JP2001085840A - Method for manufacture of multilayer printed wiring board - Google Patents

Method for manufacture of multilayer printed wiring board

Info

Publication number
JP2001085840A
JP2001085840A JP25978399A JP25978399A JP2001085840A JP 2001085840 A JP2001085840 A JP 2001085840A JP 25978399 A JP25978399 A JP 25978399A JP 25978399 A JP25978399 A JP 25978399A JP 2001085840 A JP2001085840 A JP 2001085840A
Authority
JP
Japan
Prior art keywords
insulating resin
resin layer
layer
via hole
circuit
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP25978399A
Other languages
Japanese (ja)
Inventor
Naoki Yoneda
直樹 米田
Katsuto Murata
勝人 邑田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Taiyo Holdings Co Ltd
Original Assignee
Taiyo Ink Mfg Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Taiyo Ink Mfg Co Ltd filed Critical Taiyo Ink Mfg Co Ltd
Priority to JP25978399A priority Critical patent/JP2001085840A/en
Publication of JP2001085840A publication Critical patent/JP2001085840A/en
Withdrawn legal-status Critical Current

Links

Abstract

PROBLEM TO BE SOLVED: To improve adhesion between conductor circuit layers and an insulating resin layer having openings formed as via holes and to thereby ensure stable peel strength, by irradiating the surface of the insulating resin layer with short-wavelength UV rays. SOLUTION: Firstly, an insulating resin layer is formed on an insulating substrate having a first circuit layer formed thereon. Next, an opening is formed in the insulating resin layer as a via hole for electrical interconnection of the first circuit layer with a second circuit layer. Subsequently, the surface of the resultant insulating resin layer is roughened using a roughening agent after or before being irradiated with short-wavelength UV rays. Then, the insulating resin layer is plated, and the second circuit layer and the via hole is formed, for interlayer connection of the first and second circuit layers through the via hole. The steps, the formation of the insulating resin layer and the opening, irradiation of the insulating resin layer with the UV rays and its roughening, and the formation of the circuit layers are repeated as required.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は多層プリント配線板
の製造方法に関し、特に粗化ムラに起因する導体のピー
ル強度の低下を防止し、信頼性に優れた多層プリント配
線板を製造する方法について提案する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for manufacturing a multilayer printed wiring board, and more particularly to a method for manufacturing a multilayer printed wiring board having excellent reliability by preventing a reduction in peel strength of a conductor due to unevenness in roughness. suggest.

【0002】[0002]

【従来の技術】多層プリント配線板を製造する方法とし
て、従来、内層回路板の表面にプリプレグを介して銅箔
を重ね、熱板プレスにて加熱一体成形する、いわゆるシ
ーケンシャル積層法という技術が知られている。しか
し、このシーケンシャル積層法では、ガラス布等の基材
にエポキシ樹脂等を含浸してプリプレグを作成するため
に厚みを薄くするには限界があり、多層プリント配線板
の高密度化や薄型化に対応できなくなってきた。
2. Description of the Related Art As a method of manufacturing a multilayer printed wiring board, there is conventionally known a technique called a so-called sequential lamination method in which a copper foil is laminated on a surface of an inner layer circuit board via a prepreg, and integrally formed by heating with a hot plate press. Have been. However, in this sequential lamination method, there is a limit in reducing the thickness in order to make a prepreg by impregnating a base material such as a glass cloth with an epoxy resin or the like. I can no longer respond.

【0003】これに対し最近では、多層プリント配線板
の高密度化・薄型化に対応するために、熱板プレスによ
る加熱加圧成形を行わず、しかも層間絶縁材料にガラス
クロスを用いない、いわゆるビルドアップ方式による多
層プリント配線板の製造技術が注目を浴びている。
On the other hand, recently, in order to cope with high-density and thinning of a multilayer printed wiring board, so-called hot-press molding by a hot plate press is not performed, and a glass cloth is not used as an interlayer insulating material. 2. Description of the Related Art A technique for manufacturing a multilayer printed wiring board by a build-up method has attracted attention.

【0004】このビルドアップ方式による多層プリント
配線板の製造方法によれば、確かに導体回路層と絶縁樹
脂層とを交互にビルドアップして多層化するので、配線
板の高密度化及び薄型化には充分に対応することができ
る。
According to this method of manufacturing a multilayer printed wiring board by the build-up method, since the conductive circuit layers and the insulating resin layers are alternately built up and multilayered, the wiring board is made denser and thinner. Can be adequately dealt with.

【0005】[0005]

【発明が解決しようとする課題】しかしながら、このビ
ルドアップ方式にて製造した多層プリント配線板は、プ
リプレグを用いて加熱加圧成形することにより製造した
多層プリント配線板よりも一般的に導体のピール強度が
低くなる傾向があり、特に量産時においては、粗化ムラ
によるピール強度の大幅な低下がみられた。このピール
強度の低下は、導体回路の接続信頼性や層間絶縁性の悪
化に大きく影響するという問題があった。
However, multilayer printed wiring boards manufactured by this build-up method generally have conductor peeling more than multilayer printed wiring boards manufactured by heating and pressing using a prepreg. The strength tended to decrease, and particularly during mass production, a significant decrease in peel strength due to roughening unevenness was observed. There is a problem that the decrease in the peel strength greatly affects the connection reliability of the conductor circuit and the deterioration of the interlayer insulation.

