at a temperature of from about 250 ° C. to about 250 ° C., and then performing an imidization treatment at 280 ° C. to 380 ° C. under normal pressure (see Japanese Patent Application Laid-Open No. 8-279407).
【0032】上記の方法によって形成されるポリイミド
樹脂被膜は、酸化被膜層を介して、アルミニウム被膜表
面に強固に密着しているので、膜厚が1μm以上であれ
ば優れた耐食性などの性能を発揮する。なお、ポリイミ
ド樹脂被膜の膜厚の上限は限定されるものではないが、
磁石自体の小型化に基づく要請から、15μm以下が望
ましく、10μm以下がより望ましい。なお、必要に応
じて、酸化被膜層表面へのポリイミド樹脂被膜形成処理
液の塗布、それに続く熱処理を複数回繰り返して行って
もよいことはいうまでもない。さらに、ポリイミド樹脂
被膜の各種性能(耐磨耗性や滑り性など)を高めるため
に、被膜中にチタンやニッケルなどの金属の微粒子、ア
ルミナやシリカなどのセラミックスや金属酸化物などの
微粒子、テフロン(登録商標)などの合成樹脂の微粒
子、その他、有機顔料や無機顔料として使用される各種
微粒子を分散させてもよい。たとえば、被膜中に粒径1
μmのテフロン球を20重量%程度分散させれば、ポリ
イミド樹脂被膜の滑り性を向上させることができる。添
加する微粒子の大きさや形状は、形成される被膜の性能
や膜厚などを考慮して適宜選択されるものであるが、通
常、粒径0.01μm〜5μmの微粒子を使用すること
ができる。Since the polyimide resin film formed by the above method is firmly adhered to the surface of the aluminum film via the oxide film layer, if the film thickness is 1 μm or more, it exhibits excellent performance such as corrosion resistance. I do. The upper limit of the thickness of the polyimide resin film is not limited,
From the demand based on miniaturization of the magnet itself, it is preferably 15 μm or less, more preferably 10 μm or less. It is needless to say that the application of the polyimide resin film forming treatment liquid to the surface of the oxide film layer and the subsequent heat treatment may be repeated a plurality of times as necessary. Furthermore, in order to enhance the various performances (abrasion resistance, slipperiness, etc.) of the polyimide resin film, fine particles of a metal such as titanium or nickel, fine particles of a ceramic or metal oxide such as alumina or silica, and Teflon in the film. Fine particles of a synthetic resin such as (registered trademark) or various fine particles used as an organic pigment or an inorganic pigment may be dispersed. For example, a particle size of 1
By dispersing about 20% by weight of μm Teflon spheres, the slipperiness of the polyimide resin film can be improved. The size and shape of the fine particles to be added are appropriately selected in consideration of the performance and the thickness of the coating film to be formed, but fine particles having a particle size of 0.01 μm to 5 μm can be usually used.
【0033】本発明において用いられるR−Fe−B系
永久磁石における希土類元素(R)は、Nd、Pr、D
y、Ho、Tb、Smのうち少なくとも1種、あるいは
さらに、La、Ce、Gd、Er、Eu、Tm、Yb、
Lu、Yのうち少なくとも1種を含むものが望ましい。
また、通常はRのうち1種をもって足りるが、実用上は
2種以上の混合物(ミッシュメタルやジジムなど)を入
手上の便宜などの理由によって用いることもできる。R
−Fe−B系永久磁石におけるRの含量は、10原子%
未満であると結晶構造がα−Feと同一構造の立方晶組
織となるため、高磁気特性、特に高い保磁力(HcJ)
が得られず、一方、30原子%を超えるとRリッチな非
磁性相が多くなり、残留磁束密度(Br)が低下して優
れた特性の永久磁石が得られないので、組成の10原子
%〜30原子%であることが望ましい。The rare earth element (R) in the R—Fe—B permanent magnet used in the present invention is Nd, Pr, D
at least one of y, Ho, Tb, and Sm, or La, Ce, Gd, Er, Eu, Tm, Yb,
A material containing at least one of Lu and Y is desirable.
In general, one kind of R is sufficient, but in practice, a mixture of two or more kinds (such as misch metal and dymium) can be used for convenience and other reasons. R
-The content of R in the Fe-B-based permanent magnet is 10 atomic%.
If it is less than 1, the crystal structure becomes a cubic structure having the same structure as that of α-Fe, so that it has high magnetic properties, particularly high coercive force (HcJ).
On the other hand, if it exceeds 30 atomic%, the R-rich nonmagnetic phase increases, the residual magnetic flux density (Br) decreases, and a permanent magnet having excellent characteristics cannot be obtained. It is desirably about 30 at%.
【0034】Feの含量は、65原子%未満であるとB
rが低下し、80原子%を超えると高いHcJが得られ
ないので、65原子%〜80原子%の含有が望ましい。
また、Feの一部をCoで置換することによって、得ら
れる磁石の磁気特性を損なうことなしに温度特性を改善
することができるが、Co置換量がFeの20原子%を
超えると磁気特性が劣化するので望ましくない。Co置
換量が5原子%〜15原子%の場合、Brは置換しない
場合に比較して増加するため、高磁束密度を得るのに望
ましい。If the Fe content is less than 65 atomic%, B
When r decreases and exceeds 80 atomic%, a high HcJ cannot be obtained. Therefore, the content of 65 to 80 atomic% is desirable.
