JP2001062504A - Method for manufacturing rolled copper foil - Google Patents

Method for manufacturing rolled copper foil

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Publication number
JP2001062504A
JP2001062504A JP23719799A JP23719799A JP2001062504A JP 2001062504 A JP2001062504 A JP 2001062504A JP 23719799 A JP23719799 A JP 23719799A JP 23719799 A JP23719799 A JP 23719799A JP 2001062504 A JP2001062504 A JP 2001062504A
Authority
JP
Japan
Prior art keywords
annealing
copper foil
rolling
copper
temperature
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP23719799A
Other languages
Japanese (ja)
Other versions
JP3514180B2 (en
Inventor
Yoshinori Yamamoto
佳紀 山本
Hajime Sasaki
元 佐々木
Takeshi Shimada
健 嶋田
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Cable Ltd
Original Assignee
Hitachi Cable Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Cable Ltd filed Critical Hitachi Cable Ltd
Priority to JP23719799A priority Critical patent/JP3514180B2/en
Publication of JP2001062504A publication Critical patent/JP2001062504A/en
Application granted granted Critical
Publication of JP3514180B2 publication Critical patent/JP3514180B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Abstract

PROBLEM TO BE SOLVED: To effectively control softening and strength decrease under ordinary temperature without depending on wall-thinning of a material before final rolling by placing the material to be annealed in a specified temperature range and annealing it before final rolling. SOLUTION: Copper foil is manufactured from a copper material by repeating annealing and rolling. The temperature of the material to be annealed is made 550 to 750 deg.C, and it is annealed before final rolling, and impurity elements deposited in the material are solid-solved in the mother phase of the copper to improve the resistance against softening of the material itself. The annealing before final rolling is for 20 minutes maximum, and after annealing, it is preferable to cool it at the cooling rate of 50 deg.C/min or higher until it reaches 300 deg.C. The copper material is desirably of a plate material made by hot-rolling an ingot of touch pitch copper into a specified thickness. A softening preventive effect is further increased using tough pitch copper containing a very fine amount of oxygen.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、圧延銅箔の製造方
法に関し、特に、常温において軟化しにくく、従って、
強度の低下しにくい圧延銅箔の製造方法に関する。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a method for producing a rolled copper foil, and more particularly, it is difficult to soften at room temperature.
The present invention relates to a method for producing a rolled copper foil whose strength is not easily reduced.

【0002】[0002]

【従来の技術】厚さが15μmクラスの極薄の銅箔がプ
リント基板の配線板、電池の集電体、コンデンサの電
極、電磁波シールド材、リードフレーム等に使用されて
いる。通常、この種の銅箔は、銅の素材に焼鈍と冷間圧
延を繰り返し施すことによって、たとえば、200μm
厚さの生地材を製造し、最終の圧延加工において、この
生地材を、たとえば、15μmに減厚して製造される。
2. Description of the Related Art Ultra-thin copper foil having a thickness of 15 μm is used for a wiring board of a printed circuit board, a current collector of a battery, an electrode of a capacitor, an electromagnetic wave shielding material, a lead frame, and the like. Usually, a copper foil of this type is made of, for example, 200 μm by repeatedly annealing and cold rolling a copper material.
A fabric material having a thickness is manufactured, and in the final rolling process, the material is reduced to, for example, 15 μm.

【0003】このようにして製造される銅箔は、最終圧
延が90%を超える高い冷間加工度のため、内部に高エ
ネルギーを蓄積した状態となり、このため、時間が経過
するのに伴って再結晶が進行し、常温下において軟化す
る性質を有している。軟化した銅箔は、強度と伸びが低
下して破断あるいはシワが入りやすくなり、取扱いの難
しい銅箔となる。
[0003] The copper foil produced in this way has a high degree of cold work in which the final rolling exceeds 90%, so that high energy is accumulated inside the copper foil. It has the property of undergoing recrystallization and softening at room temperature. The softened copper foil has a reduced strength and elongation, is likely to be broken or wrinkled, and is difficult to handle.

