JP2001064081A - Ceramic composition - Google Patents

Ceramic composition

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Publication number
JP2001064081A
JP2001064081A JP24270799A JP24270799A JP2001064081A JP 2001064081 A JP2001064081 A JP 2001064081A JP 24270799 A JP24270799 A JP 24270799A JP 24270799 A JP24270799 A JP 24270799A JP 2001064081 A JP2001064081 A JP 2001064081A
Authority
JP
Japan
Prior art keywords
slurry
ceramic composition
compound containing
weight
green sheet
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP24270799A
Other languages
Japanese (ja)
Inventor
Heikichi Tanei
平吉 種井
Kosaku Morita
耕策 森田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP24270799A priority Critical patent/JP2001064081A/en
Publication of JP2001064081A publication Critical patent/JP2001064081A/en
Pending legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To obtain a ceramic composition having low specific dielectric constant and low coefficient of thermal expansion by adding a specific amount (wt.%), expressed in term of CaO, of a compound containing Ca or a specific amount (wt.%), expressed in term of MgO, of a compound containing Mg to a raw ceramic composition for a slurry, and to provide a green sheet good in producibility, which is useful for producing a multilayer ceramic substrate. SOLUTION: To a raw ceramic composition for a slurry, 0.1 to 5 wt.%, expressed in term of CaO, of a compound containing Ca or 0.1 to 5 wt.%, expressed in term of MgO, of a compound containing Mg is added. The preferable ceramic composition contains 40 to 72 wt.% borosilicate glass, 8 to 60 wt.% alumina as a filler and 0 to 37 wt.% cordierite. A green sheet is obtained by mixing the borosilicate glass having a softening point of 750 to 840 deg.C, the ceramic filler, an organic binder and a solvent to prepare a slurry and processing the slurry into the form of a sheet to form a green sheet.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明はセラミック組成物及
び多層セラミック基板に関する。
The present invention relates to a ceramic composition and a multilayer ceramic substrate.

【0002】[0002]

【従来の技術】従来多層セラミック基板は、セラミック
材料としてアルミナ(Al2O3)が主に用いられ、導体材
料としてアルミナと同時焼結可能な高融点金属であるモ
リブデン(Mo)、タングステン(W)が用いられてい
る。しかし、アルミナの熱膨張係数が約7×10-6/℃と大
きいので、アルミナ基板にシリコン半導体素子を直接搭
載する場合には、それらの接続導体部に大きな応力が作
用し、信頼性が得られない。さらに、アルミナの比誘電
率が約10と比較的大きく、多層回路基板としての信号
伝搬がまだ十分速くない。その上、上記高融点金属の抵
抗は比較的大きく、配線の微細化が困難である。
2. Description of the Related Art Conventionally, alumina (Al 2 O 3 ) is mainly used as a ceramic material for a multilayer ceramic substrate, and molybdenum (Mo), tungsten (W), which is a refractory metal co-sinterable with alumina as a conductor material, ) Is used. However, since the thermal expansion coefficient of alumina is as large as about 7 × 10 -6 / ° C, when silicon semiconductor elements are directly mounted on an alumina substrate, large stress acts on those connecting conductors, and reliability is obtained. I can't. Furthermore, the relative dielectric constant of alumina is relatively large, about 10, and signal propagation as a multilayer circuit board is not yet sufficiently fast. In addition, the resistance of the high melting point metal is relatively large, and it is difficult to miniaturize the wiring.

【0003】そこで、上記問題点を解決するために、セ
ラミック材料として、アルミナに代えて約1000℃以
下で焼結するガラスセラミックスを用い、導体材料とし
て高融点金属に代えて低抵抗の銅、銀/パラジューム等
を用いた多層回路基板が知られている。尚、この種の技
術として特開平2−30641号公報、特開平10−3
30168号公報を挙げることができる。
In order to solve the above problems, glass ceramics sintered at about 1000 ° C. or less are used as the ceramic material instead of alumina, and low-resistance copper or silver is used as the conductor material instead of the high melting point metal. / Multilayer circuit boards using palladium and the like are known. Incidentally, as this kind of technology, Japanese Patent Application Laid-Open Nos. 2-30641 and 10-3
No. 30,168 can be mentioned.