Further, by substituting a part of Fe with Co, the temperature characteristics can be improved without impairing the magnetic characteristics of the obtained magnet. However, when the Co substitution amount exceeds 20 atomic% of Fe, the magnetic characteristics become poor. It is not desirable because it deteriorates. When the amount of Co substitution is 5 atomic% to 15 atomic%, Br increases in comparison with the case where no substitution is made, and thus it is desirable to obtain a high magnetic flux density.
【0035】Bの含量は、2原子%未満であると菱面体
構造が主相となり、高いHcJは得られず、28原子%
を超えるとBリッチな非磁性相が多くなり、Brが低下
して優れた特性の永久磁石が得られないので、2原子%
〜28原子%の含有が望ましい。また、磁石の製造性の
改善や低価格化のために、2.0wt%以下のP、2.
0wt%以下のSのうち、少なくとも1種、合計量で
2.0wt%以下を含有していてもよい。さらに、Bの
一部を30wt%以下のCで置換することによって、磁
石の耐食性を改善することができる。If the content of B is less than 2 atomic%, the rhombohedral structure becomes the main phase, and a high HcJ cannot be obtained.
If it exceeds 0.005%, the B-rich non-magnetic phase increases, so that Br decreases and a permanent magnet having excellent characteristics cannot be obtained.
The content of about 28 atomic% is desirable. Further, in order to improve the manufacturability of the magnet and to reduce the price, the content of P of 2.0 wt% or less;
At least one of S at 0 wt% or less may be contained in a total amount of 2.0 wt% or less. Further, by replacing a part of B with 30 wt% or less of C, the corrosion resistance of the magnet can be improved.
【0036】さらに、Al、Ti、V、Cr、Mn、B
i、Nb、Ta、Mo、W、Sb、Ge、Sn、Zr、
Ni、Si、Zn、Hf、Gaのうち少なくとも1種の
添加は、保磁力や減磁曲線の角型性の改善、製造性の改
善、低価格化に効果がある。なお、その添加量は、最大
エネルギー積(BH)maxを159kJ/m3以上と
するためには、Brが少なくとも0.9T以上必要とな
るので、該条件を満たす範囲で添加することが望まし
い。なお、R−Fe−B系永久磁石には、R、Fe、B
以外に工業的生産上不可避な不純物を含有するものでも
差し支えない。Further, Al, Ti, V, Cr, Mn, B
i, Nb, Ta, Mo, W, Sb, Ge, Sn, Zr,
Addition of at least one of Ni, Si, Zn, Hf, and Ga is effective in improving the coercive force and the squareness of the demagnetization curve, improving the manufacturability, and reducing the cost. In order to set the maximum energy product (BH) max to 159 kJ / m 3 or more, Br is required to be at least 0.9 T or more. Therefore, it is preferable to add Br in a range that satisfies the condition. The R-Fe-B permanent magnet includes R, Fe, B
In addition to these, those containing impurities that are inevitable in industrial production may be used.
【0037】また、本発明において用いられるR−Fe
−B系永久磁石の中で、平均結晶粒径が1μm〜80μ
mの範囲にある正方晶系の結晶構造を有する化合物を主
相とし、体積比で1%〜50%の非磁性相(酸化物相を
除く)を含むことを特徴とする磁石は、HcJ≧80k
A/m、Br>0.4T、(BH)max≧80kJ/
m3を示し、(BH)maxの最大値は199kJ/m
3以上に達する。The R-Fe used in the present invention
-Among the B-based permanent magnets, the average crystal grain size is 1 μm to 80 μm.
The magnet having a main phase of a compound having a tetragonal crystal structure in the range of m and containing 1% to 50% by volume of a nonmagnetic phase (excluding an oxide phase) is HcJ ≧ 80k
A / m, Br> 0.4T, (BH) max ≧ 80 kJ /
indicates m 3, the maximum value of (BH) max is 199kJ / m
Reaches 3 or more.
【0038】なお、本発明のポリイミド樹脂被膜の上
に、更に別の被膜を積層形成してもよい。このような構
成を採用することによって、ポリイミド樹脂被膜の特性
を増強・補完したり、さらなる機能性を付与したりする
ことができる。It is to be noted that another film may be laminated on the polyimide resin film of the present invention. By adopting such a configuration, the characteristics of the polyimide resin film can be enhanced or supplemented, and further functionality can be imparted.
【0039】[0039]
【実施例】たとえば、米国特許4770723号公報に
記載されているようにして、公知の鋳造インゴットを粉
砕し、微粉砕後に成形、焼結、熱処理、表面加工を行う
ことによって得られた17Nd−1Pr−75Fe−7
B組成の23mm×10mm×6mm寸法の焼結磁石
(以下「磁石体試験片」と称する)を用いて以下の実験
を行った。以下の実験において、アルミニウム被膜の膜
厚、酸化被膜層の膜厚およびポリイミド樹脂被膜の膜厚
は破断面の電子顕微鏡観察によって測定した。なお、本
発明は、R−Fe−B系焼結磁石への適用に限られるも
のではなく、R−Fe−B系ボンド磁石に対しても適用
できるものである。For example, as described in U.S. Pat. No. 4,770,723, 17Nd-1Pr obtained by pulverizing a well-known casting ingot, performing pulverization, forming, sintering, heat treatment and surface processing. -75Fe-7
The following experiment was performed using a sintered magnet having a B composition and a size of 23 mm × 10 mm × 6 mm (hereinafter referred to as “magnet test piece”). In the following experiments, the film thickness of the aluminum film, the film thickness of the oxide film layer, and the film thickness of the polyimide resin film were measured by observing the fracture surface with an electron microscope. The present invention is not limited to the application to the R-Fe-B based sintered magnet, but is also applicable to the R-Fe-B based bonded magnet.