【0004】従来、この問題への対処策としては、最終
圧延前の生地材の厚さを薄くすることが行われている
(特開平10−230303号等)。生地材の厚さを薄
くすることで冷間圧延の加工度を下げ、これによって銅
箔内への蓄積エネルギーを少なくし、再結晶の進行を抑
制しようとするもので、強度低下を防ぐうえでの効果は
確かに大きい。
Conventionally, as a countermeasure against this problem, the thickness of the material before final rolling is reduced (Japanese Patent Application Laid-Open No. 10-230303). By reducing the workability of cold rolling by reducing the thickness of the dough material, this reduces the energy stored in the copper foil and tries to suppress the progress of recrystallization. The effect is certainly great.

【0005】[0005]

【発明が解決しようとする課題】しかし、この方法に基
づく圧延銅箔の製造方法によると、たとえば、15μm
の銅箔を得ようとするとき、最終圧延前の生地材の厚さ
を従来の半分の100μmに設定したとすると、焼鈍時
間が生地材の厚さに反比例して長くなるため、重量当た
りの焼鈍効率の低下が著しく、コスト上の負担が大きく
なる。
However, according to the method for producing a rolled copper foil based on this method, for example, 15 μm
When trying to obtain a copper foil, if the thickness of the material before final rolling is set to 100 μm, which is half the conventional value, the annealing time increases in inverse proportion to the thickness of the material, so The annealing efficiency is remarkably reduced, and the cost burden is increased.

【0006】また、この方法によると、焼鈍を圧延ライ
ンの中で連続して行うとき、材料が破断しやすい問題を
有しており、一方、これを避けるためにコイル巻き材料
を炉内で焼鈍するときには、巻き層間において材料が粘
着するなど、製造上の問題も有している。
Further, according to this method, when annealing is continuously performed in a rolling line, there is a problem that the material is easily broken. On the other hand, in order to avoid this, the coil wound material is annealed in a furnace. In some cases, there is also a problem in manufacturing, such as the material sticking between the winding layers.

【0007】このように最終圧延前の生地材の厚さを薄
くする方法は、銅箔の強度低下を防ぐうえにおいては有
効であるけれども、製造コストおよび製造技術上の観点
からすると不利であり、現実には、採用の難しい方法で
あると言わざるを得ない。
Although the method of reducing the thickness of the material before the final rolling is effective in preventing the strength of the copper foil from decreasing, it is disadvantageous from the viewpoint of manufacturing cost and manufacturing technology. In reality, this is a difficult method to adopt.

【0008】従って、本発明の目的は、最終圧延前の生
地材の薄肉化に依存することなく、常温下での軟化とそ
れによる強度低下を効果的に抑制することのできる圧延
銅箔の製造方法を提供することにある。
Accordingly, an object of the present invention is to produce a rolled copper foil capable of effectively suppressing softening at room temperature and resulting reduction in strength without depending on thinning of the material before final rolling. It is to provide a method.

【0009】[0009]

【課題を解決するための手段】本発明は、上記の目的を
達成するため、焼鈍と圧延を繰り返すことによって銅の
素材から所定の厚さの銅箔を製造する圧延銅箔の製造方
法において、焼鈍される生地材の温度が550〜750
℃になるようにして最終圧延前の焼鈍を行うことを特徴
とする圧延銅箔の製造方法を提供するものである。
SUMMARY OF THE INVENTION The present invention provides a method for producing a rolled copper foil for producing a copper foil having a predetermined thickness from a copper material by repeating annealing and rolling to achieve the above object. The temperature of the material to be annealed is 550-750
The present invention provides a method for producing a rolled copper foil, wherein annealing before final rolling is carried out at a temperature of ℃.

