JP2001066779A5

JP2001066779A5 -

Info

Publication number: JP2001066779A5
Application number: JP1999243346A
Authority: JP
Filing date: 1999-08-30
Publication date: 2005-07-07
Anticipated expiration: 2019-08-30

Claims

(A) at least one compound represented by the following general formulas (I) to (III) that generates an acid upon irradiation with an actinic ray or radiation;
(B) a resin having a group that decomposes by the action of an acid and increases the solubility in an alkaline developer, and (c) a basic nitrogen-containing compound,
A body-type photosensitive composition comprising:

(Wherein, R ¹ to R ³⁷ is a hydrogen atom, a linear, branched, cyclic alkyl group, a linear, branched, cyclic alkoxy group, hydroxy group, .R ³⁸ represents a halogen atom or -S-R ³⁸ group, the Represents a linear, branched, cyclic alkyl group or aryl group, provided that at least one of R ^{1 to} R ¹⁵ , at least one of R ^{16 to} R ²⁷ and at least one of R ^{28 to} R ³⁷ ; One is a hydroxy group or an alkoxy group.
X ⁻ has at least one group selected from the group consisting of branched or cyclic alkyl groups having 8 or more carbon atoms and alkoxy groups, or linear, branched or cyclic alkyl groups having 4 to 7 carbon atoms and alkoxy groups. Benzenesulfone having at least two groups selected from the group of groups, or having at least three groups selected from the group of linear, branched or cyclic alkyl groups having 1 to 3 carbon atoms and alkoxy groups It represents an anion of acid, naphthalene sulfonic acid or anthracene sulfonic acid.
Alternatively, ester group, R ³⁹ —CO— group, R ⁴⁰ —CONH— group, R ⁴¹ —NH— group, R ⁴² —OCONH— group, R ⁴³ —NHCOO— group, R ⁴⁴ —NHCONH— group, R ⁴⁵ —NHCSN -Represents an anion of benzenesulfonic acid, naphthalenesulfonic acid or an anthracenesulfonic acid having at least one group selected from the group consisting of-group, R ⁴⁶ -SO ₂ NH- group and nitro group. R ^{39 to} R ⁴⁶ represent a linear, branched or cyclic alkyl group or an aryl group. )

In the compounds represented by the general formulas (1) to (3), at least one of R ^{1 to} R ¹⁵ , at least one of R ^{16 to} R ²⁷ , and at least one of R ^{28 to} R ³⁷ 2. The positive photosensitive composition according to claim 1, wherein one is a hydroxy group, and both adjacent positions of the hydroxy group are not hydrogen atoms.

(D) A low molecular weight dissolution inhibiting compound having a molecular weight of 3000 or less, which further has a group decomposable by an acid and whose solubility in an alkaline developer is increased by the action of an acid. Or the positive photosensitive composition of 2.

(A) at least one compound represented by general formulas (I) to (III) that generates an acid upon irradiation with actinic rays according to claim 1;
(C) a basic nitrogen-containing compound,
(D) a low molecular weight dissolution inhibiting compound having a molecular weight of 3000 or less, which has a group that can be decomposed by an acid, and whose solubility in an alkaline developer is increased by the action of an acid; and (e) an insoluble in water that is insoluble in water. A positive photosensitive composition comprising a soluble resin.

(B) The resin having a group that decomposes under the action of an acid and increases the solubility in an alkaline developer is a resin containing at least one repeating structural unit selected from the following general formulas (IV) and (V) The positive photosensitive composition according to claim 1, wherein the positive photosensitive composition is present.

(In the above formula, L represents a hydrogen atom, an optionally substituted linear, branched or cyclic alkyl group, or an optionally substituted aralkyl group.
Z represents a linear, branched or cyclic alkyl group which may be substituted, or an aralkyl group which may be substituted. Z and L may combine to form a 5- or 6-membered ring. )

(B) at least one repeating structural unit selected from the general formulas (IV) and (V) according to claim 5, wherein the resin having a group that decomposes by the action of an acid and increases the solubility in an alkaline developer The positive photosensitive composition according to claim 5, wherein Z is a substituted alkyl group or a substituted aralkyl group.

A pattern forming method comprising: forming a film with the positive photosensitive composition according to claim 1, and exposing and developing the film.