JP2001133979A5 - - Google Patents
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- Publication number
- JP2001133979A5 JP2001133979A5 JP2000249269A JP2000249269A JP2001133979A5 JP 2001133979 A5 JP2001133979 A5 JP 2001133979A5 JP 2000249269 A JP2000249269 A JP 2000249269A JP 2000249269 A JP2000249269 A JP 2000249269A JP 2001133979 A5 JP2001133979 A5 JP 2001133979A5
- Authority
- JP
- Japan
- Prior art keywords
- polymer compound
- resist material
- group
- compound according
- acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000001875 compounds Chemical class 0.000 claims description 11
- 239000002253 acid Substances 0.000 claims description 9
- 239000000463 material Substances 0.000 claims description 8
- 229920000642 polymer Polymers 0.000 claims description 8
- 238000010438 heat treatment Methods 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 125000004432 carbon atom Chemical group C* 0.000 claims description 3
- 125000006165 cyclic alkyl group Chemical group 0.000 claims description 3
- 229910052731 fluorine Inorganic materials 0.000 claims description 3
- 125000001153 fluoro group Chemical group F* 0.000 claims description 3
- 125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 3
- 125000002023 trifluoromethyl group Chemical group FC(F)(F)* 0.000 claims description 3
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical class CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 claims description 2
- 150000001252 acrylic acid derivatives Chemical class 0.000 claims description 2
- 150000007514 bases Chemical class 0.000 claims description 2
- 239000003431 cross linking reagent Substances 0.000 claims description 2
- 238000004090 dissolution Methods 0.000 claims description 2
- 238000010894 electron beam technology Methods 0.000 claims description 2
- 239000003112 inhibitor Substances 0.000 claims description 2
- 238000000034 method Methods 0.000 claims description 2
- 229920002120 photoresistant polymer Polymers 0.000 claims description 2
- 239000000758 substrate Substances 0.000 claims description 2
- 239000000126 substance Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2000249269A JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11-238793 | 1999-08-25 | ||
| JP23879399 | 1999-08-25 | ||
| JP2000249269A JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001133979A JP2001133979A (ja) | 2001-05-18 |
| JP2001133979A5 true JP2001133979A5 (enrdf_load_stackoverflow) | 2004-10-28 |
| JP3915870B2 JP3915870B2 (ja) | 2007-05-16 |
Family
ID=26533898
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2000249269A Expired - Lifetime JP3915870B2 (ja) | 1999-08-25 | 2000-08-21 | 高分子化合物、化学増幅レジスト材料及びパターン形成方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3915870B2 (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6461789B1 (en) * | 1999-08-25 | 2002-10-08 | Shin-Etsu Chemical Co., Ltd. | Polymers, chemical amplification resist compositions and patterning process |
| EP1275666A4 (en) | 2000-04-04 | 2007-10-24 | Daikin Ind Ltd | NEW FLUOROPOLYMER WITH ACID-ACTIVE GROUP AND CHEMICALLY REINFORCED PHOTORESIST COMPOSITIONS THAT CONTAIN THEM |
| DE60108874T2 (de) | 2000-06-13 | 2005-12-29 | Asahi Glass Co., Ltd. | Resistzusammensetzung |
| EP1302813A4 (en) * | 2000-06-21 | 2005-02-23 | Asahi Glass Co Ltd | RESIST COMPOSITION |
| JP4449176B2 (ja) * | 2000-06-30 | 2010-04-14 | 住友化学株式会社 | 化学増幅型レジスト組成物 |
| JP3945200B2 (ja) * | 2001-09-27 | 2007-07-18 | 信越化学工業株式会社 | 化学増幅レジスト材料及びパターン形成方法 |
| JP2003140345A (ja) * | 2001-11-02 | 2003-05-14 | Fuji Photo Film Co Ltd | ポジ型レジスト組成物 |
| US6723488B2 (en) * | 2001-11-07 | 2004-04-20 | Clariant Finance (Bvi) Ltd | Photoresist composition for deep UV radiation containing an additive |
| KR100498464B1 (ko) * | 2002-11-22 | 2005-07-01 | 삼성전자주식회사 | 불소 함유 감광성 폴리머, 이를 포함하는 레지스트 조성물및 레지스트 조성물을 이용한 패턴 형성 방법 |
| JP4222850B2 (ja) | 2003-02-10 | 2009-02-12 | Ｓｐａｎｓｉｏｎ Ｊａｐａｎ株式会社 | 感放射線性樹脂組成物、その製造法並びにそれを用いた半導体装置の製造方法 |
| JP5750476B2 (ja) * | 2013-07-22 | 2015-07-22 | 東京応化工業株式会社 | レジストパターン形成方法 |
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2000
- 2000-08-21 JP JP2000249269A patent/JP3915870B2/ja not_active Expired - Lifetime