【0040】実験例1:真空容器内に磁石体試験片を収
容し、内部を1×10−4Pa以下に真空排気した後、
Arガス圧10Pa、バイアス電圧−400Vの条件下
で、15分スパッタリングを行い、磁石表面を清浄化し
た。次に、Arガス圧10Pa、バイアス電圧−50
V、磁石温度250℃の条件下で、ターゲットとして金
属アルミニウムを用い、20分アークイオンプレーティ
ングを行い、磁石表面にアルミニウム被膜を形成し、放
冷した。得られたアルミニウム被膜の膜厚は1.1μm
であった。上記の方法で得られた、アルミニウム被膜付
磁石を直ちに処理室内に収容し、酸素濃度5%の常圧下
(詳細は表1参照)、温度200℃で、10分酸化処理
を行い、アルミニウム被膜表面に酸化被膜層を形成し
た。形成された酸化被膜層の膜厚は0.3μmであっ
た。ポリイミド樹脂被膜形成処理液として、BANI−
M(商品名・丸善石油化学社製)を、有機溶媒としてト
ルエンを用いて20%(vol/vol)に希釈した溶
液を調製した。これを、上記の方法で得られた、表面に
酸化被膜層を有するアルミニウム被膜付磁石にスプレー
法によって塗布した。続いて、80℃にて10分乾燥し
た後、250℃にて15分熱処理を行い、酸化被膜層表
面にポリイミド樹脂被膜を形成した。形成されたポリイ
ミド樹脂被膜の膜厚は5μmであった。上記の方法で得
られた、表面にアルミニウム被膜を有し、前記アルミニ
ウム被膜表面に、酸化被膜層を介して、ポリイミド樹脂
被膜を有する磁石を、温度70℃×相対湿度90%の高
温高湿条件下に放置して耐食性加速試験を行った。その
結果、試験開始から500時間経過しても発錆や被膜剥
離などは観察されず、優れた耐食性を示した。また、電
気絶縁性を体積抵抗率(ρ)によって評価したところ、
1×1015Ω・cm以上という優れた値を示した。な
お、体積抵抗率は、サンプルに電極付けを行い、被膜表
面と磁石間の抵抗を測定し、ρ=R・S/lの数式から
求めた(R:抵抗(Ω)、S:電極面積(cm2)、
l:ポリイミド樹脂被膜膜厚(cm))。耐熱性を熱変
形温度によって評価したところ、280℃以上という優
れた値を示した。なお、熱変形温度は、大気中20時間
その温度に放置して被膜の変色、亀裂などが生じる温度
とした。Experimental Example 1: A magnet test piece was placed in a vacuum vessel, and the inside of the test piece was evacuated to 1 × 10 −4 Pa or less.
Sputtering was performed for 15 minutes under the conditions of an Ar gas pressure of 10 Pa and a bias voltage of -400 V to clean the magnet surface. Next, an Ar gas pressure of 10 Pa and a bias voltage of -50
Under a condition of V and a magnet temperature of 250 ° C., metal ion was used as a target and arc ion plating was performed for 20 minutes to form an aluminum film on the magnet surface and allowed to cool. The thickness of the obtained aluminum film is 1.1 μm.
Met. The magnet with the aluminum coating obtained by the above method is immediately housed in the processing chamber, and subjected to an oxidation treatment at a temperature of 200 ° C. for 10 minutes under normal pressure with an oxygen concentration of 5% (for details, see Table 1). An oxide film layer was formed on the substrate. The thickness of the formed oxide film layer was 0.3 μm. BANI-
M (trade name, manufactured by Maruzen Petrochemical Co., Ltd.) was diluted to 20% (vol / vol) using toluene as an organic solvent to prepare a solution. This was applied by a spray method to the aluminum-coated magnet having an oxide coating layer on the surface obtained by the above method. Subsequently, after drying at 80 ° C. for 10 minutes, heat treatment was performed at 250 ° C. for 15 minutes to form a polyimide resin film on the surface of the oxide film layer. The film thickness of the formed polyimide resin film was 5 μm. A magnet having an aluminum coating on the surface and having a polyimide resin coating on the surface of the aluminum coating via the oxide coating layer obtained by the above method was subjected to high temperature and high humidity conditions of 70 ° C. × 90% relative humidity. The sample was allowed to stand below for an accelerated corrosion resistance test. As a result, no rusting or peeling of the film was observed even after 500 hours from the start of the test, indicating excellent corrosion resistance. When the electrical insulation was evaluated by volume resistivity (ρ),
An excellent value of 1 × 10 15 Ω · cm or more was shown. The volume resistivity was determined by applying an electrode to the sample, measuring the resistance between the coating surface and the magnet, and calculating from the equation of ρ = R · S / l (R: resistance (Ω), S: electrode area ( cm 2 ),
l: Polyimide resin film thickness (cm)). When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown. The heat deformation temperature was a temperature at which the film was left at that temperature for 20 hours in the air to cause discoloration, cracks and the like of the film.
