JP2001093807A5 - - Google Patents

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Publication number
JP2001093807A5
JP2001093807A5 JP1999267005A JP26700599A JP2001093807A5 JP 2001093807 A5 JP2001093807 A5 JP 2001093807A5 JP 1999267005 A JP1999267005 A JP 1999267005A JP 26700599 A JP26700599 A JP 26700599A JP 2001093807 A5 JP2001093807 A5 JP 2001093807A5
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JP
Japan
Prior art keywords
mark
shots
measurement
measured
focus
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Application number
JP1999267005A
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English (en)
Japanese (ja)
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JP4323636B2 (ja
JP2001093807A (ja
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Application filed filed Critical
Priority to JP26700599A priority Critical patent/JP4323636B2/ja
Priority claimed from JP26700599A external-priority patent/JP4323636B2/ja
Priority to US09/666,483 priority patent/US6639677B1/en
Publication of JP2001093807A publication Critical patent/JP2001093807A/ja
Publication of JP2001093807A5 publication Critical patent/JP2001093807A5/ja
Application granted granted Critical
Publication of JP4323636B2 publication Critical patent/JP4323636B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP26700599A 1999-09-21 1999-09-21 位置計測方法及び位置計測装置 Expired - Fee Related JP4323636B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP26700599A JP4323636B2 (ja) 1999-09-21 1999-09-21 位置計測方法及び位置計測装置
US09/666,483 US6639677B1 (en) 1999-09-21 2000-09-20 Position measuring method and position measuring system using the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP26700599A JP4323636B2 (ja) 1999-09-21 1999-09-21 位置計測方法及び位置計測装置

Publications (3)

Publication Number Publication Date
JP2001093807A JP2001093807A (ja) 2001-04-06
JP2001093807A5 true JP2001093807A5 (enExample) 2006-10-26
JP4323636B2 JP4323636B2 (ja) 2009-09-02

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ID=17438744

Family Applications (1)

Application Number Title Priority Date Filing Date
JP26700599A Expired - Fee Related JP4323636B2 (ja) 1999-09-21 1999-09-21 位置計測方法及び位置計測装置

Country Status (2)

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US (1) US6639677B1 (enExample)
JP (1) JP4323636B2 (enExample)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003324055A (ja) 2002-04-30 2003-11-14 Canon Inc 管理システム及び装置及び方法並びに露光装置及びその制御方法
JP4018438B2 (ja) * 2002-04-30 2007-12-05 キヤノン株式会社 半導体露光装置を管理する管理システム
JP3913151B2 (ja) * 2002-09-10 2007-05-09 キヤノン株式会社 露光装置のパラメータの値を最適化する方法及びシステム、露光装置及び露光方法
JP4227470B2 (ja) 2003-06-18 2009-02-18 キヤノン株式会社 位置検出方法
JP2005045164A (ja) * 2003-07-25 2005-02-17 Toshiba Corp 自動焦点合わせ装置
DE10345466A1 (de) * 2003-09-30 2005-04-28 Infineon Technologies Ag Verfahren zur Erfassung von Plazierungsfehlern von Schaltungsmustern bei der Übertragung mittels einer Maske in Schichten eines Substrats eines Halbleiterwafers
US7112890B2 (en) * 2003-10-30 2006-09-26 Asml Holding N.V. Tunable alignment geometry
US7218399B2 (en) * 2004-01-21 2007-05-15 Nikon Corporation Method and apparatus for measuring optical overlay deviation
US7259828B2 (en) * 2004-05-14 2007-08-21 Asml Netherlands B.V. Alignment system and method and device manufactured thereby
US20060012779A1 (en) * 2004-07-13 2006-01-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP4795300B2 (ja) * 2006-04-18 2011-10-19 キヤノン株式会社 位置合わせ方法、インプリント方法、位置合わせ装置、インプリント装置、及び位置計測方法
NL1036559A1 (nl) * 2008-03-12 2009-09-15 Asml Netherlands Bv Lithographic Apparatus and Method.
JP2014072313A (ja) * 2012-09-28 2014-04-21 Toshiba Corp アライメント計測システム、重ね合わせ計測システム及び半導体装置の製造方法
JP2018185452A (ja) * 2017-04-27 2018-11-22 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6522386B1 (en) * 1997-07-24 2003-02-18 Nikon Corporation Exposure apparatus having projection optical system with aberration correction element
WO1999040613A1 (en) * 1998-02-09 1999-08-12 Nikon Corporation Method of adjusting position detector
US6396569B2 (en) * 1999-09-02 2002-05-28 Texas Instruments Incorporated Image displacement test reticle for measuring aberration characteristics of projection optics
US6542221B1 (en) * 1999-11-24 2003-04-01 Texas Instruments Incorporated Integrated circuit system with automated best focus determination based on change in alignment due to predictable pattern degradation

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