【0010】本発明における最終圧延前の焼鈍温度55
0〜750℃は、圧延銅箔の焼鈍において一般に採用さ
れている200〜500℃に比較すると格段に高い温度
である。最終圧延前の焼鈍をこのように高い温度に設定
して行う理由は、生地材中に析出している不純物元素を
銅の母相中に固溶させ、生地材そのものの耐軟化性を向
上させるためである。
In the present invention, the annealing temperature before final rolling 55
The temperature of 0 to 750 ° C. is much higher than the temperature of 200 to 500 ° C. generally used for annealing of rolled copper foil. The reason for performing the annealing before the final rolling at such a high temperature is that the impurity element precipitated in the base material is dissolved in the copper matrix to improve the softening resistance of the base material itself. That's why.

【0011】通常、銅に含まれる不純物元素は、銅の母
相中に原子レベルで固溶して存在する場合と、不純物原
子だけの相、あるいは酸化物のような化合物相の形で析
出する場合があり、Sなどの不純物においては、銅の母
相中に固溶状態で存在するときに軟化現象を抑制する性
質を有する一方、析出した状態では、抑制効果を有しな
い特質を備えている。また、高温になるほど母相中に固
溶できる不純物の量は増え、従って、生地材を高温に加
熱した後、析出が進行しない速度で冷却すれば、通常よ
り多くの不純物が固溶した材料を得ることができる。
Usually, the impurity element contained in copper is present in the form of a solid solution at the atomic level in the mother phase of copper, and is precipitated in the form of only impurity atoms or a compound phase such as an oxide. In some cases, impurities such as S have the property of suppressing the softening phenomenon when present in a solid solution state in the copper matrix, while having the characteristic of having no suppression effect in the precipitated state. . Also, the higher the temperature, the more the amount of impurities that can be dissolved in the matrix increases.Therefore, if the dough material is heated to a high temperature and then cooled at a rate at which precipitation does not proceed, the material in which more impurities are dissolved in the solid solution than usual is obtained. Obtainable.

【0012】発明者らは、以上の観点から圧延銅箔の焼
鈍条件と圧延後の軟化特性の関係を究明し、薄い圧延銅
箔において問題となる常温下での軟化現象を解決したも
ので、生地材の温度を550〜750℃に設定して最終
圧延前の焼鈍を行うことが、常温での軟化現象と強度低
下を抑制するための条件となることを見いだしたもので
ある。
The present inventors have studied the relationship between the annealing conditions of rolled copper foil and the softening characteristics after rolling from the above viewpoints, and solved the softening phenomenon at room temperature, which is a problem in thin rolled copper foil, It has been found that setting the temperature of the base material to 550 to 750 ° C. and performing annealing before final rolling is a condition for suppressing the softening phenomenon and the decrease in strength at room temperature.

【0013】生地材の温度が550℃を下廻ると、母相
中への不純物の固溶が進行せずに析出が進行するように
なるため、常温での軟化現象が生ずるようになり、一
方、750℃を超過すると、焼鈍後の結晶組織が粗大化
して機械的特性の低下を招くようになる。
When the temperature of the base material is lower than 550 ° C., the solid solution of the impurities in the mother phase does not progress and the precipitation proceeds, so that the softening phenomenon at normal temperature occurs. If the temperature exceeds 750 ° C., the crystal structure after annealing becomes coarse and the mechanical properties deteriorate.

【0014】生地材を550〜750℃に保持する時間
は、短く設定することが好ましい。高温での保持時間が
長くなると、結晶の粗大化が起こるようになる。この現
象を避ける意味から、上記温度での保持時間は最長で2
0分とすべきである。
[0014] It is preferable to set a short time for keeping the material at 550 to 750 ° C. As the holding time at a high temperature becomes longer, the crystal becomes coarser. To avoid this phenomenon, the holding time at the above temperature is 2
Should be 0 minutes.

【0015】550〜750℃に加熱された後の生地材
は、急速に冷却することが望ましく、300℃までの降
温を50℃/分以上の速度で冷却すべきである。冷却速
度が50℃/分よりも遅くなると、300〜500℃の
温度領域において不純物元素の析出が生ずるようにな
り、高温での焼鈍によって与えられた耐軟化性が消失す
るようになる。
It is desirable that the dough material after being heated to 550 to 750 ° C. be cooled rapidly, and the temperature be lowered to 300 ° C. at a rate of 50 ° C./min or more. If the cooling rate is lower than 50 ° C./min, the precipitation of impurity elements will occur in the temperature range of 300 to 500 ° C., and the softening resistance given by annealing at a high temperature will be lost.