【0004】[0004]

【発明が解決しようとする課題】本発明の課題は、約1
000℃以下で焼結でき、低比誘電率、低熱膨張を有す
るセラミック組成物を提供すること、また多層セラミッ
ク基板作製のための生産性の良いグリーンシートを提供
すること、さらには最近、多層セラミック基板に対する
低価格化の要求が増大しているので、それらを低価格に
提供することである。
The problem to be solved by the present invention is about 1
To provide a ceramic composition having a low relative dielectric constant and a low thermal expansion that can be sintered at a temperature of 000 ° C. or lower, to provide a green sheet with high productivity for producing a multilayer ceramic substrate, and recently to provide a multilayer ceramic. Since the demand for lowering the cost of substrates is increasing, it is necessary to provide them at a lower price.

【0005】[0005]

【課題を解決するための手段】上記課題を解決するため
に、本発明者は低比誘電率、低熱膨張を有するホウケイ
酸ガラスを主成分とするセラミック組成物を検討した。
ホウケイ酸ガラスはSiO2とB2O3のガラス網目構造成分を
主成分としそれに修飾酸化物であるアルカリ酸化物等を
加えた組成からなる。ガラスは通常原料の酸化物あるい
は炭酸塩等を溶融し、それを急冷して作られる。その溶
融温度が高い場合、ガラス溶解坩堝及び溶解炉の費用が
かさむ。ガラスを大量に安価に作るにはその溶融温度は
約1300℃以下が好ましい。ガラスの特性は粘度が10
7.6Poiseとなる軟化点で特徴付けられる。軟化点として
は750〜840℃が選ばれる。軟化点が840℃を越えるよう
になると上記したガラス溶融温度が高くなりガラスを大
量に安価に作ることが困難になるためである。軟化点が
750℃より低い場合、多層セラミック基板上に表層導体
や抵抗体を焼成する時に反りや変形が生じやすいので、
本発明の範囲外とした。
In order to solve the above-mentioned problems, the present inventors have studied a ceramic composition mainly composed of borosilicate glass having a low dielectric constant and a low thermal expansion.
The borosilicate glass has a composition in which a glass network structure component of SiO 2 and B 2 O 3 is a main component and a modifying oxide such as an alkali oxide is added thereto. Glass is usually produced by melting a raw material oxide or carbonate and quenching it. If the melting temperature is high, the cost of the glass melting crucible and melting furnace is increased. In order to make a large amount of glass at low cost, the melting temperature is preferably about 1300 ° C. or less. Glass has a viscosity of 10
7.6 Poise is characterized by a softening point. As the softening point, 750 to 840 ° C is selected. If the softening point exceeds 840 ° C., the above-mentioned glass melting temperature increases and it becomes difficult to produce a large amount of glass at low cost. Softening point
If the temperature is lower than 750 ° C, warpage or deformation is likely to occur when firing the surface conductors and resistors on the multilayer ceramic substrate.
Out of the scope of the present invention.

