JP2001110706A - 照明装置、露光装置、露光方法及びマイクロデバイスの製造方法 - Google Patents

照明装置、露光装置、露光方法及びマイクロデバイスの製造方法

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Publication number
JP2001110706A
JP2001110706A JP28741199A JP28741199A JP2001110706A JP 2001110706 A JP2001110706 A JP 2001110706A JP 28741199 A JP28741199 A JP 28741199A JP 28741199 A JP28741199 A JP 28741199A JP 2001110706 A JP2001110706 A JP 2001110706A
Authority
JP
Japan
Prior art keywords
light
illumination
distribution
light distribution
predetermined
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP28741199A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001110706A5 (enExample
Inventor
Hideki Komatsuda
秀基 小松田
Taro Ogata
太郎 尾形
Yuji Kudo
祐司 工藤
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP28741199A priority Critical patent/JP2001110706A/ja
Publication of JP2001110706A publication Critical patent/JP2001110706A/ja
Publication of JP2001110706A5 publication Critical patent/JP2001110706A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP28741199A 1999-10-07 1999-10-07 照明装置、露光装置、露光方法及びマイクロデバイスの製造方法 Withdrawn JP2001110706A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28741199A JP2001110706A (ja) 1999-10-07 1999-10-07 照明装置、露光装置、露光方法及びマイクロデバイスの製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28741199A JP2001110706A (ja) 1999-10-07 1999-10-07 照明装置、露光装置、露光方法及びマイクロデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2001110706A true JP2001110706A (ja) 2001-04-20
JP2001110706A5 JP2001110706A5 (enExample) 2008-01-24

Family

ID=17716991

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28741199A Withdrawn JP2001110706A (ja) 1999-10-07 1999-10-07 照明装置、露光装置、露光方法及びマイクロデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2001110706A (enExample)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019702A (ja) * 2004-06-04 2006-01-19 Canon Inc 照明光学系及び露光装置
JP2006135325A (ja) * 2004-11-03 2006-05-25 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2011171776A (ja) * 2004-06-04 2011-09-01 Canon Inc 照明光学系及び露光装置
JP2015115423A (ja) * 2013-12-11 2015-06-22 富士通セミコンダクター株式会社 近似光源の設計方法

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006019702A (ja) * 2004-06-04 2006-01-19 Canon Inc 照明光学系及び露光装置
JP2011171776A (ja) * 2004-06-04 2011-09-01 Canon Inc 照明光学系及び露光装置
JP2006135325A (ja) * 2004-11-03 2006-05-25 Asml Netherlands Bv リソグラフィ装置及びデバイス製造方法
JP2015115423A (ja) * 2013-12-11 2015-06-22 富士通セミコンダクター株式会社 近似光源の設計方法

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