【0006】そこで本発明は、こうした問題を解消すべ
くなされたものであり、その主たる目的は導体回路層と
絶縁樹脂層との密着性を改善して安定したピール強度を
確保し得る多層プリント配線板の製造方法を提供するこ
とにある。
Accordingly, the present invention has been made to solve such a problem, and a main object of the present invention is to improve the adhesion between a conductive circuit layer and an insulating resin layer to thereby ensure a stable peel strength. An object of the present invention is to provide a method for manufacturing a plate.

【0007】[0007]

【課題を解決するための手段】発明者らは、上記目的の
実現に向け鋭意研究した結果、以下に示す内容を発明の
要旨構成とする方法に想到した。即ち、前記課題を解決
するために、本発明にかかる多層プリント配線板の製造
方法は、(a)第1の回路層を形成した絶縁基板上に絶縁
樹脂層を形成する工程、(b)前記(a)で形成した絶縁樹脂
層にバイアホール用開口を設ける工程、(c)前記(b)でバ
イアホール用開口を設けた絶縁樹脂層の表面に短波長紫
外線を照射する工程、(d)前記絶縁樹脂層表面を粗化剤
にて粗面化処理する工程、(e)絶縁樹脂層にめっきを施
して第2の回路層及びバイアホールを形成し、当該バイ
アホールにて第1の回路層と第2の回路層の層間接続を
行う工程、を含むことを特徴とする。
Means for Solving the Problems The inventors of the present invention have intensively studied for realizing the above-mentioned object, and as a result, have conceived a method of forming the following contents as the gist of the present invention. That is, in order to solve the above problems, the method for manufacturing a multilayer printed wiring board according to the present invention comprises: (a) a step of forming an insulating resin layer on an insulating substrate on which a first circuit layer is formed; providing a via hole opening in the insulating resin layer formed in (a), (c) irradiating the surface of the insulating resin layer provided with the via hole opening in (b) with a short wavelength ultraviolet ray, (d) A step of roughening the surface of the insulating resin layer with a roughening agent; (e) plating the insulating resin layer to form a second circuit layer and a via hole; Performing a layer connection between the layer and the second circuit layer.

【0008】また他の態様として、本発明にかかる多層
プリント配線板の製造方法は、(a)第1の回路層を形成
した絶縁基板上に絶縁樹脂層を形成する工程、(b)前記
(a)で形成した絶縁樹脂層にバイアホール用開口を設け
る工程、(c)前記(b)でバイアホール用開口を設けた絶縁
樹脂層の表面を粗化剤にて粗面化処理する工程、(d)前
記絶縁樹脂層表面の粗化面に短波長紫外線を照射する工
程、(e)絶縁樹脂層にめっきを施して第2の回路層及び
バイアホールを形成し、当該バイアホールにて第1の回
路層と第2の回路層の層間接続を行う工程、を含むこと
を特徴とする。さらに他の態様として、絶縁樹脂層表面
を粗面化する工程の前後の双方に短波長紫外線を照射す
る工程をいれてもよい。なお、上述した態様において、
短波長紫外線とは150〜280nmの範囲に波長ピー
クを有するものを意味し、特に本発明では短波長紫外線
として低圧水銀灯を用いることが望ましい。
In another aspect, the method of manufacturing a multilayer printed wiring board according to the present invention comprises: (a) forming an insulating resin layer on an insulating substrate having a first circuit layer formed thereon;
(a) providing a via-hole opening in the insulating resin layer formed in (a), (c) roughening the surface of the insulating resin layer provided with the via-hole opening in (b) with a roughening agent (D) irradiating the roughened surface of the insulating resin layer surface with short-wavelength ultraviolet rays, (e) plating the insulating resin layer to form a second circuit layer and a via hole, and using the via hole Making an interlayer connection between the first circuit layer and the second circuit layer. As still another embodiment, a step of irradiating short-wavelength ultraviolet light before and after the step of roughening the surface of the insulating resin layer may be added. In the above-described embodiment,
The short-wavelength ultraviolet ray means one having a wavelength peak in a range of 150 to 280 nm. In the present invention, it is particularly preferable to use a low-pressure mercury lamp as the short-wavelength ultraviolet ray.

【0009】[0009]

【発明の実施の形態】本発明にかかる多層プリント配線
板の製造方法は、絶縁樹脂層表面を粗化剤にて粗面化処
理する前処理として、あるいは後処理として、絶縁樹脂
層の表面あるいは絶縁樹脂層表面の粗化面に短波長紫外
線を照射する工程を経る点に特徴がある。
BEST MODE FOR CARRYING OUT THE INVENTION The method for manufacturing a multilayer printed wiring board according to the present invention is characterized in that the surface of the insulating resin layer or the surface of the insulating resin layer is roughened with a roughening agent. It is characterized in that the roughened surface of the insulating resin layer is subjected to a step of irradiating short-wavelength ultraviolet rays.

【0010】これにより、前処理としては、絶縁樹脂層
表面の粗化処理液との濡れ性が改善され、粗化処理が容
易となり粗化ムラを招くことなく均一な粗化が実現でき
る。一方、後処理としては、絶縁樹脂表面への触媒の吸
着性が改善され、無電解めっき性が向上する。その結
果、安定した導体ピール強度を確保することができる。
さらに短波長紫外線を照射する処理は、例えば絶縁樹脂
層にバイアホール用開口をレーザで孔開け加工する際に
発生するスミアを除去する処理としても有効であり、バ
イアホールを介した導体間の電気的な接続信頼性を高く
維持することができる。
As a result, as a pretreatment, the wettability of the surface of the insulating resin layer with the roughening solution is improved, the roughening process is facilitated, and uniform roughening can be realized without causing unevenness of the roughening. On the other hand, as the post-treatment, the adsorptivity of the catalyst to the insulating resin surface is improved, and the electroless plating property is improved. As a result, stable conductor peel strength can be ensured.
Further, the process of irradiating short-wavelength ultraviolet rays is also effective as a process for removing smear generated when, for example, a via hole is formed in the insulating resin layer with a laser. High connection reliability can be maintained.