【0041】実験例2:実験例1において、スプレー法
による塗布と乾燥をもう一度繰り返して行った後に熱処
理を行った以外は実験例1と同一条件で、膜厚が10μ
mのポリイミド樹脂被膜を形成した。上記の方法で得ら
れた、表面にアルミニウム被膜を有し、前記アルミニウ
ム被膜表面に、酸化被膜層を介して、ポリイミド樹脂被
膜を有する磁石に対し、実験例1と同一条件の耐食性加
速試験を行った。その結果、試験開始から500時間経
過しても発錆や被膜剥離などは観察されず、優れた耐食
性を示した。また、電気絶縁性を体積抵抗率(ρ)によ
って評価したところ、1×1015Ω・cm以上という
優れた値を示した。耐熱性を熱変形温度によって評価し
たところ、280℃以上という優れた値を示した。Experimental Example 2 A film having a thickness of 10 μm was obtained under the same conditions as in Experimental Example 1 except that heat treatment was performed after coating and drying were repeated once again by the spray method.
m of a polyimide resin film was formed. The magnet having the aluminum coating on the surface obtained by the above method and having the polyimide resin coating on the surface of the aluminum coating via the oxide coating layer was subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1. Was. As a result, no rusting or peeling of the film was observed even after 500 hours from the start of the test, indicating excellent corrosion resistance. When the electrical insulation was evaluated by volume resistivity (ρ), it showed an excellent value of 1 × 10 15 Ω · cm or more. When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown.
【0042】実験例3:磁石体試験片に対し、実験例1
と同一条件でスパッタリングを行い、磁石表面を清浄化
した。次に、Arガス圧1Pa、電圧1.5KVの条件
下で、コーティング材料としてアルミニウムワイヤーを
用い、これを加熱蒸発させてイオン化し、2.5分イオ
ンプレーティングを行い、磁石表面にアルミニウム被膜
を形成し、放冷した。得られたアルミニウム被膜の膜厚
は2μmであった。その後、N2ガスからなる加圧気体
とともに、平均粒径120μm、モース硬度6の球状ガ
ラスビーズ粉末を、噴射圧1.5kg/cm2にて10
分、アルミニウム被膜表面に対して噴射して、ショット
ピーニングを施した。上記の方法で得られた、アルミニ
ウム被膜付磁石を直ちに処理室内に収容し、酸素濃度
0.1%の常圧下(詳細は表1参照)、温度250℃
で、7分酸化処理を行い、アルミニウム被膜表面に酸化
被膜層を形成した。形成された酸化被膜層の膜厚は0.
2μmであった。上記の方法で得られた、表面に酸化被
膜層を有するアルミニウム被膜付磁石に対し、実験例1
で使用したものと同じポリイミド樹脂被膜形成処理液を
使用し、実験例1と同じ条件にて、膜厚が5μmのポリ
イミド樹脂被膜を形成した。上記の方法で得られた、表
面にアルミニウム被膜を有し、前記アルミニウム被膜表
面に、酸化被膜層を介して、ポリイミド樹脂被膜を有す
る磁石に対し、実験例1と同一条件の耐食性加速試験を
行った。その結果、試験開始から500時間経過しても
発錆や被膜剥離などは観察されず、優れた耐食性を示し
た。また、電気絶縁性を体積抵抗率(ρ)によって評価
したところ、1×1015Ω・cm以上という優れた値
を示した。耐熱性を熱変形温度によって評価したとこ
ろ、280℃以上という優れた値を示した。Experimental Example 3: Experimental example 1 for a magnet body test piece
Sputtering was performed under the same conditions as described above to clean the magnet surface. Next, under conditions of an Ar gas pressure of 1 Pa and a voltage of 1.5 KV, an aluminum wire was used as a coating material, which was heated and evaporated to be ionized, subjected to ion plating for 2.5 minutes, and an aluminum film was formed on the magnet surface. Formed and allowed to cool. The thickness of the obtained aluminum coating was 2 μm. Thereafter, spherical glass bead powder having an average particle size of 120 μm and a Mohs hardness of 6 was sprayed together with a pressurized gas consisting of N 2 gas at an injection pressure of 1.5 kg / cm 2 for 10 minutes.
In addition, shot peening was performed by spraying on the aluminum coating surface. The magnet with the aluminum coating obtained by the above method was immediately housed in the processing chamber, and under normal pressure with an oxygen concentration of 0.1% (for details, see Table 1) at a temperature of 250 ° C.
For 7 minutes to form an oxide film layer on the aluminum film surface. The thickness of the formed oxide film layer is 0.
It was 2 μm. Experimental Example 1 was applied to an aluminum-coated magnet having an oxide layer on the surface obtained by the above method.
