JP2001091917A - Method and device for treating substrate - Google Patents

Abstract

PROBLEM TO BE SOLVED: To decrease the footprints of a treating device which continuously executes plural treating stages. SOLUTION: This device is provided with plural treating vessels (A1), (A2), (A3), (B1), (B2) and (B3) which accept substrates (1) therein and subject the substrates to various kinds of treatment. The treating vessels are dispersed to respective treating vessel groups (A) and (B) and are arrayed in three stages in such a manner that the continuous treatments are executed in the treating vessels of the opposite treating vessel groups (A) and (B). Transporting vessels (C) having transporting vessels (C1), (C2) and (C3) are parallel movably disposed between the treating vessel groups (A) and (B). The treating vessels and transporting vessel described above are internally provided with rollers (7),..., (11)... in such a manner that the substrates (1) are made to travel leftward or rightward. The substrates (1) taken out of a loader cassette (2) are alternately transported to the treating vessel group (A) and the treating vessel group (B), are subjected to various kinds of the treatments and are housed into an underloader cassette (3).

Description

DETAILED DESCRIPTION OF THE INVENTION

[0001]

BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method and apparatus for processing a substrate, and more particularly to a method and apparatus for cleaning, etching, and resist stripping a glass substrate in a process of manufacturing a liquid crystal display or the like. is there.

[0002]

2. Description of the Related Art In the production of liquid crystal displays, for example, a TFT (thin film transistor) type color LCD (liquid crystal display) is manufactured by bonding a TFT array substrate and a color filter. The filter is made by performing various processes on a glass substrate. That is, the color filter cleans the glass substrate, applies a color resist, exposes, develops,
After firing, this process is repeated three times for R (red), G (green), and B (blue), followed by washing, applying an overcoat material, and firing. In addition, the array substrate, after cleaning the glass substrate, forming a film, cleaning, applying a resist,
It is obtained by exposing, developing, baking, etching and stripping the resist. Further, in the step of assembling the panel by laminating the array substrate and the color filter, the array substrate and the color filter are washed, an orientation agent is applied, firing, rubbing, washing, and sealing are performed in a known manner. Processing such as application of a lubricant, application of a spacer, lamination, panel division, liquid crystal injection, injection port sealing, compounding inspection, and polarizing plate attachment are performed. As described above, each processing step is performed continuously.

[0003] The cleaning processes frequently performed in the above manufacturing process include initial receiving cleaning, pre-film formation cleaning, pre-resist cleaning, rubbing cleaning, and finishing cleaning. Although it is slightly different, it is basically a physical cleaning method such as brush, ultrasonic wave, high pressure, etc., a chemical cleaning method such as neutral detergent, organic solvent, light etching, etc., and a dry cleaning such as UV (ultraviolet) cleaning. The cleaning is generally performed by appropriately combining a cleaning brush scrub, a pure water shower, a US (ultrasonic) dip, an MS (megasonic) shower, a pure water shower, a liquid drainer (air knife), and the like. Processing is often performed continuously.

On the other hand, the size of the glass substrate was 300 (320) × 400 mm at the initial stage of the production of liquid crystal, but gradually increased to 360 (370) × 470 mm and 500 (550) × 600 (650)
mm, 650 × 750 mm, etc., in recent years, it has become increasingly larger. Therefore, in an apparatus that performs the above-described various processes on such a large-sized glass substrate, in particular, a process such as cleaning, the processing units in each processing process must be continuously arranged in series. In general, the size of the apparatus tends to increase, and the footprint (occupied floor area) tends to increase.

In the conventional processing apparatus, different processing units are required depending on the processing purpose. However, since a series of processing units are provided continuously, new processing can be added or changed in the middle. The order could not be changed, and a dedicated device had to be prepared each time.

[0006]

The problem to be solved by the present invention is as follows.
When processing a large substrate such as the above glass substrate in the manufacture of a liquid crystal display, a substrate processing method and apparatus capable of reducing a footprint of the apparatus and easily coping with addition, change, replacement, etc. of processing units. It is to provide.