【0016】本発明による軟化防止効果は、銅の素材と
して微量の酸素を含有するタフピッチ銅を使用するとき
に大きく現れる。タフピッチ銅を構成材とした圧延銅箔
は、無酸素銅などを構成材とした圧延銅箔に比べて常温
での軟化現象が特に大きく、従って、本発明がタフピッ
チ銅の圧延銅箔の製造に適用されるとき、その効果は顕
著なものとなる。
The softening prevention effect according to the present invention appears significantly when tough pitch copper containing a trace amount of oxygen is used as a copper material. Rolled copper foil with tough pitch copper as a constituent material has a particularly large softening phenomenon at room temperature as compared with rolled copper foil with oxygen-free copper or the like as a constituent material.Therefore, the present invention relates to the production of rolled copper foil with tough pitch copper. When applied, the effect is significant.

【0017】本発明により製造される圧延銅箔は、強度
低下が起こりにくいために多くの用途に使用可能であ
る。たとえば、絶縁板と積層されるプリント基板の配線
層、絶縁フィルムと接着させられるフレキシブルプリン
ト基板の配線層、コンデンサの電極、電磁波のシールド
材、表面に活性物質をコーティングされる電池の集電
材、あるいは半導体チップを搭載するためのリードフレ
ーム材など、その硬質性を利用した多くの用途が考えら
れる。
The rolled copper foil produced according to the present invention can be used in many applications because the strength is hardly reduced. For example, a wiring layer of a printed circuit board laminated with an insulating plate, a wiring layer of a flexible printed circuit board bonded to an insulating film, an electrode of a capacitor, a shielding material for electromagnetic waves, a current collector for a battery whose surface is coated with an active material, or Many applications utilizing its rigidity, such as a lead frame material for mounting a semiconductor chip, can be considered.

【0018】[0018]

【発明の実施の形態】次に、本発明による圧延銅箔の製
造方法の実施の形態を説明する。
Next, an embodiment of a method for producing a rolled copper foil according to the present invention will be described.

【実施例1】酸素を約300ppm含有し、銅が99.
9重量%以上を占めるタフピッチ銅の鋳塊を熱間圧延加
工することによって厚さ12mmの銅の素材を製造し、
次いで、焼鈍と冷間圧延を繰り返すことによって厚さ2
00μmの最終圧延前の生地材を製造した。
EXAMPLE 1 About 300 ppm of oxygen and 99.
A 12mm thick copper material is manufactured by hot rolling a tough pitch copper ingot occupying 9% by weight or more,
Next, by repeating annealing and cold rolling, the thickness 2
A 00 μm pre-rolled material was produced.

【0019】次に、これに、生地材が600℃に加熱さ
れ、かつその温度に10分間保持される焼鈍処理を施し
た後、300℃まで50℃/分以上の速度で冷却し、そ
の後、これを15μmの厚さに冷間圧延加工することに
よって所定の圧延銅箔を製造した。
Next, the material is subjected to an annealing treatment in which the material is heated to 600 ° C. and held at that temperature for 10 minutes, and then cooled to 300 ° C. at a rate of 50 ° C./min or more. This was cold-rolled to a thickness of 15 μm to produce a predetermined rolled copper foil.

【0020】[0020]

【実施例2】焼鈍時の生地材の温度を650℃に設定し
た以外、他を実施例1と同一条件に設定することによっ
て所定の圧延銅箔を製造した。
Example 2 A given rolled copper foil was manufactured by setting the same conditions as in Example 1 except that the temperature of the material during annealing was set to 650 ° C.

【0021】[0021]

【従来例1】実施例1において、焼鈍時の生地材の温度
を400℃に設定し、他を同一条件とすることによって
所定の圧延銅箔を製造した。
Conventional Example 1 In Example 1, a predetermined rolled copper foil was produced by setting the temperature of the material at the time of annealing to 400 ° C. and setting the other conditions the same.