【0006】ホウケイ酸ガラス粉末を用いてグリーンシ
ートを作製し、そのグリーンシートに穴明けを施し、導
体を印刷し、それらのシートを積層・圧着した後それを
焼結させる多層セラミック基板の製造プロセスにおい
て、高湿度の雰囲気の下でグリーンシート上にホウ酸結
晶が析出し、導体印刷欠陥が生じ、生産性の良くない場
合があった。グリーンシート上にホウ酸結晶が析出する
原因はホウケイ酸ガラスの耐水性が悪いためである。ガ
ラス構造を考慮するとアルカリを含まないホウケイ酸ガ
ラスではBイオンは酸素3配位である。ガラス構造中の
酸素3配位のBは水分子のアタックに対して結合が切れ
やすく、水中に溶出する。溶出したB2O3からホウ酸結晶
(H3BO3)が析出する。ガラス成分にアルカリ(Na,K
等)が添加されるとBイオンは酸素4配位となる。ガラ
ス構造中の酸素4配位のBは水分子のアタックに対して
結合が切れにくい。従って、アルカリ酸化物をB2O3とほ
ぼ同じモル数添加した組成が高耐水性を有する。アルカ
リの添加は耐水性の向上が図れるが、熱膨張係数と比誘
電率を増大させる。ホウケイ酸ガラスの特長である低熱
膨張と低比誘電率を優先させるために、アルカリの添加
が少ないガラス、すなわち耐水性のあまり良くないガラ
スを使いこなすことも重要である。
A process for manufacturing a multi-layer ceramic substrate in which a green sheet is prepared using borosilicate glass powder, a hole is formed in the green sheet, a conductor is printed, the sheets are laminated and pressed, and then sintered. In some cases, boric acid crystals were precipitated on the green sheet under a high humidity atmosphere, and a conductor printing defect occurred, resulting in poor productivity. The boric acid crystals precipitate on the green sheet because the water resistance of the borosilicate glass is poor. Considering the glass structure, in borosilicate glass containing no alkali, B ions are in oxygen three coordination. The three-coordinate oxygen in the glass structure is easily broken by the attack of water molecules and elutes into water. Boric acid crystals (H 3 BO 3 ) precipitate from the eluted B 2 O 3 . Alkali (Na, K
) Is added, the B ion becomes oxygen 4-coordinate. B in oxygen coordination in the glass structure is not easily broken by the attack of water molecules. Therefore, a composition in which an alkali oxide is added in substantially the same mole number as B 2 O 3 has high water resistance. The addition of an alkali can improve the water resistance, but increases the coefficient of thermal expansion and the relative dielectric constant. In order to give priority to low thermal expansion and low dielectric constant, which are the features of borosilicate glass, it is also important to use a glass to which a small amount of alkali is added, that is, a glass having not very good water resistance.

【0007】本発明では上記の観点からSiO2:68〜82重
量%、B2O3:12〜23重量%、R2O (Na2O あるいは/及び
K2O):1〜5重量%、Al2O3:0〜5重量%からなるホウケ
イ酸ガラスを選定し、スラリーを作製する工程におい
て、スラリー原料のセラミック組成物にCaを含む化合物
をCaOに換算して0.1から5重量%、または/及びMgを含
む化合物をMgOに換算して0.1から5重量%添加すること
により、グリーンシート上に析出するホウ酸結晶析出を
抑制できることを見いだした。Caを含む化合物としては
CaCO3,Ca(OH)2等が用いられ、Mgを含む化合物としてはM
gCO3,Mg(OH)2等が用いられる。
In the present invention, SiO 2 : 68 to 82% by weight, B 2 O 3 : 12 to 23% by weight, R 2 O (Na 2 O and / or
K 2 O): 1 to 5% by weight, Al 2 O 3 : A borosilicate glass consisting of 0 to 5% by weight is selected, and in the step of preparing a slurry, a compound containing Ca is added to the ceramic composition of the slurry raw material as CaO. It has been found that the addition of a compound containing 0.1 to 5% by weight in terms of MgO or / and 0.1 to 5% by weight in terms of MgO can suppress the boric acid crystal precipitation on the green sheet. As a compound containing Ca,
CaCO 3 , Ca (OH) 2 etc. are used, and as a compound containing Mg, M
gCO 3 , Mg (OH) 2 and the like are used.

【0008】セラミック基板は大きな抗折強度(200
MPa以上)を有することが必要である。従ってセラミ
ック組成物は焼結後大きな抗折強度を有する必要があ
る。セラミック組成物がホウケイ酸ガラス単独では高強
度は得られないので、セラミックフィラーの添加が必要
である。高強度化のためのフィラーとしてはアルミナが
最も適しているが、その熱膨張係数や比誘電率が大きい
ので、それらの特性の小さいコージェライトもフィラー
として添加される。好ましいセラミック組成物はホウケ
イ酸ガラス:40〜72重量%(55〜75体積%)、フィラー
としてのアルミナ8〜60重量%(5〜45体積%)、コージ
ェライト:0〜37重量%(0〜35体積%)である。
The ceramic substrate has a large bending strength (200).
MPa or more). Therefore, the ceramic composition needs to have a large bending strength after sintering. Since high strength cannot be obtained by using a borosilicate glass alone for a ceramic composition, it is necessary to add a ceramic filler. Alumina is most suitable as a filler for increasing the strength, but cordierite having a small characteristic is also added as a filler because of its large thermal expansion coefficient and relative dielectric constant. Preferred ceramic compositions are borosilicate glass: 40-72% by weight (55-75% by volume), alumina as filler: 8-60% by weight (5-45% by volume), cordierite: 0-37% by weight (0-75%). 35% by volume).