[0007]

According to the present invention, in a substrate processing method for performing a plurality of processes in succession, the processing baths for performing the above-mentioned processes are dispersed and arranged in a group of facing processing baths. The substrate processed in the processing tank of the processing tank group is transported to the processing tank of the other processing tank group opposed thereto, and the processing following the processing in the processing tank of the one processing tank group is performed in the processing tank. A method for processing a substrate is provided, which solves the above-mentioned problem.

Further, according to the present invention, in a substrate processing apparatus for continuously performing a plurality of processes, a plurality of processing tanks for receiving a substrate and performing a continuous process, A pair of processing tank groups in which the plurality of processing tanks are dispersedly arranged in opposing processing tank groups so as to be alternately performed in the processing tanks of the other processing tank group, and from the one processing tank group to the other processing tank There is provided a substrate processing apparatus comprising a transfer means for transferring a substrate to a group, and the above-mentioned problem is solved.

In the present invention, as the substrate transfer means, a transfer tank group moving in parallel between the processing tank groups may be used, or one of the processing tank groups may be moved in parallel with the other processing tank group. The above-mentioned subject is solved by providing a processing method and an apparatus.

[0010]

DETAILED DESCRIPTION OF THE PREFERRED EMBODIMENTS The present invention can be appropriately applied to each processing step for processing a substrate such as a glass substrate. In FIG. 1, the present invention is applied to a step of cleaning a large glass substrate of a liquid crystal display. 1 shows an embodiment to which the invention is applied. As described above, various methods and steps are employed in the cleaning process. In the embodiment shown in FIG. 1, the substrate (1) taken out of the loader cassette (2) is an example.
UV irradiation treatment, pure water or chemical solution shower, pure water or chemical solution jet treatment, megasonic treatment, liquid drainage (air knife) treatment, heat drying treatment, and storage in the unloader cassette (3). The processing is performed continuously.

The processing tank (4) for performing each of the above-mentioned processes has an entrance (5) for the substrate (1) on the side and a door (6) for opening and closing the entrance (5). And a roller (7)... For supporting the right and left rows in the tank. In the figure, driving means such as a motor for rotating the roller (7) clockwise and counterclockwise, and the roller (7) are used.
Although a processing mechanism for performing each of the above-described processes on the substrate on the glass is omitted, well-known appropriate means and mechanisms can be used, and these are provided corresponding to each processing tank.

In the figure, the processing tanks (4) are provided at six locations, and they are arranged in a pair of processing tank groups (A),
(B). This dispersion is based on the fact that the above continuous processing is performed by the processing tanks (A1), (A2), (A) of one of the processing tank groups (A).
3) and the processing tanks (B1), (B2), and (B3) of the other processing tank group (B) are distributed alternately. Further, in the figure, the substrate is configured to move in the horizontal direction and enter and exit the processing tank. Therefore, the processing tank is vertically moved in a multi-stage overlapping direction to reduce the footprint. Although arranged in stages, it can also be arranged in two stages or four or more stages according to the number of processing steps. As described later, the substrate is raised and moved vertically to enter and exit the processing tank. In this case, the processing tanks can be arranged in two rows adjacent to each other in the horizontal direction (FIG. 6).

A transfer means is provided for transferring a substrate processed in one of the processing tank groups to a processing tank in the other processing tank group. As the transfer means, an appropriate robot or the like may be used, but in the figure, a transfer tank group (C) adjacent to the processing tank group is used. The transfer tank group (C) is provided between the processing tank groups (A) and (B), and has a plurality of transfer tanks (8). The transfer tank (8) includes an entrance (9) for the substrate (1), a door (10) for opening and closing the entrance (9), and a roller for the treatment layer in substantially the same manner as the processing tank (4). A roller (11) which receives the substrate (1) sent out by the rotation of (7)...
, And the entire transport tank group (C) is vertically moved in parallel along the processing tank group by an appropriate driving means. In the figure, the transport tank group (C) has three transport tanks (C1), (C2), and (C3) corresponding to the number of stages of the processing tank. Good.