【0022】[0022]

【従来例2】実施例1において、焼鈍時の生地材の温度
を500℃に設定し、他を同一条件とすることによって
所定の圧延銅箔を製造した。
Conventional Example 2 In Example 1, a predetermined rolled copper foil was manufactured by setting the temperature of the material at the time of annealing to 500 ° C. and setting the other conditions the same.

【0023】[0023]

【従来例3】実施例1において、焼鈍時の生地材の温度
を500℃に設定するとともに、焼鈍後の冷却速度を1
0℃/分に設定し、他を同一条件とすることによって所
定の圧延銅箔を製造した。
Conventional Example 3 In Example 1, the temperature of the material during annealing was set to 500 ° C. and the cooling rate after annealing was set to 1
A predetermined rolled copper foil was manufactured by setting the temperature to 0 ° C./min and the other conditions being the same.

【0024】[0024]

【比較例】実施例1において、焼鈍時の生地材の温度を
800℃に設定し、他を同一条件とすることによって所
定の圧延銅箔を製造した。
COMPARATIVE EXAMPLE In Example 1, a predetermined rolled copper foil was produced by setting the temperature of the material at the time of annealing to 800 ° C. and setting the other conditions the same.

【0025】表1に、以上の各例により得られた圧延銅
箔の特性試験結果を示す。各サンプルを常温下に放置し
たときの引張強さの経時変化を示したもので、圧延直
後、3カ月後、6ケ月後、および12ケ月後の引張強さ
を示したものである。また、表2に、実施例1、2およ
び比較例を対象とした焼鈍後の結晶粒径の測定結果を示
す。
Table 1 shows the characteristic test results of the rolled copper foil obtained in each of the above examples. It shows the change over time in tensile strength when each sample was left at room temperature, and shows the tensile strength immediately after rolling, three months, six months, and 12 months after rolling. Table 2 shows the measurement results of the crystal grain size after annealing in Examples 1 and 2 and Comparative Example.

【0026】[0026]

【表1】 [Table 1]

【0027】[0027]

【表2】 [Table 2]

【0028】表1によれば、実施例1および2における
引張強さの経時変化は緩やかであり、12ケ月後の引張
強さの残率がそれぞれ85%および95%と高いレベル
を維持しているのに比べ、従来例1〜3の12ケ月後の
引張強度残率は、51〜60%と格段に低く、両者の間
には顕著な差が認められる。
According to Table 1, the change with time of the tensile strength in Examples 1 and 2 was moderate, and the residual ratio of the tensile strength after 12 months was maintained at a high level of 85% and 95%, respectively. In contrast, the tensile strength residual ratios of Conventional Examples 1 to 3 after 12 months are remarkably low at 51 to 60%, and a remarkable difference is recognized between the two.

【0029】また、表2によれば、本発明の数値から外
れる比較例の場合が、焼鈍後において結晶粒径を著しく
粗大化させているのに比べ、実施例の場合には、いずれ
も適度な粒径を有することが示されている。表1と表2
には、軟化現象とそれによる強度低下を防止し、良質の
結晶組織を有した圧延銅箔を得るうえにおいて、最終圧
延前の焼鈍における生地材の温度を550〜750℃に
設定することの重要性が示されており、本発明による効
果が明確に現れている。
According to Table 2, the comparative examples deviating from the numerical values of the present invention show that the crystal grain size is significantly increased after annealing. It has been shown to have a good particle size. Table 1 and Table 2
In order to prevent a softening phenomenon and a decrease in strength due to the phenomenon, and to obtain a rolled copper foil having a high-quality crystal structure, it is important to set the temperature of the base material in annealing before final rolling to 550 to 750 ° C. The effect of the present invention is clearly shown.