A polyimide resin film having a thickness of 5 μm was formed under the same conditions as in Experimental Example 1 by using the same polyimide resin film forming treatment liquid as that used in Example 1. The magnet having the aluminum coating on the surface obtained by the above method and having the polyimide resin coating on the surface of the aluminum coating via the oxide coating layer was subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1. Was. As a result, no rusting or peeling of the film was observed even after 500 hours from the start of the test, indicating excellent corrosion resistance. When the electrical insulation was evaluated by volume resistivity (ρ), it showed an excellent value of 1 × 10 15 Ω · cm or more. When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown.
【0043】実験例4:実験例3において、スプレー法
による塗布と乾燥をもう一度繰り返して行った後に熱処
理を行った以外は実験例3と同一条件で、膜厚が10μ
mのポリイミド樹脂被膜を形成した。上記の方法で得ら
れた、表面にアルミニウム被膜を有し、前記アルミニウ
ム被膜表面に、酸化被膜層を介して、ポリイミド樹脂被
膜を有する磁石に対し、実験例1と同一条件の耐食性加
速試験を行った。その結果、試験開始から500時間経
過しても発錆や被膜剥離などは観察されず、優れた耐食
性を示した。また、電気絶縁性を体積抵抗率(ρ)によ
って評価したところ、1×1015Ω・cm以上という
優れた値を示した。耐熱性を熱変形温度によって評価し
たところ、280℃以上という優れた値を示した。Experimental Example 4 A film having a thickness of 10 μm was obtained under the same conditions as in Experimental Example 3 except that heat treatment was performed after coating and drying were repeated once by the spray method.
m of a polyimide resin film was formed. The magnet having the aluminum coating on the surface obtained by the above method and having the polyimide resin coating on the surface of the aluminum coating via the oxide coating layer was subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1. Was. As a result, no rusting or peeling of the film was observed even after 500 hours from the start of the test, indicating excellent corrosion resistance. When the electrical insulation was evaluated by volume resistivity (ρ), it showed an excellent value of 1 × 10 15 Ω · cm or more. When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown.
【0044】実験例5:100個の磁石体試験片(見か
け容量0.35リットル、重量1.1kg)と直径0.
8mm、長さ1mmの短円柱状アルミニウム片(見かけ
容量20リットル、重量100kg)を容積50リット
ルの振動バレル装置の処理室に投入し(合計投入量は処
理室内容積の30vol%)、振動数60Hz、振動振
幅1.8mmの条件にて乾式的に処理を7時間行い、磁
石表面にアルミニウム被膜を形成した。得られたアルミ
ニウム被膜の膜厚は0.2μmであった。上記の方法で
得られた、アルミニウム被膜付磁石を直ちに処理室内に
収容し、酸素濃度0.2%の常圧下(詳細は表1参
照)、温度180℃で、6分酸化処理を行い、アルミニ
ウム被膜表面に酸化被膜層を形成した。形成された酸化
被膜層の膜厚は0.1μmであった。上記の方法で得ら
れた、表面に酸化被膜層を有するアルミニウム被膜付磁
石に対し、実験例1で使用したものと同じポリイミド樹
脂被膜形成処理液を使用し、実験例1と同じ条件にて、
膜厚が5μmのポリイミド樹脂被膜を形成した。上記の
方法で得られた、表面にアルミニウム被膜を有し、前記
アルミニウム被膜表面に、酸化被膜層を介して、ポリイ
ミド樹脂被膜を有する磁石に対し、実験例1と同一条件
の耐食性加速試験を行った。その結果、試験開始から5
00時間経過しても発錆や被膜剥離などは観察されず、
優れた耐食性を示した。また、電気絶縁性を体積抵抗率
(ρ)によって評価したところ、1×1015Ω・cm
以上という優れた値を示した。耐熱性を熱変形温度によ
って評価したところ、280℃以上という優れた値を示
した。Experimental Example 5: 100 magnet body test pieces (apparent capacity 0.35 liters, weight 1.1 kg) and a diameter of 0.
An 8 mm, 1 mm long, short cylindrical aluminum piece (20 liters in apparent capacity, 100 kg in weight) is charged into the processing chamber of a 50 liter vibrating barrel apparatus (total input volume is 30 vol% of the processing chamber volume), and the vibration frequency is 60 Hz. The treatment was performed dry for 7 hours under the condition of a vibration amplitude of 1.8 mm to form an aluminum coating on the magnet surface. The thickness of the obtained aluminum film was 0.2 μm. The magnet with the aluminum coating obtained by the above method is immediately accommodated in the processing chamber, and subjected to an oxidation treatment at a temperature of 180 ° C. for 6 minutes under normal pressure with an oxygen concentration of 0.2% (for details, see Table 1). An oxide film layer was formed on the surface of the film. The thickness of the formed oxide film layer was 0.1 μm. For the aluminum-coated magnet having an oxide film layer on the surface obtained by the above method, using the same polyimide resin film forming treatment liquid as used in Experimental Example 1, under the same conditions as in Experimental Example 1,
A polyimide resin film having a thickness of 5 μm was formed. The magnet having the aluminum coating on the surface obtained by the above method and having the polyimide resin coating on the surface of the aluminum coating via the oxide coating layer was subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1. Was. As a result, 5
No rusting or peeling of the coating was observed even after 00 hours,
It showed excellent corrosion resistance. When the electrical insulation was evaluated by volume resistivity (ρ), 1 × 10 15 Ω · cm
The above values were excellent. When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown.