The width of the transfer tank (8) of the transfer tank group (C) is at least large enough to accommodate the substrate (1) in the tank, but is the same as that of the processing tank (4). It may be formed. Therefore, if one of the processing tank groups is provided so as to move in parallel with the other processing tank group as described later, the processing tank group can also serve as a substrate transfer unit without using the transfer tank group. (Figure 5). In this case, the width between the processing tank groups (A) and (B) is set to a width capable of delivering the substrate.

In the embodiment shown in FIG. 1, of the three processing tanks in the processing tank group (A), the lower processing tank (A1) is subjected to ultraviolet (UV) irradiation, and the processing tank ( The arrangement is such that pure water or chemical solution showering, pure water or chemical solution jet treatment is performed in A2), and liquid drainage (air knife) treatment is performed in the treatment tank (A3) above it. In addition, brushing is performed in the processing tank (B1) of the processing tank group (B), megasonic (MS) shower processing is performed in the processing tank (B2) above the processing tank (B1), and further in the processing tank (B3) above the processing tank (B3). It is arranged to perform a heat drying process. Then, the substrate (1) is taken out of the loader cassette (2) by an appropriate means such as a robot, and is loaded into a roller (7) in the processing tank, a roller in the transfer tank.
.. Are moved to the left or right in the horizontal direction, and the substrate (1) is moved up and down in the horizontal direction. 1) is moved up and down in a horizontal state, and each of the above-mentioned processes is performed continuously, and the processed substrate is unloaded into an unloader cassette (3).
Can be stored.

An example of the mode of the above-mentioned processing step will be described below in detail with reference to FIGS. In addition, in FIGS. 2 and 3, each represents a glass substrate. FIG. 2A shows an initial state in which the substrate is located in the loader cassette (2), and the substrate is in the processing tank group (A).
When the substrate is sent to the processing tank (A1), the substrate is subjected to an ultraviolet irradiation treatment in the processing tank (FIG. (B)). At this time, the substrate is located in the loader cassette (2).

When the above-mentioned processing for the substrate is completed, the substrate goes right through the lower transfer tank (C1) of the transfer tank group (C) and goes to the processing tank (B1) of the other processing tank group (B). Transported,
Receive brushing treatment. During this time, the substrate enters the processing tank (A1) and undergoes the above processing, and the substrate waits in the loader cassette (2) (FIG. (C)).

When the brushing of the substrate is completed, the substrate is transported leftward to the transport tank (C1) (FIG. 4 (d)). Then, the transport tank group (C) is raised (see FIG.
(e)), the substrate is moved to the left and carried into the processing tank (A2) of the processing tank group (A) ((f) in the same figure), and then the transfer tank group (C) is lowered (FIG. )). Substrate in processing tank (A2) is pure water shower
And so on.

After the shower processing such as pure water shower processing of the substrate and the ultraviolet irradiation processing of the substrate are completed, each substrate,
Goes to the right through the transport tanks (C2) and (C1), enters the processing tanks (B2) and (B1) of the processing tank group (B), and undergoes megasonic showering and brushing. (h)). During this time, the substrate is sent to the processing tank (A1), and the substrate stands by in the loader cassette (2).

When the megasonic showering process and the substrate brushing process of the substrate are completed, each substrate moves to the left and enters the transport tanks (C2) and (C1) of the transport tank group (C) (FIG. i)) and raise the transfer tank group (C) (see FIG.
(j)), and then move to the left. The treatment tanks (A3),
After entering (A2) ((k) in the figure), the transport tank group (C) descends ((l) in the figure). The substrate is subjected to an air knife process, and the substrate is subjected to a pure water shower process.

When the processing of the substrates is completed, each substrate goes right through the transport tanks (C3), (C2), and (C1), and goes to the processing tanks (B3), (B) of the processing tank group (B). Entering (B2), (B1), the substrate is subjected to the heating and drying treatment, the substrate is subjected to the megasonic showering treatment, the substrate is subjected to the brushing treatment, and the substrate is subjected to the treatment tank.
In (A1), the substrates are on standby in the loader cassette (FIG. 3 (a)).

