JP2001092103A - フォトマスクの製造方法及び装置、並びにデバイスの製造方法 - Google Patents

フォトマスクの製造方法及び装置、並びにデバイスの製造方法

Info

Publication number
JP2001092103A
JP2001092103A JP35667997A JP35667997A JP2001092103A JP 2001092103 A JP2001092103 A JP 2001092103A JP 35667997 A JP35667997 A JP 35667997A JP 35667997 A JP35667997 A JP 35667997A JP 2001092103 A JP2001092103 A JP 2001092103A
Authority
JP
Japan
Prior art keywords
pattern
photomask
substrate
parent
mask
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP35667997A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001092103A5 (enrdf_load_stackoverflow
Inventor
Nobutaka Umagome
伸貴 馬込
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP35667997A priority Critical patent/JP2001092103A/ja
Priority to TW087121685A priority patent/TW449672B/zh
Priority to PCT/JP1998/005912 priority patent/WO1999034255A1/ja
Priority to KR10-2000-7007029A priority patent/KR100536781B1/ko
Priority to AU16893/99A priority patent/AU1689399A/en
Priority to EP98961560A priority patent/EP1043625A4/en
Publication of JP2001092103A publication Critical patent/JP2001092103A/ja
Priority to US10/195,425 priority patent/US6677088B2/en
Publication of JP2001092103A5 publication Critical patent/JP2001092103A5/ja
Withdrawn legal-status Critical Current

Links

Landscapes

  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP35667997A 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法 Withdrawn JP2001092103A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP35667997A JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法
TW087121685A TW449672B (en) 1997-12-25 1998-12-24 Process and apparatus for manufacturing photomask and method of manufacturing the same
PCT/JP1998/005912 WO1999034255A1 (fr) 1997-12-25 1998-12-25 Procede et appareil de fabrication de photomasque et procede de fabrication de l'appareil
KR10-2000-7007029A KR100536781B1 (ko) 1997-12-25 1998-12-25 포토마스크의 제조방법과 장치 및 디바이스의 제조방법
AU16893/99A AU1689399A (en) 1997-12-25 1998-12-25 Method and apparatus for manufacturing photomask and method of fabricating device
EP98961560A EP1043625A4 (en) 1997-12-25 1998-12-25 METHOD AND APPARATUS FOR MANUFACTURING PHOTOMASK AND METHOD FOR MANUFACTURING THE APPARATUS
US10/195,425 US6677088B2 (en) 1997-12-25 2002-07-16 Photomask producing method and apparatus and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP35667997A JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2001092103A true JP2001092103A (ja) 2001-04-06
JP2001092103A5 JP2001092103A5 (enrdf_load_stackoverflow) 2005-07-28

Family

ID=18450248

Family Applications (1)

Application Number Title Priority Date Filing Date
JP35667997A Withdrawn JP2001092103A (ja) 1997-12-25 1997-12-25 フォトマスクの製造方法及び装置、並びにデバイスの製造方法

Country Status (1)

Country Link
JP (1) JP2001092103A (enrdf_load_stackoverflow)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112578638A (zh) * 2019-09-29 2021-03-30 芯恩（青岛）集成电路有限公司 一种光刻方法、光刻装置及计算机可读存储介质

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN112578638A (zh) * 2019-09-29 2021-03-30 芯恩（青岛）集成电路有限公司 一种光刻方法、光刻装置及计算机可读存储介质
CN112578638B (zh) * 2019-09-29 2022-07-01 芯恩（青岛）集成电路有限公司 一种光刻方法、光刻装置及计算机可读存储介质

Similar Documents

Publication Publication Date Title
US6677088B2 (en) Photomask producing method and apparatus and device manufacturing method
US6337162B1 (en) Method of exposure, photomask, method of production of photomask, microdevice, and method of production of microdevice
US6710847B1 (en) Exposure method and exposure apparatus
US6842225B1 (en) Exposure apparatus, microdevice, photomask, method of exposure, and method of production of device
US6841323B2 (en) Mask producing method
US20010055733A1 (en) Exposure method and exposure apparatus
KR100548713B1 (ko) 디바이스제조방법, 이것에 의하여 제조된 디바이스 및상기 방법에 사용하기 위한 마스크
JP2000012453A (ja) 露光装置及びその使用方法、露光方法、並びにマスクの製造方法
JPH11194479A (ja) フォトマスクの製造方法及び装置
JP4058405B2 (ja) デバイス製造方法およびこの方法により製造したデバイス
JP2008263194A (ja) 露光装置、露光方法、および電子デバイス製造方法
JP2000029202A (ja) マスクの製造方法
US6172740B1 (en) Projection exposure apparatus and device manufacturing method
US6265137B1 (en) Exposure method and device producing method using the same
JP2000047390A (ja) 露光装置およびその製造方法
JPH10189443A (ja) 位置検出用マーク、マーク検出方法及びその装置並びに露光装置
KR100522390B1 (ko) 디바이스제조방법, 이에 의하여 제조된 디바이스 및 컴퓨터 프로그램을 기록한 컴퓨터로 읽을 수 있는 기록매체
JPWO2004066371A1 (ja) 露光装置
JPH11176726A (ja) 露光方法、該方法を使用するリソグラフィシステム、及び前記方法を用いるデバイスの製造方法
JP3092732B2 (ja) 投影露光装置及び投影露光方法
JP2001092103A (ja) フォトマスクの製造方法及び装置、並びにデバイスの製造方法
JP2004311896A (ja) 露光方法及び装置、デバイス製造方法、並びにマスク
JP2001092104A (ja) フォトマスクの製造方法、及びデバイスの製造方法
JP2023180035A (ja) 露光装置、露光方法及び物品の製造方法
JPH05216209A (ja) フォトマスク

Legal Events

Date Code Title Description
A621 Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621

Effective date: 20041210

A521 Written amendment

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20041220

A761 Written withdrawal of application

Free format text: JAPANESE INTERMEDIATE CODE: A761

Effective date: 20061005