【0045】実験例6:実験例1と同様の方法で得た、
膜厚が1.1μmのアルミニウム被膜付磁石を直ちに処
理室内に収容し、酸素圧10Paの減圧下(詳細は表1
参照)、温度220℃で、15分酸化処理を行い、アル
ミニウム被膜表面に酸化被膜層を形成した。形成された
酸化被膜層の膜厚は0.6μmであった。上記の方法で
得られた、表面に酸化被膜層を有するアルミニウム被膜
付磁石に対し、実験例1で使用したものと同じポリイミ
ド樹脂被膜形成処理液を使用し、実験例1と同じ条件に
て、膜厚が5μmのポリイミド樹脂被膜を形成した。上
記の方法で得られた、表面にアルミニウム被膜を有し、
前記アルミニウム被膜表面に、酸化被膜層を介して、ポ
リイミド樹脂被膜を有する磁石に対し、実験例1と同一
条件の耐食性加速試験を行った。その結果、試験開始か
ら500時間経過しても発錆や被膜剥離などは観察され
ず、優れた耐食性を示した。また、電気絶縁性を体積抵
抗率(ρ)によって評価したところ、1×1015Ω・
cm以上という優れた値を示した。耐熱性を熱変形温度
によって評価したところ、280℃以上という優れた値
を示した。Experimental Example 6: Obtained in the same manner as in Experimental Example 1,
A magnet with an aluminum coating having a film thickness of 1.1 μm was immediately housed in the processing chamber, and was reduced under an oxygen pressure of 10 Pa (see Table 1 for details).
Oxidized at a temperature of 220 ° C. for 15 minutes to form an oxide film layer on the surface of the aluminum film. The film thickness of the formed oxide film layer was 0.6 μm. For the aluminum-coated magnet having an oxide film layer on the surface obtained by the above method, using the same polyimide resin film forming treatment liquid as used in Experimental Example 1, under the same conditions as in Experimental Example 1, A polyimide resin film having a thickness of 5 μm was formed. Having an aluminum coating on the surface obtained by the above method,
A magnet having a polyimide resin film on the surface of the aluminum film via an oxide film layer was subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1. As a result, no rusting or peeling of the film was observed even after 500 hours from the start of the test, indicating excellent corrosion resistance. In addition, when the electrical insulation was evaluated by volume resistivity (ρ), 1 × 10 15 Ω ·
cm or more. When the heat resistance was evaluated by the heat distortion temperature, an excellent value of 280 ° C. or more was shown.
【0046】[0046]
【表1】 [Table 1]
【0047】比較例1:磁石体試験片に対し、実験例1
と同一条件でスパッタリングを行い、磁石表面を清浄化
した。次に、実験例1と同一条件でアークイオンプレー
ティングを行い、磁石表面にアルミニウム被膜を形成
し、放冷した。得られたアルミニウム被膜の膜厚は1.
5μmであった。次に、アルミニウム被膜表面に酸化被
膜層を形成することなく、実験例1で使用したものと同
じポリイミド樹脂被膜形成処理液を使用し、実験例1と
同じ条件にて、膜厚が5μmのポリイミド樹脂被膜を直
接に形成した。上記の方法で得られた、表面にアルミニ
ウム被膜を有し、前記アルミニウム被膜表面に直接に、
ポリイミド樹脂被膜を有する磁石に対し、実験例1と同
一条件の耐食性加速試験を行った。その結果、試験開始
から150時間で被膜剥離が観察された。Comparative Example 1: Experimental Example 1 for a magnet test piece
Sputtering was performed under the same conditions as described above to clean the magnet surface. Next, arc ion plating was performed under the same conditions as in Experimental Example 1, an aluminum film was formed on the magnet surface, and the magnet was allowed to cool. The thickness of the obtained aluminum coating was 1.
It was 5 μm. Next, without forming an oxide film layer on the surface of the aluminum film, the same polyimide resin film forming treatment solution as used in Experimental Example 1 was used, and a polyimide film having a thickness of 5 μm was formed under the same conditions as in Experimental Example 1. A resin coating was formed directly. Obtained by the above method, having an aluminum coating on the surface, directly on the aluminum coating surface,
A magnet having a polyimide resin film was subjected to an accelerated corrosion resistance test under the same conditions as in Experimental Example 1. As a result, peeling of the film was observed 150 hours after the start of the test.
【0048】比較例2:比較例1において、スプレー法
による塗布と乾燥をもう一度繰り返して行った後に熱処
理を行った以外は比較例と同一条件で、膜厚が10μm
のポリイミド樹脂被膜を形成した。上記の方法で得られ
た、表面にアルミニウム被膜を有し、前記アルミニウム
被膜表面に直接に、ポリイミド樹脂被膜を有する磁石に
対し、実験例1と同一条件の耐食性加速試験を行った。
その結果、試験開始から250時間で被膜剥離が観察さ
れた。Comparative Example 2 A film having a thickness of 10 μm was obtained under the same conditions as in Comparative Example 1 except that heat treatment was performed after coating and drying were repeated once again by the spray method.