【0011】このような絶縁樹脂層の改質は、短波長紫
外線から照射される波長ピーク185nmの紫外線のエ
ネルギー強度が647kJ/molと高く、ほとんどの
分子結合エネルギー(O−H:462.8kJ/mo
l、C−H:413.4kJ/mol、C−C:34
7.7kJ/mol等)よりも高く、絶縁樹脂層表面の
主鎖、側鎖を切断するエネルギーをもっているために行
われる。これに対し、通常使用されている365nmに
波長ピークを有する高圧水銀灯などの長波長紫外線は、
これらの結合を分解、切断するエネルギーをもっていな
いので、絶縁樹脂層の改質は起こらない。
In the modification of the insulating resin layer, the energy intensity of ultraviolet light having a wavelength peak of 185 nm irradiated from short-wave ultraviolet light is as high as 647 kJ / mol, and most of the molecular bond energies (OH: 462.8 kJ / mol) are obtained. mo
1, CH: 413.4 kJ / mol, CC: 34
7.7 kJ / mol or the like) and has energy to cut the main chain and side chains on the surface of the insulating resin layer. In contrast, long-wavelength ultraviolet light such as a high-pressure mercury lamp having a wavelength peak at 365 nm, which is generally used, is
Since there is no energy to decompose and break these bonds, no modification of the insulating resin layer occurs.

【0012】このような短波長紫外線の照射による絶縁
樹脂層の改質は、20〜2000mJ/cm2の強度に
て5〜600秒行うことが望ましい。短波長紫外線の照
射量が多すぎると、絶縁樹脂層のポリマー成分の主鎖、
側鎖の切断が数多く行われるのでポリマーが必要以上に
劣化するおそれがあり、一方照射量が少なすぎると、ポ
リマーの切断が充分に行われないために絶縁樹脂層に対
する上述した粗化処理液との濡れ性や触媒の吸着性の改
善効果が得られないからである。
It is desirable that the modification of the insulating resin layer by irradiation with such short-wavelength ultraviolet rays be performed at an intensity of 20 to 2000 mJ / cm 2 for 5 to 600 seconds. If the irradiation amount of the short-wavelength ultraviolet ray is too large, the main chain of the polymer component of the insulating resin layer,
There is a risk that the polymer will be degraded more than necessary because a number of side chain cuts are performed.On the other hand, if the irradiation amount is too small, the above-described roughening treatment solution for the insulating resin layer will not be sufficiently cut off the polymer. This is because the effect of improving the wettability of the catalyst and the adsorptivity of the catalyst cannot be obtained.

【0013】以下、本発明にかかる多層プリント配線板
の製造方法について具体的に説明する。 (1)まず、第1の回路層を形成した絶縁基板上に絶縁
樹脂層を形成する。ここで、本発明で用いられる絶縁基
板は、プリント配線板の基板として使用できるものであ
れば特に制限はなく、例えば、ガラスエポキシ基板、ポ
リイミド基板、セラミック基板、フェノール樹脂基板、
金属基板等が挙げられる。第1の回路層は、銅張積層板
をエッチングして銅パターンとするか、もしくはレジス
トを介する無電解めっきを施して銅パターンとする方法
で形成される。
Hereinafter, a method for manufacturing a multilayer printed wiring board according to the present invention will be specifically described. (1) First, an insulating resin layer is formed on an insulating substrate on which a first circuit layer has been formed. Here, the insulating substrate used in the present invention is not particularly limited as long as it can be used as a substrate of a printed wiring board, for example, a glass epoxy substrate, a polyimide substrate, a ceramic substrate, a phenol resin substrate,
Metal substrates and the like can be mentioned. The first circuit layer is formed by etching the copper clad laminate to form a copper pattern, or by performing electroless plating via a resist to form a copper pattern.

【0014】絶縁樹脂層は、熱硬化性樹脂、感光性樹
脂、熱可塑性樹脂、又はこれらの樹脂を適宜に組み合わ
せた光硬化熱硬化型樹脂、ならびに海島構造やIPN構
造(相互侵入網目構造)等を有する複合樹脂等を用いて
形成することができる。具体的には、耐熱性、絶縁性及
び耐めっき液性を備えているものであれば特に限定され
るものでなく、例えば、エポキシ樹脂、エポキシアクリ
レート、変性エポキシ樹脂、フェノール樹脂、エポキシ
−PES樹脂複合体等が挙げられる。この絶縁樹脂層
は、例えば、基板上に、絶縁樹脂材料をスクリーン印刷
法やスプレー法、カーテンコート法等の公知慣用の方法
にて塗布乾燥するか、又は絶縁樹脂フィルムをラミネー
トした後、硬化することにより形成することができる。
The insulating resin layer is made of a thermosetting resin, a photosensitive resin, a thermoplastic resin, a photocuring thermosetting resin obtained by appropriately combining these resins, a sea-island structure, an IPN structure (interpenetrating network structure), or the like. It can be formed using a composite resin having the following. Specifically, it is not particularly limited as long as it has heat resistance, insulation properties, and plating solution resistance. For example, epoxy resin, epoxy acrylate, modified epoxy resin, phenol resin, epoxy-PES resin And a complex. The insulating resin layer is, for example, applied on a substrate by a known and common method such as a screen printing method, a spray method, a curtain coating method, or the like, or is dried, or is laminated with an insulating resin film and then cured. Can be formed.

