JP2001051193A - Projection optical system projection exposing device provided with the system and manufacture of device - Google Patents

Projection optical system projection exposing device provided with the system and manufacture of device

Info

Publication number
JP2001051193A
JP2001051193A JP2000155213A JP2000155213A JP2001051193A JP 2001051193 A JP2001051193 A JP 2001051193A JP 2000155213 A JP2000155213 A JP 2000155213A JP 2000155213 A JP2000155213 A JP 2000155213A JP 2001051193 A JP2001051193 A JP 2001051193A
Authority
JP
Japan
Prior art keywords
lens
lens group
optical system
projection optical
positive
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000155213A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001051193A5 (enExample
Inventor
Koji Shigematsu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to JP2000155213A priority Critical patent/JP2001051193A/ja
Publication of JP2001051193A publication Critical patent/JP2001051193A/ja
Publication of JP2001051193A5 publication Critical patent/JP2001051193A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2000155213A 1999-06-03 2000-05-25 Projection optical system projection exposing device provided with the system and manufacture of device Pending JP2001051193A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000155213A JP2001051193A (en) 1999-06-03 2000-05-25 Projection optical system projection exposing device provided with the system and manufacture of device

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP15699599 1999-06-03
JP2000155213A JP2001051193A (en) 1999-06-03 2000-05-25 Projection optical system projection exposing device provided with the system and manufacture of device

Publications (2)

Publication Number Publication Date
JP2001051193A true JP2001051193A (en) 2001-02-23
JP2001051193A5 JP2001051193A5 (enExample) 2008-03-06

Family

ID=26484588

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000155213A Pending JP2001051193A (en) 1999-06-03 2000-05-25 Projection optical system projection exposing device provided with the system and manufacture of device

Country Status (1)

Country Link
JP (1) JP2001051193A (enExample)

Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6556353B2 (en) 2001-02-23 2003-04-29 Nikon Corporation Projection optical system, projection exposure apparatus, and projection exposure method
KR20030038427A (ko) * 2001-11-05 2003-05-16 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스의 제조 방법
US6862078B2 (en) 2001-02-21 2005-03-01 Nikon Corporation Projection optical system and exposure apparatus with the same
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
CN106871041A (zh) * 2017-03-22 2017-06-20 广州维思车用部件有限公司 汽车后视镜内的投影灯装置
CN112415865A (zh) * 2020-12-01 2021-02-26 中国科学院光电技术研究所 一种应用于投影光刻机的单倍率大视场投影曝光物镜
CN118068543A (zh) * 2024-04-19 2024-05-24 南京信息工程大学 一种长工作距高分辨率物方远心镜头

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09292568A (ja) * 1996-04-25 1997-11-11 Nikon Corp 投影光学系
JPH10133105A (ja) * 1996-10-25 1998-05-22 Nikon Corp 投影露光装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH09292568A (ja) * 1996-04-25 1997-11-11 Nikon Corp 投影光学系
JPH10133105A (ja) * 1996-10-25 1998-05-22 Nikon Corp 投影露光装置

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6862078B2 (en) 2001-02-21 2005-03-01 Nikon Corporation Projection optical system and exposure apparatus with the same
US6556353B2 (en) 2001-02-23 2003-04-29 Nikon Corporation Projection optical system, projection exposure apparatus, and projection exposure method
KR20030038427A (ko) * 2001-11-05 2003-05-16 가부시키가이샤 니콘 투영 광학계, 노광 장치 및 디바이스의 제조 방법
JP2007513372A (ja) * 2003-12-02 2007-05-24 カール・ツァイス・エスエムティー・アーゲー 投影光学系
CN106871041A (zh) * 2017-03-22 2017-06-20 广州维思车用部件有限公司 汽车后视镜内的投影灯装置
CN106871041B (zh) * 2017-03-22 2023-07-18 广州维思车用部件有限公司 汽车后视镜内的投影灯装置
CN112415865A (zh) * 2020-12-01 2021-02-26 中国科学院光电技术研究所 一种应用于投影光刻机的单倍率大视场投影曝光物镜
CN112415865B (zh) * 2020-12-01 2023-11-17 中国科学院光电技术研究所 一种应用于投影光刻机的单倍率大视场投影曝光物镜
CN118068543A (zh) * 2024-04-19 2024-05-24 南京信息工程大学 一种长工作距高分辨率物方远心镜头

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