【0009】[0009]

【発明の実施の形態】組成が重量%でSiO2が77%、B2
O3が20%、K2Oが2.7%、Al2O3が0.3%からなるホウケ
イ酸ガラス粉末(軟化点:825℃、熱膨張係数:2.3
×10-6/℃)とアルミナ粉末、コージェライト粉末、炭
酸カルシウム粉末、炭酸マグネシウム粉末を表1のセラ
ミック組成となるように秤量した。これらのセラミック
組成物:100重量部と変成アクリル樹脂を主成分とす
る水溶性の有機バインダ:約14重量部と溶剤としての
水:約75重量部とアクリル酸アンモニウム塩系分散
剤:0.3重量部とをボールミルで混合し、スラリーを
作製した。ここで上記バインダ材料は環境の安全衛生上
良好な市販品の水溶性有機バインダを用いた。次に上記
スラリーを用い、ドクターブレード法により厚さ:0.2m
m、幅:450mmのグリーンシートを作製した。グリーンシ
ートは50mm角あるいは150mm角に切断した。
BEST MODE FOR CARRYING OUT THE INVENTION 77% SiO 2 and B 2
Borosilicate glass powder composed of 20% O 3, 2.7% K 2 O, and 0.3% Al 2 O 3 (softening point: 825 ° C., coefficient of thermal expansion: 2.3)
× 10 −6 / ° C.), alumina powder, cordierite powder, calcium carbonate powder, and magnesium carbonate powder were weighed to have the ceramic composition shown in Table 1. These ceramic compositions: 100 parts by weight, a water-soluble organic binder containing a modified acrylic resin as a main component: about 14 parts by weight, water as a solvent: about 75 parts by weight, and an ammonium acrylate-based dispersant: 0.3 Parts by weight were mixed with a ball mill to prepare a slurry. Here, as the binder material, a commercially available water-soluble organic binder excellent in environmental safety and health was used. Next, using the slurry, the thickness is 0.2 m by a doctor blade method.
A green sheet having a m and a width of 450 mm was prepared. The green sheet was cut into 50 mm square or 150 mm square.

【0010】初めに、150mm角のグリーンシートは温度
25℃、相対湿度85RH%に保った恒温恒湿槽に24
h入れてグリーンシート上に径100μm以上のホウ酸
結晶が析出するかどうかを調べた。結果を表1に示し
た。セラミック組成物にCaを含む化合物をCaOに換算し
て0.1から5重量%、または/及びMgを含む化合物をMgO
に換算して0.1から5重量%添加することにより、グリー
ンシート上に析出するホウ酸結晶析出を抑制できること
がわかった。
First, a 150 mm square green sheet is placed in a thermo-hygrostat kept at a temperature of 25 ° C. and a relative humidity of 85 RH%.
Then, it was examined whether or not boric acid crystals having a diameter of 100 μm or more were deposited on the green sheet. The results are shown in Table 1. The compound containing Ca in the ceramic composition is 0.1 to 5% by weight in terms of CaO, and / or the compound containing Mg is MgO.
It was found that by adding 0.1 to 5% by weight in terms of, the precipitation of boric acid crystals on the green sheet can be suppressed.