【0015】なお、絶縁樹脂層を形成する前に第1の回
路層間の凹部に絶縁樹脂を埋込み、基板表面を予め平滑
化することができる。これにより、絶縁樹脂層の厚みが
均一となり、その後の工程における信頼性が得られる。
また、この(1)の工程後に、粗化性を良くするために
絶縁樹脂層表面をバフ研磨等で物理研磨する工程を加え
ても良い。この物理研磨では、導体ピール強度の向上と
いう観点から3〜10μmの研磨除去が好ましく、また
平滑性は1〜3μmの凹凸とすることがより好ましい。
Before the formation of the insulating resin layer, the insulating resin is buried in the concave portion between the first circuit layers, so that the surface of the substrate can be smoothed in advance. Thereby, the thickness of the insulating resin layer becomes uniform, and the reliability in the subsequent steps can be obtained.
After the step (1), a step of physically polishing the surface of the insulating resin layer by buffing or the like may be added to improve the roughening property. In this physical polishing, polishing removal of 3 to 10 μm is preferable from the viewpoint of improving conductor peel strength, and smoothness is more preferably unevenness of 1 to 3 μm.

【0016】(2)次に、前記(1)で形成した絶縁樹
脂層に第1の回路層と第2の回路層を電気的に接続する
ためのバイアホールの形成用開口を設ける。ここで、開
口を設ける方法としては、例えば、絶縁樹脂層の材料と
して感光性樹脂を用いる場合にはフォト法が、また熱硬
化性樹脂を用いる場合にはレーザまたはドリルによる穿
孔法が採用される。
(2) Next, an opening for forming a via hole for electrically connecting the first circuit layer and the second circuit layer is provided in the insulating resin layer formed in (1). Here, as a method of providing an opening, for example, when a photosensitive resin is used as a material of the insulating resin layer, a photo method is used, and when a thermosetting resin is used, a laser or drilling method is used. .

【0017】(3)特に本発明では、前記(2)でバイ
アホール形成用開口を穿孔した絶縁樹脂層表面は、短波
長紫外線を照射したのち、若しくは短波長紫外線を照射
する前に粗化剤により粗面化処理が施される。この粗化
剤としては、過マンガン酸カリウム、重クロム酸カリウ
ム、オゾン、塩酸、硫酸、硝酸、フッ化水素酸等の酸化
剤、N−メチル−2−ピロリドン、N,N−ジメチルホ
ルムアミド、ジメチルスルオキシド、メトキシプロパノ
ール、ジメチルホルムアミド(DMF)等の有機溶剤、
水酸化ナトリウム、水酸化カリウム等のアルカリ水溶液
などを用いることができる。例えば粗化剤として酸化剤
を用いる場合、樹脂絶縁層を上記のような有機溶剤で膨
潤させた後、酸化剤によって粗面化処理を行う。この粗
面化処理により、絶縁樹脂層の表層部に存在する微粒状
のゴム成分及び/又は炭酸カルシウムなどのフィラーが
粗化剤に溶出し又は分解し、硬化樹脂絶縁層の表面やバ
イアホール部、スルーホール部の内壁面に凹凸状の粗化
面を容易に形成できると共に、孔明け加工時に発生した
スルーホール部のスミアも同時に除去される(デスミア
処理)。
(3) In particular, in the present invention, the surface of the insulating resin layer in which the opening for forming the via hole is perforated in the above (2) is irradiated with a short-wave ultraviolet ray or before the irradiation with the short-wave ultraviolet ray. Performs a roughening process. Examples of the roughening agent include oxidizing agents such as potassium permanganate, potassium dichromate, ozone, hydrochloric acid, sulfuric acid, nitric acid, hydrofluoric acid, N-methyl-2-pyrrolidone, N, N-dimethylformamide, dimethyl Organic solvents such as sulfoxide, methoxypropanol, dimethylformamide (DMF),
An alkaline aqueous solution such as sodium hydroxide or potassium hydroxide can be used. For example, when an oxidizing agent is used as a roughening agent, the resin insulating layer is swollen with the above organic solvent, and then subjected to a surface roughening treatment with the oxidizing agent. By this surface roughening treatment, fine-grained rubber components and / or fillers such as calcium carbonate present in the surface layer portion of the insulating resin layer are eluted or decomposed into the roughening agent, and the surface of the cured resin insulating layer or the via hole portion In addition, the roughened surface in the form of irregularities can be easily formed on the inner wall surface of the through hole, and the smear of the through hole generated at the time of drilling is also removed at the same time (desmear treatment).

