JP2001127145A5 - - Google Patents

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Publication number
JP2001127145A5
JP2001127145A5 JP2000182463A JP2000182463A JP2001127145A5 JP 2001127145 A5 JP2001127145 A5 JP 2001127145A5 JP 2000182463 A JP2000182463 A JP 2000182463A JP 2000182463 A JP2000182463 A JP 2000182463A JP 2001127145 A5 JP2001127145 A5 JP 2001127145A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2000182463A
Other versions
JP2001127145A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2000182463A priority Critical patent/JP2001127145A/ja
Priority claimed from JP2000182463A external-priority patent/JP2001127145A/ja
Priority to EP00307078A priority patent/EP1077393A2/en
Priority to US09/640,724 priority patent/US6809802B1/en
Publication of JP2001127145A publication Critical patent/JP2001127145A/ja
Priority to US10/648,479 priority patent/US6762826B2/en
Publication of JP2001127145A5 publication Critical patent/JP2001127145A5/ja
Withdrawn legal-status Critical Current

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JP2000182463A 1999-08-19 2000-06-19 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイス製造方法 Withdrawn JP2001127145A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2000182463A JP2001127145A (ja) 1999-08-19 2000-06-19 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイス製造方法
EP00307078A EP1077393A2 (en) 1999-08-19 2000-08-18 Substrate attracting and holding system for use in exposure apparatus
US09/640,724 US6809802B1 (en) 1999-08-19 2000-08-18 Substrate attracting and holding system for use in exposure apparatus
US10/648,479 US6762826B2 (en) 1999-08-19 2003-08-27 Substrate attracting and holding system for use in exposure apparatus

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP23212599 1999-08-19
JP11-232125 1999-08-19
JP2000182463A JP2001127145A (ja) 1999-08-19 2000-06-19 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイス製造方法

Publications (2)

Publication Number Publication Date
JP2001127145A JP2001127145A (ja) 2001-05-11
JP2001127145A5 true JP2001127145A5 (ja) 2007-08-16

Family

ID=26530300

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000182463A Withdrawn JP2001127145A (ja) 1999-08-19 2000-06-19 基板吸着保持方法、基板吸着保持装置および該基板吸着保持装置を用いた露光装置ならびにデバイス製造方法

Country Status (1)

Country Link
JP (1) JP2001127145A (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7559012B2 (ja) 2018-02-20 2024-10-01 アプライド マテリアルズ インコーポレイテッド 両面処理のためのパターニングされた真空チャック

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI275913B (en) * 2003-02-12 2007-03-11 Asml Netherlands Bv Lithographic apparatus and method to detect correct clamping of an object
KR100997980B1 (ko) 2003-06-10 2010-12-02 삼성전자주식회사 노광방법
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7636999B2 (en) * 2005-01-31 2009-12-29 Molecular Imprints, Inc. Method of retaining a substrate to a wafer chuck
JP4845564B2 (ja) * 2006-03-31 2011-12-28 株式会社東芝 パターン転写方法
WO2007126767A2 (en) * 2006-04-03 2007-11-08 Molecular Imprints, Inc. Chucking system comprising an array of fluid chambers
JP2008117986A (ja) * 2006-11-07 2008-05-22 Shinko Electric Co Ltd ロードポート
US8446566B2 (en) 2007-09-04 2013-05-21 Asml Netherlands B.V. Method of loading a substrate on a substrate table and lithographic apparatus and device manufacturing method
US9013682B2 (en) 2007-06-21 2015-04-21 Asml Netherlands B.V. Clamping device and object loading method
KR20120059630A (ko) * 2007-06-21 2012-06-08 에이에스엠엘 네델란즈 비.브이. 기판 테이블 상에 기판을 적재하는 방법, 디바이스 제조 방법, 컴퓨터 프로그램물, 데이터 캐리어 및 장치
TWI424516B (zh) * 2007-10-10 2014-01-21 Asml Netherlands Bv 放置基板之方法、傳送基板之方法、支撐系統及微影投影裝置
JP2010034243A (ja) * 2008-07-28 2010-02-12 Canon Inc 基板保持装置、露光装置およびデバイス製造方法
JP5470601B2 (ja) * 2009-03-02 2014-04-16 新光電気工業株式会社 静電チャック
US8913230B2 (en) * 2009-07-02 2014-12-16 Canon Nanotechnologies, Inc. Chucking system with recessed support feature
JP6236256B2 (ja) * 2013-08-30 2017-11-22 日本特殊陶業株式会社 真空吸着装置および真空吸着方法
JP6975601B2 (ja) * 2017-09-26 2021-12-01 日本特殊陶業株式会社 基板保持部材および基板保持方法
JP7071089B2 (ja) * 2017-10-31 2022-05-18 キヤノン株式会社 保持装置、保持方法、リソグラフィ装置および、物品の製造方法
JP7145212B2 (ja) * 2017-11-10 2022-09-30 アプライド マテリアルズ インコーポレイテッド 両面処理のためのパターニングされたチャック
US11205978B2 (en) * 2018-12-14 2021-12-21 Applied Materials, Inc. Handling and processing double-sided devices on fragile substrates
CN113488404B (zh) * 2021-05-30 2023-01-13 深圳市嘉伟亿科技有限公司 一种硅片激光退火定位设备及其使用方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP7559012B2 (ja) 2018-02-20 2024-10-01 アプライド マテリアルズ インコーポレイテッド 両面処理のためのパターニングされた真空チャック

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