【0011】[0011]

【表1】 [Table 1]

【0012】次に、50mm角のシートは30層積層し、1
30℃、20MPaの圧力で10分間プレスした。その
圧着体を電気炉に入れ、大気中で室温から100℃/h
の昇温速度で500℃まであげてその温度で2時間保持
し、その後100℃/hの昇温速度で表1に示す温度ま
であげて、その温度で2時間保持し緻密化焼結を行っ
た。得られたセラミック焼結体については熱膨張係数、
比誘電率、抗折強度を測定し、表1に記した。表1よ
り、本発明のセラミック組成物は熱膨張係数がアルミナ
のそれ(約7×10-6/℃)よりも小さく、2.5〜5.5×10-6
/℃の範囲であり、比誘電率はアルミナのそれ(約10)
よりも小さく4.6〜7.5の範囲である。また、抗折強度は
200MPa以上であり、実用的な強度を満足する。
Next, 30 sheets of 50 mm square sheets are laminated and 1
Pressing was performed at 30 ° C. and a pressure of 20 MPa for 10 minutes. The crimped body is placed in an electric furnace, and is heated from room temperature to 100 ° C./h in the atmosphere.
The temperature was raised to 500 ° C. at a heating rate of 2 ° C. and maintained at that temperature for 2 hours. Thereafter, the temperature was raised to a temperature shown in Table 1 at a heating rate of 100 ° C./h and maintained at that temperature for 2 hours to perform densification sintering. Was. For the obtained ceramic sintered body, the thermal expansion coefficient,
The relative dielectric constant and flexural strength were measured and are shown in Table 1. As shown in Table 1, the ceramic composition of the present invention has a coefficient of thermal expansion smaller than that of alumina (about 7 × 10 −6 / ° C.), that is, 2.5 to 5.5 × 10 −6.
/ ° C and the relative dielectric constant of that of alumina (about 10)
Smaller than 4.6 to 7.5. Further, the transverse rupture strength is 200 MPa or more, which satisfies practical strength.

【0013】次に150mm角のグリーンシートにポンチで
直径0.13mmの穴(ビアホール)を0.5mmピッチで明け、
その穴にAg/Pdペーストを印刷法で埋め込み、さらには
グリーンシート表面にもAg/Pdペーストを印刷して0.2mm
幅の配線パターンを通常の方法で形成したものを、5層
積層し、上記と同様に圧着し、焼成した。焼成した基板
表面にAg/Pd導体を印刷し、最高温度850℃に設定したベ
ルト式電気炉で焼成した。トータルの焼成時間は1hで
あった。表層導体の形成後、反り・変形等の異常が無
く、厚膜回路基板として有用であった。
Next, holes (via holes) having a diameter of 0.13 mm are punched in a 150 mm square green sheet with a punch at a pitch of 0.5 mm.
The Ag / Pd paste is embedded in the hole by printing method, and the Ag / Pd paste is also printed on the surface of the green sheet by 0.2 mm.
Five layers each having a wiring pattern having a width formed by an ordinary method were laminated, pressed and fired in the same manner as described above. An Ag / Pd conductor was printed on the fired substrate surface, and fired in a belt-type electric furnace set at a maximum temperature of 850 ° C. The total firing time was 1 hour. After the formation of the surface conductor, there was no abnormality such as warpage or deformation, and it was useful as a thick film circuit board.

【0014】[0014]

【発明の効果】本発明のセラミック組成物は850℃〜
1000℃の低温で焼結できるので、Ag/Pd,Cu,Au等の
低抵抗導体との同時焼結が可能であり、熱膨張係数が2.
2〜5.5×10-6/℃でSiの熱膨張係数に近く、本組成物
を用いたセラミック基板上にSiからなる半導体素子を
搭載した場合、両者の熱膨張係数差による接続導体部に
生じる応力が小さく、高い信頼性が得られ、比誘電率は
4.6〜6.0と低いので回路基板として、信号伝搬が
高速となり、抗折強度も200MPa以上と大きいの
で、実用的基板が作れる。さらに、本発明のセラミック
組成物の主原料であるホウケイ酸ガラスは軟化点が75
0℃〜840℃であり、安価に製造され、しかも本発明
のセラミック組成物を用いて作製したグリーンシートか
らはホウ酸結晶が析出し難く、生産性が高いという効果
が得られる。
The ceramic composition of the present invention has a temperature of 850.degree.
Since it can be sintered at a low temperature of 1000 ° C, it can be sintered simultaneously with low-resistance conductors such as Ag / Pd, Cu, and Au, and has a thermal expansion coefficient of 2.
It is close to the thermal expansion coefficient of Si at 2 to 5.5 × 10 -6 / ° C., and when a semiconductor element made of Si is mounted on a ceramic substrate using this composition, it occurs in the connecting conductor due to the difference in thermal expansion coefficient between the two. Since the stress is small, high reliability is obtained, and the relative dielectric constant is as low as 4.6 to 6.0, the signal propagation becomes high as a circuit board, and the bending strength is as large as 200 MPa or more, so that a practical board can be made. . Further, borosilicate glass, which is a main raw material of the ceramic composition of the present invention, has a softening point of 75%.
The temperature is 0 ° C. to 840 ° C., and boric acid crystals hardly precipitate from the green sheet produced using the ceramic composition of the present invention, and the effect of high productivity is obtained.