【0018】(4)次に、絶縁樹脂層にめっきを施して
第2の回路層及びバイアホールを形成し、当該バイアホ
ールにて第1の回路層と第2の回路層の層間接続を行
う。ここで、第2の回路層は、めっき等で基板全面に形
成した厚膜導体の不要部分を、例えばエッチングなどに
よって選択的に除去して導体パターンを形成する,いわ
ゆるサブトラクティブ法、又はめっきレジストを介して
無電解めっきによる厚膜の導体を形成する,いわゆるフ
ルアディティブ法、又は無電解めっきによる薄膜の導体
を絶縁樹脂層全面に形成したのちめっきレジストを介し
て電解めっきを行いめっきレジストと不要の無電解めっ
き膜を除去する,いわゆるセミアディティブ法などの既
知の方法にて形成される。なお、銅めっき、ニッケルめ
っき等、金属の種類は特に限定されることなく、通常公
知の無電解めっきや電解めっきが用いられる。
(4) Next, a second circuit layer and a via hole are formed by plating the insulating resin layer, and the first circuit layer and the second circuit layer are connected to each other through the via hole. . Here, the second circuit layer is a so-called subtractive method in which an unnecessary portion of the thick film conductor formed on the entire surface of the substrate by plating or the like is selectively removed by, for example, etching to form a conductor pattern, or a plating resist. A thick-film conductor is formed by electroless plating through a so-called full-additive method, or a thin-film conductor is formed by electroless plating over the entire surface of an insulating resin layer, and then electroplating is performed through a plating resist. Is formed by a known method such as a so-called semi-additive method for removing the electroless plating film. The type of metal such as copper plating and nickel plating is not particularly limited, and generally known electroless plating or electrolytic plating is used.

【0019】(5)さらに必要に応じて、前述した絶縁
樹脂の形成、バイアホール用開口の形成、短波長紫外線
の照射と絶縁樹脂層表面の粗化、回路層の形成の一連の
工程を繰り返すことにより所定の層数を持つ多層プリン
ト配線板が製造される。
(5) If necessary, the above-described series of steps of forming the insulating resin, forming the opening for the via hole, irradiating the short-wavelength ultraviolet ray, roughening the surface of the insulating resin layer, and forming the circuit layer are repeated. Thus, a multilayer printed wiring board having a predetermined number of layers is manufactured.

【0020】このようにして本発明により製造される多
層プリント配線板は、少なくとも絶縁樹脂層と回路層が
交互に積層されてなり、該絶縁樹脂層には開口部が設け
られ、該開口部に形成されるバイアホールを介して上層
と下層の回路層が電気的に接続されているものである。
The multilayer printed wiring board thus manufactured according to the present invention comprises at least an insulating resin layer and a circuit layer alternately laminated, and the insulating resin layer is provided with an opening, and the opening is provided in the opening. The upper and lower circuit layers are electrically connected to each other through via holes formed.

【0021】[0021]

【実施例】以下に実施例及び比較例を示して本発明につ
いて具体的に説明するが、本発明が下記実施例に限定さ
れるものでないことはもとよりである。なお、以下にお
いて「部」とあるのは、特に断りのない限り全て重量基
準である。
EXAMPLES The present invention will be specifically described below with reference to examples and comparative examples, but it is needless to say that the present invention is not limited to the following examples. In the following, “parts” are based on weight unless otherwise specified.

【0022】(実施例1) (1)まず、サブトラクティブ法によりガラスエポキシ
銅張積層板上に第1の回路層を形成した。次いで、この
第1の回路層上に、液状の絶縁樹脂層形成材料をカーテ
ンコーターにて塗布し、110℃×20分で乾燥し15
0℃×30分間で硬化して、厚さが60μmの絶縁樹脂
層を形成した。なお、絶縁樹脂層形成材料の成分組成は
以下のとおりである。
Example 1 (1) First, a first circuit layer was formed on a glass epoxy copper clad laminate by a subtractive method. Next, a liquid insulating resin layer forming material is applied on the first circuit layer with a curtain coater, and dried at 110 ° C. for 20 minutes.
The composition was cured at 0 ° C. for 30 minutes to form an insulating resin layer having a thickness of 60 μm. The component composition of the insulating resin layer forming material is as follows.

【0023】 (絶縁樹脂層形成材料の成分組成) ・エポキシ樹脂(油化シェル(株)製、エピコート1001):100部 ・エポキシ樹脂(油化シェル(株)製、エピコート828) :50部 ・ゴム変性エポキシ樹脂(東都化成(株)、YR−450) :50部 ・イミダゾール系エポキシ硬化剤 (四国化成工業(株)、キュアゾール2MZ−A) :5部 ・フェノール樹脂(明和化成(株)、HF−1) :20部 ・軽質炭酸カルシウム(平均粒径3μm以下) :35部 ・微粉末シリカ(平均粒径1.5μm以下) :15部(Component composition of insulating resin layer forming material) Epoxy resin (Eicoat 1001 manufactured by Yuka Shell Co., Ltd.): 100 parts Epoxy resin (Epicoat 828 manufactured by Yuka Shell Co., Ltd.): 50 parts Rubber-modified epoxy resin (Toto Kasei Co., Ltd., YR-450): 50 parts ・ Imidazole epoxy curing agent (Shikoku Chemicals Co., Ltd., Curesol 2MZ-A): 5 parts ・ Phenol resin (Meiwa Kasei Co., Ltd.) HF-1): 20 parts ・ Light calcium carbonate (average particle size: 3 μm or less): 35 parts ・ Fine powdered silica (average particle size: 1.5 μm or less): 15 parts

【0024】(2)次に、前記(1)で形成した絶縁樹
脂層に、炭酸ガスレーザを用いてバイアホール形成用の
開口を設けた。このときの加工条件は、パルス幅 15
/12/5μS ショット数1/1/1(日立ビアメカ
ニクス(株)製 レーザ加工機LCO−1B21)であ
る。
(2) Next, an opening for forming a via hole was formed in the insulating resin layer formed in the above (1) using a carbon dioxide gas laser. The processing conditions at this time are: pulse width 15
/ 12/5 μS Shot number 1/1/1 (laser processing machine LCO-1B21 manufactured by Hitachi Via Mechanics Co., Ltd.).