When the heating and drying process is completed, the substrate is moved rightward and stored in an unloader cassette (3).
Moves to the left after the process is completed, and enters the transport tanks (C2) and (C1).
(b)). Thereafter, the transport tank group (C) rises ((c) in the same figure), and the substrate moves left and enters the processing tanks (A3) and (A2) (the same figure).
(d)). Since this state is almost the same as that of FIG. 2 (k), FIGS. 3 (e) to (l) and FIG.
As shown in (a) to (l), the substrate is continuously loaded.
It can be taken out of the cassette (2), washed and stored in the unloader cassette (3).

In the case where the processing time in each of the above processing steps is greatly different, a plurality of processing tanks for performing the same processing may be provided so as to receive the processing repeatedly, or another substrate may be transported in advance. What is necessary is just to prevent the whole conveyance from being affected. In addition, among the processing tanks, when there is an unnecessary processing, the processing tank may be skipped and the transfer tank group may be moved, and a new processing tank may be added to receive another processing or may be appropriately performed. Can be configured.

In the embodiment shown in FIG. 5, the processing tank group (B) is used.
Is moved in the vertical direction with respect to the other processing tank group (A) in substantially the same manner as the transfer tank group (C), and the processing tank group (B) also serves as the transfer tank group to perform continuous processing. This is an embodiment in which the following is performed. In this case, (a), (b)
And moved as shown in (a) and (b).
(A1) → (B1) → (A2) → (B2) → (A3), and appropriate processing units are distributed and arranged to perform a series of processing on the substrate taken out of the loader cassette (2). Although the substrate is stored in the unloader cassette (3), the unloader cassette (3) may be provided at a lower position shown by a chain line in FIG. To do so, the lower processing tank (B1) of the other processing tank group (B) is placed in the processing tank (B1) so as to receive the substrate after the processing in the processing tank (A3) of the processing tank group (A). Raise the processing tank group (B) to a position facing A3),
After carrying the substrate into the processing tank (B1), the processing tank group (B) is lowered to a position where the processing tank (B1) faces the unloader cassette, and the substrate is processed into the unloader cassette (3). The transported substrate may be transported.

In the above embodiment, the substrate is transported in a horizontal state. However, as shown in FIG. 6, the substrate may be raised and transported in a vertical state to perform various processes. FIG.
Is a plan view showing such an embodiment, in which a processing tank is provided upright and has an entrance (5) for a substrate that opens upward and a door (not shown) that opens and closes the entrance. A processing mechanism (not shown) for performing various types of processing is provided in the tank. Further, the plurality of processing tanks arranged in the processing tank groups (A) and (B) are dispersed so as to alternately perform continuous processing, and the processing tanks (A1), (A2) and (A3) are arranged in a horizontal direction. A processing tank group (B) in which a processing tank group (A) arranged adjacently and a buffer tank (BU) for temporarily storing the processing tanks (B1) and (B2) and a substrate are horizontally arranged. ) And a loader cassette (2)
The substrate (1) taken out from the processing tank (B1) → (A1) → (B2) →
(A2) → (BU) → (A3) → (BU), and a series of processing for storing in the unloader cassette (3) is performed. The buffer tank (BU) may be a processing tank for performing an appropriate process.

A transfer tank group having a plurality of transfer tanks is provided between the processing tank groups (A) and (B) as in the above embodiment, and the substrate is moved in parallel through the transfer tank groups. Alternatively, in the embodiment shown in the figure, the processing tank group (B) is provided so as to be movable in parallel with the processing tank group (A), and the substrate is moved in parallel by the processing tank group (B). is there.
Then, between the processing tank groups (A) and (B), the substrate enters the processing tank of one processing tank group, grips the substrate, takes out the substrate outside the tank, and removes the substrate from the other processing tank group. An appropriate robot (not shown) having a function of moving laterally upward, descending downward, entering a processing tank in the processing tank group, and carrying the substrate into the tank is provided. A plurality of such robots are provided corresponding to each processing tank of the processing tank group (A), the loader cassette (2), and the unloader cassette (3), but one robot needs to be transported. The substrate may be moved to a location to carry the substrate.