Was formed. The magnets having an aluminum coating on the surface and having a polyimide resin coating directly on the surface of the aluminum coating obtained by the above method were subjected to a corrosion resistance acceleration test under the same conditions as in Experimental Example 1.
As a result, film peeling was observed 250 hours after the start of the test.
【0049】実験例7〜実験例12:実験例1〜実験例
6と同様の条件にて磁石体試験片の表面にアルミニウム
被膜を形成し、その表面に酸化被膜層を形成した後、各
実験例におけるポリイミド樹脂被膜形成処理液の調製に
用いたトルエンの代わりにトルエンと酢酸エチルとシク
ロヘキサノンの混合溶媒(容積比65:15:20)を
用いる以外は各実験例と同様の条件、膜厚にて酸化被膜
層表面にポリイミド樹脂被膜を形成した。各サンプルに
対して実験例1と同様の耐食性加速試験、電気絶縁性評
価、耐熱性評価を行ったところ、いずれのサンプルも各
実験例のサンプルと同様の結果を示した。Experimental Examples 7 to 12: Under the same conditions as in Experimental Examples 1 to 6, an aluminum film was formed on the surface of the magnet test piece, and an oxide film layer was formed on the surface. The same conditions and film thicknesses as in each experimental example except that a mixed solvent of toluene, ethyl acetate and cyclohexanone (volume ratio 65:15:20) were used instead of toluene used for preparing the polyimide resin film forming treatment solution in the examples. Thus, a polyimide resin film was formed on the surface of the oxide film layer. Each sample was subjected to the same corrosion resistance acceleration test, electrical insulation evaluation, and heat resistance evaluation as those of Experimental Example 1. As a result, all the samples showed the same results as those of the experimental examples.
【0050】[0050]
【発明の効果】本発明のR−Fe−B系永久磁石表面
に、アルミニウム被膜を有し、前記アルミニウム被膜表
面に、酸化被膜層を介して、ポリイミド樹脂被膜を有す
る永久磁石は、ポリイミド樹脂被膜が、酸化被膜層の存
在によって、アルミニウム被膜表面に強固に密着してお
り、アルミニウム被膜とともに優れた耐食性・電気絶縁
性・耐熱性を発揮する。また、酸化被膜層の上では、ポ
リイミド樹脂被膜形成反応が効率よく進行するので、溶
液法によってもアルミニウム被膜表面に対して優れた密
着性を有するポリイミド樹脂被膜を形成することができ
る。The permanent magnet according to the present invention has an aluminum coating on the surface of the R-Fe-B-based permanent magnet and has a polyimide resin coating on the aluminum coating surface via an oxide coating layer. However, due to the presence of the oxide film layer, it is firmly adhered to the surface of the aluminum film, and exhibits excellent corrosion resistance, electric insulation and heat resistance together with the aluminum film. In addition, since the polyimide resin film forming reaction proceeds efficiently on the oxide film layer, a polyimide resin film having excellent adhesion to the aluminum film surface can be formed by the solution method.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C23C 28/00 C23C 28/00 B H01F 41/02 H01F 41/02 G ──────────────────────────────────────────────────の Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C23C 28/00 C23C 28/00 B H01F 41/02 H01F 41/02 G
Claims (14)
ニウム被膜を有し、前記アルミニウム被膜表面に、酸化
被膜層を介して、ポリイミド樹脂被膜を有することを特
徴とする永久磁石。1. A permanent magnet having an aluminum coating on the surface of an R—Fe—B-based permanent magnet, and a polyimide resin coating on the surface of the aluminum coating via an oxide coating layer.
樹脂被膜であることを特徴とする請求項1記載の永久磁
石。2. The permanent magnet according to claim 1, wherein the polyimide resin film is an addition type polyimide resin film.
ナジイミドから得られる被膜であることを特徴とする請
求項2記載の永久磁石。3. The permanent magnet according to claim 2, wherein the addition type polyimide resin film is a film obtained from bisallylnadiimide.
〜50μmであることを特徴とする請求項1乃至3のい
ずれかに記載の永久磁石。4. The thickness of the aluminum film is 0.01 μm.
The permanent magnet according to any one of claims 1 to 3, wherein the thickness of the permanent magnet is from 50 to 50 m.
mであることを特徴とする請求項1乃至4のいずれかに
記載の永久磁石。5. The oxide film layer has a thickness of 0.01 μm to 2 μm.
The permanent magnet according to any one of claims 1 to 4, wherein m is m.
5μmであることを特徴とする請求項1乃至5のいずれ
かに記載の永久磁石。6. The polyimide resin film has a thickness of 1 μm to 1 μm.
The permanent magnet according to any one of claims 1 to 5, wherein the permanent magnet has a thickness of 5 µm.
ニウム被膜を形成した後、前記アルミニウム被膜表面
に、酸素雰囲気中での酸化処理によって酸化被膜層を形
成し、前記酸化被膜層表面に、ポリイミド樹脂被膜形成
処理液を塗布し、熱処理することによってポリイミド樹
脂被膜を形成することを特徴とする永久磁石の製造方
法。7. After forming an aluminum film on the surface of the R—Fe—B permanent magnet, an oxide film layer is formed on the surface of the aluminum film by an oxidation treatment in an oxygen atmosphere. A method for manufacturing a permanent magnet, comprising forming a polyimide resin film by applying a polyimide resin film forming treatment liquid and performing heat treatment.