【0025】(3)次に、絶縁樹脂層表面に短波長紫外
線として低圧水銀灯を用い、200mW/cm2の強度にて6
0秒間照射した。
(3) Next, a low-pressure mercury lamp is used as the short-wavelength ultraviolet light on the surface of the insulating resin layer, and the intensity is 200 mW / cm 2 .
Irradiated for 0 seconds.

【0026】(4)次に、前記(3)の工程を終えた基
板を、アルカリと溶剤からなる膨潤液(アトテック
(株)製、スエリングディップ セキュリガント P)
に75℃で10分間浸漬して水洗し、次いで、過マンガ
ン酸カリウムからなる粗化剤(アトテック(株)製、コ
ンセントレート コンパクトCP)に75℃で20分間
浸漬して水洗し、さらに、還元液(アトテック(株)
製、リダクション ソリューション セキュリガント
P)に40℃で5分間浸漬して中和し水洗することによ
り、絶縁樹脂層表面を粗化した。
(4) Next, the substrate after the step (3) is replaced with a swelling solution composed of an alkali and a solvent (Swelling Dip Securigant P, manufactured by Atotech Co., Ltd.).
At 75 ° C. for 10 minutes and washed with water, and then immersed in a roughening agent composed of potassium permanganate (concentrate compact CP, manufactured by Atotech Co., Ltd.) at 75 ° C. for 20 minutes, washed with water, and further reduced. Liquid (Atotech Co., Ltd.)
The solution was immersed in Reduction Solution Securiganto P) at 40 ° C. for 5 minutes, neutralized, and washed with water to roughen the surface of the insulating resin layer.

【0027】(5)次に、絶縁樹脂表面を粗面化した基
板に対し、無電解めっき液(アトテック(株)製)に3
5℃で10分間浸漬して無電解めっきを施し、水洗し、
100℃で30分間のアニーリングを行った。ここで得
られた無電解銅めっきの膜厚は0.3μmであった。
(5) Next, the substrate having a roughened insulating resin surface was treated with an electroless plating solution (manufactured by Atotech Co., Ltd.) for 3 hours.
Immerse at 5 ° C for 10 minutes, apply electroless plating, wash with water,
Annealing was performed at 100 ° C. for 30 minutes. The film thickness of the obtained electroless copper plating was 0.3 μm.

【0028】(6)次に、80g/lの硫酸銅溶液を用
いた電解めっきにより厚さ18μmの電解銅めっき層を
形成し、150℃で60分間のアフターベークを行っ
た。
(6) Next, an electrolytic copper plating layer having a thickness of 18 μm was formed by electrolytic plating using an 80 g / l copper sulfate solution, and after-baked at 150 ° C. for 60 minutes.

【0029】(7)次に、所定の回路を形成し得るよう
に銅めっき層上にエッチングレジストを形成し、公知の
方法にて不要の導体をエッチング除去したのち前記レジ
ストを除去し、第2の回路層を得ることにより、多層プ
リント配線板を製造した。
(7) Next, an etching resist is formed on the copper plating layer so that a predetermined circuit can be formed, unnecessary conductors are removed by etching by a known method, and the resist is removed. Thus, a multilayer printed wiring board was manufactured.

【0030】(実施例2) (1)まず、サブトラクティブ法によりガラスエポキシ
銅張積層板上に第1の回路層を形成した。次いで、この
第1の回路層上に、液状の絶縁樹脂層形成材料をカーテ
ンコーターにて塗布し、110℃×20分で乾燥し15
0℃×30分間で硬化して、厚さが65μmの絶縁樹脂
層を形成した。なお、絶縁樹脂層形成材料の成分組成は
実施例1と同様である。
Example 2 (1) First, a first circuit layer was formed on a glass epoxy copper clad laminate by a subtractive method. Next, a liquid insulating resin layer forming material is applied on the first circuit layer with a curtain coater, and dried at 110 ° C. for 20 minutes.
The composition was cured at 0 ° C. for 30 minutes to form an insulating resin layer having a thickness of 65 μm. The composition of the material for forming the insulating resin layer is the same as in Example 1.

【0031】(2)次に、粗化を容易にするために、前
記(1)で形成した絶縁樹脂層表面をバフ(#600,
#1000)にて5μm程度研磨除去し、絶縁樹脂層の
厚さを60μmとした。
(2) Next, in order to facilitate roughening, the surface of the insulating resin layer formed in (1) is buffed (# 600,
In step # 1000), the insulating resin layer was polished and removed by about 5 μm, and the thickness of the insulating resin layer was set to 60 μm.

【0032】(3)次に、バイアホール形成用開口を実
施例1と同様にして形成した。 (4)次に、前記(3)の工程を終えた基板を、アルカ
リと溶剤からなる膨潤液(アトテック(株)製、スエリ
ングディップ セキュリガント P)に75℃で5分間
浸漬して水洗し、次いで、過マンガン酸カリウムからな
る粗化剤(アトテック(株)製、コンセントレート コ
ンパクトCP)に70℃で10分間浸漬して水洗し、さ
らに、還元液(アトテック(株)製、リダクション ソ
リューション セキュリガントP)に40℃で5分間浸
漬して中和し水洗することにより、絶縁樹脂層表面を粗
化した。
(3) Next, an opening for forming a via hole was formed in the same manner as in Example 1. (4) Next, the substrate after the step (3) is immersed in a swelling solution (Swelling Dip Securigant P, manufactured by Atotech Co., Ltd.) composed of an alkali and a solvent at 75 ° C. for 5 minutes and washed with water, Then, it is immersed in a roughening agent composed of potassium permanganate (Concentrate Compact CP, manufactured by Atotech Co., Ltd.) for 10 minutes at 70 ° C., washed with water, and further reduced with a reducing solution (Reduction Solution Securigant, manufactured by Atotech Co., Ltd.). The surface of the insulating resin layer was roughened by immersing in P) at 40 ° C. for 5 minutes to neutralize and wash with water.