In the embodiment shown in FIG. 6, the substrate moves alternately between the processing tank groups (A) and (B), essentially as in the embodiment shown in FIGS. Fig. 6 (a)-(n)
A series of processes are performed in the course shown in FIG. The operation state is essentially the same as that of the above-described embodiment, and the details thereof are omitted.

[0028]

According to the present invention, there is provided a method and an apparatus for processing a substrate configured as described above and performing a plurality of processes continuously.
Performing the above processing in a processing tank, dispersing and arranging the processing tanks in opposing processing tank groups so that continuous processing is alternately performed in one processing tank group and the other processing tank group, and one processing tank Since the substrate processed in the processing tank of the group is carried into the processing tank of the other processing tank group opposed thereto, the processing following the processing in the processing tank of the one processing tank group is performed in the processing tank. A plurality of processing tanks to be processed are combined into a pair of processing tank groups to reduce the footprint of the entire apparatus, and since each processing is independent for each processing tank, the processing tanks can be replaced,
By removing or adding, it is possible to easily cope with various processes, it is possible to transport the substrate without passing through unnecessary processing tanks, it is possible to significantly increase flexibility, The present invention can be suitably applied to a process of cleaning a large glass substrate of a liquid crystal display, a process of other substrates, and a process of various substrates.

[Brief description of the drawings]

FIGS. 1A and 1B show an embodiment of the present invention, wherein FIG. 1A is a front view when a transport tank group is at a lower position, and FIG.

FIG. 2 is an explanatory diagram showing an operation state of the device shown in FIG.

FIG. 3 is an explanatory diagram showing an operation state following the operation of FIG. 2;

FIG. 4 is an explanatory diagram showing an operation state following the operation in FIG. 3;

5A and 5B show other embodiments of the present invention, wherein FIG. 5A is a front view when one processing tank group is at a lower position, and FIG. 5B is a front view when it is at an upper position.

FIG. 6 is an explanatory diagram viewed from a plane showing another embodiment of the present invention.

[Explanation of symbols]

 1 substrate 2 loader cassette 3 unloader cassette 4 processing tank 8 transfer tank A, B processing tank group C transfer tank group A1, A2, A3, B1, B2, B3 processing tank C1, C2, C3 transfer tank

Claims (6)

[Claims] In a method of processing a substrate, wherein a plurality of processes are continuously performed, the processing baths for performing the above-described processes are dispersedly arranged in a group of facing processing baths, and the substrates processed in one of the processing baths of the processing bath group. Wherein the substrate is transported to a processing tank of the other opposite processing tank group, and processing subsequent to the processing in the processing tank of the one processing tank group is performed in the processing tank. 2. The substrate processing method according to claim 1, wherein the transfer of the substrate is performed by a transfer tank group having a plurality of transfer tanks moving in parallel between the processing tank groups. 3. The substrate processing method according to claim 1, wherein the transport of the substrate is performed by moving one processing tank group in parallel with the other processing tank group. 4. In a substrate processing apparatus for continuously performing a plurality of processes, a plurality of processing tanks for receiving a substrate and performing a continuous process, wherein one of the processing tanks in one processing tank group and the other in the other processing tank group. A pair of processing tanks arranged such that the plurality of processing tanks are dispersedly arranged in opposing processing tank groups so as to be alternately performed in the processing tanks, and a substrate is transferred from one of the processing tank groups to the other processing tank group. An apparatus for processing a substrate, comprising a transport unit. 5. A transfer tank group in which a plurality of transfer tanks respectively facing the processing tank are provided between the processing tank groups, and a substrate is stored in the transfer tank from the processing tank, and the substrate is placed between the processing tank groups. The substrate processing apparatus according to claim 4, wherein the substrate is transported by moving the transport tank group in parallel. 6. The substrate processing apparatus according to claim 4, wherein one of the processing tank groups is moved in parallel with the other processing tank group to transfer the substrate.