形成することを特徴とする請求項7記載の製造方法。8. The method according to claim 7, wherein the aluminum film is formed by a vapor growth method.
ニウム被膜を形成することを特徴とする請求項8記載の
製造方法。9. The method according to claim 8, wherein an aluminum film having a thickness of 0.01 μm to 50 μm is formed.
ム片を処理容器内に入れ、前記処理容器内にて、両者に
振動を加え、および/または両者を攪拌することによっ
てアルミニウム被膜を形成することを特徴とする請求項
7記載の製造方法。10. An R—Fe—B-based permanent magnet and an aluminum piece are placed in a processing container, and both are vibrated and / or agitated to form an aluminum coating in the processing container. The method according to claim 7, wherein:
ニウム被膜を形成することを特徴とする請求項10記載
の製造方法。11. The method according to claim 10, wherein an aluminum film having a thickness of 0.01 μm to 1 μm is formed.
度が0.01%〜20%の常圧下、または酸素圧(分
圧)が0.1Pa〜2×104Paの減圧下、10℃〜
500℃にて行うことを特徴とする請求項7乃至11の
いずれかに記載の製造方法。12. The oxidation treatment in an oxygen atmosphere is carried out under normal pressure with an oxygen concentration of 0.01% to 20% or under reduced pressure with an oxygen pressure (partial pressure) of 0.1 Pa to 2 × 10 4 Pa. ° C ~
The method according to claim 7, wherein the method is performed at 500 ° C. 12.
ド樹脂被膜であることを特徴とする請求項7乃至12の
いずれかに記載の製造方法。13. The method according to claim 7, wherein the polyimide resin film is an addition type polyimide resin film.
ルナジイミドから得られる被膜であることを特徴とする
請求項13記載の製造方法。14. The production method according to claim 13, wherein the addition type polyimide resin film is a film obtained from bisallylnadiimide.
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JP2010245394A (en) * | 2009-04-08 | 2010-10-28 | Hitachi Metals Ltd | METHOD OF IMPROVING SALINE WATER RESISTANCE OF RARE EARTH-BASED PERMANENT MAGNET HAVING VAPOR-DEPOSITED Al FILM CONTAINING Mg ON SURFACE |
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JPH08279407A (en) * | 1995-02-07 | 1996-10-22 | Sumitomo Special Metals Co Ltd | R-fe-b permanent magnet being excellent in electrical insulating properties, heat resistance and corrosion resistance and manufacture thereof |
JPH09111182A (en) * | 1995-10-23 | 1997-04-28 | Daido Steel Co Ltd | Electronic part coated with insulating film and method of coating thereof |
JPH09246027A (en) * | 1996-03-08 | 1997-09-19 | Sumitomo Special Metals Co Ltd | R-fe-b based permanent magnet excellent in resistance to salt water |
JPH10326552A (en) * | 1997-05-26 | 1998-12-08 | Matsushita Electric Works Ltd | Surface treatment film for high withstand voltage, and relay iron core provided with this film |
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Cited By (11)
Publication number | Priority date | Publication date | Assignee | Title |
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JP2003059741A (en) * | 2001-08-10 | 2003-02-28 | Sumitomo Special Metals Co Ltd | Manufacturing method of rare earth-based permanent magnet having deposition film on surface |
WO2003058648A1 (en) * | 2001-12-28 | 2003-07-17 | Shin-Etsu Chemical Co., Ltd. | Rare earth element sintered magnet and method for producing rare earth element sintered magnet |
KR100746897B1 (en) * | 2001-12-28 | 2007-08-07 | 신에쓰 가가꾸 고교 가부시끼가이샤 | Rare earth element sintered magnet and method for producing rare earth element sintered magnet |
US7438768B2 (en) | 2001-12-28 | 2008-10-21 | Shin-Etsu Chemical Co., Ltd. | Rare earth element sintered magnet and method for producing rare earth element sintered magnet |
JP2010232350A (en) * | 2009-03-26 | 2010-10-14 | Hitachi Metals Ltd | Method for manufacturing rare-earth permanent magnet excellent in salt water resistance |
JP2010245394A (en) * | 2009-04-08 | 2010-10-28 | Hitachi Metals Ltd | METHOD OF IMPROVING SALINE WATER RESISTANCE OF RARE EARTH-BASED PERMANENT MAGNET HAVING VAPOR-DEPOSITED Al FILM CONTAINING Mg ON SURFACE |
CN102041506A (en) * | 2009-10-13 | 2011-05-04 | 北京中科三环高技术股份有限公司 | Surface treatment method of permanent magnet material |
WO2011162281A1 (en) * | 2010-06-25 | 2011-12-29 | 日本電気株式会社 | Communications device and production method for communications device case |
JPWO2011162281A1 (en) * | 2010-06-25 | 2013-08-22 | 日本電気株式会社 | Communication device and method for manufacturing communication device casing |
JP2013162664A (en) * | 2012-02-07 | 2013-08-19 | Kayaba Ind Co Ltd | Electric motor |
JP7547815B2 (en) | 2020-07-07 | 2024-09-10 | 株式会社レゾナック | Molded member and actuator |
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