【0030】[0030]

【発明の効果】以上説明したように、本発明による圧延
銅箔の製造方法によれば、最終圧延前の焼鈍を、焼鈍さ
れる生地材が550〜750℃となるようにして行うた
め、得られる銅箔は、常温下において軟化しにくい性質
を有するようになり、従って、強度低下の少ない圧延銅
箔を提供することができる。
As described above, according to the method for producing a rolled copper foil according to the present invention, the annealing before the final rolling is performed so that the material to be annealed is at 550 to 750 ° C. The resulting copper foil has a property that it is hard to soften at room temperature, and therefore, it is possible to provide a rolled copper foil with less decrease in strength.

───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.7 識別記号 FI テーマコート゛(参考) C22F 1/00 692 C22F 1/00 692A 692B (72)発明者 嶋田 健 茨城県土浦市木田余町3550番地 日立電線 株式会社システムマテリアル研究所内 Fターム(参考) 4E002 AA08 AD13 BC07 BD07 BD09 CA08 ──────────────────────────────────────────────────続 き Continued on the front page (51) Int.Cl. 7 Identification symbol FI Theme coat ゛ (Reference) C22F 1/00 692 C22F 1/00 692A 692B (72) Inventor Takeshi Shimada 3550 Kida Yomachi, Tsuchiura City, Ibaraki Prefecture Hitachi Cable Co., Ltd. System Materials Laboratory F-term (reference) 4E002 AA08 AD13 BC07 BD07 BD09 CA08

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】焼鈍と圧延を繰り返すことによって銅の素
材から所定の厚さの銅箔を製造する圧延銅箔の製造方法
において、 焼鈍される生地材の温度が550〜750℃になるよう
にして最終圧延前の焼鈍を行うことを特徴とする圧延銅
箔の製造方法。
1. A method for manufacturing a rolled copper foil for manufacturing a copper foil having a predetermined thickness from a copper material by repeating annealing and rolling, wherein the temperature of the material to be annealed is 550 to 750 ° C. And performing annealing before final rolling.
【請求項2】前記最終圧延前の焼鈍は、最長で20分間
行うことを特徴とする請求項1項記載の圧延銅箔の製造
方法。
2. The method according to claim 1, wherein the annealing before the final rolling is performed for a maximum of 20 minutes.
【請求項3】前記生地材は、前記最終圧延前の焼鈍を施
された後、300℃に到達するまでの冷却速度を50℃
/分以上に設定されて冷却されることを特徴とする請求
項1項記載の圧延銅箔の製造方法。
3. The cooling rate of the dough material after annealing before the final rolling until reaching a temperature of 300 ° C. is reduced to 50 ° C.
2. The method for producing a rolled copper foil according to claim 1, wherein the cooling is performed at a rate of not less than / min.
【請求項4】前記銅の素材は、タフピッチ銅の鋳塊を熱
間圧延した所定の厚さの板材であることを特徴とする請
求項1項記載の圧延銅箔の製造方法。
4. The method for producing a rolled copper foil according to claim 1, wherein said copper material is a sheet material having a predetermined thickness obtained by hot rolling an ingot of tough pitch copper.
JP23719799A 1999-08-24 1999-08-24 Method for producing rolled copper foil Expired - Lifetime JP3514180B2 (en)

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JP2010280191A (en) * 2009-06-08 2010-12-16 Hitachi Cable Ltd Copper foil for heat treatment, manufacturing method thereof and flexible printed wiring board
US9457389B2 (en) * 2011-11-11 2016-10-04 Furukawa Electric Co., Ltd. Rolled copper foil
US20140335372A1 (en) * 2011-11-11 2014-11-13 FURUKAWA ELECTRlC CO., LTD. Rolled copper foil
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JP2013136807A (en) * 2011-12-28 2013-07-11 Jx Nippon Mining & Metals Corp Rolled copper foil for use in forming superconductive film
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CN103071678A (en) * 2012-11-20 2013-05-01 无锡常安通用金属制品有限公司 Calendaring method of copper foil
CN115805436A (en) * 2022-11-24 2023-03-17 安徽鑫科铜业有限公司 Production method of brass strip with uniform surface lines for LED
CN115805436B (en) * 2022-11-24 2023-09-05 安徽鑫科铜业有限公司 Production method of brass strip for LED with uniform surface texture

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