Claims (3)

【特許請求の範囲】[Claims] 【請求項1】ホウケイ酸ガラスとセラミックフィラーと
有機バインダと溶剤とを混合してスラリーを作製するス
ラリー作製工程と、上記スラリーをシート状に加工して
グリーンシートを作製する工程において、スラリー原料
セラミック組成物にCaを含む化合物をCaOに換算して0.1
から5重量%、または/及びMgを含む化合物をMgOに換算
して0.1から5重量%添加したことを特徴とするセラミッ
ク組成物。
A first step of preparing a slurry by mixing a borosilicate glass, a ceramic filler, an organic binder and a solvent to form a slurry; and forming a green sheet by processing the slurry into a sheet. The compound containing Ca in the composition is converted to CaO to 0.1
Or 5% by weight, or / and 0.1 to 5% by weight of a compound containing Mg in terms of MgO.
【請求項2】軟化点が750℃〜840℃のホウケイ酸
ガラスとセラミックフィラーと有機バインダと溶剤とを
混合してスラリーを作製するスラリー作製工程と上記ス
ラリーをシート状に加工してグリーンシートを作製する
工程において、スラリー原料セラミック組成物にCaを含
む化合物をCaOに換算して0.1から5重量%、または/及
びMgを含む化合物をMgOに換算して0.1から5重量%添加
したことを特徴とするセラミック組成物。
2. A slurry preparing step of preparing a slurry by mixing borosilicate glass having a softening point of 750 ° C. to 840 ° C., a ceramic filler, an organic binder and a solvent, and processing the slurry into a sheet to form a green sheet. In the producing step, the compound containing Ca is added to the slurry raw material ceramic composition in an amount of 0.1 to 5% by weight in terms of CaO, and / or the compound containing Mg is added in an amount of 0.1 to 5% by weight converted to MgO. A ceramic composition.
【請求項3】請求項1及び2において、セラミック組成
物がホウケイ酸ガラス:40〜72重量%(55〜75体積
%)、フィラーとしてのアルミナ8〜60重量%(5〜45体
積%)、コージェライト:0〜37重量%(0〜35体積%)
とからなることを特徴とするセラミック組成物。
3. The method according to claim 1, wherein the ceramic composition is borosilicate glass: 40 to 72% by weight (55 to 75% by volume), alumina as a filler 8 to 60% by weight (5 to 45% by volume), Cordierite: 0-37% by weight (0-35% by volume)
A ceramic composition comprising:
JP24270799A 1999-08-30 1999-08-30 Ceramic composition Pending JP2001064081A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP24270799A JP2001064081A (en) 1999-08-30 1999-08-30 Ceramic composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP24270799A JP2001064081A (en) 1999-08-30 1999-08-30 Ceramic composition

Publications (1)

Publication Number Publication Date
JP2001064081A true JP2001064081A (en) 2001-03-13

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP24270799A Pending JP2001064081A (en) 1999-08-30 1999-08-30 Ceramic composition

Country Status (1)

Country Link
JP (1) JP2001064081A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165467A (en) * 2005-12-12 2007-06-28 Asahi Glass Co Ltd Method for manufacturing substrate
JP7369008B2 (en) 2019-10-29 2023-10-25 株式会社村田製作所 Conductive paste and laminated electronic components

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007165467A (en) * 2005-12-12 2007-06-28 Asahi Glass Co Ltd Method for manufacturing substrate
JP7369008B2 (en) 2019-10-29 2023-10-25 株式会社村田製作所 Conductive paste and laminated electronic components

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