【0033】(5)次に、絶縁樹脂層表面に短波長紫外
線として低圧水銀灯を用い、200mJ/cm2の強度にて6
0秒間照射した。
(5) Next, a low-pressure mercury lamp was used as the short-wavelength ultraviolet light on the surface of the insulating resin layer at a strength of 200 mJ / cm 2 .
Irradiated for 0 seconds.

【0034】(6)以下、実施例1と同様にして無電解
銅めっき、電解銅めっきを行い、第2の回路層を形成し
て、多層プリント配線板を製造した。
(6) Thereafter, electroless copper plating and electrolytic copper plating were performed in the same manner as in Example 1 to form a second circuit layer, and a multilayer printed wiring board was manufactured.

【0035】(比較例1)絶縁樹脂層表面に短波長紫外
線を照射しないこと以外は実施例1と同様にして多層プ
リント配線板を製造した。
Comparative Example 1 A multilayer printed wiring board was manufactured in the same manner as in Example 1 except that the surface of the insulating resin layer was not irradiated with short-wavelength ultraviolet rays.

【0036】(比較例2)絶縁樹脂層表面に短波長紫外
線を照射しないこと以外は実施例2と同様にして多層プ
リント配線板を製造した。
Comparative Example 2 A multilayer printed wiring board was manufactured in the same manner as in Example 2 except that the surface of the insulating resin layer was not irradiated with short-wavelength ultraviolet rays.

【0037】(比較例3)絶縁樹脂層表面に長波長紫外
線(高圧水銀灯)を200mJ/cm2の強度にて10秒間照
射したこと以外は実施例1と同様にして多層プリント配
線板を製造した。
Comparative Example 3 A multilayer printed wiring board was manufactured in the same manner as in Example 1 except that the surface of the insulating resin layer was irradiated with long-wavelength ultraviolet rays (high-pressure mercury lamp) at an intensity of 200 mJ / cm 2 for 10 seconds. .

【0038】このようにして実施例及び比較例で製造し
た多層プリント配線板について、JIS C 6481
に準拠した導体のピール強度(Max値、Min値、A
ve値)を測定し、その結果を表1に示す。
The multilayer printed wiring boards manufactured in Examples and Comparative Examples as described above were subjected to JIS C6481.
Strength (Max value, Min value, A
ve value) and the results are shown in Table 1.

【0039】表1に示す結果から明らかなように、実施
例1および2における多層プリント配線板は、導体のピ
ール強度のMax値とMin値の差がほとんどなく、安
定した導体ピール強度を示すことがわかる。これに対
し、比較例1および2における多層プリント配線板は、
粗化ムラによる導体ピール強度の変動が大きいことがわ
かる。なお、本発明にかかる実施例では、バイアホール
を介した導体間の電気的な接続信頼性も高く維持し得る
ことが確認された。
As is clear from the results shown in Table 1, the multilayer printed wiring boards in Examples 1 and 2 have almost no difference between the Max value and the Min value of the conductor peel strength, and exhibit stable conductor peel strength. I understand. In contrast, the multilayer printed wiring boards in Comparative Examples 1 and 2
It can be seen that the fluctuation of the conductor peel strength due to the roughening unevenness is large. In the examples according to the present invention, it was confirmed that the electrical connection reliability between the conductors via the via holes could be maintained high.

【0040】[0040]

【表1】 *サンプル数:10[Table 1] * Number of samples: 10

【0041】[0041]

【発明の効果】以上説明したように本発明にかかる多層
プリント配線板の製造方法によれば、短波長紫外線を照
射することにより、特に量産時における粗化ムラに起因
した導体のピール強度の低下を確実に防止でき、安定し
た導体ピール強度を確保した多層プリント配線板を提供
することができる。さらに本発明によれば、特にレーザ
プロセスにて形成したバイアホールを介した導体間の電
気的な接続信頼性も高く維持することができる。
As described above, according to the method for manufacturing a multilayer printed wiring board according to the present invention, the irradiation of short-wavelength ultraviolet light reduces the peel strength of the conductor due to unevenness particularly during mass production. Can be reliably prevented, and a multilayer printed wiring board that ensures stable conductor peel strength can be provided. Further, according to the present invention, the reliability of electrical connection between conductors via via holes formed by a laser process can be kept high.

───────────────────────────────────────────────────── フロントページの続き Fターム(参考) 5E343 AA02 AA12 BB21 BB71 DD33 DD43 EE32 EE38 GG04 5E346 AA05 AA06 AA12 AA43 BB01 CC58 DD02 DD03 DD22 EE35 EE38 FF02 FF03 FF04 GG01 GG15 GG27 HH11  ──────────────────────────────────────────────────続 き Continued on the front page F term (reference) 5E343 AA02 AA12 BB21 BB71 DD33 DD43 EE32 EE38 GG04 5E346 AA05 AA06 AA12 AA43 BB01 CC58 DD02 DD03 DD22 EE35 EE38 FF02 FF03 FF04 GG01 GG15 GG27 HH11

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】(a)第1の回路層を形成した絶縁基板上に
絶縁樹脂層を形成する工程、(b)前記(a)で形成した絶縁
樹脂層にバイアホール用開口を設ける工程、(c)前記(b)
でバイアホール用開口を設けた絶縁樹脂層の表面に短波
長紫外線を照射する工程、(d)前記絶縁樹脂層表面を粗
化剤にて粗面化処理する工程、(e)絶縁樹脂層にめっき
を施して第2の回路層及びバイアホールを形成し、当該
バイアホールにて第1の回路層と第2の回路層の層間接
続を行う工程、を含むことを特徴とする多層プリント配
線板の製造方法。
(A) forming an insulating resin layer on an insulating substrate on which a first circuit layer is formed; (b) providing a via hole opening in the insulating resin layer formed in (a); (c) the above (b)
In the step of irradiating the surface of the insulating resin layer provided with openings for via holes with short-wavelength ultraviolet light, (d) a step of roughening the surface of the insulating resin layer with a roughening agent, (e) the insulating resin layer A step of forming a second circuit layer and a via hole by plating, and making an interlayer connection between the first circuit layer and the second circuit layer in the via hole. Manufacturing method.
【請求項2】(a)第1の回路層を形成した絶縁基板上に
絶縁樹脂層を形成する工程、(b)前記(a)で形成した絶縁
樹脂層にバイアホール用開口を設ける工程、(c)前記(b)
でバイアホール用開口を設けた絶縁樹脂層の表面を粗化
剤にて粗面化処理する工程、(d)前記絶縁樹脂層表面の
粗化面に短波長紫外線を照射する工程、(e)絶縁樹脂層
にめっきを施して第2の回路層及びバイアホールを形成
し、当該バイアホールにて第1の回路層と第2の回路層
の層間接続を行う工程、を含むことを特徴とする多層プ
リント配線板の製造方法。
(A) forming an insulating resin layer on the insulating substrate on which the first circuit layer is formed; (b) providing a via hole opening in the insulating resin layer formed in (a); (c) the above (b)
In the step of roughening the surface of the insulating resin layer provided with openings for via holes with a roughening agent, (d) irradiating the roughened surface of the insulating resin layer surface with short-wavelength ultraviolet light, (e) Forming a second circuit layer and a via hole by plating the insulating resin layer, and performing interlayer connection between the first circuit layer and the second circuit layer in the via hole. A method for manufacturing a multilayer printed wiring board.
【請求項3】 前記短波長紫外線として低圧水銀灯を用
いることを特徴とする請求項1または2に記載の製造方
法。
3. The method according to claim 1, wherein a low-pressure mercury lamp is used as the short-wavelength ultraviolet light.
JP25978399A 1999-09-14 1999-09-14 Method for manufacture of multilayer printed wiring board Withdrawn JP2001085840A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP25978399A JP2001085840A (en) 1999-09-14 1999-09-14 Method for manufacture of multilayer printed wiring board

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP25978399A JP2001085840A (en) 1999-09-14 1999-09-14 Method for manufacture of multilayer printed wiring board

Publications (1)

Publication Number Publication Date
JP2001085840A true JP2001085840A (en) 2001-03-30

Family

ID=17338928

Family Applications (1)

Application Number Title Priority Date Filing Date
JP25978399A Withdrawn JP2001085840A (en) 1999-09-14 1999-09-14 Method for manufacture of multilayer printed wiring board

Country Status (1)

Country Link
JP (1) JP2001085840A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003027250A (en) * 2001-07-18 2003-01-29 Toyota Motor Corp Method for forming electroless plating film of resin
WO2004016054A1 (en) * 2002-08-07 2004-02-19 Denso Corporation Wiring substrate and wiring substrate connection structure
JP2006351646A (en) * 2005-06-14 2006-12-28 Tokai Rubber Ind Ltd Circuit board and its manufacturing method
JP2008294063A (en) * 2007-05-22 2008-12-04 Fujitsu Ltd Circuit board and manufacturing method thereof
WO2010073903A1 (en) 2008-12-26 2010-07-01 富士フイルム株式会社 Surface metal film material, process for producing surface metal film material, process for producing metal pattern material, and metal pattern material

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003027250A (en) * 2001-07-18 2003-01-29 Toyota Motor Corp Method for forming electroless plating film of resin
WO2004016054A1 (en) * 2002-08-07 2004-02-19 Denso Corporation Wiring substrate and wiring substrate connection structure
US7417195B2 (en) 2002-08-07 2008-08-26 Denso Corporation Circuit board and circuit board connection structure
DE10392162B4 (en) * 2002-08-07 2012-02-23 Denso Corporation Circuit card connection structure and manufacturing method therefor
JP2006351646A (en) * 2005-06-14 2006-12-28 Tokai Rubber Ind Ltd Circuit board and its manufacturing method
JP2008294063A (en) * 2007-05-22 2008-12-04 Fujitsu Ltd Circuit board and manufacturing method thereof
WO2010073903A1 (en) 2008-12-26 2010-07-01 富士フイルム株式会社 Surface metal film material, process for producing surface metal film material, process for producing metal pattern material, and metal pattern material
US8734934B2 (en) 2008-12-26 2014-05-27 Fujifilm Corporation Surface metal film material, method of producing surface metal film material, method of producing metal pattern material, and metal pattern material

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